TW201914737A - Processing device - Google Patents

Processing device Download PDF

Info

Publication number
TW201914737A
TW201914737A TW107133769A TW107133769A TW201914737A TW 201914737 A TW201914737 A TW 201914737A TW 107133769 A TW107133769 A TW 107133769A TW 107133769 A TW107133769 A TW 107133769A TW 201914737 A TW201914737 A TW 201914737A
Authority
TW
Taiwan
Prior art keywords
processing
cutting
machining
platform
cover
Prior art date
Application number
TW107133769A
Other languages
Chinese (zh)
Other versions
TWI734937B (en
Inventor
原田昭如
石橋幹司
白井克昌
Original Assignee
日商Towa股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商Towa股份有限公司 filed Critical 日商Towa股份有限公司
Publication of TW201914737A publication Critical patent/TW201914737A/en
Application granted granted Critical
Publication of TWI734937B publication Critical patent/TWI734937B/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B26HAND CUTTING TOOLS; CUTTING; SEVERING
    • B26DCUTTING; DETAILS COMMON TO MACHINES FOR PERFORATING, PUNCHING, CUTTING-OUT, STAMPING-OUT OR SEVERING
    • B26D7/00Details of apparatus for cutting, cutting-out, stamping-out, punching, perforating, or severing by means other than cutting
    • B26D7/20Cutting beds
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67092Apparatus for mechanical treatment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B26HAND CUTTING TOOLS; CUTTING; SEVERING
    • B26DCUTTING; DETAILS COMMON TO MACHINES FOR PERFORATING, PUNCHING, CUTTING-OUT, STAMPING-OUT OR SEVERING
    • B26D7/00Details of apparatus for cutting, cutting-out, stamping-out, punching, perforating, or severing by means other than cutting
    • B26D7/06Arrangements for feeding or delivering work of other than sheet, web, or filamentary form
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B26HAND CUTTING TOOLS; CUTTING; SEVERING
    • B26DCUTTING; DETAILS COMMON TO MACHINES FOR PERFORATING, PUNCHING, CUTTING-OUT, STAMPING-OUT OR SEVERING
    • B26D7/00Details of apparatus for cutting, cutting-out, stamping-out, punching, perforating, or severing by means other than cutting
    • B26D7/18Means for removing cut-out material or waste
    • B26D7/1845Means for removing cut-out material or waste by non mechanical means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B26HAND CUTTING TOOLS; CUTTING; SEVERING
    • B26DCUTTING; DETAILS COMMON TO MACHINES FOR PERFORATING, PUNCHING, CUTTING-OUT, STAMPING-OUT OR SEVERING
    • B26D7/00Details of apparatus for cutting, cutting-out, stamping-out, punching, perforating, or severing by means other than cutting
    • B26D2007/0012Details, accessories or auxiliary or special operations not otherwise provided for
    • B26D2007/0018Trays, reservoirs for waste, chips or cut products
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B26HAND CUTTING TOOLS; CUTTING; SEVERING
    • B26DCUTTING; DETAILS COMMON TO MACHINES FOR PERFORATING, PUNCHING, CUTTING-OUT, STAMPING-OUT OR SEVERING
    • B26D7/00Details of apparatus for cutting, cutting-out, stamping-out, punching, perforating, or severing by means other than cutting
    • B26D7/20Cutting beds
    • B26D2007/208Cutting beds having a cleaning device
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/10Greenhouse gas [GHG] capture, material saving, heat recovery or other energy efficient measures, e.g. motor control, characterised by manufacturing processes, e.g. for rolling metal or metal working

Landscapes

  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Forests & Forestry (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Auxiliary Devices For Machine Tools (AREA)
  • Sawing (AREA)
  • Dicing (AREA)

Abstract

The disclosure reduces processing waste remaining on upper surfaces of a plurality of cover elements which form protective covers. The processing device of the disclosure includes a processing table for holding an object to be processed; a moving mechanism for linearly moving the processing table; the protective covers having the plurality of cover elements which cover the moving mechanism and overlap with one another, wherein the protective covers extend and contract along with the moving of the processing table; and a slide member moving relative to the plurality of protective covers along with the processing table and sliding on the upper surfaces of the plurality of cover elements.

Description

加工裝置Processing device

本發明關於一種加工裝置。The invention relates to a processing device.

以往,在對經樹脂密封的已密封基板等電子零件進行切斷而單片化時,使用切斷裝置,例如已知有如專利文獻1所示的切削裝置。所述切削裝置具有:卡夾平臺(chuck table),保持加工對象物;以及例如滾珠螺桿等移動機構,使所述卡夾平臺直線移動。而且,切削裝置具有保護板(plate),所述保護板用於保護所述移動機構不受切削加工對象物而產生的切削屑或切削時所供給的例如水等加工液侵害。Conventionally, when an electronic component such as a sealed substrate sealed with a resin is cut and singulated, a cutting device is used, and for example, a cutting device shown in Patent Document 1 is known. The cutting device includes a chuck table that holds an object to be processed, and a moving mechanism such as a ball screw that linearly moves the chuck table. In addition, the cutting device includes a protection plate for protecting the moving mechanism from cutting chips generated by cutting an object to be processed or machining fluid such as water supplied during cutting.

所述保護板是可伴隨卡夾平臺的移動而伸縮地構成。具體而言,保護板具有:波紋罩,以包圍所述移動機構的上方及側方的方式而設;以及構成保護板的多個板,設於所述波紋罩的上表面。所述各板是多個依序重疊而構成,伴隨卡夾平臺的移動而相互滑動。The protection plate is configured to be telescopic in accordance with the movement of the clip platform. Specifically, the protective plate includes a corrugated cover provided so as to surround the upper and lateral sides of the moving mechanism, and a plurality of plates constituting the protective plate provided on the upper surface of the corrugated cover. Each of the plates is configured to be sequentially overlapped, and slides with each other as the clip platform moves.

當藉由所述切削裝置來使加工對象物單片化時,會產生製品部與邊角料等切削屑。製品部由設於卡夾平臺的卡夾機構予以保持。When an object to be processed is singulated by the cutting device, cutting chips such as a product portion and a scrap are generated. The product section is held by a clamping mechanism provided on the clamping platform.

但是,切削屑未受所述卡夾機構保持,因此從製品部切削後會從卡夾平臺飛散或掉落到外部。所述飛散的切削屑會積留在保護板中的各板的上表面。若卡夾平臺在所述狀態下移動,則在保護板伴隨所述卡夾平臺的移動而收縮的過程中,切削屑有可能侵入彼此重疊的各板之間。若有加工屑侵入板之間,則不僅會妨礙保護板的伸縮,而且擔心接觸到波紋罩而導致波紋罩發生破損。若波紋罩發生破損,則加工液會洩漏到移動機構,使移動機構生銹,引起動作不良或故障。其結果,必須頻繁地進行它們的維護作業或更換作業,導致切削裝置的運轉率下降。 [現有技術文獻] [專利文獻]However, since the cutting chips are not held by the chuck mechanism, they are scattered from the chuck platform or dropped to the outside after being cut from the product part. The flying chips may accumulate on the upper surface of each of the protective plates. If the clamp platform is moved in the state described above, in the process that the protective plate contracts with the movement of the clamp platform, cutting chips may invade between the plates that overlap each other. If machining debris penetrates between the plates, it will not only hinder the expansion and contraction of the protective plate, but also cause damage to the bellows due to contact with the bellows. If the corrugated cover is damaged, the processing fluid will leak to the moving mechanism, causing the moving mechanism to rust, causing malfunction or failure. As a result, the maintenance work or replacement work must be performed frequently, resulting in a decrease in the operation rate of the cutting device. [Prior Art Literature] [Patent Literature]

[專利文獻1]日本專利第6043648號公報[Patent Document 1] Japanese Patent No. 6043648

[發明所要解決的問題] 因此,本發明是為了解決所述問題而完成,其主要課題在於,減少殘留在構成保護罩的多個罩元件上表面的加工屑。 [解決問題的技術手段][Problems to be Solved by the Invention] Accordingly, the present invention has been made in order to solve the problems described above, and a main object thereof is to reduce machining debris remaining on the upper surfaces of a plurality of cover elements constituting a protective cover. [Technical means to solve the problem]

即,本發明的加工裝置的特徵在於包括:加工平臺,保持加工對象物;移動機構,使所述加工平臺直線移動;保護罩,具有覆蓋所述移動機構並且彼此重疊的多個罩元件,伴隨所述加工平臺的移動而伸縮;以及滑動構件,伴隨所述加工平臺而相對於所述保護罩朝所述加工平臺移動的方向相對地移動,在所述多個罩元件的上表面滑動。 [發明的效果]That is, the processing device of the present invention includes a processing platform that holds a processing object, a moving mechanism that linearly moves the processing platform, and a protective cover having a plurality of cover elements that cover the moving mechanism and overlap each other. The processing platform moves and retracts; and a sliding member moves relative to the protective cover toward the processing platform along with the processing platform, and slides on the upper surfaces of the plurality of cover elements. [Effect of the invention]

根據以上述方式構成的本發明,能夠減少殘留在構成保護罩的多個罩元件上表面的加工屑。According to the present invention configured as described above, it is possible to reduce machining debris remaining on the upper surfaces of the plurality of cover elements constituting the protective cover.

接下來,舉例來進一步詳細地說明本發明。但是,本發明並不受以下的說明限定。Next, the present invention will be described in more detail with examples. However, the present invention is not limited by the following description.

本發明的加工裝置如前所述,其特徵在於包括:加工平臺,保持加工對象物;移動機構,使所述加工平臺直線移動;保護罩,具有覆蓋所述移動機構並且彼此重疊的多個罩元件,伴隨所述加工平臺的移動而伸縮;以及滑動構件,伴隨所述加工平臺而相對於所述保護罩朝所述加工平臺移動的方向相對地移動,在所述多個罩元件的上表面滑動。 若為所述加工裝置,則當加工平臺移動時,滑動構件相對於多個保護罩而朝加工平臺移動的方向相對地移動,以在多個罩元件的上表面滑動,因此,即使有由加工對象物產生的加工屑留在保護罩的上表面,滑動構件也會推除加工屑。因此,能夠避免加工屑積留在構成保護罩的多個罩元件的上表面。其結果,加工屑難以侵入罩元件之間,能夠減少保護罩或移動機構的動作不良或故障的原因。並且,能夠抑制裝置運轉率的下降,提高裝置的生產性。The processing device of the present invention is as described above, and is characterized by comprising: a processing platform that holds a processing object; a moving mechanism that linearly moves the processing platform; and a protective cover having a plurality of covers that cover the moving mechanism and overlap each other. An element that expands and contracts with the movement of the processing platform; and a sliding member that relatively moves with respect to the protective cover toward the processing platform with the processing platform and moves on the upper surface of the plurality of cover elements slide. In the case of the processing device, when the processing platform is moved, the sliding member is relatively moved toward the processing platform relative to the plurality of protective covers to slide on the upper surfaces of the plurality of cover elements. The machining chips generated by the object remain on the upper surface of the protective cover, and the sliding members also remove the machining chips. Therefore, it is possible to prevent accumulation of machining chips on the upper surfaces of the plurality of cover elements constituting the protective cover. As a result, it is difficult for the machining chips to penetrate between the cover elements, and it is possible to reduce the causes of malfunction or failure of the protective cover or the moving mechanism. In addition, it is possible to suppress a decrease in the operation rate of the device and improve the productivity of the device.

所述加工裝置中,為了將因加工對象物的加工而產生的加工屑集中起來並一舉廢棄,有的還包括收容加工屑的加工屑收容部。 所述結構中,為了能夠伴隨加工平臺的移動而使滑動構件切實地將加工屑推出到加工屑收容部中,理想的是,所述移動機構是使所述加工平臺相對於所述加工屑收容部而進退移動者,藉由所述加工平臺的進退移動,使所述滑動構件的所述加工屑收容部側的前端移動到最靠所述加工屑收容部側的所述罩元件的上表面、或較之位於所述加工屑收容部側的狀態。即,理想的是,在所述加工平臺移動到最靠所述加工屑收容部側的狀態下,所述滑動構件位於最靠所述加工屑收容部側的所述罩元件的上表面、或較之位於所述加工屑收容部側。In the processing device, in order to collect the processing chips generated by processing the object to be processed and discard them all at once, some further include a processing chip accommodating portion that stores the processing chips. In the above-mentioned structure, in order to enable the sliding member to reliably push the machining chips into the machining chip accommodating part along with the movement of the machining platform, it is desirable that the moving mechanism allows the machining platform to accommodate the machining chip. The person moving forward and backward moves the front end of the slide member on the chip receiving portion side to the upper surface of the cover element closest to the chip receiving portion by the advance and retreat of the processing platform. Or in a state where it is located on the side of the chip receiving portion. That is, it is desirable that the sliding member is located on the upper surface of the cover element closest to the machining chip accommodation portion in a state where the machining platform is moved to the machining chip accommodation portion side, or It is located on the side of the machining chip storage portion.

理想的是,在彼此鄰接的所述罩元件中,位於所述加工平臺側的罩元件重合在與所述加工平臺位於相反側的罩元件之上。 若為所述結構,則能夠設為下述結構,即,當加工平臺移動而保護罩收縮時,被滑動構件推擠的加工屑不會侵入罩元件間。在相反的配置結構的情況下,當加工平臺移動而保護罩收縮時,擔心被滑動構件推擠的加工屑會被推入罩元件間。It is desirable that, among the cover elements adjacent to each other, the cover element located on the processing platform side is superposed on the cover element located on the opposite side from the processing platform. According to the above-mentioned structure, when the processing platform is moved and the protective cover is contracted, the machining chips pushed by the sliding member cannot enter between the cover elements. In the case of the opposite arrangement structure, when the processing platform moves and the protective cover contracts, it is feared that the machining chips pushed by the sliding member may be pushed between the cover elements.

理想的是,所述滑動構件呈覆蓋所述罩元件上表面的片材狀。 若為所述結構,則當伴隨加工平臺的移動而保護罩收縮時,能夠藉由滑動構件來推出加工屑,並且能夠藉由滑動構件來覆蓋罩元件及它們的間隙。其結果,加工屑難以留在罩元件的上表面,能夠進一步防止加工屑侵入罩元件間。Preferably, the sliding member is in the shape of a sheet covering the upper surface of the cover member. According to this structure, when the protective cover contracts with the movement of the processing platform, the machining chips can be pushed out by the sliding member, and the cover member and the gap between them can be covered by the sliding member. As a result, it is difficult for the machining chips to remain on the upper surface of the cover elements, and it is possible to further prevent the machining chips from entering between the cover elements.

為了適宜地排出落在保護罩兩側的加工屑,理想的是,加工裝置還包括:加工屑排出部,在所述保護罩的兩側沿著所述加工平臺的移動方向而設,用於排出所述加工屑;以及流體噴射機構,在所述加工屑排出部的內部,朝向所述加工屑排出部的排出側噴射流體。 此處,作為加工屑排出部的具體的實施形態,考慮呈沿著加工平臺的移動方向而形成的槽形狀者。在所述槽形狀包含平坦的內側面及平坦的底面的情況下,加工屑會貼附於所述平坦的內表面而難以排出。為了適宜地解決所述問題,理想的是,在呈槽形狀的加工屑排出部中,其底面部具有曲面狀的內表面。若為所述結構,則與平坦的內表面的情況相比,能夠減小加工屑排出部的內表面與加工屑的接觸面積,加工屑變得難以貼附,其結果,能夠容易地排出加工屑。In order to appropriately discharge the processing chips falling on both sides of the protective cover, it is desirable that the processing device further includes a processing chip discharge portion, which is provided along the moving direction of the processing platform on both sides of the protective cover, and is used for: Discharging the machining chips; and a fluid ejecting mechanism that ejects fluid toward the discharge side of the machining chip discharge section inside the machining chip discharge section. Here, as a specific embodiment of the machining chip discharge portion, a groove shape formed along the moving direction of the machining table is considered. When the groove shape includes a flat inner surface and a flat bottom surface, machining chips adhere to the flat inner surface and are difficult to discharge. In order to appropriately solve the problem, it is desirable that the bottom surface portion of the machining chip discharge portion having a groove shape has a curved inner surface. According to this structure, compared with a case of a flat inner surface, the contact area between the inner surface of the machining chip discharge portion and the machining chip can be reduced, and the machining chip becomes difficult to be attached. As a result, the machining can be easily discharged. Crumbs.

而且,加工裝置中,有的還包括:流體供給機構,朝向被保持於所述加工平臺的所述加工對象物供給流體;以及承接板構件,設於所述加工平臺及所述保護罩之間,承接在所述加工對象物的加工時所產生的加工屑。作為由流體供給機構供給的流體,為切削水、冷卻水或清洗水等。此處,承接板構件具有用於將所述加工屑與所述流體一同朝規定方向排出的排出槽。另外,作為所供給的流體,也可為包含氣體者。藉由使氣體與液體混合而噴射,容易使其有力地噴射。 所述結構中,為了增加在承接板構件的排出槽中流動的流體的流速並防止加工屑積留在排出槽的排出側,理想的是,所述排出槽的排出側的內表面具有隨著從其開口側朝向底部側而槽寬減小的傾斜面或曲面。Further, some of the processing devices further include a fluid supply mechanism configured to supply a fluid toward the processing object held by the processing platform, and a receiving plate member provided between the processing platform and the protective cover. To receive machining chips generated during the processing of the object to be processed. Examples of the fluid supplied by the fluid supply mechanism include cutting water, cooling water, and washing water. Here, the receiving plate member has a discharge groove for discharging the machining chips together with the fluid in a predetermined direction. The supplied fluid may be a gas containing the gas. Gases and liquids are mixed and ejected, so that they can be ejected vigorously. In the structure, in order to increase the flow rate of the fluid flowing in the discharge groove of the receiving plate member and prevent the machining chips from being accumulated on the discharge side of the discharge groove, it is desirable that the inner surface of the discharge side of the discharge groove has An inclined surface or a curved surface whose groove width decreases from the opening side toward the bottom side.

為了進一步防止加工屑積留在所述承接板構件的排出槽的排出側,理想的是,所述承接板構件朝向排出側而向下方傾斜。In order to further prevent machining debris from being accumulated on the discharge side of the discharge groove of the receiving plate member, the receiving plate member is preferably inclined downward toward the discharge side.

