TW202441289A - 化合物、組成物、表現增感效果的方法及製造方法 - Google Patents

化合物、組成物、表現增感效果的方法及製造方法 Download PDF

Info

Publication number
TW202441289A
TW202441289A TW112138810A TW112138810A TW202441289A TW 202441289 A TW202441289 A TW 202441289A TW 112138810 A TW112138810 A TW 112138810A TW 112138810 A TW112138810 A TW 112138810A TW 202441289 A TW202441289 A TW 202441289A
Authority
TW
Taiwan
Prior art keywords
formula
compound
group
represented
compound represented
Prior art date
Application number
TW112138810A
Other languages
English (en)
Chinese (zh)
Inventor
松本正裕
飯沼雅崇
大松禎
佐藤�
越後雅敏
Original Assignee
日商三菱瓦斯化學股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from PCT/JP2023/015256 external-priority patent/WO2023195546A1/ja
Application filed by 日商三菱瓦斯化學股份有限公司 filed Critical 日商三菱瓦斯化學股份有限公司
Publication of TW202441289A publication Critical patent/TW202441289A/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C211/00—Compounds containing amino groups bound to a carbon skeleton
    • C07C211/43—Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton
    • C07C211/44—Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton having amino groups bound to only one six-membered aromatic ring
    • C07C211/52—Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton having amino groups bound to only one six-membered aromatic ring the carbon skeleton being further substituted by halogen atoms or by nitro or nitroso groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C211/00—Compounds containing amino groups bound to a carbon skeleton
    • C07C211/43—Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton
    • C07C211/44—Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton having amino groups bound to only one six-membered aromatic ring
    • C07C211/53—Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton having amino groups bound to only one six-membered aromatic ring having the nitrogen atom of at least one of the amino groups further bound to a hydrocarbon radical substituted by amino groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C33/00—Unsaturated compounds having hydroxy or O-metal groups bound to acyclic carbon atoms
    • C07C33/40—Halogenated unsaturated alcohols
    • C07C33/46—Halogenated unsaturated alcohols containing only six-membered aromatic rings as cyclic parts
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C35/00—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a ring other than a six-membered aromatic ring
    • C07C35/48—Halogenated derivatives
    • C07C35/52—Alcohols with a condensed ring system
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C43/00—Ethers; Compounds having groups, groups or groups
    • C07C43/02—Ethers
    • C07C43/20—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring
    • C07C43/23—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring containing hydroxy or O-metal groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C43/00—Ethers; Compounds having groups, groups or groups
    • C07C43/30—Compounds having groups
    • C07C43/315—Compounds having groups containing oxygen atoms singly bound to carbon atoms not being acetal carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
    • C07C49/84—Ketones containing a keto group bound to a six-membered aromatic ring containing ether groups, groups, groups, or groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/62—Halogen-containing esters
    • C07C69/63—Halogen-containing esters of saturated acids
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/76—Esters of carboxylic acids having a carboxyl group bound to a carbon atom of a six-membered aromatic ring
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/96—Esters of carbonic or haloformic acids
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
    • C07D303/02—Compounds containing oxirane rings
    • C07D303/12—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms
    • C07D303/18—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms by etherified hydroxyl radicals
    • C07D303/20—Ethers with hydroxy compounds containing no oxirane rings
    • C07D303/24—Ethers with hydroxy compounds containing no oxirane rings with polyhydroxy compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
    • C07D303/02—Compounds containing oxirane rings
    • C07D303/48—Compounds containing oxirane rings with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, directly attached to ring carbon atoms, e.g. ester or nitrile radicals
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D309/00—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings
    • C07D309/02—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings having no double bonds between ring members or between ring members and non-ring members
    • C07D309/08—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D309/10—Oxygen atoms
    • C07D309/12—Oxygen atoms only hydrogen atoms and one oxygen atom directly attached to ring carbon atoms, e.g. tetrahydropyranyl ethers
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D317/00—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms
    • C07D317/08—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3
    • C07D317/44—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 ortho- or peri-condensed with carbocyclic rings or ring systems
    • C07D317/46—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 ortho- or peri-condensed with carbocyclic rings or ring systems condensed with one six-membered ring
    • C07D317/48—Methylenedioxybenzenes or hydrogenated methylenedioxybenzenes, unsubstituted on the hetero ring
    • C07D317/62—Methylenedioxybenzenes or hydrogenated methylenedioxybenzenes, unsubstituted on the hetero ring with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to atoms of the carbocyclic ring
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D317/00—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms
    • C07D317/08—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3
    • C07D317/72—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 spiro-condensed with carbocyclic rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D319/00—Heterocyclic compounds containing six-membered rings having two oxygen atoms as the only ring hetero atoms
    • C07D319/10—1,4-Dioxanes; Hydrogenated 1,4-dioxanes
    • C07D319/14—1,4-Dioxanes; Hydrogenated 1,4-dioxanes condensed with carbocyclic rings or ring systems
    • C07D319/16—1,4-Dioxanes; Hydrogenated 1,4-dioxanes condensed with carbocyclic rings or ring systems condensed with one six-membered ring
    • C07D319/18—Ethylenedioxybenzenes, not substituted on the hetero ring
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Hydrogenated Pyridines (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Indole Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
TW112138810A 2023-04-10 2023-10-11 化合物、組成物、表現增感效果的方法及製造方法 TW202441289A (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
WOPCT/JP2023/015256 2023-04-10
PCT/JP2023/015256 WO2023195546A1 (ja) 2022-04-08 2023-04-10 ヨウ素原子を有する環状化合物
JP2023-131361 2023-08-10
JP2023131361 2023-08-10

