JP2004524585A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2004524585A5 JP2004524585A5 JP2002584048A JP2002584048A JP2004524585A5 JP 2004524585 A5 JP2004524585 A5 JP 2004524585A5 JP 2002584048 A JP2002584048 A JP 2002584048A JP 2002584048 A JP2002584048 A JP 2002584048A JP 2004524585 A5 JP2004524585 A5 JP 2004524585A5
- Authority
- JP
- Japan
- Prior art keywords
- layer
- reflection
- mgf
- layers
- wavelength
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010410 layer Substances 0.000 description 243
- 230000003287 optical effect Effects 0.000 description 98
- 239000000463 material Substances 0.000 description 34
- 238000007689 inspection Methods 0.000 description 33
- 229910004298 SiO 2 Inorganic materials 0.000 description 26
- 229910004261 CaF 2 Inorganic materials 0.000 description 25
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 25
- 238000005286 illumination Methods 0.000 description 25
- 239000000203 mixture Substances 0.000 description 23
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 22
- 230000009467 reduction Effects 0.000 description 20
- 238000003384 imaging method Methods 0.000 description 17
- 230000003595 spectral effect Effects 0.000 description 16
- 229910021193 La 2 O 3 Inorganic materials 0.000 description 13
- 230000007704 transition Effects 0.000 description 11
- 230000000694 effects Effects 0.000 description 10
- 230000008859 change Effects 0.000 description 9
- 238000001228 spectrum Methods 0.000 description 9
- 239000010453 quartz Substances 0.000 description 8
- 238000006073 displacement reaction Methods 0.000 description 7
- 238000003475 lamination Methods 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 238000012360 testing method Methods 0.000 description 7
- 239000000126 substance Substances 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 5
- 229910052753 mercury Inorganic materials 0.000 description 5
- 235000012431 wafers Nutrition 0.000 description 5
- 230000003667 anti-reflective effect Effects 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 238000001000 micrograph Methods 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 240000004050 Pentaglottis sempervirens Species 0.000 description 1
- 235000004522 Pentaglottis sempervirens Nutrition 0.000 description 1
- 239000011358 absorbing material Substances 0.000 description 1
- 239000006117 anti-reflective coating Substances 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000012994 industrial processing Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10119909A DE10119909B4 (de) | 2001-04-23 | 2001-04-23 | Inspektionsmikroskop für den sichtbaren und ultravioletten Spektralbereich und Reflexionsminderungsschicht für den sichtbaren und ultravioletten Spektralbereich |
| PCT/EP2002/003217 WO2002086579A1 (de) | 2001-04-23 | 2002-03-22 | Inspektionsmikroskop für mehrere wellenlängenbereiche und reflexionsminderungsschicht für ein inspektionsmikroskop für mehrere wellenlängenbereiche |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004524585A JP2004524585A (ja) | 2004-08-12 |
| JP2004524585A5 true JP2004524585A5 (enExample) | 2005-12-22 |
| JP4012467B2 JP4012467B2 (ja) | 2007-11-21 |
Family
ID=7682439
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002584048A Expired - Fee Related JP4012467B2 (ja) | 2001-04-23 | 2002-03-22 | 複数の波長領域のための検査顕微鏡、及び複数の波長領域のための検査顕微鏡のための減反射層 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US7274505B2 (enExample) |
| EP (1) | EP1381901A1 (enExample) |
| JP (1) | JP4012467B2 (enExample) |
| DE (1) | DE10119909B4 (enExample) |
| TW (1) | TW579434B (enExample) |
| WO (1) | WO2002086579A1 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7019905B2 (en) * | 2003-12-30 | 2006-03-28 | 3M Innovative Properties Company | Multilayer reflector with suppression of high order reflections |
| DE102004025646A1 (de) * | 2004-05-24 | 2005-12-22 | Jenoptik Laser, Optik, Systeme Gmbh | Hochreflektierender dielektrischer Spiegel und Verfahren zu dessen Herstellung |
| DE102004034845B4 (de) | 2004-07-19 | 2006-05-18 | Leica Microsystems Cms Gmbh | Umschaltbares Mikroskop |
| CA2793855A1 (en) * | 2010-03-22 | 2011-09-29 | Luxottica Us Holdings Corporation | Ion beam assisted deposition of ophthalmic lens coatings |
| JP5603714B2 (ja) * | 2010-09-02 | 2014-10-08 | オリンパス株式会社 | 反射防止膜、レンズ、光学系、対物レンズ、及び光学機器 |