<本發明的一實施方式> 以下,參照附圖來說明本發明的加工裝置的一實施方式。另外,以下所示的所有圖中,為了便於理解,均適當省略或誇張而示意性地描繪。對於同一構成元件,標注同一符號而適當省略說明。<One embodiment of the present invention> Hereinafter, one embodiment of the processing apparatus of the present invention will be described with reference to the drawings. In addition, in all the drawings shown below, for ease of understanding, they are schematically omitted or exaggerated as appropriate. The same constituent elements are denoted by the same reference numerals, and descriptions thereof are appropriately omitted.

<加工裝置的整體結構> 本實施方式的加工裝置100如圖1所示,是藉由對作為加工對象物的已密封基板W進行切斷而單片化為多個製品P的切斷裝置。所述切斷裝置100具備基板供給模塊A、基板切斷模塊B與檢查模塊C以作為各構成元件。各構成元件(各模塊A~C)分別相對於其他構成元件而可裝卸且可更換。<Overall Structure of Processing Apparatus> As shown in FIG. 1, the processing apparatus 100 according to the present embodiment is a cutting apparatus that cuts a sealed substrate W as an object to be cut into a plurality of products P. The cutting device 100 includes, as each constituent element, a substrate supply module A, a substrate cutting module B, and an inspection module C. Each constituent element (each module A to C) is detachable and replaceable with respect to other constituent elements.

在基板供給模塊A中設有基板供給機構1。相當於被切斷物的已密封基板W從基板供給機構1被搬出,並由移送機構(未圖示)移送至基板切斷模塊B。The substrate supply module A is provided with a substrate supply mechanism 1. The sealed substrate W corresponding to the object to be cut is carried out from the substrate supply mechanism 1 and is transferred to the substrate cutting module B by a transfer mechanism (not shown).

圖1所示的切斷裝置100為雙切割平臺(twin cut table)方式的切斷裝置。因此,在基板切斷模塊B中設有兩個切斷用平臺(加工平臺)2A、2B。在切斷用平臺2A上安裝有切斷用夾具3A。在切斷用平臺2B上安裝有切斷用夾具3B。切斷用平臺2A可藉由移動機構4A而朝圖1的Y方向移動,且可藉由旋轉機構5A而朝θ方向轉動。切斷用平臺2B可藉由移動機構4B而朝圖1的Y方向移動,且可藉由旋轉機構5B而朝θ方向轉動。The cutting device 100 shown in FIG. 1 is a cutting device of a twin cut table type. Therefore, two cutting platforms (processing platforms) 2A, 2B are provided in the substrate cutting module B. A cutting jig 3A is attached to the cutting platform 2A. A cutting jig 3B is attached to the cutting platform 2B. The cutting platform 2A can be moved in the Y direction in FIG. 1 by the moving mechanism 4A, and can be rotated in the θ direction by the rotating mechanism 5A. The cutting platform 2B can be moved in the Y direction in FIG. 1 by the moving mechanism 4B, and can be rotated in the θ direction by the rotating mechanism 5B.

而且,在基板切斷模塊B中設有對位用照相機(camera)(未圖示)。對位用攝像機可獨立地朝X方向移動。在基板切斷模塊B中設有作為切斷機構的兩個主軸(spindle)6A、6B。切斷裝置100是設有兩個主軸6A、6B的雙主軸結構的切斷裝置。主軸6A、6B可獨立地朝X方向與Z方向移動。A positioning camera (not shown) is provided in the substrate cutting module B. The registration camera can move independently in the X direction. The substrate cutting module B is provided with two spindles 6A and 6B as a cutting mechanism. The cutting device 100 is a cutting device of a dual-spindle structure provided with two main shafts 6A and 6B. The main shafts 6A and 6B can move independently in the X direction and the Z direction.

所述基板切斷模塊B的動作的一例如下。切斷用平臺2A中的切斷是藉由使所述切斷用平臺2A與兩個主軸6A、6B相對地移動,從而將已密封基板W切斷而使其單片化。而且,切斷用平臺2B中的切斷是藉由使所述切斷用平臺2B與兩個主軸6A、6B相對地移動,從而將已密封基板W切斷而使其單片化。主軸6A的旋轉刀61A及主軸6B的旋轉刀61B在包含Y方向與Z方向的面內旋轉,由此來切斷被保持於各平臺2A、2B的已密封基板W。另外,切斷用平臺2A中的切斷處理與切斷用平臺2B中的切斷處理是交替地進行。An example of the operation of the substrate cutting module B is as follows. The cutting in the cutting platform 2A is performed by moving the cutting platform 2A and the two spindles 6A and 6B relative to each other to cut the sealed substrate W into a single piece. The cutting in the cutting platform 2B is performed by moving the cutting platform 2B relative to the two spindles 6A and 6B to cut the sealed substrate W into a single piece. The rotary blade 61A of the main shaft 6A and the rotary blade 61B of the main shaft 6B are rotated in a plane including the Y direction and the Z direction, thereby cutting the sealed substrate W held by each of the platforms 2A and 2B. The cutting process in the cutting platform 2A and the cutting process in the cutting platform 2B are performed alternately.

在檢查模塊C中設有檢查用平臺7。在檢查用平臺7上載置包含將已密封基板W切斷而經單片化的多個製品P的集合體。多個製品P由檢查用的攝像機(未圖示)進行檢查,被篩分為良品與不良品。良品被收容到托盤(tray)8中。The inspection module C is provided with an inspection platform 7. An assembly including a plurality of products P obtained by cutting the sealed substrate W and singulating them is placed on the inspection platform 7. The plurality of products P are inspected by an inspection camera (not shown), and are classified into good products and defective products. Good products are contained in tray 8.

另外,本實施方式中,在基板供給模塊A內設有控制部CTL,所述控制部CTL進行切斷裝置100的動作、已密封基板W的搬送、已密封基板W的切斷、製品P的檢查等所有的動作或控制。並不限於此,也可將控制部CTL設在其他模塊內。In this embodiment, a control unit CTL is provided in the substrate supply module A, and the control unit CTL performs the operation of the cutting device 100, the conveyance of the sealed substrate W, the cutting of the sealed substrate W, and the product P. Check all actions or controls. It is not limited to this, and the control section CTL may be provided in another module.

<基板切斷模塊B的具體結構> 接下來,在本實施方式的切斷裝置100中,對於基板切斷模塊B的具體結構,以下進行說明。另外,切斷用平臺2A側的裝置結構與切斷用平臺2B側的裝置結構實質上相同,因此,以下詳細說明切斷用平臺2B側的結構。而且,為了方便,將圖2的左右方向設為切斷裝置100(切斷模塊B)的前後方向來進行說明。但是,這些方向只是為了方便說明,並不限定本發明的範圍。<Specific Structure of Substrate Cutting Module B> Next, the specific structure of the substrate cutting module B in the cutting apparatus 100 of this embodiment will be described below. The device structure on the cutting platform 2A side is substantially the same as the device structure on the cutting platform 2B side. Therefore, the structure on the cutting platform 2B side will be described in detail below. For convenience, the left-right direction in FIG. 2 will be described as the front-rear direction of the cutting device 100 (cutting module B). However, these directions are only for convenience of explanation and do not limit the scope of the present invention.

切斷裝置100的基板切斷模塊B如圖2所示,具備:所述切斷用平臺2B,保持已密封基板W;所述移動機構4B,使這些切斷用平臺2B沿Y方向直線移動;保護罩10,對應於移動機構4B而設,用於保護移動機構4B;以及加工屑收容部11,收容因已密封基板W的切斷而產生的邊角料等加工屑S。As shown in FIG. 2, the substrate cutting module B of the cutting device 100 includes: the cutting platform 2B, which holds the sealed substrate W; and the moving mechanism 4B, which moves the cutting platform 2B linearly in the Y direction. A protective cover 10 provided corresponding to the moving mechanism 4B to protect the moving mechanism 4B; and a machining chip accommodating portion 11 which stores machining chips S such as scraps generated by cutting of the sealed substrate W.

移動機構4B是設於切斷用平臺2B的下側,藉由沿Y方向延伸的滾珠螺桿機構41來使切斷用平臺2B直線地往復移動。具體而言,移動機構4B具有:滾珠螺桿機構41;伺服馬達(servo motor)等驅動源42,驅動所述滾珠螺桿機構41;以及滑台(slider)43,支撐切斷用平臺2B,並且藉由滾珠螺桿機構41而沿Y方向移動。此處,滾珠螺桿機構41被收容且旋轉自如地支撐於固定台框44中。而且,成為加工屑收容部11的廢棄箱被設於移動機構4B中的切斷用平臺2B的移動範圍的外側。由此,移動機構4B使切斷用平臺2B相對於加工屑收容部11而進退移動。The moving mechanism 4B is provided below the cutting platform 2B, and the cutting platform 2B is linearly reciprocated by a ball screw mechanism 41 extending in the Y direction. Specifically, the moving mechanism 4B includes a ball screw mechanism 41, a drive source 42 such as a servo motor to drive the ball screw mechanism 41, and a slider 43 to support the cutting platform 2B, The ball screw mechanism 41 moves in the Y direction. Here, the ball screw mechanism 41 is housed and rotatably supported in the fixed table frame 44. The waste box serving as the machining chip storage unit 11 is provided outside the moving range of the cutting platform 2B in the moving mechanism 4B. As a result, the moving mechanism 4B moves the cutting platform 2B forward and backward with respect to the workpiece receiving portion 11.

