TW579434B - Inspection-microscope for several wavelength-ranges and reflection-reduction-layer for an inspection-microscope for several wavelength-ranges - Google Patents
Inspection-microscope for several wavelength-ranges and reflection-reduction-layer for an inspection-microscope for several wavelength-ranges Download PDFInfo
- Publication number
- TW579434B TW579434B TW091106133A TW91106133A TW579434B TW 579434 B TW579434 B TW 579434B TW 091106133 A TW091106133 A TW 091106133A TW 91106133 A TW91106133 A TW 91106133A TW 579434 B TW579434 B TW 579434B
- Authority
- TW
- Taiwan
- Prior art keywords
- layer
- mgf2
- reflection
- patent application
- reflection reduction
- Prior art date
Links
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims abstract description 98
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 83
- 230000003287 optical effect Effects 0.000 claims abstract description 50
- 229910052681 coesite Inorganic materials 0.000 claims abstract description 47
- 229910052906 cristobalite Inorganic materials 0.000 claims abstract description 47
- 229910052682 stishovite Inorganic materials 0.000 claims abstract description 47
- 229910052905 tridymite Inorganic materials 0.000 claims abstract description 47
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 claims abstract description 26
- 229910001634 calcium fluoride Inorganic materials 0.000 claims abstract description 26
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 19
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract description 13
- 229910052593 corundum Inorganic materials 0.000 claims abstract description 13
- 229910001845 yogo sapphire Inorganic materials 0.000 claims abstract description 13
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 11
- 230000009467 reduction Effects 0.000 claims description 86
- 239000000463 material Substances 0.000 claims description 47
- 238000007689 inspection Methods 0.000 claims description 28
- 238000005286 illumination Methods 0.000 claims description 20
- 238000003384 imaging method Methods 0.000 claims description 20
- 230000001603 reducing effect Effects 0.000 claims description 20
- 239000000203 mixture Substances 0.000 claims description 9
- 239000011521 glass Substances 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 203
- 238000013461 design Methods 0.000 description 16
- 238000001228 spectrum Methods 0.000 description 15
- 230000000694 effects Effects 0.000 description 13
- 238000000034 method Methods 0.000 description 8
- 239000010453 quartz Substances 0.000 description 8
- 230000008859 change Effects 0.000 description 7
- 230000003595 spectral effect Effects 0.000 description 7
- 230000008569 process Effects 0.000 description 6
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 5
- 238000001000 micrograph Methods 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 235000012431 wafers Nutrition 0.000 description 5
- 238000000576 coating method Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000011160 research Methods 0.000 description 3
- 238000005299 abrasion Methods 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 239000012780 transparent material Substances 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000005304 optical glass Substances 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000001429 visible spectrum Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/06—Means for illuminating specimens
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/0004—Microscopes specially adapted for specific applications
- G02B21/0016—Technical microscopes, e.g. for inspection or measuring in industrial production processes
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/16—Microscopes adapted for ultraviolet illumination ; Fluorescence microscopes
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Analytical Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Microscoopes, Condenser (AREA)
- Surface Treatment Of Optical Elements (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10119909A DE10119909B4 (de) | 2001-04-23 | 2001-04-23 | Inspektionsmikroskop für den sichtbaren und ultravioletten Spektralbereich und Reflexionsminderungsschicht für den sichtbaren und ultravioletten Spektralbereich |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW579434B true TW579434B (en) | 2004-03-11 |
Family
ID=7682439
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW091106133A TW579434B (en) | 2001-04-23 | 2002-03-28 | Inspection-microscope for several wavelength-ranges and reflection-reduction-layer for an inspection-microscope for several wavelength-ranges |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US7274505B2 (enExample) |
