TW480635B - Gold wire for semiconductor element bonding - Google Patents
Gold wire for semiconductor element bonding Download PDFInfo
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- TW480635B TW480635B TW090104260A TW90104260A TW480635B TW 480635 B TW480635 B TW 480635B TW 090104260 A TW090104260 A TW 090104260A TW 90104260 A TW90104260 A TW 90104260A TW 480635 B TW480635 B TW 480635B
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- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 title claims abstract description 38
- 239000004065 semiconductor Substances 0.000 title claims abstract description 23
- 239000010931 gold Substances 0.000 claims abstract description 13
- 239000012535 impurity Substances 0.000 claims abstract description 5
- 229910052709 silver Inorganic materials 0.000 claims description 27
- 239000004332 silver Substances 0.000 claims description 27
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 26
- 229910052790 beryllium Inorganic materials 0.000 claims description 20
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 claims description 20
- 229910052746 lanthanum Inorganic materials 0.000 claims description 18
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 claims description 18
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims description 16
- 229910052791 calcium Inorganic materials 0.000 claims description 16
- 239000011575 calcium Substances 0.000 claims description 16
- 229910052737 gold Inorganic materials 0.000 claims description 12
- 229910052697 platinum Inorganic materials 0.000 claims description 12
- 238000005304 joining Methods 0.000 claims description 6
- 230000002079 cooperative effect Effects 0.000 claims description 5
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 26
- 238000012360 testing method Methods 0.000 description 21
- 229910052727 yttrium Inorganic materials 0.000 description 13
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 13
- 239000000203 mixture Substances 0.000 description 12
- 238000000034 method Methods 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 5
- 229910052702 rhenium Inorganic materials 0.000 description 5
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 5