保護罩10設在切斷用平臺2B與移動機構4B之間,並在覆蓋移動機構4B的至少上方的狀態下伸縮。本實施方式中包含:第一保護罩10A,相對於切斷用平臺2B而設在Y方向的其中一側(切斷用平臺2B的前側);以及第二保護罩10B,相對於切斷用平臺2B而設在Y方向的另一側(切斷用平臺2B的後側)。The protective cover 10 is provided between the cutting platform 2B and the moving mechanism 4B, and expands and contracts while covering at least the upper portion of the moving mechanism 4B. This embodiment includes a first protective cover 10A provided on one side in the Y direction with respect to the cutting platform 2B (front side of the cutting platform 2B), and a second protective cover 10B provided with respect to the cutting platform. The platform 2B is provided on the other side in the Y direction (rear side of the cutting platform 2B).

第一保護罩10A是設在收容移動機構4B(具體而言為滾珠螺桿機構41)的固定台框44的前壁部、與支撐切斷用平臺2B的滑台43的前壁部之間。具體而言,第一保護罩10A覆蓋較切斷用平臺2B位於前側的滾珠螺桿機構41,且具有:波紋元件10A1,覆蓋滾珠螺桿機構41的至少上方;以及多個罩元件10A2,設於所述波紋元件10A1的上表面,覆蓋滾珠螺桿機構41的上方。所述多個罩元件10A2在俯視時呈矩形狀的平板狀。並且,在彼此鄰接的兩個罩元件10A2中,位於切斷用平臺2B側(後側)的罩元件10A2重合於與切斷用平臺2B位於相反側(前側)的罩元件10A2之上。這些罩元件10A2藉由切斷用平臺2B移動而彼此滑動。並且,第一保護罩10A在切斷用平臺2B朝前側移動時收縮,在切斷用平臺2B朝後側移動時伸展。The first protective cover 10A is provided between the front wall portion of the fixed table frame 44 that houses the moving mechanism 4B (specifically, the ball screw mechanism 41) and the front wall portion of the slide table 43 that supports the cutting platform 2B. Specifically, the first protective cover 10A covers the ball screw mechanism 41 located on the front side of the cutting platform 2B, and includes: a corrugated element 10A1 covering at least the upper portion of the ball screw mechanism 41; and a plurality of cover elements 10A2 provided in the housing. The upper surface of the corrugated element 10A1 covers the upper side of the ball screw mechanism 41. The plurality of cover elements 10A2 have a rectangular flat plate shape in a plan view. Of the two cover elements 10A2 adjacent to each other, the cover element 10A2 located on the cutting platform 2B side (rear side) overlaps with the cover element 10A2 located on the opposite side (front side) to the cutting platform 2B. These cover elements 10A2 slide on each other by moving the cutting platform 2B. The first protective cover 10A contracts when the cutting platform 2B moves toward the front side, and expands when the cutting platform 2B moves toward the rear side.

第二保護罩10B是設在收容移動機構4B(具體而言為滾珠螺桿機構41)的固定台框44的後壁部、與支撐切斷用平臺2B的滑台43的後壁部之間。具體而言,第二保護罩10B覆蓋較切斷用平臺2B位於後側的滾珠螺桿機構41,且與第一保護罩10A同樣,具有:波紋元件10B1,覆蓋滾珠螺桿機構41的至少上方;以及多個罩元件10B2,設於所述波紋元件10B1的上表面,覆蓋滾珠螺桿機構41的上方。所述多個罩元件10B2在俯視時呈矩形狀的平板狀。並且,在彼此鄰接的兩個罩元件10B2中,位於切斷用平臺2B側(前側)的罩元件10B2重合於與切斷用平臺2B位於相反側(後側)的罩元件10B2之上。這些罩元件10B2藉由切斷用平臺2B移動而彼此滑動。並且,第二保護罩10B在切斷用平臺2B朝後側移動時收縮,在切斷用平臺2B朝前側移動時伸展。The second protective cover 10B is provided between the rear wall portion of the fixed table frame 44 that houses the moving mechanism 4B (specifically, the ball screw mechanism 41) and the rear wall portion of the slide table 43 that supports the cutting platform 2B. Specifically, the second protective cover 10B covers the ball screw mechanism 41 located on the rear side of the cutting platform 2B, and, similarly to the first protective cover 10A, includes a corrugated element 10B1 covering at least the upper portion of the ball screw mechanism 41; and A plurality of cover elements 10B2 are provided on the upper surface of the corrugated element 10B1 and cover the ball screw mechanism 41 above. The plurality of cover elements 10B2 have a rectangular flat plate shape in a plan view. Of the two cover elements 10B2 adjacent to each other, the cover element 10B2 located on the cutting platform 2B side (front side) overlaps with the cover element 10B2 located on the opposite side (rear side) to the cutting platform 2B. These cover elements 10B2 slide on each other by moving the cutting platform 2B. The second protective cover 10B contracts when the cutting platform 2B moves to the rear side, and extends when the cutting platform 2B moves to the front side.

<承接板構件13中的加工屑S的滯留防止> 本實施方式的基板切斷模塊B還具備:流體供給機構12,朝向被保持於切斷用平臺2B的已密封基板W供給切削水;以及承接板構件13,設在切斷用平臺2B及保護罩10之間,承接切削水與加工屑S。<Stagnation Prevention of Processing Chips S in the Receiving Plate Member 13> The substrate cutting module B of this embodiment further includes a fluid supply mechanism 12 that supplies cutting water to the sealed substrate W held on the cutting platform 2B; and The receiving plate member 13 is provided between the cutting platform 2B and the protective cover 10, and receives cutting water and machining chips S.

流體供給機構12具有:切削水用噴嘴(nozzle)121,為了抑制由高速旋轉的旋轉刀61B產生的摩擦熱而噴射切削水;以及供給管122,向所述切削水用噴嘴121供給切削水。切削水用噴嘴121既可設於主軸6B,也可獨立於主軸6B而設。The fluid supply mechanism 12 includes a cutting water nozzle 121 that injects cutting water in order to suppress frictional heat generated by the high-speed rotating blade 61B, and a supply pipe 122 that supplies cutting water to the cutting water nozzle 121. The cutting water nozzle 121 may be provided on the main shaft 6B or may be provided separately from the main shaft 6B.

在承接板構件13的上表面,尤其如圖3所示,形成有用於將加工屑S與切削水一同朝規定方向排出的排出槽13M。所述排出槽13M是承接從切斷用平臺2B流出的切削水並予以排出者,具有在俯視時包含切斷用平臺2B的上部開口。本實施方式的排出槽13M是以朝加工屑收容部11側(切斷用平臺2B的後側)排出的方式而形成。On the upper surface of the receiving plate member 13, particularly as shown in FIG. 3, a discharge groove 13M for discharging machining chips S together with the cutting water in a predetermined direction is formed. The discharge groove 13M receives and discharges cutting water flowing from the cutting platform 2B, and has an upper opening including the cutting platform 2B in a plan view. The discharge groove 13M of the present embodiment is formed so as to be discharged toward the machining chip storage portion 11 side (the rear side of the cutting platform 2B).

所述承接板構件13中,排出槽13M的排出側設為隨著從所述上部開口側朝向底部側而槽寬變小的結構。具體而言,排出槽13M的排出側的內表面具有隨著從所述上部開口側朝向底部側而槽寬減小的傾斜面或曲面。In the receiving plate member 13, the discharge side of the discharge groove 13M has a structure in which the groove width becomes smaller as it goes from the upper opening side toward the bottom side. Specifically, the inner surface on the discharge side of the discharge groove 13M has an inclined surface or a curved surface whose groove width decreases as it goes from the upper opening side toward the bottom side.

本實施方式中,承接板構件13的排出側的側面13x朝相互靠近的方向(內側)傾斜,排出槽13M隨著朝向排出端部13a而變窄。並且,在所述變窄的部分,設為底面13y與側面13x的角部13r呈R形狀(局部圓形狀)的彎曲面(例如曲率半徑為100 mm~200 mm左右)。另外,所述彎曲面的曲率半徑並無特別限定,但藉由設為例如100 mm~200 mm左右的範圍,承接板構件13的加工變得容易。藉由所述結構,在承接板構件13的排出槽13M中流動的切削水在排出側流速變快。而且,承接板構件13朝向排出側而向下方傾斜。由此,也能夠加快承接板構件13的排出槽13M中的水的流速,尤其是排出側的水的流速。In the present embodiment, the discharge-side side surfaces 13x of the receiving plate member 13 are inclined toward each other (inside), and the discharge groove 13M becomes narrower toward the discharge end portion 13a. In addition, in the narrowed portion, a curved surface (eg, a radius of curvature of about 100 mm to 200 mm) of the corner portion 13r of the bottom surface 13y and the side surface 13x is an R shape (partially circular shape). In addition, the curvature radius of the curved surface is not particularly limited, but by setting it to a range of, for example, about 100 mm to 200 mm, the processing of the receiving plate member 13 becomes easy. With this configuration, the cutting water flowing in the discharge groove 13M of the receiving plate member 13 has a faster flow velocity on the discharge side. The receiving plate member 13 is inclined downward toward the discharge side. Thereby, the flow velocity of water in the discharge tank 13M of the receiving plate member 13 can also be increased, especially the flow velocity of water on the discharge side.

<保護罩10B中的加工屑S的滯留防止> 並且,所述基板切斷模塊B具有用於將留在第二保護罩10B上表面的加工屑S從第二保護罩10B推出至加工屑收容部11的結構。<Prevention of Retention of Processing Chips S in the Protective Cover 10B> The substrate cutting module B has a mechanism for pushing the processing chips S remaining on the upper surface of the second protective cover 10B from the second protective cover 10B to the processing chip storage. The structure of the section 11.

具體而言,基板切斷模塊B如圖2、圖4及圖5所示,具備滑動構件14,所述滑動構件14伴隨切斷用平臺2B的移動,而在第二保護罩10B中的多個罩元件10B2的上表面滑動。Specifically, as shown in FIG. 2, FIG. 4, and FIG. 5, the substrate cutting module B is provided with a sliding member 14, which is accompanied by the movement of the cutting platform 2B. The upper surface of each cover element 10B2 slides.

所述滑動構件14例如被設於支撐切斷用平臺2B的滑台43,與切斷用平臺2B一同移動。即,滑動構件14的移動量與切斷用平臺2B的移動量相同。並且,伴隨切斷用平臺2B朝加工屑收容部11側(後側)移動,而滑動構件14相對於第二保護罩10B朝切斷用平臺2B移動的方向(後方向)相對地移動。由此,滑動構件14在多個罩元件10B2的上表面滑動。The slide member 14 is provided on, for example, a slide table 43 that supports the cutting platform 2B, and moves together with the cutting platform 2B. That is, the moving amount of the sliding member 14 is the same as the moving amount of the cutting platform 2B. In addition, as the cutting platform 2B moves toward the cutting chip accommodation portion 11 side (rear side), the sliding member 14 relatively moves with respect to the second protective cover 10B in a direction (rear direction) in which the cutting platform 2B moves. Thereby, the sliding member 14 slides on the upper surface of the plurality of cover elements 10B2.

滑動構件14呈覆蓋罩元件10B2的上表面的片材狀。具體而言,滑動構件14在俯視時呈大致矩形狀,其一邊部被固定於滑台43。另外,所述一邊部所固定的構件只要是與切斷用平臺2B一同移動的構件,則並不限於滑台43。而且,滑動構件14覆蓋罩元件10B2的寬度方向的整體或大致整體。此處,所謂“覆蓋大致整體”,是指在罩元件10B2的上表面的寬度方向兩端部,保留不會留下邊角料等加工屑S的程度的空間(space)而覆蓋。The sliding member 14 has a sheet shape covering the upper surface of the cover element 10B2. Specifically, the sliding member 14 has a substantially rectangular shape in a plan view, and one side portion thereof is fixed to the sliding table 43. The member fixed on the one side is not limited to the slide table 43 as long as the member moves together with the cutting platform 2B. The sliding member 14 covers the entire or substantially the entire width direction of the cover element 10B2. Here, the term "covering substantially the entirety" means covering at the both ends in the width direction of the upper surface of the cover element 10B2 with a space to the extent that machining chips S such as scraps are not left.

並且,滑動構件14在切斷用平臺2B移動到最靠加工屑收容部11側(後側)的狀態(參照圖5)下,滑動構件14位於最靠加工屑收容部11側(後側)的罩元件10B2的上表面、或較之位於加工屑收容部11側。另外,圖5中表示滑動構件14較第二保護罩10B位於加工屑收容部11側的示例。即,滑動構件14在切斷用平臺2B移動到最靠加工屑收容部11側(後側)的狀態下,覆蓋第二保護罩10B的上表面整體或大致整體。Further, in a state where the sliding member 14 is moved to the side (rear side) closest to the chip receiving portion 11 (see FIG. 5) in the cutting platform 2B, the slide member 14 is positioned to the side (rear side) closest to the chip receiving portion 11 (see FIG. 5). The upper surface of the cover element 10B2 is located on the machining chip accommodating portion 11 side. In addition, FIG. 5 shows an example in which the sliding member 14 is located on the machining chip accommodating portion 11 side than the second protective cover 10B. That is, the sliding member 14 covers the entire or substantially the entire upper surface of the second protective cover 10B in a state where the cutting platform 2B is moved to the side (rear side) closest to the machining chip accommodation portion 11.

而且,滑動構件14的材質例如為氯乙烯等樹脂,因自重而變形且至少為自由端部的前端部14a接觸至罩元件10B2的上表面。滑動構件14具有如下強度,即,在罩元件10B2的上表面滑動時不會因所述滑動所承受的摩擦力而彎曲變形,而且,能夠將加工屑S朝向移動方向推出。The material of the sliding member 14 is, for example, a resin such as vinyl chloride, which is deformed by its own weight, and at least the front end portion 14 a of the free end portion is in contact with the upper surface of the cover element 10B2. The sliding member 14 has a strength such that the upper surface of the cover element 10B2 does not bend and deform due to the frictional force received by the sliding when sliding on the upper surface of the cover element 10B2, and can push the machining chips S toward the moving direction.

滑動構件14的前端部14a在圖4中,在俯視時具有與跟切斷用平臺2B的移動方向正交的方向平行的前端邊,但也可具有從所述移動方向朝傾斜方向延伸的前端邊,還可呈中央部朝外側突出的三角形狀或梯形狀。The front end portion 14 a of the sliding member 14 has a front end side parallel to a direction orthogonal to the moving direction of the cutting platform 2B in plan view in FIG. 4, but may have a front end extending from the moving direction toward the oblique direction. The side may have a triangular shape or a ladder shape with the central portion protruding outward.

而且,若以與承接板構件13的關係而言,本實施方式的滑動構件14在切斷用平臺2B的移動方向(Y方向)上,較承接板構件13的排出端部13a伸出至外側(加工屑收容部11側)。另外,只要在切斷用平臺2B移動到最靠加工屑收容部11側的狀態(第二保護罩10B最收縮的狀態)下,滑動構件14位於最靠加工屑收容部11側的罩元件10B2的上表面、或較之位於加工屑收容部11側,則也可不較承接板構件13的排出端部13a伸出至外側。Furthermore, in terms of the relationship with the receiving plate member 13, the sliding member 14 of this embodiment protrudes to the outside from the discharge end portion 13 a of the receiving plate member 13 in the moving direction (Y direction) of the cutting platform 2B. (Working chip storage section 11 side). In addition, as long as the cutting platform 2B is moved to the side closest to the workpiece receiving portion 11 (the state where the second protective cover 10B is most contracted), the slide member 14 is located at the cover element 10B2 closest to the workpiece receiving portion 11. The upper surface of the receiving plate member 13 may be projected to the outside from the discharge end portion 13 a of the receiving plate member 13 rather than being located on the chip receiving portion 11 side.

<滑動構件14的動作> 接下來,參照圖6(a)~圖6(c)來說明伴隨所述切斷用平臺2B的移動的、滑動構件14的動作。 如圖6(a)所示,在第二保護罩10B伸展的狀態下,有加工屑S留在所述罩元件10B2的上表面。另外,所述加工屑S是因切斷而飛散從而留在罩元件10B2上表面的加工屑S、或者與切削液一同從排出槽13M流出而留在罩元件10B2上表面的加工屑S等。<Operation of Slider Member 14> Next, the operation of the slider member 14 accompanying the movement of the cutting platform 2B will be described with reference to FIGS. 6 (a) to 6 (c). As shown in FIG. 6 (a), in a state where the second protective cover 10B is extended, machining chips S remain on the upper surface of the cover element 10B2. The machining chips S are scattered by cutting and left on the upper surface of the cover element 10B2, or machining chips S flowing out of the discharge groove 13M together with the cutting fluid and left on the upper surface of the cover element 10B2.

如圖6(b)所示,當切斷用平臺2B朝加工屑收容部11側(後側)移動時,滑動構件14與切斷用平臺2B一同朝加工屑收容部11側移動。此時,滑動構件14相對於罩元件10B2而朝切斷用平臺2B移動的方向相對地移動。由此,滑動構件14一邊推動留在罩元件10B2上表面的加工屑S,一邊在多個罩元件10B2的上表面滑動。As shown in FIG. 6 (b), when the cutting platform 2B is moved toward the cutting chip storage portion 11 side (rear side), the slide member 14 is moved toward the cutting chip storage portion 11 side together with the cutting platform 2B. At this time, the sliding member 14 relatively moves with respect to the cover element 10B2 in the direction in which the cutting platform 2B moves. Accordingly, the slide member 14 slides the upper surfaces of the plurality of cover elements 10B2 while pushing the machining chips S remaining on the upper surface of the cover element 10B2.

接著,如圖6(c)所示,在切斷用平臺2B移動到最靠加工屑收容部11側(後側)的狀態下,滑動構件14的前端部14a越過最靠加工屑收容部11側的罩元件10B2的上表面而位於加工屑收容部11側。由此,被滑動構件14推動的加工屑S從罩元件10B2的上表面被推出到加工屑收容部11中,從而被收容到加工屑收容部11中。Next, as shown in FIG. 6 (c), in a state where the cutting platform 2B is moved to the side (rear side) closest to the machining chip accommodation portion 11, the front end portion 14 a of the sliding member 14 passes over the machining chip accommodation portion 11. The upper surface of the cover member 10B2 on the side is located on the side of the chip receiving portion 11. As a result, the machining chips S pushed by the sliding member 14 are pushed out from the upper surface of the cover element 10B2 into the machining chips accommodating section 11, and thereby are accommodated in the machining chips accommodating section 11.

