TW201803105A - 顯示裝置 - Google Patents
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- TW201803105A TW201803105A TW106107401A TW106107401A TW201803105A TW 201803105 A TW201803105 A TW 201803105A TW 106107401 A TW106107401 A TW 106107401A TW 106107401 A TW106107401 A TW 106107401A TW 201803105 A TW201803105 A TW 201803105A
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- 239000010410 layer Substances 0.000 claims description 83
- 239000004820 Pressure-sensitive adhesive Substances 0.000 claims description 68
- 239000002335 surface treatment layer Substances 0.000 claims description 49
- 238000002834 transmittance Methods 0.000 claims description 27
- 239000000806 elastomer Substances 0.000 claims description 24
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- 229910052751 metal Inorganic materials 0.000 claims description 11
- 239000002184 metal Substances 0.000 claims description 11
- 229920000642 polymer Polymers 0.000 claims description 10
- 229920005989 resin Polymers 0.000 claims description 8
- 239000011347 resin Substances 0.000 claims description 8
- 229920006223 adhesive resin Polymers 0.000 claims description 7
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 6
- 239000002216 antistatic agent Substances 0.000 claims description 5
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 4
- 238000010521 absorption reaction Methods 0.000 claims description 4
- 238000002310 reflectometry Methods 0.000 claims description 4
- 239000010409 thin film Substances 0.000 claims description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 3
- 229910052731 fluorine Inorganic materials 0.000 claims description 3
- 239000011737 fluorine Substances 0.000 claims description 3
- 239000000377 silicon dioxide Substances 0.000 claims description 3
- 239000004925 Acrylic resin Substances 0.000 claims description 2
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- 150000002430 hydrocarbons Chemical class 0.000 claims description 2
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- 150000004706 metal oxides Chemical class 0.000 claims description 2
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- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 3
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- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 2
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- OZAIFHULBGXAKX-VAWYXSNFSA-N AIBN Substances N#CC(C)(C)\N=N\C(C)(C)C#N OZAIFHULBGXAKX-VAWYXSNFSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
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- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
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- 239000003431 cross linking reagent Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005401 electroluminescence Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
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- 238000005546 reactive sputtering Methods 0.000 description 1
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- 230000003068 static effect Effects 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000001392 ultraviolet--visible--near infrared spectroscopy Methods 0.000 description 1
Classifications
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/86—Arrangements for improving contrast, e.g. preventing reflection of ambient light
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
- C08G18/62—Polymers of compounds having carbon-to-carbon double bonds
- C08G18/6216—Polymers of alpha-beta ethylenically unsaturated carboxylic acids or of derivatives thereof
- C08G18/622—Polymers of esters of alpha-beta ethylenically unsaturated carboxylic acids
- C08G18/6225—Polymers of esters of acrylic or methacrylic acid
- C08G18/6229—Polymers of hydroxy groups containing esters of acrylic or methacrylic acid with aliphatic polyalcohols
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- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/72—Polyisocyanates or polyisothiocyanates
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
- C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
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- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
- C09J133/04—Homopolymers or copolymers of esters
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- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
- C09J133/04—Homopolymers or copolymers of esters
- C09J133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
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- C09J201/00—Adhesives based on unspecified macromolecular compounds
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/111—Anti-reflection coatings using layers comprising organic materials
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
- G02B1/116—Multilayers including electrically conducting layers
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- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
- H10K77/10—Substrates, e.g. flexible substrates
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2102/00—Constructional details relating to the organic devices covered by this subclass
- H10K2102/301—Details of OLEDs
- H10K2102/311—Flexible OLED
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2102/00—Constructional details relating to the organic devices covered by this subclass
- H10K2102/301—Details of OLEDs
- H10K2102/351—Thickness
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- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
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- H10K59/8791—Arrangements for improving contrast, e.g. preventing reflection of ambient light
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
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Abstract
本申請案係關於顯示裝置。本申請案可提供減少外部光的反射以改良對比度的顯示裝置。此顯示裝置不僅可應用於OLED、自發光顯示裝置,亦可應用於各種顯示裝置,包含LCD、非自發光顯示裝置、以及類似者,並且亦可用作為可撓顯示裝置。
Description
本申請案係關於顯示裝置。
本申請案主張2016年3月8日申請之案號為10-2016-0027595的韓國專利申請案之優先權,其揭露內容係整體以引用方式併入本文。
有機電致發光裝置(organic electroluminescence device,OLED)為自發光顯示裝置,並且不需要背光,因而具有質輕且薄的優點。
然而,缺點在於OLED面板由於金屬線路或電極的外部光造成反射而大幅降低對比度。
專利文件1(日本未審查之專利公開案案號2014-186351)揭露將圓偏光板(circular polarizing plate)附接至OLED面板以防止因外部光的反射造成之對比度降低的技術。根據專利文件1,由外部入射的外部光經由該圓偏光板進入,並且由金屬製成的第二電極反射該
入射的外部光,以改變其偏極化方向(polarization direction)。因此,該入射的外部光不穿透該圓偏光板,且不向外部發射,因而造成消光干涉(extinction interference)。因此,藉由阻擋外部光被反射而改良對比度。
然而,當使用圓偏光板時,問題在於顯示器的亮度大幅降低至50%或更低。此外,隨著顯示裝置逐漸進化為可彎曲或可折疊的可撓顯示裝置,使用圓偏光板將其附接至OLED面板會有所限制,因為彎曲與折疊使圓偏光板之曲率大的區域出現性能劣化。
藉由本申請案解決的問題是提供減少外部光的反射以改良對比度的顯示裝置。
本申請案係關於用於解決上述問題的顯示裝置。該顯示裝置可包括顯示面板(display panel)、壓敏性黏著層(pressure-sensitive adhesive layer)、以及表面處理層(surface treatment layer)。圖1例示顯示裝置,其依序包括顯示面板(101)、壓敏性黏著層(102)以及表面處理層(103)。
在一實例中,顯示裝置可具有藉由以下方程式1計算
的反射率(RC)為10%或更低。此顯示裝置可減少外部光的反射以改良對比度(contrast ratio)。
在方程式1中,RS為該表面處理層對於具有550nm波長之光的反射率(%),RP為該顯示面板對於具有550nm波長之光的反射率(%),以及T為該壓敏性黏著層與該表面處理層對於具有550nm波長之光的總透射率(%)。
更具體而言,該顯示裝置可具有由上述方程式1計算的反射率(RC)為10%或更低、9%或更低、8%或更低、或7%或更低。
在一實例中,顯示裝置可滿足以下方程式2。
在方程式2中,RM為配備有壓敏性黏著層與表面處理層的顯示面板對於具有550nm波長之光所量測的反射率,以及RC為由方程式1計算的反射率RC。反射率(RM)可指在顯示裝置之表面處理層側所量測的反射率。
相對於反射率量測值RM,藉由方程式1所計算的反射率RC可具有約3%以內的偏差(deviation)。因此,於顯示裝置中,當藉由方程式1所計算的反射率RC設計為低時,可降低實際量測的反射率RM。
亦即,本申請案可提供表面處理層的反射率、顯示面板的反射率、以及壓敏性黏著層與表面處理層的總透射率之間的關係,以降低實際量測的反射率,如方程式1所示,並且藉由調整方程式1計算的反射率RC以減少顯示面板的外部光反射率。
顯示面板可包括自發光顯示面板(self-luminous display panel)或非自發光顯示面板(non-self-luminous display panel)。作為自發光顯示面板,例如可以舉例不需要背光的OLED面板與類似物,以及作為非自發光顯示面板,例如可以舉例需要背光的LCD面板與類似物。根據本發明的一實施態樣,OLED面板可作為顯示面板,但並非以此為限。
低反射面板可作為顯示面板。在一實例中,顯示面板的反射率(RP)可為5%至20%。
顯示面板可配備有抗反射層(antireflection layer)。可在顯示裝置的發光表面層提供抗反射層。抗反射層可含括薄膜電晶體以及閘線(gate line)與資料線(data line)。抗反射層可提供於非像素區(non-pixel area),涵括薄膜電晶體以及包括閘線與資料線的配線部(wiring portion)。此抗反射層可用以防止於薄膜電晶體之配線電極(wiring electrode)的表面以及包括提供於非像素區之閘線與資料線的配線部的光反射。當外部光入射於抗反射層上時,存在從抗反射層之表面反射的主要反射光,以及存在經由抗反射層從較低配線部反射的次要反射光。可將
抗反射層的厚度調整為10nm至100nm。當抗反射層的厚度在該範圍內時,透過主要反射光與次要反射光之消光干涉(extinction interference)而有效減少光反射率,使得此顯示面板有利於實現反射率RP。
抗反射層可包括選自由Cu、Al、Mo、Ti、Ag、Ni、Mn、Au、Cr與Co組成的群組之一或二或更多金屬所衍生的金屬氧化物、金屬氮化物、或金屬氮氧化物(metal oxynitride)。
於顯示面板的觀視側(visual side),可依序提供壓敏性黏著層與表面處理層。因此,顯示裝置可解決外部光(external light)反射至觀視側的問題。可藉由在顯示面板的上表面依序層合(laminating)壓敏性黏著層與表面處理層以形成顯示面板。
壓敏性黏著層與表面處理層的總透射率(total transmittance)T可為30%至80%。總透射率T可更具體地為40%至70%或50%至60%。當總透射率T在上述範圍內時,可有效減少外部光所致之反射率。總透射率可指在配備有壓敏性黏著層與表面處理層之狀態(例如,在壓敏性黏著層與表面處理層經層合的狀態),對於具有約550nm波長之光所量測之透射率。此外,總透射率可指藉由使光於層合的壓敏性黏著層與表面處理層之間先進入表面處理層而量測的透射率值。
壓敏性黏著層可包括壓敏性黏著樹脂與吸光材料(light absorbing material)。吸光材料可包括染料
(dye)或顏料(pigment)。例如,可使用諸如苯乙烯樹脂或彈性體、聚烯烴(polyolefin)樹脂或彈性體、聚氧伸烷基(polyoxyalkylene)樹脂或彈性體、聚酯樹脂或彈性體、聚氯乙烯樹脂或彈性體、聚碳酸酯樹脂或彈性體、聚苯硫(polyphenylene sulfide)樹脂或彈性體、烴類(hydrocarbon)之混合物、聚醯胺樹脂或彈性體、丙烯酸酯樹脂或彈性體、環氧樹脂或彈性體、聚矽氧(silicone)樹脂或彈性體、氟樹脂或彈性體、或其混合物之壓敏性黏著樹脂作為壓敏性黏著樹脂。
染料或顏料可為具有不同最大吸收波長帶(maximum absorption wavelength band)的三或更多種染料或顏料之混合物。舉例而言,染料或顏料可為其最大吸收波長帶分別對應於R(紅色)區域、G(綠色)區域以及B(藍色)區域之三或更多種染料或顏料之混合物。不過,染料或顏料的種類不限於以上所述,但可合適地調整以能夠在可見光區域展現平坦的(flat)透射光譜(transmittance spectrum)。例如,染料或顏料亦可為其最大吸收波長帶分別於R(紅色)、G(綠色)、Y(黃色)與V(紫色)區域的染料或顏料之混合物。如上所述,染料或顏料的混合物可展現大致穩定與平坦的透射光譜。舉例而言,染料或顏料的混合物可具有之透射光譜為其中壓敏性黏著層與表面處理層於400nm至700nm波長的總透射率之標準差(standard deviation)為5或更小。總透射率可指於一起配備有壓敏性黏著層與表面處理層的狀態所量測之對400
nm至700nm之波長的平均透射率。標準差可指對於400nm至700nm之波長帶的平均透射率之偏差。
壓敏性黏著層可包括0.1至3重量份的染料或顏料(相對於100重量份的壓敏性黏著樹脂)。此壓敏性黏著層可有效展現壓敏性黏著層與表面處理層之總透射率T。在本說明書中,重量份可指每一成份的重量比例。
壓敏性黏著層可進一步包括抗靜電劑(antistatic agent)。例如,可使用離子化合物或金屬鹽作為抗靜電劑。例如,可使用已知可作為抗靜電劑的有機鹽作為離子化合物。例如,可使用可作為抗劑電劑的已知鹼金屬鹽或鹼土金屬鹽作為金屬鹽。在進一步包括抗靜電劑的情況下,壓敏性黏著層可具有抗靜電性質,以減少靜電產生等等。
表面處理層的反射率RS可為0.5%至2%。表面處理層的反射率RS可更具體地為0.7%至1.8%,或0.9%至1.6%。當表面處理層的反射率RS在上述範圍內時,可有效減少外部光所致之反射率。
例如,表面處理層可為抗反射層(antireflection layer)或防眩光層(anti-glare layer)。表面處理層可包括低折射率層(low refractive index layer),其對於550nm波長具有約1.4或更低的折射率。在低折射率層中的折射率之下限可為例如約1.2或更大,以及更具體的折射率範圍可為1.31至1.35。低折射率層可包括氟系丙烯酸酯(fluorine-based acrylate)以及含有中空二氧化矽
(hollow silica)的光可固化丙烯酸酯。此表面處理層有利於實現反射率RS。表面處理層可進一步包括在低折射率層之一表面上的硬塗層(hard coating layer)。
本案的顯示裝置可減少外部光的反射,以改良對比度。此顯示裝置不僅可應用於OLED、自發光顯示裝置(self-luminous display device),亦可用於各種顯示裝置包括LCD、非自發光顯示裝置(non-self-luminous display device)、以及類似者,並且亦可用作為可撓顯示裝置(flexible display device)。
本案可提供其中減少了外部光的反射以改良對比度之顯示裝置。此顯示裝置不僅可應用於OLED、自發光顯示裝置,亦可用於各種顯示裝置包括LCD、非自發光顯示裝置、以及類似者,並且亦可用作為可撓顯示裝置。
101‧‧‧顯示面板
102‧‧‧壓敏性黏著層
103‧‧‧表面處理層
圖1為本案之顯示裝置的示意圖。
圖2為面板的反射率圖(根據波長)。
圖3為表面處理層的反射率圖(根據波長)。
圖4為根據實施例1之波長的透射率與反射率圖。
圖5為根據實施例2之波長的透射率與反射率圖。
圖6為根據實施例3之波長的透射率與反射率圖。
圖7為根據實施例4之波長的透射率與反射率圖。
圖8為根據實施例5之波長的透射率與反射率圖。
圖9為根據比較例1至3之波長的透射率與反射率圖。
圖10為反射率量測值RM與計算值RC之比較圖。
下文藉由根據本案之實施例等等以更詳細說明顯示裝置,但本案之範圍不受限於以下說明。
以下的實施例與比較例中,依據製造商手冊,使用UV-VIS-NIR分光光度計(solidspec-3700,Shimadzu),量測透射率(transmittance)與反射率(reflectance)(根據波長)。
在以下的實施例與比較例中,根據以下方程式1,計算反射率(RC)。
在方程式1中,RS為表面處理層對於具有550nm波長之光的反射率(%),RP為顯示面板對於具有550nm波長之光的反射率(%),以及T為壓敏性黏著層與表面處理層對於具有550nm波長之光的總透射率(%)。
實施例與比較例中所使用的面板、壓敏性黏著層與表面處理層之製備如下。
於非像素區的上表面,藉由反應性濺鍍方法(reactive sputtering method),形成厚度為80nm(±20nm)的AlO0.3N0.8作為抗反射層,以製備對於550nm波長的光具有反射率為15.95%的低反射面板(面板A)。
製備對於550nm波長的光具有反射率為42.68%的高反射面板(面板B),於面板的非像素區上表面並未形成抗反射層。
圖2為面板A與B的反射率圖(根據波長)。
以重量比99:1(BA:HBA),將丙烯酸正丁酯(n-butyl acrylate,BA)與丙烯酸2-羥乙酯(2-hydroxyethyl acrylate,2-HEA)加至回流氮氣且配備有冷卻裝置的1L(公升)反應器,以利於溫度控制,並且添加乙酸乙酯作為溶劑。而後,以氮氣沖1小時以移除氧氣,以及添加反應起始劑(AIBN;偶氮雙異丁腈(azobisisobutyronitrile)),使得反應進行約8小時,而後用乙酸乙酯稀釋反應物,以製備壓敏性黏著聚合物(A)。壓敏性黏著聚合物(A)的重量平均分子量(Mw)約為1.8百萬。
將離子化合物(FC-4400,3M Co.)與製備的壓敏性黏著聚合物溶液(A)混合,比例為約1重量份(相對於100重量份的壓敏性黏著聚合物溶液(A)之固體含量);以及將約0.083重量份(相對於100重量份的固體含量)的異氰酸酯(isocyanate)硬化劑(T-39M,Soken)(作為交聯劑)與8ppm的催化劑(二月桂酸二丁基錫(dibutyl tin dilaurate),DBTDL)混合於溶劑(EAc,乙酸乙酯)中。再者,將作為染料之紅色S-A2G、黃色S-BY、紫色V-IRS、紅色S-3G以及綠色S-6G(Yedham Chemical),以約0.22、0.1、0.19、0.23與0.08重量份(相對於100重量份的固體含量)之比例混合,以製備可交聯組成物。將製備的可交聯組成物塗覆在經脫離處理(release-treated)的PET(聚(對酞酸乙二酯)(poly(ethyleneterephthalate))(Mitsubishu製造的MRF-38))膜之脫離處理表面(release-treated surface)上,並且於100℃或更高之溫度乾燥2分鐘或更久,以製備壓敏性黏著層A。
壓敏性黏著層B的製備係與壓敏性黏著層A的製備相同方式,差別在於作為染料之紅色S-A2G、黃色S-BY、紫色V-IRS、紅色S-3G以及綠色S-6G(Yedham Chemical)混合物之使用比例約為0.1、0.05、0.09、0.11與0.04重量
份(相對於壓敏性黏著聚合物溶液(A)之固體含量)。
壓敏性黏著層C的製備係與壓敏性黏著層A的製備相同方式,差別在於作為染料之紅色S-A2G、黃色S-BY、紫色V-IRS、紅色S-3G以及綠色S-6G(Yedham Chemical)混合物之使用比例約為0.17、0.07、0.14、0.17與0.06重量份(相對於壓敏性黏著聚合物溶液(A)之固體含量)。
壓敏性黏著層D的製備係與壓敏性黏著層A的製備相同方式,差別在於作為染料之紅色S-A2G、黃色S-BY、紫色V-IRS、紅色S-3G以及綠色S-6G(Yedham Chemical)混合物之使用比例約為0.28、0.12、0.24、0.29與0.11重量份(相對於壓敏性黏著聚合物溶液(A)之固體含量)。
壓敏性黏著層E的製備係與壓敏性黏著層A的製備相同方式,差別在於作為染料之紅色S-A2G、黃色S-BY、紫色V-IRS、紅色S-3G以及綠色S-6G(Yedham Chemical)混合物之使用比例約為0.17、0.07、0.14、0.17與0.06重量份(相對於壓敏性黏著聚合物溶液(A)之固體含量)。
壓敏性黏著層F的製備係與壓敏性黏著層A的製備相同方式,差別在於不使用染料。
以#10 mayer棒(#10 mayer bar)將KYOEISHA鹽形式的抗靜電硬塗溶液(antistatic hard coating solution)(固體含量50重量%,產品名稱:LJD-1000)塗覆在TAC膜的上表面上,於90℃乾燥1分鐘,而後以150mJ/cm2的紫外線照射,以製備厚度約為5至6μm(微米)的硬塗膜。透過以在550nm之折射率為約1.33的低折射率層塗覆的抗反射層,製備對於550nm波長之光具有反射率為0.89%的表面處理層A與具有反射率為1.14%的表面處理層B,該低折射率層係由分別包含60重量%與40重量%之中空二氧化矽(hollow silica)的光可固化丙烯酸酯與氟系丙烯酸酯(fluorine-based acrylate)製成。
當於TAC膜之上表面未形成表面處理層時,對於550nm波長之光的反射率為4.05%。
圖3為表面處理層A至B以及未形成表面處理層之情況的反射率圖(根據波長)。
藉由將膜(其中,壓敏性黏著層A與表面處理層A係經層合)的壓敏性黏著表面層合(laminating)於低反射面板(面板A)之上表面而製造顯示裝置。
實施例2至5與比較例1至3的製造方式與實施例1相同,差別在於面板、壓敏性黏著層與表面處理層之改變如以下表1所示。
實施例1至5與比較例1至3的物理性質(RS、RP、T、RM與RC)如表2所示。圖4至8分別為實施例1至5之透射率與反射率(根據波長)的圖。圖9為比較例1至3之透射率與反射率(根據波長)的圖。圖10為反射率量測值RM與計算值RC之比較圖。
101‧‧‧顯示面板
102‧‧‧壓敏性黏著層
103‧‧‧表面處理層
Claims (19)
- 如申請專利範圍第1項之顯示裝置,其中,該顯示面板包括自發光顯示面板或非自發光顯示面板。
- 如申請專利範圍第1項之顯示裝置,其中,該顯示面板的反射率RP為5%至20%。
- 如申請專利範圍第1項之顯示裝置,其中,該顯示面板配備有抗反射層於非像素區上,涵括薄膜電晶體與包含閘線(gate line)與資料線(data line)的配線部(wiring portion)。
- 如申請專利範圍第5項之顯示裝置,其中,該反射層包括選自由Cu、Al、Mo、Ti、Ag、Ni、Mn、Au、Cr與Co組成的群組之一或二或更多金屬所衍生的金屬氧化物、金屬氮化物、或金屬氮氧化物。
- 如申請專利範圍第5項之顯示裝置,其中,該反射層的厚度為10nm至100nm。
- 如申請專利範圍第1項之顯示裝置,其中,該壓敏性黏著層與該表面處理層係依序提供在該顯示面板的觀視側(visual side)上。
- 如申請專利範圍第1項之顯示裝置,其中,該壓敏性黏著層與該表面處理層的總透射率T為30%至80%。
- 如申請專利範圍第1項之顯示裝置,其中,該壓敏性黏著層包括壓敏性黏著樹脂與染料或顏料。
- 如申請專利範圍第10項之顯示裝置,其中,該壓敏性黏著樹脂包括苯乙烯樹脂或彈性體、聚烯烴樹脂或彈性體、聚氧伸烷基(polyoxyalkylene)樹脂或彈性體、聚酯樹脂或彈性體、聚氯乙烯樹脂或彈性體、聚碳酸酯樹脂或彈性體、聚苯硫(polyphenylene sulfide)樹脂或彈性體、烴類之混合物、聚醯胺樹脂或彈性體、丙烯酸酯樹脂或彈性體、環氧樹脂或彈性體、聚矽氧(silicone)樹脂或彈性體、氟樹脂或彈性體、或其混合物。
- 如申請專利範圍第10項之顯示裝置,其中,該染料或顏料為三或更多種具有彼此不同之最大吸收波長帶(maximum absorption wavelength band)的染料或顏料之混合物,並且具有於400nm至700nm波長的該壓敏性黏著層與該表面處理層的總透射率之標準差為5或更小。
- 如申請專利範圍第10項之顯示裝置,其中,相對於100重量份的該壓敏性黏著樹脂,該壓敏性黏著層包括0.1至3重量份的染料或顏料。
- 如申請專利範圍第10項之顯示裝置,其中,該壓敏性黏著層進一步包括抗靜電劑。
- 如申請專利範圍第1項之顯示裝置,其中,該表面處理層的反射率RS為0.5%至2%。
- 如申請專利範圍第1項之顯示裝置,其中,該表面處理層包括抗反射層或防眩光層(anti-glare layer)。
- 如申請專利範圍第1項之顯示裝置,其中,該表面處理層包括對於550nm波長具有折射率為1.2至1.4的低折射率層。
- 如申請專利範圍第17項之顯示裝置,其中,該低折射率層包括氟系丙烯酸酯(fluorine-based acrylate)以及含有中空二氧化矽(hollow silica)的光可固化丙烯酸酯。
- 如申請專利範圍第17項之顯示裝置,其中,該表面處理層進一步包括提供於該低折射率層之一表面上的硬塗層。
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CN107925012B (zh) | 2020-04-07 |
WO2017155266A1 (ko) | 2017-09-14 |
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KR102010759B1 (ko) | 2019-08-14 |
US10497904B2 (en) | 2019-12-03 |
JP6595697B2 (ja) | 2019-10-23 |
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JP2018523854A (ja) | 2018-08-23 |
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