TWI601682B - Substrate stripping apparatus and stripping method, and electronic device manufacturing method - Google Patents

Substrate stripping apparatus and stripping method, and electronic device manufacturing method Download PDF

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TWI601682B
TWI601682B TW102147011A TW102147011A TWI601682B TW I601682 B TWI601682 B TW I601682B TW 102147011 A TW102147011 A TW 102147011A TW 102147011 A TW102147011 A TW 102147011A TW I601682 B TWI601682 B TW I601682B
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peeling
substrate
plate
main surface
peeled
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TW102147011A
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Chinese (zh)
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TW201429854A (en
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伊藤泰則
宇津木洋
瀧內圭
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旭硝子股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C63/00Lining or sheathing, i.e. applying preformed layers or sheathings of plastics; Apparatus therefor
    • B29C63/0004Component parts, details or accessories; Auxiliary operations
    • B29C63/0013Removing old coatings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65HHANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H2301/00Handling processes for sheets or webs
    • B65H2301/50Auxiliary process performed during handling process
    • B65H2301/51Modifying a characteristic of handled material
    • B65H2301/511Processing surface of handled material upon transport or guiding thereof, e.g. cleaning
    • B65H2301/5112Processing surface of handled material upon transport or guiding thereof, e.g. cleaning removing material from outer surface
    • B65H2301/51122Processing surface of handled material upon transport or guiding thereof, e.g. cleaning removing material from outer surface peeling layer of material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65HHANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H29/00Delivering or advancing articles from machines; Advancing articles to or into piles
    • B65H29/54Article strippers, e.g. for stripping from advancing elements
    • B65H29/56Article strippers, e.g. for stripping from advancing elements for stripping from elements or machines
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68381Details of chemical or physical process used for separating the auxiliary support from a device or wafer
    • H01L2221/68386Separation by peeling

Description

基板之剝離裝置及剝離方法以及電子元件之製造方法 Substrate stripping device and peeling method, and electronic component manufacturing method

本發明係關於一種將基板與補強板之界面剝離之基板之剝離裝置及剝離方法以及電子元件之製造方法。 The present invention relates to a peeling device and a peeling method of a substrate which peels off an interface between a substrate and a reinforcing plate, and a method of manufacturing the electronic component.

近年來,隨著顯示面板、太陽電池、及薄膜二次電池等電子元件之薄型化、輕量化,而迫切需要用於電子元件之基板之薄板化。然而,若因薄板化導致基板之強度下降,則基板之操作性劣化,故而難以於基板之表面形成薄膜電晶體(TFT:Thin Film Transistor)、彩色濾光片(CF:color filter)等電子元件用之功能層。 In recent years, as electronic components such as display panels, solar cells, and thin film secondary batteries have become thinner and lighter, there has been a demand for thinning of substrates for electronic components. However, when the strength of the substrate is lowered due to the thinning, the handleability of the substrate is deteriorated, so that it is difficult to form electronic components such as a thin film transistor (TFT) and a color filter (CF: color filter) on the surface of the substrate. Use the functional layer.

因此,提出有一種方法,構成於基板之背面可剝離地貼附有補強板之積層板(廣義上為積層體),於此積層板之基板之正面形成功能層之後,將基板與補強板剝離(例如參照專利文獻1)。以下,將形成功能層之面稱為基板之「正面」,將貼附補強板之面稱為基板之「背面」。 Therefore, there has been proposed a method in which a laminated plate (in a broad sense, a laminated body) in which a reinforcing plate is detachably attached to a back surface of a substrate, and a functional layer is formed on the front surface of the substrate of the laminated plate, and then the substrate and the reinforcing plate are peeled off. (For example, refer to Patent Document 1). Hereinafter, the surface on which the functional layer is formed is referred to as the "front surface" of the substrate, and the surface on which the reinforcing plate is attached is referred to as the "back surface" of the substrate.

專利文獻1之剝離方法係如下方法,即,以使基板之背面與補強板之界面自一端側朝向另一端側依序剝離之方式,使基板及補強板中之至少一方之板材彎曲變形,而將整個界面剝離。上述彎曲變形係藉由利用可撓性板吸附並保持基板及補強板中之至少一方,並使固定於可撓性板之複數之可動體獨立地移動而進行。 The peeling method of the patent document 1 is a method of bending and deforming the board|substrate of at least one of a board|substrate and a reinforcement board so that the interface of the back surface of a board|substrate and a reinforcement board may mutually isolate from the one end side to the other end side. Strip the entire interface. The bending deformation is performed by suctioning and holding at least one of the substrate and the reinforcing plate by the flexible plate, and moving the plurality of movable bodies fixed to the flexible plate independently.

圖19(a)係模式性表示專利文獻1中之基板之剝離形態之積層板100之俯視圖。圖19(b)係基板之剝離形態之側視圖。 Fig. 19 (a) is a plan view schematically showing a laminated board 100 in a peeling form of a substrate in Patent Document 1. Fig. 19 (b) is a side view showing a peeling form of the substrate.

如圖19(b)般,積層板100包含基板102、及貼附於基板102之背面之補強板104。圖19(a)之虛線A及圖19(b)之符號A係基板102與補強板104之界面已剝離之剝離區域106、和界面未剝離之未剝離區域108之邊界線(以下亦稱為「剝離前線」,以下以符號A表示)。為使該剝離前線A如圖19(a)之箭頭B般自積層板100之角部110側朝向角部112側大致平行地行進,而使圖19(b)之複數之可動體114、114…如箭頭C般依序下降移動。 As shown in FIG. 19(b), the laminated board 100 includes a substrate 102 and a reinforcing plate 104 attached to the back surface of the substrate 102. The broken line A in FIG. 19(a) and the symbol A in FIG. 19(b) are the boundary line between the peeled region 106 in which the interface between the substrate 102 and the reinforcing plate 104 has been peeled off, and the unpeeled region 108 in which the interface is not peeled off (hereinafter also referred to as "Peeling front line", which is indicated by the symbol A below). In order to advance the peeling front line A substantially parallel to the corner portion 112 side from the corner portion 110 side of the laminated board 100 as shown by an arrow B in Fig. 19(a), the plurality of movable bodies 114 and 114 of Fig. 19(b) are caused. ... as the arrow C moves down in sequence.

基板102之正面係不可變形地支持於作為支持機構之平板狀之載台116,補強板104被可彈性變形之可撓性板118吸附並保持。於該可撓性板118呈棋盤格狀固定有可動體114、114…。即,使排列於相對於剝離前線A之剝離行進方向即箭頭B大致正交之方向的複數之可動體114、114…同時下降移動而使可撓性板118不斷彎曲變形,藉此,剝離前線A向箭頭B方向行進。 The front surface of the substrate 102 is non-deformably supported by a flat-shaped stage 116 as a support mechanism, and the reinforcing plate 104 is adsorbed and held by the elastically deformable flexible plate 118. The movable bodies 114, 114, ... are fixed in a checkerboard shape on the flexible plate 118. In other words, the plurality of movable bodies 114, 114, which are arranged in a direction substantially orthogonal to the direction of the peeling of the peeling front line A, that is, the arrow B, are simultaneously lowered and moved, whereby the flexible sheet 118 is continuously bent and deformed, whereby the front line is peeled off. A travels in the direction of arrow B.

再者,於專利文獻1中,係以剝離區域106之曲率半徑a為250mm~2500mm之方式,藉由可動體114、114…使可撓性板118彎曲變形。 Further, in Patent Document 1, the flexible plate 118 is bent and deformed by the movable bodies 114, 114, etc. so that the radius of curvature a of the peeling region 106 is 250 mm to 2,500 mm.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]國際公開第2011/024689號 [Patent Document 1] International Publication No. 2011/024689

然而,於專利文獻1之基板之剝離形態中,存在如下問題:如圖19(a)所示於基板102之端部產生微細龜裂(以下稱為龜裂)120之情形時,剝離時龜裂120伸展而導致基板102斷裂(破裂)。 However, in the peeling form of the substrate of Patent Document 1, there is a problem that when a fine crack (hereinafter referred to as a crack) 120 is generated at the end portion of the substrate 102 as shown in Fig. 19 (a), the turtle is peeled off. The crack 120 stretches to cause the substrate 102 to break (fracture).

於圖19(c)中表示有起因於龜裂120之基板102之斷裂之機制。 The mechanism of the fracture of the substrate 102 due to the crack 120 is shown in Fig. 19(c).

於界面上向箭頭B方向行進之剝離前線A通過龜裂120時會向使龜 裂120伸展之方向通過。即,剝離前線A之以箭頭B表示之剝離行進方向變成自基板102之緣部102A朝向基板102之內側之方向。藉此,使界面剝離之力作用於使龜裂120伸展之方向,故而龜裂120如符號122般與剝離前線A一併伸展。藉由實驗而查明基板102由於該機制而斷裂。 When the peeling front line A that travels in the direction of the arrow B on the interface passes through the crack 120, it will make the turtle The direction of the crack 120 is extended. That is, the peeling traveling direction indicated by the arrow B of the peeling front line A becomes the direction from the edge portion 102A of the substrate 102 toward the inner side of the substrate 102. Thereby, the force for peeling off the interface acts on the direction in which the crack 120 is stretched, so that the crack 120 extends together with the peeling front line A as indicated by the symbol 122. It was found by experimentation that the substrate 102 was broken due to this mechanism.

本發明係鑒於此種狀況研究而成者,其目的在於提供一種即便於基板產生龜裂之情形時亦可將基板良好地剝離之基板之剝離裝置及剝離方法以及電子元件之製造方法。 The present invention has been made in view of such a situation, and an object of the present invention is to provide a peeling apparatus, a peeling method, and a method of manufacturing an electronic component, which can peel a substrate well even when a substrate is cracked.

為了達成上述目的,本發明之一態樣之基板之剝離裝置係將基板、與補強上述基板之補強板之界面沿自一端側朝向另一端側之剝離行進方向依序剝離者,該剝離裝置之特徵在於具備剝離機構,該剝離機構於將剝離上述界面之剝離區域與未剝離區域之邊界線和上述基板之外周之2個交點連結而成之直線、與上述剝離區域之上述基板之外周之接線所成之角度為至少90度以下之剝離範圍內,以上述邊界線之端部之切線、與上述剝離區域之上述基板之外周之接線所成之角度大於90度的方式剝離上述界面。 In order to achieve the above object, in a stripping apparatus for a substrate according to an aspect of the present invention, the interface between the substrate and the reinforcing plate for reinforcing the substrate is sequentially peeled off from the one end side toward the other end side, and the peeling device is sequentially removed. A peeling mechanism is provided in which a straight line connecting a boundary line between a peeling region and an unpeeled region where the interface is peeled off and an outer circumference of the substrate is connected, and a wiring of the outer periphery of the substrate in the peeling region The angle formed is such that the angle is at least 90 degrees or less, and the interface is peeled off so that the angle between the end of the boundary line and the line of the outer periphery of the substrate in the peeling region is greater than 90 degrees.

為了達成上述目的,本發明之一態樣之基板之剝離方法係將基板、與補強上述基板之補強板之界面沿自一端側朝向另一端側之剝離行進方向依序剝離者,該剝離方法之特徵在於:於將剝離上述界面之剝離區域與未剝離區域之邊界線和上述基板之外周之2個交點連結而成之直線、與上述剝離區域之上述基板之外周之接線所成之角度為至少90度以下之剝離範圍內,藉由剝離機構以上述邊界線之端部之切線、與上述剝離區域之上述基板之外周之接線所成之角度大於90度之方式剝離上述界面。 In order to achieve the above object, in a method for peeling off a substrate according to an aspect of the present invention, the interface between the substrate and the reinforcing plate for reinforcing the substrate is sequentially peeled off from the one end side toward the other end side, and the peeling method is performed. A line formed by connecting a boundary line separating the boundary between the peeled region and the unpeeled region of the interface and the outer periphery of the substrate, and an angle formed by the wiring of the outer periphery of the substrate in the peeling region is at least In the peeling range of 90 degrees or less, the interface is peeled off by the peeling means so that the angle formed by the end of the boundary line and the line of the outer periphery of the said peeling area is more than 90 degrees.

為了達成上述目的,本發明之一態樣之電子元件之製造方法係 具有於經補強板補強之基板之正面形成功能層之功能層成形步驟、及將形成有上述功能層之上述基板與上述補強板剝離之剝離步驟者,該電子元件之製造方法之特徵在於:上述剝離步驟係如下步驟,即,將上述基板與上述補強板之界面沿自一端側朝向另一端側之剝離行進方向依序剝離,且於將剝離上述界面之剝離區域與未剝離區域之邊界線和上述基板之外周之2個交點連結而成之直線、與上述剝離區域之上述基板之外周之接線所成之角度為至少90度以下之剝離範圍內,以上述邊界線之端部之切線、與上述剝離區域之上述基板之外周之接線所成之角度大於90度之方式剝離上述界面。 In order to achieve the above object, a method of manufacturing an electronic component according to an aspect of the present invention is a functional layer forming step of forming a functional layer on a front surface of a substrate reinforced by a reinforcing plate, and a peeling step of peeling the substrate on which the functional layer is formed and the reinforcing plate, wherein the electronic component manufacturing method is characterized by The peeling step is a step of sequentially peeling the interface between the substrate and the reinforcing plate in a peeling traveling direction from one end side toward the other end side, and a boundary line between the peeling region and the non-stripping region where the interface is peeled off. a straight line connecting the two intersections of the outer periphery of the substrate, and an angle formed by the wiring of the outer periphery of the substrate in the peeling region is at least 90 degrees or less, and the tangent of the end portion of the boundary line is The interface is peeled off at an angle of more than 90 degrees from the outer circumference of the substrate in the peeling region.

根據本發明之剝離形態之一態樣,於上述剝離範圍內行進之邊界線(剝離前線)在通過產生於基板端部之龜裂時,不會向使龜裂伸展之方向通過,而是向自基板之內側朝向基板之緣部之方向通過。藉此,剝離界面之力不會向使龜裂伸展之方向作用,故而龜裂不會與邊界線之行進一併伸展。由此,根據本發明之剝離形態之一態樣,即便於基板產生龜裂之情形時亦可將基板良好地剝離。 According to one aspect of the peeling form of the present invention, the boundary line (peeling front line) which travels within the peeling range does not pass through the crack in the direction of the crack when it passes through the crack generated at the end of the substrate, but Passing from the inner side of the substrate toward the edge of the substrate. Thereby, the force of the peeling interface does not act in the direction in which the crack is stretched, and therefore the crack does not extend together with the progress of the boundary line. Therefore, according to one aspect of the peeling form of the present invention, the substrate can be favorably peeled off even when cracks occur in the substrate.

本發明之一態樣較佳為上述基板係厚度為0.2mm以下之玻璃基板。 One aspect of the present invention is preferably a glass substrate having a substrate thickness of 0.2 mm or less.

根據本發明之一態樣,適用於與電子元件之薄型化對應之玻璃基板之剝離裝置、剝離方法。 According to an aspect of the present invention, it is suitable for a peeling device and a peeling method for a glass substrate corresponding to a reduction in thickness of an electronic component.

於本發明之基板之剝離裝置之一態樣中,較佳為上述剝離機構具備:支持機構,其支持包含上述基板及上述補強板之積層體之第1主面;可撓性板,其具有吸附並保持上述積層體之第2主面之外緣之第1吸附面、及吸附並保持除上述外緣以外之第2主面之第2吸附面,且上述第2吸附面係相對於上述第2主面平行之面,上述第1吸附面係相對於上述第2吸附面突出特定量之突出面;複數之可動體,其等空開間隔而固定於上述可撓性板,且相對於上述支持機構而可獨立地移 動;及控制機構,其使位於上述剝離行進方向之上述一端側之上述可動體至位於上述剝離行進方向之另一端側之上述可動體向離開上述支持機構之方向依序移動。 In one aspect of the substrate peeling apparatus of the present invention, preferably, the peeling mechanism includes: a support mechanism that supports a first main surface including the laminate of the substrate and the reinforcing plate; and a flexible plate having a first adsorption surface that adsorbs and holds the outer edge of the second main surface of the laminate, and a second adsorption surface that adsorbs and holds the second main surface other than the outer edge, and the second adsorption surface is opposite to the above a plane parallel to the second main surface, wherein the first adsorption surface protrudes by a specific amount of the protruding surface with respect to the second adsorption surface; and the plurality of movable bodies are fixed to the flexible plate at intervals, and are opposed to the flexible plate The above support mechanism can be moved independently And a control mechanism that sequentially moves the movable body located on the one end side of the peeling traveling direction to the other end side located in the peeling traveling direction in a direction away from the support mechanism.

於本發明之基板之剝離方法之一態樣中,較佳為藉由剝離機構而進行,該剝離機構具備:支持機構,其支持包含上述基板及上述補強板之積層體之第1主面;可撓性板,其具有吸附並保持上述積層體之第2主面之外緣之第1吸附面、及吸附並保持除上述外緣以外之第2主面之第2吸附面,且上述第2吸附面係相對於上述第2主面平行之面,上述第1吸附面係相對於上述第2吸附面突出特定量之突出面;及複數之可動體,其等空開間隔而固定於上述可撓性板,且相對於上述支持機構而可獨立地移動;藉由控制機構,使位於上述剝離行進方向之上述一端側之上述可動體至位於上述剝離行進方向之另一端側之上述可動體向離開上述支持機構之方向依序移動。 In one aspect of the method for peeling off the substrate of the present invention, preferably, the peeling mechanism includes a support mechanism that supports a first main surface including the laminate of the substrate and the reinforcing plate; a flexible plate having a first adsorption surface that adsorbs and holds the outer edge of the second main surface of the laminate; and a second adsorption surface that adsorbs and holds the second main surface other than the outer edge, and the second adsorption surface (2) a surface of the adsorption surface that is parallel to the second main surface, wherein the first adsorption surface protrudes by a specific amount of the protruding surface with respect to the second adsorption surface; and the plurality of movable bodies are fixed to the space at intervals a flexible plate that is independently movable with respect to the support mechanism; and the movable body located on the one end side of the peeling traveling direction to the movable body located at the other end side of the peeling traveling direction by a control mechanism Move in the direction of leaving the above support organization.

於本發明之電子元件之製造方法之一態樣中,較佳為上述剝離步驟係如下步驟,即,藉由支持機構支持包含上述基板及上述補強板之積層體之第1主面,並且控制空開間隔而固定於吸附並保持上述積層體之第2主面之可撓性板的複數之可動體之相對於上述支持機構之移動,藉此將上述界面沿自一端側朝向另一端側之剝離行進方向依序剝離,且上述可撓性板具有吸附並保持上述積層體之第2主面之外緣之第1吸附面、及吸附並保持除上述外緣以外之第2主面之第2吸附面,上述第2吸附面係相對於上述第2主面平行之面,上述第1吸附面具備相對於上述第2吸附面突出特定量之突出面。 In one aspect of the method of manufacturing an electronic component of the present invention, preferably, the stripping step is a step of supporting a first main surface including a laminate of the substrate and the reinforcing plate by a support mechanism, and controlling The movement of the movable body that is fixed to the movable plate that adsorbs and holds the second main surface of the laminated body with respect to the support mechanism is opened at intervals, thereby moving the interface from one end side toward the other end side The peeling traveling direction is sequentially peeled off, and the flexible sheet has a first adsorption surface that adsorbs and holds the outer edge of the second main surface of the laminate, and a second main surface that adsorbs and holds the outer surface other than the outer edge. In the adsorption surface, the second adsorption surface is parallel to the second main surface, and the first adsorption surface includes a protruding surface that protrudes by a specific amount with respect to the second adsorption surface.

根據本發明之剝離形態之一態樣,若藉由控制機構,使位於剝離行進方向之一端側之可動體至位於剝離行進方向之另一端側之可動體向離開支持機構之方向依序移動,則可使積層體之外緣相較於除外緣以外之面延遲剝離。藉此,根據本發明之剝離形態之一態樣,邊界 線之端部之切線、與剝離區域之基板之外周之接線所成之角度大於90度,故即便於基板產生龜裂之情形時亦可將基板良好地剝離。 According to one aspect of the peeling form of the present invention, the movable body located on one end side in the peeling traveling direction is sequentially moved in the direction away from the support mechanism by the movable body on the one end side in the peeling traveling direction. Then, the outer edge of the laminate can be delayed from being peeled off from the surface other than the outer edge. Thereby, according to one aspect of the peeling form of the present invention, the boundary The angle between the tangent of the end portion of the wire and the wire outside the substrate of the peeling region is greater than 90 degrees, so that the substrate can be favorably peeled off even when the substrate is cracked.

