KR20100115819A - Polishing apparatus, polishing auxiliary apparatus and polishing method - Google Patents

Abstract

The polishing apparatus 1 of this invention is provided on the rotating shaft part 5, the rotating shaft part 5, the rotary table 6 which hold | maintains the workpiece | work 30 on the upper surface, and the rotary table 6 To the rotary grindstone 3 rotatably and liftably supported in the direction opposite to the rotation direction of the dress, the dress grindstone installation portion 10 disposed around the rotary shaft portion 5, and the dress grindstone installation portion 10. The rotating grindstone is fixed and has the dress grindstone 11 arrange | positioned so that the grinding | polishing surface may face the grinding | polishing surface of the rotating grindstone 3, The rotating grindstone while rotating the rotary table 6 and the rotating grindstone 3 in mutually opposite directions. By contacting the surface of the workpiece (3) with the surface of the workpiece 30, the workpiece is polished, and in parallel with this, the polishing surface of the rotating grindstone 3 is brought into contact with the polishing surface of the dress grindstone 11. The rotating grindstone 3 is dressed.

Description

Polishing Apparatus, Polishing Auxiliary Apparatus and Polishing Method {POLISHING APPARATUS, POLISHING AUXILIARY APPARATUS AND POLISHING METHOD}

The present invention relates to a polishing apparatus, a polishing auxiliary apparatus and a polishing method.

This application claims priority based on Japanese Patent Application No. 2008-102873 for which it applied to Japan on April 10, 2008, and uses the content here.

Background Art A polishing method is known in which a rotating grindstone that rotates relative to a work is pressed against the surface of the work to polish the work to a predetermined thickness. An example of the conventional grinding | polishing apparatus used for this grinding | polishing method is shown in FIG.

This polishing apparatus 101 has a work holding part 102 and a rotating grindstone 103 for polishing the work 200.

The workpiece holding part 102 has the cylindrical rotating shaft part 104 and the rotating table 105 rotatably supported by the upper part of the rotating shaft part 104. As shown in FIG.

The upper surface of the rotary table 105 is a workpiece holding surface 106 holding the workpiece 200, and is rotated in the direction of arrow a in the drawing by a rotation driving mechanism (not shown). As the rotary table 105 is driven to rotate, the workpiece 200 held on the workpiece holding surface 106 revolves about the axis of rotation of the rotary table 105.

The rotary grindstone 103 has a grindstone holding tool 107 rotatably supported and a grindstone 108 held by the grindstone holding tool 107, and the surface of the grindstone 108 has a work holding surface ( It is arranged to face 106.

In addition, the rotary grindstone 103 is driven to rotate in the direction opposite to the rotation direction of the rotary table 105 (arrow b direction in the drawing) by a rotation driving mechanism (not shown), and by the lifting operation mechanism. The operation is performed between a position (initial position) spaced apart from the holding surface 106 and a position (polishing position) in which the grindstone 108 contacts the surface of the work 200.

In such a polishing apparatus 101, while rotating the rotary table 105 and the rotary grindstone 103 in a direction opposite to each other, the rotary grindstone 103 is moved downward to operate, and the surface of the grindstone 108 is moved to the workpiece 200. When pressed against the surface of), the surface of the work 200 is slid by the grindstone 108, and the surface of the work 200 is polished.

Further, as a polishing apparatus of this kind, there is provided a tool rotation driving unit for rotationally driving an abrasive tool or an abrasive tool, a work holding unit for holding a workpiece rotating in parallel with a rotation axis of the tool rotation driving unit, a tool rotation driving unit and a workpiece holding unit; A polishing apparatus comprising: an axial driving portion for relatively approaching or retracting a supporting portion in the direction of their rotational axis, and a control portion, wherein the tool rotation driving portion or the workpiece holding portion is formed by pressing the workpiece against the tool to planally finish the workpiece. The polishing apparatus is known in which the rotating shaft is located in the plane of the drive reference plane for guiding the drive by the axial drive unit (see Patent Document 1).

In addition, as a device of this kind, a grinding device (see Patent Document 2) or a vacuum adsorption mechanism, in which a rotary table is provided to be horizontally rotatable, supported by a columnar column, and a rotary grindstone is installed up and down is provided. The planar grinding apparatus provided with the grinding wheel grindstone of the provided cup wheel type is known (refer patent document 3).

Japanese Patent Laid-Open No. 2007-210074 Japanese Patent Laid-Open No. 10-058320 Japanese Patent Laid-Open No. 5-077147

However, in the polishing apparatus 101 as described above, the abrasive powder shaved from the workpiece 200 causes clogging in the grindstone 108 to lower the polishing performance of the grindstone 108 or damage the workpiece 200. There is a problem such as giving. In particular, in the case where the workpiece is a sapphire substrate or a SiC substrate, the grinding powder is viscous, so that clogging of the rotating grindstone is likely to occur.

Therefore, in such a polishing apparatus 101, in order to suppress the blockage of the grindstone 108, the dressing process of reducing the rotation speed of the rotating grindstone 103 or removing grinding | polishing powder adhering to a rotating grindstone by stopping a grinding process in the middle Countermeasures, such as performing a plurality of times, have been adopted. Here, a dressing process is performed by sliding a dress grindstone on the surface of a rotating grindstone.

However, if the rotation speed of the rotary grindstone 103 is made small, the grinding | polishing speed of a workpiece will become low and it will require a long time to grind a workpiece to predetermined thickness. In addition, if the dressing process is performed while the polishing process is stopped in the middle, the dressing process takes time in addition to the time taken for polishing of the work itself. From these points, in the conventional polishing apparatus 101, sufficient processing efficiency cannot be obtained, and it is the present state that the productivity of a workpiece | work is brought about.

Moreover, this situation is the same also in the grinding | polishing apparatus of patent documents 1-3, The appearance of the grinding | polishing apparatus which can improve polishing performance, solving the problem of a grindstone clogging was anticipated.

This invention is made | formed in order to solve the said subject, The grinding | polishing apparatus, the grinding | polishing method, and the grinding | polishing which can grind | block the workpiece efficiently, suppressing the blockage of a rotating grindstone, and can grind | polish a workpiece | work while suppressing the damage. It is an object to provide an auxiliary device.

MEANS TO SOLVE THE PROBLEM The present inventors discovered that the said subject was easily solved by providing the following grinding | polishing apparatus, the polishing auxiliary apparatus, and the grinding | polishing method as a result of earnest effort to solve the said subject.

That is, the grinding | polishing apparatus of this invention (1) is provided on the rotating shaft part, the said rotating shaft part, and the rotating table which hold | maintains a workpiece | work on the upper surface, and the upper surface of the said rotating table, opposes the rotation of the said rotating table. A rotating grindstone rotatably supported in a direction opposite to the direction and operated to elevate, a dress grindstone mounting portion disposed around the rotating shaft portion, and fixed on the dress grindstone mounting portion, and the polishing surface thereof is polished of the rotary grindstone. And having the dress grindstone disposed to face the surface, while polishing the work by bringing the polishing surface of the rotating grindstone into contact with the surface of the work while rotating the rotary table and the dress grindstone and the rotating grindstone in opposite directions. In parallel with this, the grinding surface adhering to the rotating grinding wheel is removed by bringing the grinding surface of the rotating grinding wheel into contact with the grinding surface of the dress grinding wheel. It is characterized by the above-mentioned.

(2) In the polishing apparatus of the present invention, the dress grindstone described in (1) may be a ring-shaped dress grindstone disposed on the dress grindstone attachment portion.

(3) In the polishing apparatus of the present invention, the dress grindstone according to (1) may be configured of a plurality of dress grindstone pieces arranged in an annular shape on a predetermined interval on the dress grindstone attachment portion.

(4) In the grinding | polishing apparatus of this invention, the dress grindstone installation part in any one of (1)-(3) supports the dress grindstone table which hold | maintains the said dress grindstone, and the said dress grindstone table so that it can rock up and down. It is characterized by having a dress grindstone table support.

(5) In the polishing apparatus of the present invention, the dress grindstone table support portion according to any one of (1) to (4) is provided with a spring for elastically supporting the dress grindstone table.

(6) The polishing auxiliary apparatus of the present invention has an annular dress grindstone mounting portion and a dress grindstone fixed on the dress grindstone mounting portion, and the dress grindstone mounting portion is attachable to the peripheral surface of the rotating shaft portion of the polishing apparatus. It is characterized by being configured.

(7) In the polishing auxiliary apparatus of the present invention, the dress grindstone according to (6) is made of a ring-shaped dress grindstone piece disposed on the dress grindstone attachment portion.

(8) In the polishing auxiliary apparatus of the present invention, the dress grindstone according to (6) is composed of a plurality of dress grindstone pieces arranged in an annular shape at a predetermined interval on the dress grindstone installation portion.

(9) In the polishing auxiliary apparatus of the present invention, the dress grindstone mounting portion according to any one of (6) to (8) is capable of swinging the dress grindstone table holding the dress grindstone and the dress grindstone table up and down. It is characterized by having the dress grindstone table support part which supports.

(10) In the polishing auxiliary apparatus of the present invention, the dress grindstone table supporter according to (6) to (9) is provided with a spring for elastically supporting the dress grindstone table.

(11) In the polishing method of the present invention, the rotary table for holding the workpiece and the rotary grindstone are rotated in opposite directions, and the grinding table is brought into contact with the surface of the workpiece to polish the workpiece. A dress grindstone is disposed around the polishing grinder, and in parallel with the polishing of the work, the polishing grind of the rotating grindstone is brought into contact with the polishing grind of the dress grindstone to remove the abrasive powder attached to the rotating grindstone. .

According to the present invention, when the rotary grindstone which rotates relative to the workpiece is pressed against the surface of the workpiece and the workpiece is polished to a predetermined thickness, the workpiece is reduced and polished efficiently while the blockage of the rotary grindstone is suppressed. It can be processed.

Moreover, even if the dress grindstone installation part has the dress grindstone table which hold | maintains a dress grindstone, and the dress grindstone table support part which supports the dress grindstone table so that it can rock up and down, even if the height of a grindstone and / or dress grindstone is uneven, The dress grindstone table swings so as to offset the difference in height, and thus the abrasive powder is removed in contact with the grindstone, thereby preventing the clogging of the grindstone caused by the dress grindstone uniformly.

In addition, since the dress grindstone table support has a spring, the dress grindstone table can be quickly returned to the initial state even when tilted to one side. For this reason, a grindstone and a dress grindstone can always be contacted in a favorable contact state, and the grindstone grind | polish in grinding | polishing can be efficiently processed.

BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1A is a schematic perspective view of the entire apparatus of a polishing apparatus having the polishing auxiliary apparatus of the present invention.
It is a perspective view which shows the other example of the dress grindstone provided with the grinding | polishing apparatus provided with the grinding | polishing auxiliary apparatus of this invention.
It is a schematic diagram of the grinding | polishing apparatus shown in FIG. 1A.
FIG. 3 is a perspective view of the rotary grindstone of the polishing apparatus illustrated in FIG. 1A as viewed from below in FIG. 1A. FIG.
4 is a schematic diagram showing a conventional polishing apparatus.

EMBODIMENT OF THE INVENTION Hereinafter, embodiment of the grinding | polishing apparatus, the grinding | polishing auxiliary apparatus, and the grinding | polishing method of this invention are described.

(Polishing device and polishing aid)

First, the polishing apparatus and the polishing auxiliary apparatus of the present invention will be described.

1A and 1B are perspective views showing an embodiment of a polishing apparatus (a polishing apparatus of the present invention) provided with the polishing auxiliary apparatus of the present invention, FIG. 2 is a schematic diagram of the polishing apparatus shown in FIG. 1A, and FIG. 3 is FIG. 1A. It is a perspective view which looked at the rotary grindstone which the grinding | polishing apparatus shown in FIG. 1 viewed from the bottom in FIG. 1A.

The grinding | polishing apparatus 1 shown to FIG. 1A and FIG. 2 has the workpiece holding part 2, the rotating grindstone 3 which grinds the workpiece | work 30, and the grinding | polishing auxiliary means which grinds the rotating grindstone 3 (polishing) Auxiliary device) 4.

The work holding | maintenance part 2 has the rotation shaft part 5, the rotation table 6, and the rotation drive mechanism which rotates the rotation table 6 to rotate.

The rotary table 6 forms a disk shape and is fixed to the upper portion of the rotary shaft portion 5. The upper surface of this turntable 6 constitutes the work holding surface 7 which holds the work 30. One or more workpieces 30 are held on the workpiece holding surface 7 by a fixing method such as bonding or adsorption.

