TW413832B - Heat processing device - Google Patents

Heat processing device Download PDF

Info

Publication number
TW413832B
TW413832B TW088100274A TW88100274A TW413832B TW 413832 B TW413832 B TW 413832B TW 088100274 A TW088100274 A TW 088100274A TW 88100274 A TW88100274 A TW 88100274A TW 413832 B TW413832 B TW 413832B
Authority
TW
Taiwan
Prior art keywords
hot plate
heat treatment
heat
treatment device
heater
Prior art date
Application number
TW088100274A
Other languages
English (en)
Chinese (zh)
Inventor
Kengo Mizosaki
Masaaki Yoshida
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Application granted granted Critical
Publication of TW413832B publication Critical patent/TW413832B/zh

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67103—Apparatus for thermal treatment mainly by conduction
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67115—Apparatus for thermal treatment mainly by radiation

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Nonlinear Science (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW088100274A 1998-01-16 1999-01-08 Heat processing device TW413832B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP01830098A JP3363368B2 (ja) 1998-01-16 1998-01-16 熱処理装置

Publications (1)

Publication Number Publication Date
TW413832B true TW413832B (en) 2000-12-01

Family

ID=11967770

Family Applications (1)

Application Number Title Priority Date Filing Date
TW088100274A TW413832B (en) 1998-01-16 1999-01-08 Heat processing device

Country Status (3)

Country Link
JP (1) JP3363368B2 (ja)
KR (1) KR100538714B1 (ja)
TW (1) TW413832B (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100407364B1 (ko) * 2000-06-26 2003-12-01 유니셈 주식회사 반도체 웨이퍼 베이크 장치
JP4618912B2 (ja) * 2001-03-12 2011-01-26 Ｏｋｉセミコンダクタ株式会社 被処理体の加熱処理装置及びその排気方法
KR100788389B1 (ko) * 2001-12-29 2007-12-31 엘지.필립스 엘시디 주식회사 배기 장치
JP3950424B2 (ja) 2003-02-10 2007-08-01 東京エレクトロン株式会社 熱処理装置
JP4290579B2 (ja) * 2004-01-19 2009-07-08 大日本スクリーン製造株式会社 基板加熱装置および基板加熱方法
JP6925213B2 (ja) * 2017-09-22 2021-08-25 東京エレクトロン株式会社 加熱処理装置及び加熱処理方法
JP7116558B2 (ja) * 2018-03-02 2022-08-10 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置及び基板処理システム

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2922743B2 (ja) * 1993-03-02 1999-07-26 大日本スクリーン製造株式会社 熱処理装置
JP3028462B2 (ja) * 1995-05-12 2000-04-04 東京エレクトロン株式会社 熱処理装置
JPH11121324A (ja) * 1997-10-13 1999-04-30 Dainippon Screen Mfg Co Ltd 基板加熱装置

Also Published As

Publication number Publication date
KR19990067945A (ko) 1999-08-25
JPH11204428A (ja) 1999-07-30
JP3363368B2 (ja) 2003-01-08
KR100538714B1 (ko) 2005-12-26

Similar Documents

Publication Publication Date Title
US6087632A (en) Heat processing device with hot plate and associated reflector
KR100829827B1 (ko) 기판 처리장치
JP4410147B2 (ja) 加熱装置、塗布、現像装置及び加熱方法
TW411485B (en) Substrate treating apparatus
JP2006269920A (ja) 加熱装置、塗布、現像装置及び加熱方法
JP2006303104A (ja) 加熱装置、塗布、現像装置及び加熱方法
TW400541B (en) Processing system
KR20080080925A (ko) 기판 처리 장치
US6246030B1 (en) Heat processing method and apparatus
TW413832B (en) Heat processing device
JP4407971B2 (ja) 基板処理装置
JP3874960B2 (ja) 基板処理装置
KR100629255B1 (ko) 반도체 포토 공정용 베이크 장치
US20150062546A1 (en) Apparatus with surface protector to inhibit contamination
JP2000124127A (ja) レジスト塗布・現像装置、ならびにそれに用いる基板加熱処理装置および基板搬送装置
JP6362416B2 (ja) 保持装置、リソグラフィ装置、および物品の製造方法
JP3324974B2 (ja) 熱処理装置及び熱処理方法
JP2007324168A (ja) 熱処理装置
JP2001237157A (ja) 加熱処理装置
JP4869952B2 (ja) 熱処理装置
JP4015015B2 (ja) 熱処理装置
JP4781165B2 (ja) 熱処理装置
JP2000012427A (ja) 基板処理方法及び基板処理装置
JP4800226B2 (ja) 熱処理装置
JP3657186B2 (ja) 加熱処理装置

Legal Events

Date Code Title Description
GD4A Issue of patent certificate for granted invention patent
MM4A Annulment or lapse of patent due to non-payment of fees