這些推出動作是每當切斷用平臺2B相對於加工屑收容部11而進退移動時反復進行。另外,相對於所述加工屑收容部11的進退移動既可伴隨已密封基板W的切斷處理而進行,也可在已密封基板W的切斷處理結束後進行。These pushing-out operations are repeated every time the cutting platform 2B moves forward and backward with respect to the machining chip storage portion 11. In addition, the advancing and retracting movement with respect to the machining chip storage portion 11 may be performed with the cutting process of the sealed substrate W, or may be performed after the cutting process of the sealed substrate W is completed.

<落在保護罩10B兩側的加工屑S的排出> 而且,本實施方式的基板切斷模塊B如圖2及圖7所示,還具備:加工屑排出部15,用於將落在第二保護罩10B的寬度方向(X方向)兩側的加工屑S排出到外部(加工屑收容部11);以及流體噴射機構16,在所述加工屑排出部15的內部,朝向排出側噴射作為流體的水。<Discharge of Work Chips S Falling on Both Sides of the Protective Cover 10B> Further, as shown in FIGS. 2 and 7, the substrate cutting module B of this embodiment further includes a work chip discharge unit 15 for removing the The machining chips S on both sides in the width direction (X direction) of the two protective covers 10B are discharged to the outside (the machining chip accommodating portion 11); and the fluid ejection mechanism 16 injects the machining chip discharge portion 15 toward the discharge side as Fluid of water.

加工屑排出部15是在第二保護罩10B的寬度方向兩側,沿著切斷用平臺2B的移動方向(Y方向)而設。所述加工屑排出部15呈槽形狀,所述槽形狀呈沿著切斷用平臺2B的移動方向的直線狀。並且,加工屑排出部15如圖7所示,在所述槽剖面上,底面部具有曲面狀的內表面。另外,加工屑排出部15也可在所述槽剖面上,整體具有曲面狀的內表面。本實施方式中,為雙切割平臺方式,在並列地設有兩個第二保護罩10B時,在兩個第二保護罩10B之間設置一個加工屑排出部15供兼用。The machining chip discharge portion 15 is provided along the moving direction (Y direction) of the cutting platform 2B on both sides in the width direction of the second protective cover 10B. The machining chip discharge portion 15 has a groove shape, and the groove shape has a linear shape along the moving direction of the cutting platform 2B. Further, as shown in FIG. 7, the machining chip discharge portion 15 has a curved inner surface on the bottom surface portion in the groove cross section. The machining chip discharge portion 15 may have a curved inner surface as a whole in the groove cross section. In this embodiment, the two cutting platform method is adopted. When two second protective covers 10B are provided in parallel, one machining chip discharge portion 15 is provided between the two second protective covers 10B for dual use.

流體噴射機構16是從加工屑排出部15的切斷用平臺2B側(前側)朝向加工屑收容部11側(後側)噴射水的機構,且具備:設在加工屑排出部15內部的噴射噴嘴161、及向所述噴射噴嘴161供給清洗水的供給管162。另外,也可不僅在第二保護罩10B的兩側,還在第一保護罩10A的兩側延長設置加工屑排出部15。此處,噴射噴嘴161對水的噴射例如既可在已密封基板W的切斷處理中始終進行,也可在所述切斷處理中間歇地進行,還可在切斷處理結束後進行。The fluid ejection mechanism 16 is a mechanism that ejects water from the cutting platform 2B side (front side) of the machining chip discharge unit 15 toward the machining chip storage unit 11 side (rear side), and includes a jet provided inside the machining chip discharge unit 15. The nozzle 161 and a supply pipe 162 that supplies washing water to the spray nozzle 161. In addition, the machining chip discharge portion 15 may be provided not only on both sides of the second protective cover 10B but also on both sides of the first protective cover 10A. Here, the spraying of water by the spray nozzle 161 may be performed continuously, for example, during the cutting process of the sealed substrate W, or intermittently during the cutting process, or may be performed after the cutting process is completed.

<本實施方式的效果> 根據本實施方式的切斷裝置100,當切斷用平臺2B移動時,滑動構件14相對於第二保護罩10B而朝切斷用平臺2B移動的方向相對地移動,從而在多個罩元件10B2的上表面滑動,因此即使有從已密封基板W產生的加工屑S留在保護罩10B的上表面,滑動構件14也會推除加工屑S。因此,能夠避免加工屑S積留在構成保護罩10B的多個罩元件10B2的上表面。其結果,加工屑S難以侵入罩元件10B2之間,能夠減少保護罩10B或移動機構4B的動作不良或故障的原因。並且,能夠抑制切斷裝置100的運轉率的下降,提高裝置的生產性。<Effects of this Embodiment> According to the cutting device 100 of this embodiment, when the cutting platform 2B moves, the sliding member 14 relatively moves in the direction in which the cutting platform 2B moves relative to the second protective cover 10B. As a result, the upper surface of the plurality of cover elements 10B2 slides. Therefore, even if machining chips S generated from the sealed substrate W remain on the upper surface of the protective cover 10B, the slide member 14 pushes the machining chips S out. Therefore, it is possible to prevent the machining chips S from being accumulated on the upper surfaces of the plurality of cover elements 10B2 constituting the protective cover 10B. As a result, it is difficult for the machining chips S to penetrate between the cover elements 10B2, and it is possible to reduce the cause of malfunction or failure of the protective cover 10B or the moving mechanism 4B. In addition, it is possible to suppress a decrease in the operation rate of the cutting device 100 and improve the productivity of the device.

本實施方式中,移動機構4B是使切斷用平臺2B相對於加工屑收容部11而進退移動者,在切斷用平臺2B移動到最靠加工屑收容部11側的狀態下,滑動構件14位於最靠加工屑收容部11側的所述罩元件10B2的上表面、或較之位於加工屑收容部11側,因此與滑動構件14較它們位於內側的情況相比,滑動構件14能夠伴隨切斷用平臺2B的移動而將加工屑S切實地推出到加工屑收容部11中。而且,能夠將因已密封基板W的切斷而產生的加工屑S集中於加工屑收容部11中並一舉丟棄。In the present embodiment, the moving mechanism 4B moves the cutting platform 2B forward and backward with respect to the machining chip storage portion 11, and the sliding member 14 moves the cutting platform 2B to a position closest to the machining chip storage portion 11. The upper surface of the cover element 10B2 located on the side closest to the chip receiving portion 11 or on the side of the chip receiving portion 11 allows the sliding member 14 to accompany cutting when compared with the case where the sliding member 14 is positioned on the inside. The cutting platform 2B is moved to reliably push the machining chips S into the machining chip accommodating section 11. In addition, the machining chips S generated by the cutting of the sealed substrate W can be collected in the machining chip accommodating portion 11 and discarded in one fell swoop.

本實施方式中,在第二保護罩10B的彼此鄰接的罩元件10B2中,位於切斷用平臺2B側的罩元件10B2重合於與切斷用平臺2B位於相反側的罩元件10B2之上,因此能夠設為下述結構,即,當切斷用平臺2B移動而保護罩10B收縮時,被滑動構件14推動的加工屑S不會侵入罩元件10B2間。In this embodiment, among the cover elements 10B2 adjacent to each other in the second protective cover 10B, the cover element 10B2 on the cutting platform 2B side overlaps with the cover element 10B2 on the opposite side to the cutting platform 2B. When the cutting platform 2B moves and the protective cover 10B contracts, the machining chips S pushed by the sliding member 14 can be prevented from entering between the cover elements 10B2.

本實施方式中,滑動構件14呈覆蓋罩元件10B2上表面的片材狀,當伴隨切斷用平臺2B的移動而保護罩10B收縮時,能夠藉由滑動構件14來推出加工屑S,並且能夠藉由滑動構件14來覆蓋罩元件10B2及它們的間隙,因此加工屑S難以留在罩元件10B2的上表面,能夠適宜地防止加工屑S侵入罩元件10B2間。In this embodiment, the sliding member 14 is in the shape of a sheet covering the upper surface of the cover element 10B2, and when the protective cover 10B contracts with the movement of the cutting platform 2B, the machining chip S can be pushed out by the sliding member 14 and can Since the cover members 10B2 and their gaps are covered by the sliding member 14, it is difficult for the machining chips S to remain on the upper surface of the cover members 10B2, and it is possible to appropriately prevent the machining chips S from entering between the cover members 10B2.

本實施方式中,在保護罩10B的兩側設有加工屑排出部15,在所述加工屑排出部15的內部,設有朝向排出側噴射流體的流體噴射機構16,因此能夠適宜地排出落在保護罩10B兩側的加工屑S。而且,加工屑排出部15為槽形狀,其底面部具有曲面狀的內表面,因此與平坦的內表面的情況相比,能夠減小加工屑排出部15的內表面與加工屑S的接觸面積,加工屑S變得難以貼附,其結果,能夠容易地排出加工屑S。In the present embodiment, machining chip discharge sections 15 are provided on both sides of the protective cover 10B, and a fluid ejection mechanism 16 for ejecting a fluid toward the discharge side is provided inside the machining chip discharge section 15, so that it can be appropriately discharged. Work chips S on both sides of the protective cover 10B. Further, the machining chip discharge portion 15 has a groove shape, and the bottom surface portion has a curved inner surface. Therefore, compared with the case of a flat inner surface, the contact area between the inner surface of the machining chip discharge portion 15 and the machining chip S can be reduced. As a result, it becomes difficult to attach the machining chips S, and as a result, the machining chips S can be easily discharged.

