TW202014364A - 基板處理裝置 - Google Patents

基板處理裝置 Download PDF

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TW202014364A
TW202014364A TW108123530A TW108123530A TW202014364A TW 202014364 A TW202014364 A TW 202014364A TW 108123530 A TW108123530 A TW 108123530A TW 108123530 A TW108123530 A TW 108123530A TW 202014364 A TW202014364 A TW 202014364A
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桑原丈二
稲垣幸彥
村井征爾
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日商斯庫林集團股份有限公司
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Abstract

本發明係一種基板處理裝置，其處理基板，上述裝置包含以下要素：分度區塊，其針對每個載具載置部具備分度機器人，上述分度機器人具有用以自上述載具載置部之載具取出基板且將基板收納於上述載具載置部之載具之臂，且水平方向之位置固定；橋接區塊，其與上述分度區塊鄰接配置；及處理區塊，其具有多個階層，上述多個階層積層有具備至少1個以上之處理單元之階層；且上述橋接區塊具備：緩衝部；通路部，其設置於自多個階層之最下層至最上層之範圍；及兩台橋接機械人，其等具有於與上述通路部之間交接基板之臂。

Description

基板處理裝置
本發明係關於一種對半導體晶片、液晶顯示器用基板、電漿顯示器用基板、有機EL(Electro-Luminescence，電致發光)用基板、FED(Field Emission Display，場致發射顯示器)用基板、光顯示器用基板、磁碟用基板、磁光碟用基板、光遮罩用基板、太陽電池用基板等各種基板(以下簡稱為基板)進行特定處理之基板處理裝置，尤其涉及一種搬送基板之技術。
先前，作為此種裝置，有如下裝置，其具備載具區塊、處理區塊、介面區塊及曝光裝置(例如參照日本專利特開2013-69917號公報)。
載具區塊具備4個載具載置部，上述4個載具載置部供載置收納有處理前之基板之載具，或供載置收納處理後之基板之空載具。又，載具區塊於與載具載置部對向之位置配置有具備交接臂之兩台分度機器人，上述交接臂自載置於載具載置部之載具取出基板，或將基板收容到載置於載具載置部之空載具中。於兩台分度機器人之間，配置有用以於與處理區塊之間交接基板之塔部。該分度機器人可配合於4台載具載置部之位置於水平方向上移動，並且可配合於塔部之高度而跨及相當於處理區塊內之階層中之最下層到最上層之高度之位置升降。
處理區塊由6個階層之區塊構成。處理區塊於各階層具備對基板進行處理之液體處理單元等。各階層於俯視下於中央具備主臂，於主臂搬送路徑之一側具備液體處理單元，於另一側具備加熱單元等。處理區塊具備交接臂及自處理區塊之最下層跨及至最上層之支架單元。
介面區塊負責處理區塊與曝光裝置之間之基板搬送。
於上述構成之裝置中，將基板自載具區塊之塔部取入至支架單元，經由支架單元及交接臂將基板分配至處理區塊中之6個階層中進行處理。由此可增加每單位時間能處理之基板之片數。然而，最近，為了進一步提昇生產性，期望提昇基板處理裝置中之處理量。為此，為了於不增大佔據面積之情況下提昇處理量，提出進一步增加處理區塊之階層之數量。
然而，具有此種構成之先前例存在如下問題。
即，先前之裝置由於增加處理區塊內之階層數而高度變高，相對應地，於與處理區塊之間交接基板之載具區塊之塔部之高度亦必須變高。然而，載具區塊由於於利用無塵室之天花板搬送載具之OHT(Overhead Hoist Transport，亦稱為高架行駛式無人搬送車)與載具載置部之間進行載具交接，因此，若使載具區塊之塔部之高度變高，則有與OHT相干渉之虞。因此，存在如下問題，即無法增高載具區塊之塔部之高度，故即使增加處理區塊之階層數，載具區塊與處理區塊之間之基板搬送效率亦變低，因此即便增加處理區塊之階層數亦無法如所期待般提昇處理量。
本發明係鑒於此種情況而完成者，其目的在於提供一種可對應於增加處理區塊之階層數而提昇處理量之基板處理裝置。
本發明為了達成此種目的而採取如下構成。
本發明係一種基板處理裝置，其對基板進行處理，上述裝置包含以下要素，即為：分度區塊，其具備至少兩台用以於與高架行駛式無人搬送車之間交接收納基板之載具之載具載置部，且為了自載具載置部之載具取出基板且將基板收納至載具載置部之載具中，而針對上述每個載具載置部具備分度機器人，上述分度機器人具有可向水平方向進退、於水平面內回轉、向垂直方向升降之臂，且水平方向之位置相對於上述各載具載置部固定；橋接區塊，其與上述分度區塊鄰接配置；及處理區塊，其與上述橋接區塊鄰接配置，具有多個階層，上述多個階層積層有具備至少1個以上之處理單元之階層；且上述分度區塊之高度未達上述處理區塊之最上層，上述橋接區塊具備：緩衝部，其配置於上述分度區塊側且可利用上述分度機器人交接基板之位置，於高度方向上具備用以載置基板之多級台；通路部，其配置於上述處理區塊側且可於與上述處理區塊之間交接基板之位置，於上述處理區塊之階層方向上，自上述處理區塊中之多個階層之最下層跨及至最上層而具備用以載置基板之多級台；及兩台橋接機械人，其等具有於與上述通路部之間交接基板之臂。
根據本發明，橋接區塊具備自處理區塊中之最下層跨及至最上層而設置之通路部。因此，雖分度機器人之臂到達不了處理區塊之最上層，但橋接區塊可將利用分度機器人自載具載置部之載具載置至緩衝部之基板利用兩台橋接機械人經由通路部亦搬送至處理區塊中之最上層之處理單元。其結果，可對應於增加處理區塊之階層數而提昇處理量。
又，於本發明中，較佳為上述處理區塊針對上述多個階層中之每特定階層數具備於上述處理單元及上述通路部交接基板之1台搬送機械人，上述通路部由針對上述多個階層中之每特定階層數而分離配置之多個分離通路部構成。
由於針對每特定階層數具備於處理單元間進行基板之搬送之搬送機械人，故可提昇各處理單元間之基板搬送效率。又，由於通路部由多個分離通路部構成，故可實現分離通路部之輕量化。
又，於本發明中，較佳為上述各分離通路部中配置於上方之分離通路部相對於上述多個階層配置於靠向下方，配置於中央之分離通路部相對於上述多個階層配置於中央，配置於下方之分離通路部相對於上述多個階層配置於靠向上方。
可縮短橋接機械人於與分離通路部之間交接基板時所需之升降移動距離。因此，可提昇利用橋接機械人之於與分離通路部之間之搬送效率。
又，於本發明中，較佳為上述處理區塊省略將針對每上述特定階層數而配置之上述搬送機械人彼此隔開之隔間。
由於針對每特定階層數而配置之搬送機械人彼此未利用隔間隔開，故保養搬送機械人時，作業人員可容易進行作業。
又，於本發明中，較佳為上述處理單元具備對基板供給處理液之功能，自配置於下部且貯存上述處理液之處理液箱對上述各階層之處理單元供給處理液之泵及過濾器配置於較上述多個階層之最上層更靠下方。
由於泵及過濾器配置於較最上層之處理單元靠下方，故可抑制自處理液箱往上吸處理液時之負壓。因此，可抑制處理液產生發泡，可提昇利用處理液進行之處理之品質。
又，於本發明中，上述分度區塊較佳為於與上述各載具載置部對向之位置配置有上述各分度機器人。
由於於載具載置部之對向之位置配置各分度機器人，故於分度機器人與載具載置部之間交接基板時，可有效率地進行臂之移動。
又，於本發明中，較佳為上述載具載置部至少於垂直方向上具備兩台以上，上述緩衝部之高度為載置於最上部之上述載具載置部之載具之上端以下。
由於於利用分度機器人於載具與緩衝部之間搬送基板時，可抑制分度機器人之上升高度，故可有效率地進行搬送。
又，於本發明中，較佳為上述載具載置部至少於垂直方向上具備兩台以上，上述緩衝部之高度為配置於最下部之載具載置部上所載置之載具之下端以上。
由於於利用分度機器人於載具與緩衝部之間搬送基板時，可抑制分度機器人之下降高度，故可有效率地進行搬送。
又，於本發明中，較佳為上述緩衝部之高度為最上部之通路部之上端以下且最下部之通路部之下端以上。
由於於利用分度機器人於載具與緩衝部之間搬送基板時，可抑制分度機器人之上升高度及下降高度，故可有效率地進行搬送。
以下，參照圖式對本發明之一實施例進行說明。