- 229910001020 Au alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000003353 gold alloy Substances 0.000 description 4
- 229910052762 osmium Inorganic materials 0.000 description 4
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 4
- ZSLUVFAKFWKJRC-IGMARMGPSA-N 232Th Chemical compound [232Th] ZSLUVFAKFWKJRC-IGMARMGPSA-N 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 3
- 229910052776 Thorium Inorganic materials 0.000 description 3
- 238000000137 annealing Methods 0.000 description 3
- -1 lanthanum osmium calcium Chemical compound 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910052691 Erbium Inorganic materials 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- UYAHIZSMUZPPFV-UHFFFAOYSA-N erbium Chemical compound [Er] UYAHIZSMUZPPFV-UHFFFAOYSA-N 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 238000005482 strain hardening Methods 0.000 description 2
- 229910052778 Plutonium Inorganic materials 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 230000001050 lubricating effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- OYEHPCDNVJXUIW-UHFFFAOYSA-N plutonium atom Chemical compound [Pu] OYEHPCDNVJXUIW-UHFFFAOYSA-N 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- 238000005491 wire drawing Methods 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
Classifications
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Description
480635 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明説明(1 ). 發明背景 1·發明領域 本發明係有關一種接合半導體元件用之金質導線,其 用於半導體元件之電極與外部引線間之電連結,特別本發明 係有關一種即使用於外部引線側之加壓接合時仍可滿意地使 用、於需要時可藉低壓接合達成半導體元件之接合用之金質導線。 2·相關技術說明 封裝半導體裝置時,半導體元件電極與外部引線間之 互連或接合目前係藉基於廣為人使用的使用金質導線之「球 接3」方法藉佈線方法形成互連或接合。此種方法通常涉及 藉熱壓接合或超音波輔助熱壓接合作為加壓接合至半導體元 件電極之手段而形成佈線。 第1A-1D圖顯示用於互連及回路形成之超音波輔助熱壓 接合,其中1為毛細管,2為金質導線,3為炬電極,4為金屬 球,5為紹電極,6為半導體元件,7為夾具以及8為引線。 晚近半導體裝置之製法中,’於回路形成過程期間,球 頸部係於回路形成方向之反向強迫彎曲俾穩定前述回路形狀 而變形之,然後實際形成最終回路,如此藉「逆變形」而形 成回路。夕種半導體裝置由於受操作電路或外部環境加熱 使用時暴路於*溫下。因此尋求藉此方式藉逆變形而形成㈡ 路之後,即使暴露於苛刻的熱週期環境下仍可讓導線斷裂減 至最低。 本專利公開案平第8-3 16262號、日本專利公開案平第 而 回 (請先閱讀背面之注意事項再填寫本頁) 訂
