TW503481B - Method of forming a pre-metal dielectric film on a semiconductor substrate - Google Patents

Method of forming a pre-metal dielectric film on a semiconductor substrate Download PDF

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TW503481B
TW503481B TW090120646A TW90120646A TW503481B TW 503481 B TW503481 B TW 503481B TW 090120646 A TW090120646 A TW 090120646A TW 90120646 A TW90120646 A TW 90120646A TW 503481 B TW503481 B TW 503481B
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thin film
layer
ozone
patent application
film layer
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Amit S Kelkar
Michael D Whiteman
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Atmel Corp
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    • H—ELECTRICITY
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    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
    • H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
    • H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
    • H01L21/02126—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements, e.g. SiOC, SiOC:H or SiONC
    • H01L21/02129—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements, e.g. SiOC, SiOC:H or SiONC the material being boron or phosphorus doped silicon oxides, e.g. BPSG, BSG or PSG
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    • H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
    • H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
    • H01L21/02164—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material being a silicon oxide, e.g. SiO2
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    • H01L21/022—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being a laminate, i.e. composed of sublayers, e.g. stacks of alternating high-k metal oxides
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    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/314—Inorganic layers
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    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/314—Inorganic layers
    • H01L21/316—Inorganic layers composed of oxides or glassy oxides or oxide based glass
    • H01L21/31604—Deposition from a gas or vapour