| EP (1) | EP1381901A1 (enExample) |
| JP (1) | JP4012467B2 (enExample) |
| DE (1) | DE10119909B4 (enExample) |
| TW (1) | TW579434B (enExample) |
| WO (1) | WO2002086579A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102918428A (zh) * | 2010-09-02 | 2013-02-06 | 奥林巴斯株式会社 | 反射防止膜、透镜、光学系统、物镜以及光学设备 |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7019905B2 (en) * | 2003-12-30 | 2006-03-28 | 3M Innovative Properties Company | Multilayer reflector with suppression of high order reflections |
| DE102004025646A1 (de) * | 2004-05-24 | 2005-12-22 | Jenoptik Laser, Optik, Systeme Gmbh | Hochreflektierender dielektrischer Spiegel und Verfahren zu dessen Herstellung |
| DE102004034845B4 (de) | 2004-07-19 | 2006-05-18 | Leica Microsystems Cms Gmbh | Umschaltbares Mikroskop |
| US20110229659A1 (en) * | 2010-03-22 | 2011-09-22 | Timothy Ray Reynolds | Ion beam assisted deposition of ophthalmic lens coatings |
| PL2972070T3 (pl) * | 2013-03-15 | 2020-11-16 | Sensory Analytics | Sposób i system do pomiaru podczas procesu w czasie rzeczywistym grubości powłoki |
| US9733465B2 (en) * | 2015-02-12 | 2017-08-15 | The Penn State Research Foundation | Waveguides for enhanced total internal reflection fluorescence microscopy |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3936136A (en) * | 1970-12-29 | 1976-02-03 | Nippon Kogaku K.K. | Multilayer anti-reflection film for ultraviolet rays |
| US4960310A (en) * | 1989-08-04 | 1990-10-02 | Optical Corporation Of America | Broad band nonreflective neutral density filter |
| JP3324780B2 (ja) * | 1991-05-16 | 2002-09-17 | オリンパス光学工業株式会社 | 紫外線顕微鏡 |
| DE4219817A1 (de) * | 1992-06-17 | 1993-12-23 | Merck Patent Gmbh | Aufdampfmaterial zur Herstellung mittelbrechender optischer Schichten |
| JP3224316B2 (ja) * | 1993-09-07 | 2001-10-29 | キヤノン株式会社 | 二波長反射防止膜 |
| US5661596A (en) * | 1994-02-03 | 1997-08-26 | Canon Kabushiki Kaisha | Antireflection film and exposure apparatus using the same |
| FR2750216B1 (fr) * | 1996-06-21 | 1998-07-24 | Commissariat Energie Atomique | Empilement multicouche de materiaux fluorures, utilisable en optique et son procede de fabrication |
| US5911858A (en) * | 1997-02-18 | 1999-06-15 | Sandia Corporation | Method for high-precision multi-layered thin film deposition for deep and extreme ultraviolet mirrors |
| US5937920A (en) * | 1997-08-04 | 1999-08-17 | Link Research & Development, Inc. | Product dispensing system |
| US5960840A (en) * | 1998-04-27 | 1999-10-05 | Link Research And Development, Inc. | Controlled product dispensing system |
| DE19831392A1 (de) | 1998-07-14 | 2000-02-03 | Leica Microsystems | Zweibereichs-Reflexionsminderung für den sichtbaren Spektralbereich und einer Wellenlänge von: (248 +/- 15)NM |
| JP2000227504A (ja) * | 1999-02-05 | 2000-08-15 | Minolta Co Ltd | 反射防止膜 |
| US6196522B1 (en) * | 1999-04-02 | 2001-03-06 | Ecolab, Inc. | Geometric lockout coupler |
| DE19931954A1 (de) * | 1999-07-10 | 2001-01-11 | Leica Microsystems | Beleuchtungseinrichtung für ein DUV-Mikroskop |
| JP2001074904A (ja) * | 1999-09-02 | 2001-03-23 | Canon Inc | 二波長反射防止膜 |
| JP4524877B2 (ja) * | 2000-07-17 | 2010-08-18 | コニカミノルタホールディングス株式会社 | 眼鏡用レンズ |
| JP2003279702A (ja) * | 2002-03-19 | 2003-10-02 | Olympus Optical Co Ltd | ２波長反射防止膜および該２波長反射防止膜を施した対物レンズ |
-
2001
- 2001-04-23 DE DE10119909A patent/DE10119909B4/de not_active Expired - Lifetime
-
2002
- 2002-03-22 US US10/475,653 patent/US7274505B2/en not_active Expired - Lifetime
- 2002-03-22 WO PCT/EP2002/003217 patent/WO2002086579A1/de not_active Ceased
- 2002-03-22 JP JP2002584048A patent/JP4012467B2/ja not_active Expired - Fee Related
- 2002-03-22 EP EP02706779A patent/EP1381901A1/de not_active Withdrawn
- 2002-03-28 TW TW091106133A patent/TW579434B/zh not_active IP Right Cessation
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102918428A (zh) * | 2010-09-02 | 2013-02-06 | 奥林巴斯株式会社 | 反射防止膜、透镜、光学系统、物镜以及光学设备 |
| CN102918428B (zh) * | 2010-09-02 | 2015-01-07 | 奥林巴斯株式会社 | 反射防止膜、透镜、光学系统、物镜以及光学设备 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1381901A1 (de) | 2004-01-21 |
| JP2004524585A (ja) | 2004-08-12 |
| WO2002086579A1 (de) | 2002-10-31 |
| DE10119909B4 (de) | 2005-04-21 |
| DE10119909A1 (de) | 2002-10-31 |
| US20040145803A1 (en) | 2004-07-29 |
| JP4012467B2 (ja) | 2007-11-21 |
| US7274505B2 (en) | 2007-09-25 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |