TW201902620A - Double-sided grinding device - Google Patents

Double-sided grinding device Download PDF

Info

Publication number
TW201902620A
TW201902620A TW107111514A TW107111514A TW201902620A TW 201902620 A TW201902620 A TW 201902620A TW 107111514 A TW107111514 A TW 107111514A TW 107111514 A TW107111514 A TW 107111514A TW 201902620 A TW201902620 A TW 201902620A
Authority
TW
Taiwan
Prior art keywords
hook
double
upper platen
platen
groove
Prior art date
Application number
TW107111514A
Other languages
Chinese (zh)
Other versions
TWI728241B (en
Inventor
小田桐茂
大山貴史
井上裕介
Original Assignee
日商創技股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商創技股份有限公司 filed Critical 日商創技股份有限公司
Publication of TW201902620A publication Critical patent/TW201902620A/en
Application granted granted Critical
Publication of TWI728241B publication Critical patent/TWI728241B/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/04Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/07Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
    • B24B37/08Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for double side lapping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/27Work carriers
    • B24B37/28Work carriers for double side lapping of plane surfaces
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/34Accessories
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/017Devices or means for dressing, cleaning or otherwise conditioning lapping tools

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)

Abstract

Provided is a double-side polishing apparatus capable of maintaining an upper platen horizontally during dressing while suppressing deterioration of workability when dressing the upper platen. In the double-side polishing apparatus (1) that polishes both surfaces of a workpiece by a lower platen (2) and an upper platen (3), it is configured with a driver (10) penetrating the lower platen (2) and rotating around an axis, a support mechanism (an elevating actuator (9), an aligning bearing (9b)) for hangingly supporting the upper platen (3) in a swingable and rotatable manner, a hook (20) provided on a peripheral edge of a center opening (3b) of the upper platen (3), a groove portion (11) formed on a peripheral surface of the driver (10) and into which the hook (20) can be inserted when a circumferential relative rotation angle between the upper platen (3) and the driver (10) is a predetermined angle, an abutment region (12) formed on an upper surface (10c) of the driver (10), and a projection portion (13) formed on the abutment region (12) and in contact with the hook (20).

Description

雙面研磨裝置Double-side grinding device

本發明係有關一種對設置於上定盤與下定盤之間的工件之雙面進行研磨之雙面研磨裝置之發明。The present invention relates to a double-side polishing device for polishing both sides of a workpiece disposed between an upper platen and a lower platen.

以往,已知的有:藉由萬能接頭及對位軸承將上定盤連接到設置於裝置上部之氣缸軸上,並且在中心鼓之外周面上形成沿軸向形成之第一槽以及長度不同於第一槽之第二槽,使設置於上定盤之掛鉤與第一槽或第二槽卡合,以便將中心鼓之旋轉力傳遞到上定盤之雙面研磨裝置(例如,參照專利文獻1)。In the past, it has been known that the upper fixed plate is connected to a cylinder shaft provided on the upper part of the device through a universal joint and a counter bearing, and a first groove formed in the axial direction is formed on the outer peripheral surface of the center drum and the length is different In the second groove of the first groove, the hook provided on the upper plate is engaged with the first groove or the second groove, so that the rotation force of the center drum is transmitted to the double-side grinding device of the upper plate (for example, refer to the patent Literature 1).

[現有技術文獻] [專利文獻] 專利文獻1:日本特開第2017-1151號公報[Prior Art Document] [Patent Document] Patent Document 1: Japanese Patent Laid-Open No. 2017-1151

[發明要解決之課題] 在習知的雙面研磨裝置中,在研磨工件時為了使上定盤下降到工件研磨位置,將形成於上定盤之掛鉤插入到第一槽中。另一方面,在清洗或修整(dressing)(以下,簡稱為「修整」)貼在上定盤之研磨墊時,將掛鉤插入到第二槽中。再者 ,掛鉤由從下方支撐形成於該第二槽之掛鉤之支撐面來支撐,使上定盤停在工件研磨位置之上方位置,從而維持修整期間之上定盤之水平狀態。[Problems to be Solved by the Invention] In the conventional double-side polishing apparatus, a hook formed on the upper platen is inserted into the first groove in order to lower the upper platen to the workpiece grinding position when grinding the workpiece. On the other hand, when cleaning or dressing (hereinafter, simply referred to as "dressing") is attached to the polishing pad of the upper platen, the hook is inserted into the second groove. Furthermore, the hook is supported by a supporting surface supporting the hook formed in the second groove from below, so that the upper platen stops at a position above the workpiece grinding position, thereby maintaining the horizontal state of the upper platen during the trimming.

但是,該以往的雙面研磨裝置中,無論研磨工件時與修整研磨面時的哪一個,都需要將掛鉤插入槽中。也就是說,即使在修整上定盤時,亦需要調整上定盤與中心鼓之相對旋轉角度,以便掛鉤能夠插入所需之槽中,從而產生修整時之作業性降低之問題。However, in this conventional double-side polishing apparatus, it is necessary to insert the hook into the groove regardless of whether the workpiece is being polished or the polishing surface is being trimmed. That is, even when trimming the upper plate, the relative rotation angle between the upper plate and the center drum needs to be adjusted so that the hook can be inserted into the required groove, thereby causing a problem in that the workability during trimming is reduced.

進一步,以往的雙面研磨裝置中,雖然形成有一對第二槽,但是由於機械加工精度的問題導致該一對第二槽之槽深度產生差異的情況下,會有上定盤在修整時傾斜的顧慮。Further, in the conventional double-side polishing apparatus, although a pair of second grooves are formed, if the depth of the grooves of the pair of second grooves is different due to the problem of machining accuracy, the upper plate may be inclined during trimming. Concerns.

本發明著眼於上述問題而做出,因此,本發明之目的在於提供一種雙面研磨裝置,能夠抑制修整上定盤時之作業性降低,並且在修整過程中能夠將上定盤維持在水平。The present invention has been made focusing on the above-mentioned problems. Therefore, an object of the present invention is to provide a double-side polishing device that can suppress a decrease in workability when trimming an upper platen, and can maintain the upper platen at a level during the trimming process.

為了實現上述目的,本發明提供一種利用下定盤與上定盤研磨工件之雙面之雙面研磨裝置,其包括:驅動件、支撐機構、掛鉤、槽部、接觸區域、及突起部。In order to achieve the above object, the present invention provides a double-side grinding device for grinding both sides of a workpiece by using a lower platen and an upper platen, which include a driving member, a supporting mechanism, a hook, a groove portion, a contact area, and a protruding portion.

上述驅動件貫穿下定盤,並且能夠圍繞軸旋轉。The driving member penetrates the lower fixed plate and can rotate around the shaft.

上述支撐機構能夠擺動且能夠旋轉地吊掛支撐上定盤。The support mechanism can swing and rotatably suspend and support the upper platen.

上述掛鉤從上定盤之內周緣朝著中心方向延伸。The hook extends from the inner periphery of the upper plate toward the center.

上述槽部形成於驅動件之圓周表面並且朝著驅動件之軸向延伸,當上定盤與驅動件之圓周方向之相對旋轉角度為既定角度時,能夠插入掛鉤。The groove is formed on the circumferential surface of the driving member and extends toward the axial direction of the driving member. When the relative rotation angle of the upper plate and the circumferential direction of the driving member is a predetermined angle, the hook can be inserted.

上述接觸區域形成於驅動件之上表面。The contact area is formed on an upper surface of the driving member.

上述突起部設置於接觸區域,並且在掛鉤接觸到接觸區域之狀態下與掛鉤接觸。The protruding portion is provided in the contact area and is in contact with the hook in a state where the hook contacts the contact area.

[發明效果]其結果,能夠抑制修整上定盤之研磨面時的作業性降低,並且在修整過程中能夠將上定盤維持在水平。[Effects of the Invention] As a result, it is possible to suppress a decrease in workability when trimming the polished surface of the upper platen, and to maintain the upper platen at a level during the dressing process.

[實施形態]以下,基於附圖所示的實施例1對本發明之雙面研磨裝置之實施形態進行說明。[Embodiment] Hereinafter, an embodiment of the double-side polishing apparatus of the present invention will be described based on Example 1 shown in the drawings.

(實施例1)(Example 1)

首先,對結構進行說明。First, the structure will be described.

實施例1之雙面研磨裝置1係對半導體晶片、水晶晶片、藍寶石晶片、玻璃晶片或者陶瓷晶片等薄板狀之工件WR之正反兩面進行研磨加工之裝置。以下,將實施例1之雙面研磨裝置1之結構分為「整體結構」、「驅動件之詳細結構」、「掛鉤之詳細結構」來進行說明。The double-side polishing device 1 of Example 1 is a device for polishing the front and back surfaces of a thin plate-shaped workpiece WR such as a semiconductor wafer, a crystal wafer, a sapphire wafer, a glass wafer, or a ceramic wafer. Hereinafter, the structure of the double-side polishing apparatus 1 of Example 1 is divided into "the overall structure", "the detailed structure of a driver", and "the detailed structure of a hook", and it demonstrates.

[整體結構][the whole frame]

圖1係表示實施例1之雙面研磨裝置之整體結構之概略示意截面圖。以下,基於圖1對實施例1之雙面研磨裝置之整體結構進行說明。FIG. 1 is a schematic cross-sectional view showing the overall structure of a double-side polishing apparatus of Example 1. FIG. Hereinafter, the overall structure of the double-side polishing apparatus of Example 1 will be described based on FIG. 1.

如圖1所示,實施例1之雙面研磨裝置1具有以軸線L1為中心同心設置之下定盤2、上定盤3、設置於下定盤2中央之太陽齒輪4、及以包圍下定盤2之外周之方式佈置的內齒輪5。As shown in FIG. 1, the double-side polishing apparatus 1 of the embodiment 1 has a lower platen 2, an upper platen 3, a sun gear 4 provided in the center of the lower platen 2, and a lower platen 2 concentrically disposed around the axis L1 as a center. Internal gear 5 arranged in a peripheral manner.

太陽齒輪4、下定盤2、內齒輪5分別藉由驅動軸6、7、8連接到圖未示之驅動源,並被旋轉驅動。The sun gear 4, the lower fixed plate 2, and the internal gear 5 are respectively connected to a driving source (not shown) through drive shafts 6, 7, and 8 and are rotationally driven.

另一方面,上定盤3藉由安裝於上定盤3之上表面之定盤吊架9a被吊掛支撐於升降用致動器9之桿9c上。在此,桿9c之前端部插裝球面軸承等對位軸承9b。因此,上定盤3藉由升降用致動器9能夠擺動且能夠旋轉地被吊掛支撐。也就是說,藉由升降用致動器9及對位軸承9b構成吊掛支撐上定盤3之支撐機構。On the other hand, the upper platen 3 is hung and supported on a lever 9c of the lifting actuator 9 by a platen hanger 9a mounted on the upper surface of the upper platen 3. Here, an alignment bearing 9b such as a spherical bearing is inserted at the front end of the rod 9c. Therefore, the upper platen 3 is supported by the lifting actuator 9 so as to be swingable and rotatable. That is, the support mechanism for hanging and supporting the upper platen 3 is constituted by the lifting actuator 9 and the registration bearing 9b.

另外,在上定盤3之下方設有貫穿下定盤2之驅動件10。該驅動件10具有沿軸線L1延伸之驅動軸10a、及形成於驅動軸10a之前端之驅動件主體10b。In addition, a driving member 10 penetrating the lower platen 2 is provided below the upper platen 3. The driver 10 has a driver shaft 10a extending along the axis L1, and a driver body 10b formed at the front end of the driver shaft 10a.

再者 ,在該驅動件10中,驅動軸10a連接到圖未示之驅動源,並且可以圍繞軸線L1旋轉。進一步,在驅動件主體10b之圓周表面上形成有多個(在此是4個)槽部11。另一方面,在上定盤3之中心開口3b之周緣(內周緣)安裝有多個(在此為4個)朝向上定盤3之中心O延伸之掛鉤20。Furthermore, in the driving member 10, the driving shaft 10a is connected to a driving source (not shown) and can be rotated about the axis L1. Further, a plurality of (here, four) groove portions 11 are formed on the circumferential surface of the driver body 10b. On the other hand, a plurality of (here, four) hooks 20 extending toward the center O of the upper plate 3 are attached to the periphery (inner periphery) of the center opening 3 b of the upper plate 3.

再者 ,在研磨工件WR時,桿9c從升降用致動器9突出,並且在上定盤3下降的同時,掛鉤20逐個分別插入到各槽部11。於是,槽部11與掛鉤20在圓周方向上進行干涉,從而驅動件10之旋轉力被傳遞到上定盤3,該上定盤3旋轉驅動。Furthermore, when the workpiece WR is being ground, the lever 9c protrudes from the lifting actuator 9, and while the upper platen 3 is lowered, the hooks 20 are inserted into the respective groove portions 11 one by one. Then, the groove portion 11 and the hook 20 interfere in the circumferential direction, so that the rotational force of the driver 10 is transmitted to the upper platen 3, which is rotationally driven.

在下定盤2及上定盤3彼此相對之面上各自黏貼有研磨墊2a、3a。Polishing pads 2a and 3a are respectively adhered to the surfaces of the lower platen 2 and the upper platen 3 facing each other.

再者,在該雙面研磨裝置1中,在下定盤2與上定盤3之間設置由遊星輪板CA保持之工件WR。在此,如圖1所示,遊星輪板CA與太陽齒輪4及內齒輪5嚙合,並藉由該太陽齒輪4及內齒輪5之旋轉而自轉及公轉。於是,藉由該遊星輪板CA之自轉及公轉,由遊星輪板CA保持之工件WR在下定盤2與上定盤3之間移動,從而雙面被研磨。Further, in the double-side polishing apparatus 1, a workpiece WR held by a star wheel plate CA is provided between the lower platen 2 and the upper platen 3. Here, as shown in FIG. 1, the planetary gear plate CA meshes with the sun gear 4 and the internal gear 5, and rotates and revolves by the rotation of the sun gear 4 and the internal gear 5. Then, by the rotation and revolution of the star wheel plate CA, the workpiece WR held by the star wheel plate CA moves between the lower platen 2 and the upper platen 3, so that both sides are polished.

(驅動件之詳細結構)(Detailed structure of the driver)

圖2係表示實施例1之雙面研磨裝置之主要部分之斜視圖,圖3係表示實施例1之驅動件之俯視圖。以下,基於圖2及圖3,對實施例1之驅動件之詳細結構進行說明。FIG. 2 is a perspective view showing a main part of the double-side polishing apparatus according to the first embodiment, and FIG. 3 is a plan view showing a driving member according to the first embodiment. Hereinafter, the detailed structure of the driver in Embodiment 1 will be described based on FIGS. 2 and 3.

如上所述,驅動件10藉由圖未示之驅動源來旋轉驅動,並且將旋轉力傳遞到上定盤3,使得該上定盤3旋轉驅動。如圖2所示,該驅動件10具有連接到驅動源並沿著軸線L1配設之驅動軸10a、及形成於驅動軸10a之前端之驅動件主體10b。As described above, the driving member 10 is rotationally driven by a driving source (not shown), and transmits the rotational force to the upper platen 3 so that the upper platen 3 is rotationally driven. As shown in FIG. 2, the driving member 10 includes a driving shaft 10 a connected to a driving source and disposed along the axis L1, and a driving member body 10 b formed at a front end of the driving shaft 10 a.

驅動軸10a貫穿下定盤2之中心開口2b,將驅動件主體10b支撐在從下定盤2向上方突出之位置(參見圖1)。The drive shaft 10a passes through the central opening 2b of the lower platen 2 and supports the driver body 10b at a position protruding upward from the lower platen 2 (see FIG. 1).

驅動件主體10b之圓周表面形成有多個(在此為4個)槽部11,面向上定盤3之上表面10c形成有接觸區域12,該接觸區域12上形成有多個(在此為2個)突起部13。A plurality of (four in this case) groove portions 11 are formed on the peripheral surface of the driver body 10b, and a contact area 12 is formed on the upper surface 10c of the upper fixed plate 3, and a plurality of contact areas 12 (here, 2 pieces) of protruding portion 13.

如圖2所示,槽部11沿軸線L1即驅動件10之軸向延伸,並且在驅動件主體10b之徑向及上下方向上敞開。另外,4個槽部11之各自之槽寬度G1被設定為能夠插入掛鉤20之相同尺寸(參見圖3)。此外,「槽寬度G1」係驅動件主體10b之內側面11a之圓周方向之間隔尺寸。As shown in FIG. 2, the groove portion 11 extends along the axis L1, that is, the axial direction of the driver 10, and is opened in the radial direction and the vertical direction of the driver body 10 b. In addition, the respective groove widths G1 of the four groove portions 11 are set to the same size in which the hook 20 can be inserted (see FIG. 3). In addition, the "groove width G1" is an interval dimension in the circumferential direction of the inner side surface 11a of the driver body 10b.

進一步,在該實施例1中,4個槽部11沿驅動件主體10b之圓周方向間隔90°來形成,並且這些槽部11設置於以上定盤3之中心O(軸線L1經過的點)為對稱點之點對稱位置上。Further, in this embodiment 1, four groove portions 11 are formed at intervals of 90 ° in the circumferential direction of the driver body 10b, and these groove portions 11 are provided at the center O (the point where the axis L1 passes) of the above-mentioned fixed plate 3 as The point of symmetry is in a symmetrical position.

接觸區域12係掛鉤20之前端部22之接觸面22a能夠接觸之區域,並且具有相比該接觸面22a足夠寬之面積。在此,如圖3所示,接觸區域12是沿著驅動件主體10b之周緣部之區域。另外,該接觸區域12上重複形成有槽部11,並且槽部11之上端在該接觸區域12內敞開。The contact area 12 is an area where the contact surface 22 a of the front end portion 22 of the hook 20 can contact, and has an area sufficiently wider than the contact surface 22 a. Here, as shown in FIG. 3, the contact region 12 is a region along the peripheral edge portion of the driver body 10 b. In addition, a groove portion 11 is repeatedly formed in the contact area 12, and an upper end of the groove portion 11 is opened in the contact area 12.

突起部13從接觸區域12沿著驅動件10之軸向(軸線L1)向上方突出,並且能夠接觸到掛鉤20之前端部22之側面22b,而掛鉤20處於與接觸區域12接觸之狀態。在此,如圖3所示,雖然突起部13沿著驅動件主體10b之圓周方向彎曲,但是其圓周方向尺寸G2被設定為充分小於槽部11之間的間隔尺寸。也就是說,雖然槽部11之上端在接觸區域12內敞開,並且突起部13形成於接觸區域12上,但是該接觸區域12充分確保掛鉤20之前端部22之接觸面22a所接觸之面積。The protruding portion 13 protrudes upward from the contact area 12 along the axial direction (axis line L1) of the driver 10, and can contact the side surface 22b of the front end portion 22 of the hook 20, and the hook 20 is in contact with the contact area 12. Here, as shown in FIG. 3, although the protruding portion 13 is bent along the circumferential direction of the driver body 10 b, its circumferential dimension G2 is set to be sufficiently smaller than the interval size between the groove portions 11. That is, although the upper end of the groove portion 11 is open in the contact area 12 and the protrusion portion 13 is formed on the contact area 12, the contact area 12 sufficiently ensures the area contacted by the contact surface 22 a of the end portion 22 before the hook 20.

此外,突起部13可以與驅動件主體10b分開形成,並藉由圖未示之螺釘或者焊接等固定在驅動件主體10b上,也可以與驅動件主體10b一體地形成。In addition, the protruding portion 13 may be formed separately from the driver main body 10b, and fixed to the driver main body 10b by screws or welding not shown, or may be formed integrally with the driver main body 10b.

(掛鉤之詳細結構)(Detailed structure of the hook)

圖4係表示實施例1之上定盤之中央部分之俯視圖。以下,基於圖2及圖4,對設置於實施例1之上定盤之掛鉤之詳細結構進行說明。Fig. 4 is a plan view showing the central portion of the upper plate in the first embodiment. Hereinafter, the detailed structure of the hook provided on the fixing plate of the first embodiment will be described based on FIG. 2 and FIG. 4.

掛鉤20被固定於上定盤3之中心開口3b之周緣部(內周緣),並朝向上定盤3之中心O延伸。如圖4所示,該掛鉤20具有:固定部21,其一端固定於上定盤3之上表面,並且前端朝著上定盤3之中心開口3b之內側突出;前端部22,其形成於固定部21之前端,並朝著下定盤2延伸。在此,如圖1及圖4所示,固定部21延伸到前端部22位於驅動件主體10b之上表面10c之上方為止,在俯視時,前端部22相對於驅動件主體10b之上表面10c重複。The hook 20 is fixed to the peripheral edge portion (inner peripheral edge) of the center opening 3 b of the upper platen 3 and extends toward the center O of the upper platen 3. As shown in FIG. 4, the hook 20 has: a fixing portion 21 whose one end is fixed to the upper surface of the upper platen 3 and whose front end protrudes toward the inner side of the central opening 3 b of the upper platen 3; a front end portion 22 which is formed on The front end of the fixing portion 21 extends toward the lower fixed plate 2. Here, as shown in FIGS. 1 and 4, the fixing portion 21 extends until the front end portion 22 is located above the upper surface 10 c of the driver body 10 b. In a plan view, the front end portion 22 is opposite to the upper surface 10 c of the driver body 10 b. repeat.

另外,該掛鉤20具有:第一掛鉤20A,其前端部22之掛鉤寬度W1略小於槽部11之槽寬度G1,並且插入到槽部11時前端部22之側面22b接觸槽部11之內側面11a;及第二掛鉤20B,其前端部22之掛鉤寬度W2足夠小於槽部11之槽寬度G1,並且插入到槽部11時前端部22之側面22b並不接觸槽部11之內側面11a。此外,「掛鉤寬度」係上定盤3之圓周方向上之掛鉤前端部尺寸。In addition, the hook 20 has a first hook 20A, the hook width W1 of the front end portion 22 is slightly smaller than the groove width G1 of the groove portion 11, and the side surface 22b of the front end portion 22 contacts the inner side surface of the groove portion 11 when inserted into the groove portion 11. 11a; and the second hook 20B, the hook width W2 of the front end portion 22 is sufficiently smaller than the groove width G1 of the groove portion 11, and the side surface 22b of the front end portion 22 does not contact the inner side surface 11a of the groove portion 11 when inserted into the groove portion 11. The “hook width” refers to the size of the front end portion of the hook in the circumferential direction of the upper plate 3.

再者,第一掛鉤20A與第二掛鉤20B分別設有2個,在此,沿著上定盤3之圓周方向每隔90°交替佈置。也就是說,如圖4所示,4個掛鉤20設置於以上定盤3之中心O(軸線L1經過的點)為對稱點之點對稱位置上,並且設置於第一掛鉤20A之間相對、第二掛鉤20B之間相對的位置上。Furthermore, two first hooks 20A and two second hooks 20B are respectively provided, and here, they are alternately arranged every 90 ° along the circumferential direction of the upper platen 3. That is, as shown in FIG. 4, the four hooks 20 are disposed at a point symmetrical position where the center O (the point where the axis L1 passes) of the above fixed plate 3 is a point of symmetry, and are disposed between the first hooks 20A, The second hooks 20B are in opposite positions.

接著,將實施例1之雙面研磨裝置之作用分為「修整時的上定盤支撐作用」和「工件研磨時的上定盤支撐作用」進行說明。Next, the functions of the double-side polishing apparatus of Example 1 are divided into "upper plate support operation during dressing" and "upper plate support operation during workpiece grinding".

[修整時的上定盤支撐作用][Support function of upper plate during dressing]

圖5及圖6表示使用實施例1之雙面研磨裝置修整上定盤時的主要部分。以下,基於圖5及圖6,對實施例1之雙面研磨裝置在修整時的上定盤支撐作用進行說明。5 and 6 show the main parts when the upper platen is trimmed using the double-side polishing apparatus of the first embodiment. Hereinafter, the supporting action of the upper platen of the double-side polishing apparatus of Example 1 during dressing will be described based on FIGS. 5 and 6.

在實施例1之雙面研磨裝置1中,研磨工件時,使上定盤3下降, 用上定盤3與下定盤2夾持載置於下定盤2上之工件WR。In the double-side polishing apparatus 1 of Example 1, when the workpiece is ground, the upper platen 3 is lowered, and the workpiece WR placed on the lower platen 2 is held between the upper platen 3 and the lower platen 2.

在此,即便工件WR或保持工件WR之遊星輪板CA之厚度發生變化,為了均衡作用於工件WR上之按壓力,另外,為了使上定盤3追蹤伴隨下定盤2之旋轉之下定盤2之微小之上下振動(搖擺),上定盤3藉由對位軸承9b吊掛支撐在升降用致動器9上,從而能夠容許相對於水平方向上的偏轉角。Here, even if the thickness of the work piece WR or the star wheel plate CA holding the work piece WR changes, in order to equalize the pressing force acting on the work piece WR, and to make the upper platen 3 track the lower platen 2 accompanying the rotation of the lower platen 2 The small upper and lower vibrations (swing), the upper fixed plate 3 is hung and supported on the lifting actuator 9 by the positioning bearing 9b, thereby allowing a deflection angle with respect to the horizontal direction.

另一方面,下定盤2及上定盤3上各自黏貼有研磨墊2a、3a,工件WR藉由下定盤2、上定盤3及遊星輪板CA之旋轉、以及研磨墊2a、3a或圖未示之供應機構所供應之漿料進行研磨。但是,當長時間使用雙面研磨裝置1時,漿料或切屑粉等進入研磨墊2a、3a,造成研磨墊2a、3a之堵塞或研磨墊2a、3a之表面變形。因此,由於研磨速率之顯著降低而進行研磨墊2a、3a之修整。On the other hand, the lower platen 2 and the upper platen 3 are respectively attached with polishing pads 2a, 3a. The workpiece WR is rotated by the lower platen 2, the upper platen 3, and the star wheel plate CA, and the polishing pads 2a, 3a or FIG. The slurry supplied from a supply mechanism not shown is ground. However, when the double-side polishing apparatus 1 is used for a long time, slurry or chip powder enters the polishing pads 2a, 3a, causing blockage of the polishing pads 2a, 3a or deformation of the surfaces of the polishing pads 2a, 3a. Therefore, the polishing pads 2a, 3a are trimmed due to a significant reduction in the polishing rate.

在此,藉由如下方式進行研磨墊2a、3a之修整,例如,在下定盤2與上定盤3之間插入修整部件,並分別旋轉下定盤2及上定盤3的同時進一步將該修整部件向研磨墊2a、3a之研磨面按壓,使其在下定盤2與上定盤3之外周部與內周部之間往返移動。Here, the dressing of the polishing pads 2a and 3a is performed by, for example, inserting a dressing member between the lower platen 2 and the upper platen 3, and further rotating the lower platen 2 and the upper platen 3 while dressing the same The components are pressed against the polishing surfaces of the polishing pads 2a and 3a, so that they move back and forth between the outer peripheral portion and the inner peripheral portion of the lower platen 2 and the upper platen 3.

此時,由於需要將修整部件插入下定盤2與上定盤3之間,所以上定盤3相對於下定盤2以留有間隙的方式被保持。但是,如上所述,由於該上定盤3係藉由對位軸承9b吊掛支撐,所以將修整部件按壓在上定盤3之研磨墊3a上時,上定盤3之傾斜度發生變化,無法使修整部件適當接觸上定盤3之研磨墊3a。At this time, since the trimming member needs to be inserted between the lower platen 2 and the upper platen 3, the upper platen 3 is held with a gap relative to the lower platen 2. However, as described above, since the upper platen 3 is suspended and supported by the alignment bearing 9b, when the trimming member is pressed against the polishing pad 3a of the upper platen 3, the inclination of the upper platen 3 changes. The dressing member cannot be properly brought into contact with the polishing pad 3a of the upper platen 3.

對此,如圖5及圖6所示,在實施例1之雙面研磨裝置1中,當上定盤3藉由升降用致動器9下降時,設置於上定盤3之掛鉤20之前端部22之接觸面22a與形成於驅動件主體10b之上表面10c之接觸區域12相接觸。因此,上定盤3藉由掛鉤20由驅動件10之上表面10c支撐。In contrast, as shown in FIG. 5 and FIG. 6, in the double-side polishing apparatus 1 of the first embodiment, when the upper platen 3 is lowered by the lifting actuator 9, the hook 20 of the upper platen 3 is provided. The contact surface 22a of the front end portion 22 is in contact with the contact area 12 formed on the upper surface 10c of the driver body 10b. Therefore, the upper platen 3 is supported by the upper surface 10 c of the driving member 10 by the hook 20.

其結果,修整上定盤3時,即便將修整部件按壓在上定盤3之研磨墊3a上,由於驅動件10之上表面10c干涉到掛鉤20,從而防止上定盤3之晃動。因此,在修整過程中能夠將上定盤3維持在水平。As a result, when trimming the upper platen 3, even if the trimming member is pressed against the polishing pad 3a of the upper platen 3, the upper surface 10c of the driver 10 interferes with the hook 20, thereby preventing the upper platen 3 from shaking. Therefore, the upper platen 3 can be maintained at a level during the trimming process.

另外,如圖5所示,掛鉤20之前端部22之接觸面22a所接觸之接觸區域12係沿驅動件主體10b之周緣部之區域。另外,雖然槽部11之上端在該接觸區域12上敞開並形成有突起部13,但是充分確保了掛鉤20之前端部22之接觸面22a所接觸之面積。因此,無需嚴密調整上定盤3與驅動件10之圓周方向之相對旋轉角度,使上定盤3下降而掛鉤20與形成在驅動件主體10b之上表面10c之接觸區域12相接觸。因此,能夠抑制修整時作業性降低。In addition, as shown in FIG. 5, the contact area 12 contacted by the contact surface 22 a of the front end portion 22 of the hook 20 is an area along the peripheral edge portion of the driver body 10 b. In addition, although the upper end of the groove portion 11 is opened on the contact area 12 and a protruding portion 13 is formed, the area contacted by the contact surface 22 a of the front end portion 22 of the hook 20 is sufficiently ensured. Therefore, there is no need to strictly adjust the relative rotation angle of the upper platen 3 and the circumferential direction of the driving member 10 to lower the upper platen 3 and the hook 20 contacts the contact area 12 formed on the upper surface 10c of the driving member body 10b. Therefore, a decrease in workability during dressing can be suppressed.

再者,在實施例1中,形成於驅動件主體10b之上表面10c之接觸區域12上形成有沿驅動件10之軸向(軸線L1)向上方突出之突起部13,該突起部13能夠與接觸到接觸區域12之掛鉤20之前端部22之側面22b接觸。Furthermore, in the first embodiment, the contact area 12 formed on the upper surface 10c of the driver body 10b is formed with a protrusion 13 protruding upward in the axial direction (axis L1) of the driver 10, and the protrusion 13 can It is in contact with the side surface 22b of the front end portion 22 of the hook 20 in contact with the contact area 12.

因此,當驅動件10之驅動軸10a旋轉時,如圖5所示,突起部13與掛鉤20之前端部22之側面22b接觸。因此,驅動件10之旋轉力被傳遞至掛鉤20,上定盤3旋轉。Therefore, when the driving shaft 10 a of the driving member 10 rotates, as shown in FIG. 5, the protruding portion 13 contacts the side surface 22 b of the front end portion 22 of the hook 20. Therefore, the rotational force of the driving member 10 is transmitted to the hook 20, and the upper platen 3 is rotated.

也就是說,藉由該突起部13,能夠將驅動件10之旋轉力傳遞至上定盤3,使上定盤3旋轉,從而能夠進行修整。其結果,能夠適當進行修整作業。That is, by the protrusion 13, the rotational force of the driver 10 can be transmitted to the upper platen 3 and the upper platen 3 can be rotated, so that the trimming can be performed. As a result, a trimming operation can be performed appropriately.

另外,在該實施例1中,相對於所設置的4個掛鉤20,設置2個突起部13。也就是說,突起部13之數量(2個)比掛鉤20之數量(4個)少。因此,如圖5所示,並不是所有的掛鉤20與突起部13接觸,從而產生了與突起部13接觸並從驅動件10傳遞旋轉力之掛鉤20(圖5中之第二掛鉤20B)、並不與突起部13接觸並不傳遞旋轉力之掛鉤20(圖5中之第一掛鉤20A)。In addition, in the first embodiment, two protruding portions 13 are provided with respect to the four hooks 20 provided. That is, the number of protrusions 13 (two) is smaller than the number of hooks 20 (four). Therefore, as shown in FIG. 5, not all the hooks 20 are in contact with the protruding portion 13, so that a hook 20 (the second hook 20B in FIG. 5) that comes into contact with the protruding portion 13 and transmits the rotational force from the driving member 10 is generated, The hook 20 (the first hook 20A in FIG. 5) is not in contact with the protrusion 13 and does not transmit a rotational force.

因此,在修整時旋轉力並沒有輸入到所有的掛鉤20,根據上定盤3與驅動件10之圓周方向上之相對旋轉角度,可以使每次進行修整時輸入旋轉力之掛鉤20不同。因此,能夠分散作用於各掛鉤20之負擔。因此,能夠抑制掛鉤20之破損或不良狀態之產生。Therefore, the rotational force is not input to all the hooks 20 during dressing. According to the relative rotation angles of the upper plate 3 and the driving member 10 in the circumferential direction, the hooks 20 that input the rotational force each time the dressing is performed may be different. Therefore, the load acting on each hook 20 can be distributed. Therefore, it is possible to suppress damage or occurrence of a defective state of the hook 20.

特別是,如圖5所示,前端部22之掛鉤寬度W1略小於槽部11之槽寬度G1,側面22b與槽部11之內側面11a接觸之第一掛鉤20A並不接觸突起部13,前端部22之掛鉤寬度W2足夠小於槽部11之槽寬度G1,側面22b並不與槽部11之內側面11a接觸之第二掛鉤20B接觸突起部13時,如後所述,在研磨工件時,來自驅動件10之旋轉力只傳遞至第一掛鉤20A,在修整時,只傳遞至第二掛鉤20B。In particular, as shown in FIG. 5, the hook width W1 of the front end portion 22 is slightly smaller than the groove width G1 of the groove portion 11, and the first hook 20A in which the side surface 22 b is in contact with the inner side surface 11 a of the groove portion 11 does not contact the protruding portion 13. When the hook width W2 of the portion 22 is sufficiently smaller than the groove width G1 of the groove portion 11, and when the second hook 20B whose side surface 22b does not contact the inner side surface 11a of the groove portion 11 contacts the protruding portion 13, as described later, when grinding the workpiece, The rotational force from the driving member 10 is transmitted only to the first hook 20A, and only the second hook 20B is transmitted during the trimming.

因此,在研磨工件時以及修整時,傳遞旋轉力之掛鉤20可以不同,從而能夠進一步分散作用於各掛鉤20之負擔。因此,能夠抑制掛鉤20的破損或不良狀態之產生。Therefore, the hooks 20 that transmit the rotational force may be different during grinding of the workpiece and during dressing, so that the load acting on each of the hooks 20 can be further dispersed. Therefore, it is possible to suppress damage or occurrence of a defective state of the hook 20.

另外,亦可以將第一掛鉤20A之掛鉤寬度W1與第二掛鉤20B之掛鉤寬度W2設為相同之掛鉤寬度。In addition, the hook width W1 of the first hook 20A and the hook width W2 of the second hook 20B may be set to the same hook width.

[研磨工件時的上定盤支撐作用][Support function of upper platen when grinding workpiece]

圖7及圖8示出了使用實施例1之雙面研磨裝置對工件進行研磨時之主要部分。以下,基於圖7及圖8,對實施例1之雙面研磨裝置在研磨工件時的上定盤支撐作用進行說明。FIG. 7 and FIG. 8 show the main parts when the workpiece is polished using the double-side polishing apparatus of the first embodiment. Hereinafter, based on FIG. 7 and FIG. 8, the supporting action of the upper platen when the double-side polishing apparatus of Example 1 is used for polishing a workpiece will be described.

如上所述,在實施例1之雙面研磨裝置1中,降下上定盤3並在下定盤2上載置上定盤3而對工件WR進行研磨。也就是說,在研磨工件WR時,首先,調整上定盤3之旋轉方向之角度或者驅動件10之旋轉方向之角度,以便上定盤3與驅動件10之圓周方向上之相對旋轉角度成既定角度。另外,該「既定角度」係設置於上定盤3之掛鉤20與形成於驅動件10之槽部11在上下方向上相對之角度。As described above, in the double-side polishing apparatus 1 of Example 1, the upper platen 3 is lowered and the upper platen 3 is placed on the lower platen 2 to polish the workpiece WR. That is, when grinding the workpiece WR, first, adjust the angle of the rotation direction of the upper platen 3 or the angle of the rotation direction of the drive member 10 so that the relative rotation angle of the upper platen 3 and the circumferential direction of the drive member 10 becomes Established angle. The “predetermined angle” is an angle in which the hook 20 provided on the upper platen 3 and the groove portion 11 formed in the driver 10 face each other in the vertical direction.

再者,上定盤3與驅動件10之圓周方向上之相對旋轉角度成為既定角度,並且掛鉤20與槽部11在上下方向上相對時,使桿9c從升降用致動器9突出,降下上定盤3。再者,如圖7及圖8所示,由於4個掛鉤20伴隨上定盤3之下降各自插入到4個槽部11,所以掛鉤20不被驅動件主體10b所干涉,可將上定盤3載置於下定盤2之上。In addition, when the relative rotation angle in the circumferential direction of the upper platen 3 and the driver 10 becomes a predetermined angle, and when the hook 20 and the groove portion 11 face each other in the vertical direction, the lever 9c protrudes from the lifting actuator 9 and is lowered.上 定 盘 3. Furthermore, as shown in FIG. 7 and FIG. 8, the four hooks 20 are inserted into the four groove portions 11 with the lowering of the upper platen 3, so that the upper platen 20 can be prevented from being interfered by the driver body 10b. 3 is placed on the lower platen 2.

再者,由於掛鉤20像這樣插入到槽部11內,當驅動件10之驅動軸10a旋轉時,如圖7所示,槽部11之內側面11a與第一掛鉤20A之側面22b接觸。因此,驅動件10之旋轉力被傳遞至第一掛鉤20A,上定盤3旋轉。Furthermore, since the hook 20 is inserted into the groove portion 11 in this way, when the driving shaft 10a of the driving member 10 rotates, as shown in FIG. 7, the inner side surface 11a of the groove portion 11 contacts the side surface 22b of the first hook 20A. Therefore, the rotational force of the driving member 10 is transmitted to the first hook 20A, and the upper platen 3 is rotated.

也就是說,可以藉由該槽部11將驅動件10之旋轉力傳遞至上定盤3,使上定盤3旋轉,從而能夠進行工件WR之研磨。其結果是,能夠適當地進行工件研磨作業。That is, the rotating force of the driving member 10 can be transmitted to the upper platen 3 through the groove portion 11 and the upper platen 3 can be rotated, so that the workpiece WR can be polished. As a result, the work grinding operation can be performed appropriately.

另外,從圖7可以看出,在該實施例1中,掛鉤20當中,前端部22之掛鉤寬度W1略小於槽部11之槽寬度G1之第一掛鉤20A之側面22b接觸槽部11之內側面11a,前端部22之掛鉤寬度W2足夠小於槽部11之槽寬度G1之第二掛鉤20B之側面22b並不接觸槽部11之內側面11a。因此,來自驅動件10之旋轉力只傳遞至第一掛鉤20A,旋轉力並不作用於第二掛鉤20B。研磨工件時,雖然需要將4個掛鉤20各自插入到4個槽部11,但是,就第二掛鉤20B而言,能夠緩解槽部11之間所要求之尺寸精度,從而可以使4個掛鉤20很容易插入到槽部11中。In addition, as can be seen from FIG. 7, in the first embodiment, among the hooks 20, the hook width W1 of the front end portion 22 is slightly smaller than the side surface 22 b of the first hook 20A of the groove width G1 of the groove portion 11 and contacts the inside of the groove portion 11. The side surface 11 a and the hook width W2 of the front end portion 22 are sufficiently smaller than the side surface 22 b of the second hook 20B of the groove width G1 of the groove portion 11 and do not contact the inner side surface 11 a of the groove portion 11. Therefore, the rotational force from the driving member 10 is transmitted only to the first hook 20A, and the rotational force does not act on the second hook 20B. When the workpiece is to be ground, although the four hooks 20 need to be inserted into the four groove portions 11 respectively, the second hook 20B can alleviate the dimensional accuracy required between the groove portions 11 and thus can make the four hooks 20 It is easily inserted into the groove portion 11.

此外,如上所述,研磨工件時與槽部11之內側面11a接觸之第一掛鉤20A,在修整時至少前端部22之接觸面22a接觸到接觸區域12,並能夠支撐上定盤3。也就是說,該第一掛鉤20A係兼而發揮如下作用之掛鉤,在研磨工件時傳遞旋轉力以及在修整時支撐上定盤。In addition, as described above, the first hook 20A that is in contact with the inner side surface 11 a of the groove portion 11 when grinding the workpiece, at least the contact surface 22 a of the front end portion 22 contacts the contact area 12 during dressing, and can support the upper platen 3. In other words, the first hook 20A is a hook that also functions to transmit the rotational force when grinding the workpiece and support the upper plate during dressing.

再者,在實施例1中,4個掛鉤20與4個槽部11各自沿著圓周方向以90°間隔來形成,兩者全都設置於以上定盤3之中心O(軸線L1經過之點)為對稱點之點對稱位置上。Furthermore, in the first embodiment, the four hooks 20 and the four groove portions 11 are formed at intervals of 90 ° along the circumferential direction, and both of them are set at the center O (the point where the axis L1 passes) of the above-mentioned fixed plate 3. It is a point of symmetry at a point of symmetry.

因此,在修整時,能夠藉由4個掛鉤20均衡地支撐上定盤3,並且不管在修整過程中施加到上定盤3之力之作用方向如何,可以抑制上定盤3之擺動並保持水平狀態。另一方面,在研磨工件時,能夠將各掛鉤20各自插入到槽部11內,驅動件10並不阻礙上定盤3之下降,能夠適當進行工件WR之研磨作業。Therefore, during trimming, the upper platen 3 can be supported by the four hooks 20 in a balanced manner, and regardless of the direction of the force applied to the upper platen 3 during the trimming process, the swing of the upper platen 3 can be suppressed and maintained. Horizontal state. On the other hand, when grinding a workpiece, each of the hooks 20 can be inserted into the groove portion 11, and the driver 10 does not hinder the lowering of the upper platen 3, and the grinding operation of the workpiece WR can be performed appropriately.

接下來,對效果進行說明。Next, effects will be described.

在實施例1的雙面研磨裝置1中,能夠得到以下列舉的效果。In the double-side polishing apparatus 1 of Example 1, the following effects can be obtained.

(1)利用下定盤2與上定盤3研磨工件WR雙面之雙面研磨裝置1構成為如下,包括: 驅動件10,貫穿上述下定盤2,並圍繞軸旋轉; 支撐機構(升降用致動器9,對位軸承9b),能夠擺動且能夠旋轉地吊掛支撐上述上定盤3; 掛鉤20,從上述上定盤3之中心開口3b之周緣朝向中心O延伸; 槽部11,形成於上述驅動件10之圓周表面並且朝著上述驅動件10之軸向延伸,當上述上定盤3與上述驅動件10之圓周方向之相對旋轉角度為既定角度時,能夠插入上述掛鉤20; 接觸區域12,形成於上述驅動件10之上表面10c; 突起部13,設置於上述接觸區域12,在上述掛鉤20接觸到上述接觸區域12之狀態下與上述掛鉤20接觸。(1) The double-side grinding device 1 for grinding both sides of a workpiece WR by using the lower platen 2 and the upper platen 3 is configured as follows, including: a driving member 10 penetrating the lower platen 2 and rotating around an axis; a supporting mechanism (for lifting The actuator 9 and the registration bearing 9b) can swing and rotatably suspend and support the upper fixed plate 3; the hook 20 extends from the peripheral edge of the central opening 3b of the upper fixed plate 3 toward the center O; the groove portion 11 is formed On the circumferential surface of the driving member 10 and extending toward the axial direction of the driving member 10, when the relative rotation angle of the upper fixing plate 3 and the driving member 10 in the circumferential direction is a predetermined angle, the hook 20 can be inserted; A region 12 is formed on the upper surface 10c of the driving member 10; a protrusion 13 is provided on the contact region 12 and contacts the hook 20 in a state where the hook 20 contacts the contact region 12.

因此,能夠抑制修整上定盤3時的作業性降低,並且在修整過程中能夠將上定盤3維持在水平。Therefore, it is possible to suppress a decrease in workability when trimming the upper platen 3 and to maintain the upper platen 3 at a level during the trimming process.

(2)在上述驅動件10之圓周表面上形成有多個(4個)上述槽部11, 上述掛鉤20構成為如下,具有:插入到上述槽部11時接觸該槽部11之內側面11a之第一掛鉤20A;及插入到上述槽部11時並不接觸該槽部11之內側面11a之第二掛鉤20B。(2) A plurality (4) of the groove portions 11 are formed on the peripheral surface of the driving member 10, and the hook 20 is configured to have an inner side surface 11a that contacts the groove portion 11 when inserted into the groove portion 11. A first hook 20A; and a second hook 20B that does not contact the inner side surface 11a of the groove portion 11 when inserted into the groove portion 11.

因此,除了(1)的效果,還可以放寬第二掛鉤20B與槽部11之間所要求之尺寸精度,從而能夠使多個掛鉤20很容易地插入到槽部11中。Therefore, in addition to the effect of (1), the required dimensional accuracy between the second hook 20B and the groove portion 11 can be relaxed, so that a plurality of hooks 20 can be easily inserted into the groove portion 11.

(3)構成為如下,上述掛鉤20及上述槽部11都在以上述上定盤3之中心O(軸線L1經過的點)為對稱點之點對稱位置上被設置多個。(3) The plurality of hooks 20 and the groove portions 11 are arranged at a point symmetrical position with the center O (the point where the axis L1 passes) of the upper plate 3 as a symmetry point.

因此,除了(1)或者(2)的效果,在修整時還可以在圓周方向均衡地支撐上定盤3。Therefore, in addition to the effects of (1) or (2), the fixing plate 3 can be evenly supported in the circumferential direction during trimming.

(4)構成為如下,上述突起部13之數量(2個)少於上述掛鉤20之數量(4個)。(4) The number of the protrusions 13 (two) is smaller than the number of the hooks 20 (four).

因此,除了(1)~(3)之任何一個效果,每次進行修整時,還可以使被傳遞旋轉力之掛鉤20不同,並分散作用於各掛鉤20之負擔,從而能夠抑制掛鉤20之破損或不良狀態之產生。Therefore, in addition to any of the effects (1) to (3), each time the trimming is performed, the hooks 20 to which the rotational force is transmitted can be made different, and the load acting on each of the hooks 20 can be dispersed, thereby suppressing the damage of the hooks 20 Or the emergence of bad conditions.

以上,雖然基於實施例1對本發明之雙面研磨裝置進行了說明,但是,關於具體的結構,並不限於該實施例,只要不脫離申請專利範圍之各權利項之發明主旨,就允許設計之變更、補充等。Although the double-side polishing apparatus of the present invention has been described based on Embodiment 1, the specific structure is not limited to this embodiment, and it is allowed to design as long as it does not depart from the gist of the invention of each claim of the patent scope. Changes, additions, etc.

在實施例1中,示出了驅動件主體10b形成有4個槽部11、2個突起部13,上定盤3上設有4個掛鉤20之例子。但是,槽部、突起部、掛鉤之數量並不限於此,各自設定1個以上即可。也就是說,例如,如圖9所示,驅動件主體10b形成有3個槽部11與3個突起部13,且上定盤3上設有3個掛鉤20也可以。In the first embodiment, an example is shown in which the driver main body 10 b is formed with four groove portions 11 and two protruding portions 13, and the upper plate 3 is provided with four hooks 20. However, the number of grooves, protrusions, and hooks is not limited to this, and one or more of them may be set. That is, for example, as shown in FIG. 9, the driver body 10 b may be formed with three groove portions 11 and three protruding portions 13, and three hooks 20 may be provided on the upper platen 3.

即使在這種情況下,如圖10A及圖10B所示,在修整時3個掛鉤20各自接觸形成於驅動件主體10b之上表面10c之接觸區域12,並能夠在圓周方向上均衡地支撐上定盤3。Even in this case, as shown in FIGS. 10A and 10B, the three hooks 20 each contact the contact area 12 formed on the upper surface 10c of the driver body 10b during the trimming, and can be evenly supported in the circumferential direction. Fixed plate 3.

另外,此時,3個掛鉤20之前端部22之掛鉤寬度全都設定為略小於槽寬度G1之相同尺寸。因此,如圖11A及圖11B所示,在研磨工件時將掛鉤20插入到槽部11時,所有掛鉤20之側面22b將接觸槽部11之內側面11a。另一方面,由於突起部13之數量(3個)與掛鉤20之數量(3個)相同,所以在修整時所有掛鉤20接觸突起部13。In addition, at this time, the hook widths of the front ends 22 of the three hooks 20 are all set to be the same size slightly smaller than the groove width G1. Therefore, as shown in FIGS. 11A and 11B, when the hooks 20 are inserted into the groove portions 11 when the workpiece is being ground, the side surfaces 22 b of all the hooks 20 will contact the inner side surfaces 11 a of the groove portions 11. On the other hand, since the number (3) of the protrusions 13 is the same as the number (3) of the hooks 20, all the hooks 20 contact the protrusions 13 during trimming.

因此,無論修整時及研磨工件時之哪一種情況,可以藉由所有掛鉤20來接受從驅動件10輸入之旋轉力,從而分散輸入旋轉力。因此,作用於掛鉤20之旋轉力不會集中,可以防止發生掛鉤20之破損等。Therefore, regardless of the situation during trimming or grinding of the workpiece, all the hooks 20 can receive the rotational force input from the driving member 10 to disperse the input rotational force. Therefore, the rotational force acting on the hook 20 is not concentrated, and damage to the hook 20 and the like can be prevented.

在實施例1中,雖然掛鉤20構成為如下,即具有在研磨工件時接觸槽部11之內側面11a之第一掛鉤20A、及在研磨工件時不接觸槽部11之內側面11a之第二掛鉤20B,但是並不限於此。例如,多個(4個)掛鉤20之掛鉤寬度亦可以是全都相同的尺寸。In the first embodiment, the hook 20 is configured to have a first hook 20A that contacts the inner side surface 11a of the groove portion 11 when the workpiece is ground, and a second hook 20A that does not contact the inner side surface 11a of the groove portion 11 when the workpiece is ground. The hook 20B is not limited thereto. For example, the hook widths of a plurality of (4) hooks 20 may all be the same size.

在這種情況下,研磨工件時從驅動件10輸入之旋轉力可以藉由所有掛鉤20來接受,從而分散輸入旋轉力。因此,作用於掛鉤20之力不會集中,可以防止發生掛鉤20之破損等。In this case, the rotational force input from the driving member 10 when the workpiece is ground can be received by all the hooks 20 to disperse the input rotational force. Therefore, the force acting on the hook 20 is not concentrated, so that breakage of the hook 20 and the like can be prevented.

在實施例1中,將第一掛鉤20A之掛鉤寬度W1設為略小於槽部11之槽寬度G1,將第二掛鉤20B之掛鉤寬度W2設為足夠小於槽部11之槽寬度G1,因此形成了側面22b接觸槽部11之內側面11a之第一掛鉤20A與側面22b並不接觸槽部11之內側面11a之第二掛鉤20B,但是並不限於此。例如,亦可以將多個掛鉤20之掛鉤寬度設定為全部相同之尺寸,並適宜地變更槽部11之槽寬度,從而形成側面22b接觸槽部11之內側面11a之第一掛鉤20A與側面22b並不接觸槽部11之內側面11a之第二掛鉤20B。In Embodiment 1, the hook width W1 of the first hook 20A is set to be slightly smaller than the groove width G1 of the groove portion 11, and the hook width W2 of the second hook 20B is set to be sufficiently smaller than the groove width G1 of the groove portion 11, so that The first hook 20A that the side surface 22b contacts the inner side surface 11a of the groove portion 11 and the side surface 22b do not contact the second hook 20B that is the inner side surface 11a of the groove portion 11, but it is not limited thereto. For example, the hook widths of the plurality of hooks 20 may be set to all the same size, and the groove width of the groove portion 11 may be appropriately changed, so that the first hook 20A and the side surface 22b that contact the inner side surface 11a of the groove portion 11 with the side surface 22b are formed. The second hook 20B that does not contact the inner side surface 11 a of the groove portion 11.

在實施例1中,雖然示出了形成於驅動件主體10b之圓周表面之槽部11向驅動件主體10b之徑向及上下方向敞開的例子,但是並不限於此。該槽部11至少向上方敞開以便能夠插入掛鉤20,並且所具有的槽長度能夠使上定盤3下降至下定盤2上載置上定盤3為止即可,下方無需敞開。In the first embodiment, an example in which the groove portion 11 formed on the circumferential surface of the driver body 10b is opened in the radial and vertical directions of the driver body 10b is shown, but it is not limited to this. The groove portion 11 is opened at least upwardly so that the hook 20 can be inserted, and the groove length is such that the upper platen 3 can be lowered until the lower platen 2 is placed on the upper platen 3, and the lower portion need not be opened.

在實施例1中,雖然示出了將接觸區域12設定為沿驅動件主體10b之周緣部之區域之例子,但是並不限於此。只要該接觸區域12至少形成於驅動件主體10b之上表面10c且掛鉤20之前端部22之接觸面22a能夠接觸就可以。也就是說,例如,當掛鉤20之固定部21較長時,亦可以在驅動件主體10b之中心部分設置接觸區域。Although the example in which the contact area 12 is set as the area along the peripheral edge part of the driver main body 10b is shown in Embodiment 1, it is not limited to this. It suffices that the contact area 12 is formed on at least the upper surface 10c of the driver body 10b and the contact surface 22a of the front end portion 22 of the hook 20 can be contacted. That is, for example, when the fixing portion 21 of the hook 20 is long, a contact area may be provided at the center portion of the driver body 10b.

在實施例1中,雖然示出了從接觸區域12向上定盤3突出之突起部13與掛鉤20之前端部22之側面22b接觸之例子,但是並不限於此。例如,如圖12所示,在掛鉤20之前端部22形成向下敞開之凹部23。於是,當掛鉤20與接觸區域12接觸時,亦可以將突起部13嵌入該凹部23,從而使掛鉤20接觸突起部13。In the first embodiment, the example in which the protruding portion 13 protruding from the contact area 12 upwardly to the fixed plate 3 contacts the side surface 22 b of the front end portion 22 of the hook 20 is shown, but it is not limited to this. For example, as shown in FIG. 12, the end portion 22 forms a recess 23 which is open downward before the hook 20. Therefore, when the hook 20 is in contact with the contact area 12, the protruding portion 13 may also be fitted into the recessed portion 23, so that the hook 20 contacts the protruding portion 13.

在實施例1中,雖然驅動件主體10b之上表面10c形成為平坦表面,但是並不限於此。例如,如圖13所示之驅動件10那樣,亦可以在驅動件主體10b之上表面10c形成沿周緣下降一段之段差表面10d,在該段差表面10d上形成接觸區域12及突起部13,並且將槽部11之上端敞開。In Embodiment 1, although the upper surface 10c of the driver body 10b is formed as a flat surface, it is not limited to this. For example, as in the driver 10 shown in FIG. 13, a stepped surface 10 d may be formed on the upper surface 10 c of the driver body 10 b along the peripheral edge, and a contact region 12 and a protrusion 13 may be formed on the stepped surface 10 d. The upper end of the groove portion 11 is opened.

進一步,亦可以是設置於上定盤之掛鉤具有驅動用掛鉤、到驅動件主體之軸向距離比該驅動用掛鉤長之接觸用掛鉤,形成於驅動件主體之槽部具有驅動用槽與收縮用槽。Further, the hook provided on the upper plate may have a driving hook, and a contact hook having an axial distance from the driving member body longer than the driving hook may have a driving groove and a contraction formed in a groove portion of the driving member body. With trough.

這種情況下,在修整時,接觸用掛鉤與形成於驅動件主體之上表面之接觸區域相接觸,上定盤藉由驅動件主體之上表面支撐。另一方面,驅動用掛鉤插入到驅動用槽,並藉由該驅動用掛鉤與驅動用槽之間的干涉,驅動件主體之旋轉驅動力傳遞至上定盤。In this case, during trimming, the contact hook contacts the contact area formed on the upper surface of the driver body, and the upper plate is supported by the upper surface of the driver body. On the other hand, the driving hook is inserted into the driving groove, and the rotational driving force of the driver body is transmitted to the upper platen by the interference between the driving hook and the driving groove.

在研磨工件時,與修整時相同,驅動用掛鉤插入到驅動用槽,並藉由該驅動用掛鉤與驅動用槽之間的干涉,驅動件主體的之旋轉驅動力傳遞至上定盤。此時,接觸用掛鉤插入到收縮用槽中。因此,上定盤之下降變為可能,將上定盤載置於下定盤並能夠實施工件之研磨。When grinding a workpiece, the driving hook is inserted into the driving groove in the same manner as in the trimming, and the rotational driving force of the driver body is transmitted to the upper platen by the interference between the driving hook and the driving groove. At this time, the contact hook is inserted into the contraction groove. Therefore, it becomes possible to lower the upper platen, and the upper platen can be placed on the lower platen and the workpiece can be ground.

1‧‧‧雙面研磨裝置1‧‧‧ Double-side grinding device

2‧‧‧下定盤2‧‧‧ lower order

2a‧‧‧研磨墊2a‧‧‧ polishing pad

2b‧‧‧中心開口2b‧‧‧center opening

3‧‧‧上定盤3‧‧‧on order

3a‧‧‧研磨墊3a‧‧‧ polishing pad

3b‧‧‧中心開口3b‧‧‧center opening

4‧‧‧太陽齒輪4‧‧‧ sun gear

5‧‧‧內齒輪5‧‧‧ Internal gear

6‧‧‧驅動軸6‧‧‧Drive shaft

7‧‧‧驅動軸7‧‧‧Drive shaft

8‧‧‧驅動軸8‧‧‧Drive shaft

9‧‧‧升降用致動器(支撐機構)9‧‧‧ Lifting actuator (support mechanism)

9a‧‧‧定盤吊架9a‧‧‧ fixed plate hanger

9b‧‧‧對位軸承(支撐機構)9b‧‧‧Alignment bearing (supporting mechanism)

9c‧‧‧桿9c‧‧‧ par

10‧‧‧驅動件10‧‧‧Driver

10a‧‧‧驅動軸10a‧‧‧Drive shaft

10b‧‧‧驅動件主體10b‧‧‧Driver body

10c‧‧‧上表面10c‧‧‧ Top surface

10d‧‧‧段差表面10d‧‧‧step difference surface

11‧‧‧槽部11‧‧‧Slot

11a‧‧‧內側面11a‧‧‧ inside

12‧‧‧接觸區域12‧‧‧contact area

13‧‧‧突起部13‧‧‧ protrusion

20‧‧‧掛鉤20‧‧‧ hook

20A‧‧‧第一掛鉤20A‧‧‧First hook

20B‧‧‧第二掛鉤20B‧‧‧Second hook

21‧‧‧固定部21‧‧‧Fixed section

22‧‧‧前端部22‧‧‧ front end

22a‧‧‧接觸面22a‧‧‧contact surface

22b‧‧‧(掛鉤前端部之)側面22b‧‧‧ (side of hook front end)

23‧‧‧凹部23‧‧‧ recess

CA‧‧‧遊星輪板CACA‧‧‧Star Wheel CA

G1‧‧‧槽部之槽寬度G1‧‧‧Slot width

G2‧‧‧突起部之圓周方向尺寸G2‧‧‧ Circumferential dimension of protrusion

L1‧‧‧軸線L1‧‧‧ axis

O‧‧‧上定盤之中心O‧‧‧Upper Order Center

WR‧‧‧工件WR‧‧‧Workpiece

W1‧‧‧第一掛鉤前端部之掛鉤寬度W1‧‧‧ Hook width at the front end of the first hook

W2‧‧‧第二掛鉤前端部之掛鉤寬度W2‧‧‧ Hook width at the front end of the second hook

圖1係表示實施例1之雙面研磨裝置之整體結構之概略示意截面圖; 圖2係表示實施例1之雙面研磨裝置之主要部分之斜視圖; 圖3係表示實施例1之雙面研磨裝置之驅動件之俯視圖; 圖4係表示實施例1之雙面研磨裝置之上定盤之主要部分之俯視圖; 圖5係實施例1之雙面研磨裝置在修整時之俯視圖; 圖6係圖5之A-A截面圖; 圖7係實施例1之雙面研磨裝置在研磨工件時之俯視圖; 圖8係圖7之B-B截面圖; 圖9係表示其他例之雙面研磨裝置之主要部分之斜視圖; 圖10A係其他例之雙面研磨裝置在修整時之俯視圖; 圖10B係圖10A之C-C截面圖; 圖11A係其他例之雙面研磨裝置在研磨工件時之俯視圖; 圖11B係圖11A之D-D截面圖; 圖12係表示掛鉤及突起部之變形例之說明圖;以及 圖13係表示驅動件之變形例之說明圖。FIG. 1 is a schematic cross-sectional view showing the overall structure of the double-sided polishing apparatus of Embodiment 1. FIG. 2 is a perspective view of a main part of the double-sided polishing apparatus of Embodiment 1. FIG. Top view of the driving part of the polishing device; Figure 4 is a top view of the main part of the fixed plate on the double-sided polishing device of Example 1; Figure 5 is a top view of the double-sided polishing device of Example 1 during dressing; Figure 6 Fig. 5 is a cross-sectional view of AA; Fig. 7 is a plan view of the double-sided grinding apparatus of Example 1 when grinding a workpiece; Fig. 8 is a cross-sectional view of BB of Fig. 7; Oblique view; Figure 10A is a top view of a double-sided polishing device of another example during dressing; Figure 10B is a cross-sectional view of CC of FIG. 10A; Figure 11A is a top view of a double-sided polishing device of another example when grinding a workpiece; 11A is a DD cross-sectional view; FIG. 12 is an explanatory diagram showing a modification example of the hook and the protrusion; and FIG. 13 is an explanatory diagram showing a modification example of the driving member.

Claims (5)

一種雙面研磨裝置,係利用下定盤與上定盤研磨工件之雙面,上述雙面研磨裝置包括: 驅動件,貫穿上述下定盤,並圍繞軸旋轉; 支撐機構,能夠擺動且能夠旋轉地吊掛支撐上述上定盤; 掛鉤,從上述上定盤之內周緣朝向中心延伸; 槽部,形成於上述驅動件之圓周表面並朝著上述驅動件之軸向延伸,當上述上定盤與上述驅動件之圓周方向之相對旋轉角度為既定角度時能夠插入上述掛鉤; 接觸區域,形成於上述驅動件之上表面;以及 突起部,設置於上述接觸區域上,在上述掛鉤接觸到上述接觸區域之狀態下與上述掛鉤接觸。A double-side grinding device uses both a lower platen and an upper platen to grind both sides of a workpiece. The double-side grinding device includes: a driving member that penetrates the lower platen and rotates around an axis; a supporting mechanism that can swing and rotatably suspend The upper plate is hung and supported; the hook extends from the inner peripheral edge of the upper plate toward the center; the groove is formed on the circumferential surface of the driving member and extends toward the axial direction of the driving member. The driver can be inserted into the hook when the relative rotation angle in the circumferential direction of the driver is a predetermined angle; a contact area is formed on the upper surface of the driver; and a protrusion is provided on the contact area, where the hook contacts the contact area It is in contact with the hook in the state. 如申請專利範圍第1項所述之雙面研磨裝置,其中, 上述槽部在上述驅動件之圓周表面形成有多個, 上述掛鉤具有: 插入到上述槽部時,接觸該槽部之內側面之第一掛鉤;及 插入到上述槽部時,並不接觸該槽部之內側面之第二掛鉤。The double-side polishing device according to item 1 of the scope of patent application, wherein the groove portion is formed in a plurality on a circumferential surface of the driving member, and the hook includes: when inserted into the groove portion, contacting an inner side surface of the groove portion A first hook; and a second hook that does not contact the inner side of the groove when inserted into the groove. 如申請專利範圍第1或2項所述之雙面研磨裝置,其中, 上述掛鉤及上述槽部都在以上述上定盤之中心為對稱點之點對稱位置上設有多個。According to the double-sided polishing device described in item 1 or 2 of the scope of the patent application, the hooks and the grooves are provided at a plurality of point-symmetrical positions with the center of the upper plate as a point of symmetry. 如申請專利範圍第1或2項所述之雙面研磨裝置,其中, 上述突起部之數量少於上述掛鉤之數量。The double-side polishing device according to item 1 or 2 of the scope of patent application, wherein the number of the protrusions is less than the number of the hooks. 如申請專利範圍第3項所述之雙面研磨裝置,其中, 上述突起部之數量少於上述掛鉤之數量。The double-side polishing device according to item 3 of the scope of patent application, wherein the number of the protrusions is less than the number of the hooks.
TW107111514A 2017-04-05 2018-03-31 Double side polishing machine TWI728241B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017-075211 2017-04-05
JP2017075211A JP6829467B2 (en) 2017-04-05 2017-04-05 Double-sided polishing device

Publications (2)

Publication Number Publication Date
TW201902620A true TW201902620A (en) 2019-01-16
TWI728241B TWI728241B (en) 2021-05-21

Family

ID=63844503

Family Applications (1)

Application Number Title Priority Date Filing Date
TW107111514A TWI728241B (en) 2017-04-05 2018-03-31 Double side polishing machine

Country Status (4)

Country Link
JP (1) JP6829467B2 (en)
KR (1) KR102481144B1 (en)
CN (1) CN108687650B (en)
TW (1) TWI728241B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI749917B (en) * 2020-11-30 2021-12-11 寅翊智造股份有限公司 Barrel changing apparatus of automatic processing machine
TWI749916B (en) * 2020-11-30 2021-12-11 寅翊智造股份有限公司 Barrel changing apparatus of automatic processing machine

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020171996A (en) * 2019-04-11 2020-10-22 信越半導体株式会社 Double-sided polishing method
CN110202528B (en) * 2019-07-04 2023-11-17 山东太古飞机工程有限公司 Auxiliary fixture for removing tail spray of aircraft engine
CN116810669B (en) * 2023-08-30 2023-11-10 启东市洁慧新材料有限公司 High-precision grinding tool for grinding equipment and use method thereof

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3833774B2 (en) * 1997-04-02 2006-10-18 スピードファム株式会社 Planar polishing equipment with anti-vibration mechanism
JP3133300B2 (en) 1999-03-24 2001-02-05 システム精工株式会社 Polishing method and polishing apparatus
JP2003205453A (en) * 2001-11-09 2003-07-22 Fujikoshi Mach Corp Both-sided polishing device
EP1489649A1 (en) * 2002-03-28 2004-12-22 Shin-Etsu Handotai Co., Ltd Double side polishing device for wafer and double side polishing method
JP2007268679A (en) 2006-03-31 2007-10-18 Speedfam Co Ltd Correction implement for polishing pad for double-sided polishing device and double-sided polishing device equipped therewith
JP2009028826A (en) * 2007-07-26 2009-02-12 Shimadzu Corp Double side polisher
WO2010013390A1 (en) * 2008-07-31 2010-02-04 信越半導体株式会社 Wafer polishing method and double side polishing apparatus
JPWO2010150757A1 (en) * 2009-06-24 2012-12-10 旭硝子株式会社 Glass disk polishing apparatus and glass disk polishing method
JP2011194517A (en) * 2010-03-19 2011-10-06 Hamai Co Ltd Double-side polishing device and machining method
JP5807583B2 (en) * 2012-02-20 2015-11-10 旭硝子株式会社 Carrier pressing mechanism, polishing apparatus, glass substrate polishing method, and glass substrate manufacturing method
JP6269450B2 (en) * 2014-11-18 2018-01-31 信越半導体株式会社 Workpiece processing equipment
JP6491024B2 (en) * 2015-04-20 2019-03-27 不二越機械工業株式会社 Double-side polishing apparatus and polishing method
JP6304132B2 (en) * 2015-06-12 2018-04-04 信越半導体株式会社 Workpiece processing equipment
CN106425830A (en) * 2016-11-14 2017-02-22 宜兴市晶科光学仪器有限公司 Double-side grinding and polishing machine

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI749917B (en) * 2020-11-30 2021-12-11 寅翊智造股份有限公司 Barrel changing apparatus of automatic processing machine
TWI749916B (en) * 2020-11-30 2021-12-11 寅翊智造股份有限公司 Barrel changing apparatus of automatic processing machine

Also Published As

Publication number Publication date
JP2018176304A (en) 2018-11-15
KR102481144B1 (en) 2022-12-23
JP6829467B2 (en) 2021-02-10
CN108687650A (en) 2018-10-23
TWI728241B (en) 2021-05-21
CN108687650B (en) 2022-05-03
KR20180113175A (en) 2018-10-15

Similar Documents

Publication Publication Date Title
TWI728241B (en) Double side polishing machine
JP5826306B2 (en) Method for adjusting a polishing pad for simultaneous double-side polishing of a semiconductor wafer
JP5627685B2 (en) Double-side polishing apparatus and carrier therefor
WO2016199333A1 (en) Workpiece machining device
KR20100115819A (en) Polishing apparatus, polishing auxiliary apparatus and polishing method
TWI622461B (en) Carrier ring, grinding device, and grinding method
JP2002217149A (en) Wafer polishing apparatus and method
JP2004050345A (en) Processing device for outer periphery of thin plate-like work
JP6725831B2 (en) Work processing device
JP2004154924A (en) Polishing apparatus, carrier for polishing apparatus, and polishing method
KR101941768B1 (en) Double side polishing apparatus of the wafer
JPH1029142A (en) Mirror chamfering and machining method for disk semiconductor wafer chamfered section
KR100899637B1 (en) Wafer doubleside polishing device
JP3139753U (en) Double-side polishing machine
JP3230551U (en) Wafer polishing equipment
KR20100062372A (en) Polishing pad dresser
JPS63300857A (en) Polisher
JP4352909B2 (en) Polishing apparatus, carrier for polishing apparatus and polishing method
JP2003145399A (en) Mirror chamfering method for chamfered portion of disc semiconductor wafer
KR101572094B1 (en) Apparatus for dressing grinding wheel
JP2016066724A (en) Wafer polishing method
JP2004058186A (en) Machining apparatus for outer circumferential part of thin sheet work
JP2015230734A (en) Method for processing glass substrate for magnetic recording medium, method for manufacturing glass substrate for magnetic recording medium, and device for processing glass substrate for magnetic recording medium
JP2015058501A (en) Polishing device for workpiece and method of manufacturing workpiece
KR101285897B1 (en) Apparatus and method for polishing wafer