    • H01L21/31625—Deposition of boron or phosphorus doped silicon oxide, e.g. BSG, PSG, BPSG
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    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
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    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
    • H01L21/02263—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
    • H01L21/02271—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
    • H01L21/02274—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition in the presence of a plasma [PECVD]
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    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H01L21/31051—Planarisation of the insulating layers

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Description

五、發明說明（1) 頁域 本發明與半導體制。 基板上形成介電所t私有關，更特別是有關於，在半導體 半導體元件。貝溥膜之方法以及形成具此介電質薄膜之
_矽導 般係 為一層 摻雜襯裡氧化 擴散至基板5 2 利用BPSG膜 及再流動性質 的，並期望可 引入之雜質。 =路裝置之形成中，纟平面製程中常需在 於火表面擴散層及多晶矽導體。一或多層 、1石夕基板表面’並將金屬配線導體形成於 ^ 中’俾互相連接在石夕基板表面上的各式 期望之積體電路。 ^屬化製程之前，將介電質薄膜沈積於基板 =良好的移動離子汲取性質，以及具有良好 來充性貪。一種在先前技術中廣泛使用之隔 饵矽酸鹽（BPSG)。參閱圖5，在先前技術 且未掺雜襯裡氧化物5 8沉積於具有複數個多 矽基板表面5 2。此薄且未摻雜襯裡氧化物5 8 =烧（Si Η」與氧反應來形成，並且該層接著 璃，諸如一層BPSG 56，如上述。此薄且未 物58之目的在避免包含於卯別膜56之磷或硼 之擴散層。 做為内層介電質薄膜之目的係基於汲取性質 。介電質薄膜具有良好汲取性質為不可或缺 有效地沒取以移除任何在晶圓製造製程期間 介電質薄膜具有良好的再流動性也很重要，
第5頁 503481 五、發明說明（2) ^ ~ 俾能充分填充在矽基板表面上生成的多晶矽導體間之縫 隙。此品質有時稱之為具有良好的，，隙填充”或良好的，， 段覆蓋”。 在先前技術中，BPSG薄膜層一般係以四乙基正矽酸鹽化 物（TE0S)與臭氧（〇3)在磷化氫(ρ%)與二硼化氫(n)存在 了反應來形成。在本文中，吾人將臭氧與7£：〇8稱之為π臭 氧/ TE0S"或”臭氧與TE〇s”。已摻雜BpsG膜具有重約百分 之四至=的硼，以及重約百分之四至八的磷。藉由加入上 述=多^的石朋與磷，Si〇2的軟化點可降至約875-9〇〇 t。 接著在高溫下（諸如875 —9〇〇。(：）採行再流動步驟，將摻 玻璃軟化並使其流至基板的裂缝與缝隙中，俾形成具 隙填充品質之預金屬介電質薄膜。但應注意高度摻雜之 =Ϊ Ϊ不具備良好的沉積隙填充性質。*其再流動於高 隙：軚化點的溫度後’僅能完全填充多晶矽導體間的缝 為期=者7件幾何尺寸之持續縮減，在高溫下再流動 :中::二:係因為η-與…雜物之增強擴散於石夕Ϊ 在陟取雷F、Κ政會導致裝置之電參數的非預期偏移，諸如 度摻雜之BPSr勝么4 > 又…、问/皿再/瓜動’則高 合^ t 膜無法充分填充縫隙。摻雜材質如硼盎硝脾 圖5所示，”遒無法充分做隙填充。如 生。在接在多晶石夕導體54間的bps"56中發 在接d經由介電質薄膜蝕刻接點， 化製程中以故姑士士 从汉社俊續的金屬 中Μ鎢填充時，上述的鶴係以化學蒸氣沉積法