於本發明之基板之剝離裝置之一態樣中,較佳為上述剝離機構具備:支持機構,其支持包含上述基板及上述補強板之積層體之第1主面;可撓性板,其吸附並保持上述積層體之第2主面;複數之可動體,其等空開間隔而位於上述可撓性板,且相對於上述支持機構而可獨立地移動;及控制機構,其使位於上述剝離行進方向之上述一端側之上述可動體至位於上述剝離行進方向之另一端側之上述可動體向離開上述支持機構之方向依序移動,並且使位於上述第2主面之外緣之上述可動體之離開移動開始時間,相較於位於除上述外緣以外之上述第2主面之上述可動體的離開移動開始時間延遲特定時間。 In one aspect of the substrate peeling apparatus of the present invention, preferably, the peeling mechanism includes: a support mechanism that supports a first main surface including the laminate of the substrate and the reinforcing plate; and a flexible plate that adsorbs And holding the second main surface of the laminated body; the plurality of movable bodies are located at the flexible plate at intervals, and are independently movable with respect to the support mechanism; and the control mechanism is located at the peeling The movable body on the one end side in the traveling direction is sequentially moved in a direction away from the support mechanism to the other end side in the peeling traveling direction, and the movable body located on the outer edge of the second main surface is moved. The departure movement start time is delayed by a specific time from the departure movement start time of the movable body located on the second main surface other than the outer edge.

於本發明之基板之剝離方法之一態樣中,較佳為藉由剝離機構而進行,該剝離機構具備:支持機構,其支持包含上述基板及上述補強板之積層體之第1主面;可撓性板,其吸附並保持上述積層體之第2主面;及複數之可動體,其等空開間隔而固定於上述可撓性板,且相對於上述支持機構而可獨立地移動;藉由控制機構使位於上述剝離行進方向之上述一端側之上述可動體至位於上述剝離行進方向之另一端側之上述可動體向離開上述支持機構之方向依序移動,並且藉由上述控制機構使位於上述第2主面之外緣之上述可動體之離開移動開始時間,相較於位於除上述外緣以外之上述第2主面之上述可動體的離開移動開始時間延遲特定時間。 In one aspect of the method for peeling off the substrate of the present invention, preferably, the peeling mechanism includes a support mechanism that supports a first main surface including the laminate of the substrate and the reinforcing plate; a flexible plate that adsorbs and holds the second main surface of the laminated body; and a plurality of movable bodies that are fixed to the flexible plate at intervals, and are independently movable with respect to the support mechanism; The movable body on the one end side of the peeling traveling direction to the movable body located on the other end side in the peeling traveling direction is sequentially moved in a direction away from the supporting mechanism by a control mechanism, and is controlled by the control mechanism The departure movement start time of the movable body located at the outer edge of the second main surface is delayed by a specific time from the departure movement start time of the movable body located on the second main surface other than the outer edge.

於本發明之電子元件之製造方法之一態樣中,較佳為上述剝離步驟係如下步驟,即,藉由支持機構支持包含上述基板及上述補強板之積層體之第1主面,並且控制空開間隔而固定於吸附並保持上述積層體之第2主面之可撓性板的複數之可動體之相對於上述支持機構之移動,藉此將上述界面沿自一端側朝向另一端側之剝離行進方向依序 剝離,且使位於上述剝離行進方向之上述一端側之上述可動體至位於上述剝離行進方向之另一端側之上述可動體向離開上述支持機構之方向依序移動,並且使位於上述第2主面之外緣之上述可動體之離開移動開始時間相較於位於除上述外緣以外之上述第2主面之上述可動體的離開移動開始時間延遲特定時間。 In one aspect of the method of manufacturing an electronic component of the present invention, preferably, the stripping step is a step of supporting a first main surface including a laminate of the substrate and the reinforcing plate by a support mechanism, and controlling The movement of the movable body that is fixed to the movable plate that adsorbs and holds the second main surface of the laminated body with respect to the support mechanism is opened at intervals, thereby moving the interface from one end side toward the other end side Peeling direction of travel And peeling off, the movable body located on the one end side of the peeling traveling direction to the other end side located in the peeling traveling direction is sequentially moved in a direction away from the support mechanism, and is located on the second main surface The departure movement start time of the movable body at the outer edge is delayed by a specific time from the departure movement start time of the movable body located on the second main surface other than the outer edge.

根據本發明之剝離形態之一態樣,若藉由控制機構使位於第2主面之外緣之可動體之離開移動開始時間相較於位於除外緣以外之第2主面之可動體之離開移動開始時間延遲特定時間,則可將積層體之外緣相較於除外緣以外之面延遲剝離。藉此,根據本發明之剝離形態之一態樣,邊界線之端部之切線、與剝離區域之基板之外周之接線所成之角度大於90度,故而即便於基板產生龜裂之情形時亦可將基板良好地剝離。 According to one aspect of the peeling form of the present invention, the movement start time of the movable body located at the outer edge of the second main surface is separated from the movable body of the second main surface located outside the excluded edge by the control mechanism When the movement start time is delayed by a certain time, the outer edge of the laminate can be delayed from being peeled off from the surface other than the exclusion edge. Therefore, according to one aspect of the peeling form of the present invention, the angle between the tangent of the end portion of the boundary line and the wiring of the outer periphery of the substrate of the peeling region is greater than 90 degrees, so that even when the substrate is cracked, The substrate can be peeled off well.

根據本發明之基板之剝離裝置及基板之剝離方法以及電子元件之製造方法,即便於基板產生龜裂之情形時亦可將基板良好地剝離。 According to the peeling apparatus for a substrate, the peeling method of the substrate, and the method of manufacturing the electronic component of the present invention, the substrate can be favorably peeled off even when the substrate is cracked.

1‧‧‧積層板 1‧‧‧ laminate

1a‧‧‧第1主面 1a‧‧‧1st main face

1b‧‧‧第2主面 1b‧‧‧2nd main face

2‧‧‧基板 2‧‧‧Substrate

3、3A、3B‧‧‧補強板 3, 3A, 3B‧‧‧ reinforcing plate

4‧‧‧支持板 4‧‧‧Support board

5‧‧‧樹脂層 5‧‧‧ resin layer

6‧‧‧積層體 6‧‧‧Layer

7‧‧‧液晶層 7‧‧‧Liquid layer

8、9‧‧‧角部 8, 9‧‧‧ corner

10‧‧‧剝離區域 10‧‧‧ Stripped area

11‧‧‧未剝離區域 11‧‧‧Unpeeled area

12‧‧‧剝離範圍 12‧‧‧Extraction range

13‧‧‧龜裂 13‧‧‧ crack

20‧‧‧剝離裝置 20‧‧‧ peeling device

22‧‧‧可撓性板 22‧‧‧Flexible board

22A‧‧‧第1吸附面 22A‧‧‧1st adsorption surface

22B‧‧‧第2吸附面 22B‧‧‧2nd adsorption surface

24‧‧‧可動體 24‧‧‧ movable body

26‧‧‧載台 26‧‧‧The stage

28‧‧‧驅動裝置 28‧‧‧ drive

30‧‧‧控制裝置 30‧‧‧Control device

32‧‧‧吸附片材 32‧‧‧Adsorption sheet

34‧‧‧彈性片材 34‧‧‧Elastic sheet

36‧‧‧本體板 36‧‧‧ body board

38‧‧‧槽 38‧‧‧ slots

40‧‧‧貫通孔 40‧‧‧through holes

42‧‧‧桿 42‧‧‧ pole

44‧‧‧球接頭 44‧‧‧ ball joint

46‧‧‧框架 46‧‧‧Frame

48‧‧‧緩衝構件 48‧‧‧ cushioning members

50‧‧‧驅動部 50‧‧‧ Drive Department

52‧‧‧彈性片材 52‧‧‧Elastic sheet

52A‧‧‧第1吸附面 52A‧‧‧1st adsorption surface

52B‧‧‧第2吸附面 52B‧‧‧2nd adsorption surface

54、56‧‧‧中間膜 54, 56‧‧‧ interlayer film

58‧‧‧吸附墊 58‧‧‧Adsorption pad

60‧‧‧搬送裝置 60‧‧‧Transporting device

62‧‧‧面板 62‧‧‧ panel

64‧‧‧可撓性板 64‧‧‧Flexible board

66‧‧‧積層體 66‧‧‧Layered body

D、P‧‧‧箭頭 D, P‧‧‧ arrows

E‧‧‧剝離前線 E‧‧‧ peeling front line

F、G‧‧‧交點 F, G‧‧‧ intersection

H‧‧‧直線 H‧‧‧ Straight line

J、K‧‧‧接線 J, K‧‧‧ wiring

N‧‧‧切線 N‧‧‧ tangent

θ‧‧‧角度 Θ‧‧‧ angle

圖1係用於電子元件之製造步驟之積層板之要部放大側視圖。 Fig. 1 is an enlarged side elevational view of an essential part of a laminate for use in a manufacturing step of an electronic component.

圖2係於電子元件之製造步驟之途中製作之積層體之要部放大側視圖。 Fig. 2 is an enlarged side elevational view of the main part of the laminated body produced on the way to the manufacturing steps of the electronic component.

圖3(a)係矩形狀之積層板之俯視圖,圖3(b)係表示利用本發明之基板之剝離方法之剝離前線之剝離行進方向的要部說明圖。 Fig. 3 (a) is a plan view of a rectangular laminated plate, and Fig. 3 (b) is an explanatory view of a principal part of a peeling traveling direction of a peeling front line by a peeling method of the substrate of the present invention.

圖4係表示沿自基板之短邊朝向對向之短邊之剝離行進方向依序剝離界面之剝離方法的說明圖。 Fig. 4 is an explanatory view showing a peeling method in which the interface is sequentially peeled off from the short side of the substrate toward the peeling traveling direction of the opposite short side.

圖5係表示圓形之基板之情形時之剝離方法的說明圖。 Fig. 5 is an explanatory view showing a peeling method in the case of a circular substrate.

圖6係表示本發明之剝離裝置之基本構成之要部縱剖面圖。 Fig. 6 is a longitudinal cross-sectional view showing the essential part of the basic structure of the peeling device of the present invention.

圖7係表示相對於可撓性板之複數之可動體之配置位置的可撓性 板之俯視圖。 Figure 7 is a view showing the flexibility of the arrangement position of a plurality of movable bodies with respect to the flexible board. Top view of the board.

圖8(a)係可撓性板之俯視圖,圖8(b)係沿(a)之S-S線之縱剖面圖。 Fig. 8(a) is a plan view of the flexible board, and Fig. 8(b) is a longitudinal sectional view taken along line S-S of (a).

圖9係表示依序剝離界面之狀態之剝離裝置之要部縱剖面圖。 Fig. 9 is a longitudinal cross-sectional view showing the essential part of the peeling device in a state in which the interface is sequentially peeled off.

圖10(a)係表示藉由剝離機構將要保持積層板之前狀態之要部縱剖面圖,圖10(b)係表示藉由剝離機構已保持積層板之狀態之要部縱剖面圖,圖10(c)係表示藉由剝離機構已將界面完全剝離之狀態之要部縱剖面圖。 Fig. 10 (a) is a longitudinal sectional view showing a state before a laminated plate is held by a peeling mechanism, and Fig. 10 (b) is a longitudinal sectional view showing a state in which a laminated plate has been held by a peeling mechanism, Fig. 10 (c) is a longitudinal cross-sectional view of an essential part showing a state in which the interface has been completely peeled off by the peeling mechanism.

圖11(a)係表示行進中之剝離前線之積層板之俯視圖,圖11(b)係沿圖11(a)之T-T線之縱剖面圖。 Fig. 11 (a) is a plan view showing a laminate of a peeling front line during traveling, and Fig. 11 (b) is a longitudinal sectional view taken along line T-T of Fig. 11 (a).

圖12(a)係代替第1吸附面之壁厚而設為2階段構成之剝離裝置之要部縱剖面圖,圖12(b)係於第1吸附面之背面側配置二層之中間膜而設為2階段構成的剝離裝置之要部縱剖面圖。 Fig. 12 (a) is a longitudinal cross-sectional view of a main part of a peeling device having a two-stage configuration instead of the thickness of the first adsorption surface, and Fig. 12 (b) is a two-layer intermediate film disposed on the back side of the first adsorption surface. In addition, it is a longitudinal sectional view of the principal part of the peeling apparatus which consists of two stages.

圖13(a)係剝離前線正在行進之可撓性板之俯視圖,圖13(b)係沿圖13(a)之U-U線之縱剖面圖。 Fig. 13 (a) is a plan view of the flexible plate on which the peeling front line is traveling, and Fig. 13 (b) is a longitudinal sectional view taken along line U-U of Fig. 13 (a).

圖14(a)係藉由搬送裝置而於可撓性板載置有積層板之剝離裝置之側視圖,圖14(b)係藉由載台真空吸附並保持積層板之第1主面之剝離裝置之側視圖,圖14(c)係藉由剝離裝置實施本發明之剝離方法之剝離裝置之側視圖。 Fig. 14 (a) is a side view of a peeling device in which a laminate is placed on a flexible plate by a transfer device, and Fig. 14 (b) is a vacuum suction on the stage and holding the first main surface of the laminated plate. A side view of the peeling device, and Fig. 14 (c) is a side view of the peeling device for carrying out the peeling method of the present invention by a peeling device.

圖15(a)係已將界面完全剝離之剝離裝置之側視圖,圖15(b)係將基板自載台交接至可撓性板之剝離裝置之側視圖,圖15(c)係即將搬出基板前之狀態之剝離裝置之側視圖。 Fig. 15 (a) is a side view of the peeling device in which the interface has been completely peeled off, and Fig. 15 (b) is a side view of the peeling device for transferring the substrate from the stage to the flexible plate, and Fig. 15 (c) is about to be carried out Side view of the stripping device in the state before the substrate.

圖16(a)係藉由搬送裝置於可撓性板載置有積層體之剝離裝置之側視圖,圖16(b)係藉由可撓性板真空吸附並保持積層體之第1主面之剝離裝置之側視圖,圖16(c)係藉由剝離裝置實施本發明之剝離方法之剝離裝置之側視圖。 Fig. 16 (a) is a side view of a peeling device in which a laminate is placed on a flexible plate by a conveying device, and Fig. 16 (b) is a vacuum suction and holding of a first main surface of the laminated body by a flexible plate. A side view of the peeling device, and Fig. 16 (c) is a side view of the peeling device for carrying out the peeling method of the present invention by a peeling device.

圖17(a)係已將界面完全剝離之剝離裝置之側視圖,圖17(b)係藉 由上下之可撓性板真空吸附並保持積層體之剝離裝置之側視圖,圖17(c)係藉由剝離裝置實施本發明之剝離方法之剝離裝置之側視圖。 Figure 17 (a) is a side view of the peeling device which has completely peeled off the interface, and Figure 17 (b) is a A side view of the peeling device which vacuum-adsorbs and holds the laminated body by the upper and lower flexible plates, and Fig. 17 (c) is a side view of the peeling device which performs the peeling method of the present invention by a peeling device.

圖18(a)係已將界面完全剝離之剝離裝置之側視圖,圖18(b)係將補強板自上側之可撓性板交接至下側之可撓性板之剝離裝置之側視圖,圖18(c)係即將搬出補強板之前之狀態之剝離裝置之側視圖。 Fig. 18 (a) is a side view of the peeling device which has completely peeled off the interface, and Fig. 18 (b) is a side view of the peeling device for transferring the reinforcing plate from the upper flexible plate to the lower flexible plate. Fig. 18 (c) is a side view of the peeling device in a state immediately before the reinforcing plate is removed.

圖19(a)係模式性表示專利文獻1中之基板之剝離形態之積層板之俯視圖,圖19(b)係表示基板之剝離形態之剝離裝置之側視圖,圖19(c)係表示起因於龜裂之基板之斷裂之機制的說明圖。 Fig. 19 (a) is a plan view schematically showing a laminate of a peeling form of a substrate in Patent Document 1, and Fig. 19 (b) is a side view showing a peeling device of a peeling form of the substrate, and Fig. 19 (c) is a view showing the cause An explanatory diagram of the mechanism of the fracture of the substrate of the crack.

以下,依照隨附圖式,說明本發明之基板之剝離裝置及剝離方法以及電子元件之製造方法之實施形態。 Hereinafter, embodiments of the substrate peeling device, the peeling method, and the electronic component manufacturing method of the present invention will be described with reference to the accompanying drawings.

圖1係用於電子元件之製造步驟之積層板1之要部放大側視圖。 Fig. 1 is an enlarged side elevational view of an essential part of a laminate 1 for use in a manufacturing step of an electronic component.

[電子元件之製造方法] [Manufacturing method of electronic components]

實施形態之電子元件之製造方法係為應對用於電子元件之基板2之薄板化,構成於基板2之背面貼附有補強板3之積層板1,且具有於積層板1之基板2之正面形成功能層之功能層形成步驟、及將形成有功能層之基板2與補強板3剝離之剝離步驟。於上述剝離步驟中,係使用實施形態之基板之剝離裝置。關於剝離裝置於下文敍述。再者,補強板3並不構成電子元件之一部分,而是自基板2上剝離後作為基板2之補強用再次利用。 In the method of manufacturing the electronic component of the embodiment, in order to cope with the thinning of the substrate 2 for the electronic component, the laminated board 1 having the reinforcing plate 3 attached to the back surface of the substrate 2 is provided, and the front surface of the substrate 2 of the laminated board 1 is provided. A functional layer forming step of forming a functional layer, and a peeling step of peeling off the substrate 2 on which the functional layer is formed and the reinforcing plate 3. In the above-described peeling step, a peeling device for a substrate of the embodiment is used. The peeling device is described below. Further, the reinforcing plate 3 does not constitute a part of the electronic component, but is peeled off from the substrate 2 and reused as a reinforcing material for the substrate 2.

上述電子元件係指顯示面板、太陽電池、薄膜二次電池等電子零件。又,上述顯示面板包含液晶面板(LCD)、電漿面板(PDP)、及有機EL面板(OLED)。 The above electronic component refers to an electronic component such as a display panel, a solar cell, or a thin film secondary battery. Further, the display panel includes a liquid crystal panel (LCD), a plasma panel (PDP), and an organic EL panel (OLED).

[積層板1] [Laminated board 1]

如圖1般積層板1包含基板2及補強基板2之補強板3,且藉由於基板2之背面貼附補強板3而構成。 As shown in FIG. 1, the laminated board 1 includes the reinforcing plate 3 of the substrate 2 and the reinforcing substrate 2, and is configured by attaching the reinforcing plate 3 to the back surface of the substrate 2.

[基板2] [Substrate 2]

於基板2之正面,在電子元件之製造步驟之途中形成有特定之功能層(例如TFT、CF)。 On the front side of the substrate 2, a specific functional layer (for example, TFT, CF) is formed in the middle of the manufacturing process of the electronic component.

基板2為例如玻璃基板、陶瓷基板、樹脂基板、金屬基板、或半導體基板等,但玻璃基板由於耐化學品性、耐透濕性優異、且線膨脹係數較小,故而較佳。其原因在於,線膨脹係數越小,則高溫下形成之功能層之圖案於冷卻時越難以偏移。 The substrate 2 is, for example, a glass substrate, a ceramic substrate, a resin substrate, a metal substrate, or a semiconductor substrate. However, the glass substrate is excellent in chemical resistance and moisture permeability resistance and has a small coefficient of linear expansion. The reason for this is that the smaller the coefficient of linear expansion, the more difficult it is to shift the pattern of the functional layer formed at a high temperature during cooling.

作為玻璃基板之玻璃並無特別限定,例如可例示無鹼玻璃、硼矽酸玻璃、鹼石灰玻璃、高氧化矽玻璃、其他以氧化矽為主成分之氧化物系玻璃等。作為氧化物系玻璃,較佳為經氧化物換算氧化矽之含量為40~90質量%之玻璃。 The glass of the glass substrate is not particularly limited, and examples thereof include alkali-free glass, borosilicate glass, soda lime glass, high cerium oxide glass, and other oxide-based glass containing cerium oxide as a main component. The oxide-based glass is preferably a glass having a content of cerium oxide of 40 to 90% by mass in terms of oxide.

又,作為玻璃基板之玻璃,較佳採用適於電子元件之種類或其製造步驟之玻璃。例如,液晶面板用之玻璃基板較佳為由實質上不含鹼金屬成分之玻璃(無鹼玻璃)形成。如此,玻璃基板之玻璃可基於所應用之電子元件之種類及其製造步驟而適當地進行選擇。 Further, as the glass of the glass substrate, a glass suitable for the type of the electronic component or the manufacturing step thereof is preferably used. For example, the glass substrate for a liquid crystal panel is preferably formed of glass (alkali-free glass) which does not substantially contain an alkali metal component. Thus, the glass of the glass substrate can be appropriately selected based on the type of electronic component to be applied and the manufacturing steps thereof.