480635 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明説明(2 ) 9-36162號及日本專利公開案平第11-214425號中,本案申請 人已經揭示經由使用具有規定組成之金質導線作為回路形成 之金質導線可獲得前述預定效果。 雖然此專&議&供暴露於熱週期環境時減少導線斷裂 的結果,但近年來使用環境逐漸變苛刻,結果導致要求互連 線或接線即使暴露於更苛刻的熱週期環境下仍可忍受導線不 會斷裂。此外,前述各公開案中增加元件量來增加防止導線 斷裂發現可能造成電阻增大的缺點。此外,於操作長的回路 時須維持回路鬲度面,隨著接腳數目的增加近來已經採用於 高回路。 於第1A-1D圖之第二側接面(後文也稱做引線8側接面), 南壓接合可能導致失誤例如高回路形狀塌陷,因此需要使用 低壓接合。但低壓接合造成接面強度低的問題。因此高回路 佈線之預定目的係改良接面強度,即使於第二側接面使用低 壓接合時亦如此,同時維持高回路形狀。發明人嘗試製造可 滿足此等性質的金質導線,但抗拉強度不足。 鑑於先前技術之此等情況,提供一種半導體元件接合 用之金質導線而達成本發明之一目的,其中元素添加總量係 不大於1 OOppm質量比俾維持低電阻,首先,允許逆變形俾 於回路形成後即使暴露於苛刻的熱週期環境下仍可讓導線斷 裂減至最低;第二,允許於規定高度形成高回路;第三,即 使於第二側接面藉低壓接合仍可維持接面強度高於規定值俾 維持高回路形狀;以及第四,也允許維持高抗拉強度。 發明概述 本紙張尺度朗中國國家標準(CNS ) A4規格(21()χ297公楚) ---------批衣------II------0 (請先閱讀背面之注意事項再填寫本頁) 480635 A7 B7 五、發明説明(3 ) 為了達成前述目的,本發明提供一種接合半導體元件 用之金質導線,其包含ll-20ppm質量比銀,i_9ppm質量比 鉑,l-15ppm質量比釔,l-15ppm質量比鑭及i-i5ppm質量比 銪,帶有l-20ppm質量比鈣及l-10ppm質量比皱之任一者或 二者,前述各元素之總量係不大於lOOppm質量比,差額為 金及無法避免的雜質。 也提供使用前述金質導線做半導體元件與引線之接線 之方法。 圖式之簡單說明 第1A至1D圖為一組說明圖,顯示使用金質導線藉超音 波輔助半導體元件電極與外部引線間的熱壓接合之方法。 發明之具體實施例 ⑴組成 a) 原料金 使用之原料金較佳為已經純化至至少99.99%重量比之 高純度金。純度更佳至少99.995%重量比以及最佳至少 99.999%重量比。以較高純度金為較佳,原因在於其可將有 害組分的影響減至最低。 b) [銀] 當用於本發明之金質合金引線含有規定量之鉑、釔、 鑭、銪及鈣或鈹時,前述目的可以n _20ppm質量比銀含量 達成。 不似銀含量低於1 lppm質量比,如此即使於熱週期測試 後仍可改良抗斷裂強度且允許維持高抗拉強度。不似銀含量 本紙張尺度適用中國國家標準(CNS ) A4規格(21〇χ297公釐) (請先閱讀背面之注意事項再填寫本頁) 訂 經濟部智慧財產局員工消費合作社印製 480635 A7 B7 經濟部智慧財產局R工消費合作社印製 五、發明説明(4 ) · 大於20ppm質量比時,如此也大為改良低壓接合時之第二側 抗撕強度’同時也允許維持高抗拉強度。因此於規定量之始 專存在時’銀含量限於11 -2Oppm質量比。 c) [始] 當用於本發明之合金金質導線含有規定量之銀、釔、 鑭、銪及#5或鈹時,前述目的可以l_9ppm質量比鉑含量達 成。 不似當链含量低於1 ppm質量比時,如此改良熱週期測 試後之抗斷裂強度且允許維持高抗拉強度。不似鉑含量大於 9ppm質量比時,如此也大為改良低壓接合時之第二側抗撕 強度,同時也允許維持高抗拉強度。因此當有規定量之銀等 存在時’齡含量限於1 ·9ρρπι質量比。 d) [紀] 當用於本發明之合金金質導線含有規定量之銀、鉑、 鑭、銪及鈣或鈹時,前述目的可以卜15ppm質量比釔含量達 成。 不似當釔含量低於lppm質量比時,如此改良熱週期測 試後之抗斷裂強度也允許維持高抗拉強度。不似釔含量大於 15ppm質量比時,如此也允許回路高度增高,同時大為改良 低壓接合時的第二側抗撕強度。 當於規定量之銀等存在時,因而釔含量係限於l-15ppm 質量比。 e) [鑭] 當用於本發明之合金金質導線含有規定量之銀、鉑、 本紙張尺度適用中國國家標準(CNS ) Α4規格(210X297公釐) (請先閲讀背面之注意事項再填寫本頁) •裝
、1T 線 480635 經濟部智慧財產局員工消費合作社印製 A7 _____B7_ 五、發明説明(5 ) 在乙、銪及妈或鈹時,前述目的可以1-15ppm質量比鋼含量達 成。 不似鑭含量低於lppm質量比時,如此改良熱週期測試 後之抗斷裂強度且允許維持高抗拉強度。不似鑭含量大於 15ppm質量比時,如此也允許回路高度增高,同時大為改良 低壓接合時的第二側抗撕強度以及允許維持高抗拉強度。 因此於規定量之銀等存在時,鑭含量係限於1_15沖〇1質 量比。 f) [銪] 當用於本發明之合金金質導線含有規定量之銀、鉑、 在乙、鑭及鈣或鈹時,前述目的可以質量比銪含量達 成。 不似銪含量低於lppm質量比時,如此改良熱週期測試 後之抗斷裂強度且允許維持高抗拉強度。不似銪含量大於 15ppm質量比時,如此也允許回路高度增高,同時大為改良 低壓接合時的第二側抗撕強度以及允許維持高抗拉強度。 因此於規疋篁之銀專存在時,銪含量係限於1·1 質 量比。 