Publications (1)

Publication Number Publication Date
TW202441289A true TW202441289A (zh) 2024-10-16

Family

ID=93059291

Family Applications (2)

Application Number Title Priority Date Filing Date
TW112138810A TW202441289A (zh) 2023-04-10 2023-10-11 化合物、組成物、表現增感效果的方法及製造方法
TW113124571A TW202513523A (zh) 2023-08-10 2024-07-01 化合物、組成物、展現增感效果的方法及製造方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
TW113124571A TW202513523A (zh) 2023-08-10 2024-07-01 化合物、組成物、展現增感效果的方法及製造方法

Country Status (5)

Country Link
JP (1) JPWO2024214321A1 (https=)
KR (2) KR20260006548A (https=)
CN (2) CN121057722A (https=)
TW (2) TW202441289A (https=)
WO (2) WO2024214321A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN121941673A (zh) * 2023-10-11 2026-04-28 三菱瓦斯化学株式会社 有机卤素化合物的制造方法、化合物、产酸剂、产碱剂、淬灭剂、聚合物、组合物和抗蚀图案形成方法

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4022814A (en) * 1974-08-28 1977-05-10 Lafayette Pharmacal, Inc. Iodine containing organic carbonates for use as radiographic agents
JPH07248624A (ja) * 1994-03-09 1995-09-26 Hitachi Ltd パターン形成材料及びパターン形成方法
GB9419203D0 (en) * 1994-09-23 1994-11-09 Nycomed Innovation Ab Contrast media
WO2001081316A2 (en) * 2000-04-27 2001-11-01 Abbott Laboratories Substituted phenyl farnesyltransferase inhibitors
FR2892412B1 (fr) * 2005-10-26 2008-05-16 Galderma Res & Dev Composes biaromatiques modulateurs des ppars
CN103402986A (zh) * 2010-11-24 2013-11-20 阿勒根公司 S1p受体的调节剂
ES2572703T3 (es) * 2011-11-08 2016-06-01 Actelion Pharmaceuticals Ltd. Derivados de 2-(1,2,3-triazol-2-il)benzamida y 3-(1,2,3-triazol-2-il)picolinamida como antagonistas del receptor de orexina
WO2014133620A2 (en) * 2012-12-07 2014-09-04 University Of Washington Through Its Center For Commercialization Thermally-activated self-immolative materials
KR101614524B1 (ko) * 2013-09-30 2016-04-21 주식회사 엘지화학 중합성 액정 화합물, 이를 포함하는 액정 조성물 및 광학 필름
JPWO2015152128A1 (ja) * 2014-03-31 2017-04-13 長瀬産業株式会社 アミノ酸前駆体、アミノ酸およびその製造方法、ならびに該アミノ酸を用いたｐｅｔ診断用トレーサー
JP2019034932A (ja) * 2017-08-10 2019-03-07 大正製薬株式会社 アゾールで置換されたピリジン化合物を有効成分として含有する医薬
FR3072679B1 (fr) * 2017-10-25 2020-10-30 Servier Lab Nouveaux derives macrocycliques, leur procede de preparation et les compositions pharmaceutiques qui les contiennent
JP7646117B2 (ja) * 2018-08-24 2025-03-17 三菱瓦斯化学株式会社 化合物、及びそれを含む組成物、並びに、レジストパターンの形成方法及び絶縁膜の形成方法
EP3854789A1 (en) * 2020-01-22 2021-07-28 Cygnet Biosciences B.V. Macrocyclic compounds useful as chitinase inhibitors
US20230096137A1 (en) * 2020-02-06 2023-03-30 Mitsubishi Gas Chemical Company, Inc. Composition for lithography and pattern formation method
KR20230012474A (ko) * 2020-05-15 2023-01-26 미쯔비시 가스 케미칼 컴파니, 인코포레이티드 화합물, (공)중합체, 조성물, 레지스트패턴 형성방법, 그리고 화합물 및 (공)중합체의 제조방법
TWI849314B (zh) 2020-06-01 2024-07-21 日商住友化學股份有限公司 化合物、樹脂、抗蝕劑組成物及抗蝕劑圖案的製造方法
JP7789494B2 (ja) * 2020-06-01 2025-12-22 住友化学株式会社 化合物、樹脂、レジスト組成物及びレジストパターンの製造方法
JP7788806B2 (ja) * 2020-06-26 2025-12-19 住友化学株式会社 化合物、樹脂、レジスト組成物及びレジストパターンの製造方法
US20240018125A1 (en) * 2020-09-28 2024-01-18 Ermium Therapeutics Cyclic isothiourea derivatives as cxcr4 modulators
JP2022123840A (ja) * 2021-02-12 2022-08-24 住友化学株式会社 カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP2022135974A (ja) * 2021-03-04 2022-09-15 住友化学株式会社 レジスト組成物及びレジストパターンの製造方法
JP2022141598A (ja) * 2021-03-15 2022-09-29 住友化学株式会社 カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP7848028B2 (ja) * 2021-04-15 2026-04-20 住友化学株式会社 カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP7813190B2 (ja) * 2021-06-18 2026-02-12 住友化学株式会社 酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP2023018671A (ja) * 2021-07-27 2023-02-08 住友化学株式会社 カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法
TW202411185A (zh) * 2022-04-08 2024-03-16 日商三菱瓦斯化學股份有限公司 具有碘原子之環狀化合物
JP2023156257A (ja) * 2022-04-12 2023-10-24 住友化学株式会社 カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法
CN114805644B (zh) * 2022-06-24 2022-09-16 苏州美创医疗科技有限公司 一种不透射聚合物及其制备方法和应用