上述樹脂基板之樹脂並無特別限定,可為晶質樹脂,亦可為非晶質樹脂。 The resin of the resin substrate is not particularly limited, and may be a crystalline resin or an amorphous resin.

基板2之厚度係根據基板2之種類而設定。例如,於玻璃基板之情形時,為實現電子元件之輕量化、薄板化,較佳為0.7mm以下,更佳為0.2mm以下,進而較佳為0.1mm以下。於0.2mm以下之情形時,可對玻璃基板賦予良好之撓性,獲得對應於電子元件之薄型化之較佳基板。於0.1mm以下之情形時,可將玻璃基板捲取為滾筒狀。又,基於玻璃基板之製造容易、及玻璃基板之操作容易等理由,玻璃基板之厚度較佳為0.03mm以上。 The thickness of the substrate 2 is set according to the type of the substrate 2. For example, in the case of a glass substrate, in order to reduce the weight and thickness of the electronic component, it is preferably 0.7 mm or less, more preferably 0.2 mm or less, and still more preferably 0.1 mm or less. When it is 0.2 mm or less, the glass substrate can be provided with good flexibility, and a preferable substrate corresponding to the thinning of the electronic component can be obtained. When the thickness is 0.1 mm or less, the glass substrate can be wound into a roll shape. Further, the thickness of the glass substrate is preferably 0.03 mm or more for the reason that the production of the glass substrate is easy and the operation of the glass substrate is easy.

[補強板3] [Reinforcing board 3]

補強板3具備若貼附於基板2則於進行剝離操作之前補強基板2之 功能。補強板3於功能層之形成後在電子元件之製造步驟之途中藉由實施形態之基板之剝離裝置而自基板2上剝離。 The reinforcing plate 3 is provided with a reinforcing substrate 2 before being subjected to a peeling operation if attached to the substrate 2 Features. After the formation of the functional layer, the reinforcing plate 3 is peeled off from the substrate 2 by the peeling device of the substrate of the embodiment in the middle of the manufacturing process of the electronic component.

為抑制因溫度變化所致之翹曲或剝離,補強板3較佳為相對於基板2之線膨脹係數之差較小者。於基板2為玻璃基板之情形時,補強板3較佳為包含玻璃板者。該玻璃板之玻璃較佳為與玻璃基板之玻璃相同種類。 In order to suppress warpage or peeling due to temperature change, the reinforcing plate 3 preferably has a smaller difference in linear expansion coefficient with respect to the substrate 2. In the case where the substrate 2 is a glass substrate, the reinforcing plate 3 preferably includes a glass plate. The glass of the glass plate is preferably of the same type as the glass of the glass substrate.

補強板3具備作為底層之支持板4、及形成於支持板4之面之樹脂層5。藉由作用於樹脂層5與基板2之間之凡得瓦耳力、或樹脂層5之黏著力等,基板2經由樹脂層5而可剝離地貼附於支持板4。 The reinforcing plate 3 includes a support plate 4 as a bottom layer and a resin layer 5 formed on the surface of the support plate 4. The substrate 2 is detachably attached to the support sheet 4 via the resin layer 5 by the van der Waals force acting between the resin layer 5 and the substrate 2 or the adhesion of the resin layer 5 or the like.

再者,圖1之補強板3係由支持板4與樹脂層5構成,但亦可僅由支持板4構成。於該情形時,藉由作用於支持板4與基板2之間之凡得瓦耳力等而將支持板4與基板2可剝離地貼附。又,於該情形時,較佳為於支持板4之貼附側面形成無機薄膜,使得作為玻璃板之支持板4、與作為玻璃基板之基板2在高溫下不接著。 Further, the reinforcing plate 3 of Fig. 1 is composed of the support plate 4 and the resin layer 5, but may be constituted only by the support plate 4. In this case, the support plate 4 and the substrate 2 are detachably attached by a van der Waals force or the like acting between the support plate 4 and the substrate 2. Moreover, in this case, it is preferable to form an inorganic thin film on the attachment side surface of the support plate 4 so that the support plate 4 as a glass plate and the substrate 2 which is a glass substrate are not adhered at high temperature.

又,圖1之支持板4為1塊,樹脂層5為1層,但亦可由複數塊之支持板4構成支持板4,並且由複數層構成樹脂層5。 Further, the support plate 4 of Fig. 1 is one block, and the resin layer 5 is one layer. However, the support plate 4 may be constituted by a plurality of support plates 4, and the resin layer 5 may be composed of a plurality of layers.

[支持板4] [Support Board 4]

支持板4係介隔樹脂層5而支持基板2,藉此利用補強板3補強基板2。該支持板4亦具備防止電子元件之製造步驟中之基板2之變形、損傷、破損等之功能。 The support plate 4 supports the substrate 2 with the resin layer 5 interposed therebetween, whereby the substrate 2 is reinforced by the reinforcing plate 3. The support plate 4 also has a function of preventing deformation, damage, breakage, and the like of the substrate 2 in the manufacturing process of the electronic component.

作為支持板4可例示例如玻璃板、陶瓷板、樹脂板、半導體板、或金屬板等。支持板4之種類可根據電子元件之種類、及基板2之種類等而適當地進行選定。若支持板4與基板2種類相同,則可減少因溫度變化所致之翹曲、剝離,故而較佳。 As the support plate 4, for example, a glass plate, a ceramic plate, a resin plate, a semiconductor plate, a metal plate, or the like can be exemplified. The type of the support plate 4 can be appropriately selected depending on the type of the electronic component, the type of the substrate 2, and the like. If the support plate 4 and the substrate 2 are of the same type, warpage and peeling due to temperature change can be reduced, which is preferable.

支持板4與基板2之平均線膨脹係數之差(絕對值)係根據基板2之尺寸形狀等而適當地進行設定,但較佳為例如35×10-7/℃以下。此 處,所謂「平均線膨脹係數」係指50~300℃之溫度範圍內之平均線膨脹係數(JIS R 3102:1995年)。 The difference (absolute value) between the average linear expansion coefficients of the support plate 4 and the substrate 2 is appropriately set depending on the size and shape of the substrate 2, but is preferably, for example, 35 × 10 -7 / ° C or less. Here, the "average linear expansion coefficient" means an average linear expansion coefficient in a temperature range of 50 to 300 ° C (JIS R 3102: 1995).

支持板4之厚度較佳為例如0.7mm以下。又,為補強基板2,支持板4之厚度較佳為0.4mm以上。支持板4之厚度可厚於基板2亦可薄於基板2。 The thickness of the support plate 4 is preferably, for example, 0.7 mm or less. Further, in order to reinforce the substrate 2, the thickness of the support plate 4 is preferably 0.4 mm or more. The thickness of the support plate 4 may be thicker than the substrate 2 or thinner than the substrate 2.

為了使得支持板4能夠支持樹脂層5之全體,支持板4之外形尺寸較佳為如圖1所示般與樹脂層5之外形尺寸相同、或者大於樹脂層5之外形尺寸。 In order to enable the support plate 4 to support the entirety of the resin layer 5, the outer shape of the support plate 4 is preferably the same as the outer shape of the resin layer 5 or larger than the outer shape of the resin layer 5 as shown in FIG.

[樹脂層5] [Resin layer 5]

樹脂層5具備密接於基板2後於進行剝離操作之前,防止基板2之相對於支持板4之位置偏離的功能。又,樹脂層5亦具備藉由剝離操作而容易自基板2上剝離之功能。由於容易剝離基板2,故可防止剝離時之基板2之破損。進而,樹脂層5係以與支持板4之間之結合力相對高於與基板2之結合力的方式形成。 The resin layer 5 has a function of preventing the position of the substrate 2 from being displaced from the support plate 4 before being adhered to the substrate 2 before the peeling operation. Further, the resin layer 5 also has a function of being easily peeled off from the substrate 2 by a peeling operation. Since the substrate 2 is easily peeled off, damage of the substrate 2 at the time of peeling can be prevented. Further, the resin layer 5 is formed such that the bonding force with the support plate 4 is relatively higher than the bonding force with the substrate 2.

樹脂層5之樹脂並無特別限定,可例示丙烯酸系樹脂、聚烯烴樹脂、聚胺基甲酸酯樹脂、聚醯亞胺樹脂、聚矽氧樹脂、聚醯亞胺聚矽氧樹脂等。又,亦可混合複數種樹脂進行使用,但自耐熱性及剝離性之觀點而言,較佳為聚矽氧樹脂、聚醯亞胺聚矽氧樹脂。 The resin of the resin layer 5 is not particularly limited, and examples thereof include an acrylic resin, a polyolefin resin, a polyurethane resin, a polyimide resin, a polyoxyn resin, and a polyimide resin. Further, a plurality of kinds of resins may be used in combination, but from the viewpoint of heat resistance and peelability, a polydecene oxide resin or a polyimide polyimide resin is preferable.

樹脂層5之厚度並無特別限定,但較佳為1~50μm,更佳為4~20μm。藉由將樹脂層5之厚度設為1μm以上,於樹脂層5與基板2之間混入有氣泡或異物之情形時,樹脂層5會變形以吸收氣泡或異物之厚度。另一方面,若將樹脂層5之厚度設為50μm以下,則可縮短樹脂層5之形成時間,進而不會使用必要以上之樹脂層5之樹脂,故而較經濟。 The thickness of the resin layer 5 is not particularly limited, but is preferably 1 to 50 μm, more preferably 4 to 20 μm. When the thickness of the resin layer 5 is 1 μm or more and bubbles or foreign matter are mixed between the resin layer 5 and the substrate 2, the resin layer 5 is deformed to absorb the thickness of bubbles or foreign matter. On the other hand, when the thickness of the resin layer 5 is 50 μm or less, the formation time of the resin layer 5 can be shortened, and the resin of the resin layer 5 or more which is necessary is not used, which is economical.

為了使樹脂層5能夠密接基板2之全體,樹脂層5之外形尺寸較佳為如圖1所示般與基板2之外形尺寸相同、或者大於基板2之外形尺 寸。 In order to enable the resin layer 5 to be in close contact with the entire substrate 2, the outer shape of the resin layer 5 is preferably the same as the outer shape of the substrate 2 as shown in FIG. Inch.

