TWD230200S - 反應管 - Google Patents

反應管 Download PDF

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Publication number
TWD230200S
TWD230200S TW111300908F TW111300908F TWD230200S TW D230200 S TWD230200 S TW D230200S TW 111300908 F TW111300908 F TW 111300908F TW 111300908 F TW111300908 F TW 111300908F TW D230200 S TWD230200 S TW D230200S
Authority
TW
Taiwan
Prior art keywords
reaction tube
design
express
views
processing device
Prior art date
Application number
TW111300908F
Other languages
English (en)
Chinese (zh)
Inventor
岡嶋優作
Original Assignee
日商國際電氣股份有限公司 (日本)
日商國際電氣股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商國際電氣股份有限公司 (日本), 日商國際電氣股份有限公司 filed Critical 日商國際電氣股份有限公司 (日本)
Publication of TWD230200S publication Critical patent/TWD230200S/zh

Links

TW111300908F 2021-09-15 2022-02-24 反應管 TWD230200S (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021-019930 2021-09-15
JP2021019930F JP1713188S (enrdf_load_stackoverflow) 2021-09-15 2021-09-15

Publications (1)

Publication Number Publication Date
TWD230200S true TWD230200S (zh) 2024-03-01

Family

ID=81209955

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111300908F TWD230200S (zh) 2021-09-15 2022-02-24 反應管

Country Status (3)

Country Link
US (1) USD1022904S1 (enrdf_load_stackoverflow)
JP (1) JP1713188S (enrdf_load_stackoverflow)
TW (1) TWD230200S (enrdf_load_stackoverflow)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD166710S (zh) 2013-07-08 2015-03-21 日立國際電氣股份有限公司 反應管

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD405429S (en) * 1997-01-31 1999-02-09 Tokyo Electron Limited Processing tube for use in a semiconductor wafer heat processing apparatus
USD424024S (en) * 1997-01-31 2000-05-02 Tokyo Electron Limited Quartz process tube
USD405431S (en) * 1997-08-20 1999-02-09 Tokyo Electron Ltd. Tube for use in a semiconductor wafer heat processing apparatus
JP3985899B2 (ja) * 2002-03-28 2007-10-03 株式会社日立国際電気 基板処理装置
TWD118408S1 (zh) * 2006-02-20 2007-08-01 東京威力科創股份有限公司 半導體製造用加工處理管
USD600659S1 (en) * 2006-09-12 2009-09-22 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
TWD127410S1 (zh) * 2007-04-20 2009-02-11 東京威力科創股份有限公司 半導體製造用製程管
TWD125601S (zh) * 2007-05-08 2008-10-21 東京威力科創股份有限公司 半導體製造用加工處理管
TWD133943S1 (zh) 2008-05-09 2010-03-21 日立國際電氣股份有限公司 反應管
USD742339S1 (en) 2014-03-12 2015-11-03 Hitachi Kokusai Electric Inc. Reaction tube
JP1534828S (enrdf_load_stackoverflow) * 2015-02-23 2015-10-13
JP1535455S (enrdf_load_stackoverflow) * 2015-02-25 2015-10-19
JP1546345S (enrdf_load_stackoverflow) * 2015-09-04 2016-03-22
JP1546512S (enrdf_load_stackoverflow) * 2015-09-04 2016-03-22

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD166710S (zh) 2013-07-08 2015-03-21 日立國際電氣股份有限公司 反應管

Also Published As

Publication number Publication date
JP1713188S (enrdf_load_stackoverflow) 2022-04-21
USD1022904S1 (en) 2024-04-16

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