TW428203B - Methods and apparatus for scanning and focusing an ion beam - Google Patents

Methods and apparatus for scanning and focusing an ion beam

Info

Publication number
TW428203B
TW428203B TW088109490A TW88109490A TW428203B TW 428203 B TW428203 B TW 428203B TW 088109490 A TW088109490 A TW 088109490A TW 88109490 A TW88109490 A TW 88109490A TW 428203 B TW428203 B TW 428203B
Authority
TW
Taiwan
Prior art keywords
charged particle
particle beam
scan
scanning
voltage
Prior art date
Application number
TW088109490A
Other languages
English (en)
Inventor
Joseph C Olson
Original Assignee
Varian Semiconductor Equipment
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Varian Semiconductor Equipment filed Critical Varian Semiconductor Equipment
Application granted granted Critical
Publication of TW428203B publication Critical patent/TW428203B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H01J37/1474—Scanning means
    • H01J37/1477—Scanning means electrostatic

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
TW088109490A 1998-06-19 1999-06-08 Methods and apparatus for scanning and focusing an ion beam TW428203B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/100,927 US6075249A (en) 1998-06-19 1998-06-19 Methods and apparatus for scanning and focusing an ion beam

Publications (1)

Publication Number Publication Date
TW428203B true TW428203B (en) 2001-04-01

Family

ID=22282245

Family Applications (1)

Application Number Title Priority Date Filing Date
TW088109490A TW428203B (en) 1998-06-19 1999-06-08 Methods and apparatus for scanning and focusing an ion beam

Country Status (6)

Country Link
US (1) US6075249A (zh)
EP (1) EP1088325A1 (zh)
JP (1) JP4305801B2 (zh)
KR (1) KR100654873B1 (zh)
TW (1) TW428203B (zh)
WO (1) WO1999066528A1 (zh)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI391977B (zh) * 2004-11-30 2013-04-01 Sen Corp 使用離子束之照射系統、增進照射準確度之方法及校正射束軌跡偏差之方法
TWI413999B (zh) * 2006-03-27 2013-11-01 Varian Semiconductor Equipment 離子植入機以及離子植入方法
TWI425550B (zh) * 2006-04-10 2014-02-01 Axcelis Tech Inc 用於測量帶狀離子射束之通量的方法及系統
CN110718432A (zh) * 2018-07-11 2020-01-21 北京中科信电子装备有限公司 一种二自由度电扫描装置

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6791094B1 (en) * 1999-06-24 2004-09-14 Varian Semiconductor Equipment Associates, Inc. Method and apparatus for determining beam parallelism and direction
US7547460B2 (en) * 2000-09-15 2009-06-16 Varian Semiconductor Equipment Associates, Inc. Ion implanter optimizer scan waveform retention and recovery
US6617593B2 (en) * 2000-12-04 2003-09-09 Intel Corporation Ion implantation system
JP3692999B2 (ja) * 2001-10-26 2005-09-07 日新イオン機器株式会社 イオン注入方法およびその装置
US6903350B1 (en) * 2004-06-10 2005-06-07 Axcelis Technologies, Inc. Ion beam scanning systems and methods for improved ion implantation uniformity
US6992310B1 (en) 2004-08-13 2006-01-31 Axcelis Technologies, Inc. Scanning systems and methods for providing ions from an ion beam to a workpiece
US6992309B1 (en) 2004-08-13 2006-01-31 Axcelis Technologies, Inc. Ion beam measurement systems and methods for ion implant dose and uniformity control
JP5214090B2 (ja) 2004-11-30 2013-06-19 株式会社Ｓｅｎ ビーム偏向走査方法及びビーム偏向走査装置並びにイオン注入方法及びイオン注入装置
JP4964413B2 (ja) * 2004-11-30 2012-06-27 株式会社Ｓｅｎ イオンビーム／荷電粒子ビーム照射装置
JP5280206B2 (ja) * 2005-12-07 2013-09-04 バリアン・セミコンダクター・エクイップメント・アソシエイツ・インコーポレイテッド 差動ポンピングを容易にする装置、プロセッサ可読担体およびその方法
JP5329050B2 (ja) * 2007-04-20 2013-10-30 株式会社Ｓｅｎ ビーム処理装置
US9905396B1 (en) 2016-10-18 2018-02-27 Varian Semiconductor Equipment Associates, Inc. Curved post scan electrode
EP4056606A1 (en) 2021-03-08 2022-09-14 Trinseo Europe GmbH Hollow plastic spheres with controlled particle sizes

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4276477A (en) * 1979-09-17 1981-06-30 Varian Associates, Inc. Focusing apparatus for uniform application of charged particle beam
US4283631A (en) * 1980-02-22 1981-08-11 Varian Associates, Inc. Bean scanning and method of use for ion implantation
US4922106A (en) * 1986-04-09 1990-05-01 Varian Associates, Inc. Ion beam scanning method and apparatus
US4899059A (en) * 1988-05-18 1990-02-06 Varian Associates, Inc. Disk scanning apparatus for batch ion implanters
US4851693A (en) * 1988-06-03 1989-07-25 Varian Associates, Inc. Compensated scan wave form generator for ion implantation equipment
NL9000822A (nl) * 1990-04-09 1991-11-01 Philips Nv Werkwijze voor bestraling van een object met een geladen deeltjesbundel en inrichting voor uitvoering van de werkwijze.
JP2648642B2 (ja) * 1990-04-17 1997-09-03 アプライド マテリアルズ インコーポレイテッド 巾広ビームでイオンインプランテーションを行なう方法及び装置
JP3379128B2 (ja) * 1993-01-13 2003-02-17 日新電機株式会社 イオン注入装置
US5350926A (en) * 1993-03-11 1994-09-27 Diamond Semiconductor Group, Inc. Compact high current broad beam ion implanter
JP3399117B2 (ja) * 1994-10-05 2003-04-21 日新電機株式会社 イオン注入装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI391977B (zh) * 2004-11-30 2013-04-01 Sen Corp 使用離子束之照射系統、增進照射準確度之方法及校正射束軌跡偏差之方法
TWI413999B (zh) * 2006-03-27 2013-11-01 Varian Semiconductor Equipment 離子植入機以及離子植入方法
TWI425550B (zh) * 2006-04-10 2014-02-01 Axcelis Tech Inc 用於測量帶狀離子射束之通量的方法及系統
CN110718432A (zh) * 2018-07-11 2020-01-21 北京中科信电子装备有限公司 一种二自由度电扫描装置

Also Published As

Publication number Publication date
KR20010052986A (ko) 2001-06-25
US6075249A (en) 2000-06-13
WO1999066528A1 (en) 1999-12-23
JP4305801B2 (ja) 2009-07-29
JP2002518807A (ja) 2002-06-25
KR100654873B1 (ko) 2006-12-08
EP1088325A1 (en) 2001-04-04

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Legal Events

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GD4A Issue of patent certificate for granted invention patent
MK4A Expiration of patent term of an invention patent