再者，圖1係表示實施例之基板處理裝置之整體構成之立體圖，圖2係基板處理裝置之右側視圖，圖3係基板處理裝置之後視圖，圖4係基板處理裝置之左側視圖，圖5係基板處理裝置之俯視圖，圖6係表示搬送系統之右側視圖。
本實施例之基板處理裝置1具備分度區塊3、橋接區塊5、處理區塊7及實用區塊9。
分度區塊3與橋接區塊5連結，於與橋接區塊5之間交接作為處理對象之基板W。橋接區塊5與處理區塊7連結，於與處理區塊7之間交接基板W。於處理區塊7，供給處理液給自橋接區塊5接收之基板W，然後，進行藉由加熱而於基板W上形成覆膜之處理等，並將結束處理之基板W搬送至橋接區塊5。實用區塊9與處理區塊7連結，具備供給處理液給處理區塊7之構成等。又，實用區塊9有於背面側與未圖示之曝光裝置等鄰接連結之情況。
上述分度區塊3、橋接區塊5、處理區塊7及實用區塊9以依該順序排成一行之方式配置。
於以下說明中，將分度區塊3、橋接區塊5、處理區塊7及實用區塊9排列之方向設為「前後方向X」(水平方向)。特別將自實用區塊9朝向分度區塊3之方向設為「前方XF」，將前方XF方向之相反方向設為「後方XB」。將與前後方向X於水平方向上正交之方向設為「寬度方向Y」。進而，於自分度區塊3之正面觀察之情形時，將寬度方向Y之一方向適當地設為「右方YR」，將與右方YR相反之另一方向設為「左方YL」。又，將垂直之方向設為「上下方向Z」(高度方向、垂直方向)。再者，於簡記作「側方」或「橫向」等時，並不限定於前後方向X及寬度方向Y中之任一方向。
分度區塊3具備載具載置部11、搬送空間AID、分度用搬送機械人TID及處理液箱配備部TU。關於載具載置部11，於本實施例中，具備4個載具載置部11。具體來說，於橫向上具備2個載具載置部11，於各自之上下方向Z之上方向具備1個載具載置部11。各載具載置部11供載置載具C。載具C積層並收納多片(例如50片)基板W，例如於與未圖示之OHT(Overhead Hoist Transport，亦稱為高架行駛式無人搬送車)之間進行載具C之交接。OHT利用無塵室之天花板搬送載具C。OHT由於無法於與配置於上下方向Z之下方之載具載置部11之間直接進行載具C之交接，因此，藉由使用未圖示之載具起重機等於與配置於上下方向Z之下方之載具載置部11之間交接載具C。作為載具C，例如可列舉FOUP(Front Opening Unified Pod，前開式晶片傳送盒)。
搬送空間AID配置於載具載置部11之後方XB。於搬送空間AID配置有分度用搬送機械人TID。分度用搬送機械人TID於與載具C之間交接基板W，並且於與橋接區塊5之間交接基板W。分度用搬送機械人TID配置有兩台。各分度用搬送機械人TID之前後方向X及寬度方向Y上之位置固定。各分度用搬送機械人TID配置於相對於配置於上下方向Z之兩台載具載置部11於寬度方向Y上對向之位置。換言之，於配置於上下方向Z之一對載具載置部11之寬度方向Y上之大致中央位置、且於前後方向X上向後方XB分開之對向位置，配置有1台分度用搬送機械人TID。於以下說明中，於必須區分兩台分度用搬送機械人TID之情形時，將其中一者設為分度用搬送機械人TID1，將另一者稱為分度用搬送機械人TID2。
再者，上述分度用搬送機械人TID相當於本發明中之「分度機器人」。
如上所述，於各載具載置部11之對向之位置配置有各分度用搬送機械人TID1、TID2，因此，於各分度用搬送機械人TID1、TID2與各載具載置部11之間交接基板W時，使臂19相對於載具載置部19進退即可。因此，可有效率地進行基板W之交接。
如圖6所示，分度用搬送機械人TID具備基台部13、伸縮部15、保持部17及2根臂19。基台部13如圖5所示與載具載置部11對向配置，且前後方向X及寬度方向Y之位置固定。伸縮部15搭載於基台部13上，構成為可於上下方向Z上伸縮。保持部17配置於伸縮部15之上部，構成為可相對於基台部13及伸縮部15繞上下方向Z軸旋轉。2根臂19藉由保持部17於上下方向Z上積層並保持為水平姿勢，構成為可相對於前後方向X同時進退。分度用搬送機械人TID以2根臂19到達上下方向Z上之上方及下方之載具載置部11並到達下述緩衝部BF之最上級及最下級之方式藉由伸縮部15之伸縮而升降。
橋接區塊5具備搬送空間ABG、橋接用搬送機械人BT、緩衝部BF及通路部PS。
