TW366438B - Process for manufacturing pellicle and jig for manufacturing pellicle - Google Patents

Process for manufacturing pellicle and jig for manufacturing pellicle

Info

Publication number
TW366438B
TW366438B TW086118957A TW86118957A TW366438B TW 366438 B TW366438 B TW 366438B TW 086118957 A TW086118957 A TW 086118957A TW 86118957 A TW86118957 A TW 86118957A TW 366438 B TW366438 B TW 366438B
Authority
TW
Taiwan
Prior art keywords
frame
film
special
pellicle
manufacturing
Prior art date
Application number
TW086118957A
Other languages
English (en)
Inventor
Masahiro Kondou
Minoru Fujita
Hiroaki Nakagawa
Hiroyuki Kurata
Original Assignee
Mitsui Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP33555996A external-priority patent/JPH10171100A/ja
Priority claimed from JP13084097A external-priority patent/JPH10319576A/ja
Priority claimed from JP28591297A external-priority patent/JP3377735B2/ja
Application filed by Mitsui Chemicals Inc filed Critical Mitsui Chemicals Inc
Application granted granted Critical
Publication of TW366438B publication Critical patent/TW366438B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Liquid Crystal (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
TW086118957A 1996-12-16 1997-12-16 Process for manufacturing pellicle and jig for manufacturing pellicle TW366438B (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP33555996A JPH10171100A (ja) 1996-12-16 1996-12-16 マスク保護装置の製造方法
JP13084097A JPH10319576A (ja) 1997-05-21 1997-05-21 マスク保護装置の製造方法における薄膜の切断方法と治具
JP14128297 1997-05-30
JP28591297A JP3377735B2 (ja) 1997-05-30 1997-10-17 マスク保護装置の製造方法における薄膜の切断方法と、該方法で用いる切断治具

Publications (1)

Publication Number Publication Date
TW366438B true TW366438B (en) 1999-08-11

Family

ID=27471572

Family Applications (1)

Application Number Title Priority Date Filing Date
TW086118957A TW366438B (en) 1996-12-16 1997-12-16 Process for manufacturing pellicle and jig for manufacturing pellicle

Country Status (8)

Country Link
US (1) US6335126B1 (zh)
EP (1) EP0945761B1 (zh)
KR (1) KR20000057324A (zh)
CA (1) CA2274972A1 (zh)
DE (1) DE69739840D1 (zh)
MY (1) MY132704A (zh)
TW (1) TW366438B (zh)
WO (1) WO1998027460A1 (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7241539B2 (en) * 2002-10-07 2007-07-10 Samsung Electronics Co., Ltd. Photomasks including shadowing elements therein and related methods and systems
KR100558195B1 (ko) * 2004-06-30 2006-03-10 삼성전자주식회사 광도 보정 방법과 노광 방법 및 이를 수행하기 위한 광도보정 장치와 노광 장치
WO2007009543A1 (en) * 2005-07-18 2007-01-25 Carl Zeiss Smt Ag Pellicle for use in a microlithographic exposure apparatus
KR102495880B1 (ko) * 2022-09-06 2023-02-06 주식회사에이피에스케미칼 카본복합재 펠리클 프레임 제조방법

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0757528B2 (ja) * 1987-02-03 1995-06-21 三井石油化学工業株式会社 有機質の膜を切断する方法
JPH02145292A (ja) 1988-11-29 1990-06-04 Tosoh Corp プラスチック薄膜の切断方法
US5203961A (en) * 1991-09-20 1993-04-20 Yen Yung Tsai Wet die cutter assembly and method
JPH05303194A (ja) * 1992-04-27 1993-11-16 Tosoh Corp ペリクルおよびその製造方法
JPH07281421A (ja) 1994-04-14 1995-10-27 Shin Etsu Chem Co Ltd ペリクルの製造方法
JP3429869B2 (ja) 1994-09-21 2003-07-28 信越化学工業株式会社 ペリクルの製造方法
JPH08292553A (ja) 1995-04-21 1996-11-05 Shin Etsu Chem Co Ltd 半導体リソグラフィ用ペリクルの製造方法
US5769984A (en) * 1997-02-10 1998-06-23 Micro Lithography, Inc. Optical pellicle adhesion system

Also Published As

Publication number Publication date
CA2274972A1 (en) 1998-06-25
MY132704A (en) 2007-10-31
WO1998027460A1 (fr) 1998-06-25
US6335126B1 (en) 2002-01-01
EP0945761A1 (en) 1999-09-29
KR20000057324A (ko) 2000-09-15
EP0945761B1 (en) 2010-04-14
EP0945761A4 (en) 2000-04-05
DE69739840D1 (de) 2010-05-27

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees