JP4012467B2 - 複数の波長領域のための検査顕微鏡、及び複数の波長領域のための検査顕微鏡のための減反射層 - Google Patents

複数の波長領域のための検査顕微鏡、及び複数の波長領域のための検査顕微鏡のための減反射層 Download PDF

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JP4012467B2
JP4012467B2 JP2002584048A JP2002584048A JP4012467B2 JP 4012467 B2 JP4012467 B2 JP 4012467B2 JP 2002584048 A JP2002584048 A JP 2002584048A JP 2002584048 A JP2002584048 A JP 2002584048A JP 4012467 B2 JP4012467 B2 JP 4012467B2
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layer
layers
reflection
mgf
reflection layer
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Japanese (ja)
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JP2004524585A5 (enExample
JP2004524585A (ja
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アイゼンクレーマー、フランク
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ライカ ミクロジュステムス ツェーエムエス ゲーエムベーハー
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/06—Means for illuminating specimens
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/0016—Technical microscopes, e.g. for inspection or measuring in industrial production processes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/16—Microscopes adapted for ultraviolet illumination ; Fluorescence microscopes

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Analytical Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Microscoopes, Condenser (AREA)
  • Surface Treatment Of Optical Elements (AREA)
JP2002584048A 2001-04-23 2002-03-22 複数の波長領域のための検査顕微鏡、及び複数の波長領域のための検査顕微鏡のための減反射層 Expired - Fee Related JP4012467B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10119909A DE10119909B4 (de) 2001-04-23 2001-04-23 Inspektionsmikroskop für den sichtbaren und ultravioletten Spektralbereich und Reflexionsminderungsschicht für den sichtbaren und ultravioletten Spektralbereich
PCT/EP2002/003217 WO2002086579A1 (de) 2001-04-23 2002-03-22 Inspektionsmikroskop für mehrere wellenlängenbereiche und reflexionsminderungsschicht für ein inspektionsmikroskop für mehrere wellenlängenbereiche

Publications (3)

Publication Number Publication Date
JP2004524585A JP2004524585A (ja) 2004-08-12
JP2004524585A5 JP2004524585A5 (enExample) 2005-12-22
JP4012467B2 true JP4012467B2 (ja) 2007-11-21

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JP2002584048A Expired - Fee Related JP4012467B2 (ja) 2001-04-23 2002-03-22 複数の波長領域のための検査顕微鏡、及び複数の波長領域のための検査顕微鏡のための減反射層

Country Status (6)

Country Link
US (1) US7274505B2 (enExample)
EP (1) EP1381901A1 (enExample)
JP (1) JP4012467B2 (enExample)
DE (1) DE10119909B4 (enExample)
TW (1) TW579434B (enExample)
WO (1) WO2002086579A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7019905B2 (en) * 2003-12-30 2006-03-28 3M Innovative Properties Company Multilayer reflector with suppression of high order reflections
DE102004025646A1 (de) * 2004-05-24 2005-12-22 Jenoptik Laser, Optik, Systeme Gmbh Hochreflektierender dielektrischer Spiegel und Verfahren zu dessen Herstellung
DE102004034845B4 (de) 2004-07-19 2006-05-18 Leica Microsystems Cms Gmbh Umschaltbares Mikroskop
WO2011119414A1 (en) * 2010-03-22 2011-09-29 Luxottica Us Holdings Corporation Ion beam assisted deposition of ophthalmic lens coatings
JP5603714B2 (ja) * 2010-09-02 2014-10-08 オリンパス株式会社 反射防止膜、レンズ、光学系、対物レンズ、及び光学機器
ES2808550T3 (es) * 2013-03-15 2021-03-01 Sensory Analytics Método y sistema para la medición en tiempo real durante el proceso del espesor de recubrimiento
US9733465B2 (en) * 2015-02-12 2017-08-15 The Penn State Research Foundation Waveguides for enhanced total internal reflection fluorescence microscopy

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3936136A (en) * 1970-12-29 1976-02-03 Nippon Kogaku K.K. Multilayer anti-reflection film for ultraviolet rays
US4960310A (en) * 1989-08-04 1990-10-02 Optical Corporation Of America Broad band nonreflective neutral density filter
JP3324780B2 (ja) * 1991-05-16 2002-09-17 オリンパス光学工業株式会社 紫外線顕微鏡
DE4219817A1 (de) * 1992-06-17 1993-12-23 Merck Patent Gmbh Aufdampfmaterial zur Herstellung mittelbrechender optischer Schichten
JP3224316B2 (ja) * 1993-09-07 2001-10-29 キヤノン株式会社 二波長反射防止膜
US5661596A (en) * 1994-02-03 1997-08-26 Canon Kabushiki Kaisha Antireflection film and exposure apparatus using the same
FR2750216B1 (fr) * 1996-06-21 1998-07-24 Commissariat Energie Atomique Empilement multicouche de materiaux fluorures, utilisable en optique et son procede de fabrication
US5911858A (en) * 1997-02-18 1999-06-15 Sandia Corporation Method for high-precision multi-layered thin film deposition for deep and extreme ultraviolet mirrors
US5937920A (en) * 1997-08-04 1999-08-17 Link Research & Development, Inc. Product dispensing system
US5960840A (en) * 1998-04-27 1999-10-05 Link Research And Development, Inc. Controlled product dispensing system
DE19831392A1 (de) 1998-07-14 2000-02-03 Leica Microsystems Zweibereichs-Reflexionsminderung für den sichtbaren Spektralbereich und einer Wellenlänge von: (248 +/- 15)NM
JP2000227504A (ja) 1999-02-05 2000-08-15 Minolta Co Ltd 反射防止膜
US6196522B1 (en) * 1999-04-02 2001-03-06 Ecolab, Inc. Geometric lockout coupler
DE19931954A1 (de) 1999-07-10 2001-01-11 Leica Microsystems Beleuchtungseinrichtung für ein DUV-Mikroskop
JP2001074904A (ja) * 1999-09-02 2001-03-23 Canon Inc 二波長反射防止膜
JP4524877B2 (ja) * 2000-07-17 2010-08-18 コニカミノルタホールディングス株式会社 眼鏡用レンズ
JP2003279702A (ja) * 2002-03-19 2003-10-02 Olympus Optical Co Ltd ２波長反射防止膜および該２波長反射防止膜を施した対物レンズ

Also Published As

Publication number Publication date
EP1381901A1 (de) 2004-01-21
US7274505B2 (en) 2007-09-25
JP2004524585A (ja) 2004-08-12
DE10119909A1 (de) 2002-10-31
US20040145803A1 (en) 2004-07-29
TW579434B (en) 2004-03-11
DE10119909B4 (de) 2005-04-21
WO2002086579A1 (de) 2002-10-31

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