於搬送空間ABG配置有橋接用搬送機械人BT。具體來說，配置有兩台橋接用搬送機械人BT。橋接用搬送機械人BT配置於各分度用搬送機械人TID及緩衝部BF之後方XB。各橋接用搬送機械人BT隔著將緩衝部BF與通路部PS連接之線於右方YR及左方YL對向配置。各橋接用搬送機械人BT於前後方向X及寬度方向Y上位置固定。於以下說明中，於必須區分兩台橋接用搬送機械人BT之情形時，將其中一者設為橋接用搬送機械人BT1，將另一者稱為橋接用搬送機械人BT2。
再者，上述橋接用搬送機械人BT相當於本發明中之「橋接機械人」。
如圖6所示，橋接用搬送機械人BT具備基台部21、伸縮部23、保持部25及1根臂27。基台部21如圖5所示對向配置於分度用搬送機械人TID之後方XB，且前後方向X及寬度方向Y上之位置固定。伸縮部23搭載於基台部21上，構成為可於Z方向上伸縮。保持部25配置於伸縮部23之上部，構成為可相對於基台部21及伸縮部23繞上下方向Z軸旋轉。1根臂27藉由保持部25保持為水平姿勢，構成為可相對於前後方向X進退。橋接用搬送機械人BT以臂27到達上下方向Z上之緩衝部BF之最上級及最下級並到達通路部PS之最上級及最下級之方式藉由伸縮部23之伸縮而升降。
如圖5所示，緩衝部BF配置於分度區塊3與橋接區塊5之交界處。如圖6所示，緩衝部BF於上下方向Z上相隔地具備多級台29。多級台29分別豎立設置有3根銷31。3根銷31抵接於基板W之下表面，而以水平姿勢支持基板W。3根銷31僅具有臂19、27可進入到由3根銷31支持之基板W之下表面之長度。
緩衝部BF配置於可利用上述兩台分度區塊用搬送機械人TID交接基板W之位置，且配置於可利用兩台橋接用搬送機械人BT交接基板W之位置。即，緩衝部BF配置於可利用兩台分度區塊用搬送機械人TID及兩台橋接用搬送機械人BT同時交接至不同之台29之位置。換言之，緩衝部BF構成為分度區塊用搬送機械人TID1之2根臂19、分度區塊用搬送機械人TID2之2根臂19及橋接用搬送機械人BT1、BT2之2根臂27這6根臂19、27可同時存取。因此，如圖5所示，緩衝部BF例如藉由於分度區塊3與橋接區塊5之交界壁處於上下方向Z上豎立設置並隔著台29對向配置之支持柱33而相隔支持各台29。由此，可同時自4個方向存取緩衝部BF。
緩衝部BF之配置較佳為如下設置。即，緩衝部BF之上下方向Z之位置設定為分度區塊3之中間程度之高度。具體來說，為載置於上級之載具載置部11之載具C之上端以下且載置於下級之載具載置部11之載具C之下端以上。載具C之上端為與OHT相接之載具C本身之最上部，載具C之下端為與載具載置部11相接之載具C本身之最下部。又，緩衝部BF之上下方向Z之位置相對於下述之通路部PS為通路部PS之最上部之上端以下且通路部PS之最下部之下端以上。
藉由如此般限制緩衝部BF之上下方向Z之高度，於利用分度用搬送機械人TID於載具C與緩衝部BF之間搬送基板W時，可抑制分度用搬送機械人TID之上升高度及下降高度，因此，可有效率地進行搬送。
此處，於對通路部PS進行說明前，對處理區塊7進行說明。
如圖5所示，處理區塊7於俯視下寬度方向Y之大致中央部具備於前後方向X上形成之搬送空間ATB。處理區塊7於與橋接區塊5之交界處具備通路部PS。處理區塊7於搬送空間ATB之左方YL具備4個熱處理單元BU，於隔著搬送空間ATB之與4個熱處理單元BU為相反側之右方YR具備3個塗佈單元SU。3個塗佈單元SU具備噴嘴35。該噴嘴35經由實用區塊9供給來自設置於分度區塊3之下部之處理液箱配備部TU之處理液。熱處理單元BU實施例如將基板W加熱之處理及將經加熱處理之基板W冷卻之處理。
如圖3及圖4所示，處理區塊7將配置於前後方向X上之4個熱處理單元BU於上下方向Z上配置5層。又，與上述5層熱處理單元BU之上下方向Z之下方相隔地，具備5層熱處理單元BU。進而，與上述5層熱處理單元BU之上下方向Z之下方相隔地，具備5層熱處理單元BU。此處，將包括最上層之5層之熱處理單元BU設為第1熱處理單元群GBU1，將包括中間層之5層之熱處理單元BU設為第2熱處理單元群GBU2，將包括最下層之5層之熱處理單元BU設為第3熱處理單元群GBU3。
如圖2及圖3所示，處理區塊7將配置於前後方向X上之3個塗佈單元SU於上下方向Z上配置6層。此處，將其中包括最上層之2層之塗佈單元SU設為第1塗佈單元群GSU1，將包括中間層之2層之塗佈單元SU設為第2塗佈單元群GSU2，將包括最下層之2層之塗佈單元SU設為第3塗佈單元群GSU3。
如上所述，處理區塊7由熱處理單元BU為15個階層、塗佈單元SU為6個階層之多個階層構成。本實施例之處理區塊7中之階層數與先前例中之處理區塊相比將單元數設為約1.5倍以較先前例提高處理量。因此，相較於為了OHT於上方往返而限制高度之分度區塊3，處理區塊7之高度變高。
處理用搬送機械人TBS以於處理區塊7之多個階層中之第1熱處理單元群GBU1、第1塗佈單元群GSU1與通路部PS之間、第2熱處理單元群GBU2、第2塗佈單元群GSU2與通路部PS之間、第3熱處理單元群GBU3、及第3塗佈單元群GSU3與通路部PS之間搬送基板W之方式配置於搬送空間ATB。具體來說，處理用搬送機械人TBS1進行第1熱處理單元群GBU1等中之搬送，處理用搬送機械人TBS2進行第2熱處理單元群GBU2等中之搬送，處理用搬送機械人TBS3進行第3熱處理單元群GBU3等中之搬送。
如圖5及圖6所示，處理用搬送機械人TBS具備移動機構37、藉由移動機構37移動之移動基台39、搭載於移動基台，伸縮部41、保持部43、及2根臂45。移動機構37使移動基台39於前後方向X上移動。搭載於移動基台39上之伸縮部41藉由於上下方向Z上伸縮使保持部43於上下方向Z上移動。2根臂45積層配置於上下方向Z上，以可於包含前後方向X或寬度方向Y之水平面內進退之方式安裝於保持部43上。再者，2根臂45被交替地進退驅動，因此，成為無法同時進出或退出之構成。
如圖5及圖6所示，上述通路部PS具備與上述緩衝部BF相同之構成。
即，通路部PS配置於橋接區塊5與處理區塊7之交界處。通路部PS於上下方向Z上相隔地具備多級台47。多級台47分別豎立設置有3根銷49。3根銷49抵接於基板W之下表面，而以水平姿勢支持基板W。3根銷49僅具有臂27、45可進入到由3根銷支持之基板W之下表面之長度。
通路部PS配置於可利用上述兩台橋接用搬送機械人BT交接基板W之位置，且配置於可利用3台處理用搬送機械人TBS交接基板W之位置。即，通路部PS配置於可利用兩台橋接用搬送機械人BT及3台處理用搬送機械人TBS同時交接至不同之台47之位置。換言之，通路部PS構成為2根臂27、3根臂45這5根臂27、45可同時存取。為此，如圖5所示，於通路部PS例如藉由於橋接區塊5與處理區塊7之交界壁處於上下方向Z豎立設置、並隔著台47於寬度方向Y上對向配置之支持柱51，各台47有間隔地受支撐。由此，可自3個方向存取通路部PS。
又，如圖6所示，通路部PS未一體構成，例如於上下方向Z上分離為3個而構成。此處，於與第1熱處理單元群GBU1及第1塗佈單元群GSU1對應之位置配置有第1通路部PS1，於與第2熱處理單元群GBU2及第2塗佈單元群GSU2對應之位置配置有第2通路部PS2，於與第3熱處理單元群GBU3及第3塗佈單元群GSU3對應之位置配置有第3通路部PS3。進而，如圖2、圖4、圖6所示，第1通路部PS1相對於處理區塊7中之第1熱處理單元群GBU1及第1塗佈單元群GSU1之各階層配置於上下方向Z上之靠下方。又，第2通路部PS2相對於處理區塊7中之第2熱處理單元群GBU2及第2塗佈單元群GSU2之各階層配置於上下方向Z上之大致中央。進而，第3通路部PS3相對於處理區塊7中之第3熱處理單元群GBU3及第3塗佈單元群GSU3之各階層配置於上下方向Z上之靠上方。
由於如此般將通路部PS分離為通路部PS1～PS3並以上述上下方向Z上之位置關係進行配置，故可縮短橋接用搬送機械人BT於與各通路部PS1～PS3之間交接基板W時所需之升降移動距離。因此，可提昇橋接用搬送機械人BT與通路部PS之間之搬送效率。又，由於通路部PS由多個通路部PS1～PS3構成，故可實現通路部PS之輕量化。
再者，上述通路部PS1～PS3相當於本發明中之「分離通路部」。
如圖3所示，於自處理區塊7之背面側觀察上述各處理用搬送機械人TBS1～TBS3之情形時，搬送空間ATB未被分隔。即，省略了跨及熱處理單元BU及塗佈單元SU而安裝之隔間。由此，於保養各處理用搬送機械人TBS1～TBS3時，作業人員可容易進行作業。
