TW201714240A - Device and method for bonding of substrates - Google Patents
Device and method for bonding of substratesInfo
- Publication number
- TW201714240A TW201714240A TW106101547A TW106101547A TW201714240A TW 201714240 A TW201714240 A TW 201714240A TW 106101547 A TW106101547 A TW 106101547A TW 106101547 A TW106101547 A TW 106101547A TW 201714240 A TW201714240 A TW 201714240A
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- bonding
- mounting
- outer ring
- deformation
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/185—Joining of semiconductor bodies for junction formation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/10—Methods of surface bonding and/or assembly therefor
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Combinations Of Printed Boards (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
WOPCT/EP2011/063968 | 2011-08-12 | ||
EP2011063968 | 2011-08-12 | ||
PCT/EP2011/064353 WO2013023708A1 (de) | 2011-08-12 | 2011-08-22 | Vorrichtung und verfahren zum bonden von substraten |
WOPCT/EP2011/064353 | 2011-08-22 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201714240A true TW201714240A (en) | 2017-04-16 |
TWI708307B TWI708307B (zh) | 2020-10-21 |
Family
ID=44719857
Family Applications (6)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW101124662A TWI602252B (zh) | 2011-08-12 | 2012-07-09 | 接合基板之設備及方法 |
TW110133657A TWI809495B (zh) | 2011-08-12 | 2012-07-09 | 接合基板之設備及方法 |
TW106101547A TWI708307B (zh) | 2011-08-12 | 2012-07-09 | 接合基板之設備及方法 |
TW111130297A TWI820860B (zh) | 2011-08-12 | 2012-07-09 | 接合基板之設備及方法 |
TW108116259A TWI732215B (zh) | 2011-08-12 | 2012-07-09 | 接合基板之設備及方法 |
TW109125168A TWI777200B (zh) | 2011-08-12 | 2012-07-09 | 接合基板之設備及方法 |
Family Applications Before (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW101124662A TWI602252B (zh) | 2011-08-12 | 2012-07-09 | 接合基板之設備及方法 |
TW110133657A TWI809495B (zh) | 2011-08-12 | 2012-07-09 | 接合基板之設備及方法 |
Family Applications After (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW111130297A TWI820860B (zh) | 2011-08-12 | 2012-07-09 | 接合基板之設備及方法 |
TW108116259A TWI732215B (zh) | 2011-08-12 | 2012-07-09 | 接合基板之設備及方法 |
TW109125168A TWI777200B (zh) | 2011-08-12 | 2012-07-09 | 接合基板之設備及方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US9613840B2 (zh) |
JP (6) | JP5977826B2 (zh) |
KR (5) | KR102151902B1 (zh) |
CN (1) | CN106941084B (zh) |
SG (1) | SG2014009369A (zh) |
TW (6) | TWI602252B (zh) |
WO (1) | WO2013023708A1 (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI814872B (zh) * | 2018-07-26 | 2023-09-11 | 日商日本碍子股份有限公司 | 暫時固定基板、暫時固定方法及電子構件的製造方法 |
Families Citing this family (21)
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JP6333031B2 (ja) * | 2014-04-09 | 2018-05-30 | キヤノン株式会社 | インプリント装置および物品の製造方法 |
KR102249004B1 (ko) * | 2014-04-22 | 2021-05-07 | 에베 그룹 에. 탈너 게엠베하 | 나노구조를 엠보싱하기 위한 방법 및 장치 |
SG11201603148VA (en) * | 2014-12-18 | 2016-07-28 | Ev Group E Thallner Gmbh | Method for bonding substrates |
KR102311942B1 (ko) * | 2014-12-23 | 2021-10-13 | 에베 그룹 에. 탈너 게엠베하 | 기판들을 예비고정하기 위한 방법 및 장치 |
KR20170137050A (ko) | 2015-04-10 | 2017-12-12 | 에베 그룹 에. 탈너 게엠베하 | 2개의 기판을 결합하기 위한 기판 홀더 및 방법. |
CN108028180B (zh) | 2016-02-16 | 2022-01-28 | Ev 集团 E·索尔纳有限责任公司 | 用于接合衬底的方法 |
SG11201806511XA (en) | 2016-03-22 | 2018-08-30 | Ev Group E Thallner Gmbh | Device and method for bonding substrates |
CN110383446A (zh) | 2017-03-16 | 2019-10-25 | Ev 集团 E·索尔纳有限责任公司 | 用于接合至少三个衬底的方法 |
JP6935112B2 (ja) * | 2018-07-19 | 2021-09-15 | ボンドテック株式会社 | 基板接合装置 |
KR102478503B1 (ko) | 2018-07-25 | 2022-12-19 | 가부시키가이샤 니콘 | 접합 방법 및 접합 장치 |
TWI828760B (zh) * | 2018-10-25 | 2024-01-11 | 日商尼康股份有限公司 | 基板貼合裝置、參數計算裝置、基板貼合方法及參數計算方法 |
JP6818076B2 (ja) * | 2019-04-17 | 2021-01-20 | エーファウ・グループ・エー・タルナー・ゲーエムベーハー | 基板を接合する装置および方法 |
JP6801061B2 (ja) * | 2019-08-05 | 2020-12-16 | エーファウ・グループ・エー・タルナー・ゲーエムベーハー | 基板を仮固定するための方法と装置 |
JP6797267B2 (ja) * | 2019-11-07 | 2020-12-09 | 東京エレクトロン株式会社 | 接合システムおよび接合方法 |
