TW546235B - Substrate processing apparatus - Google Patents
Substrate processing apparatus Download PDFInfo
- Publication number
- TW546235B TW546235B TW091119368A TW91119368A TW546235B TW 546235 B TW546235 B TW 546235B TW 091119368 A TW091119368 A TW 091119368A TW 91119368 A TW91119368 A TW 91119368A TW 546235 B TW546235 B TW 546235B
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- roller
- conveying
- rollers
- pressing
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Robotics (AREA)
- Cleaning In General (AREA)
- Rollers For Roller Conveyors For Transfer (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Supply And Installment Of Electrical Components (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001279200A JP3926593B2 (ja) | 2001-09-14 | 2001-09-14 | 基板処理装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW546235B true TW546235B (en) | 2003-08-11 |
Family
ID=19103436
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW091119368A TW546235B (en) | 2001-09-14 | 2002-08-27 | Substrate processing apparatus |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP3926593B2 (ko) |
KR (1) | KR100484061B1 (ko) |
TW (1) | TW546235B (ko) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI386354B (zh) * | 2003-10-17 | 2013-02-21 | Olympus Corp | 基板搬送裝置 |
CN110312374A (zh) * | 2018-03-20 | 2019-10-08 | 奥宝科技股份有限公司 | 碎屑移除系统、光学处理系统、空气刀及移除碎屑的方法 |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10358149B3 (de) * | 2003-12-10 | 2005-05-12 | Höllmüller Maschinenbau GmbH | Verfahren und Vorrichtung zum berührungslosen Behandeln von ebenem Gut in Durchlaufanlagen |
DE10358147C5 (de) * | 2003-12-10 | 2007-11-22 | Höllmüller Maschinenbau GmbH | Verfahren und Vorrichtung zum Behandeln von ebenem Gut in Durchlaufanlagen |
JP4789446B2 (ja) * | 2004-09-27 | 2011-10-12 | 芝浦メカトロニクス株式会社 | 基板の処理装置 |
JP5110367B2 (ja) * | 2007-12-27 | 2012-12-26 | 日立化成工業株式会社 | 水平搬送型表面処理装置 |
TWI462215B (zh) * | 2010-03-29 | 2014-11-21 | Dainippon Screen Mfg | 基板處理裝置、轉換方法、及轉移方法 |
US10098269B2 (en) | 2010-04-29 | 2018-10-09 | Fuji Machine Mfg. Co., Ltd. | Manufacture work machine for controlling a plurality of work-element performing apparatuses by central control device |
JP5750235B2 (ja) | 2010-04-29 | 2015-07-15 | 富士機械製造株式会社 | 製造作業機 |
KR101707929B1 (ko) * | 2012-10-04 | 2017-02-17 | 히라따기꼬오 가부시키가이샤 | 반송 시스템 및 제어 방법 |
JP6315547B2 (ja) * | 2013-12-17 | 2018-04-25 | 芝浦メカトロニクス株式会社 | 基板処理装置 |
JP5833172B2 (ja) * | 2014-04-15 | 2015-12-16 | 富士機械製造株式会社 | 製造作業機 |
JP7198039B2 (ja) * | 2018-10-22 | 2022-12-28 | 株式会社Screenフェバックス | 基板搬送装置およびこの基板搬送装置を備えた基板処理装置 |
JP2024034527A (ja) * | 2022-08-31 | 2024-03-13 | ファスフォードテクノロジ株式会社 | 半導体製造装置および半導体装置の製造方法 |
CN115535519A (zh) * | 2022-09-21 | 2022-12-30 | 漳州市百事得家具有限公司 | 一种应用于定制家具生产的智能柔性封边生产线 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09232268A (ja) * | 1996-02-19 | 1997-09-05 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
JP3388988B2 (ja) * | 1996-03-18 | 2003-03-24 | 大日本スクリーン製造株式会社 | 基板処理装置 |
-
2001
- 2001-09-14 JP JP2001279200A patent/JP3926593B2/ja not_active Expired - Lifetime
-
2002
- 2002-08-12 KR KR10-2002-0047452A patent/KR100484061B1/ko active IP Right Grant
- 2002-08-27 TW TW091119368A patent/TW546235B/zh not_active IP Right Cessation
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI386354B (zh) * | 2003-10-17 | 2013-02-21 | Olympus Corp | 基板搬送裝置 |
CN110312374A (zh) * | 2018-03-20 | 2019-10-08 | 奥宝科技股份有限公司 | 碎屑移除系统、光学处理系统、空气刀及移除碎屑的方法 |
CN110312374B (zh) * | 2018-03-20 | 2024-05-14 | 奥宝科技有限公司 | 碎屑移除系统、光学处理系统、空气刀及移除碎屑的方法 |
Also Published As
Publication number | Publication date |
---|---|
KR20030023475A (ko) | 2003-03-19 |
KR100484061B1 (ko) | 2005-04-19 |
JP3926593B2 (ja) | 2007-06-06 |
JP2003086654A (ja) | 2003-03-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
GD4A | Issue of patent certificate for granted invention patent | ||
MM4A | Annulment or lapse of patent due to non-payment of fees |