如圖2所示，上述處理區塊7自處理液箱配備部TU對塗佈單元SU供給處理液。為此，使用實用區塊9之泵及過濾器61。於本實施例中，對第1塗佈單元群GSU1中之2個階層之各階層之塗佈單元SU、第2塗佈單元群GSU2中之2個階層之各階層之塗佈單元SU、及第3塗佈單元群GSU3中之2個階層之各階層之塗佈單元SU供給處理液之泵及過濾器61配置於實用區塊9。
具體來說，各泵及過濾器61自處理區塊7中較最上層靠下方之位置依序朝向下方配置。即，最上層係位於第1塗佈單元群GSU1之上層之塗佈單元SU，但用以對其供給處理液之泵及過濾器61配置於第1塗佈單元群GSU1之下層之塗佈單元SU之後方XB，用以對第1塗佈單元群GSU1之下層供給處理液之泵及過濾器61配置於第2塗佈單元群GSU2之上層之塗佈單元SU之後方XB。又，用以對第2塗佈單元群GSU2之上層供給處理液之泵及過濾器61配置於第2塗佈單元群GSU2之下層之塗佈單元SU之後方XB，用以對第2塗佈單元群GSU2之下層供給處理液之泵及過濾器61配置於第3塗佈單元群GSU3之上層之塗佈單元SU之後方XB。又，用以對第3塗佈單元群GSU3之上層供給處理液之泵及過濾器61配置於第3塗佈單元群GSU3之下層之塗佈單元SU之後方XB，用以對第3塗佈單元群GSU3之下層供給處理液之泵及過濾器61配置於較第3塗佈單元群GSU3之下層之塗佈單元SU更靠下方之後方XB。
於本實施例中，由於將泵及過濾器61設為上述配置，故可使自泵及過濾器61到噴嘴35之距離分別相等，並且抑制自配備於分度區塊3之下部之處理液箱配備部TU之處理液箱往上吸處理液時之負壓。因此，可抑制處理液產生發泡，可提昇利用處理液進行之處理之品質。
以上述方式構成之基板處理裝置例如以如下方式對基板W進行處理。處理例如為對基板W進行烘烤(以下稱為脫水烘烤)後，對基板W供給處理液而形成覆膜，然後，進行烘烤(以下稱為預烘烤)。
首先，將收容有未處理之基板W之4個載具C載置於4台載具載置部11上。然後，分度區塊3之分度用搬送機械人TID1、TID2分別對1個載具C存取，將載具C內之基板W以2片為單位取出，並且將基板W先載置於緩衝部BF之空台29上。分度用搬送機械人TID1、TID2反覆進行該取入動作直到全部載具C變空為止。
與上述取入動作並行地，橋接區塊之橋接用搬送機械人BT1、BT2自緩衝部BF搬送基板W到通路部PS之空著之台47且與處理區塊7中之搬送目的地之階層對應之通路部PS1、PS2、PS3中之任一者。搬送至通路部PS之基板W由處理用搬送機械人TBS1～TBS3搬送至任一熱處理單元BU，進行用於脫水烘烤之熱處理。結束熱處理之基板W由處理用搬送機械人TBS1～TBS3搬送至任一塗佈單元SU形成覆膜。然後，利用處理用搬送機械人TBS1～TBS3將基板W搬送至任一熱處理單元BU，進行預烘烤。結束全部處理之基板W經由通路部PS、橋接區塊5、分度區塊3返回到載置於載具載置台11之於處理前收容該基板W之載具C。
如此，根據本實施例，橋接區塊5具備自處理區塊7中之最下層跨及至最上層而設置之通道PS。因此，雖分度用搬送機械人TID之臂19無法到達處理區塊7之最上層，但橋接區塊5可將自載具載置部11之載具C利用分度用搬送機械人TID載置到緩衝部BF之基板W利用兩台橋接用搬送機械人BT1、BT2經由通路部PS亦搬送至處理區塊7中之最上層之熱處理單元BU及塗佈單元SU。其結果，可藉由增加處理區塊7之階層數來提昇處理量。
本發明並不限定於上述實施方式，可如下變化實施。
(1)於上述實施例中，將載具載置部11設為4個之構成，但本發明並不限定於此種構成。例如，載具載置部11可設為2個，亦可設為超過4個之個數。
(2)於上述實施例中，使分度用搬送機械人TID1、TID2與載具載置部11之正面對向配置，但本發明並不限定於此種構成。即，分度用搬送機械人TID1、TID2只要為可對載具載置部11存取且可對緩衝部BF存取之位置，則亦可不為與載具載置部11之正面對向之位置。又，分度用搬送機械人TID具備2根臂19，但本發明並不限定於此種構成，亦可為具備1根臂或3根以上之臂之構成。
(3)於上述實施例中，使兩台分度用搬送機械人TID1、TID2與載具載置部11之正面對向配置，但本發明並不限定於此種構成。即，分度用搬送機械人TID1、TID2只要為可對載具載置部11存取且可對緩衝部BF存取之位置，則亦可使兩台分度用搬送機械人TID1、TID2由1台分度用搬送機械人TID構成。