Also Published As

Publication number Publication date
CN121666377A (zh) 2026-03-13
KR20260006548A (ko) 2026-01-13
TW202513523A (zh) 2025-04-01
WO2024214321A1 (ja) 2024-10-17
CN121057722A (zh) 2025-12-02
JPWO2024214321A1 (https=) 2024-10-17
KR20260051032A (ko) 2026-04-15
WO2025033019A1 (ja) 2025-02-13

Similar Documents

Publication Publication Date Title
TW202411185A (zh) 具有碘原子之環狀化合物
TWI899096B (zh) 化合物、聚合物、組成物、膜形成用組成物、圖型形成方法、絕緣膜之形成方法及化合物之製造方法，以及含有碘之乙烯基聚合物及其乙醯化衍生物之製造方法
TWI474122B (zh) 有機膜形成用化合物、利用此化合物之有機膜材料、有機膜形成方法及圖案形成方法
TW202142957A (zh) 微影術用組成物及圖型形成方法
TWI530481B (zh) 金剛烷基（甲基）丙烯酸系單體，及在重複單位含有該單體之（甲基）丙烯酸系聚合物
CN107266319B (zh) 树枝状多苯基取代金刚烷衍生物单分子树脂、正性光刻胶组合物和负性光刻胶组合物
CN115605517A (zh) 化合物、(共)聚合物、组合物、抗蚀图案形成方法、以及化合物和(共)聚合物的制造方法
TW202112734A (zh) 化合物、（共）聚合物、組成物及圖型形成方法
KR20230123513A (ko) 화합물, 중합체, 조성물, 막형성용 조성물, 패턴의형성방법, 절연막의 형성방법 및 화합물의 제조방법
TW202441289A (zh) 化合物、組成物、表現增感效果的方法及製造方法
TW202400552A (zh) 阻劑組成物、阻劑圖型形成方法、化合物及酸產生劑
TW202535992A (zh) 組成物、樹脂組成物、膜形成用組成物、微影術用膜形成用組成物、阻劑膜形成用組成物
CN119451998A (zh) 组合物、树脂组合物、膜形成用组合物、图案形成方法及化合物
KR101757809B1 (ko) 모노머, 상기 모노머를 포함하는 하드마스크 조성물 및 상기 하드마스크 조성물을 사용하는 패턴형성방법
CN121889366A (zh) 化合物、组合物、树脂组合物、膜形成用组合物、光刻用膜形成用组合物、抗蚀剂膜形成用组合物
WO2025182419A1 (ja) 組成物
TW202600505A (zh) 化合物、組成物、半導體微影用膜形成用組成物，及半導體微影用阻劑膜形成用組成物
TW202532389A (zh) 含碘（甲基）丙烯酸酯化合物、含碘（甲基）丙烯酸酯（共）聚合物、微影用組成物、阻劑組成物、下層膜形成用組成物及含碘（甲基）丙烯酸酯化合物之製造方法
TW202535804A (zh) 含碘（甲基）丙烯酸酯化合物、含碘（甲基）丙烯酸酯（共）聚合物、微影用組成物、阻劑組成物、下層膜形成用組成物及含碘（甲基）丙烯酸酯化合物之製造方法
TW202535805A (zh) 含碘（甲基）丙烯酸酯化合物、含碘（甲基）丙烯酸酯（共）聚合物、微影用組合物、阻劑組成物、下層膜形成用組成物及含碘（甲基）丙烯酸酯化合物之製造方法
JP2008063309A (ja) 重合性化合物の製造方法
TW202613065A (zh) 化合物、聚合物、組成物、膜形成用組成物、圖型形成方法、絕緣膜之形成方法及化合物之製造方法，以及含有碘之乙烯基聚合物及其乙醯化衍生物之製造方法
JP2012077077A (ja) 環状化合物、フォトレジスト基材及びフォトレジスト組成物