JPWO2024214321A1 - - Google Patents
Info
- Publication number
- JPWO2024214321A1 JPWO2024214321A1 JP2025513784A JP2025513784A JPWO2024214321A1 JP WO2024214321 A1 JPWO2024214321 A1 JP WO2024214321A1 JP 2025513784 A JP2025513784 A JP 2025513784A JP 2025513784 A JP2025513784 A JP 2025513784A JP WO2024214321 A1 JPWO2024214321 A1 JP WO2024214321A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C211/00—Compounds containing amino groups bound to a carbon skeleton
- C07C211/43—Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton
- C07C211/44—Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton having amino groups bound to only one six-membered aromatic ring
- C07C211/52—Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton having amino groups bound to only one six-membered aromatic ring the carbon skeleton being further substituted by halogen atoms or by nitro or nitroso groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C211/00—Compounds containing amino groups bound to a carbon skeleton
- C07C211/43—Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton
- C07C211/44—Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton having amino groups bound to only one six-membered aromatic ring
- C07C211/53—Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton having amino groups bound to only one six-membered aromatic ring having the nitrogen atom of at least one of the amino groups further bound to a hydrocarbon radical substituted by amino groups
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C33/00—Unsaturated compounds having hydroxy or O-metal groups bound to acyclic carbon atoms
- C07C33/40—Halogenated unsaturated alcohols
- C07C33/46—Halogenated unsaturated alcohols containing only six-membered aromatic rings as cyclic parts
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C35/00—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a ring other than a six-membered aromatic ring
- C07C35/48—Halogenated derivatives
- C07C35/52—Alcohols with a condensed ring system
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C43/00—Ethers; Compounds having groups, groups or groups
- C07C43/02—Ethers
- C07C43/20—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring
- C07C43/23—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring containing hydroxy or O-metal groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C43/00—Ethers; Compounds having groups, groups or groups
- C07C43/30—Compounds having groups
- C07C43/315—Compounds having groups containing oxygen atoms singly bound to carbon atoms not being acetal carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
- C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
- C07C49/84—Ketones containing a keto group bound to a six-membered aromatic ring containing ether groups, groups, groups, or groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
- C07C69/62—Halogen-containing esters
- C07C69/63—Halogen-containing esters of saturated acids
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
- C07C69/76—Esters of carboxylic acids having a carboxyl group bound to a carbon atom of a six-membered aromatic ring
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
- C07C69/96—Esters of carbonic or haloformic acids
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
- C07D303/02—Compounds containing oxirane rings
- C07D303/12—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms
- C07D303/18—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms by etherified hydroxyl radicals
- C07D303/20—Ethers with hydroxy compounds containing no oxirane rings
- C07D303/24—Ethers with hydroxy compounds containing no oxirane rings with polyhydroxy compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
- C07D303/02—Compounds containing oxirane rings