90120646.ptd 第6頁 503481 五、發明說明（3) (CVD)沉積而得，並充入空隙中，導致相鄰接點間形成殘 餘金屬或π縱標。並導致相鄰接點間的非預期電短路 得半導體裝置故障。因此’需要具良好隙填充特性且無J 高溫再流動之預金屬化介電質薄膜。 ' 在先前技術中原企圖產生具良好隙填充性之内層介電f 薄膜，其包括Murao在美國專利第5，5 1 8, 962號所揭之半導 體裝置，其形成於以未摻雜C V D石夕氧化物膜塗覆之基板表 面區域，以及在矽氧化物膜上形成的内層隔絕膜，其係^ 一層第一未摻雜臭氧-TE0S之石夕化物玻璃（nsg)膜、一層 BPSG膜，以及一層第二臭氧—TE〇s NSG膜所組成。此外曰， Bicker等人之美國專利第5, 869, 4 〇3與5, 9以，237號中描述 一種半導體製程方法，其在與基板接點區相鄰之基板中形 : Γ孔’在其中進行電連結。在較佳具體例中，由 #八i愛形成5第一氧化物層在基板上形成，以至少覆蓋 化i層點區’並在第一氧化物層上形成BPSG製成的第二氧 號中；^揭fLee等人之美國專利第5, 166, 101與5, 354, 387 驟製程形I:組合的BPSG隔絕層與平坦層，其係藉由兩步 程包括第二2半&體晶圓之崎①區表面上。此兩步驟沉積製 以TE0S做為=驟’係為藉由利用填與石朋掺雜物之氣態源並 層；以及第砂之來源的CVD沈積，來形成無空隙之BPSG 本發明之二步驟為形成肿^之罩層。 成方法，其特f的在提供一種預金屬中階介電質薄膜的形 充特性。 為具良好活動離子汲取能力並具良好隙填
90120646.ptd 第7頁 503481 五、發明說明（4) 本發明之另一目的在提供一種 >、 ^ ........... 形成方法，其具有良好且無須仰賴高溫再流動製程之沉積 隙填充特性。 發明之槪¥ 預金屬中階介電質薄膜的 ----〜已由具良好沉積隙填充特性以及良好汲取能力 之預金屬介電質薄膜形成方法來實現。本方法包含首先沉 積一層具有無空隙隙填充特性之未换#鬲臭氧之二氧化石夕 膜，接著沉積具汲取能力之摻雜低臭氧之BPSG膜。這兩層 隔絕膜提供可充分填充小或窄線間的縫隙，而無需犧牲良 好活動離子沒取能力。先前技術之隔纟巴膜傾向於提供良好 隙填充或良好汲取之一而非兩|兼顧’或是先前技術薄膜 需以多層實現所欲性質。 未摻雜二氧化矽之薄膜具有至少為15比1之高臭氧/TE0S 體積比，可與一般具有例如為1 0比1之低臭氧/TE0S體積比 的先前技術之摻雜BpsG膜進行比較。藉由形成具高臭氧 /TE0S比之膜，TE〇s—二聚物之表面活動率增加，使得該膜 f f較佳的流動特性。反應物會迅速在表面上擴散，因此 哥侍具最低能量之區域。而造成無空隙之介電質薄膜 面。 ^ 接著經加熱處理使薄膜緊， 軟化薄膜與使薄M、☆私^ ^ ~ ™升如无刖技術所為之 下進行，可避免上述在較小尺以在較低溫 關之擴散問題發生。最後，第 ，人南溫熱處理有 面化而平面化。本發明之方法；B:s:層上方經化學機械平 忐了用於形成半導體元件， 上述目的
梭S·
五、發明說明（5) 了用以形成1ή 成多晶石夕匯i排：i填充或崎啦披覆的結構，諸如形 具體例 參閱圖1 ，石々其也！ 〇 θ丄 各式晶圓製Γ步；：；；明之方法前，，基板12已歷經 體，以及電P且盘^ — A ; 土板上形成各式二極體、電晶 方式，在2 「件。此係以在此技術中廣為人知之 技術中已知古·ν加入摻雜物為之。多晶矽導體14亦係以此 間為間隙二成於基板上表面。在各個多晶矽導體14 ，、’/、而以電絕緣介電質薄膜填充。 半i，^2/ 一層未播雜高臭氧之二氧化石夕膜20係沉積於 ΐ = ，晶彻14之上。此未推雜高丄 隙]R。赞復ί夕晶矽導體14，並填充多晶矽導體14間之間 ^ \薄膜層20之厚度不低於l〇〇nm且不高於4〇〇nm。 ’專膜層之臭氧濃度不低於120g/m3且不高於 二〇g/m3。此第一薄膜層2〇並未摻雜硼或磷，俾使苴最可 =顯，如沉積隙填充。第一薄膜層2〇之一特性在於、薄膜之 :，乳/TE0S體積比。在先前技術中，一般使用之薄膜的 六、虱/TE0S比約為1〇比！。在本發明中，臭氧/TE〇s比高於 1 5比1，較佳約為η比！。較高的臭氧比可增進二聚 ，之形成，其係兩種單體之組合，具有高表面流動性。此 局f面移動性形成完全表面反應，不僅限於氣相反應。由 於70全表面反應之形成，離子可於表面移動並找到能量最 低處。導致表面移動性變高以及該膜具有似流動特性。由
五、發明說明（6)
^反應物易於在表面擴散，該膜在多晶矽導體間充分且— 王填充咼方位比間隙，而不殘留任何空隙與裂縫。 *參閱圖3，一層摻雜低臭氧之卯別膜3〇沉積於二 ，20之上。第二薄膜層3〇的厚度不低於5〇〇四。抑別膜之 =度夠厚是不y或缺的，俾於後續平面化時，使得BpsG膜 小厚度足以覆蓋整個元件。平面化後之BpsG膜最佳厚度至 2 20 0,。因此-般介電質薄膜之厚度包括不高於3〇; 二^一薄膜層，未摻雜二氧化矽膜2〇，以及至少7〇 %的第 〜薄膜層，BPSG膜30。BPSG膜30的臭氧濃度不少於 qg/m3，但不高K100g/m3。卯別膜内的硼重量百分比一般 ，圍自0至4 % ，並且此膜之磷重量百分比不超過6 %而一 ，範圍自4至6% 〇BPSG膜30具有半導體元件所需之移動離 子汲取功能。 接著，具有形成於頂面之兩層2〇與3〇之基板12於溫度不 ，過85 0 C下>進行熱處理。理想上，熱處理溫度約為7〇〇 C，俾使其咼至足以提供適量之再流動，但低至當元件具 小元件尺寸時，亦不影響元件特性。如上述，由於由二氧 化石夕20層與BPSG膜30層組成之介電層具有良好沉積隙填充 特性，故该膜無需在高溫下退火。退火係用以使膜緊密， 而非使膜軟化與流動。在本發明中，退火溫度係在7〇Q它 至8 0 0 °C間，俾獲得夠密實之預金屬介電質薄膜，以符合 製造接點蝕刻外型與蝕刻速率所需。 參閱圖4，利用任何已知平面化技術，將上介電質薄膜 面化。如上述，平面化後 層30平面化，其包括化學機械平