(4)於上述實施例中，分度用搬送機械人TID設為具備基台部13、伸縮部15、保持部17及臂19之構成，但本發明並不限定於此種構成。即，只要分度用搬送機械人TID不於水平方向上移動地固定並可對載具載置部11及緩衝部BF存取，則可為任意構成。
(5)於上述實施例中，緩衝部BF設為以支柱33保持多個台29而可自4個方向存取之構成，但只要可自4個方向存取緩衝部BF即可，本發明並不限定於此種構成。
(6)於上述實施例中，橋接用搬送機械人BT設為具備基台部21、伸縮部23、保持部25及臂27之構成，但本發明並不限定於此種構成。即，只要橋接用搬送機械人BT不於水平方向上移動地固定並可對緩衝部BF及通路部PS存取，則可為任意構成。
(7)於上述實施例中，通路部PS設為以支柱51保持多個台49而可自3個方向存取，但只要可自3個方向存取通路部PS即可，並不限定於此種構成。又，於實施例中，採用分割成通路部PS1～PS3之構成，但亦可將通路部PS一體構成。
(8)於上述實施例中，設為將泵及過濾器61配置於較最上層靠下方之構成，但本發明並不限定於此種構成。
(9)於上述實施例中，作為載具C列舉FOUP進行了說明，但本發明並不限定於FOUP。 本發明可於不脫離其精神或本質屬性之情況下以其他特定形式實施。因此，應參照隨附申請專利範圍而非以上說明來指示本發明之範圍。
1:基板處理裝置 3:分度區塊 5:橋接區塊 7:處理區塊 9:實用區塊 11:載置部 13:基台部 15:伸縮部 17:保持部 19:臂 21:基台部 23:伸縮部 25:保持部 27:臂 29:台 31:銷 33:支持柱 35:噴嘴 37:移動機構 39:移動基台 41:伸縮部 43:保持部 45:臂 47:台 49:銷 51:支持柱 61:過濾器 ABG:搬送空間 ATB:搬送空間 AID:搬送空間 BF:緩衝部 BT:橋接用搬送機械人 BT1:橋接用搬送機械人 BT2:橋接用搬送機械人 BU:熱處理單元 C:載具 GBU1:第1熱處理單元群 GBU2:第2熱處理單元群 GBU3:第3熱處理單元群 GSU1:第1塗佈單元群 GSU2:第2塗佈單元群 GSU3:第3塗佈單元群 PS:通路部 PS1:通路部 PS2:通路部 PS3:通路部 SU:塗佈單元 TBS:處理用搬送機械人 TBS1:處理用搬送機械人 TBS2:處理用搬送機械人 TBS3:處理用搬送機械人 TID:分度用搬送機械人 TID1:分度用搬送機械人 TID2:分度用搬送機械人 TU:處理液箱配備部 W:基板 X:前後方向 XF:前方 XB:後方 Y:寬度方向 YL:左方 YR:右方 Z:上下方向
※為了說明本發明，於圖式中示出目前較佳之若干種形式，然而，應理解本發明並不嚴格限定於所示設備和裝置。
圖1係表示實施例之基板處理裝置之整體構成之立體圖； 圖2係基板處理裝置之右側視圖； 圖3係基板處理裝置之後視圖； 圖4係基板處理裝置之左側視圖； 圖5係基板處理裝置之俯視圖； 圖6係表示搬送系統之右側視圖。
1:基板處理裝置
3:分度區塊
5:橋接區塊
7:處理區塊
9:實用區塊
11:載置部
19:臂
27:臂
29:台
31:銷
33:支持柱
35:噴嘴
37:移動機構
39:移動基台
43:保持部
45:臂
47:台
49:銷
51:支持柱
ABG:搬送空間
ATB:搬送空間
AID:搬送空間
BF:緩衝部
BT:橋接用搬送機械人
BT1:橋接用搬送機械人
BT2:橋接用搬送機械人
BU:熱處理單元
C:載具
PS:通路部
SU:塗佈單元
TBS:處理用搬送機械人
TID:分度用搬送機械人
TID1:分度用搬送機械人
TID2:分度用搬送機械人
TU:處理液箱配備部
W:基板
X:前後方向
XF:前方
XB:後方
Y:寬度方向
YL:左方
YR:右方
Z:上下方向

Claims (20)