- C07D303/48—Compounds containing oxirane rings with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, directly attached to ring carbon atoms, e.g. ester or nitrile radicals
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D309/00—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings
- C07D309/02—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings having no double bonds between ring members or between ring members and non-ring members
- C07D309/08—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D309/10—Oxygen atoms
- C07D309/12—Oxygen atoms only hydrogen atoms and one oxygen atom directly attached to ring carbon atoms, e.g. tetrahydropyranyl ethers
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D317/00—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms
- C07D317/08—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3
- C07D317/44—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 ortho- or peri-condensed with carbocyclic rings or ring systems
- C07D317/46—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 ortho- or peri-condensed with carbocyclic rings or ring systems condensed with one six-membered ring
- C07D317/48—Methylenedioxybenzenes or hydrogenated methylenedioxybenzenes, unsubstituted on the hetero ring
- C07D317/62—Methylenedioxybenzenes or hydrogenated methylenedioxybenzenes, unsubstituted on the hetero ring with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to atoms of the carbocyclic ring
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D317/00—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms
- C07D317/08—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3
- C07D317/72—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 spiro-condensed with carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D319/00—Heterocyclic compounds containing six-membered rings having two oxygen atoms as the only ring hetero atoms
- C07D319/10—1,4-Dioxanes; Hydrogenated 1,4-dioxanes
- C07D319/14—1,4-Dioxanes; Hydrogenated 1,4-dioxanes condensed with carbocyclic rings or ring systems
- C07D319/16—1,4-Dioxanes; Hydrogenated 1,4-dioxanes condensed with carbocyclic rings or ring systems condensed with one six-membered ring
- C07D319/18—Ethylenedioxybenzenes, not substituted on the hetero ring
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Hydrogenated Pyridines (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Plural Heterocyclic Compounds (AREA)
- Indole Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2023/015256 WO2023195546A1 (ja) | 2022-04-08 | 2023-04-10 | ヨウ素原子を有する環状化合物 |
| JP2023131361 | 2023-08-10 | ||
| PCT/JP2023/036897 WO2024214321A1 (ja) | 2023-04-10 | 2023-10-11 | 化合物、組成物、増感効果を発現する方法および製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2024214321A1 true JPWO2024214321A1 (https=) | 2024-10-17 |
Family
ID=93059291
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025513784A Pending JPWO2024214321A1 (https=) | 2023-04-10 | 2023-10-11 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPWO2024214321A1 (https=) |
| KR (2) | KR20260006548A (https=) |
| CN (2) | CN121057722A (https=) |
| TW (2) | TW202441289A (https=) |
| WO (2) | WO2024214321A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN121941673A (zh) * | 2023-10-11 | 2026-04-28 | 三菱瓦斯化学株式会社 | 有机卤素化合物的制造方法、化合物、产酸剂、产碱剂、淬灭剂、聚合物、组合物和抗蚀图案形成方法 |
Family Cites Families (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4022814A (en) * | 1974-08-28 | 1977-05-10 | Lafayette Pharmacal, Inc. | Iodine containing organic carbonates for use as radiographic agents |
| JPH07248624A (ja) * | 1994-03-09 | 1995-09-26 | Hitachi Ltd | パターン形成材料及びパターン形成方法 |
| GB9419203D0 (en) * | 1994-09-23 | 1994-11-09 | Nycomed Innovation Ab | Contrast media |
| WO2001081316A2 (en) * | 2000-04-27 | 2001-11-01 | Abbott Laboratories | Substituted phenyl farnesyltransferase inhibitors |
| FR2892412B1 (fr) * | 2005-10-26 | 2008-05-16 | Galderma Res & Dev | Composes biaromatiques modulateurs des ppars |