g) [鈣、鈹] 當用於本發明之合金金質導線含有規定量之銀、鉑、 纪、鋼及銪時,前述目的可以鈣含量K2〇ppm質量比及鈹含 量l-10ppm質量比中之任一者或二者達成。 不似當#5及鈹含量低於lpprn質量比時,如此改良熱週 期測試後之抗斷裂強度且允許維持高抗拉強度。不似當鈣含 本紙張尺度適用中國國家標準(CNS ) Μϋ^1〇'χ297&4 -- (請先閱讀背面之注意事項再填寫本頁) 480635 經濟部智慧財產局崑工消費合作社印製 A7 B7 五、發明説明(6 ) 量大於20ppm質量比或鈹含量大於i〇ppm質量比時,如此也 允许回路南度增南,同時大為改良低壓接合時的第二側抗撕 強度以及允許維持高抗拉強度。 因此當有規定量之銀等存在時,鈣含量及鈹含量之任 一者或二者分別係限K1_2〇ppm質量比及1_10ppmf量比。 (2) 金質導線製法 現在說明製造用於本發明之半導體元件之金質導線之 方法實例。於首先熔化具有規定組成之金屬且澆鑄成為鑄錠 之後,使用凹槽型滾軋機滾軋,然後使用中間退火,最終藉 冷加工製成直徑1(M00微米之細導線,隨後接受最終退火, 因而導線具有伸長率4-6%,以及導線表面塗覆以潤滑防鏽 劑。然後完全加工後的導線於規定張力下再度以外直徑5〇 3 毫米之捲軸捲曲至規定長度而準備終製品。使用的規定的長 度為100-3000米,但常見甚至更長長度。 (3) 用途 本發明之金質導線係用於半導體元件電極與外部引線 間的接合,接合方法通常為根據球接合法之接線及互連如 第1A-1D圖所示。較佳用於所謂的「高回路」,其中如第⑴ 圖所示導線2,為高。現在參照第以請圖說明藉球接合方 法接合之方法。 如第1A圖所示,金f導線2穿過毛細管卜電炬3係位在 導線2梢端對側且形成放電到達金質導線2,如此加熱金質導 線2梢端且熔化導線而形成球4。 其次如第1B圖所示,毛细普】 七、、、田& 1下降用於加壓接合至半導 本紙張尺度適用中國國家標準(CNS ) A4規 ---------裝 訂 線 (請先閲讀背面之注意事項再填寫本頁) 9 480635 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明説明(7 ) 體元件6上的鋁電極5。此處,超音波振動(圖中未顯示)於半 導體元件6使用加熱器方塊加熱時通過毛細管丨且施加於半導 體元件’故球4被熱壓接合,變成加壓接合球4,。 其次如第1C圖所示,毛細管丨遵照規定的彈道移動且下 降至外引線8。當外引線8使用加熱器方塊加熱時,超音波振 動(圖中未顯示)通過毛細管1且施加於外引線,故金質導線2 表面被熱壓接合至外引線8。 最後如第1D圖所示,夾具7升高而夾緊金質導線2,如 此切斷金質導線2且完成佈線。然後佈線剖面使用樹脂密封 而完成半導體裝置。 實例 實例1 於添加規定量之銀、鉑、紀、鋼、銪、鈣及鈹至具有 純度99.999%重量比或以上之高純度金且於真空熔爐熔化混 合物後,澆鑄而形成具有表1所示組成之金質合金鑄錠;使 用凹槽輥及線拉伸機器接受冷加工然後接受中間退火以及最 終冷加工獲得直徑25微米,於最終退火至導線伸長率4%後 ’導線表面塗覆以潤滑劑及完成金質合金導線。 (測量方法) (1) 熱週期測試後之導線斷裂 试驗材料用作為接線用於使用高速自動接線機進行超 音波熱壓接合至1C晶片電極。於使用超音波輸出〇,丨96瓦及 負載0.49牛頓進行球接合後,毛細管首先於回路形成方向之 反向移動,反向角度設定為於垂直夾角6〇度,球頸部被強迫 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公董) (請先閲讀背面之注意事項再填寫本頁}
10 480635 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明説明(8 ). ’考曲變形而形成且維持内翹曲,然後接合至外部引線而形成 常規回路(佈線)。對各個1C晶片共形成2〇〇接腳佈線。佈線 試樣使用樹脂密封然後接受2〇〇〇次最大苛刻度熱週期測試, 測試採用-55 C X 30分鐘及160°C X 30分鐘之循環。準備100個 1C晶片進行測試,藉導電試驗決定導線斷裂的存在。有導線 斷裂部之1C數目係以斷裂比率(%)顯示於表1 (2) 回路高度 前述熱週期測試係以相同方式進行,但形成佈線未做 逆變形,以及共對8個1C晶片形成接線。然後來自任一選定IC 的200條導線使用長度測量顯微鏡測量回路高度。平均值示 於表1作為回路高度。 (3) 使用低輸出接觸接合之第二側抗撕強度 進行低輸出接觸接合,以超音波輸出0157瓦(常見0.235 瓦)及負載0.392牛頓(常見0.588牛頓)作為第二側(引線側)的 加壓接合條件,如第1C圖所示。於第id圖所示之佈線形成 後’導線的中區經切斷,引線側導線梢端使用配置有接合測 試器的鑷子夾緊,測量由定錨引線舉高導線至由引線撕離需 要的負載。共測量50點,平均值示於表i作為使用低壓接合 之第二側抗撕強度。 f__例2-17,比鲂存,丨1-12 金質合金導線係以貫例1之相同方式製造及測試,但各 元素用量改成如表1及2所示。測試結果也示於表1及2。 