TW201334961A - Bonding device and bonding method - Google Patents

Bonding device and bonding method Download PDF

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Publication number
TW201334961A
TW201334961A TW102102999A TW102102999A TW201334961A TW 201334961 A TW201334961 A TW 201334961A TW 102102999 A TW102102999 A TW 102102999A TW 102102999 A TW102102999 A TW 102102999A TW 201334961 A TW201334961 A TW 201334961A
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Taiwan
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plate
platform
rotating roller
bonding
substrate
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TW102102999A
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Chinese (zh)
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TWI561376B (en
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Hiroshi Utsugi
Yasunori Ito
Daisuke Uchida
Yuki Tateyama
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Asahi Glass Co Ltd
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/10Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the pressing technique, e.g. using action of vacuum or fluid pressure
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B17/00Layered products essentially comprising sheet glass, or glass, slag, or like fibres
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B41/00Arrangements for controlling or monitoring lamination processes; Safety arrangements
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C27/00Joining pieces of glass to pieces of other inorganic material; Joining glass to glass other than by fusing
    • C03C27/06Joining glass to glass by processes other than fusing

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Ceramic Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • Organic Chemistry (AREA)
  • Laminated Bodies (AREA)
  • Liquid Crystal (AREA)
  • Joining Of Glass To Other Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

The present invention provides a bonding device that reduces defects or warpage of a laminated board after bonding. A bonding device 10 for bonding a plate-like member 2 and a flexible plate 3 comprises: an upper platform 20, which sucks and holds the plate-like member 2; a lower platform 40, which is arranged under the upper platform 20 and carries the flexible plate 3; a rotating roll 50, which is in contact with a lower surface of the flexible plate 3 supported by the lower platform 40 to have the flexible plate 3 to flex and deform due to the its own weight; a push section 60, which pushes, via the rotating roll 50, the flexible plate 3 against the plate-like member 2 sucked and held by the upper platform 20; and a moving mechanism 70, which causes the rotating roll 50 and the push section 60 to move relative to the upper platform 20.

Description

黏合裝置及黏合方法 Adhesive device and bonding method

本發明係關於一種黏合裝置、及黏合方法。 The present invention relates to an adhesive device and a bonding method.

隨著顯示面板、太陽電池、薄膜二次電池等電子器件之薄型化、輕量化,而要求電子器件中使用之基板之薄板化。若基板變薄,則基板之操作性較差,故而變得難以於基板上形成電子器件用之功能層(例如薄膜電晶體、彩色濾光片)。 As electronic devices such as display panels, solar cells, and thin film secondary batteries are thinner and lighter, thinner substrates are required for use in electronic devices. When the substrate is thinned, the handleability of the substrate is inferior, so that it is difficult to form a functional layer (for example, a thin film transistor or a color filter) for an electronic device on the substrate.

因此,提出有將基板與增強板黏合而製造積層板並於該積層板之基板上形成功能層後,將基板與增強板剝離之方法(例如,參照專利文獻1)。於專利文獻1中,於基板與增強板之黏合時使用真空加壓機。 For this reason, there has been proposed a method in which a substrate and a reinforcing sheet are bonded to each other to form a laminated sheet, and a functional layer is formed on the substrate of the laminated sheet, and then the substrate and the reinforcing sheet are peeled off (for example, see Patent Document 1). In Patent Document 1, a vacuum presser is used when bonding a substrate to a reinforcing plate.

又,作為將基板與片材黏合之方法,提出有由吸附體自上方平坦地支持基板,並且由複數個吸附墊自下方支持片材之方法(例如,參照專利文獻2)。於該方法中,使用自下方提昇片材並將其壓接於基板之旋轉輥。隨著旋轉輥之移動,複數個吸附墊以特定之順序解除吸附,並且向下方退避。 In addition, as a method of bonding the substrate to the sheet, a method in which the substrate is supported flat from the upper side by the adsorbent and the sheet is supported from below by a plurality of adsorption pads has been proposed (for example, see Patent Document 2). In this method, a rotating roll that lifts the sheet from below and crimps it to the substrate is used. As the rotating roller moves, the plurality of adsorption pads are desorbed in a specific order and are retracted downward.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利特開2007-326358號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2007-326358

[專利文獻2]日本專利特開2009-040617號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2009-040617

於專利文獻1中記載之黏合方法中,由於將基板與增強板平行地黏合,故而有於真空度較低之情形時基板與增強板之間夾入氣泡而成為缺陷之情形。 In the bonding method described in Patent Document 1, since the substrate and the reinforcing plate are bonded in parallel, when the degree of vacuum is low, bubbles may be trapped between the substrate and the reinforcing plate to cause defects.

又,於專利文獻2中記載之黏合方法中,由於利用二維地離散配置之複數個吸附墊吸附片材,故而於因對片材局部施加之吸附力之影響而使片材變形之狀態下與平板狀之基板黏合。由於在黏合後欲使片材恢復至原本形狀,故而積層板之翹曲較大。 Further, in the bonding method described in Patent Document 2, since the sheet is adsorbed by a plurality of adsorption pads which are two-dimensionally discretely disposed, the sheet is deformed by the influence of the adsorption force locally applied to the sheet. Bonded to a flat substrate. Since the sheet is returned to the original shape after bonding, the warpage of the laminate is large.

本發明係鑒於上述課題而完成者,其目的在於提供一種可減少黏合後之積層板之缺陷或翹曲之黏合裝置、及黏合方法。 The present invention has been made in view of the above problems, and an object thereof is to provide an adhesive device and a bonding method capable of reducing defects or warpage of a laminated board after bonding.

為了解決上述課題,本發明之一態樣之黏合裝置係將板狀構件與可撓性板黏合者,且包括:上平台,其係吸附上述板狀構件;下平台,其係配置於該上平台之下方,且載置上述可撓性板;旋轉輥,其係與由該下平台支持之上述可撓性板之下表面接觸,且使上述可撓性板因自身重量而撓曲變形;推壓部,其係將因該旋轉輥而撓曲變形之上述可撓性板推壓於由上述上平台吸附之板狀構件;及移動機構,其係使上述旋轉輥及上述推壓部對於上述上平台相對移動。 In order to solve the above problems, an adhesive device according to an aspect of the present invention is a device for bonding a plate member to a flexible plate, and includes: an upper platform that adsorbs the plate member; and a lower platform on which the lower plate is disposed a flexible plate disposed below the platform; and a rotating roller that is in contact with a lower surface of the flexible plate supported by the lower platform, and the flexible plate is flexibly deformed by its own weight; a pressing portion that presses the flexible plate that is flexibly deformed by the rotating roller against a plate-shaped member that is adsorbed by the upper stage; and a moving mechanism that causes the rotating roller and the pressing portion to The above upper platform is relatively moved.

又,本發明之另一態樣之黏合方法係將板狀構件與可撓性板黏合者,且包括如下步驟:由上平台吸附上述板狀構件,並且於配置於上述上平台之下方之下平台上載置上述可撓性板;及使與由上述下平台支持之上述可撓性板之下表面接觸,且於上 述可撓性板因自身重量而撓曲變形之狀態,使擠壓於由上述上平台吸附之上述板狀構件之旋轉輥對於上述上平台相對移動。 Moreover, another aspect of the bonding method of the present invention is to bond the plate member to the flexible plate, and includes the steps of: adsorbing the plate member from the upper platform, and disposing under the upper platform; Disposing the above flexible plate on the platform; and contacting the lower surface of the flexible plate supported by the lower platform, and In a state where the flexible sheet is flexibly deformed by its own weight, the rotating roller pressed against the plate-like member adsorbed by the upper stage is relatively moved with respect to the upper stage.

根據本發明,可提供一種可減少黏合後之積層板之缺陷或翹曲之黏合裝置、及黏合方法。 According to the present invention, it is possible to provide an adhesive device and a bonding method which can reduce defects or warpage of a laminated board after bonding.

1‧‧‧積層板 1‧‧‧ laminate

2‧‧‧基板(板狀構件) 2‧‧‧Substrate (plate member)

2A‧‧‧基板 2A‧‧‧Substrate

2B‧‧‧基板 2B‧‧‧Substrate

3‧‧‧增強板(可撓性板) 3‧‧‧Enhanced board (flexible board)

3A‧‧‧增強板 3A‧‧‧Enhanced Board

3B‧‧‧增強板 3B‧‧‧Enhanced board

4‧‧‧支持板 4‧‧‧Support board

4A‧‧‧支持板 4A‧‧‧Support Board

4B‧‧‧支持板 4B‧‧‧Support Board

5‧‧‧樹脂層 5‧‧‧ resin layer

5A‧‧‧樹脂層 5A‧‧‧ resin layer

5B‧‧‧樹脂層 5B‧‧‧ resin layer

6‧‧‧積層體 6‧‧‧Layer

7‧‧‧液晶層 7‧‧‧Liquid layer

10‧‧‧黏合裝置 10‧‧‧Adhesive device

11‧‧‧搬送機構 11‧‧‧Transportation agency

12‧‧‧保持構件 12‧‧‧ Keeping components

13‧‧‧臂 13‧‧‧ Arm

14‧‧‧吸附墊 14‧‧‧Adsorption pad

15‧‧‧定位構件 15‧‧‧ Positioning members

16‧‧‧本體部 16‧‧‧ Body Department

17‧‧‧螺栓 17‧‧‧ bolt

18‧‧‧軸部 18‧‧‧Axis

19‧‧‧頭部 19‧‧‧ head

19a‧‧‧定位機構之上部 19a‧‧‧Top part of the positioning mechanism

20‧‧‧上平台 20‧‧‧Upper platform

21‧‧‧吸附板 21‧‧‧Adsorption plate

22‧‧‧吸附孔 22‧‧‧Adsorption holes

23‧‧‧槽 23‧‧‧ slot

24‧‧‧主框架 24‧‧‧ main frame

25‧‧‧缸 25‧‧‧cylinder

26‧‧‧增強構件 26‧‧‧Enhanced components

27‧‧‧缸本體 27‧‧‧ cylinder body

28‧‧‧桿 28‧‧‧ rod

29‧‧‧載置部 29‧‧‧Loading Department

29a‧‧‧載置部之下部 29a‧‧‧Under the Department

30‧‧‧切換機構 30‧‧‧Switching mechanism

31‧‧‧上平台支持構件 31‧‧‧Upper platform support components

32‧‧‧升降機構 32‧‧‧ Lifting mechanism

33‧‧‧旋轉用馬達 33‧‧‧Rotary motor

34‧‧‧升降桿 34‧‧‧ Lifting rod

35‧‧‧升降用馬達 35‧‧‧ Lifting motor

36‧‧‧支持具 36‧‧‧Support

36a‧‧‧支持具之上部 36a‧‧‧ Supporting upper part

37‧‧‧支承具 37‧‧‧support

37a‧‧‧支承具之下部 37a‧‧‧Under the support

40‧‧‧下平台 40‧‧‧Lower platform

40a‧‧‧氣體噴出孔 40a‧‧‧ gas ejection hole

41‧‧‧樹脂層 41‧‧‧ resin layer

42‧‧‧下平台本體 42‧‧‧ platform ontology

43‧‧‧間隔件 43‧‧‧ spacers

44‧‧‧升降板 44‧‧‧ lifting plate

45‧‧‧導引件 45‧‧‧Guide

46‧‧‧伸縮缸 46‧‧‧ Telescopic cylinder

47‧‧‧缸本體 47‧‧‧ cylinder body

48‧‧‧桿 48‧‧‧ rod

49‧‧‧頂起銷 49‧‧‧Top pin

50‧‧‧旋轉輥 50‧‧‧Rotating roller

55‧‧‧支持輥 55‧‧‧Support roller

56‧‧‧軸部 56‧‧‧Axis

57‧‧‧軸支持部 57‧‧‧Axis Support Department

60‧‧‧推壓缸(推壓部) 60‧‧‧Pushing cylinder (pushing part)

61‧‧‧推壓缸本體 61‧‧‧Pushing cylinder body

62‧‧‧桿 62‧‧‧ pole

63‧‧‧支持框架 63‧‧‧Support framework

64‧‧‧導引件 64‧‧‧Guide

70‧‧‧移動機構 70‧‧‧Mobile agencies

71‧‧‧驅動部 71‧‧‧ Drive Department

72‧‧‧移動用馬達 72‧‧‧Moving motor

73‧‧‧滾珠螺桿 73‧‧‧Ball screw

74‧‧‧馬達本體部 74‧‧‧Motor body

75‧‧‧編碼器部 75‧‧‧Encoder Department

80‧‧‧限制部 80‧‧‧Restrictions

81‧‧‧夾緊缸 81‧‧‧Clamping cylinder

82‧‧‧缸本體 82‧‧‧ cylinder body

83‧‧‧軸部 83‧‧‧Axis

84‧‧‧臂 84‧‧‧ Arm

90‧‧‧控制部 90‧‧‧Control Department

Fr‧‧‧框架 Fr‧‧ frame

G‧‧‧間隔 G‧‧‧ interval

Gd‧‧‧導軌 Gd‧‧‧rail

GS‧‧‧氣體供給源 GS‧‧‧ gas supply source

IS‧‧‧位置感測器 IS‧‧‧ position sensor

L‧‧‧距離 L‧‧‧ distance

Sb‧‧‧滑動底座 Sb‧‧‧ sliding base

W‧‧‧間隔 W‧‧‧ interval

圖1係表示利用本發明之一實施形態之黏合裝置製造之積層板之剖面圖。 BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a cross-sectional view showing a laminated board manufactured by an adhesive apparatus according to an embodiment of the present invention.

圖2係表示使用積層板製造之電子器件之剖面圖。 Fig. 2 is a cross-sectional view showing an electronic device manufactured using a laminate.

圖3係表示本發明之一實施形態之黏合裝置之圖4之III-III剖面圖。 Fig. 3 is a sectional view taken along line III-III of Fig. 4 showing an adhesive apparatus according to an embodiment of the present invention.

圖4係圖3之IV-IV剖面圖。 Figure 4 is a cross-sectional view taken along line IV-IV of Figure 3.

圖5係圖3之V-V剖面圖。 Figure 5 is a cross-sectional view taken along line V-V of Figure 3.

圖6係表示本發明之一實施形態之黏合裝置之搬送機構之動作的圖7的VI-VI剖面圖。 Fig. 6 is a sectional view taken along line VI-VI of Fig. 7 showing the operation of the conveying mechanism of the bonding apparatus according to the embodiment of the present invention.

圖7係圖6之VII-VII剖面圖。 Figure 7 is a cross-sectional view taken along line VII-VII of Figure 6.

圖8係圖6之VIII-VIII剖面圖。 Figure 8 is a cross-sectional view taken along line VIII-VIII of Figure 6.

圖9係表示一實施形態之黏合裝置之動作之圖(1)。 Fig. 9 is a view (1) showing the operation of the bonding apparatus of the embodiment.

圖10係表示一實施形態之黏合裝置之動作之圖(2)。 Fig. 10 is a view (2) showing the operation of the bonding apparatus of the embodiment.

圖11係表示第1變形例之黏合裝置之動作之圖。 Fig. 11 is a view showing the operation of the bonding apparatus of the first modification.

圖12係表示第2變形例之黏合裝置之動作之圖。 Fig. 12 is a view showing the operation of the bonding apparatus of the second modification.

圖13係表示第3變形例之黏合裝置之動作之圖(1)。 Fig. 13 is a view (1) showing the operation of the bonding apparatus according to the third modification.

圖14係表示第3變形例之黏合裝置之動作之圖(2)。 Fig. 14 is a view (2) showing the operation of the bonding apparatus according to the third modification.

以下,參照圖式對用以實施本發明之形態進行說明。於各圖式中,對相同或對應之構成標附相同或對應之符號,並省略說明。 Hereinafter, embodiments for carrying out the invention will be described with reference to the drawings. In the drawings, the same or corresponding reference numerals are attached to the same or corresponding components, and the description is omitted.

本實施形態之黏合裝置係為了應對電子器件中使用之基板之薄板化而將基板與增強板黏合。於利用增強版增強之基板上形成功能層後,將基板與增強板剝離,而製造包含基板與功能層之電子器件。增強板並非為電子器件之一部分。 The bonding apparatus of the present embodiment bonds the substrate to the reinforcing plate in order to cope with the thinning of the substrate used in the electronic device. After the functional layer is formed on the substrate reinforced with the enhanced version, the substrate and the reinforcing plate are peeled off, and an electronic device including the substrate and the functional layer is fabricated. The stiffener is not part of the electronics.

此處,所謂電子器件,係指顯示面板、太陽電池、薄膜二次電池等電子零件。顯示面板包含液晶面板(LCD,Liquid Crystal Display,液晶顯示器)或電漿面板(PDP,Plasma Display Panel,電漿顯示器面板)、有機EL(Electro Luminescence,電致發光)面板(OLED(Organic Light Emitting Diode,有機發光二極體))。 Here, the electronic device refers to an electronic component such as a display panel, a solar cell, or a thin film secondary battery. The display panel includes a liquid crystal panel (LCD) or a plasma panel (PDP, Plasma Display Panel), and an organic EL (Electro Luminescence) panel (OLED (Organic Light Emitting Diode). , organic light-emitting diode)).

(積層板) (Laminated board)

圖1係表示利用本發明之一實施形態之黏合裝置製造之積層板之剖面圖。積層板1包含基板2、及增強基板2之增強板3。 BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a cross-sectional view showing a laminated board manufactured by an adhesive apparatus according to an embodiment of the present invention. The laminate 1 includes a substrate 2 and a reinforcing plate 3 of the reinforcing substrate 2.

(基板) (substrate)

於基板2上,於電子器件之製造步驟中途形成有特定之功能層(例如,導電層)。 On the substrate 2, a specific functional layer (for example, a conductive layer) is formed in the middle of the manufacturing process of the electronic device.

基板2例如為玻璃基板、陶瓷基板、樹脂基板、金屬基板、或半導體基板等。於該等中,玻璃基板之耐化學品性、耐透濕性優異,且線膨脹係數較小,故而較佳。線膨脹係數變得越小,則於高溫下形成之功能層之圖案於冷卻時越難以偏移。 The substrate 2 is, for example, a glass substrate, a ceramic substrate, a resin substrate, a metal substrate, or a semiconductor substrate. Among these, the glass substrate is excellent in chemical resistance and moisture permeability resistance, and has a small coefficient of linear expansion. The smaller the coefficient of linear expansion becomes, the more difficult it is to shift the pattern of the functional layer formed at a high temperature during cooling.

玻璃基板之玻璃並無特別限定,例如可列舉無鹼玻璃、硼矽酸玻璃、鈉鈣玻璃、高二氧化矽玻璃、其他以氧化矽為主成分之氧化物系玻璃等。作為氧化物系玻璃,較佳為藉由氧化物換算而得之氧化矽之含量為40~90質量%之玻璃。 The glass of the glass substrate is not particularly limited, and examples thereof include alkali-free glass, borosilicate glass, soda lime glass, high cerium oxide glass, and other oxide-based glass containing cerium oxide as a main component. The oxide-based glass is preferably a glass having a content of cerium oxide of 40 to 90% by mass in terms of oxide.

作為玻璃基板之玻璃,較佳為採用適於電子器件之種類或其製造步驟之玻璃。例如,液晶面板用玻璃基板較佳為包含實質上不含有鹼金屬成分之玻璃(無鹼玻璃)。如此,玻璃基板之玻璃根據所應用之 電子器件之種類及其製造步驟而適當選擇。 As the glass of the glass substrate, it is preferable to use a glass suitable for the kind of the electronic device or the manufacturing steps thereof. For example, the glass substrate for liquid crystal panels preferably contains glass (alkali-free glass) which does not substantially contain an alkali metal component. Thus, the glass of the glass substrate is applied according to The type of electronic device and its manufacturing steps are appropriately selected.

樹脂基板之樹脂並無特別限定,既可為晶質樹脂,亦可為非晶質樹脂。 The resin of the resin substrate is not particularly limited, and may be a crystalline resin or an amorphous resin.

作為晶質樹脂,例如可列舉:作為熱塑性樹脂之聚醯胺、聚縮醛、聚對苯二甲酸丁二酯、聚對苯二甲酸乙二酯、聚萘二甲酸乙二酯、或間規聚苯乙烯等,就熱硬化性樹脂而言,可列舉:聚苯硫醚、聚醚醚酮、液晶聚合物、氟樹脂、或聚醚腈等。 Examples of the crystalline resin include polyamine, thermoplastic acetal, polybutylene terephthalate, polyethylene terephthalate, polyethylene naphthalate, or a syndiometer as a thermoplastic resin. Examples of the thermosetting resin such as polystyrene include polyphenylene sulfide, polyether ether ketone, liquid crystal polymer, fluororesin, or polyether nitrile.

作為非晶質樹脂,例如可列舉:作為熱塑性樹脂之聚碳酸酯、改性聚苯醚、聚環己烯、或聚降烯系樹脂等,就熱硬化性樹脂而言,可列舉:聚碸、聚醚碸、聚芳酯、聚醯胺醯亞胺、聚醚醯亞胺、或熱塑性聚醯亞胺。 Examples of the amorphous resin include polycarbonate as a thermoplastic resin, modified polyphenylene ether, polycyclohexene, or polycondensate. Examples of the thermosetting resin such as an olefin-based resin include polyfluorene, polyether oxime, polyarylate, polyamidoximine, polyether quinone, or thermoplastic polyimide.

作為樹脂基板之樹脂,尤佳為非晶質且熱塑性之樹脂。 As the resin of the resin substrate, an amorphous and thermoplastic resin is particularly preferable.

基板2之厚度係根據基板2之種類而設定。例如,於玻璃基板之情形時,就電子器件之輕量化、薄板化而言,較佳為0.7 mm以下,更佳為0.3 mm以下,進而較佳為0.1 mm以下。於0.3 mm以下之情形時,可對玻璃基板賦予良好之柔性。於0.1 mm以下之情形時,可將玻璃基板捲取成輥狀。又,就容易製造玻璃基板、及容易操作玻璃基板等理由而言,玻璃基板之厚度較佳為0.03 mm以上。 The thickness of the substrate 2 is set according to the type of the substrate 2. For example, in the case of a glass substrate, the weight and thickness of the electronic device are preferably 0.7 mm or less, more preferably 0.3 mm or less, and still more preferably 0.1 mm or less. When it is 0.3 mm or less, it can impart good flexibility to the glass substrate. When the thickness is 0.1 mm or less, the glass substrate can be wound into a roll shape. Moreover, the thickness of the glass substrate is preferably 0.03 mm or more for the reason that the glass substrate is easily produced and the glass substrate is easily handled.

(增強板) (enhancement board)

若增強板3與基板2密接,則於進行剝離操作之前增強基板2。增強板3於功能層之形成後,於電子器件之製造步驟中途自基板2剝離,並非為電子器件之一部分。 When the reinforcing plate 3 is in close contact with the substrate 2, the substrate 2 is reinforced before the peeling operation. After the formation of the functional layer, the reinforcing plate 3 is peeled off from the substrate 2 in the middle of the manufacturing process of the electronic device, and is not part of the electronic device.

就抑制溫度變化所致之翹曲或剝離而言,增強板3較佳為與基板2之線膨脹係數差之絕對值較小者。於基板2為玻璃基板之情形時,增強板3較佳為包含玻璃板者。該玻璃板之玻璃較佳為與玻璃基板之玻璃相同之種類。 The reinforcing plate 3 preferably has a smaller absolute value of the difference in linear expansion coefficient from the substrate 2 in terms of suppressing warpage or peeling due to temperature change. In the case where the substrate 2 is a glass substrate, the reinforcing plate 3 preferably includes a glass plate. The glass of the glass plate is preferably of the same type as the glass of the glass substrate.

增強板3包括支持板4、及形成於支持板4上之樹脂層5。藉由於樹脂層5與基板2之間作用凡得瓦(Van Der Waals)力等而使樹脂層5與基板2可剝離地結合。 The reinforcing plate 3 includes a supporting plate 4 and a resin layer 5 formed on the supporting plate 4. The resin layer 5 and the substrate 2 are releasably bonded by the action of a Van Der Waals force or the like between the resin layer 5 and the substrate 2.

再者,本實施形態之增強板3包含支持板4與樹脂層5,但亦可由支持板4構成。藉由於支持板4與基板2之間作用之凡得瓦力等而使支持板4與基板2可剝離地結合。為了避免作為支持板4之玻璃板、與作為基板2之玻璃基板以高溫接著,亦可於支持板4之表面形成無機薄膜。又,亦可藉由於支持板4之表面設置表面粗糙度不同之區域等而於支持板4與基板2之界面設置結合力不同之區域。 Further, the reinforcing plate 3 of the present embodiment includes the support plate 4 and the resin layer 5, but may be constituted by the support plate 4. The support plate 4 and the substrate 2 are detachably bonded by the van der Waals force or the like acting between the support plate 4 and the substrate 2. In order to avoid the glass plate as the support plate 4 and the glass substrate as the substrate 2 to be heated at a high temperature, an inorganic thin film may be formed on the surface of the support plate 4. Further, an area where the bonding strength is different may be provided at the interface between the support plate 4 and the substrate 2 by providing a region having a different surface roughness or the like on the surface of the support plate 4.

又,本實施形態之增強板3包含支持板4與樹脂層5,支持板4亦可為複數個。同樣地,樹脂層5亦可為複數層。 Further, the reinforcing plate 3 of the present embodiment includes the support plate 4 and the resin layer 5, and the support plate 4 may be plural. Similarly, the resin layer 5 may also be a plurality of layers.

(支持板) (support board)

支持板4係介隔樹脂層5而支持並增強基板2。支持板4係防止電子器件之製造步驟中之基板2之變形、附損傷、破損等。 The support plate 4 supports and reinforces the substrate 2 by interposing the resin layer 5. The support board 4 prevents deformation, damage, breakage, and the like of the substrate 2 in the manufacturing steps of the electronic device.

支持板4例如為玻璃板、陶瓷板、樹脂板、半導體板、或金屬板等。支持板4之種類係根據電子器件之種類或基板2之種類等而選定。若支持板4與基板2為相同種類,則會減少溫度變化所致之翹曲或剝離。 The support plate 4 is, for example, a glass plate, a ceramic plate, a resin plate, a semiconductor plate, or a metal plate. The type of the support board 4 is selected depending on the type of the electronic device, the type of the substrate 2, and the like. If the support plate 4 and the substrate 2 are of the same type, warpage or peeling due to temperature change is reduced.

支持板4與基板2之平均線膨脹係數之差(絕對值)係根據基板2之尺寸形狀等而適當設定,例如較佳為35×10-7/℃以下。此處,所謂「平均線膨脹係數」,係指50~300℃之溫度範圍內之平均線膨脹係數(JIS(Japanese Industrial Standards,日本工業標準)R3102)。 The difference (absolute value) between the average linear expansion coefficients of the support plate 4 and the substrate 2 is appropriately set depending on the size and shape of the substrate 2, and is preferably, for example, 35 × 10 -7 / ° C or less. Here, the "average linear expansion coefficient" means an average linear expansion coefficient (JIS (Japanese Industrial Standards) R3102) in a temperature range of 50 to 300 °C.

支持板4之厚度為例如0.7 mm以下。又,就增強基板2而言,支持板4之厚度較佳為0.4 mm以上。支持板4之厚度既可較基板2厚,亦可較其薄。 The thickness of the support plate 4 is, for example, 0.7 mm or less. Further, in the case of the reinforcing substrate 2, the thickness of the support plate 4 is preferably 0.4 mm or more. The thickness of the support plate 4 can be thicker than the substrate 2 or thinner.

支持板4之外形較佳為如圖1所示般與樹脂層5之外形相同, 或較樹脂層5之外形大以使支持板4可支持樹脂層5之整體。 The shape of the support plate 4 is preferably the same as that of the resin layer 5 as shown in FIG. Or larger than the resin layer 5, the support plate 4 can support the entirety of the resin layer 5.

(樹脂層) (resin layer)

若樹脂層5與基板2密接,則於進行剝離操作之前防止基板2之位置偏移。樹脂層5藉由剝離操作而自基板2容易剝離。因容易剝離基板2而可防止基板2之破損,又,可防止預料外之位置(樹脂層5與支持板4之間)之剝離。 When the resin layer 5 is in close contact with the substrate 2, the positional deviation of the substrate 2 is prevented before the peeling operation. The resin layer 5 is easily peeled off from the substrate 2 by a peeling operation. Since the substrate 2 is easily peeled off, the substrate 2 can be prevented from being damaged, and the peeling of the unexpected position (between the resin layer 5 and the support plate 4) can be prevented.

樹脂層5形成為與支持板4之結合力較與基板2之結合力而言相對較高。藉此,於進行剝離操作時,可防止積層板1於預料外之位置(樹脂層5與支持板4之間)剝離。 The resin layer 5 is formed such that the bonding force with the support plate 4 is relatively higher than the bonding force with the substrate 2. Thereby, when the peeling operation is performed, it is possible to prevent the laminated board 1 from being peeled off at an unexpected position (between the resin layer 5 and the support sheet 4).

樹脂層5之樹脂並無特別限定。例如,作為樹脂層5之樹脂,可列舉:丙烯酸系樹脂、聚烯烴樹脂、聚胺基甲酸酯樹脂、聚醯亞胺樹脂、矽酮樹脂、聚醯亞胺矽酮樹脂等。亦可混合使用若干種樹脂。其中,基於耐熱性或剝離性之觀點,較佳為矽酮樹脂、聚醯亞胺矽酮樹脂。 The resin of the resin layer 5 is not particularly limited. For example, examples of the resin of the resin layer 5 include an acrylic resin, a polyolefin resin, a polyurethane resin, a polyimide resin, an anthrone resin, and a polyacrylonitrile resin. Several kinds of resins can also be used in combination. Among them, an anthrone resin and a polyamidoxime resin are preferred from the viewpoint of heat resistance or peelability.

樹脂層5之厚度並無特別限定,但較佳為1~50 μm,更佳為4~20 μm。藉由將樹脂層5之厚度設為1 μm以上,而於在樹脂層5與基板2之間混入氣泡或異物之情形時,可使樹脂層5以吸收氣泡或異物之厚度之方式變形。另一方面,若樹脂層5之厚度為50 μm以下,則可縮短樹脂層5之形成時間,進而不會過度使用樹脂層5之樹脂,故而較為經濟。 The thickness of the resin layer 5 is not particularly limited, but is preferably 1 to 50 μm, more preferably 4 to 20 μm. When the thickness of the resin layer 5 is 1 μm or more, when bubbles or foreign matters are mixed between the resin layer 5 and the substrate 2, the resin layer 5 can be deformed so as to absorb the thickness of bubbles or foreign matter. On the other hand, when the thickness of the resin layer 5 is 50 μm or less, the formation time of the resin layer 5 can be shortened, and the resin of the resin layer 5 can be prevented from being excessively used, which is economical.

樹脂層5之外形較佳為如圖1所示般與基板2之外形相同,或較基板2之外形大以使樹脂層5可密接基板2之整體。 The outer shape of the resin layer 5 is preferably the same as that of the substrate 2 as shown in FIG. 1, or larger than the outer surface of the substrate 2 so that the resin layer 5 can be closely adhered to the entirety of the substrate 2.

再者,樹脂層5亦可包含2層以上。於此情形時,「樹脂層之厚度」係指所有樹脂層之合計之厚度。 Further, the resin layer 5 may also contain two or more layers. In this case, the "thickness of the resin layer" means the total thickness of all the resin layers.

又,於樹脂層5包含2層以上之情形時,形成各層之樹脂之種類亦可不同。 Moreover, when the resin layer 5 contains two or more layers, the kind of the resin which forms each layer may differ.

(積層體) (layered body)

圖2係表示使用積層板製造之積層體之剖面圖。 Fig. 2 is a cross-sectional view showing a laminate produced by using a laminate.

積層體6係於積層板1之基板2上形成導電層等功能層而成。功能層之種類係根據電子器件之種類而選擇。亦可將複數層功能層依序積層於基板2上。作為功能層之形成方法,係使用一般方法,例如使用CVD(Chemical Vapor Deposition,化學氣相沈積)法或PVD(Physical Vapor Deposition,物理氣相沈積)法等蒸鍍法、濺鍍法等。功能層係利用光微影法或蝕刻法形成為特定之圖案。 The laminated body 6 is formed by forming a functional layer such as a conductive layer on the substrate 2 of the laminated board 1. The type of functional layer is selected according to the type of electronic device. A plurality of functional layers may be sequentially laminated on the substrate 2. As a method of forming the functional layer, a general method, for example, a vapor deposition method such as a CVD (Chemical Vapor Deposition) method or a PVD (Physical Vapor Deposition) method, a sputtering method, or the like is used. The functional layer is formed into a specific pattern by photolithography or etching.

例如,積層體6依序包括包含支持板4A及樹脂層5A之增強板3A、基板2A、液晶層7、基板2B、及包含支持板4B及樹脂層5B之增強板3B。該積層體6係於LCD之製造步驟中途製作者。於一基板2A上之液晶層7側之面形成有未圖示之薄膜電晶體(TFT,Thin Film Transistor),於另一基板2B上之液晶層7側之面形成有未圖示之彩色濾光片(CF,Color Filter)。 For example, the laminated body 6 sequentially includes the reinforcing plate 3A including the supporting plate 4A and the resin layer 5A, the substrate 2A, the liquid crystal layer 7, the substrate 2B, and the reinforcing plate 3B including the supporting plate 4B and the resin layer 5B. The laminated body 6 is produced by a maker in the middle of the manufacturing process of the LCD. A thin film transistor (TFT) (not shown) is formed on the surface of the substrate 2A on the liquid crystal layer 7 side, and a color filter (not shown) is formed on the surface of the other substrate 2B on the liquid crystal layer 7 side. Light film (CF, Color Filter).

於將增強板3A、3B剝離後,安裝偏光板、背光裝置等,而可獲得作為製品之LCD。於增強板3A、3B之剝離時,使用下述之剝離裝置。 After the reinforcing plates 3A and 3B are peeled off, a polarizing plate, a backlight, and the like are mounted, and an LCD as a product can be obtained. When the reinforcing sheets 3A and 3B are peeled off, the following peeling device is used.

再者,於本實施形態中,增強板3A、3B之剝離係於液晶層7之形成後進行,但亦可於TFT或CF之形成後、液晶層7之形成前進行。 Further, in the present embodiment, the peeling of the reinforcing plates 3A and 3B is performed after the formation of the liquid crystal layer 7, but it may be performed after the formation of the TFT or CF and before the formation of the liquid crystal layer 7.

(黏合裝置) (adhesive device)

圖3係表示本發明之一實施形態之黏合裝置之圖4之III-III剖面圖。圖4係圖3之IV-IV剖面圖,圖5係圖3之V-V剖面圖。圖6係表示本發明之一實施形態之黏合裝置之搬送機構之動作的圖7的VI-VI剖面圖。圖7係圖6之VII-VII剖面圖,圖8係圖6之VIII-VIII剖面圖。圖9~圖10係表示一實施形態之黏合裝置之動作(黏合方法) 之圖。再者,於圖3~圖12中,為了易於觀察圖式,省略增強板3所包含之樹脂層5之圖式。又,於圖3、圖4、圖6、圖7、及圖9~圖12中,方便起見,省略限制部80之圖式。又,由於下述之各種缸本體之內部構造為一般者,故而省略圖式。 Fig. 3 is a sectional view taken along line III-III of Fig. 4 showing an adhesive apparatus according to an embodiment of the present invention. 4 is a cross-sectional view taken along line IV-IV of FIG. 3, and FIG. 5 is a cross-sectional view taken along line V-V of FIG. 3. Fig. 6 is a sectional view taken along line VI-VI of Fig. 7 showing the operation of the conveying mechanism of the bonding apparatus according to the embodiment of the present invention. Figure 7 is a cross-sectional view taken along line VII-VII of Figure 6, and Figure 8 is a cross-sectional view taken along line VIII-VIII of Figure 6. 9 to 10 show the operation of the bonding apparatus of one embodiment (bonding method) Picture. In addition, in FIGS. 3 to 12, in order to facilitate the observation of the drawings, the pattern of the resin layer 5 included in the reinforcing plate 3 is omitted. Further, in FIGS. 3, 4, 6, 7, and 9 to 12, the illustration of the restricting portion 80 is omitted for the sake of convenience. Moreover, since the internal structure of each of the cylinder bodies described below is a general one, the drawings are omitted.

如圖3~圖5所示,黏合裝置10係將作為板狀構件之基板2、與作為可撓性板之增強板3黏合之裝置。黏合裝置10包括:上平台20,其係吸附基板2;及下平台40,其係配置於上平台20之下方,且載置增強板3。再者,基板2與增強板3之配置亦可相反,亦可將基板2載置於下平台40,由上平台20吸附增強板3。 As shown in FIGS. 3 to 5, the bonding apparatus 10 is a device in which a substrate 2 as a plate member is bonded to a reinforcing plate 3 as a flexible plate. The bonding device 10 includes an upper platform 20 that adsorbs the substrate 2, and a lower platform 40 that is disposed below the upper platform 20 and that houses the reinforcing plate 3. Furthermore, the arrangement of the substrate 2 and the reinforcing plate 3 may be reversed, and the substrate 2 may be placed on the lower stage 40, and the reinforcing plate 3 may be adsorbed by the upper stage 20.

如圖6~圖9所示,黏合裝置10包括對於上平台20及下平台40傳送基板2及增強板3之搬送機構11。搬送機構11包含基板2或保持增強板3之保持構件12。如圖7所示,保持構件12包含於水平方向上空出間隔排列之複數個臂13、及設置於各臂13之複數個吸附墊14。 As shown in FIGS. 6 to 9, the bonding apparatus 10 includes a transport mechanism 11 that transports the substrate 2 and the reinforcing plate 3 to the upper platform 20 and the lower platform 40. The conveying mechanism 11 includes a substrate 2 or a holding member 12 that holds the reinforcing plate 3. As shown in FIG. 7, the holding member 12 includes a plurality of arms 13 arranged at intervals in the horizontal direction, and a plurality of adsorption pads 14 provided on the respective arms 13.

如圖9及圖10所示,黏合裝置10包括:旋轉輥50,其係與由下平台40支持之增強板3之下表面接觸,且使增強板3因自身重量而撓曲變形;及作為推壓部之推壓缸60,其係將藉由旋轉輥50而撓曲變形之增強板3擠壓於由上平台20吸附之基板2。推壓缸60包含推壓缸本體61、自推壓缸本體61可伸縮地突出之桿62。於桿62之前端固定有支持框架63,該支持框架63係使旋轉輥50以旋轉輥50之中心軸為中心旋轉自由地支持。 As shown in FIG. 9 and FIG. 10, the bonding apparatus 10 includes: a rotating roller 50 which is in contact with the lower surface of the reinforcing plate 3 supported by the lower platform 40, and causes the reinforcing plate 3 to flex and deform due to its own weight; The pressing cylinder 60 of the pressing portion presses the reinforcing plate 3 which is flexibly deformed by the rotating roller 50 against the substrate 2 adsorbed by the upper stage 20. The urging cylinder 60 includes a urging cylinder body 61 and a rod 62 that telescopically protrudes from the urging cylinder body 61. A support frame 63 is fixed to the front end of the rod 62, and the support frame 63 is rotatably supported by the rotating roller 50 around the central axis of the rotating roller 50.

如圖3及圖6所示,黏合裝置10包括使旋轉輥50及推壓缸60對於上平台20相對移動之移動機構70。移動機構70包含可沿著敷設於框架Fr上之2條導軌Gd、及導軌Gd移動之滑動底座Sb;及驅動滑動底座(slide base)Sb之驅動部71(參照圖3)。驅動部71包含例如對於框架Fr固定之移動用馬達72、及將移動用馬達72之旋轉運 動轉換成直線運動並傳達至滑動底座Sb之滾珠螺桿73等。於滑動底座Sb上固定有推壓缸60。移動用馬達72亦可為伺服馬達,且包含馬達本體部74、及檢測馬達本體部74之旋轉量及旋轉方向之編碼器部75。若移動用馬達72旋轉,則滑動底座Sb於導軌Gd之長度方向(於圖3、圖6、圖9、圖10中為左右方向)上移動,推壓缸60及旋轉輥50對於上平台20相對移動。移動用馬達72係以推壓缸60等之對於上平台20之相對位置成為目標位置之方式根據編碼器部75之檢測結果進行反饋控制。 As shown in FIGS. 3 and 6, the bonding apparatus 10 includes a moving mechanism 70 that relatively moves the rotating roller 50 and the pressing cylinder 60 with respect to the upper stage 20. The moving mechanism 70 includes a sliding base Sb that is movable along two rails Gd and rails Gd that are laid on the frame Fr, and a driving unit 71 that drives a slide base Sb (see FIG. 3). The driving unit 71 includes, for example, a moving motor 72 fixed to the frame Fr and a rotating motor 72. The ball is converted into a linear motion and transmitted to the ball screw 73 of the sliding base Sb and the like. A pressing cylinder 60 is fixed to the sliding base Sb. The moving motor 72 may be a servo motor, and includes a motor main body portion 74 and an encoder portion 75 that detects the amount of rotation and the direction of rotation of the motor main portion 74. When the moving motor 72 rotates, the slide base Sb moves in the longitudinal direction of the guide rail Gd (the horizontal direction in FIGS. 3, 6, 9, and 10), and the pressing cylinder 60 and the rotating roller 50 are aligned with the upper platform 20. Relative movement. The moving motor 72 performs feedback control based on the detection result of the encoder unit 75 such that the relative position of the pressing cylinder 60 or the like to the upper stage 20 becomes the target position.

如圖3等所示,上平台20吸附並自上方支持基板2。上平台20包含吸附基板2之吸附板21、形成有使貫通形成於吸附板21之複數個吸附孔22連通之槽23之主框架24、及增強主框架24之增強構件26。形成於主框架24之槽23與真空泵等吸氣源連接。若吸氣源動作,則吸附孔22內減壓,而將基板2固定於上平台20。主框架24支持複數個缸25。各缸25包含固定於主框架24之缸本體27、及自缸本體27可伸縮地突出之桿28。與複數個桿28對應之複數個桿孔貫通形成於吸附板21及主框架24。缸25亦可固定於增強構件26。 As shown in FIG. 3 and the like, the upper stage 20 adsorbs and supports the substrate 2 from above. The upper stage 20 includes an adsorption plate 21 that adsorbs the substrate 2, a main frame 24 that forms a groove 23 that penetrates a plurality of adsorption holes 22 formed in the adsorption plate 21, and a reinforcing member 26 that reinforces the main frame 24. The groove 23 formed in the main frame 24 is connected to an intake source such as a vacuum pump. When the intake source is operated, the inside of the adsorption hole 22 is decompressed, and the substrate 2 is fixed to the upper stage 20. The main frame 24 supports a plurality of cylinders 25. Each of the cylinders 25 includes a cylinder body 27 fixed to the main frame 24 and a rod 28 that telescopically protrudes from the cylinder body 27. A plurality of rod holes corresponding to the plurality of rods 28 are formed through the adsorption plate 21 and the main frame 24. The cylinder 25 can also be fixed to the reinforcing member 26.

如圖4及圖7所示,上平台20與切換機構30連接,該切換機構30係使上平台20反轉,而將上平台20之吸附基板2之吸附面之朝向切換成朝上、及朝下。切換機構30包含可旋轉地支持上平台20之複數個(例如2個)上平台支持構件31、及使複數個上平台支持構件31升降之升降機構32。於一上平台支持構件31設置有使上平台20旋轉之旋轉用馬達33。升降機構32包含與複數個上平台支持構件31連結之複數個升降桿34、及使複數個升降桿34升降之升降用馬達35等。上平台20藉由升降機構32而可對於框架Fr上下移動。 As shown in FIG. 4 and FIG. 7 , the upper platform 20 is connected to the switching mechanism 30. The switching mechanism 30 reverses the upper platform 20 and switches the orientation of the adsorption surface of the adsorption substrate 2 of the upper platform 20 upward. Down. The switching mechanism 30 includes a plurality of (for example, two) upper platform supporting members 31 that rotatably support the upper platform 20, and an elevating mechanism 32 that elevates and lowers the plurality of upper platform supporting members 31. The upper platform support member 31 is provided with a rotation motor 33 that rotates the upper platform 20. The elevating mechanism 32 includes a plurality of elevating rods 34 coupled to a plurality of upper platform supporting members 31, and a lifting motor 35 for lifting and lowering the plurality of lifting rods 34. The upper platform 20 is movable up and down with respect to the frame Fr by the elevating mechanism 32.

上平台20於自搬送機構11收取基板2時,如圖7所示般藉由升降機構32上升至特定位置後,藉由旋轉用馬達33反轉,而使上平台 20之吸附面變成水平朝上。於吸附面之上方搬送由保持構件12保持之基板2,解除各保持構件12之吸附墊14之吸附。複數個缸25之桿28伸長並自上平台20之吸附面突出,而自保持構件12提昇基板2。其次,自形成於基板2與上平台20之間之間隙拉抽保持構件12。其後,複數個缸25之桿28縮短並沒入吸附面,而將基板2載置於吸附面上,由上平台20吸附基板2。繼而,旋轉用馬達33使上平台20反轉,而使上平台20之吸附面變成水平朝下。最後,升降機構32使上平台20下降至特定位置。於本實施形態中,由於在上平台20之吸附面上載置基板2,平坦地支持基板2後,吸附基板2,故而可防止基板2之變形,可減少積層板1之殘留應力。又,由於保持構件12不與基板2之與增強板3接觸之側之面接觸,故而於在保持構件12上有塵埃等異物之情形時,可防止異物進入基板2與增強板3之間。 When the upper platform 20 picks up the substrate 2 from the transport mechanism 11, as shown in FIG. 7, the lift mechanism 32 is raised to a specific position, and then rotated by the rotation motor 33 to make the upper platform The adsorption surface of 20 becomes horizontally upward. The substrate 2 held by the holding member 12 is conveyed above the adsorption surface, and the adsorption of the adsorption pads 14 of the respective holding members 12 is released. The rods 28 of the plurality of cylinders 25 are elongated and protrude from the suction surface of the upper stage 20, and the substrate 2 is lifted from the holding member 12. Next, the holding member 12 is drawn from the gap formed between the substrate 2 and the upper stage 20. Thereafter, the rods 28 of the plurality of cylinders 25 are shortened and immersed in the adsorption surface, and the substrate 2 is placed on the adsorption surface, and the substrate 2 is adsorbed by the upper stage 20. Then, the rotation motor 33 reverses the upper stage 20 so that the adsorption surface of the upper stage 20 becomes horizontally downward. Finally, the lifting mechanism 32 lowers the upper platform 20 to a specific position. In the present embodiment, since the substrate 2 is placed on the adsorption surface of the upper stage 20 and the substrate 2 is supported flatly, the substrate 2 is adsorbed, so that the deformation of the substrate 2 can be prevented, and the residual stress of the laminated plate 1 can be reduced. Further, since the holding member 12 is not in contact with the surface of the substrate 2 on the side in contact with the reinforcing plate 3, when foreign matter such as dust is present on the holding member 12, foreign matter can be prevented from entering between the substrate 2 and the reinforcing plate 3.

如圖4及圖5所示,黏合裝置10進而包括定位構件15,該定位構件15係定位將基板2與增強板3黏合時之上平台20與下平台40之相對位置。定位構件15例如對於框架Fr固定,且藉由與上平台20之下表面接觸,而定位上平台20與下平台40之相對位置。此時,上平台20之吸附面、與下平台40之載置增強板3之載置面可大致平行。 As shown in FIGS. 4 and 5, the bonding device 10 further includes a positioning member 15 that positions the relative position of the upper platform 20 and the lower platform 40 when the substrate 2 is bonded to the reinforcing plate 3. The positioning member 15 is fixed, for example, to the frame Fr, and is positioned by the upper surface of the upper platform 20 to position the upper platform 20 and the lower platform 40. At this time, the adsorption surface of the upper stage 20 and the placement surface of the lower stage 40 on which the reinforcing plate 3 is placed may be substantially parallel.

定位構件15可於上平台20與下平台40之間隔G(參照圖5)發生變化之方向(於圖4及圖5中為上下方向)上伸縮。定位構件15包含例如對於框架Fr固定之本體部16、及與上平台20之下表面接觸之螺栓17。於本體部16之上表面形成有供螺栓17之軸部18插入之螺栓孔。藉由使插入於該螺栓孔之螺栓17旋轉特定量,而可使螺栓17之頭部19上下移動特定量從而調整接觸於螺栓17之頭部19之上平台20、與下平台40之間之間隔G。間隔G係根據基板2或增強板3 之材質或厚度而設定。例如,間隔G係以由上平台20吸附之基板2、與載置於下平台40之增強板3之間之距離L成為0.5~8 mm之方式設定。上平台20之位置係藉由雷射位移計等位置感測器IS檢測。位置感測器IS可為非接觸式亦可為接觸式。 The positioning member 15 can be expanded and contracted in a direction in which the gap G (see FIG. 5) between the upper platform 20 and the lower stage 40 changes (in the vertical direction in FIGS. 4 and 5). The positioning member 15 includes, for example, a body portion 16 fixed to the frame Fr, and a bolt 17 in contact with the lower surface of the upper platform 20. A bolt hole into which the shaft portion 18 of the bolt 17 is inserted is formed on the upper surface of the body portion 16. By rotating the bolt 17 inserted into the bolt hole by a certain amount, the head portion 19 of the bolt 17 can be moved up and down by a certain amount to adjust the contact between the platform 20 above the head 19 of the bolt 17 and the lower platform 40. Interval G. The spacing G is based on the substrate 2 or the reinforcing plate 3 Set by material or thickness. For example, the gap G is set such that the distance L between the substrate 2 adsorbed by the upper stage 20 and the reinforcing plate 3 placed on the lower stage 40 is 0.5 to 8 mm. The position of the upper platform 20 is detected by a position sensor IS such as a laser displacement meter. The position sensor IS can be either non-contact or contact.

再者,定位構件15只要可於間隔G發生變化之方向上伸縮,則構成可為各種各樣。例如,定位構件15亦可包含旋轉馬達、及使旋轉馬達之旋轉運動變化成直線運動之滾珠螺桿等。旋轉馬達係根據位置感測器IS之檢測結果,以距離L成為特定值之方式藉由控制部90進行反饋控制。 Further, the positioning member 15 may have various configurations as long as it can expand and contract in a direction in which the gap G changes. For example, the positioning member 15 may include a rotary motor and a ball screw that changes the rotational motion of the rotary motor into a linear motion. The rotation motor performs feedback control by the control unit 90 so that the distance L becomes a specific value based on the detection result of the position sensor IS.

下平台40可與旋轉輥50及推壓缸60一併對於上平台20相對移動。下平台40例如對於滑動底座Sb固定,且可於與上平台20之吸附面平行之方向(於圖3、圖6、圖9、圖10中為左右方向)上移動。 The lower platform 40 can move relative to the upper platform 20 together with the rotating roller 50 and the pressing cylinder 60. The lower stage 40 is fixed, for example, to the slide base Sb, and is movable in a direction parallel to the adsorption surface of the upper stage 20 (left-right direction in FIGS. 3, 6, 9, and 10).

下平台40於對於上平台20相對移動時,可滑動地支持增強板3以避免由上平台20吸附之基板2與由下平台40支持之增強板3之位置偏移。為了降低與增強板3之摩擦係數,使下平台40具備下平台本體42、及固定於下平台本體42上之樹脂層41,且於樹脂層41上載置增強板3。由於下平台40之載置面由樹脂形成,故而與由金屬或陶瓷形成之情形相比,可減少下平台40與增強板3之摩擦。樹脂並無特別限定,例如可使用UPE(超高分子聚乙烯:Ultra High Molecular Weight Polyethylene)、ABS(Acrylonitrile Butadiene Styrene,丙烯腈-丁二烯-苯乙烯)樹脂等。樹脂亦可形成為板、膜、或皮膜。 The lower platform 40 slidably supports the reinforcing plate 3 when the relative movement of the upper platform 20 is relatively moved to avoid the positional displacement of the substrate 2 adsorbed by the upper platform 20 and the reinforcing plate 3 supported by the lower platform 40. In order to reduce the friction coefficient with the reinforcing plate 3, the lower stage 40 is provided with the lower stage main body 42 and the resin layer 41 fixed to the lower stage main body 42, and the reinforcing plate 3 is placed on the resin layer 41. Since the mounting surface of the lower stage 40 is formed of a resin, the friction between the lower stage 40 and the reinforcing plate 3 can be reduced as compared with the case of forming a metal or ceramic. The resin is not particularly limited, and for example, UPE (Ultra High Molecular Weight Polyethylene), ABS (Acrylonitrile Butadiene Styrene) resin, or the like can be used. The resin may also be formed into a sheet, a film, or a film.

如圖3及圖6所示,於下平台40(詳細而言為下平台本體42)與滑動底座Sb之間插入有間隔件43。於由間隔件43形成之空間配設有升降板44、上下導引升降板44之導引件45、及驅動升降板44之 伸縮缸46。如圖6所示,伸縮缸46包含固定於滑動底座Sb之缸本體47、及自缸本體47可伸縮地突出之桿48。於桿48之前端固定有升降板44,於升降板44上二維地空出間隔突設有複數個頂起銷49。與複數個頂起銷49對應之複數個銷孔貫通形成於下平台40。 As shown in FIGS. 3 and 6, a spacer 43 is inserted between the lower stage 40 (more specifically, the lower stage body 42) and the slide base Sb. A lifting plate 44, a guiding member 45 for guiding the lifting plate 44 up and down, and a driving lifting plate 44 are disposed in the space formed by the spacer 43. Telescopic cylinder 46. As shown in FIG. 6, the telescopic cylinder 46 includes a cylinder body 47 fixed to the slide base Sb, and a rod 48 projecting telescopically from the cylinder body 47. A lifting plate 44 is fixed to the front end of the rod 48, and a plurality of lifting pins 49 are two-dimensionally spaced apart from the lifting plate 44. A plurality of pin holes corresponding to the plurality of jacking pins 49 are formed through the lower platform 40.

於下平台40自搬送機構11收取增強板3時,如圖6所示般於下平台40之上方搬送由保持構件12保持之增強板3,解除各保持構件12之吸附墊14之吸附。伸縮缸46之桿48伸長,升降板44上升。自下平台40之載置面突出之頂起銷49自保持構件12提昇增強板3。其次,自形成於增強板3與下平台40之間之間隙拉抽保持構件12。其後,伸縮缸46之桿48縮短,升降板44下降。其結果,頂起銷49沒入下平台40之水平載置面,將增強板3載置於下平台40上。 When the lower plate 40 receives the reinforcing plate 3 from the conveying mechanism 11, the reinforcing plate 3 held by the holding member 12 is conveyed above the lower stage 40 as shown in Fig. 6, and the adsorption of the adsorption pad 14 of each holding member 12 is released. The rod 48 of the telescopic cylinder 46 is extended and the lifting plate 44 is raised. The jacking pin 49 projecting from the mounting surface of the lower platform 40 lifts the reinforcing plate 3 from the holding member 12. Next, the holding member 12 is drawn from the gap formed between the reinforcing plate 3 and the lower stage 40. Thereafter, the rod 48 of the telescopic cylinder 46 is shortened, and the lifting plate 44 is lowered. As a result, the jacking pin 49 is not placed on the horizontal loading surface of the lower platform 40, and the reinforcing plate 3 is placed on the lower platform 40.

如圖9及圖10所示,旋轉輥50係與由下平台40支持之增強板3之下表面接觸,使增強板3因自身重量而撓曲變形。為了抑制增強板3之損傷,使旋轉輥50包含例如金屬製之輥本體、及固定於輥本體之外周面之橡膠片材,由橡膠片材與增強板3之下表面接觸。 As shown in FIGS. 9 and 10, the rotating roller 50 is in contact with the lower surface of the reinforcing plate 3 supported by the lower stage 40, so that the reinforcing plate 3 is flexibly deformed by its own weight. In order to suppress the damage of the reinforcing plate 3, the rotating roller 50 includes, for example, a metal roll body and a rubber sheet fixed to the outer peripheral surface of the roll body, and the rubber sheet is in contact with the lower surface of the reinforcing plate 3.

旋轉輥50係以對於滑動底座Sb之移動方向垂直之旋轉軸為中心旋轉自由。旋轉輥50係與增強板3之下表面接觸,且於增強板3之兩側伸出。 The rotating roller 50 is freely rotatable about a rotation axis perpendicular to the moving direction of the slide base Sb. The rotating roller 50 is in contact with the lower surface of the reinforcing plate 3 and protrudes on both sides of the reinforcing plate 3.

如圖9及圖10所示,為了減少旋轉輥50之撓曲,而可於旋轉輥50之下方或斜下方設置支持旋轉輥50之支持輥55。支持輥55係與旋轉輥50之外周面接觸,可與旋轉輥50一併旋轉。 As shown in FIGS. 9 and 10, in order to reduce the deflection of the rotating roller 50, a supporting roller 55 that supports the rotating roller 50 may be provided below or obliquely below the rotating roller 50. The support roller 55 is in contact with the outer peripheral surface of the rotary roller 50, and is rotatable together with the rotary roller 50.

如圖4及圖7所示,支持輥55藉由支持框架63而以支持輥55之中心軸為中心旋轉自由地被支持。支持輥55於與旋轉輥50之旋轉軸平行之方向上空出間隔排列有複數個而形成行。為了減少支持輥55之撓曲,而於支持輥55彼此之間設置有支持各支持輥55之軸部 56之軸支持部57。軸支持部57係固定於支持框架63,且使各支持輥55之軸部56以軸部56之中心軸為中心旋轉自由地支持。再者,軸支持部57亦可使各支持輥55之軸部56不可旋轉地支持,於此情形時,可於各支持輥55之本體部內配設軸承以使各支持輥55之本體部對於軸部56旋轉自由。複數個支持輥55既可為一體旋轉者,亦可為獨立旋轉者。 As shown in FIGS. 4 and 7, the support roller 55 is rotatably supported by the center axis of the support roller 55 by the support frame 63. The support roller 55 is arranged in a plurality of spaces in a direction parallel to the rotation axis of the rotary roller 50 to form a row. In order to reduce the deflection of the support roller 55, a shaft portion supporting each of the support rollers 55 is provided between the support rollers 55 with each other. A shaft support portion 57 of 56. The shaft support portion 57 is fixed to the support frame 63, and the shaft portion 56 of each of the support rollers 55 is rotatably supported around the central axis of the shaft portion 56. Further, the shaft support portion 57 may also support the shaft portion 56 of each of the support rollers 55 in a non-rotatable manner. In this case, bearings may be disposed in the body portion of each of the support rollers 55 so that the body portions of the respective support rollers 55 are The shaft portion 56 is free to rotate. The plurality of support rollers 55 may be either an integral rotator or an independent rotator.

支持輥55於旋轉輥50之移動方向兩側(於圖3、圖6、圖9、圖10中為左右兩側)分別各設置有1行,可自斜下方支持旋轉輥50。可抑制旋轉輥50之向移動方向之預料外之變形。 The support roller 55 is provided with one row on each of both sides in the moving direction of the rotary roller 50 (left and right sides in FIGS. 3, 6, 9, and 10), and the rotary roller 50 can be supported from the obliquely downward direction. The unexpected deformation of the rotating roller 50 in the moving direction can be suppressed.

使旋轉輥50及支持輥55旋轉自由地支持之支持框架63係如圖4所示般可沿著對於滑動底座Sb固定之導引件64上下移動。於支持框架63與滑動底座Sb之間配設將支持框架63上推之推壓缸60。 The support frame 63 that rotatably supports the rotary roller 50 and the support roller 55 is movable up and down along the guide 64 fixed to the slide base Sb as shown in FIG. A pressing cylinder 60 that pushes up the support frame 63 is disposed between the support frame 63 and the slide base Sb.

推壓缸60係將藉由旋轉輥50而撓曲變形之增強板3擠壓並壓接於由上平台20吸附之基板2。包含旋轉輥50及推壓缸60之壓接單元係如圖3所示般配置於2個下平台40之間。 The urging cylinder 60 presses and crimps the reinforcing plate 3 which is flexibly deformed by the rotating roller 50 to the substrate 2 adsorbed by the upper stage 20. The pressure bonding unit including the rotating roller 50 and the pressing cylinder 60 is disposed between the two lower platforms 40 as shown in FIG.

如圖5所示,黏合裝置10可進而包括限制上平台20向上方移動之限制部80以避免因推壓缸60之推壓力而導致上平台20自定位構件15浮升。再者,於上平台20足夠重之情形時,亦可無限制部80。 As shown in FIG. 5, the bonding apparatus 10 may further include a restriction portion 80 that restricts the upward movement of the upper platform 20 to prevent the upper platform 20 from rising from the positioning member 15 due to the urging force of the urging cylinder 60. Furthermore, when the upper platform 20 is sufficiently heavy, the restriction portion 80 may be omitted.

限制部80例如包含將上平台20擠壓於定位構件15之夾緊缸(clamp cylinder)81。夾緊缸81包含對於框架Fr固定之缸本體82、自缸本體82可伸縮地突出之軸部83、及對於軸部83固定之臂84。 The restricting portion 80 includes, for example, a clamp cylinder 81 that presses the upper platform 20 against the positioning member 15. The clamp cylinder 81 includes a cylinder body 82 that is fixed to the frame Fr, a shaft portion 83 that telescopically protrudes from the cylinder body 82, and an arm 84 that is fixed to the shaft portion 83.

若夾緊缸81使上平台20與定位構件15接觸,則使可旋動地被缸本體82支持之軸部83旋動之後,縮短軸部83,利用臂84將上平台20擠壓於定位構件15。 If the clamping cylinder 81 brings the upper platform 20 into contact with the positioning member 15, the shaft portion 83 that is rotatably supported by the cylinder body 82 is rotated, the shaft portion 83 is shortened, and the upper platform 20 is pressed by the arm 84. Member 15.

黏合裝置10進而包括控制黏合裝置10之各種動作之控制部 90。控制部90例如控制搬送機構11、上平台20之缸25、吸氣源、切換機構30、頂起銷49用之伸縮缸46、推壓缸60、移動機構70、限制部80之動作。控制部90以包含CPU(Central Processing Unit,中央處理器)、ROM(Read Only Memory,唯讀記憶體)或RAM(Random Access Memory,隨機存取記憶體)等記憶媒體等之電腦之形式構成。藉由使CPU執行記憶媒體中所記錄之程式,而控制黏合裝置10之各種動作。 The bonding device 10 further includes a control unit that controls various actions of the bonding device 10. 90. The control unit 90 controls, for example, the operation of the transport mechanism 11, the cylinder 25 of the upper platform 20, the intake air source, the switching mechanism 30, the telescopic cylinder 46 for the jacking pin 49, the pressing cylinder 60, the moving mechanism 70, and the restricting portion 80. The control unit 90 is configured to include a computer such as a CPU (Central Processing Unit), a ROM (Read Only Memory), or a RAM (Random Access Memory). The various actions of the bonding apparatus 10 are controlled by causing the CPU to execute the program recorded in the memory medium.

其次,基於圖9~圖10對上述構成之黏合裝置之動作(黏合方法)進行說明。黏合裝置之各種動作係於控制部90之控制下進行。 Next, the operation (adhesion method) of the above-described bonding device will be described based on FIGS. 9 to 10. The various actions of the bonding device are performed under the control of the control unit 90.

如圖9所示,旋轉輥50係於將基板2與增強板3黏合時由推壓缸60向上方上推,而使載置於下平台40之增強板3撓曲變形,而將其自下方擠壓、壓接於由上平台20吸附之基板2。由於將增強板3以撓曲變形之狀態與基板2黏合,故而於基板2與增強板3之間難以夾有氣泡,而可減少積層板1之缺陷。此時,上平台20之吸附面(下表面)、與下平台40之載置面(上表面)成為大致平行。 As shown in FIG. 9, the rotating roller 50 is pushed upward by the pressing cylinder 60 when the substrate 2 and the reinforcing plate 3 are bonded, and the reinforcing plate 3 placed on the lower stage 40 is flexibly deformed, and is self-contained. The substrate 2 adsorbed by the upper platform 20 is pressed and crimped underneath. Since the reinforcing plate 3 is bonded to the substrate 2 in a state of being flexed and deformed, it is difficult to trap air bubbles between the substrate 2 and the reinforcing plate 3, and the defects of the laminated plate 1 can be reduced. At this time, the adsorption surface (lower surface) of the upper stage 20 and the placement surface (upper surface) of the lower stage 40 are substantially parallel.

於此狀態下,如圖10所示,旋轉輥50藉由移動機構70而對於上平台20相對移動,而將基板2與增強板3黏合。旋轉輥50向圖中右方向移動,而將基板2之右半部分與增強板3之右半部分黏合之後,向圖中左方向移動,而將基板2之左半部分與增強板3之左半部分黏合。旋轉輥50係以不使基板2與增強板3之位置偏移之方式一面與增強板3之下表面接觸一面進行旋轉。 In this state, as shown in FIG. 10, the rotating roller 50 is relatively moved to the upper stage 20 by the moving mechanism 70, and the substrate 2 is bonded to the reinforcing plate 3. The rotating roller 50 moves in the right direction in the drawing, and after the right half of the substrate 2 is bonded to the right half of the reinforcing plate 3, it moves to the left in the figure, and the left half of the substrate 2 and the left side of the reinforcing plate 3 Half part bonded. The rotating roller 50 rotates while being in contact with the lower surface of the reinforcing plate 3 so as not to shift the position of the substrate 2 and the reinforcing plate 3.

此時,如圖10所示,可使下平台40與旋轉輥50一併對於上平台20相對移動。由於旋轉輥50之旋轉軸與下平台40之間之移動方向上之間隔W不寬,故而可減少旋轉輥50與下平台40之間之增強板3之撓曲變形。下平台40係以不使基板2與增強板3之位置偏移之方式可滑動地支持增強板3。 At this time, as shown in FIG. 10, the lower stage 40 can be relatively moved with respect to the upper stage 20 together with the rotating roll 50. Since the interval W in the moving direction between the rotating shaft of the rotating roller 50 and the lower stage 40 is not wide, the flexural deformation of the reinforcing plate 3 between the rotating roller 50 and the lower stage 40 can be reduced. The lower stage 40 slidably supports the reinforcing plate 3 so as not to offset the position of the substrate 2 and the reinforcing plate 3.

如此,根據本實施形態,於將基板2與增強板3黏合而製造積層板1時,由於未吸附固定增強板3,故而可以增強板3之變形較少之狀態將增強板3與基板2黏合,而可減少黏合後之積層板1之翹曲。該效果於基板2及增強板3之兩者包含玻璃板之情形時較為顯著。例如,於將玻璃板、及剛性較玻璃板低之樹脂板黏合之情形時,由於樹脂板之剛性較玻璃板之剛性低,故而黏合後之樹脂板產生變形而仿照玻璃板,相對於此,玻璃板幾乎不變形故而容易成為平板狀,積層板難以翹曲。另一方面,於將玻璃板彼此黏合之情形時,黏合後兩者之玻璃板產生變形,難以順沿其中一者,積層板容易翹曲。 According to the present embodiment, when the laminated plate 1 is produced by bonding the substrate 2 and the reinforcing plate 3, since the reinforcing plate 3 is not adsorbed and fixed, the reinforcing plate 3 and the substrate 2 can be bonded in a state where the deformation of the reinforcing plate 3 is less. , the warpage of the laminated board 1 after bonding can be reduced. This effect is remarkable when both the substrate 2 and the reinforcing plate 3 contain a glass plate. For example, when a glass plate and a resin plate having a lower rigidity than the glass plate are bonded, since the rigidity of the resin plate is lower than that of the glass plate, the resin plate after the bonding is deformed to resemble the glass plate. The glass plate is hardly deformed so that it is easily formed into a flat plate shape, and the laminated plate is difficult to warp. On the other hand, in the case where the glass sheets are bonded to each other, the glass sheets of the two after bonding are deformed, and it is difficult to follow one of them, and the laminated sheets are easily warped.

再者,本實施形態之下平台40係於將基板2與增強板3黏合時與旋轉輥50等一併移動,但亦可與旋轉輥50分開而獨立移動,亦可不移動。只要旋轉輥50移動,則可將基板2與增強板3黏合。 Further, in the present embodiment, the stage 40 is moved together with the rotating roller 50 or the like when the substrate 2 and the reinforcing plate 3 are bonded together, but may be moved independently from the rotating roller 50 or may not move. The substrate 2 can be bonded to the reinforcing plate 3 as long as the rotating roller 50 moves.

此外,如圖9所示,於黏合開始時於旋轉輥50之上端部,增強板3可撓曲變形成向上方凸出之彎曲形狀。由於將基板2與增強板3平滑地黏合,故而可抑制基板2或增強板3之破損。 Further, as shown in FIG. 9, at the upper end portion of the rotating roller 50 at the start of bonding, the reinforcing plate 3 is bendable to form a curved shape which protrudes upward. Since the substrate 2 and the reinforcing plate 3 are smoothly bonded, damage of the substrate 2 or the reinforcing plate 3 can be suppressed.

於黏合開始時於旋轉輥50之上端部,以使增強板3撓曲變形成向上方凸出之彎曲形狀之方式,使控制部90控制移動機構70,調整下平台40上載置增強板3之位置。該調整係於搬送機構11將增強板3交付至下平台40之前進行。 At the beginning of the bonding, at the upper end of the rotating roller 50, the reinforcing plate 3 is flexed to form a curved shape that protrudes upward, and the control unit 90 controls the moving mechanism 70 to adjust the lower platform 40 to mount the reinforcing plate 3. position. This adjustment is performed before the conveyance mechanism 11 delivers the reinforcing plate 3 to the lower stage 40.

再者,於圖9所示之例中,於黏合開始時旋轉輥50配置於距增強板3之兩側緣等距離之位置,但亦可如圖11所示般配置於增強板3之一側緣附近。 Further, in the example shown in FIG. 9, the rotating roller 50 is disposed at a position equidistant from both side edges of the reinforcing plate 3 at the start of bonding, but may be disposed in one of the reinforcing plates 3 as shown in FIG. Near the side edges.

以上,對本發明之一實施形態進行了說明,但本發明並不限於上述實施形態,可進行各種變形、變更。 Although an embodiment of the present invention has been described above, the present invention is not limited to the above embodiment, and various modifications and changes can be made.

例如,上述實施形態之黏合裝置10係用於製造LCD之製造步驟中使用之積層板1,但黏合裝置10之用途可為多種多樣。 For example, the bonding apparatus 10 of the above embodiment is used for manufacturing the laminated board 1 used in the manufacturing steps of the LCD, but the application of the bonding apparatus 10 can be various.

又,於上述實施形態中,於將基板2與增強板3黏合時,上平台20之吸附面與下平台40之載置面平行,但亦可傾斜。又,上平台20之吸附面、下平台40之載置面亦可相對於水平面傾斜。 Further, in the above embodiment, when the substrate 2 and the reinforcing plate 3 are bonded together, the adsorption surface of the upper stage 20 is parallel to the mounting surface of the lower stage 40, but may be inclined. Further, the adsorption surface of the upper platform 20 and the placement surface of the lower stage 40 may be inclined with respect to the horizontal plane.

又,如圖12所示,為了減少下平台40與增強板3之摩擦,而可於下平台40之載置面形成對上方噴射氣體之氣體噴出孔40a。氣體噴出孔40a係二維地空出間隔而排列。複數個氣體噴出孔40a係經由配管與氣體供給源GS連接。氣體供給源GS於控制部90之控制下對氣體噴出孔40a供給氣體。 Further, as shown in FIG. 12, in order to reduce the friction between the lower stage 40 and the reinforcing plate 3, a gas ejection hole 40a for injecting gas upward may be formed on the mounting surface of the lower stage 40. The gas ejection holes 40a are arranged two-dimensionally at intervals. The plurality of gas ejection holes 40a are connected to the gas supply source GS via a pipe. The gas supply source GS supplies gas to the gas ejection holes 40a under the control of the control unit 90.

又,如圖13所示,升降桿34貫通上平台支持構件31,自下方支持上平台支持構件31之支持具36可固定於升降桿34之下端部。自圖13所示之狀態使升降桿34下降,由定位構件15支持上平台20之後,於欲使升降桿34繼續下降時,如圖14所示般支持具36自上平台支持構件31離開,保持上平台20與下平台40之平行度。 Further, as shown in FIG. 13, the lifting rod 34 penetrates the upper platform supporting member 31, and the support member 36 that supports the upper platform supporting member 31 from below can be fixed to the lower end portion of the lifting rod 34. The lifting rod 34 is lowered from the state shown in Fig. 13, and after the upper platform 20 is supported by the positioning member 15, when the lifting rod 34 is to continue to descend, the support member 36 is separated from the upper platform supporting member 31 as shown in Fig. The parallelism between the upper platform 20 and the lower platform 40 is maintained.

另一方面,若於圖14所示之狀態下使升降桿34上升,則如圖13所示般支持具36提昇上平台支持構件31,上平台20上升而自定位構件15離開。於上平台支持構件31之下表面固定有支承支持具36之支承具37。支持具36之上部36a成為向上凸出之形狀,支承具37之下部37a成為向上凹陷之形狀。支持具36之上部36a、及支承具37之下部37a可分別為越沿著升降桿34之軸方向向上方行進則半徑變得越小之形狀,例如可為切取球之一部分而成之形狀、圓錐梯形狀、或圓錐形狀。於升降桿34上升時,決定支持具36與支承具37之水平方向上之位置,決定上平台20相對於框架Fr之水平方向上之位置,故而可於上平台20之特定位置載置基板2。 On the other hand, if the lifter lever 34 is raised in the state shown in FIG. 14, the support member 36 lifts the upper deck support member 31 as shown in FIG. 13, and the upper deck 20 rises and separates from the positioning member 15. A support 37 for supporting the support 36 is fixed to the lower surface of the upper platform support member 31. The upper portion 36a of the support member 36 has a shape that protrudes upward, and the lower portion 37a of the support member 37 has a shape that is recessed upward. The upper portion 36a of the support member 36 and the lower portion 37a of the support member 37 may each have a shape in which the radius becomes smaller as it goes upward in the axial direction of the lift rod 34, and may be, for example, a shape in which one part of the ball is cut out. Conical ladder shape, or conical shape. When the lifting rod 34 is raised, the position of the support member 36 and the support member 37 in the horizontal direction is determined, and the position of the upper platform 20 in the horizontal direction relative to the frame Fr is determined. Therefore, the substrate 2 can be placed at a specific position of the upper platform 20. .

再者,支承具37係與上平台支持構件31分開而獨立形成,但亦可作為上平台支持構件31之一部分形成。 Further, the support 37 is formed separately from the upper platform support member 31, but may be formed as a part of the upper platform support member 31.

又,支持具36之上部36a與支承具37之下部37a之凹凸亦可相 反。亦可使支持具36之上部36a成為向下凹陷之形狀,使支承具37之下部37a成為向下凸出之形狀。於此情形時,支持具36之上部36a、及支承具37之下部37a可分別為越沿著升降桿34之軸方向向下方行進則半徑變得小之形狀。 Moreover, the concave portion of the upper portion 36a of the support member 36 and the lower portion 37a of the support member 37 can also be anti. The upper portion 36a of the holder 36 may be recessed downward so that the lower portion 37a of the support member 37 has a downwardly convex shape. In this case, the upper portion 36a of the support member 36 and the lower portion 37a of the support member 37 may each have a shape in which the radius becomes smaller as they travel downward in the axial direction of the lift rod 34.

又,如圖13及圖14所示,可於上平台20之下表面固定載置於定位構件15上之載置部29。載置部29之下部29a成為向上凹陷之形狀(越沿著鉛垂方向向上方行進則半徑變得越小之形狀,例如切取球之一部分而成之形狀、圓錐梯形狀、或圓錐形狀)。定位構件15之上部(詳細而言為螺栓17之頭部19之上部19a)之角部被進行倒角,成為向上凸出之形狀(越沿著鉛垂方向向上方行進則半徑變得越小之形狀,例如切取球之一部分而成之形狀、圓錐梯形狀、或圓錐形狀)。藉由螺栓17之頭部19將載置部29導引至特定位置,而決定上平台20相對於框架Fr之水平方向之位置。因此,由上平台20吸附之基板2、與由下平台40支持之增強板3之位置是固定的,故而可使基板之外緣與增強板3之外緣對齊。 Further, as shown in FIGS. 13 and 14, the placing portion 29 placed on the positioning member 15 can be fixed to the lower surface of the upper platform 20. The lower portion 29a of the placing portion 29 has a shape that is recessed upward (the radius becomes smaller as it travels upward in the vertical direction, for example, a shape in which one part of the ball is cut, a conical trapezoidal shape, or a conical shape). The corner portion of the upper portion of the positioning member 15 (specifically, the upper portion 19a of the head portion 19 of the bolt 17) is chamfered to have an upwardly convex shape (the radius becomes smaller as it goes upward in the vertical direction). The shape, for example, a shape in which one part of the ball is cut, a conical ladder shape, or a conical shape). The position of the upper platform 20 with respect to the horizontal direction of the frame Fr is determined by guiding the placing portion 29 to a specific position by the head portion 19 of the bolt 17. Therefore, the position of the substrate 2 adsorbed by the upper stage 20 and the reinforcing plate 3 supported by the lower stage 40 is fixed, so that the outer edge of the substrate can be aligned with the outer edge of the reinforcing plate 3.

再者,載置部29係與上平台20分開而獨立形成,但亦可作為上平台20之一部分而形成。 Further, the placing portion 29 is formed separately from the upper platform 20, but may be formed as a part of the upper platform 20.

又,載置部29之下部29a與定位構件15之上部19a之凹凸亦可相反。 Further, the unevenness of the lower portion 29a of the placing portion 29 and the upper portion 19a of the positioning member 15 may be reversed.

本申請案係基於2012年1月26日提出申請之日本專利申請案2012-014509者,其內容作為參照併入本文。 The present application is based on Japanese Patent Application No. 2012-014509, filed Jan.

2‧‧‧基板(板狀構件) 2‧‧‧Substrate (plate member)

3‧‧‧增強板(可撓性板) 3‧‧‧Enhanced board (flexible board)

20‧‧‧上平台 20‧‧‧Upper platform

21‧‧‧吸附板 21‧‧‧Adsorption plate

22‧‧‧吸附孔 22‧‧‧Adsorption holes

23‧‧‧槽 23‧‧‧ slot

24‧‧‧主框架 24‧‧‧ main frame

25‧‧‧缸 25‧‧‧cylinder

26‧‧‧增強構件 26‧‧‧Enhanced components

27‧‧‧缸本體 27‧‧‧ cylinder body

28‧‧‧桿 28‧‧‧ rod

32‧‧‧升降機構 32‧‧‧ Lifting mechanism

35‧‧‧升降用馬達 35‧‧‧ Lifting motor

40‧‧‧下平台 40‧‧‧Lower platform

41‧‧‧樹脂層 41‧‧‧ resin layer

42‧‧‧下平台本體 42‧‧‧ platform ontology

43‧‧‧間隔件 43‧‧‧ spacers

44‧‧‧升降板 44‧‧‧ lifting plate

45‧‧‧導引件 45‧‧‧Guide

46‧‧‧伸縮缸 46‧‧‧ Telescopic cylinder

49‧‧‧頂起銷 49‧‧‧Top pin

50‧‧‧旋轉輥 50‧‧‧Rotating roller

60‧‧‧推壓缸(推壓部) 60‧‧‧Pushing cylinder (pushing part)

70‧‧‧移動機構 70‧‧‧Mobile agencies

71‧‧‧驅動部 71‧‧‧ Drive Department

72‧‧‧移動用馬達 72‧‧‧Moving motor

73‧‧‧滾珠螺桿 73‧‧‧Ball screw

74‧‧‧馬達本體部 74‧‧‧Motor body

75‧‧‧編碼器部 75‧‧‧Encoder Department

90‧‧‧控制部 90‧‧‧Control Department

Fr‧‧‧框架 Fr‧‧ frame

Gd‧‧‧導軌 Gd‧‧‧rail

Sb‧‧‧滑動底座 Sb‧‧‧ sliding base

Claims (19)

一種黏合裝置,其係將板狀構件與可撓性板黏合者,且包括:上平台,其係吸附上述板狀構件;下平台,其係配置於該上平台之下方,且載置上述可撓性板;旋轉輥,其係與由該下平台支持之上述可撓性板之下表面接觸,且使上述可撓性板因自身重量而撓曲變形;推壓部,其係將因該旋轉輥而撓曲變形之上述可撓性板推壓於由上述上平台吸附之板狀構件;及移動機構,其係使上述旋轉輥及上述推壓部對於上述上平台相對移動。 An adhesive device for bonding a plate member to a flexible plate, and comprising: an upper platform for adsorbing the plate member; a lower platform disposed below the upper platform and mounting the above a flexible plate; the rotating roller is in contact with the lower surface of the flexible plate supported by the lower platform, and the flexible plate is flexibly deformed by its own weight; the pressing portion is The flexible plate that is flexibly deformed by the rotating roller is pressed against the plate-shaped member that is adsorbed by the upper stage, and the moving mechanism that relatively moves the rotating roller and the pressing portion with respect to the upper stage. 如請求項1之黏合裝置,其中上述移動機構係使上述下平台與上述旋轉輥及上述推壓部一併對於上述上平台相對移動。 The bonding apparatus of claim 1, wherein the moving mechanism relatively moves the lower stage together with the rotating roller and the pressing portion to the upper stage. 如請求項2之黏合裝置,其中上述下平台之載置上述可撓性板之面由樹脂形成。 The bonding apparatus of claim 2, wherein the surface of the lower stage on which the flexible board is placed is formed of a resin. 如請求項2或3之黏合裝置,其中於上述下平台之載置上述可撓性板之面形成有對上方噴射氣體之氣體噴出孔。 The bonding apparatus of claim 2 or 3, wherein a gas ejection hole for injecting gas to the upper side is formed on a surface of the lower stage on which the flexible plate is placed. 如請求項1至4中任一項之黏合裝置,其進而包括自下方或斜下方支持上述旋轉輥之支持輥。 The bonding apparatus according to any one of claims 1 to 4, which further comprises a supporting roller for supporting the above-mentioned rotating roller from below or obliquely below. 如請求項5之黏合裝置,其中上述支持輥於與上述旋轉輥之軸方向平行之方向上空出間隔配置有複數個,於上述支持輥彼此之間配設有支持各支持輥之軸部之軸支持部。 The bonding device of claim 5, wherein the support roller is disposed at a plurality of intervals in a direction parallel to an axial direction of the rotating roller, and an axis supporting a shaft portion of each of the supporting rollers is disposed between the supporting rollers Support department. 如請求項5或6之黏合裝置,其中上述支持輥分別配設於上述旋轉輥之移動方向兩側,且自斜下方支持上述旋轉輥。 The bonding device of claim 5 or 6, wherein the support rollers are respectively disposed on both sides of the moving direction of the rotating roller, and the rotating roller is supported from an obliquely lower side. 如請求項1至7中任一項之黏合裝置,其進而包括切換機構,該切換機構係使上述上平台反轉,將上述上平台之吸附上述板狀構件之面之朝向切換成朝上、及朝下。 The bonding apparatus according to any one of claims 1 to 7, further comprising a switching mechanism that reverses the upper platform to switch the orientation of the upper platform to which the surface of the plate member is attracted upward, And down. 如請求項1至8中任一項之黏合裝置,其進而包括定位構件,該定位構件係定位將上述板狀構件與上述可撓性板黏合時之上述上平台與上述下平台之相對位置,且該定位構件於上述上平台與上述下平台之間隔發生變化之方向上可伸縮。 The bonding device of any one of claims 1 to 8, further comprising a positioning member that positions the relative position of the upper platform and the lower platform when the plate member is bonded to the flexible plate, And the positioning member is expandable and contractable in a direction in which the interval between the upper platform and the lower platform changes. 如請求項2至4中任一項之黏合裝置,其進而包括控制上述移動機構之控制部,且該控制部係控制上述移動機構,而調整上述下平台上載置上述可撓性板之位置。 The bonding apparatus according to any one of claims 2 to 4, further comprising a control unit for controlling the moving mechanism, wherein the control unit controls the moving mechanism to adjust a position at which the flexible plate is placed on the lower platform. 一種黏合方法,其係將板狀構件與可撓性板黏合者,且包括如下步驟:由上平台吸附上述板狀構件,並且於配置於上述上平台之下方之下平台上載置上述可撓性板;及使與由上述下平台支持之上述可撓性板之下表面接觸,且於上述可撓性板因自身重量而撓曲變形之狀態,使擠壓於由上述上平台吸附之上述板狀構件之旋轉輥對於上述上平台相對移動。 A bonding method for bonding a plate member to a flexible plate, and comprising the steps of: adsorbing the plate member from an upper platform, and placing the flexible layer on a platform disposed below the upper platform; a plate that is in contact with a lower surface of the flexible plate supported by the lower platform, and is squeezed to the plate adsorbed by the upper platform in a state in which the flexible plate is flexibly deformed by its own weight The rotating roller of the member moves relative to the upper platform. 如請求項11之黏合方法,其中使上述下平台與上述旋轉輥一併對於上述上平台相對移動。 The bonding method of claim 11, wherein the lower stage and the rotating roller are relatively moved together with respect to the upper stage. 如請求項12之黏合方法,其中上述下平台之載置上述可撓性板之面由樹脂形成。 The bonding method of claim 12, wherein the surface of the lower stage on which the flexible board is placed is formed of a resin. 如請求項12或13之黏合方法,其中於上述下平台之載置上述可撓性板之面形成有對上方噴射氣體之氣體噴出孔。 The bonding method of claim 12 or 13, wherein a gas ejection hole for injecting gas to the upper side is formed on a surface of the lower stage on which the flexible plate is placed. 如請求項11至14中任一項之黏合方法,其中於上述旋轉輥之下方或斜下方配設支持上述旋轉輥之支持輥。 The bonding method according to any one of claims 11 to 14, wherein a support roller supporting the above-mentioned rotating roller is disposed below or obliquely below the rotating roller. 如請求項15之黏合方法,其中上述支持輥係於與上述旋轉輥之軸方向平行之方向上空出間隔配置有複數個,且於上述支持輥彼此之間配設支持各支持輥之軸部之軸支持部。 The bonding method of claim 15, wherein the supporting roller is disposed at a plurality of intervals in a direction parallel to an axial direction of the rotating roller, and a shaft portion supporting each of the supporting rollers is disposed between the supporting rollers Shaft support. 如請求項15或16之黏合方法,其中上述支持輥分別配設於上述旋轉輥之移動方向兩側,且自斜下方支持上述旋轉輥。 The bonding method of claim 15 or 16, wherein the support rollers are respectively disposed on both sides of the moving direction of the rotating roller, and the rotating roller is supported from an obliquely lower side. 如請求項11至17中任一項之黏合方法,其包括如下步驟:使上述上平台之吸附上述板狀構件之吸附面朝上,於該吸附面上載置上述板狀構件後,由上述上平台吸附上述板狀構件,繼而使上述上平台反轉而使上述上平台之吸附面朝下。 The bonding method according to any one of claims 11 to 17, comprising the steps of: causing the adsorption surface of the upper platform to adsorb the plate-like member to face upward, and placing the plate-shaped member on the adsorption surface, The platform adsorbs the above-mentioned plate-shaped member, and then the upper platform is reversed so that the adsorption surface of the upper platform faces downward. 如請求項11至18中任一項之黏合方法,其中上述板狀構件及上述可撓性板分別包含玻璃板。 The bonding method according to any one of claims 11 to 18, wherein the plate member and the flexible plate respectively comprise a glass plate.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI698343B (en) * 2015-12-21 2020-07-11 日商日本電氣硝子股份有限公司 Method and device for manufacturing glass film laminate

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104625997B (en) * 2013-11-12 2017-06-30 珠海格力电器股份有限公司 Positioning tool
KR20170075719A (en) * 2014-10-29 2017-07-03 아사히 가라스 가부시키가이샤 Substrate suction device, substrate bonding device, substrate bonding method, and electronic device manufacturing method
CN104669762B (en) * 2015-03-24 2017-03-29 京东方科技集团股份有限公司 A kind of vacuum forming apparatus
CN105739235A (en) * 2016-03-23 2016-07-06 常州鸿开电子科技有限公司 Multifunctional suction cup device with backlight for mask plate detection
CN109863029A (en) * 2016-10-26 2019-06-07 Agc株式会社 The manufacturing method of laminated body
CN106989090B (en) * 2017-04-28 2019-02-15 歌尔股份有限公司 Cutting part pastes tooling
CN107414979A (en) * 2017-08-01 2017-12-01 合肥英源新材料科技有限公司 A kind of manufacture method of the Multifunctional plate pressing of sheet material laminator
KR102021669B1 (en) * 2017-11-29 2019-09-16 우순 테크놀로지 컴퍼니, 리미티드 Laminating machine
WO2021145226A1 (en) * 2020-01-16 2021-07-22 ソニーセミコンダクタソリューションズ株式会社 Manufacturing device, manufacturing method, and semiconductor element
CN114407494B (en) * 2022-03-11 2023-12-29 新疆钢之盛建筑科技有限公司 Composite board processing equipment and processing method thereof
CN115366522B (en) * 2022-10-21 2023-01-03 北京玻钢院复合材料有限公司 Multifunctional layer spreading device for composite sandwich board

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5023668A (en) * 1990-04-16 1991-06-11 Minnesota Mining And Manufacturing Method and apparatus for adhesive transfer
EP0562266B1 (en) * 1992-03-26 2000-07-12 J.M. Voith GmbH Winder for winding a web, in particular a paper web
JP3283823B2 (en) * 1998-06-02 2002-05-20 株式会社日立製作所 Plate rolling mill
EP1232689B1 (en) * 2001-02-16 2004-06-16 JUWEL AQUARIUM GmbH & CO. KG Method for manufacturing containers from substantially plate shaped elements and a product obtained thereby
JP4519413B2 (en) * 2003-04-09 2010-08-04 リンテック株式会社 Tape sticking method and sticking device
JP4452549B2 (en) * 2004-04-28 2010-04-21 リンテック株式会社 Wafer processing equipment
JP4780559B2 (en) * 2005-12-14 2011-09-28 株式会社日立プラントテクノロジー Film sticking method and apparatus
JP4930161B2 (en) 2006-05-08 2012-05-16 旭硝子株式会社 Thin glass laminated body, display device manufacturing method using thin glass laminated body, and supporting glass substrate
KR100820170B1 (en) * 2006-08-30 2008-04-10 한국전자통신연구원 A Flexible Substrate Adhesion Method
JP4870046B2 (en) * 2007-08-06 2012-02-08 クライムプロダクツ株式会社 Sheet glass bonding method and apparatus
JP5251336B2 (en) * 2008-07-30 2013-07-31 セントラル硝子株式会社 Method and apparatus for pre-bonding laminated glass using curved roll
JP2011026143A (en) * 2009-07-21 2011-02-10 Climb Products Co Ltd Apparatus and method for sticking workpiece

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI698343B (en) * 2015-12-21 2020-07-11 日商日本電氣硝子股份有限公司 Method and device for manufacturing glass film laminate

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