  1. 一種基板處理裝置，其處理基板，上述裝置包含以下要素：分度區塊，其包含至少兩台用以於與高架行駛式無人搬送車之間交接收納基板之載具之載具載置部，為了自載具載置部之載具取出基板且將基板收納至載具載置部之載具中，而針對上述每個載具載置部具備分度機器人，上述分度機器人具有可向水平方向進退、於水平面內回轉、向垂直方向升降之臂，且相對於上述各載具載置部水平方向之位置固定； 橋接區塊，其與上述分度區塊鄰接配置；及 處理區塊，其與上述橋接區塊鄰接配置，具有多個階層，上述多個階層積層有具備至少1個以上之處理單元之階層；且 上述分度區塊之高度未達上述處理區塊之最上層， 上述橋接區塊包含：緩衝部，其配置於上述分度區塊側且可利用上述分度機器人交接基板之位置，於高度方向上具備用以載置基板之多層台；通路部，其配置於上述處理區塊側且可於與上述處理區塊之間交接基板之位置，於上述處理區塊之階層方向上，自上述處理區塊中之多個階層之最下層至最上層具備用以載置基板之多層台；及兩台橋接機械人，其等具有於與上述通路部之間交接基板之臂。
  2. 如請求項1之基板處理裝置，其中 上述處理區塊針對上述多個階層中之每特定階層數，具備於上述處理單元及上述通路部交接基板之1台搬送機械人， 上述通路部係由針對上述多個階層中每特定階層數分離配置之多個分離通路部而構成。
  3. 如請求項2之基板處理裝置，其中 上述各分離通路部中配置於上方之分離通路部，係相對於上述多個階層配置於靠下方，配置於中央之分離通路部，係相對於上述多個階層配置於中央，配置於下方之分離通路部，係相對於上述多個階層配置於靠上方。
  4. 如請求項2之基板處理裝置，其中 上述處理區塊省略將針對每上述特定階層數而配置之上述搬送機械人彼此隔開之隔間。
  5. 如請求項3之基板處理裝置，其中 上述處理區塊省略將針對每上述特定階層數而配置之上述搬送機械人彼此隔開之隔間。
  6. 如請求項1之基板處理裝置，其中 上述處理單元具備供給處理液給基板之功能，將處理液自配置於下部且貯存上述處理液之處理液箱供給至上述各階層之處理單元之泵及過濾器，係配置於較上述多個階層之最上層靠下方。
  7. 如請求項2之基板處理裝置，其中 上述處理單元具備供給處理液給基板之功能，將處理液自配置於下部且貯存上述處理液之處理液箱供給至上述各階層之處理單元之泵及過濾器，係配置於較上述多個階層之最上層靠下方。
  8. 如請求項3之基板處理裝置，其中 上述處理單元具備供給處理液給基板之功能，將處理液自配置於下部且貯存上述處理液之處理液箱供給至上述各階層之處理單元之泵及過濾器，係配置於較上述多個階層之最上層靠下方。
  9. 如請求項4之基板處理裝置，其中 上述處理單元具備供給處理液給基板之功能，將處理液自配置於下部且貯存上述處理液之處理液箱供給至上述各階層之處理單元之泵及過濾器，係配置於較上述多個階層之最上層靠下方。
  10. 如請求項1之基板處理裝置，其中 上述分度區塊於與上述各載具載置部對向之位置，配置有上述各分度機器人。
  11. 如請求項2之基板處理裝置，其中 上述分度區塊於與上述各載具載置部對向之位置，配置有上述各分度機器人。
  12. 如請求項3之基板處理裝置，其中 上述分度區塊於與上述各載具載置部對向之位置，配置有上述各分度機器人。
  13. 如請求項4之基板處理裝置，其中 上述分度區塊於與上述各載具載置部對向之位置，配置有上述各分度機器人。
  14. 如請求項6之基板處理裝置，其中 上述分度區塊於與上述各載具載置部對向之位置，配置有上述各分度機器人。
  15. 如請求項1之基板處理裝置，其中 上述載具載置部至少於垂直方向上具備兩台以上，上述緩衝部之高度為載置於最上部之上述載具載置部之載具之上端以下。
  16. 如請求項2之基板處理裝置，其中 上述載具載置部至少於垂直方向上具備兩台以上，上述緩衝部之高度為載置於最上部之上述載具載置部之載具之上端以下。
  17. 如請求項1之基板處理裝置，其中 上述載具載置部至少於垂直方向上具備兩台以上，上述緩衝部之高度為載置於配置於最下部之載具載置部之載具之下端以上。
  18. 如請求項2之基板處理裝置，其中 上述載具載置部至少於垂直方向上具備兩台以上，上述緩衝部之高度為載置於配置於最下部之載具載置部之載具之下端以上。
  19. 如請求項1之基板處理裝置，其中 上述緩衝部之高度為最上部之通路部之上端以下，且最下部之通路部之下端以上。
  20. 如請求項2之基板處理裝置，其中 上述緩衝部之高度為最上部之通路部之上端以下，且最下部之通路部之下端以上。
TW108123530A 2018-09-21 2019-07-04 基板處理裝置 TWI738021B (zh)

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