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 裝 訂 線 (請先閱讀背面之注意事項再填寫本頁) 11 480635 五、發明説明(9 ) 經濟部智慧財產局員工消費合作社印製 表1 組成(質量ppm) *測試結果 添加元素 金且 無法 避免 雜質 熱週 測試 後導 線斷 裂(%) 回路 南度 (微米) 使用低輸 出接觸接 合至第二 側抗撕強 度(毫牛頓) 抗拉 強度 (毫牛 頓) 銀 始 在乙 鑭 銪 鈣 鈹 含 量 實例 1 11 5 10 10 10 10 5 61 差額 0 187 58 131 2 15 5 10 10 10 10 5 65 差額 0 182 58 136 3 20 5 10 10 10 10 5 70 差額 0 181 52 141 4 15 1 10 10 10 10 5 61 差額 0 184 56 130 5 15 9 10 10 10 10 5 69 差額 0 186 59 139 6 15 5 1 10 10 10 5 56 差額 0 192 62 130 7 15 5 15 10 10 10 5 70 差額 0 185 55 140 8 15 5 10 1 10 10 5 56 差額 0 193 61 132 9 15 5 10 15 10 10 5 70 差額 0 188 57 142 10 15 5 10 10 1 10 5 56 差額 0 197 60 132 11 15 5 10 10 15 10 5 70 差額 0 186 54 141 12 15 5 10 10 10 1 5 56 差額 0 203 64 133 13 15 5 10 10 10 20 5 75 差額 0 170 51 144 14 15 5 10 10 10 10 1 61 差額 0 184 55 130 15 15 5 10 10 10 10 10 70 差額 0 188 57 140 16 15 5 10 10 10 10 - 60 差額 0 181 58 135 17 15 5 10 10 10 - 5 55 差額 0 186 57 134 (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 12 480635
五、發明説明(1G ) 表2 組成(質量ppm) *測試結果 添加元素 金且 無法 避免 雜質 熱週 測試 後導 線斷 裂(%) 回路 向度 (微米) 使用低輸 出接觸接 合至第二 側抗撕強 度(毫牛頓) 抗拉 強度 (毫牛 頓) 銀 雀白 在乙 鑭 銪 鈣 鈹 含 量 比較 例1 - 5 10 10 10 10 5 60 差額 10 190 60 115 2 15 - 10 10 10 10 5 60 差額 43 188 57 117 3 15 5 - 10 10 10 5 55 差額 24 186 58 109 4 15 5 10 - 10 10 5 55 差額 24 188 58 111 5 15 5 10 10 - 10 5 55 差額 10 187 59 108 6 15 5 10 10 10 - 5 50 差額 30 191 60 105 7 30 5 10 10 10 10 80 差額 0 179 8 127 8 15 10 10 10 10 10 5 70 差額 0 183 12 129 9 15 5 20 10 10 10 5 75 差額 0 135 30 139 10 15 5 10 20 10 10 5 75 差額 0 138 33 145 11 15 5 10 10 20 10 5 75 差額 0 141 28 146 12 15 5 10 10 10 30 5 85 差額 0 130 19 149 13 15 5 10 10 讎 30 5 75 差額 0 131 20 140 (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 (測試結果) (1)實例1至17其中銀、鉑、釔、鑭、銪、鈣及鈹各元素 含量係於本發明之範圍者,皆為絕佳製品,於使用的嚴苛條 件下經熱週期測試後具有〇%導線斷裂率,同時具有高回路 高度170微米或以上,抗撕強度51毫牛頓或以上,即使於第 二側(引線側)使用低壓接合亦如此,以及可維持高抗拉強度 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 13 480635 A7 B7 五、發明説明(11 ) 130亳牛頓或以上。 因此本發明之構造可達成本發明之目的,提供一種半 導體元件接合用金質導線,其中元素添加總量係不大於 l〇〇ppm質量比俾維持低電阻,首先,允許逆變形俾於回路 形成後即使暴露於苛刻的熱週期環境下仍可讓導線斷裂減至 最低;第二’允許於規定高度形成高回路;第三,即使於第 二側接面藉低壓接合仍可維持接面強度高於規定值俾維持高 回路形狀;以及第四,也允許維持高抗拉強度。 (2) 至於比較例1至5,於組成15ppm質量比銀,5ppm質 量比紐,lOppm質量比釔,ι〇ρρηι質量比銪,i〇ppm質量比 鑭,lOppm質量比鈣及5ppm質量比鈹之組合物中未添加銀、 始、纪、鑭及銪中之一種元素;而對比較例6,添加銀、鉑 、紀、鑭及銪但未添加鈣及鈹;全部此等試樣於使用的嚴苛 條件下經熱週期測試後皆顯示無法接受的導線斷裂率1〇_ 43% ;以及儘管高回路高度以及使用低壓接合之改良第二側 抗撕強度,抗拉強度仍不足(僅105-1 Π毫牛頓),因此本發 明之試樣可高度地用以達成本發明之目的。 (3) 至於比較例7及8,於15ppm質量比銀,5ppm質量比 轴,lOppm質量比釔,l〇ppm質量比鑭,10ppm質量比銪,1〇ppm 質量比鈣及5ppm質量比鈹之組成中,銀含量提升至高於 20ppm質量比或鉑含量提升至高於外口爪質量比;二試樣皆顯 示高回路高度,但使用低壓接合之第二側抗撕強度為丨2毫 牛頓及抗拉強度為127-129亳牛頓,因此本發明之試樣可高 度優異地達成本發明之目的。 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公楚) (請先閱讀背面之注意事項再填寫本頁) 訂 争 經濟部智慧財產局員工消費合作社印製 14 480635 Α7 Β7 五、發明説明(12 ) (4) 至於比較例9至12,於15ppm質量比銀,5ppm質量比 始,lOppm質量比釔,l〇ppm質量比鑭,10ppm質量比銪,1〇ppm 質量比鈣及5ppm質量比鈹之組成中釔含量提升至高於丨5ppm / 質量比,鑭含量提升至高於15ppm質量比,銪含量提升至高 • 於15ppm質量比或鈣含量提升至高於20ppm質量比;全部此 等試樣皆具有回路高度130-141微米及使用低壓接合之第二 側抗撕強度為19-33毫牛頓,因此本發明之試樣可高度優異 地用於達成本發明之目的。 (5) 比較例13含有15ppm質量比銀,5ppm質量比鉑,i〇ppm 質量比記,lOppm質量比鑭,30ppm質量比#5及5ppm質量比 鈹’但組成中不含銪,比較例13具有回路高度131微米及使 用低壓接合之第二側抗撕強度為20毫牛頓,因此本發明之試 樣可高度優異地用以達成本發明之目的。 (請先閱讀背面之注意事項再填寫本頁) •裝. 、訂 -線- 經濟部智慧財產局氮工消費合作社印製 15 本紙張尺度適用中國國家標準(CNS ) Α4規格(210Χ297公釐)
Claims (1)
- 480635 A8 B8 C8 D8 六、申請專利範圍 1· 一種接合半導體元件用之金質導線,其包含ll-20ppm 質量比銀,l-9ppm質量比鉑,卜15ppm質量比紀,1-l5ppm質量比鑭及i-i5ppm質量比銪,帶有質 量比鈣及MOppm質量比鈹之任一者或二者,前述各 元素之總量係不大於lOOppm質量比,差額為金及無法 避免的雜質。 ^ (請先閲讀背面之注意事項再填寫本頁} 經濟部智慧財產局員工消費合作社印製 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐)
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JP2000183521A JP3323185B2 (ja) | 2000-06-19 | 2000-06-19 | 半導体素子接続用金線 |
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JP (1) | JP3323185B2 (zh) |
KR (1) | KR100695925B1 (zh) |
CN (1) | CN1267991C (zh) |
DE (1) | DE60127768T2 (zh) |
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EP1811555A4 (en) * | 2004-09-30 | 2012-06-20 | Tanaka Electronics Ind | AU-ALLOY BOND WIRE |
CN100501956C (zh) | 2004-11-26 | 2009-06-17 | 田中电子工业株式会社 | 半导体组件用金焊接线 |
JP4595018B2 (ja) * | 2009-02-23 | 2010-12-08 | 株式会社新川 | 半導体装置の製造方法およびボンディング装置 |
CN107644716B (zh) * | 2017-09-15 | 2019-09-13 | 绍兴市高砚智生物科技有限公司 | 添加蜜胺甲醛树脂的复合铜丝生产方法 |
CN107958850A (zh) * | 2017-11-28 | 2018-04-24 | 宁波尚进自动化科技有限公司 | 一种焊点焊接质量监控系统及其监控方法 |
CN109811176A (zh) * | 2019-03-25 | 2019-05-28 | 杭州辰卓科技有限公司 | 一种电子器件封装高阻尼键合线用金合金及其工艺 |
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JPS5649534A (en) * | 1979-09-28 | 1981-05-06 | Tanaka Kikinzoku Kogyo Kk | Bonding wire for semiconductor device |