本實施方式中,承接板構件13的排出槽13M的排出側的內表面具有隨著從所述開口側朝向底部側而槽寬減小的傾斜面或曲面,因此能夠增加在排出槽13M中流動的流體的流速,防止加工屑S積留在排出槽13M的排出側。而且,在排出槽13M的排出側的內表面具有曲面的情況下,與平坦的內表面的情況相比,能夠減小與加工屑S的接觸面積,加工屑S變得難以貼附,從而能夠進一步防止加工屑S積留在排出槽13M的排出側。進而,承接板構件13朝向排出側而向下方傾斜,因此能夠進一步防止加工屑S積留在承接板構件13的排出槽13M的排出側。In this embodiment, the inner surface on the discharge side of the discharge groove 13M of the receiving plate member 13 has an inclined surface or a curved surface whose groove width decreases as it goes from the opening side to the bottom side, so that the flow in the discharge groove 13M can be increased. The flow velocity of the fluid prevents the machining chips S from accumulating on the discharge side of the discharge groove 13M. In addition, when the inner surface on the discharge side of the discharge groove 13M has a curved surface, compared with the case of a flat inner surface, the contact area with the machining chips S can be reduced, and the machining chips S become difficult to attach, so that It is further prevented that the machining chips S accumulate on the discharge side of the discharge groove 13M. Furthermore, since the receiving plate member 13 inclines downward toward the discharge side, it is possible to further prevent the machining chips S from being accumulated on the discharge side of the discharge groove 13M of the receiving plate member 13.

<其他變形實施方式> 另外,本發明並不限於所述實施方式。 例如,也可藉由在滑動構件的背面形成凹凸形狀來減小與罩元件的接觸面積。另外,作為凹凸形狀,考慮採用沿著滑動構件的滑動方向延伸的凸條部或者使多個凸部散佈等。若為此結構,則能夠使滑動構件的滑動變得順暢。<Other Variations> The present invention is not limited to the above-mentioned embodiments. For example, it is also possible to reduce the contact area with the cover element by forming an uneven shape on the back surface of the sliding member. In addition, as the concave-convex shape, it is conceivable to use ridge portions extending along the sliding direction of the sliding member or to distribute a plurality of ridge portions. With this configuration, the sliding of the sliding member can be made smooth.

而且,滑動構件除了為片材狀構件以外,也可具有:例如呈棒狀的滑動部,遍及罩元件的寬度方向兩端部而延伸;以及支撐框架部,被固定於加工平臺側並支撐所述滑動部。此結構也能夠減小與罩元件的接觸面積,從而能夠使滑動構件的滑動變得順暢。In addition to the sheet-like member, the sliding member may include, for example, a rod-shaped sliding portion extending across both ends of the cover element in the width direction; and a support frame portion that is fixed to the processing platform side and supports the housing. Mentioned sliding portion. This structure can also reduce the contact area with the cover element, so that the sliding of the sliding member can be made smooth.

而且,保護罩除了使多個罩元件即罩板彼此重疊的結構以外,也可為具有多個罩構件的伸縮罩(telescopic cover)。Further, the protective cover may be a telescopic cover having a plurality of cover members in addition to a structure in which a plurality of cover elements, that is, cover plates are overlapped with each other.

進而,加工屑排出部的底面部的內表面除了彎曲形狀以外,只要具有減小與加工屑的接觸面積的曲面即可。Furthermore, the inner surface of the bottom surface portion of the machining chip discharge portion may have a curved surface that reduces the contact area with the machining chip in addition to the curved shape.

而且,所述實施方式中,對雙切割平臺方式且雙主軸結構的切斷裝置進行了說明,但並不限於此,也可為單切割平臺(single cut table)方式且單主軸結構的切斷裝置、或者單切割平臺方式且雙主軸結構的切斷裝置等。Furthermore, in the above-mentioned embodiment, the cutting device of the double cutting platform method and the dual-spindle structure is described, but it is not limited thereto, and the cutting device of the single cutting table method and the single-spindle structure may also be used. Device, or a cutting device of single cutting platform type and dual spindle structure.

除此以外,本發明的加工裝置也可進行切斷以外的加工,例如也可進行切削或磨削等除此以外的機械加工。In addition, the processing device of the present invention may perform processing other than cutting, and may also perform other mechanical processing such as cutting or grinding.

此外,本發明並不限於所述實施方式,當然可在不脫離其主旨的範圍內進行各種變形。In addition, the present invention is not limited to the embodiment described above, and various modifications can be made without departing from the scope of the invention.

1‧‧‧基板供給機構1‧‧‧ substrate supply mechanism

2A、2B‧‧‧切斷用平臺(加工平臺)2A, 2B ‧‧‧ cutting platform (processing platform)

3A、3B‧‧‧切斷用夾具3A, 3B‧‧‧ Cutting fixture

4A、4B‧‧‧移動機構4A, 4B‧‧‧ Mobile agency

5A、5B‧‧‧旋轉機構5A, 5B‧‧‧rotation mechanism

6A、6B‧‧‧主軸6A, 6B‧‧‧ Spindle

7‧‧‧檢查用平臺7‧‧‧ Inspection platform

8‧‧‧托盤8‧‧‧ tray

10‧‧‧保護罩10‧‧‧ protective cover

10A‧‧‧第一保護罩10A‧‧‧First protective cover

10A1、10B1‧‧‧波紋元件10A1, 10B1‧‧‧ corrugated element

10A2、10B2‧‧‧罩元件10A2, 10B2‧‧‧ cover element

10B‧‧‧第二保護罩10B‧‧‧Second protective cover

11‧‧‧加工屑收容部11‧‧‧Processing chip storage

12‧‧‧流體供給機構12‧‧‧ fluid supply mechanism

13‧‧‧承接板構件13‧‧‧Accepting plate member

13a‧‧‧排出端部13a‧‧‧Discharge end

13M‧‧‧排出槽13M‧‧‧Exhaust trough

13r‧‧‧角部13r‧‧‧corner

13x‧‧‧側面13x‧‧‧ side

13y‧‧‧底面13y‧‧‧ Underside

14‧‧‧滑動構件14‧‧‧ sliding member

14a‧‧‧前端部14a‧‧‧Front end

15‧‧‧加工屑排出部15‧‧‧Processing chip discharge section

16‧‧‧流體噴射機構16‧‧‧ fluid ejection mechanism

41‧‧‧滾珠螺桿機構41‧‧‧ball screw mechanism

42‧‧‧驅動源42‧‧‧Drive source

43‧‧‧滑台43‧‧‧Slide

44‧‧‧固定台框44‧‧‧ fixed table frame

61A、61B‧‧‧旋轉刀61A, 61B‧‧‧Rotary Knife

100‧‧‧切斷裝置(加工裝置)100‧‧‧ cutting device (processing device)

121‧‧‧切削水用噴嘴121‧‧‧ Nozzle for cutting water

122、162‧‧‧供給管122, 162‧‧‧ supply pipe

161‧‧‧噴射噴嘴161‧‧‧jet nozzle

A‧‧‧基板供給模塊A‧‧‧ substrate supply module

B‧‧‧基板切斷模塊B‧‧‧ substrate cutting module

C‧‧‧檢查模塊C‧‧‧ Inspection Module

CTL‧‧‧控制部CTL‧‧‧Control Department

P‧‧‧製品P‧‧‧ products

S‧‧‧加工屑S‧‧‧Processing chips

W‧‧‧已密封基板(加工對象物)W‧‧‧ Sealed substrate (object to be processed)

X、Y、Z、θ‧‧‧方向X, Y, Z, θ‧‧‧ directions

圖1是示意性地表示本實施方式的切斷裝置的結構的圖。 圖2是示意性地表示本實施方式的基板切斷模塊的結構的圖。 圖3(a)是表示本實施方式的承接板構件的排出側的結構的立體圖,圖3(b)為剖面圖,且圖3(c)為側面圖。 圖4是示意性地表示本實施方式的基板切斷模塊的結構的局部平面圖。 圖5是示意性地表示本實施方式的基板切斷模塊的結構(第二保護罩收縮的狀態)的圖。 圖6(a)~圖6(c)是表示本實施方式的基板切斷模塊的各狀態的局部平面圖。 圖7是示意性地表示本實施方式的加工屑排出部及第二保護罩的位置關係的剖面圖。FIG. 1 is a diagram schematically showing a configuration of a cutting device according to this embodiment. FIG. 2 is a diagram schematically showing a configuration of a substrate cutting module according to the present embodiment. FIG. 3 (a) is a perspective view showing a structure on a discharge side of the receiving plate member according to the present embodiment, FIG. 3 (b) is a cross-sectional view, and FIG. 3 (c) is a side view. FIG. 4 is a partial plan view schematically showing a configuration of a substrate cutting module according to the present embodiment. FIG. 5 is a diagram schematically showing a configuration (a state where the second protective cover is contracted) of the substrate cutting module according to the present embodiment. 6 (a) to 6 (c) are partial plan views showing each state of the substrate cutting module according to the present embodiment. FIG. 7 is a cross-sectional view schematically showing a positional relationship between a machining chip discharge portion and a second protective cover according to the present embodiment.

Claims (7)

一種加工裝置,包括: 加工平臺,保持加工對象物; 移動機構,使所述加工平臺直線移動; 保護罩,具有覆蓋所述移動機構並且彼此重疊的多個罩元件,伴隨所述加工平臺的移動而伸縮;以及 滑動構件,伴隨所述加工平臺而相對於所述保護罩朝所述加工平臺移動的方向相對地移動,在所述多個罩元件的上表面滑動。A processing device includes: a processing platform that holds a processing object; a moving mechanism that linearly moves the processing platform; a protective cover having a plurality of cover elements covering the moving mechanism and overlapping each other, accompanying the movement of the processing platform And telescopically; and a sliding member that moves relative to the protective cover toward the processing platform along with the processing platform, and slides on the upper surfaces of the plurality of cover elements. 如申請專利範圍第1項所述的加工裝置,其中還包括: 加工屑收容部,收容因所述加工對象物的加工而產生的加工屑,且 所述移動機構使所述加工平臺相對於所述加工屑收容部而進退移動,藉由所述加工平臺的進退移動,使所述滑動構件的所述加工屑收容部側的前端移動到最靠所述加工屑收容部側的所述罩元件的上表面、或較最靠所述加工屑收容部側的所述罩元件位於所述加工屑收容部側的狀態。The processing device according to item 1 of the scope of patent application, further comprising: a processing chip storage section that stores processing chips generated by processing the processing object, and the moving mechanism makes the processing platform relatively to the processing platform. The chip receiving portion moves forward and backward, and the tip of the chip receiving portion side of the sliding member is moved to the cover element closest to the chip receiving portion by the advance and retreat of the processing platform. The upper surface, or the state where the cover element closest to the machining chip storage portion side is located on the machining chip storage portion side. 如申請專利範圍第1項或第2項所述的加工裝置,其中, 所述滑動構件呈覆蓋所述罩元件上表面的片材狀。The processing device according to claim 1 or claim 2, wherein the sliding member has a sheet shape covering an upper surface of the cover element. 如申請專利範圍第1項所述的加工裝置,其中還包括: 加工屑排出部,在所述保護罩的兩側沿著所述加工平臺的移動方向而設,用於排出因所述加工對象物的加工而產生的加工屑;以及 流體噴射機構,在所述加工屑排出部的內部,朝向所述加工屑排出部的排出側噴射流體。The processing device according to item 1 of the scope of patent application, further comprising: a processing chip discharge portion provided on both sides of the protective cover along the moving direction of the processing platform for discharging the processing object Machining chips generated by machining of objects; and a fluid ejection mechanism that ejects fluid toward the discharge side of the machining chip discharge section inside the machining chip discharge section. 如申請專利範圍第4項所述的加工裝置,其中, 所述加工屑排出部呈槽形狀,其底面部具有曲面狀的內表面。The processing device according to item 4 of the scope of patent application, wherein the processing chip discharge portion has a groove shape, and a bottom surface portion thereof has a curved inner surface. 如申請專利範圍第1項所述的加工裝置,其中還包括: 流體供給機構,朝向被保持於所述加工平臺的所述加工對象物供給流體;以及 承接板構件,設於所述加工平臺及所述保護罩之間,承接在所述加工對象物的加工時所產生的加工屑,且 所述承接板構件具有用於將所述加工屑朝規定方向排出的排出槽, 所述排出槽的排出側的內表面具有隨著從其開口側朝向底部側而槽寬減小的傾斜面或曲面。The processing device according to item 1 of the scope of patent application, further comprising: a fluid supply mechanism for supplying a fluid toward the processing object held on the processing platform; and a receiving plate member provided on the processing platform and The protective cover receives processing chips generated during processing of the object to be processed, and the receiving plate member has a discharge groove for discharging the processing chips in a predetermined direction. The inner surface of the discharge side has an inclined surface or a curved surface whose groove width decreases as it goes from the opening side toward the bottom side. 如申請專利範圍第6項所述的加工裝置,其中, 所述承接板構件朝向排出側而向下方傾斜。The processing device according to claim 6 in which the receiving plate member is inclined downward toward the discharge side.
TW107133769A 2017-09-27 2018-09-26 Processing device TWI734937B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017186636A JP6876586B2 (en) 2017-09-27 2017-09-27 Processing equipment
JP2017-186636 2017-09-27

Publications (2)

Publication Number Publication Date
TW201914737A true TW201914737A (en) 2019-04-16
TWI734937B TWI734937B (en) 2021-08-01

Family

ID=65864672

Family Applications (1)

Application Number Title Priority Date Filing Date
TW107133769A TWI734937B (en) 2017-09-27 2018-09-26 Processing device

Country Status (4)

Country Link
JP (1) JP6876586B2 (en)
KR (1) KR102205063B1 (en)
CN (1) CN109560015B (en)
TW (1) TWI734937B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI775292B (en) * 2020-02-10 2022-08-21 日商Towa股份有限公司 Machining device

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7222941B2 (en) * 2020-02-10 2023-02-15 Towa株式会社 processing equipment
WO2021192837A1 (en) * 2020-03-24 2021-09-30 東京エレクトロン株式会社 Removal processing device
CN113650087B (en) * 2021-07-23 2022-12-09 于翔 Remainder collection device of DH series edge scraping machine
JP2024030826A (en) * 2022-08-25 2024-03-07 Towa株式会社 cutting device

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1072862B (en) * 1960-01-07 Dipl Ing Helmut Missling Gie ßen Telescope-like collapsible cover for the guideways of machine tools
JPS6043648B2 (en) 1984-02-08 1985-09-30 松下電器産業株式会社 bistable plunger
JPH07156039A (en) * 1993-11-30 1995-06-20 Disco Abrasive Syst Ltd Bellows mechanism of cutting device
JP4216565B2 (en) * 2002-10-28 2009-01-28 株式会社ディスコ Cutting equipment
JP4295496B2 (en) * 2002-12-03 2009-07-15 株式会社ディスコ Bellows mechanism and cutting device with bellows mechanism
JP2006007391A (en) * 2004-06-29 2006-01-12 Mori Seiki Co Ltd Chip discharging device
JP4657688B2 (en) * 2004-11-29 2011-03-23 株式会社ディスコ Cutting equipment
DE102006015799B4 (en) * 2006-04-03 2009-11-12 Gebr. Heller Maschinenfabrik Gmbh Cover for machine guides
EP2439201B1 (en) * 2006-06-16 2013-08-07 H. Lundbeck A/S Compounds with combined sert, 5-ht3 and 5-ht1a activity
JP2008004620A (en) * 2006-06-20 2008-01-10 Disco Abrasive Syst Ltd Cutting device
JP5096100B2 (en) * 2007-10-05 2012-12-12 株式会社ディスコ Cutting equipment
JP2012024885A (en) * 2010-07-23 2012-02-09 Disco Corp Working device with cutting tool
JP2012051081A (en) * 2010-09-02 2012-03-15 Disco Corp Cutting device
CN202763456U (en) * 2012-06-06 2013-03-06 广州泰胜数控机械有限公司 Machine tool worktable
KR101484985B1 (en) * 2014-04-24 2015-01-21 주식회사 한성Gt Chip cover for machine tool
JP2017019044A (en) * 2015-07-10 2017-01-26 株式会社ディスコ Bellows cover and cutting device using the same
JP6598639B2 (en) * 2015-10-30 2019-10-30 Towa株式会社 Industrial equipment

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI775292B (en) * 2020-02-10 2022-08-21 日商Towa股份有限公司 Machining device

Also Published As

Publication number Publication date
CN109560015B (en) 2023-06-02
KR102205063B1 (en) 2021-01-20
KR20190036469A (en) 2019-04-04
JP6876586B2 (en) 2021-05-26
CN109560015A (en) 2019-04-02
TWI734937B (en) 2021-08-01
JP2019058995A (en) 2019-04-18

Similar Documents

Publication Publication Date Title
TW201914737A (en) Processing device
CN106956370B (en) Conveying mechanism of processing device
JP5945182B2 (en) Tool for cutting tools
KR101606024B1 (en) Glass dividing device and glass dividing method
JP6598639B2 (en) Industrial equipment
JP5248987B2 (en) Transport mechanism
KR20170113169A (en) Mobile body feeding mechanism and processing apparatus
TWI669201B (en) Cutting device
KR102460049B1 (en) Cutting method of workpiece
JP5965815B2 (en) Cutting equipment
TWI609419B (en) Cutting device
JP2004142054A (en) Machine tool having dust collector
JP4024040B2 (en) Machine Tools
JP2007088157A (en) Cutting device
JP2002233926A5 (en)
US11839933B2 (en) Laser processing apparatus
JP5336754B2 (en) Cutting equipment
JP6388813B2 (en) Cutting equipment
JP6746208B2 (en) Cutting equipment
JP6762864B2 (en) Processing equipment
JP6120627B2 (en) Cutting equipment
WO2023281817A1 (en) Processing device and method for manufacturing processed article
JP5922381B2 (en) Processing equipment equipped with a bite tool
JP5504471B2 (en) Foreign machine for wire saw
JP7300952B2 (en) Conveyor and cutting equipment