JP2023533653A (ja) | 2020-06-29 | 2023-08-04 | エーファウ・グループ・エー・タルナー・ゲーエムベーハー | 基板同士を接合するための方法および装置 |
EP4173027A1 (de) | 2020-06-29 | 2023-05-03 | EV Group E. Thallner GmbH | Substrathalter und verfahren zum fixieren und bonden eines substrats |
CN112038220B (zh) * | 2020-08-31 | 2023-02-03 | 上海华力集成电路制造有限公司 | 晶圆键合工艺中改善晶圆边缘形变的方法 |
US11829077B2 (en) | 2020-12-11 | 2023-11-28 | Kla Corporation | System and method for determining post bonding overlay |
CN116982140A (zh) | 2021-02-26 | 2023-10-31 | 邦德科技股份有限公司 | 接合方法、基板接合装置以及基板接合系统 |
US11782411B2 (en) | 2021-07-28 | 2023-10-10 | Kla Corporation | System and method for mitigating overlay distortion patterns caused by a wafer bonding tool |
WO2023078567A1 (de) | 2021-11-08 | 2023-05-11 | Ev Group E. Thallner Gmbh | Vorrichtung und verfahren zum bonden von substraten |
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JPH0831515B2 (ja) * | 1988-06-21 | 1996-03-27 | 株式会社ニコン | 基板の吸着装置 |
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JP3321827B2 (ja) * | 1992-05-15 | 2002-09-09 | ソニー株式会社 | はり合わせ基板形成用支持装置及びはり合わせ基板の形成方法 |
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JPH11195696A (ja) * | 1997-12-26 | 1999-07-21 | Canon Inc | 基板支持台及び基板処理装置 |
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US7682933B1 (en) * | 2007-09-26 | 2010-03-23 | The United States Of America As Represented By The Secretary Of The Air Force | Wafer alignment and bonding |
US7846813B2 (en) * | 2008-02-04 | 2010-12-07 | Fairchild Semiconductor Corporation | Method and apparatus for bonded substrates |
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JP5090393B2 (ja) | 2009-03-19 | 2012-12-05 | 株式会社栃木屋 | 蝶番 |
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US8408262B2 (en) * | 2009-10-08 | 2013-04-02 | International Business Machines Corporation | Adaptive chuck for planar bonding between substrates |
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JP2012175043A (ja) * | 2011-02-24 | 2012-09-10 | Tokyo Electron Ltd | 接合装置、接合システム、接合方法、プログラム及びコンピュータ記憶媒体 |
EP2704182B1 (en) * | 2011-04-26 | 2018-01-03 | Nikon Corporation | Substrate bonding apparatus and substrate bonding method |
US20130147129A1 (en) * | 2011-12-08 | 2013-06-13 | Nan Ya Technology Corporation | Wafer supporting structure |
-
2011
- 2011-08-22 KR KR1020197022752A patent/KR102151902B1/ko active Application Filing
- 2011-08-22 SG SG2014009369A patent/SG2014009369A/en unknown
- 2011-08-22 US US14/238,091 patent/US9613840B2/en active Active
- 2011-08-22 KR KR1020237022568A patent/KR20230106735A/ko not_active Application Discontinuation
- 2011-08-22 KR KR1020147002692A patent/KR102009053B1/ko active IP Right Grant
- 2011-08-22 KR KR1020207024765A patent/KR102350216B1/ko active IP Right Grant
- 2011-08-22 KR KR1020227000549A patent/KR20220008392A/ko active Application Filing
- 2011-08-22 CN CN201610944779.1A patent/CN106941084B/zh active Active
- 2011-08-22 JP JP2014525328A patent/JP5977826B2/ja active Active
- 2011-08-22 WO PCT/EP2011/064353 patent/WO2013023708A1/de active Application Filing
-
2012
- 2012-07-09 TW TW101124662A patent/TWI602252B/zh active
- 2012-07-09 TW TW110133657A patent/TWI809495B/zh active
- 2012-07-09 TW TW106101547A patent/TWI708307B/zh active
- 2012-07-09 TW TW111130297A patent/TWI820860B/zh active
- 2012-07-09 TW TW108116259A patent/TWI732215B/zh active
- 2012-07-09 TW TW109125168A patent/TWI777200B/zh active
-
2016
- 2016-07-22 JP JP2016144567A patent/JP6231625B2/ja active Active
-
2017
- 2017-10-19 JP JP2017202648A patent/JP6543316B2/ja active Active
-
2019
- 2019-06-14 JP JP2019111074A patent/JP6848012B2/ja active Active
-
2021
- 2021-03-03 JP JP2021033637A patent/JP7146002B2/ja active Active
-
2022
- 2022-09-20 JP JP2022148832A patent/JP7345613B2/ja active Active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI814872B (zh) * | 2018-07-26 | 2023-09-11 | 日商日本碍子股份有限公司 | 暫時固定基板、暫時固定方法及電子構件的製造方法 |
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