Although it does not specifically limit as a material of the turntable 6, For example, ceramics, such as alumina, are mentioned.

The rotary drive mechanism for rotating the rotary table 6 includes a motor (not shown), a rotary shaft portion 5 connected to the center portion of the rotary table 6, and rotation transmission means for transmitting rotation of the shaft of the motor. Consists of. In the rotation drive mechanism comprised in this way, when a motor is driven, rotation of the shaft will be transmitted to the rotation shaft part 5 via rotation transmission means, and the rotation table 6 fixed to the rotation shaft part 5 will rotate the motor speed. According to this, the rotation operation is performed in the direction of the arrow A in the figure. As a result, the work 30 held on the work holding surface 7 revolves about the rotation axis.

The rotary grindstone 3 of this embodiment has the grindstone holding tool 8, the some grindstone 9 hold | maintained by the grindstone holding tool 8, and the grindstone holding tool 8 by rotating table ( It has a rotation drive mechanism to rotate-drive in the direction opposite to the rotation direction of 6) (arrow B direction in drawing).

The grindstone holder 8 forms a disk shape, and is rotatably supported so that one main surface thereof may face the workpiece holding surface 7 of the turntable 6. The rotary shaft 28 of this grindstone holding tool 8 is substantially parallel to the rotary shaft 6a of the rotary table 6. In this embodiment, the rotating shaft 28 of the grindstone holding tool 8 is set in the position which intersects the inner periphery of the dress grindstone 11 mentioned later. Thereby, the grindstone 9 hold | maintained by the grindstone holding tool 8 can be dress-processed efficiently by the dress grindstone 11, and polishing powder can be removed.

In the structure of this embodiment, as shown in FIG. 3, several grindstones 9 (18 as an example in FIG. 3) are fixed to the outer periphery of one main surface of the grindstone holding tool 8 at equal intervals. It is. Each grindstone 9 has a square columnar shape, and is arranged so that their major axis directions are substantially parallel to the tangential direction of the outer circumference of the disk shaped grindstone holder 8.

The rotation drive mechanism for rotationally driving the grindstone holder 8 transmits a motor (not shown), a rotation shaft 28 fixed to the grindstone holder 8, and rotation of the shaft of the motor to the rotation shaft 28. It has a rotation transmission means etc., It is comprised so that the grindstone holding tool 8 may be rotated in the direction opposite to the rotation direction of the said rotary table 6 (arrow B direction in drawing). In the rotation drive mechanism comprised in this way, when a motor is driven, the rotation of the shaft will be transmitted to the rotating shaft 28 via rotation transmission means, and the grindstone holder 8 fixed to the rotating shaft 28 will be used for the motor rotation speed. Therefore, the rotation is operated in the direction of the arrow B in the figure. Thereby, the some grindstone 9 fixed to the grindstone holding tool 8 revolves about the rotating shaft 28. As shown in FIG.

Moreover, the grinding | polishing apparatus 1 of this form carries out the lifting operation mechanism (not shown) which raises and lowers the rotating grindstone 3 in the extending direction of the rotating shaft 28 (in the up-down direction in the example shown to FIG. 1A). Have As shown in FIG. 2, the rotary grindstone 3 has a position (initial position) spaced apart from the surface of the work 30 by the elevating operation mechanism, and the grindstone 9 is formed on the surface of the work 30. A movement operation is performed between the contacting positions (polishing positions).

In the rotary grindstone 3 comprised as mentioned above, the grindstone holding tool 8 is rotated and operated in the opposite direction to the rotational direction of a rotating table, and the surface of the grindstone 9 is operated by the workpiece | work 30. When pressed against the surface of, the grindstone 9 slides on the surface of the workpiece 30 to polish the surface of the workpiece 30. Thereby, the work 30 is processed so that the upper surface may become a smooth surface which has surface roughness etc. of a desired range.

1A and 2, the polishing apparatus 1 of the present invention is characterized in that polishing aids (polishing aids) 4 are arranged around the rotary table 6. .

The grinding | polishing auxiliary means (polishing auxiliary apparatus) 4 is outlined by the dress grindstone installation part 10 and the some dress grindstone 11 arrange | positioned on this dress grindstone installation part 10. As shown in FIG.

The dress grindstone installation part 10 has the dress grindstone table 12 and the dress grindstone table support part 13 which supports the dress grindstone table 12.

The dress grindstone table 12 has an annular shape whose inner circumference is slightly larger than the outer circumference of the rotary shaft portion 5, and is disposed around the upper portion of the rotary shaft portion 5. This dress grindstone table 12 is supported by the dress grindstone table support part 13 so that it can rock up and down in a predetermined height range. Moreover, in the outer peripheral part of this dress grindstone table 12, the some bolt hole 14 through which the 2nd bolt 25 mentioned later is inserted is formed intermittently along the circumference.

Moreover, the part corresponding to the 1st bolt attachment plate 20 mentioned later of the dress grindstone table 12 is cut out. Thereby, a tool can be easily attached to the head part of the 1st bolt 21, and the operation which tightens the 1st bolt 21 can be performed.

On this dress grindstone table 12, a dress grindstone 11 formed by arranging a plurality of dress grindstone pieces 11A (16 in Fig. 1A) in an annular shape is fixed.

Each dress grindstone piece 11A forms a brick shape, and is annularly arranged on the outer circumferential portion of the dress grindstone table 12 such that their major axis direction is substantially parallel to the tangential direction of the outer circumference of the dress grindstone table 12. In addition, each dress grindstone 11 has the dimension whose surface becomes a surface of substantially the same height as the surface of the workpiece | work 30. As shown in FIG.

With these configurations, the dress grindstone rotates integrally with the turntable, moves downward to operate the grindstone holder 8 in a direction opposite to the rotation direction of the turntable, and the surface of the grindstone 9 Is pressed against the surface of the work 30, the surface 9 of the grindstone also presses the surface of the dress grindstone 11.

Thereby, while the grindstone 9 slides the surface of the workpiece | work 30, the surface is slid by the dress grindstone 11, and simultaneously with the grinding | polishing process of the workpiece | work 30, to the dress grindstone 11 is carried out. Dressing of the grindstone 9 is performed, and the grinding | polishing powder is removed. In addition, 11 A of brick-shaped dress grindstone pieces used in this embodiment are an example, As shown in FIG. 1B, the dress grindstone 11B previously formed in the ring shape was formed on the outer peripheral part of the dress grindstone table 12. FIG. You may arrange one in.

For this reason, in the grinding | polishing process of the workpiece | work 30, it is suppressed that the grinding | polishing powder of the workpiece | work 30 is clogged by the grindstone 9, and the grindstone 9 can exhibit favorable grinding | polishing performance through the whole process of grinding | polishing process. . In addition, the risk of damage of the workpiece 30 due to the abrasive powder can be suppressed.

In addition, when the grinding processing of the grindstone 9 is performed simultaneously with the polishing processing of the work 30, the polishing processing is stopped until the polishing processing is finished (the workpiece is polished to a predetermined thickness) as compared with performing the dressing processing. The time required can be shortened.

From these points, in the polishing apparatus 1 of the present embodiment, high processing efficiency can be obtained in the polishing process, and the productivity of the polished workpiece can be dramatically improved.

The dress grindstone table support part 13 is comprised by the annular part 15 which supports the dress grindstone table 12, the support part 16 for supporting the annular part 15, and the cushion mechanism 17. As shown in FIG.

The annular portion 15 has an annular shape whose inner circumference has a dimension slightly larger than the outer circumference of the rotary shaft portion, and is disposed around the rotary shaft portion 5 so as to contact the lower surface of the dress grindstone table 12. In addition, a first bolt hole 19 through which the first bolt 21 described later penetrates and an agent through which the bolt 25 and the spring 26 described later penetrate into the outer peripheral portion of the annular portion 15. 2 bolt holes 18 are formed in required numbers along the circumference, respectively. Among them, the first bolt 21 is screwed into the first bolt hole 19. In addition, the bolt 25 and the spring 26 are inserted through the second bolt hole 18.

The support part 16 is comprised from the 1st bolt mounting plate 20, the 1st bolt 21, and the auxiliary bolt 23. As shown in FIG.

The mounting plate 24 is provided below the part in which the above-mentioned bolt 25 and the spring 26 were installed, and it rotates intermittently along the circumference of the rotating shaft part 5 below the torus 15, respectively. The suspension is fixed to the outer periphery of 5) by an auxiliary bolt 27.

Moreover, in the said support part 16, the bolt mounting plate 20 is provided in the outer peripheral part of the rotating shaft part 5, and the 1st bolt 21 screwed to the bolt hole 19 of the torus part 15 on this part. ), The auxiliary bolt 23 is screwed or contacted with the mounting plate 20.

Each of the plurality of second bolts 25 has the head portion upward, and the bolt hole 14 of the dress grindstone table 12, the second bolt hole 18 of the annular portion 15, and the second bolt mounting plate ( It is inserted through the bolt hole of 24). Moreover, the nut is screwed to the lower end part of each 2nd bolt 25 so that the lower surface of the 2nd bolt attachment plate 24 may contact. Thereby, each 2nd bolt 25 is prevented from escaping from each bolt hole, respectively.

A spring 26 is externally mounted to each second bolt 25. Each spring 26 is arrange | positioned between the upper surface of the 2nd bolt attachment plate 24, and the lower surface of the dress grindstone table 12. As shown in FIG. Thereby, the spring 26 acts to elastically support the dress grindstone table 12.

As for the dress grindstone table support part 12 comprised as mentioned above, the annular part 15 is elastically supported by the spring 26 in an initial state. The height position of the dress grindstone table 12 in this initial state is called an initial position.

The initial position can be arbitrarily set according to the thickness of the workpiece, the polishing amount of the workpiece, and the type of the spring 26, and is not particularly limited, but in the case of the arrangement as shown in FIG. 1A, the use surface of the dress grindstone 11 is used. It is preferable to set silver slightly higher than the grinding | polishing surface of the workpiece | work mounted on the turntable 6. In addition, although it is possible to reset the initial position in accordance with the amount of polishing during polishing, it is preferable to keep it constant from the viewpoint of productivity.

From this state, when an external force is applied to a part of the dress grindstone table 12, the dress grindstone table 12 is elastically supported by the spring 26, and can be inclined in a required direction.

When the dress grindstone table 12 shows such a behavior and makes contact with the dress grindstone 11 while revolving each grindstone 9, the height of each grindstone 9 and / or each dress grindstone 11 will increase. Even in the case of nonuniformity, since the dress grindstone table 12 sinks downward in the high part, each grindstone 9 and each dress grindstone 11 contact uniformly. In addition, since the dress grindstone table 12 tries to return to an initial state quickly even if it inclines to one side, the grindstone 9 and each dress grindstone 11 can always be contacted in a favorable contact state, and each grindstone 9 ) Can be efficiently dressed.

By the way, in the grinding | polishing apparatus 1 of this embodiment, although it demonstrated with the grinding | polishing auxiliary means (polishing auxiliary apparatus) 4 attached to the rotating shaft part 5 previously, this grinding | polishing assistance means 4 Since the dress grindstone installation part 10 and the some dress grindstone 11 arrange | positioned on this dress grindstone installation part 10 are comprised schematically, this grinding | polishing assistance means 4 is shown to FIG. 1A and FIG. It can be attached to the rotating shaft part of disk shape different from the one rotating shaft part 5.

Since the dress grindstone installation part 10 has the dress grindstone table 12 and the dress grindstone table support part 13 which supports the dress grindstone table 12, the general disk which is not equipped with the grinding | polishing assistance means 4 is provided. By attaching and fixing the polishing auxiliary means 4 to the rotating shaft portion of the shape, the polishing auxiliary means 4 can be separately attached to the disk-shaped rotating shaft portion of the conventional polishing apparatus.

By configuring the polishing auxiliary means 4 to be mounted on a separate rotary shaft as described above, the polishing auxiliary means 4 of the structure of the present invention can be applied to a conventional polishing apparatus having a disk-shaped rotary shaft portion that is already in use at the production site. have.

As a result, the conventional polishing apparatus can be retrofitted into a novel polishing apparatus exhibiting the effect of the present invention, and it is possible to use it as it is without destroying the ready-to-use apparatus and improve the production efficiency.

(Polishing method)

Next, the grinding | polishing method of this invention is demonstrated to an example using the grinding | polishing apparatus shown in FIG. 1A and FIG.

As shown to FIG. 1A and FIG. 2, first, the grinding | polishing apparatus 1 is set to the position (initial position) in which the rotary grindstone 3 was separated from the surface of the workpiece | work 30 in an initial state.

Next, the work (working substrate) 30 is attached to the work holding surface 7 of the turntable 6.

Although it does not specifically limit as the workpiece | work 30, For example, the board | substrate which consists of metal materials, such as iron, steel, copper, semiconductor materials, such as sapphire, silicon, and SiC, ceramics, etc. are mentioned. According to the present invention, even when a workpiece which is likely to be clogged, such as sapphire or SiC, is applied, the blockage of the rotating grindstone can be suppressed and polishing can be performed efficiently.

The number of the workpieces attached to the workpiece holding surface 7 may be one or a plurality of sheets, and the number of workpieces may be appropriately set depending on the diameter of the workpiece holding surface 7 and the diameter of the workpiece 30. For example, when the diameter of the workpiece | work holding surface 7 is about 300 mm and the workpiece | work 30 is a 4-inch board | substrate, about 3 sheets of board | substrate can be attached to the workpiece | work holding surface 7.

The rotation drive mechanism including the rotation shaft portion 5 rotates the rotation table 6 at a predetermined rotation speed in the direction of the arrow A in the drawing. Thereby, the workpiece | work 30 held by the workpiece | work holding surface 7 revolves horizontally about a rotating shaft.

Moreover, the rotation drive mechanism which the rotary grindstone 3 has rotates the grindstone holding tool 8 at predetermined rotation speed in the arrow B direction in a figure. Thereby, the some grindstone 9 fixed to the grindstone holding tool 8 revolves horizontally about a rotating shaft.

Next, the rotary grindstone 3 is lowered from the initial position to the position (polishing position) in which the surface of the grindstone 9 comes into contact with the surface of the work 30 by the lifting operation mechanism. As a result, the surface of the grindstone 9 is pressed against the surface of the work 30.

When the surface of the grindstone 9 which revolves in the opposite direction contacts the surface of the workpiece | work idle, the grindstone 9 slides the surface of the workpiece | work 30, and polishes the surface of the workpiece | work 30. As shown in FIG. As a result, the workpiece is processed to have a small thickness, and the surface thereof is polished to a flat surface having a desired roughness.

In addition, the surface of the grindstone 9 is also pressed by the surface of the dress grindstone 11 at this time. Thereby, while the grindstone 9 grinds the surface of the workpiece | work 30, the surface is ground by the dress grindstone 11, and simultaneously with the grinding | polishing process of the workpiece | work 30, The dressing process of the grindstone 9 is performed. Therefore, as a result of being able to suppress the phenomenon which produces the blockage on the surface of the grindstone 9 by grinding | polishing powder of a workpiece | work, etc., it becomes possible to respond to the polishing process which is faster than a conventional apparatus.

And when each workpiece 30 is polished to a predetermined thickness, the lifting operation mechanism raises the rotary grindstone 3 to a position (initial position) spaced apart from the surface of the workpiece 30, thereby removing the workpiece 30. You can do it.

As mentioned above, in the grinding | polishing method of this method, the dressing of the grindstone 9 is performed simultaneously with the grinding | polishing process of the workpiece | work 30.

For this reason, in the grinding | polishing process of the workpiece | work 30, it is suppressed that the grinding | polishing powder of the workpiece | work 30 is clogged by the grindstone 9, and the grindstone 9 can exhibit favorable grinding | polishing performance through the whole process of grinding | polishing process.

In addition, if the polishing process of the work 30 and the dressing process of the grindstone 9 are performed simultaneously, compared with performing a dressing process by stopping polishing process, it is necessary until polishing process is complete | finished (a workpiece becomes predetermined thickness). It can save time.

From these points, in this polishing method, high processing efficiency can be obtained, and the productivity of the processed product can be improved remarkably.

For example, when the sapphire substrate (thickness: 700 µm, diameter: 4 inches) is polished to a thickness of 80 µm using the polishing apparatus shown in FIGS. 1A and 2, the polishing rate is 50 to 100 µm / min. When the polishing can be carried out using the conventional polishing apparatus (polishing apparatus shown in Fig. 4), and the same polishing processing is performed, polishing can only be performed at a polishing rate of 10 m / min. That is, by using the polishing apparatus (polishing method) of this invention, the polishing rate of 5 to 10 times compared with the past can be obtained.

In addition, in the said embodiment, each part which comprises a grinding | polishing apparatus and a grinding | polishing auxiliary apparatus, and each process of a grinding | polishing method are an example, It can change suitably in the range which does not deviate from the range of this invention.

[Industry availability]

According to the polishing apparatus, the polishing auxiliary apparatus and the polishing method of the present invention, since the clogging of the rotating grindstone can be suppressed and the polishing can be carried out efficiently without damaging the workpiece, the sapphire substrate which tends to cause the clogging of the rotating grindstone can be produced. It has a suitable characteristic as polishing a SiC substrate.

1: polishing device
2: work holding part
3: rotating grindstone
4: polishing aid (polishing aid)
5: rotating shaft part
6: rotating table
8: Grindstone Reserve
9: grindstone
10: Dress Stone Installation
11: dress grindstone
11A: Dress Stone
11B: Dress Hell
12: dress grindstone table
13: dress grindstone table supports
15: torus
16: support
17: cushion mechanism
18: second bolt hole
19: first bolt hole
20: bolt mounting plate
21: first bolt
24: mounting plate
25: second bolt
26: spring
30: walk

Claims (11)

The rotating shaft,
A rotary table provided on the rotary shaft portion and holding a workpiece on an upper surface thereof;
A rotary grindstone which faces the upper surface of the rotary table and is rotatably supported in a direction opposite to the rotational direction of the rotary table, and is operated by lifting and lowering;
Dress grindstone installation portion disposed around the rotating shaft portion,
It is fixed on the said dress grindstone installation part, Comprising: The grinding face has the dress grindstone arrange | positioned so that it may oppose the grinding face of the said rotating grindstone,
While rotating the rotary table and the dress grindstone and the rotary grindstone in opposite directions, the polishing surface of the rotary grindstone is brought into contact with the surface of the workpiece to polish the workpiece, and in parallel therewith, The polishing apparatus which makes it possible to remove the abrasive powder attached to the said rotating grindstone by making contact with the grinding surface of the said dress grindstone. The polishing device according to claim 1, wherein the dress grindstone is a ring-shaped dress grindstone disposed on the dress grindstone attachment portion. The polishing apparatus according to claim 1, wherein the dress grindstone comprises a plurality of dress grindstone pieces arranged in an annular shape at a predetermined interval on the dress grindstone installation portion. According to claim 1, The dress grindstone mounting portion,
A dress grindstone table for holding the dress grindstone,
And a dress grindstone table support portion for supporting the dress grindstone table to swing up and down. The polishing apparatus according to claim 4, wherein the dress grindstone table support portion includes a spring for elastically supporting the dress grindstone table. The annular dress grindstone installation department,
Having a dress grind fixed on the dress grindstone installation,
The said dress grindstone installation part is comprised so that attachment to the peripheral surface of the rotating shaft part of a grinding | polishing apparatus is possible. 7. The polishing auxiliary apparatus according to claim 6, wherein the dress grindstone is a ring shaped dress grindstone disposed on the dress grindstone installation portion. 7. The polishing auxiliary apparatus according to claim 6, wherein the dress grindstone comprises a plurality of dress grindstone pieces arranged in an annular shape at a predetermined interval on the dress grindstone installation portion. According to claim 6, The dress grindstone installation portion,
A dress grindstone table for holding the dress grindstone,
And a dress grindstone table support part for supporting the dress grindstone table to swing up and down. The polishing auxiliary apparatus according to claim 9, wherein the dress grindstone table support portion includes a spring for elastically supporting the dress grindstone table. When grinding the workpiece by contacting the surface of the workpiece with the polishing surface of the grinding wheel while rotating the rotary table holding the workpiece and the rotary grindstone in opposite directions,
A dress grindstone is disposed around the rotary table, and in parallel with polishing the work, polishing is performed while removing the abrasive powder attached to the rotary grindstone by bringing the polishing surface of the rotary grindstone into contact with the polishing surface of the dress grindstone. A polishing method characterized by the above-mentioned.

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