TW202031819A - 抗眩光塗覆膜 - Google Patents
抗眩光塗覆膜 Download PDFInfo
- Publication number
- TW202031819A TW202031819A TW108144717A TW108144717A TW202031819A TW 202031819 A TW202031819 A TW 202031819A TW 108144717 A TW108144717 A TW 108144717A TW 108144717 A TW108144717 A TW 108144717A TW 202031819 A TW202031819 A TW 202031819A
- Authority
- TW
- Taiwan
- Prior art keywords
- glare coating
- glare
- coating film
- particles
- coating
- Prior art date
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 195
- 239000011248 coating agent Substances 0.000 title claims abstract description 193
- 239000002245 particle Substances 0.000 claims abstract description 76
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims abstract description 22
- 239000011146 organic particle Substances 0.000 claims abstract description 11
- 229920005989 resin Polymers 0.000 claims abstract description 8
- 239000011347 resin Substances 0.000 claims abstract description 8
- 239000010954 inorganic particle Substances 0.000 claims abstract description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 43
- 229920002050 silicone resin Polymers 0.000 claims description 38
- 239000000203 mixture Substances 0.000 claims description 21
- 239000000758 substrate Substances 0.000 claims description 21
- 239000011324 bead Substances 0.000 claims description 15
- 230000003746 surface roughness Effects 0.000 claims description 14
- 235000012239 silicon dioxide Nutrition 0.000 claims description 10
- 229920001721 polyimide Polymers 0.000 claims description 9
- 239000000377 silicon dioxide Substances 0.000 claims description 9
- 239000007787 solid Substances 0.000 claims description 8
- 229920000089 Cyclic olefin copolymer Polymers 0.000 claims description 5
- 239000003822 epoxy resin Substances 0.000 claims description 5
- 229920000647 polyepoxide Polymers 0.000 claims description 5
- 238000006116 polymerization reaction Methods 0.000 claims description 5
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 4
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 claims description 4
- 238000002834 transmittance Methods 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 125000006165 cyclic alkyl group Chemical group 0.000 claims description 3
- 239000011242 organic-inorganic particle Substances 0.000 claims description 3
- 229920002284 Cellulose triacetate Polymers 0.000 claims description 2
- 229920001577 copolymer Polymers 0.000 claims description 2
- 150000001925 cycloalkenes Chemical class 0.000 claims description 2
- 229920006290 polyethylene naphthalate film Polymers 0.000 claims description 2
- 229920001296 polysiloxane Polymers 0.000 claims description 2
- 125000005702 oxyalkylene group Chemical group 0.000 claims 1
- 239000011342 resin composition Substances 0.000 abstract description 60
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 abstract description 5
- 238000005299 abrasion Methods 0.000 abstract description 4
- 125000003700 epoxy group Chemical group 0.000 abstract description 3
- 230000000052 comparative effect Effects 0.000 description 15
- 229920000642 polymer Polymers 0.000 description 15
- 239000003795 chemical substances by application Substances 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 8
- 239000004642 Polyimide Substances 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 7
- 239000011159 matrix material Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 238000005481 NMR spectroscopy Methods 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 239000011247 coating layer Substances 0.000 description 6
- 229910021485 fumed silica Inorganic materials 0.000 description 6
- 239000003999 initiator Substances 0.000 description 6
- 230000002829 reductive effect Effects 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 229910002018 Aerosil® 300 Inorganic materials 0.000 description 5
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 5
- 239000003054 catalyst Substances 0.000 description 5
- 238000005227 gel permeation chromatography Methods 0.000 description 5
- 239000010410 layer Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 229910000077 silane Inorganic materials 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 230000006866 deterioration Effects 0.000 description 4
- 125000000524 functional group Chemical group 0.000 description 4
- 230000004313 glare Effects 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 238000010030 laminating Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 239000012808 vapor phase Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- 150000002430 hydrocarbons Chemical class 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000002356 single layer Substances 0.000 description 3
- 239000003643 water by type Substances 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- -1 alkoxy Silanes Chemical class 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 239000003963 antioxidant agent Substances 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 239000008199 coating composition Substances 0.000 description 2
- 238000001723 curing Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 230000000379 polymerizing effect Effects 0.000 description 2
- 238000000197 pyrolysis Methods 0.000 description 2
- 238000006748 scratching Methods 0.000 description 2
- 230000002393 scratching effect Effects 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- ROYZOPPLNMOKCU-UHFFFAOYSA-N 2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl-tripropoxysilane Chemical compound C1C(CC[Si](OCCC)(OCCC)OCCC)CCC2OC21 ROYZOPPLNMOKCU-UHFFFAOYSA-N 0.000 description 1
- QQZOPKMRPOGIEB-UHFFFAOYSA-N 2-Oxohexane Chemical compound CCCCC(C)=O QQZOPKMRPOGIEB-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- DAJFVZRDKCROQC-UHFFFAOYSA-N 3-(oxiran-2-ylmethoxy)propyl-tripropoxysilane Chemical compound CCCO[Si](OCCC)(OCCC)CCCOCC1CO1 DAJFVZRDKCROQC-UHFFFAOYSA-N 0.000 description 1
- ZMPJUOJIHXQXNX-UHFFFAOYSA-N 3-prop-1-enoxypropyl(tripropoxy)silane Chemical compound C(=CC)OCCC[Si](OCCC)(OCCC)OCCC ZMPJUOJIHXQXNX-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000006004 Quartz sand Substances 0.000 description 1
- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- 239000003377 acid catalyst Substances 0.000 description 1
- 239000004840 adhesive resin Substances 0.000 description 1
- 229920006223 adhesive resin Polymers 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 208000003464 asthenopia Diseases 0.000 description 1
- RQPZNWPYLFFXCP-UHFFFAOYSA-L barium dihydroxide Chemical compound [OH-].[OH-].[Ba+2] RQPZNWPYLFFXCP-UHFFFAOYSA-L 0.000 description 1
- 229910001863 barium hydroxide Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- QFWPJPIVLCBXFJ-UHFFFAOYSA-N glymidine Chemical compound N1=CC(OCCOC)=CN=C1NS(=O)(=O)C1=CC=CC=C1 QFWPJPIVLCBXFJ-UHFFFAOYSA-N 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000003456 ion exchange resin Substances 0.000 description 1
- 229920003303 ion-exchange polymer Polymers 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000005543 nano-size silicon particle Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000036632 reaction speed Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 239000011856 silicon-based particle Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 125000003011 styrenyl group Chemical group [H]\C(*)=C(/[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 1
- TXJZGLZJCDSVRK-UHFFFAOYSA-N triethoxy(3-prop-1-enoxypropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCOC=CC TXJZGLZJCDSVRK-UHFFFAOYSA-N 0.000 description 1
- UDUKMRHNZZLJRB-UHFFFAOYSA-N triethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OCC)(OCC)OCC)CCC2OC21 UDUKMRHNZZLJRB-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- IWZLBIVZPIDURM-UHFFFAOYSA-N trimethoxy(3-prop-1-enoxypropyl)silane Chemical compound CO[Si](OC)(OC)CCCOC=CC IWZLBIVZPIDURM-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
- G02B5/021—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures
- G02B5/0226—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures having particles on the surface
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/02—Polysilicates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/042—Coating with two or more layers, where at least one layer of a composition contains a polymer binder
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
- C08K5/0025—Crosslinking or vulcanising agents; including accelerators
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/02—Polysilicates
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
- C09D183/06—Polysiloxanes containing silicon bound to oxygen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/006—Anti-reflective coatings
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/61—Additives non-macromolecular inorganic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/65—Additives macromolecular
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/66—Additives characterised by particle size
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/66—Additives characterised by particle size
- C09D7/67—Particle size smaller than 100 nm
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/66—Additives characterised by particle size
- C09D7/68—Particle size between 100-1000 nm
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/66—Additives characterised by particle size
- C09D7/69—Particle size larger than 1000 nm
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/111—Anti-reflection coatings using layers comprising organic materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0273—Diffusing elements; Afocal elements characterized by the use
- G02B5/0278—Diffusing elements; Afocal elements characterized by the use used in transmission
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2201/00—Polymeric substrate or laminate
- B05D2201/02—Polymeric substrate
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2401/00—Form of the coating product, e.g. solution, water dispersion, powders or the like
- B05D2401/10—Organic solvent
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2420/00—Indexing scheme corresponding to the position of each layer within a multilayer coating relative to the substrate
- B05D2420/01—Indexing scheme corresponding to the position of each layer within a multilayer coating relative to the substrate first layer from the substrate side
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2425/00—Indexing scheme corresponding to the position of each layer within a multilayer coating relative to the surface
- B05D2425/01—Indexing scheme corresponding to the position of each layer within a multilayer coating relative to the surface top layer/ last layer, i.e. first layer from the top surface
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2518/00—Other type of polymers
- B05D2518/10—Silicon-containing polymers
- B05D2518/12—Ceramic precursors (polysiloxanes, polysilazanes)
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2601/00—Inorganic fillers
- B05D2601/20—Inorganic fillers used for non-pigmentation effect
- B05D2601/22—Silica
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
- B05D3/0254—After-treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
- B05D3/061—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
- B05D3/065—After-treatment
- B05D3/067—Curing or cross-linking the coating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/50—Multilayers
- B05D7/52—Two layers
- B05D7/53—Base coat plus clear coat type
- B05D7/536—Base coat plus clear coat type each layer being cured, at least partially, separately
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2379/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2361/00 - C08J2377/00
- C08J2379/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08J2379/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2483/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers
- C08J2483/04—Polysiloxanes
- C08J2483/06—Polysiloxanes containing silicon bound to oxygen-containing groups
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Nanotechnology (AREA)
- Inorganic Chemistry (AREA)
- Laminated Bodies (AREA)
- Paints Or Removers (AREA)
Abstract
揭露一種抗眩光塗覆樹脂組成物以及包含其的抗眩光塗覆膜。具體而言,提供一種抗眩光塗覆樹脂組成物以及使用其生產的抗眩光塗覆膜,所述抗眩光塗覆樹脂組成物包含含有環氧基及丙烯酸基的矽氧烷樹脂,並且更包含有機或無機顆粒,且因此確保硬度、耐刮擦性及可加工性,並且藉由引入顆粒而提供抗眩光性質。此外,可達成使用所述樹脂組成物製備的膜樹脂及使用所述樹脂組成物生產的膜的硬度、耐磨性及抗眩光性質。
Description
本揭露是有關於一種抗眩光塗覆樹脂組成物以及包含其的抗眩光塗覆膜。
抗眩光塗覆膜被定義為具有利用由於表面不平順引起的散射反射來減少外部光反射的功能的膜,並且被應用至各種顯示面板的表面,以防止由於外部反射光引起的顯示器可見度的劣化,並且減少由於反射光引起的眼睛疲勞。此外,抗眩光塗覆膜分散內部光,因此進一步防止眩光。一般而言,使用藉由用其中具有顆粒的組成物進行塗覆來散射光的方法。然而,此種方法具有弱散射能力,因此常常使用藉由表面不平順進行光散射的方法。當所應用的表面不平順嚴重時,由於外部光的反射,抗眩光性質優異,但顯示器的可見度可能會劣化。此外,由於表面不平順暴露於外部,因此在存在物理衝擊時可能發生損壞,且因此需要研發用於覆蓋窗的高硬度AG膜。由於表面不平順引起的可見度的劣化正成為一個需要被解決的問題,且研發具有足夠的抗眩光性質及高可見度且無眩光問題的AG膜是至關重要的。為此,已經應用了抗反射(anti-reflection,AR)膜,所述抗反射膜包括交替堆疊的低折射材料及高折射材料,以藉由在介面上的反射過程期間的相消干擾(destructive interference)來減少入射光的反射,但由於AG膜的製程簡單且成本低,因此AG膜是較佳的。
作為先前技術,韓國專利公開案第2017-0082922號揭露了一種抗眩光樹脂組成物以及使用其的抗眩光膜,所述抗眩光樹脂組成物藉由影像清晰度達成高解析度,並且由於在其上形成的表面不平順而表現出抗眩光性質,並且具有對薄膜而言可取的機械性質。然而,當分散在其中的聚集體具有2微米(µm)至100微米的大尺寸時,在顯示器中出現眩光的可能性仍然相當高。
同時,韓國專利第10-0378340號揭露了一種抗眩光塗層,所述抗眩光塗層包括不同類型的具有不同折射率的透光顆粒,但具有由於有機顆粒而導致抗刮擦性差的缺點。
此外,韓國專利第10-0296369號揭露了一種抗眩光塗層,所述抗眩光塗層在黏合劑樹脂中包含透光漫射體(diffuser)且因此具有1至15的內部霧度(internal haze),但具有由於高的內部霧度而導致可見度低的風險。
因此,預計研發既具有抗眩光性質又具有高硬度的窗覆蓋塗覆材料(window cover coating material)將成為使聚合物膜更廣泛應用於顯示器的必要技術。
[技術問題]
因此,本揭露是鑑於上述問題而作出的,並且本揭露的一個目的是提供一種抗眩光塗覆樹脂組成物以及使用其生產的抗眩光塗覆膜,所述抗眩光塗覆樹脂組成物包含含有環氧基及丙烯酸基的矽氧烷樹脂,並且包括有機或無機顆粒,且因此確保硬度、耐刮擦性及可加工性,並且藉由引入顆粒而提供抗眩光性質。本揭露的另一目的是達成使用所述樹脂組成物製備的膜樹脂及使用所述樹脂組成物生產的膜的硬度、耐磨性及抗眩光性質。
[技術解決方案]
根據本揭露的一個態樣,為解決所述技術問題,提供一種抗眩光塗覆膜,所述抗眩光塗覆膜包括:基板;高硬度塗層,形成在所述基板上;以及抗眩光塗層,形成在所述高硬度塗層上,其中所述高硬度塗層由包含第一矽氧烷樹脂的第一組成物形成,並且所述抗眩光塗層由包含第二矽氧烷樹脂及顆粒的第二組成物形成,其中所述第一矽氧烷樹脂及所述第二矽氧烷樹脂中的每一者藉由至少一種烷氧基矽烷的聚合形成,所述至少一種烷氧基矽烷選自由下式1表示的烷氧基矽烷及由下式2表示的烷氧基矽烷,
>式1>
R1 n
Si(OR2
)4-n
其中R1
為經環氧樹脂或壓克力取代的C1至C3直鏈、支鏈或環狀伸烷基,R2
為C1至C8直鏈、支鏈或環狀烷基,且n為1至3的整數,
>式2>
Si(OR3
)4
其中R3
代表C1至C4直鏈或支鏈烷基。
所述顆粒的平均粒徑可為0.01微米至5微米。
所述抗眩光塗層可具有100奈米(nm)至300奈米的表面粗糙度(Ra)。
所述高硬度塗層可具有10微米至50微米的厚度。
所述抗眩光塗層可具有1微米至3微米的厚度。
所述顆粒可為有機顆粒或無機顆粒。
所述無機顆粒可包含二氧化矽顆粒及矽顆粒中的至少一者。
所述有機顆粒可包含苯乙烯珠(styrenic bead)、丙烯酸珠(acrylic bead)及交聯丙烯酸珠(cross-linked acrylic bead)中的至少一者。
相對於所述第二組成物的固體含量,所述顆粒可以1重量%至5重量%的量存在。
所述基板可包括聚醯亞胺膜、聚萘二甲酸乙二醇酯膜、三乙醯基纖維素膜、環烯烴聚合物膜、環烯烴共聚物膜及丙烯酸膜中的至少一者。
所述抗眩光塗覆膜可具有40至100的光澤單位(gloss unit)。
所述抗眩光塗覆膜可具有90或大於90的透射率。
所述抗眩光塗覆膜可具有30或小於30的霧度。
[有利效果]
根據本揭露的抗眩光塗覆樹脂組成物及使用其製備的抗眩光塗覆膜可確保硬度、耐刮擦性及可加工性,並且可藉由引入顆粒達成優異的抗眩光性質。
在一個態樣中,本揭露是有關於一種用於高硬度塗層的樹脂組成物以及用於抗眩光塗層的樹脂組成物,其中所述用於高硬度塗層的樹脂組成物包含第一矽氧烷樹脂,且所述用於抗眩光塗層的樹脂組成物包含第二矽氧烷樹脂及顆粒,其中所述第一矽氧烷樹脂及所述第二矽氧烷樹脂中的每一者藉由至少一種烷氧基矽烷的聚合形成,所述至少一種烷氧基矽烷選自由下式1表示的烷氧基矽烷及由下式2表示的烷氧基矽烷,
>式1>
R1 n
Si(OR2
)4-n
其中R1
為經環氧樹脂或壓克力取代的C1至C3直鏈、支鏈或環狀伸烷基,R2
為C1至C8直鏈、支鏈或環狀烷基,且n為1至3的整數,
>式2>
Si(OR3
)4
其中R3
代表C1至C4直鏈或支鏈烷基。
用於高硬度塗層的樹脂組成物可用於生產高硬度塗層,且用於高硬度塗層的樹脂組成物被稱為「第一組成物」。用於抗眩光塗層的樹脂組成物可用於生產抗眩光塗層,且用於抗眩光塗層的樹脂組成物被稱為「第二組成物」。第一組成物與第二組成物相互獨立,並且除了顆粒之外的剩餘成分的含量可彼此相同或不同。在以下說明中,為了便於描述,將第二組成物描述為其中僅將顆粒添加至第一組成物中的組成物,但本揭露並非僅限於此。
另外,第一矽氧烷樹脂及第二矽氧烷樹脂相互獨立,並且可彼此相同或不同。為了便於描述,以下描述將第一矽氧烷樹脂及第二矽氧烷樹脂描述為一種矽氧烷樹脂,但本揭露並非僅限於此。
本揭露較佳地為用於高硬度塗層的樹脂組成物,所述樹脂組成物包含由化合物的化學鍵合產生的矽氧烷樹脂,所述化合物包括含有環氧基或丙烯酸基的烷氧基矽烷及具有矽烷T結構的三烷氧基矽烷(trialkoxysilane)。
具體而言,用於高硬度塗層的樹脂組成物包括矽氧烷樹脂,所述矽氧烷樹脂藉由使包括環氧基或丙烯酸基的烷氧基矽烷與水反應而獲得,藉此提高包括由其製備的固化產物的膜或片材的硬度及耐磨損性。
可藉由控制添加的試劑(reagent)的量來控制硬度及柔性,藉此提供對預期用途最佳的樹脂組成物。因此,本揭露的用於高硬度塗層的樹脂組成物由於矽烷而具有高的表面硬度及耐刮擦性,並且根據本揭露的包括具有高硬度的固化塗覆產品的膜或片材是藉由矽氧烷的光固化反應來製備的,所述矽氧烷藉由水與含有環氧樹脂或壓克力的烷氧基矽烷之間的反應而製備。
更具體而言,含有環氧樹脂或壓克力的烷氧基矽烷可由以上式1表示,並且更佳地包括選自以下中的至少一者:3-縮水甘油氧基丙基三甲氧基矽烷、3-縮水甘油氧基丙基三乙氧基矽烷、3-縮水甘油氧基丙基三丙氧基矽烷、3-甲基丙烯醯氧基丙基三甲氧基矽烷、3-甲基丙烯醯氧基丙基三乙氧基矽烷、3-丙烯醯氧基丙基三甲氧基矽烷、3-丙烯醯氧基丙基三乙氧基矽烷、3-丙烯醯氧基丙基三丙氧基矽烷、2-(3,4-環氧環己基)乙基三甲氧基矽烷、2-(3,4-環氧環己基)乙基三乙氧基矽烷、以及2-(3,4-環氧環己基)乙基三丙氧基矽烷。
藉由自包括由式2表示的烷氧基矽烷的化合物聚合矽氧烷樹脂,本揭露能夠藉由矽氧烷的緻密交聯來確保表面硬度。
在本揭露中,矽氧烷樹脂的合成可在室溫下進行,但作為另一選擇亦可在50℃至120℃下攪拌1至120小時的同時進行。用於進行反應的觸媒可為:酸觸媒,例如鹽酸、乙酸、氟化氫、硝酸、硫酸或碘酸;鹼觸媒,例如氨、氫氧化鉀、氫氧化鈉、氫氧化鋇或咪唑;以及離子交換樹脂,例如琥珀炸藥(Amberite)。該些觸媒可單獨使用或組合使用。在此種情況下,以100重量份的矽氧烷樹脂計,觸媒的量可為約0.0001重量份至約10重量份,但並非特別僅限於此。當反應進行時,水或醇作為副產物產生。當移除此水或醇時,可抑制反向反應,並且可更快地執行正向反應,使得藉由此原理可控制反應速度。在反應完成後,可藉由在減壓下加熱而移除副產物。
如上所述,根據本揭露合成的矽氧烷樹脂在T1範圍(-48至-55 ppm)內的積分值(integral value)為0至10、在T2範圍(-55至-62 ppm)內的積分值為10至20、且在T3範圍(-62至-75 ppm)內的積分值為80,其中所述積分值是指在基於0 ppm四甲基矽烷(tetramethylsilane,TMS)的29
Si核磁共振(NMR)量測之後藉由基於80的T3範圍的積分獲得的值。在此種情況下,核磁共振值為藉由用29
Si NMR(日本電子光學實驗室傅里葉變換-核磁共振(JEOL FT-NMR))量測核磁共振並執行積分而獲得的值。將所量測的聚合物在CDCl3
中稀釋至約10%的濃度。
T1範圍(-48至-55 ppm)中的積分值為0至10是指存在於矽氧烷樹脂聚合物中的T1結構存在於聚合物整個結構的0至10%中,其中T1結構為其中作為聚合物的重覆單元的中心原子的矽原子(Si)僅在一端連接至矽氧烷樹脂聚合物鏈的結構。亦即,T1結構為聚合物的末端。在T2範圍(-55至-62 ppm)內的積分值為10至20是指存在於矽氧烷樹脂聚合物中的T2結構存在於聚合物整個結構的10至20%中,且T2結構為其中作為聚合物的重覆單元的中心原子的矽原子(Si)僅在兩端連接至矽氧烷樹脂聚合物鏈的結構。T3範圍(-62至-75 ppm)中的積分值為80是指存在於矽氧烷樹脂聚合物中的T3結構存在於聚合物整個結構的80%中,其中T3結構為其中作為聚合物的重覆單元的中心原子的矽原子(Si)在三端經由網路結構連接至矽氧烷樹脂聚合物鏈的結構。
如上所述,本揭露的矽氧烷樹脂較佳為包括具有矽烷T結構的三烷氧基矽烷(trialkoxysilane)的矽氧烷樹脂,且因此包括最大量的T3結構。
同時,除了矽氧烷樹脂之外,第一組成物還可包含作為另一種組分的至少一種添加劑,所述添加劑選自由有機溶劑、光起始劑、熱起始劑、抗氧化劑、調平劑及塗佈助劑組成的群組。在此種情況下,可藉由控制所使用的添加劑的種類及含量而提供適用於各種應用的第一塗覆用組成物。在本揭露中,較佳地提供能夠提高硬度、耐磨性、柔性及抗捲曲性的第一塗覆用組成物。
根據本揭露的起始劑為例如光聚合起始劑(例如,有機金屬鹽)及熱聚合起始劑(例如,胺或咪唑)。在此種情況下,以100重量份的矽氧烷樹脂的總量計,添加的起始劑的量較佳地為約0.01重量份至10重量份。當起始劑的含量小於0.01重量份時,塗層獲得足夠硬度所需的固化時間延長,且因此效率降低。當起始劑的含量大於10重量份時,塗層的黃度可能增加,因此使得難以獲得透明的塗層。
此外,有機溶劑可包括但不限於選自由以下組成的群組中的至少一者:酮類,例如丙酮、甲基乙基酮、甲基丁基酮及環己酮;溶纖劑,例如甲基溶纖劑及丁基溶纖劑;醚類,例如乙醚及二噁烷;醇類,例如異丁醇、異丙醇、丁醇及甲醇;鹵代烴,例如二氯甲烷、氯仿及三氯乙烯;以及烴,例如正己烷、苯及甲苯。具體而言,由於可藉由控制所添加的有機溶劑的量來控制矽氧烷樹脂的黏度,因此可適當地控制有機溶劑的量,以便進一步改善可加工性或控制塗覆膜的厚度。
第一組成物可包含抗氧化劑以抑制由聚合導致的氧化,但並非僅限於此。
第一組成物可更包含調平劑或塗佈助劑,但並非僅限於此。
矽氧烷樹脂的聚合可包括但不限於光照射或加熱。
用於抗眩光塗層的樹脂組成物較佳地包含矽氧烷樹脂及平均粒度為0.01微米至5微米的顆粒,所述矽氧烷樹脂由包括選自由式1表示的烷氧基矽烷及由式2表示的烷氧基矽烷中的至少一種烷氧基矽烷的化合物的化學鍵合產生。
根據本揭露的用於抗眩光塗層的樹脂組成物包含由包括至少一種烷氧基矽烷的化合物的化學鍵合產生的矽氧烷樹脂、以及平均粒度為0.01微米至5微米的顆粒,藉此有利地達成表面不平順並獲得優異的抗眩光性質及高硬度兩者。
顆粒的平均粒徑為0.01微米至5微米,較佳地為0.012微米至4微米。
當平均粒徑小於0.01微米時,由此產生的閃光(sparkling)物理性質是有利的,但在達成霧度(Hz)及所需的光澤單位(gloss unit,GU)方面可能存在限制,且因此可能需要過量的含量。當平均粒徑超過5微米時,可能會出現閃光,且顆粒可能為可見的,從而導致顯示器可見度劣化。
顆粒包括有機顆粒或無機顆粒。有機顆粒為具有含烴官能基的顆粒,且無機顆粒為不具有含烴官能基的顆粒。
有機顆粒的實例可包括但不限於苯乙烯珠(styrenic bead)、丙烯酸珠(acrylic bead)及交聯丙烯酸珠(cross-linked acrylic bead)。苯乙烯珠為具有苯乙烯官能基的珠,丙烯酸珠為具有丙烯酸官能基的珠,且交聯丙烯酸珠為具有交聯丙烯酸官能基的珠。
舉例而言,無機顆粒包括二氧化矽顆粒,但本揭露並非僅限於此。
依據二氧化矽生產方法的不同,二氧化矽顆粒通常可分為氣相二氧化矽(fumed silica)顆粒及沈澱二氧化矽顆粒。氣相二氧化矽顆粒一般為藉由使四氯化矽(SiCl4
)在3,000℃下經受火焰熱解(flame pyrolysis)或電弧(electric arc)而產生的汽化石英砂。氣相二氧化矽顆粒為熱解後獲得的二氧化矽顆粒,並且為高度純淨的奈米二氧化矽。氣相二氧化矽顆粒可為市售類型。沈澱二氧化矽顆粒為藉由使用溶劑的沈澱製程獲得的二氧化矽顆粒。一般而言,氣相二氧化矽顆粒的大小小於沈澱二氧化矽顆粒的大小。
本揭露的顆粒較佳為二氧化矽顆粒,在有機或無機顆粒中,二氧化矽顆粒在確保表面硬度方面是有利的。
相對於用於抗眩光塗層的樹脂組成物的固體含量,顆粒較佳地以1重量%至5重量%的量存在。用於抗眩光塗層的樹脂組成物的固體含量為藉由使由式1及式2表示的烷氧基矽烷彼此反應而獲得的樹脂組成物的固體含量。
當顆粒的含量在所述範圍內時,其與塗覆厚度恰當匹配,因此確保穩定的霧度(Hz)及光澤單位(GU)。
當顆粒的含量相對於用於抗眩光塗層的樹脂組成物的固體含量小於1重量%時,抗眩光塗層的表面粗糙度(Ra)變小,並且抗眩光塗層的表面變得光滑,因此降低抗眩光性質。亦即,GU超過100。同時,當顆粒的含量相對於用於抗眩光塗層的樹脂組成物的固體含量大於5%時,抗眩光塗層的表面粗糙度(Ra)增加,在抗眩光塗層的表面上產生過度的不平順,發生漫反射,霧度增加,並且可見度劣化。亦即,GU小於40。
圖1為根據本揭露實施例的抗眩光塗覆膜的示意性剖視圖。
本揭露的另一較佳實施例提供了一種其中高硬度塗層120及抗眩光塗層130以所述順序堆疊在基板110上的結構,其中抗眩光塗層130具有0.01微米至5微米的平均粒徑。
抗眩光塗層可具有100奈米至300奈米的表面粗糙度(Ra)。
抗眩光塗覆膜具有其中堆疊有兩個層(即,高硬度塗層120及抗眩光塗層130)的結構。在僅包括抗眩光塗層130而不包括高硬度塗層120的單層結構的情形中,膜的強度降低,並且內部霧度變為0.9或大於0.9,從而導致可見度差。同時,在僅包括高硬度塗層120而不包括抗眩光塗層130的單層結構的情形中,抗眩光性質差。因此,需要具有包括高硬度塗層120及抗眩光塗層130的層壓結構的抗眩光塗覆膜。
參照圖2,將詳細闡述本揭露的抗眩光塗覆膜的結構。所述抗眩光塗覆膜包括:基板110;高硬度塗層120,位於基板上;以及抗眩光塗層130,位於高硬度塗層上,其中抗眩光塗層130包含顆粒131及基質132。此處,基質132為固化材料,所述固化材料包括在用於抗眩光塗層的樹脂組成物的成分中除顆粒以外的成分。
如自圖2可見,顆粒131可自基質132突出至抗眩光塗層130的外部,或者可嵌入其中。由於顆粒131自基質132突出,抗眩光塗層130的表面粗糙度Ra增加,且因此抗眩光塗覆膜的抗眩光性質增加。然而,當抗眩光塗層130的表面粗糙度(Ra)過度增加時,會發生過度的漫反射,且可見度因此降低。
基板110較佳地為透明基板,並且可不受特別限制地使用任何基板,只要其為透明的即可。基板110可包括聚醯亞胺(polyimide,PI)膜、聚萘二甲酸乙二醇酯(poly-ethylene naphthalate,PEN)膜、三乙醯基纖維素(tri-acetyl cellulose,TAC)膜、環烯烴聚合物(cyclo olefin polymer,COP)膜、環烯烴共聚物(cyclo olefin copolymer,COC)膜、壓克力膜等。具體而言,就膜自身優異的熱性質、高模數及高硬度而言,使用透明的聚醯亞胺作為基板是較佳的。透明基板110具有10微米至200微米、較佳地20微米至100微米的厚度。當基板110的厚度小於10微米時,難以處理膜,並且當厚度超過200微米時,無法獲得經濟效率。
高硬度塗層120由用於高硬度塗層的樹脂組成物生產,所述樹脂組成物包含矽氧烷樹脂,所述矽氧烷樹脂由包括選自由式1表示的烷氧基矽烷及由式2表示的烷氧基矽烷中的至少一種烷氧基矽烷的化合物的化學鍵合產生,並且抗眩光塗層130由用於抗眩光塗層的樹脂組成物以及平均粒度為0.01微米至5微米的顆粒生產,所述樹脂組成物包括由化合物的化學鍵合產生的矽氧烷樹脂,所述化合物包括選自由式1表示的烷氧基矽烷及由式2表示的烷氧基矽烷中的至少一種烷氧基矽烷。用於高硬度塗層的樹脂組成物及用於抗眩光塗層的樹脂組成物如上所述。
抗眩光塗層130較佳地具有100奈米至300奈米、較佳地160奈米至300奈米的表面粗糙度(Ra)。
當表面粗糙度在上述範圍內時,具有確保表面靈敏度及光澤單位(GU)的優點。
當表面粗糙度(Ra)小於100奈米時,抗眩光塗層130的表面為光滑的而無不平順,因此導致塗覆膜的抗眩光性質劣化,並且使得抗眩光塗覆膜的光澤單位高於100。同時,當表面粗糙度(Ra)超過300奈米時,抗眩光塗層130的表面的不平順過大,因此導致光的漫反射增加及可見度降低。所述膜的光澤單位小於40。
高硬度塗層120可具有10微米至50微米的厚度。
當高硬度塗層120的厚度為10微米至50微米時,可獲得具有有效用作抗眩光塗覆膜的鉛筆強度及霧度的膜。
抗眩光塗層130可具有1微米至3微米、較佳地2微米至3微米的厚度。
當抗眩光塗層130的厚度滿足2微米至3微米時,可改善抗眩光性質,並且可獲得防止顆粒自膜解除吸附的效果。
具體而言,當高硬度塗層120的厚度在上述範圍內時,本揭露可達成期望水準的鉛筆硬度。由於當塗覆至50微米的厚度時會達成為9H的鉛筆硬度,因此超過所述厚度是無意義的。此外,當抗眩光塗層130的厚度小於1微米時,抗眩光塗層130中存在的顆粒可能不會以足夠的強度結合至抗眩光塗層130,因此不利地導致在存在外部衝擊時分離的問題。同時,當抗眩光塗層130的厚度超過3微米時,抗眩光塗層130中含有的顆粒不會突出至抗眩光塗層130的表面,並且抗眩光塗層130的表面上的不平順變小,且因此表面粗糙度(Ra)變小。
本揭露的顆粒131的平均粒徑為0.01微米至5微米,並且抗眩光塗層130的厚度為1微米至3微米。因此,平均粒徑大於抗眩光塗層130的厚度的顆粒131自抗眩光塗層130的基質132突出,藉此增加抗眩光塗層130的表面粗糙度Ra。突出的顆粒131不規則地反射光,藉此增加抗眩光性質。
此外,高硬度塗層120及抗眩光塗層130可藉由以下方式來生產:使用例如塗覆、澆鑄或模製等方法形成塗覆用樹脂組成物,隨後進行光聚合或熱聚合以形成固化產物。在光聚合的情形中,可藉由在光照射之前進行熱處理而獲得均勻的表面。熱處理可在不低於40℃且不高於約300℃的溫度下進行,但本揭露並非僅限於此。此外,輻射光的量可不小於50毫焦耳/平方公分(mJ/cm2
)且不大於20,000毫焦耳/平方公分,但並非僅限於此。
[發明的實施例]
在下文中,將基於以下實例更詳細地闡述本揭露。將參照圖1及圖2詳細闡述本揭露的實例及比較例。
圖1是有關於根據本揭露的實例1至實例5的抗眩光塗覆膜,所述抗眩光塗覆膜包括高硬度塗層、抗眩光塗層及基板。
同時,圖3是有關於比較例2至比較例4的抗眩光塗覆膜,所述抗眩光塗覆膜僅包括抗眩光塗層及基板,而不包括高硬度塗層。
提供該些實例僅僅是為了更佳地理解本揭露,而不應被解釋為限制本揭露的範圍。
>實例1>
將KBM-403(信越化學有限公司(Shinetsu Chemical Co., Ltd.))、TEOS(西格瑪-奧德里奇公司(Sigmaaldrich Corporation))及蒸餾水以80:20:160的莫耳比混合,並將所得混合物注入了1,000毫升燒瓶中,添加了0.1克氫氧化鈉溶液(在1克H2O中)作為觸媒,並用機械攪拌器在65℃下以100轉/分鐘(rpm)的速度將混合物攪拌了6小時。然後,用2-丁酮對所得混合物進行了稀釋以達成為50重量%的固體含量,且然後藉由0.45微米的特氟隆(Teflon)過濾器進行了過濾以獲得重量平均分子量為7,400且多分散性指數(PDI)為1.7(GPC)的矽氧烷樹脂。在此種情況下,分子量及分子量分佈(多分散性指數(polydispersity index,PDI))為藉由凝膠滲透層析(gel permeation chromatography,GPC)(由沃特世公司(Waters)生產,型號名稱:e2695)基於聚苯乙烯獲得的重量平均分子量(Mw)及數量平均分子量(Mn)。將待量測的聚合物溶解在了四氫呋喃中至濃度為1%,並以20微升的量注入至GPC中。用於GPC的流動相為四氫呋喃,並以1.0毫升/分鐘的流速引入,且在30℃下進行了分析。在本文中使用的管柱為串聯連接的兩個沃特世苯乙烯凝膠(Styragel)HR3。在40℃下使用RI偵測器(由沃特世公司生產的2414)作為偵測器進行了量測。在此種情形中,藉由將測得的重量平均分子量除以數量平均分子量而計算了分子量分佈(molecular weight distribution,PDI)。
接下來,將作為光起始劑的3重量份的易璐佳(IRGACURE)250(巴斯夫公司(BASF Corporation))添加到了100重量份的矽氧烷樹脂中,以獲得用於高硬度塗層的樹脂組成物。使用邁耶棒(Mayer bar)將用於高硬度塗層的樹脂組成物塗覆在了聚醯亞胺基板的表面上,並在乾燥烘箱中在100℃下乾燥了10分鐘,且然後暴露於波長為315奈米的紫外線燈達30秒,以產生厚度為10微米的高硬度塗層。
此外,將1重量%的平均粒徑為4微米的沈澱二氧化矽顆粒(德國德固賽歐克607(ACEMATT OK607),贏創有限公司(EVONIK Co., Ltd.))添加到了用於高硬度塗層的樹脂組成物中,且然後在室溫下以100轉/分鐘的速度攪拌了1小時,以獲得用於抗眩光塗層的樹脂組成物。
使用邁耶棒將用於抗眩光塗層的樹脂組成物塗覆在了高硬度塗層上,在乾燥烘箱中在100℃下乾燥了10分鐘,且然後暴露於波長為315 奈米的紫外線燈達30秒,以產生厚度為2微米的抗眩光塗層。
>實例2>
除了將3重量%的平均粒徑為4微米的沈澱二氧化矽顆粒(ACEMATT OK607,贏創有限公司)添加至用於高硬度塗層的樹脂組成物中且然後在室溫下攪拌1小時之外,以與實例1相同的方式藉由層壓抗眩光塗層而生產了抗眩光塗覆膜。
>實例3>
除了將5重量%的平均粒徑為4微米的沈澱二氧化矽顆粒(ACEMATT OK607,贏創有限公司)添加至用於高硬度塗層的樹脂組成物中且然後在室溫下攪拌1小時之外,以與實例1相同的方式藉由層壓抗眩光塗層而生產了抗眩光塗覆膜。
>實例4>
除了將3重量%的平均粒徑為12奈米的氣相(fumed)二氧化矽顆粒(埃爾若賽爾300(AEROSIL300),贏創有限公司)添加至用於高硬度塗層的樹脂組成物中且然後在室溫下攪拌1小時之外,以與實例1相同的方式藉由層壓抗眩光塗層而生產了抗眩光塗覆膜。
>實例5>
除了將5重量%的平均粒徑為12奈米的氣相二氧化矽顆粒(AEROSIL300,贏創有限公司)添加至用於高硬度塗層的樹脂組成物中且然後在室溫下攪拌1小時之外,以與實例1相同的方式藉由層壓抗眩光塗層而生產了抗眩光塗覆膜。
>比較例1>
除了未向用於高硬度塗層的樹脂組成物中添加顆粒之外,以與實例1相同的方式生產了抗眩光塗層。
>比較例2>
將1重量%的平均粒徑為12奈米的氣相二氧化矽顆粒(AEROSIL300,贏創有限公司)添加到了用於高硬度塗層的樹脂組成物中,且然後在室溫下攪拌了1小時以獲得用於抗眩光塗層的樹脂組成物,並且將用於抗眩光塗層的樹脂組成物塗覆在了聚醯亞胺的表面上,在100℃下乾燥了10分鐘,且然後暴露於波長為315奈米的紫外線燈達30秒,以產生抗眩光塗覆膜,所述抗眩光塗覆膜包括層壓至2微米厚度的抗眩光塗層。
>比較例3>
將3重量%的平均粒徑為12奈米的氣相二氧化矽顆粒(AEROSIL300,贏創有限公司)添加到了用於高硬度塗層的樹脂組成物中,且然後在室溫下攪拌了1小時以獲得用於抗眩光塗層的樹脂組成物,並且將用於抗眩光塗層的樹脂組成物塗覆在了聚醯亞胺的表面上,在100℃下乾燥了10分鐘,且然後暴露於波長為315奈米的紫外線燈達30秒,以產生抗眩光塗覆膜,所述抗眩光塗覆膜包括厚度為2微米的層壓抗眩光塗層。
>比較例4>
將5重量%的平均粒徑為12奈米的氣相二氧化矽顆粒(AEROSIL300,贏創有限公司)添加到了用於高硬度塗層的樹脂組成物中,且然後在室溫下攪拌了1小時以獲得用於抗眩光塗層的樹脂組成物,並且將用於抗眩光塗層的樹脂組成物塗覆在了聚醯亞胺的表面上,在100℃下乾燥了10分鐘,且然後暴露於波長為315奈米的紫外線燈達30秒,以產生抗眩光塗覆膜,所述抗眩光塗覆膜包括層壓至2微米厚度的抗眩光塗層。
>量測實例>
根據以下方法評估了在實例及比較例中生產的抗眩光塗覆膜的物理性質,且結果示於下表1中。
(1)透射率(%):根據美國材料試驗標準(ASTM)D1003使用由村上有限公司(Murakami Co., Ltd.)製造的HM-150進行了量測
(2)霧度:根據ASTM D1003使用由村上有限公司製造的HM-150進行了量測
(3)光澤單位(GU):在60℃下使用由村上有限公司生產的光澤度計(gloss meter)GM-3D進行了量測
(4)表面硬度(Ra):使用由奈米系統有限公司(Nanosystem Co., Ltd.)生產的NV-2000量測了鉛筆硬度
(5)閃光(sparkling):將所生產的膜貼附在了未經AG處理的顯示器上,並用肉眼評估了RGB光源。
(強):在所有的R、G及B光源中皆觀察到閃光
(中等):在R、G及B光源中的兩個光源中觀察到閃光
(弱):在R、G、B光源中的一個光源中觀察到閃光
良(O.K.):未觀察到閃光(sparkling)
(6)鉛筆硬度:根據ASTM D3363使用由日本井本有限公司(IMOTO Co., Ltd., Japan)生產的鉛筆硬度測試儀在1千克力(kgf)的負荷下以180毫米/分鐘(mm/min)的速度進行了量測。
(7)耐刮擦性:當#0000鋼絲絨在1.5千克的負荷下往復運動10次時,觀察是否發生刮擦,並且基於以下標準評估了耐刮擦性。
–良(OK):未發生刮擦
–不良(NG):發生刮擦
[表1]
條目 | TT (透射率) | 霧度 | 內部霧度 | GU | Ra(nm) | 閃光 | 鉛筆硬度 | 耐刮擦性 |
實例1 | 91.6 | 2.4 | 0.5 | 98.5 | 110 | 弱 | 5H | O.K. |
實例2 | 90.9 | 14.2 | 0.7 | 64.0 | 159 | 弱 | 5H | O.K. |
實例3 | 90.6 | 29.8 | 0.8 | 42.8 | 260 | O.K. | 5H | O.K. |
實例4 | 91.8 | 4.6 | 0.6 | 97.6 | 180 | 弱 | 5H | O.K. |
實例5 | 91.5 | 10.7 | 0.7 | 74.6 | 200 | 弱 | 5H | O.K. |
比較例1 | 92.0 | 0.4 | 0.3 | 150.5 | 20 | O.K. | 4H | O.K. |
比較例2 | 91.3 | 2.7 | 0.9 | 120.5 | 80 | 弱 | 5H | O.K. |
比較例3 | 90.9 | 5.0 | 1.1 | 120.8 | 150 | 弱 | 5H | O.K. |
比較例4 | 90.7 | 11.2 | 1.7 | 102.3 | 200 | 弱 | 5H | O.K. |
如自表1可見,相較於比較例1,隨著二氧化矽顆粒的含量增加,內部霧度增加且因此光澤單位(GU)降低,且鉛筆硬度增加。當霧度(haze)為30或大於30時,顯示器可見度可能劣化。當GU為100或大於100時,由於缺乏抗眩光性質,因此無法獲得防止眩光的效果。當GU為40或小於40時,由於漫反射增加,可見度可能降低。使用單層代替雙層的比較例2至比較例4具有較雙層情形中高的內部霧度,且因此降低了可見度,並且具有較雙層情形中高的GU,且因此降低了抗反射性質。隨著含量增加,表面粗糙度(Ra)增加,並取決於顆粒的類型。當Ra降低時,可見度增加,但抗眩光性質降低,並且當Ra增加時,抗眩光性質可能增加,但可見度可能劣化。因此,Ra較佳地在100奈米至300奈米的範圍內。
因此,實驗表明,使用本揭露的塗覆樹脂組成物生產的雙層塗覆膜能夠達成所有的硬度、耐刮擦性及抗眩光性質,且因此適合作為抗眩光顯示器保護膜。
110:基板
120:高硬度塗層
130:抗眩光塗層
131:顆粒
132:基質
藉由結合附圖閱讀以下詳細說明,將更清楚地理解本揭露的上述及其他目的、特徵及其他優點,在附圖中:
圖1為根據本揭露實施例的抗眩光塗覆膜的示意性剖視圖。
圖2為抗眩光塗覆膜的剖視圖,其具體示出抗眩光塗層的顆粒及基質。
圖3為不包括高硬度塗層的比較例的抗眩光塗覆膜的示意性剖視圖。
110:基板
120:高硬度塗層
130:抗眩光塗層
Claims (13)
- 一種抗眩光塗覆膜,包括: 基板; 高硬度塗層,形成在所述基板上;以及 抗眩光塗層,形成在所述高硬度塗層上, 其中所述高硬度塗層由包含第一矽氧烷樹脂的第一組成物形成,並且 所述抗眩光塗層由包含第二矽氧烷樹脂及顆粒的第二組成物形成, 其中所述第一矽氧烷樹脂及所述第二矽氧烷樹脂中的每一者藉由至少一種烷氧基矽烷的聚合形成,所述至少一種烷氧基矽烷選自由下式1表示的烷氧基矽烷及由下式2表示的烷氧基矽烷, >式1> R1 n Si(OR2 )4-n 其中R1 為經環氧樹脂或壓克力取代的C1至C3直鏈、支鏈或環狀伸烷基,R2 為C1至C8直鏈、支鏈或環狀烷基,且n為1至3的整數, >式2> Si(OR3 )4 其中R3 代表C1至C4直鏈或支鏈烷基。
- 如請求項1所述的抗眩光塗覆膜,其中所述顆粒的平均粒徑為0.01微米至5微米。
- 如請求項1所述的抗眩光塗覆膜,其中所述抗眩光塗層具有100奈米至300奈米的表面粗糙度(Ra)。
- 如請求項1所述的抗眩光塗覆膜,其中所述高硬度塗層具有10微米至50微米的厚度。
- 如請求項1所述的抗眩光塗覆膜,其中所述抗眩光塗層具有1微米至3微米的厚度。
- 如請求項1所述的抗眩光塗覆膜,其中所述顆粒為有機顆粒或無機顆粒。
- 如請求項6所述的抗眩光塗覆膜,其中所述無機顆粒包含二氧化矽顆粒。
- 如請求項6所述的抗眩光塗覆膜,其中所述有機顆粒包含苯乙烯珠、丙烯酸珠及交聯丙烯酸珠中的至少一者。
- 如請求項1所述的抗眩光塗覆膜,其中相對於所述第二組成物的固體含量,所述顆粒以1重量%至5重量%的量存在。
- 如請求項1所述的抗眩光塗覆膜,其中所述基板包括聚醯亞胺膜、聚萘二甲酸乙二醇酯膜、三乙醯基纖維素膜、環烯烴聚合物膜、環烯烴共聚物膜及丙烯酸膜中的至少一者。
- 如請求項1所述的抗眩光塗覆膜,其中所述抗眩光塗覆膜具有40至100的光澤單位。
- 如請求項1所述的抗眩光塗覆膜,其中所述抗眩光塗覆膜具有90或大於90的透射率。
- 如請求項1所述的抗眩光塗覆膜,其中所述抗眩光塗覆膜具有30或小於30的霧度。
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2018-0156565 | 2018-12-07 | ||
KR20180156565 | 2018-12-07 | ||
KR1020190160469A KR20200070117A (ko) | 2018-12-07 | 2019-12-05 | 방현성 코팅용 수지 조성물 및 이를 포함하여 제조된 방현성 코팅 필름 |
KR10-2019-0160469 | 2019-12-05 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW202031819A true TW202031819A (zh) | 2020-09-01 |
TWI735095B TWI735095B (zh) | 2021-08-01 |
Family
ID=71405485
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW108144717A TWI735095B (zh) | 2018-12-07 | 2019-12-06 | 抗眩光塗覆膜 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20210317321A1 (zh) |
EP (1) | EP3892695A4 (zh) |
KR (1) | KR20200070117A (zh) |
CN (1) | CN113166586A (zh) |
TW (1) | TWI735095B (zh) |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7695781B2 (en) * | 2004-02-16 | 2010-04-13 | Fujifilm Corporation | Antireflective film, polarizing plate including the same, image display unit including the same and method for producing antireflective film |
JP4885441B2 (ja) * | 2004-11-18 | 2012-02-29 | コニカミノルタオプト株式会社 | 防眩性反射防止フィルム、偏光板および画像表示装置 |
WO2008020613A1 (fr) * | 2006-08-18 | 2008-02-21 | Dai Nippon Printing Co., Ltd. | Laminé optique, plaque polarisante, et appareil de présentation d'images |
KR20080070349A (ko) * | 2007-01-26 | 2008-07-30 | 동우 화인켐 주식회사 | 방현성 하드코팅액 및 이를 사용한 고경도 하드코팅 필름 |
JP2010527046A (ja) * | 2007-05-16 | 2010-08-05 | エルジー・ケム・リミテッド | アンチグレアフィルム用組成物およびそれを用いて製造したアンチグレアフィルム |
TWI327958B (en) * | 2007-05-28 | 2010-08-01 | Daxon Technology Inc | Antireflective film and method for making thereof |
JP4848072B2 (ja) * | 2009-03-30 | 2011-12-28 | 日本製紙ケミカル株式会社 | 防眩ハードコートフィルム |
WO2011099505A1 (ja) * | 2010-02-15 | 2011-08-18 | Jsr株式会社 | 屋外設置用デバイスおよび屋外設置用デバイス用反射防止層 |
KR20120009608A (ko) * | 2010-07-19 | 2012-02-02 | 동우 화인켐 주식회사 | 방현성 하드코팅 조성물, 이를 이용한 방현 필름, 편광판 및 표시 장치 |
JP2012159691A (ja) * | 2011-01-31 | 2012-08-23 | Fujifilm Corp | 防眩フィルム、偏光板、画像表示装置、及び防眩フィルムの製造方法 |
JP6986339B2 (ja) * | 2015-08-18 | 2021-12-22 | 日本精化株式会社 | 反射防止膜形成用組成物、反射防止膜およびその形成方法 |
KR102120989B1 (ko) * | 2016-01-07 | 2020-06-09 | 주식회사 엘지화학 | 눈부심 방지용 수지 조성물 및 이를 이용한 눈부심 방지 필름 |
JP6651940B2 (ja) * | 2016-03-29 | 2020-02-19 | 日油株式会社 | インサート成形用防眩性反射防止フィルム及びこれを用いた樹脂成形品 |
-
2019
- 2019-12-05 KR KR1020190160469A patent/KR20200070117A/ko not_active IP Right Cessation
- 2019-12-06 TW TW108144717A patent/TWI735095B/zh not_active IP Right Cessation
- 2019-12-06 US US17/267,748 patent/US20210317321A1/en not_active Abandoned
- 2019-12-06 EP EP19893597.5A patent/EP3892695A4/en not_active Withdrawn
- 2019-12-06 CN CN201980080706.4A patent/CN113166586A/zh active Pending
Also Published As
Publication number | Publication date |
---|---|
EP3892695A4 (en) | 2022-08-31 |
TWI735095B (zh) | 2021-08-01 |
US20210317321A1 (en) | 2021-10-14 |
KR20200070117A (ko) | 2020-06-17 |
CN113166586A (zh) | 2021-07-23 |
EP3892695A1 (en) | 2021-10-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US10876018B2 (en) | Hard coating composition and window member having hard coating layer | |
US20090004462A1 (en) | Inorganic-Organic Hybrid Nanocomposite Antiglare and Antireflection Coatings | |
JP2011088787A (ja) | 反射防止膜用組成物、反射防止膜、反射防止膜の製造方法、反射防止膜付き基材 | |
US20180010012A1 (en) | Resin composition for hard coating, and hard-coating film comprising cured form of same as coating layer | |
WO2013094585A1 (ja) | ガラス繊維複合化樹脂基板 | |
JP5316348B2 (ja) | 光硬化性コーティング剤組成物及びその硬化皮膜を有する物品 | |
JP2004231934A (ja) | 透明複合体組成物 | |
JP6994562B2 (ja) | コーティング用樹脂組成物及びその硬化物をコーティング層として含むコーティングフィルム | |
US11034798B2 (en) | Fast curing tintable optical coating | |
KR102109345B1 (ko) | 하드 코팅용 수지 조성물 및 이의 경화물을 코팅층으로 포함하는 하드코팅 필름 | |
US20230323058A1 (en) | Optical multilayer structure, method of manufacturing the same and window cover film comprising the same | |
TWI688621B (zh) | 用於塗佈的組成物以及包含所述組成物的固化產物以作為塗佈層的塗佈膜 | |
KR20160055655A (ko) | 하드코팅층 형성용 조성물 | |
TWI735095B (zh) | 抗眩光塗覆膜 | |
WO2018179687A1 (ja) | 含フッ素共重合体、膜形成用組成物、及び光学フィルム | |
KR20180012104A (ko) | 저굴절층 형성용 광경화성 코팅 조성물 | |
JP2022506660A (ja) | 防眩性コーティング用樹脂組成物及びこれを含んで製造された防眩性コーティングフィルム | |
JP2003266581A (ja) | 硬化被膜付き透明基材 | |
KR101555290B1 (ko) | 하드 코팅 조성물 | |
KR102381938B1 (ko) | 코팅용 수지 조성물 및 코팅필름 | |
TWI833329B (zh) | 塗覆膜、塗覆組成物以及顯示元件 | |
US20240002687A1 (en) | Composition for coating of optical substrates and the use thereof | |
JP7517660B2 (ja) | 光学積層体およびこれを含むフレキシブルディスプレイ装置 | |
KR20210081900A (ko) | 코팅용 수지 조성물 및 코팅필름 | |
JP2024501200A (ja) | シルセスキオキサン樹脂、及びこれを含む耐指紋特性の反射防止組成物 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |