TWD230200S - reaction tube - Google Patents
reaction tube Download PDFInfo
- Publication number
- TWD230200S TWD230200S TW111300908F TW111300908F TWD230200S TW D230200 S TWD230200 S TW D230200S TW 111300908 F TW111300908 F TW 111300908F TW 111300908 F TW111300908 F TW 111300908F TW D230200 S TWD230200 S TW D230200S
- Authority
- TW
- Taiwan
- Prior art keywords
- reaction tube
- design
- express
- views
- processing device
- Prior art date
Links
- 239000000758 substrate Substances 0.000 abstract description 4
- 238000000034 method Methods 0.000 abstract description 2
- 238000010586 diagram Methods 0.000 abstract 1
Abstract
【物品用途】;本設計之物品是反應管,係在基板處理裝置中,將複數層排列的基板收容在內部,且在預定的氣體氛圍下進行處理的反應管。;【設計說明】;立體圖中,未呈現在其他六視圖中的細線,皆為用表現立體表面之形狀的線條。[Object Purpose];The object of this design is a reaction tube, which is a reaction tube in a substrate processing device that accommodates multiple layers of substrates and processes them under a predetermined gas atmosphere.;[Design Description];In the three-dimensional diagram, the fine lines that are not shown in the other six views are all lines used to express the shape of the three-dimensional surface.
Description
本設計之物品是反應管,係在基板處理裝置中,將複數層排列的基板收容在內部,且在預定的氣體氛圍下進行處理的反應管。The object of this design is a reaction tube, which is used in a substrate processing device to house multiple layers of substrates inside and process them in a predetermined gas atmosphere.
立體圖中,未呈現在其他六視圖中的細線,皆為用表現立體表面之形狀的線條。In the three-dimensional view, the thin lines that are not shown in the other six views are all lines used to express the shape of the three-dimensional surface.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021-019930 | 2021-09-15 | ||
JP2021019930F JP1713188S (en) | 2021-09-15 | 2021-09-15 |
Publications (1)
Publication Number | Publication Date |
---|---|
TWD230200S true TWD230200S (en) | 2024-03-01 |
Family
ID=81209955
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW111300908F TWD230200S (en) | 2021-09-15 | 2022-02-24 | reaction tube |
Country Status (3)
Country | Link |
---|---|
US (1) | USD1022904S1 (en) |
JP (1) | JP1713188S (en) |
TW (1) | TWD230200S (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWD166710S (en) | 2013-07-08 | 2015-03-21 | 日立國際電氣股份有限公司 | reaction tube |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD405429S (en) * | 1997-01-31 | 1999-02-09 | Tokyo Electron Limited | Processing tube for use in a semiconductor wafer heat processing apparatus |
USD424024S (en) * | 1997-01-31 | 2000-05-02 | Tokyo Electron Limited | Quartz process tube |
USD405431S (en) * | 1997-08-20 | 1999-02-09 | Tokyo Electron Ltd. | Tube for use in a semiconductor wafer heat processing apparatus |
JP3985899B2 (en) * | 2002-03-28 | 2007-10-03 | 株式会社日立国際電気 | Substrate processing equipment |
USD590359S1 (en) * | 2006-02-20 | 2009-04-14 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers or the like |
USD600659S1 (en) * | 2006-09-12 | 2009-09-22 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
USD594488S1 (en) * | 2007-04-20 | 2009-06-16 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
USD619630S1 (en) * | 2007-05-08 | 2010-07-13 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
USD618638S1 (en) | 2008-05-09 | 2010-06-29 | Hitachi Kokusai Electric, Inc. | Reaction tube |
USD742339S1 (en) | 2014-03-12 | 2015-11-03 | Hitachi Kokusai Electric Inc. | Reaction tube |
JP1534828S (en) * | 2015-02-23 | 2015-10-13 | ||
JP1535455S (en) * | 2015-02-25 | 2015-10-19 | ||
JP1546345S (en) * | 2015-09-04 | 2016-03-22 | ||
JP1546512S (en) * | 2015-09-04 | 2016-03-22 |
-
2021
- 2021-09-15 JP JP2021019930F patent/JP1713188S/ja active Active
-
2022
- 2022-02-24 TW TW111300908F patent/TWD230200S/en unknown
- 2022-03-14 US US29/830,614 patent/USD1022904S1/en active Active
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWD166710S (en) | 2013-07-08 | 2015-03-21 | 日立國際電氣股份有限公司 | reaction tube |
Also Published As
Publication number | Publication date |
---|---|
USD1022904S1 (en) | 2024-04-16 |
JP1713188S (en) | 2022-04-21 |
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