再者,樹脂層5亦可包含2層以上。於該情形時,「樹脂層之厚度」意味著所有樹脂層之合計厚度。又,於樹脂層5包含2層以上之情形時,形成各層之樹脂之種類亦可不同。進而,積層板1之構成並不限於圖1所示者。例如,亦可代替樹脂層5,使用包含選自由金屬矽化物、氮化物及碳化物組成之群(WSi2、AlN、TiN、Si3N4及SiC等)之至少一種的無機層。又,亦可不使用樹脂層5,而是藉由對基板2與補強板3之各者之接合面進行鏡面研磨,減小該等之接合面之表面粗糙度,而將基板2與補強板3接合。 Further, the resin layer 5 may also contain two or more layers. In this case, "the thickness of the resin layer" means the total thickness of all the resin layers. Moreover, when the resin layer 5 contains two or more layers, the kind of the resin which forms each layer may differ. Further, the configuration of the laminated board 1 is not limited to those shown in FIG. For example, an inorganic layer containing at least one selected from the group consisting of metal tellurides, nitrides, and carbides (WSi 2 , AlN, TiN, Si 3 N 4 , SiC, etc.) may be used instead of the resin layer 5 . Further, instead of using the resin layer 5, the surface of each of the substrate 2 and the reinforcing plate 3 may be mirror-polished to reduce the surface roughness of the bonding surfaces, and the substrate 2 and the reinforcing plate 3 may be removed. Engage.

圖2係於電子元件之製造步驟之途中製作之積層體6之要部放大側視圖。 Fig. 2 is an enlarged side elevational view of an essential part of the laminated body 6 produced in the middle of the manufacturing steps of the electronic component.

[積層體6] [Laminated body 6]

積層體6係藉由使於圖1之積層板1之基板2之正面形成有功能層之2塊積層板1、1以使各功能層對向的方式結合而構成。功能層之種類係根據電子元件之種類而進行選擇。亦可於基板2之正面依序積層複數之功能層。作為功能層之形成方法係使用一般之方法,例如使用CVD法、PVD法等蒸鍍法、及濺鍍法等。功能層係藉由光微影法、及蝕刻法形成為特定之圖案。 The laminated body 6 is formed by combining two laminated sheets 1 and 1 having a functional layer on the front surface of the substrate 2 of the laminated board 1 of Fig. 1 so that the functional layers are opposed to each other. The type of the functional layer is selected according to the type of the electronic component. A plurality of functional layers may be sequentially laminated on the front side of the substrate 2. As a method of forming the functional layer, a general method, for example, a vapor deposition method such as a CVD method or a PVD method, a sputtering method, or the like is used. The functional layer is formed into a specific pattern by photolithography and etching.

圖2之積層體6係自上層至下層具備補強板3A、基板2A、液晶層(功能層)7、基板2B、及補強板3B。即,夾隔著中央之液晶層7而於上層側具備包含基板2A與補強板3A之積層板1B,於下層側具備包含基板2B與補強板3B之積層板1A。 The laminated body 6 of Fig. 2 includes a reinforcing plate 3A, a substrate 2A, a liquid crystal layer (functional layer) 7, a substrate 2B, and a reinforcing plate 3B from the upper layer to the lower layer. In other words, the laminated board 1B including the substrate 2A and the reinforcing plate 3A is provided on the upper layer side, and the laminated board 1A including the substrate 2B and the reinforcing plate 3B is provided on the lower layer side.

圖2之積層體6係於LCD之製造步驟之途中製作者。於基板2A之液晶層7側之面、即基板2A之正面形成有薄膜電晶體(TFT),於基板2B之液晶層7側之面、即基板2B之正面形成有彩色濾光片(CF),藉由薄膜電晶體與彩色濾光片而形成作為功能層之液晶層7。 The laminate 6 of Fig. 2 is produced by the maker of the LCD manufacturing process. A thin film transistor (TFT) is formed on the surface of the substrate 2A on the liquid crystal layer 7 side, that is, on the front surface of the substrate 2A, and a color filter (CF) is formed on the surface of the substrate 2B on the liquid crystal layer 7 side, that is, on the front surface of the substrate 2B. A liquid crystal layer 7 as a functional layer is formed by a thin film transistor and a color filter.

再者,圖2之積層體6係於兩側配置有補強板3A、3B之構成,但積層體亦可為僅於單側配置有補強板之構成。 Further, the laminated body 6 of Fig. 2 has a configuration in which reinforcing plates 3A and 3B are disposed on both sides, but the laminated body may have a configuration in which a reinforcing plate is disposed only on one side.

積層體6係於剝離步驟中被剝離補強板3A、3B。於剝離補強板3A、3B後之基板2A、2B之背面安裝背光裝置等電子零件,藉此製造作為製品之LCD。補強板3A、3B之剝離係使用後述之剝離裝置進行。 The laminated body 6 is peeled off from the reinforcing plates 3A and 3B in the peeling step. An electronic component such as a backlight device is mounted on the back surfaces of the substrates 2A and 2B after the peeling reinforcing plates 3A and 3B, thereby manufacturing an LCD as a product. The peeling of the reinforcing plates 3A and 3B is performed using a peeling device described later.

[本發明之基板之剝離方法] [Method of peeling off substrate of the present invention]

首先,於說明實施形態之基板之剝離裝置前,對本發明之基板之剝離方法進行說明。 First, the method of peeling off the substrate of the present invention will be described before explaining the peeling device for the substrate of the embodiment.

本發明之基板之剝離方法係以如下剝離方法為基礎:例如於圖1所示之積層板1中,將基板2與補強板3之界面,如圖3(a)所示之矩形狀之積層板1之俯視圖所示般,沿自角部(一端)8側朝向角部(另一端)9側之箭頭D表示之剝離行進方向依序剝離。 The peeling method of the substrate of the present invention is based on the following peeling method: for example, in the laminated board 1 shown in Fig. 1, the interface between the substrate 2 and the reinforcing sheet 3 is a rectangular laminated layer as shown in Fig. 3(a). As shown in the plan view of the panel 1, the peeling traveling direction is sequentially peeled off along the arrow D from the corner portion (one end) 8 side toward the corner portion (the other end) 9 side.

其次,對圖3(a)中所示之符號E、F、G、H、J、K、L、M、N、12進行說明。 Next, symbols E, F, G, H, J, K, L, M, N, and 12 shown in Fig. 3(a) will be described.

符號E係剝離界面之剝離區域10與未剝離區域11之剝離前線(邊界線)。 The symbol E is a peeling front line (boundary line) of the peeling region 10 of the peeling interface and the unpeeled region 11.

符號F、G係剝離前線E與基板2之外周之2個交點。 Symbols F and G are two intersections of the peeling front line E and the outer circumference of the substrate 2.

符號H係將交點F、G連結而成之直線。 The symbol H is a straight line in which the intersection points F and G are connected.

符號J、K係剝離區域10之基板2之外周之接線。 Symbol J, K is the wiring of the outer periphery of the substrate 2 of the peeling region 10.

符號M、N係剝離前線E之端部之切線。 Symbols M and N are tangent to the end of the front line E.

符號12係直線H與接線J、K所成之角度為至少90度以下之剝離範圍。該剝離範圍係由兩點鏈線L與接線J、K圍成之俯視三角形之範圍。 The symbol 12 is a peeling range in which the angle H between the straight line H and the wires J and K is at least 90 degrees or less. The peeling range is a range of a triangular shape in a shape surrounded by the two-point chain line L and the wires J and K.

而且,本發明之基板之剝離方法之特徵在於,於剝離範圍12內以切線M、N與接線J、K所成之角度θ大於90度之方式剝離界面。 Further, the method for peeling off the substrate of the present invention is characterized in that the interface is peeled off in the peeling range 12 such that the angles θ formed by the tangent lines M and N and the wires J and K are greater than 90 degrees.

圖3(b)係表示利用本發明之基板之剝離方法之剝離前線E之剝離行進方向的要部說明圖。 Fig. 3 (b) is an explanatory view of a principal part of a peeling traveling direction of the peeling front line E by the peeling method of the substrate of the present invention.

於剝離範圍12內行進之剝離前線E通過產生於基板2之端部之龜裂13時,不會向使龜裂13伸展之方向通過,而是如箭頭P般向自基板2之內側朝向基板2之緣部之方向通過。藉此,剝離界面之力不會作用於使龜裂13伸展之方向,故而龜裂13不會與剝離前線E之行進一併伸展。由此,根據本發明之基板之剝離方法,即便於基板2產生龜裂13之情形時亦可將基板2良好地剝離。 When the peeling front line E traveling in the peeling range 12 passes through the crack 13 generated at the end portion of the substrate 2, it does not pass through the direction in which the crack 13 is stretched, but is directed toward the substrate from the inner side of the substrate 2 as indicated by the arrow P. The direction of the edge of 2 passes. Thereby, the force of the peeling interface does not act on the direction in which the crack 13 is stretched, and therefore the crack 13 does not extend together with the progress of the peeling front line E. Thus, according to the method for peeling off the substrate of the present invention, the substrate 2 can be favorably peeled off even when the cracks 13 are formed on the substrate 2.

再者,規定剝離範圍12之理由在於:於超出剝離範圍12之範圍內,即便是圖19(a)所示之先前之剝離方法,亦有角度θ大於90度之情形。於該情形時,即便為先前之剝離方法,龜裂亦不會伸展。即,本發明之基板之剝離方法可防止因存在於剝離範圍12內之龜裂13所致之基板2之斷裂。 Further, the reason why the peeling range 12 is specified is that, even in the range of the peeling range 12, even in the previous peeling method shown in Fig. 19 (a), the angle θ is larger than 90 degrees. In this case, even if it is the previous peeling method, the crack does not stretch. That is, the peeling method of the substrate of the present invention can prevent breakage of the substrate 2 due to the crack 13 existing in the peeling range 12.

又,圖3(a)之剝離方法係沿自角部8側朝向角部9側之箭頭D表示之剝離行進方向依序剝離界面之剝離方法。相對於此,圖4之其他剝離方法係使剝離前線E沿自基板2之短邊2C朝向短邊2D之箭頭Q表示之剝離行進方向行進而依序剝離界面之剝離方法。於圖4之剝離方法之情形時,基板2之整個面變成剝離範圍12。 Moreover, the peeling method of FIG. 3 (a) is a peeling method which sequentially peels the interface in the peeling advancing direction shown by the arrow D from the corner part 8 side toward the corner part 9 side. On the other hand, the other peeling method of FIG. 4 is a peeling method in which the peeling front line E is sequentially peeled off along the peeling traveling direction indicated by the arrow Q from the short side 2C of the substrate 2 toward the short side 2D. In the case of the peeling method of Fig. 4, the entire surface of the substrate 2 becomes the peeling range 12.

進而,於圖5所示之圓形之基板1C之情形時亦藉由同樣之剝離方法剝離界面。即,於將作為剝離界面之剝離區域10與未剝離區域11之邊界線的剝離前線E與基板2之外周之2個交點F、G連結而成之直線H、和剝離區域10之基板2之外周之接線J、K所成之角度為至少90度以下的剝離範圍(由兩點鏈線L與接線J、K圍成之俯視半圓形之範圍)12內,以剝離前線E之端部之切線M、N與接線J、K所成之角度θ大於90度之方式剝離界面。該情形時,亦可獲得同樣之效果。以上係本發明之基板之剝離方法,可解決先前之問題。 Further, in the case of the circular substrate 1C shown in Fig. 5, the interface was also peeled off by the same peeling method. In other words, the line H of the peeling front line E which is the boundary line between the peeling region 10 and the unpeeled region 11 at the peeling interface and the two intersections F and G of the outer periphery of the substrate 2, and the substrate 2 of the peeling region 10 The angle formed by the outer peripheral wires J and K is a peeling range of at least 90 degrees (the range of the semicircular shape defined by the two-point chain line L and the wires J and K) 12 to peel off the end of the front line E The tangent lines M, N and the wires J, K are separated by an angle θ greater than 90 degrees. In this case, the same effect can be obtained. The above is a method for peeling off the substrate of the present invention, which solves the previous problems.

其次,對本發明之基板之剝離裝置進行說明。 Next, the peeling device of the substrate of the present invention will be described.

[本發明之基板之剝離裝置] [The peeling device of the substrate of the present invention]

圖6係表示剝離裝置20之基本構成之要部縱剖面圖。圖7係模式性表示相對於後述之可撓性板22之複數之可動體24、24…之配置位置的可撓性板22之俯視圖。又,圖6係相當於沿圖7之R-R線之剖面圖。 Fig. 6 is a longitudinal sectional view showing an essential part of a basic configuration of the peeling device 20. Fig. 7 is a plan view schematically showing the position of the flexible plate 22 with respect to the arrangement positions of the plurality of movable bodies 24, 24, ... of the flexible plate 22 to be described later. 6 is a cross-sectional view taken along line R-R of FIG. 7.

如圖6般剝離裝置20係將基板2與補強板3之界面自角部8側朝向角部9側而依序剝離。於剝離時,如圖7般作為剝離上述界面之剝離區域10與未剝離區域11之邊界線之剝離前線E係於箭頭D方向行進。 As shown in Fig. 6, the peeling device 20 sequentially peels the interface between the substrate 2 and the reinforcing plate 3 from the corner portion 8 side toward the corner portion 9 side. At the time of peeling, as shown in FIG. 7, the peeling front line E which is the boundary line of the peeling region 10 and the non-peeling region 11 which peeled the said interface advances in the arrow D direction.

又,剝離裝置20係藉由不可變形地支持基板2並使補強板3彎曲變形而剝離上述界面之裝置,但亦可為不可變形地支持補強板3使基板2彎曲變形而剝離上述界面之裝置。 Further, the peeling device 20 is a device that peels and deforms the reinforcing plate 3 by deformably supporting the substrate 2, but may be a device that supports the reinforcing plate 3 and deforms the substrate 2 by bending and deforms the interface. .

剝離裝置20係由作為支持機構之平板狀之載台26、可撓性板22、複數之可動體24、24…、對應每個可動體24而使可動體24升降移動之複數之驅動裝置28、及對應每個驅動裝置28而控制驅動裝置28之控制裝置(控制機構)30等構成。 The peeling device 20 is a plurality of driving devices 28 that are a flat-shaped stage 26 as a supporting mechanism, a flexible plate 22, a plurality of movable bodies 24, 24, ..., and a movable body 24 that moves up and down in response to each movable body 24. And a control device (control mechanism) 30 that controls the drive device 28 for each drive device 28, and the like.

載台26為支持基板2,而真空吸附並保持積層板1之第1主面(基板2之正面)1a。再者,亦可代替真空吸附,而使用靜電吸附或磁吸附。又,載台26於剝離時不可變形地支持基板2,故為剛性較高之金屬製。 The stage 26 is a support substrate 2, and vacuum-adsorbs and holds the first main surface (front surface of the substrate 2) 1a of the laminated board 1. Further, instead of vacuum adsorption, electrostatic adsorption or magnetic adsorption may be used. Further, since the stage 26 supports the substrate 2 in a non-deformable manner at the time of peeling, it is made of a metal having high rigidity.

可撓性板22為使補強板3彎曲變形而真空吸附並保持積層板1之第2主面1b。再者,亦可代替真空吸附而使用靜電吸附或磁吸附。 The flexible plate 22 is configured to bend and deform the reinforcing plate 3 to vacuum-adsorb and hold the second main surface 1b of the laminated plate 1. Further, instead of vacuum adsorption, electrostatic adsorption or magnetic adsorption may be used.

圖8(a)係可撓性板22之俯視圖,圖8(b)係沿圖8(a)之S-S線之可撓性板22之縱剖面圖。 Fig. 8(a) is a plan view of the flexible board 22, and Fig. 8(b) is a longitudinal sectional view of the flexible board 22 taken along line S-S of Fig. 8(a).

可撓性板22係由吸附並保持積層板1之第2主面1b之布狀之吸附片材32、被覆有吸附片材32之彈性片材34、及支持彈性片材34之本體板36構成。於彈性片材34之表面具備貫通其之框狀之槽38,於較該槽 38更靠內側被覆有吸附片材32。又,於本體板36開口有複數之貫通孔40、40…,該等貫通孔40、40…之一端係連通於槽38,另一端經由未圖示之抽吸管路而連接於吸氣源(例如真空泵)。 The flexible sheet 22 is a cloth-like absorbent sheet 32 that adsorbs and holds the second main surface 1b of the laminated sheet 1, an elastic sheet 34 coated with the absorbent sheet 32, and a body sheet 36 that supports the elastic sheet 34. Composition. The surface of the elastic sheet 34 is provided with a frame-shaped groove 38 penetrating therethrough. 38 is further covered with an adsorption sheet 32 on the inner side. Further, a plurality of through holes 40, 40, ... are opened in the main body plate 36, and one end of the through holes 40, 40 is connected to the groove 38, and the other end is connected to the suction source via a suction pipe (not shown). (eg vacuum pump).

因此,若驅動上述吸氣源,則上述抽吸管路、貫通孔40、及槽38之空氣被抽吸,藉此積層板1之第2主面1b被真空吸附並保持於吸附片材32。於該情形時,為了使吸附片材32能夠全體地支持積層板1之第2主面1b,吸附片材32之外形尺寸係設定為大於積層板1之第2主面1b之外形尺寸。又,作為彈性片材34之材料並無特別限定,但較佳為橡膠。作為橡膠較佳為聚矽氧橡膠。 Therefore, when the air intake source is driven, the air in the suction duct, the through hole 40, and the groove 38 is sucked, whereby the second main surface 1b of the laminated plate 1 is vacuum-sucked and held on the adsorption sheet 32. . In this case, in order to allow the adsorption sheet 32 to support the second main surface 1b of the laminated board 1 as a whole, the outer dimensions of the adsorption sheet 32 are set to be larger than the outer dimensions of the second main surface 1b of the laminated board 1. Further, the material of the elastic sheet 34 is not particularly limited, but is preferably rubber. The rubber is preferably a polyoxyethylene rubber.

本體板36係與彈性片材34為相同大小。又,本體板36之彎曲剛性較彈性片材34更高,本體板36之彎曲剛性支配可撓性板22之彎曲剛性。可撓性板22之每單位寬度(1mm)之彎曲剛性較佳為1000~40000N.mm2/mm。例如,於可撓性板22之寬度為100mm之部分,彎曲剛性為100000~4000000N.mm2。藉由將可撓性板22之每單位寬度(1mm)之彎曲剛性設為1000N.mm2/mm以上,可防止可撓性板22吸附並保持之板(本實施形態中為補強板3)之折曲。又,藉由將可撓性板22之每單位寬度(1mm)之彎曲剛性設為40000N.mm2/mm以下,可使可撓性板22吸附並保持之板適度地彎曲變形。作為可撓性板22,例如除了可使用聚氯乙烯(PVC)樹脂、聚碳酸酯樹脂、丙烯酸系樹脂、聚縮醛(POM)樹脂等樹脂板以外,還可使用金屬板。 The body plate 36 is the same size as the elastic sheet 34. Moreover, the bending rigidity of the main body plate 36 is higher than that of the elastic sheet 34, and the bending rigidity of the main body plate 36 governs the bending rigidity of the flexible plate 22. The bending rigidity per unit width (1 mm) of the flexible plate 22 is preferably 1000 to 40,000 N. Mm 2 /mm. For example, in the portion of the flexible plate 22 having a width of 100 mm, the bending rigidity is 100000 to 4000000 N. Mm 2 . By setting the bending rigidity per unit width (1 mm) of the flexible board 22 to 1000 N. The mm 2 /mm or more can prevent the bending of the plate (the reinforcing plate 3 in the present embodiment) which is sucked and held by the flexible plate 22. Moreover, the bending rigidity per unit width (1 mm) of the flexible board 22 is set to 40,000 N. Below mm 2 /mm, the plate which is attracted and held by the flexible plate 22 is moderately bent and deformed. As the flexible plate 22, for example, a metal plate such as a polyvinyl chloride (PVC) resin, a polycarbonate resin, an acrylic resin, or a polyacetal (POM) resin can be used.

作為本體板36,例如除了可使用聚氯乙烯(PVC)樹脂、聚碳酸酯樹脂、丙烯酸系樹脂、聚縮醛(POM)樹脂等樹脂板以外,還可使用金屬板。 As the main body plate 36, for example, a metal plate such as a polyvinyl chloride (PVC) resin, a polycarbonate resin, an acrylic resin, or a polyacetal (POM) resin can be used.

再者,載台26對積層板1之第1主面1a之支持方法及構造亦與可撓性板22之真空吸附保持方法及其構造大致相同。 Further, the method and structure for supporting the first main surface 1a of the laminated plate 1 by the stage 26 are also substantially the same as those of the vacuum suction holding method of the flexible board 22.

