TW201412409A - 空氣軸承裝置及塗布裝置 - Google Patents

空氣軸承裝置及塗布裝置 Download PDF

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Publication number
TW201412409A
TW201412409A TW102127675A TW102127675A TW201412409A TW 201412409 A TW201412409 A TW 201412409A TW 102127675 A TW102127675 A TW 102127675A TW 102127675 A TW102127675 A TW 102127675A TW 201412409 A TW201412409 A TW 201412409A
Authority
TW
Taiwan
Prior art keywords
coating
air bearing
bearing device
gas
exhaust
Prior art date
Application number
TW102127675A
Other languages
English (en)
Chinese (zh)
Inventor
Toshiyuki Ikeda
Satoshi Ueda
Original Assignee
Oiles Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oiles Industry Co Ltd filed Critical Oiles Industry Co Ltd
Publication of TW201412409A publication Critical patent/TW201412409A/zh

Links

Classifications

    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16CSHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C32/00Bearings not otherwise provided for
    • F16C32/06Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings
    • F16C32/0603Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings supported by a gas cushion, e.g. an air cushion
    • F16C32/0614Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings supported by a gas cushion, e.g. an air cushion the gas being supplied under pressure, e.g. aerostatic bearings
    • F16C32/0622Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings supported by a gas cushion, e.g. an air cushion the gas being supplied under pressure, e.g. aerostatic bearings via nozzles, restrictors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/6715Apparatus for applying a liquid, a resin, an ink or the like
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67784Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations using air tracks

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Magnetic Bearings And Hydrostatic Bearings (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Spray Control Apparatus (AREA)
  • Details Or Accessories Of Spraying Plant Or Apparatus (AREA)
TW102127675A 2012-08-06 2013-08-01 空氣軸承裝置及塗布裝置 TW201412409A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012174198A JP2014031865A (ja) 2012-08-06 2012-08-06 エアベアリング装置及び塗布装置

Publications (1)

Publication Number Publication Date
TW201412409A true TW201412409A (zh) 2014-04-01

Family

ID=50067824

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102127675A TW201412409A (zh) 2012-08-06 2013-08-01 空氣軸承裝置及塗布裝置

Country Status (5)

Country Link
JP (1) JP2014031865A (enExample)
KR (1) KR20150040924A (enExample)
CN (1) CN104583618A (enExample)
TW (1) TW201412409A (enExample)
WO (1) WO2014024583A1 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201539620A (zh) * 2014-02-18 2015-10-16 Oiles Industry Co Ltd 空氣軸承裝置及測定裝置
US11097974B2 (en) 2014-07-31 2021-08-24 Corning Incorporated Thermally strengthened consumer electronic glass and related systems and methods
US12338159B2 (en) 2015-07-30 2025-06-24 Corning Incorporated Thermally strengthened consumer electronic glass and related systems and methods
JP6923555B2 (ja) 2016-01-12 2021-08-18 コーニング インコーポレイテッド 薄厚熱強化及び化学強化ガラス系物品
US11795102B2 (en) 2016-01-26 2023-10-24 Corning Incorporated Non-contact coated glass and related coating system and method
TWI785156B (zh) 2017-11-30 2022-12-01 美商康寧公司 具有高熱膨脹係數及對於熱回火之優先破裂行為的非離子交換玻璃
EP3719443B1 (en) 2019-04-03 2021-06-09 Hexagon Technology Center GmbH Coordinate-measuring machine with self-cleaning air bearing
KR20210154825A (ko) 2019-04-23 2021-12-21 코닝 인코포레이티드 확정 응력 프로파일을 갖는 유리 라미네이트 및 그 제조방법
US11697617B2 (en) 2019-08-06 2023-07-11 Corning Incorporated Glass laminate with buried stress spikes to arrest cracks and methods of making the same
CN111894983A (zh) * 2020-07-30 2020-11-06 西安工业大学 微孔节流的静压气体止推轴承
CN114251362A (zh) * 2020-09-24 2022-03-29 武汉科技大学 一种微纳多孔节流气浮球面轴承
FR3139869A1 (fr) * 2022-09-16 2024-03-22 Micro-Contrôle - Spectra-Physics Appareil pour la réduction des vibrations dans un système de régulation de mouvement à coussin d’air

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60113816A (ja) * 1983-11-22 1985-06-20 Miyoutoku:Kk エア−スライド装置
JPH07109217B2 (ja) * 1986-01-31 1995-11-22 京セラ株式会社 静圧気体直線案内装置
JPH09222124A (ja) * 1996-02-19 1997-08-26 Nippon Seiko Kk 静圧気体軸受
US6287004B1 (en) * 1999-11-22 2001-09-11 Nikon Corporation Fluid bearing operable in a vacuum region
TWI222423B (en) * 2001-12-27 2004-10-21 Orbotech Ltd System and methods for conveying and transporting levitated articles
JP2004019760A (ja) * 2002-06-14 2004-01-22 Nsk Ltd 静圧軸受
JP4468059B2 (ja) * 2004-04-23 2010-05-26 太平洋セメント株式会社 静圧軸受け装置
JP2008149238A (ja) * 2006-12-15 2008-07-03 Chugai Ro Co Ltd 塗布装置
US7607647B2 (en) * 2007-03-20 2009-10-27 Kla-Tencor Technologies Corporation Stabilizing a substrate using a vacuum preload air bearing chuck
JP2011133724A (ja) * 2009-12-25 2011-07-07 Nikon Corp 流体静圧軸受、移動体装置、露光装置、デバイス製造方法、及び清掃装置

Also Published As

Publication number Publication date
CN104583618A (zh) 2015-04-29
WO2014024583A1 (ja) 2014-02-13
KR20150040924A (ko) 2015-04-15
JP2014031865A (ja) 2014-02-20

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