GB2116208B (en) * | 1981-12-04 | 1985-12-04 | Mitsubishi Metal Corp | Fine gold alloy wire for bonding of a semiconductor device |
JPS61110735A (ja) * | 1984-10-31 | 1986-05-29 | Tatsuta Electric Wire & Cable Co Ltd | 耐熱性に優れた金合金 |
JPS62228440A (ja) * | 1986-03-28 | 1987-10-07 | Matsuda Kikinzoku Kogyo Kk | 半導体素子ボンデイング用金線 |
JP3337049B2 (ja) * | 1995-05-17 | 2002-10-21 | 田中電子工業株式会社 | ボンディング用金線 |
US5945065A (en) * | 1996-07-31 | 1999-08-31 | Tanaka Denshi Kogyo | Method for wedge bonding using a gold alloy wire |
JP3657087B2 (ja) * | 1996-07-31 | 2005-06-08 | 田中電子工業株式会社 | ウエッジボンディング用金合金線 |
US5745418A (en) * | 1996-11-25 | 1998-04-28 | Macronix International Co., Ltd. | Flash memory mass storage system |
JP3573321B2 (ja) * | 1996-12-11 | 2004-10-06 | 住友金属鉱山株式会社 | Auボンディングワイヤー |
JP3669809B2 (ja) * | 1997-04-25 | 2005-07-13 | 田中電子工業株式会社 | 半導体素子ボンディング用金合金線 |
JP2000040710A (ja) * | 1998-07-24 | 2000-02-08 | Sumitomo Metal Mining Co Ltd | ボンディング用金合金細線 |
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2000
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- 2001-02-23 TW TW090104260A patent/TW480635B/zh not_active IP Right Cessation
- 2001-02-24 SG SG200101081A patent/SG87207A1/en unknown
- 2001-02-26 KR KR1020010009692A patent/KR100695925B1/ko not_active IP Right Cessation
- 2001-02-27 EP EP01250061A patent/EP1168439B1/en not_active Expired - Lifetime
- 2001-02-27 DE DE60127768T patent/DE60127768T2/de not_active Expired - Lifetime
- 2001-02-28 CN CNB011089202A patent/CN1267991C/zh not_active Expired - Fee Related
- 2001-02-28 MY MYPI20010898A patent/MY136914A/en unknown
Also Published As
Publication number | Publication date |
---|---|
CN1267991C (zh) | 2006-08-02 |
EP1168439A3 (en) | 2002-04-10 |
MY136914A (en) | 2008-11-28 |
JP3323185B2 (ja) | 2002-09-09 |
JP2002009101A (ja) | 2002-01-11 |
SG87207A1 (en) | 2002-03-19 |
CN1330404A (zh) | 2002-01-09 |
EP1168439A2 (en) | 2002-01-02 |
EP1168439B1 (en) | 2007-04-11 |
KR20010113459A (ko) | 2001-12-28 |
KR100695925B1 (ko) | 2007-03-20 |
DE60127768T2 (de) | 2007-12-27 |
DE60127768D1 (de) | 2007-05-24 |
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