| CN103402986A (zh) * | 2010-11-24 | 2013-11-20 | 阿勒根公司 | S1p受体的调节剂 |
| ES2572703T3 (es) * | 2011-11-08 | 2016-06-01 | Actelion Pharmaceuticals Ltd. | Derivados de 2-(1,2,3-triazol-2-il)benzamida y 3-(1,2,3-triazol-2-il)picolinamida como antagonistas del receptor de orexina |
| WO2014133620A2 (en) * | 2012-12-07 | 2014-09-04 | University Of Washington Through Its Center For Commercialization | Thermally-activated self-immolative materials |
| KR101614524B1 (ko) * | 2013-09-30 | 2016-04-21 | 주식회사 엘지화학 | 중합성 액정 화합물, 이를 포함하는 액정 조성물 및 광학 필름 |
| JPWO2015152128A1 (ja) * | 2014-03-31 | 2017-04-13 | 長瀬産業株式会社 | アミノ酸前駆体、アミノ酸およびその製造方法、ならびに該アミノ酸を用いたｐｅｔ診断用トレーサー |
| JP2019034932A (ja) * | 2017-08-10 | 2019-03-07 | 大正製薬株式会社 | アゾールで置換されたピリジン化合物を有効成分として含有する医薬 |
| FR3072679B1 (fr) * | 2017-10-25 | 2020-10-30 | Servier Lab | Nouveaux derives macrocycliques, leur procede de preparation et les compositions pharmaceutiques qui les contiennent |
| JP7646117B2 (ja) * | 2018-08-24 | 2025-03-17 | 三菱瓦斯化学株式会社 | 化合物、及びそれを含む組成物、並びに、レジストパターンの形成方法及び絶縁膜の形成方法 |
| EP3854789A1 (en) * | 2020-01-22 | 2021-07-28 | Cygnet Biosciences B.V. | Macrocyclic compounds useful as chitinase inhibitors |
| US20230096137A1 (en) * | 2020-02-06 | 2023-03-30 | Mitsubishi Gas Chemical Company, Inc. | Composition for lithography and pattern formation method |
| KR20230012474A (ko) * | 2020-05-15 | 2023-01-26 | 미쯔비시 가스 케미칼 컴파니, 인코포레이티드 | 화합물, (공)중합체, 조성물, 레지스트패턴 형성방법, 그리고 화합물 및 (공)중합체의 제조방법 |
| TWI849314B (zh) | 2020-06-01 | 2024-07-21 | 日商住友化學股份有限公司 | 化合物、樹脂、抗蝕劑組成物及抗蝕劑圖案的製造方法 |
| JP7789494B2 (ja) * | 2020-06-01 | 2025-12-22 | 住友化学株式会社 | 化合物、樹脂、レジスト組成物及びレジストパターンの製造方法 |
| JP7788806B2 (ja) * | 2020-06-26 | 2025-12-19 | 住友化学株式会社 | 化合物、樹脂、レジスト組成物及びレジストパターンの製造方法 |
| US20240018125A1 (en) * | 2020-09-28 | 2024-01-18 | Ermium Therapeutics | Cyclic isothiourea derivatives as cxcr4 modulators |
| JP2022123840A (ja) * | 2021-02-12 | 2022-08-24 | 住友化学株式会社 | カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法 |
| JP2022135974A (ja) * | 2021-03-04 | 2022-09-15 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
| JP2022141598A (ja) * | 2021-03-15 | 2022-09-29 | 住友化学株式会社 | カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法 |
| JP7848028B2 (ja) * | 2021-04-15 | 2026-04-20 | 住友化学株式会社 | カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法 |
| JP7813190B2 (ja) * | 2021-06-18 | 2026-02-12 | 住友化学株式会社 | 酸発生剤、レジスト組成物及びレジストパターンの製造方法 |
| JP2023018671A (ja) * | 2021-07-27 | 2023-02-08 | 住友化学株式会社 | カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法 |
| TW202411185A (zh) * | 2022-04-08 | 2024-03-16 | 日商三菱瓦斯化學股份有限公司 | 具有碘原子之環狀化合物 |
| JP2023156257A (ja) * | 2022-04-12 | 2023-10-24 | 住友化学株式会社 | カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法 |
| CN114805644B (zh) * | 2022-06-24 | 2022-09-16 | 苏州美创医疗科技有限公司 | 一种不透射聚合物及其制备方法和应用 |
-
2023
- 2023-10-11 JP JP2025513784A patent/JPWO2024214321A1/ja active Pending
- 2023-10-11 CN CN202380096847.1A patent/CN121057722A/zh active Pending
- 2023-10-11 KR KR1020257025196A patent/KR20260006548A/ko active Pending
- 2023-10-11 WO PCT/JP2023/036897 patent/WO2024214321A1/ja not_active Ceased
- 2023-10-11 TW TW112138810A patent/TW202441289A/zh unknown
-
2024
- 2024-06-28 CN CN202480051808.4A patent/CN121666377A/zh active Pending
- 2024-06-28 WO PCT/JP2024/023669 patent/WO2025033019A1/ja active Pending
- 2024-06-28 KR KR1020267000168A patent/KR20260051032A/ko active Pending
- 2024-07-01 TW TW113124571A patent/TW202513523A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| CN121666377A (zh) | 2026-03-13 |
| KR20260006548A (ko) | 2026-01-13 |
| TW202513523A (zh) | 2025-04-01 |
| WO2024214321A1 (ja) | 2024-10-17 |
| CN121057722A (zh) | 2025-12-02 |
| TW202441289A (zh) | 2024-10-16 |
| KR20260051032A (ko) | 2026-04-15 |
| WO2025033019A1 (ja) | 2025-02-13 |