| CA2908964C (en) * | 2013-03-15 | 2018-11-20 | Sensory Analytics | Method and system for real-time in-process measurement of coating thickness |
| US9733465B2 (en) * | 2015-02-12 | 2017-08-15 | The Penn State Research Foundation | Waveguides for enhanced total internal reflection fluorescence microscopy |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3936136A (en) * | 1970-12-29 | 1976-02-03 | Nippon Kogaku K.K. | Multilayer anti-reflection film for ultraviolet rays |
| US4960310A (en) * | 1989-08-04 | 1990-10-02 | Optical Corporation Of America | Broad band nonreflective neutral density filter |
| JP3324780B2 (ja) * | 1991-05-16 | 2002-09-17 | オリンパス光学工業株式会社 | 紫外線顕微鏡 |
| DE4219817A1 (de) * | 1992-06-17 | 1993-12-23 | Merck Patent Gmbh | Aufdampfmaterial zur Herstellung mittelbrechender optischer Schichten |
| JP3224316B2 (ja) * | 1993-09-07 | 2001-10-29 | キヤノン株式会社 | 二波長反射防止膜 |
| US5661596A (en) * | 1994-02-03 | 1997-08-26 | Canon Kabushiki Kaisha | Antireflection film and exposure apparatus using the same |
| FR2750216B1 (fr) * | 1996-06-21 | 1998-07-24 | Commissariat Energie Atomique | Empilement multicouche de materiaux fluorures, utilisable en optique et son procede de fabrication |
| US5911858A (en) * | 1997-02-18 | 1999-06-15 | Sandia Corporation | Method for high-precision multi-layered thin film deposition for deep and extreme ultraviolet mirrors |
| US5937920A (en) * | 1997-08-04 | 1999-08-17 | Link Research & Development, Inc. | Product dispensing system |
| US5960840A (en) * | 1998-04-27 | 1999-10-05 | Link Research And Development, Inc. | Controlled product dispensing system |
| DE19831392A1 (de) * | 1998-07-14 | 2000-02-03 | Leica Microsystems | Zweibereichs-Reflexionsminderung für den sichtbaren Spektralbereich und einer Wellenlänge von: (248 +/- 15)NM |
| JP2000227504A (ja) | 1999-02-05 | 2000-08-15 | Minolta Co Ltd | 反射防止膜 |
| US6196522B1 (en) * | 1999-04-02 | 2001-03-06 | Ecolab, Inc. | Geometric lockout coupler |
| DE19931954A1 (de) * | 1999-07-10 | 2001-01-11 | Leica Microsystems | Beleuchtungseinrichtung für ein DUV-Mikroskop |
| JP2001074904A (ja) * | 1999-09-02 | 2001-03-23 | Canon Inc | 二波長反射防止膜 |
| JP4524877B2 (ja) * | 2000-07-17 | 2010-08-18 | コニカミノルタホールディングス株式会社 | 眼鏡用レンズ |
| JP2003279702A (ja) * | 2002-03-19 | 2003-10-02 | Olympus Optical Co Ltd | ２波長反射防止膜および該２波長反射防止膜を施した対物レンズ |
-
2001
- 2001-04-23 DE DE10119909A patent/DE10119909B4/de not_active Expired - Lifetime
-
2002
- 2002-03-22 WO PCT/EP2002/003217 patent/WO2002086579A1/de not_active Ceased
- 2002-03-22 EP EP02706779A patent/EP1381901A1/de not_active Withdrawn
- 2002-03-22 JP JP2002584048A patent/JP4012467B2/ja not_active Expired - Fee Related
- 2002-03-22 US US10/475,653 patent/US7274505B2/en not_active Expired - Lifetime
- 2002-03-28 TW TW091106133A patent/TW579434B/zh not_active IP Right Cessation
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN104335117B (zh) | 光学投影阵列曝光系统 | |
| JPWO2008069220A1 (ja) | 結像装置及び顕微鏡 | |
| JP2003050311A (ja) | 紫外線用の減衰フィルタ | |
| KR102542986B1 (ko) | 반사 굴절 렌즈 및 이러한 렌즈를 포함하는 광학 시스템 | |
| US6825976B2 (en) | Antireflection coating for ultraviolet light | |
| JP4012467B2 (ja) | 複数の波長領域のための検査顕微鏡、及び複数の波長領域のための検査顕微鏡のための減反射層 | |
| JP2004524585A5 (enExample) | ||
| US4145113A (en) | Color correcting interference filter | |
| US9594192B2 (en) | Optical element, optical system, and method of manufacturing optical element | |
| US20210349325A1 (en) | Beam splitter for achieving grazing incidence of light | |
| CN115128008A (zh) | 半导体显微检测的筒镜镜组及半导体显微检测系统 | |
| CN102918428B (zh) | 反射防止膜、透镜、光学系统、物镜以及光学设备 | |
| US6819498B1 (en) | Two-wavelength antireflection film and objective lens coated with two-wavelength antireflection film | |
| US20080165328A1 (en) | Projection apparatus | |
| JP2002311332A (ja) | 検査用顕微鏡およびそのための対物レンズ | |
| KR102825439B1 (ko) | Uv 파장대역의 광을 반사시키는 코팅막 및 그를 포함하는 결함 검사장치 | |
| US20250244568A1 (en) | Scanning reflective bright field microscope | |
| EP0183417A2 (en) | Optical element with antireflection coating, for use in microscopes | |
| JP2010020298A (ja) | 結像装置及び顕微鏡 | |
| Peres | Light and Lenses | |
| CN1828338A (zh) | 透镜 | |
| JP2024040468A (ja) | 装置および膜厚ムラ検査方法 | |
| KR20250145539A (ko) | 광학 소자 및 장치 | |
| Vollrath | Duv microscopy for wafer and mask inspection and metrology | |
| WO2014133951A2 (en) | Method and apparatus for producing a super-magnified wide-field image |