TW201543152A - 感光性樹脂組成物 - Google Patents

感光性樹脂組成物 Download PDF

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Publication number
TW201543152A
TW201543152A TW104107850A TW104107850A TW201543152A TW 201543152 A TW201543152 A TW 201543152A TW 104107850 A TW104107850 A TW 104107850A TW 104107850 A TW104107850 A TW 104107850A TW 201543152 A TW201543152 A TW 201543152A
Authority
TW
Taiwan
Prior art keywords
boiling point
organic solvent
resin composition
photosensitive resin
less
Prior art date
Application number
TW104107850A
Other languages
English (en)
Chinese (zh)
Inventor
Yoshifumi Ikeda
Yoji Fujita
Original Assignee
Toray Industries
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries filed Critical Toray Industries
Publication of TW201543152A publication Critical patent/TW201543152A/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
TW104107850A 2014-03-14 2015-03-12 感光性樹脂組成物 TW201543152A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014051259 2014-03-14

Publications (1)

Publication Number Publication Date
TW201543152A true TW201543152A (zh) 2015-11-16

Family

ID=54071725

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104107850A TW201543152A (zh) 2014-03-14 2015-03-12 感光性樹脂組成物

Country Status (3)

Country Link
JP (1) JPWO2015137281A1 (ja)
TW (1) TW201543152A (ja)
WO (1) WO2015137281A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI701504B (zh) * 2016-03-28 2020-08-11 日商東麗股份有限公司 樹脂組成物、其硬化凸紋圖案、及使用其之半導體電子零件或半導體裝置之製造方法

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2017217293A1 (ja) * 2016-06-15 2019-04-04 東レ株式会社 感光性樹脂組成物
JP7062953B2 (ja) * 2016-08-29 2022-05-09 東レ株式会社 感光性樹脂組成物、硬化膜、有機ｅｌ表示装置、半導体電子部品、半導体装置
TW201821280A (zh) * 2016-09-30 2018-06-16 日商富士軟片股份有限公司 積層體以及半導體元件的製造方法
KR20240009689A (ko) * 2022-07-14 2024-01-23 주식회사 동진쎄미켐 감광성 수지 조성물, 경화막 및 이를 포함하는 표시장치

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4337602B2 (ja) * 2004-03-31 2009-09-30 日本ゼオン株式会社 感放射線組成物、積層体及びその製造方法並びに電子部品
JP4935269B2 (ja) * 2005-09-21 2012-05-23 東レ株式会社 ポジ型感光性樹脂組成物
JP4853228B2 (ja) * 2006-10-25 2012-01-11 東レ株式会社 感光性シロキサン組成物、それから形成された硬化膜、および硬化膜を有する素子、並びにパターン形成方法
JP2013232314A (ja) * 2012-04-27 2013-11-14 Jsr Corp 感放射線性樹脂組成物、絶縁膜および有機ｅｌ素子
JP6286834B2 (ja) * 2013-02-22 2018-03-07 東レ株式会社 耐熱性樹脂組成物および耐熱性樹脂膜の製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI701504B (zh) * 2016-03-28 2020-08-11 日商東麗股份有限公司 樹脂組成物、其硬化凸紋圖案、及使用其之半導體電子零件或半導體裝置之製造方法

Also Published As

Publication number Publication date
JPWO2015137281A1 (ja) 2017-04-06
WO2015137281A1 (ja) 2015-09-17

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