90120646.ptd 第10頁
之上BPSG層至少厚2GGnm ’俾使其^ 沒取。如此完成之石夕基板現在即可進行金屬化製和動離子 金屬經介電質薄膜進行沉積， ，、中 相連、、、口在矽基板中形成之部件雕 ，、互 所欲之電路。i述之介電質薄；成Κ::片上實現 在半導體膜層上使用，且不= ”途不限於 :適=在形成於基板上之兩或多層多晶石夕：其 :”"ΐΐίί!件下提供隔絕層。其中其對隔絕層：-% 好隙填充性更為關鍵。 9 <具良 立件編號說明 12 碎基板 14 16 多晶矽導體 間隙 20 未摻雜高臭氧之二氧化矽膜 30 摻雜低臭氧之BPSG膜 52 矽基板表面 5 4 多晶矽導體 56 BPSG 膜 58 60
薄且未摻雜襯裡氧化物（BPSG) 空隙
503481 圖式簡單說明 圖1係具複數個多晶矽導體之半導體基板橫剖面圖。 圖2-4係為顯示依本發明之方法在圖1之半導體基板上形 成介電質薄膜的步驟之橫剖面圖。 圖5係為在先前技術中已知的半導體基板上形成典型的 介電質薄膜之橫剖面圖。
90120646.pid 第12頁

Claims (1)

  1. 503481 六、申請專利範圍 1· 一種在半導體基板上形成介電質薄膜之方法，其包 括： 沉積一第一層未摻雜臭氧及TE0S膜於半導體基板上，於 半導體基板具有複數個多晶矽導體在其頂面上，該第一層 薄膜具有至少為15比1之臭氧對TE0S之體積比； 曰 沉積第二層摻雜低臭氧之BPSG膜於第一層薄膜上； 對第一及第二薄膜層施予熱處理；以及 ' 弟一薄膜層進行平面化，使得在多晶石夕導體上之第二声 厚度至少為20 0nm。 θ 2 ·如申請專利範圍第1項之方法 度範圍為lOOnm至400nm。 3·如申請專利範圍第1項之方法 度至少為500nm。 4 ·如申請專利範圍第1項之方法 溫度至少為7 0 0 °C。 5 ·如申請專利範圍第1項之方法 硼重量百分比範圍自〇至4 % 。 6 ·如申請專利範圍第1項之方法 磷重量百分比不高於6 % 。 7 ·如申請專利範圍第1項之方法 臭氧濃度範圍自120g/m3至140g/m3。 8 · —種在半導體基板上形成介電質薄 括： 沉積一第-層未摻雜臭氧及丽膜於半導體基板上，膜 其中’第一薄膜層厚 其中’第二薄膜層厚 其中 其中 施行之熱處理 第二薄膜層之 其中’第二薄膜層之 其中 第一薄膜層之 膜之方法，其包
    503481 六、申請專利範圍 的第層厚度範圍自100㈣至400 nm ’並且苴中第一薄膜層 之臭氧對TE0S體積比至少為15比1 ; 八 、 “沉積第二層摻雜低臭氧之BPSG膜於第_薄膜層上，第二 薄膜層厚度至少為5 00nm，硼重量百分比 自0 磷重量百分比範圍自4至6 % ; 對第一及第二薄膜層施予熱處理；以及 平面化第二薄膜層。 施行之熱處理 施行之熱處理 半導體基板具 9 ·如申請專利範圍第8項之方法，其中 溫度至少為7 0 0 °C。 10·如申請專利範圍第9項之方法，其中 溫度低於8 0 0 °C。 11 ·如申請專利範圍第9項之方法，其中 丨γ肌少队一 複數個多晶石夕導體於其頂面上，以及其中在多晶矽導體上 經平面化之第二薄膜層的厚度至少為2〇〇nm。 12· —種半導體裝置之形成方法，其包括： 在矽基板表面上形成擴散層及多晶梦導體； ^積一第一層未摻雜臭氧及TE〇s膜於半導體基板上， 一薄膜層之臭氧/TEOS體積比至少為15比丨，以 弟 自lOOnm至400nm ; 久厚度範圍 沉積第二層摻雜低臭氧之BPSG膜於第一薄膜 薄膜層厚度至少為5〇〇nm ; 、_上’第二 平面化第二薄膜層，使其在多晶矽導體上 20 0nm ； &至少為 形成穿透第一及第二薄膜層之開孔，露 路出母一擴散層
    503481 六、申請專利範圍 與多晶矽導體的一部分；以及 形成在第一及第二薄膜層之配線導體，配線導體經開孔 電連結至擴散層及多晶矽導體。 1 3.如申請專利範圍第1 2項之方法，其中，施行之熱處 理溫度不高於85 0 t：。 1 4.如申請專利範圍第1 2項之方法，其中，第二薄膜層 之硼重量百分比範圍自0至4 % 。 1 5.如申請專利範圍第1 2項之方法，其中，第二薄膜層 之磷重量百分比不高於6 % 。 1 6.如申請專利範圍第1 2項之方法，其中，第一薄膜層 之臭氧濃度範圍自120g/m3至140g/m3。 1 7. —種在一對多晶矽匯流排上形成隔絕層之方法，其 包括： 沉積一第一層未摻雜臭氧及TE0S膜於一對多晶矽匯流排 上，第一薄膜層之臭氧對TE0S體積比至少為15比1 ; 沉積第二層摻雜低臭氧之BPSG膜於第一薄膜層上，第二 薄膜層厚度至少為500nm，硼重量百分比範圍自0至4 % ， 以及磷重量百分比不高於6 % ; 對第一及第二薄膜層施予熱處理；以及 平面化第二薄膜層，使得在該對多晶矽匯流排上之第二 層厚度至少為200nm。
    90120646.ptd 第15頁
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