如圖6所示於本體板36之下表面呈棋盤格狀固定有圖7所示之圓 盤狀之可動體24、24…。該等可動體24、24…係藉由螺栓等緊固構件固定於本體板36,但亦可代替螺栓而使用接著固定。該等可動體24、24…係藉由被控制裝置30驅動控制之驅動裝置28、28…,而相對於載台26獨立地升降移動。 As shown in FIG. 6, the circle shown in FIG. 7 is fixed on the lower surface of the main body plate 36 in a checkerboard shape. Disc-shaped movable bodies 24, 24... The movable bodies 24, 24, ... are fixed to the main body plate 36 by fastening members such as bolts, but they may be used instead of the bolts. The movable bodies 24, 24, ... are independently moved up and down with respect to the stage 26 by the driving devices 28, 28, ... that are driven and controlled by the control device 30.

即,控制裝置30係使圖7中位於角部8側之可動體24、24…至位於箭頭D表示之剝離行進方向之角部9側的可動體24、24…,向離開載台26之方向依序下降移動。藉由該動作,如圖9之縱剖面圖般基板2與補強板3之界面自角部8側朝向角部9側而依序剝離。 In other words, the control device 30 moves the movable bodies 24, 24, ... on the side of the corner portion 8 in Fig. 7 to the movable bodies 24, 24, ... on the side of the corner portion 9 of the peeling traveling direction indicated by the arrow D, and moves away from the stage 26. The direction moves down in sequence. By this operation, the interface between the substrate 2 and the reinforcing plate 3 is sequentially peeled off from the corner portion 8 side toward the corner portion 9 side as shown in the longitudinal cross-sectional view of FIG. 9 .

驅動裝置28係由例如旋轉式之伺服馬達及滾珠螺桿機構等構成。伺服馬達之旋轉運動於滾珠螺桿機構被轉換成線性運動,並被傳遞至滾珠螺桿機構之桿42。桿42之前端部經由球接頭44而設有可動體24。藉此,可使自載台26離開之可動體24如圖9般追隨可撓性板22之彎曲變形而翹起。由此,不對可撓性板22賦予強制之力,便可使可撓性板22彎曲變形。再者,作為驅動裝置28並不限定於旋轉式之伺服馬達及滾珠螺桿機構,亦可為線性伺服馬達、或液壓缸體(例如氣壓缸體)。 The drive unit 28 is constituted by, for example, a rotary servo motor and a ball screw mechanism. The rotary motion of the servo motor is converted into linear motion by the ball screw mechanism and transmitted to the rod 42 of the ball screw mechanism. The movable body 24 is provided at the front end of the rod 42 via the ball joint 44. Thereby, the movable body 24 from which the stage 26 is separated can be lifted up following the bending deformation of the flexible board 22 as shown in FIG. Thereby, the flexible plate 22 can be bent and deformed without applying a force to the flexible plate 22. Further, the drive device 28 is not limited to the rotary servo motor and the ball screw mechanism, and may be a linear servo motor or a hydraulic cylinder (for example, a pneumatic cylinder).

複數之驅動裝置28、28…較佳為介隔緩衝構件48而安裝於可相對於載台26升降之框架46。緩衝構件48係以追隨可撓性板22之彎曲變形之方式彈性變形。藉此,桿42相對於載台26而翹起。 The plurality of driving devices 28, 28, ... are preferably attached to the frame 46 that can be raised and lowered with respect to the stage 26 via the cushioning member 48. The cushioning member 48 is elastically deformed in such a manner as to follow the bending deformation of the flexible plate 22. Thereby, the rod 42 is lifted with respect to the stage 26.

於將已剝離之補強板3自可撓性板22上卸除時,框架46係藉由未圖示之驅動部而下降移動。藉此,於載台26與可撓性板22之間可獲得用於取出補強板3之足夠的作業空間。又,載台26亦同樣地藉由驅動部50、50…而升降移動,相對於可撓性板22進行進退移動。 When the detached reinforcing plate 3 is removed from the flexible plate 22, the frame 46 is lowered and moved by a driving portion (not shown). Thereby, a sufficient working space for taking out the reinforcing plate 3 can be obtained between the stage 26 and the flexible plate 22. Further, the stage 26 is also moved up and down by the driving units 50, 50, and moves forward and backward with respect to the flexible board 22.

控制裝置30係構成為包含CPU、ROM及RAM等記錄媒體等之電腦。控制裝置30藉由讓CPU執行記錄於記錄媒體之程式,而對應每個驅動裝置28控制複數之驅動裝置28,從而控制複數之可動體24、24… 之升降移動。 The control device 30 is configured as a computer including a recording medium such as a CPU, a ROM, and a RAM. The control device 30 controls the plurality of driving devices 28 corresponding to each driving device 28 by causing the CPU to execute the program recorded on the recording medium, thereby controlling the plurality of movable bodies 24, 24... Move up and down.

其次,對用於獲得圖3(a)所示之剝離前線E之第1剝離裝置之構成進行說明。 Next, the configuration of the first peeling device for obtaining the peeling front line E shown in Fig. 3(a) will be described.

[第1剝離裝置之構成] [Configuration of the first peeling device]

圖10(a)係表示藉由包含載台26與可撓性板22之剝離機構即將保持積層板1前之狀態的要部縱剖面圖,圖10(b)係藉由上述剝離機構保持積層板1之狀態之要部縱剖面圖,圖10(c)係表示藉由上述剝離機構已將界面完全剝離之基板2與補強板3的要部縱剖面圖。 Fig. 10 (a) is a longitudinal sectional view of a main portion in a state in which the peeling mechanism including the stage 26 and the flexible plate 22 is about to hold the laminated plate 1, and Fig. 10 (b) is held by the peeling mechanism. FIG. 10(c) is a longitudinal cross-sectional view showing a principal part of the substrate 2 and the reinforcing plate 3 in which the interface has been completely peeled off by the peeling mechanism.

又,圖11(a)係表示行進中之剝離前線E之積層板1之俯視圖,圖11(b)係沿圖11(a)之T-T線之縱剖面圖。 Further, Fig. 11(a) is a plan view showing the laminated board 1 of the peeling front line E during traveling, and Fig. 11(b) is a longitudinal sectional view taken along line T-T of Fig. 11(a).

如圖10(a)~10(c)所示,於可撓性板22之彈性片材34具備吸附並保持積層板1之第2主面1b之框狀之外緣1c之第1吸附面22A、及吸附並保持除外緣1c以外之矩形狀之第2主面1b之第2吸附面22B。第2吸附面22B係相對於第2主面1b平行之面,第1吸附面22A係相對於第2吸附面22B突出特定量之突出面。 As shown in Figs. 10(a) to 10(c), the elastic sheet 34 of the flexible sheet 22 is provided with a first adsorption surface that adsorbs and holds the frame-shaped outer edge 1c of the second main surface 1b of the laminated sheet 1. 22A, and the second adsorption surface 22B of the second main surface 1b having a rectangular shape other than the edge 1c is adsorbed and held. The second adsorption surface 22B is a surface parallel to the second main surface 1b, and the first adsorption surface 22A protrudes by a specific amount with respect to the second adsorption surface 22B.

又,構成載台26之彈性片材52亦具備同樣之第1吸附面52A、及第2吸附面52B。即,於彈性片材34具備吸附並保持積層板1之第1主面1a之框狀之外緣1d之第1吸附面52A、及吸附並保持除外緣1d以外之矩形狀之第1主面1a之第2吸附面52B。第2吸附面52B係相對於第1主面1a平行之面,第1吸附面52A係相對於第2吸附面52B突出特定量之突出面。 Further, the elastic sheet 52 constituting the stage 26 also includes the same first adsorption surface 52A and second adsorption surface 52B. In other words, the elastic sheet 34 includes a first adsorption surface 52A that adsorbs and holds the frame-shaped outer edge 1d of the first main surface 1a of the laminated plate 1, and a first main surface that absorbs and holds a rectangular shape other than the exclusion edge 1d. The second adsorption surface 52B of 1a. The second adsorption surface 52B is a surface parallel to the first main surface 1a, and the first adsorption surface 52A protrudes by a specific amount with respect to the second adsorption surface 52B.

作為一例,第1吸附面22A、52A之突出量t為約0.5mm,第1吸附面22A、52A之寬度w為2~10mm。再者,第1吸附面22A、52A只要裝備於載台26及可撓性板22中之至少一方便可。於該情形時,上述突出量t為約1.0mm。 As an example, the amount of protrusion t of the first adsorption surfaces 22A and 52A is about 0.5 mm, and the width w of the first adsorption surfaces 22A and 52A is 2 to 10 mm. Further, the first adsorption surfaces 22A and 52A may be provided on at least one of the stage 26 and the flexible plate 22. In this case, the above-mentioned amount of protrusion t is about 1.0 mm.

根據以上述方式構成之第1剝離裝置,若藉由控制裝置30如圖7 般使位於箭頭D所示之剝離行進方向之角部8側之可動體24至位於剝離行進方向之角部9側的可動體24,如圖9般向離開載台26之方向依序下降移動,則如圖11(b)般積層板1之外緣1c、1d較除外緣1c、1d以外之面延遲剝離。 According to the first peeling device configured as described above, the control device 30 is as shown in FIG. The movable body 24 located on the side of the corner portion 8 in the peeling traveling direction indicated by the arrow D to the movable body 24 located on the side of the corner portion 9 in the peeling traveling direction is gradually moved downward in the direction away from the stage 26 as shown in FIG. Then, as shown in Fig. 11(b), the outer edges 1c and 1d of the laminated board 1 are delayed from being peeled off from the surfaces other than the outer edges 1c and 1d.

藉此,根據第1剝離裝置,如圖3(a)般剝離前線E之端部之切線M、N、與剝離區域10之外周之接線J、K所成之角度θ大於90度,故即便於圖3(b)所示之龜裂13產生於基板2之情形時亦可將基板2良好地剝離。 According to the first peeling device, as shown in FIG. 3(a), the tangent lines M and N of the end portion of the front line E are peeled off, and the angles θ formed by the wires J and K on the outer circumference of the peeling region 10 are larger than 90 degrees, so that even When the crack 13 shown in FIG. 3(b) is generated on the substrate 2, the substrate 2 can be favorably peeled off.

圖12(a)係表示代替第1吸附面22A、52A之壁厚而設為2階段構成之另一形態之剝離裝置。圖12(b)係表示於第1吸附面22A、52A之背面側重疊配置長度不同之二層之中間膜54、56而將第1吸附面22A、52A設為2階段構成的另一形態之剝離裝置。該等另一形態之剝離裝置亦可獲得同樣之效果。又,即便將第1吸附面22A、52A設為傾斜面亦同樣。 Fig. 12 (a) shows a peeling device of another embodiment in which the thickness of the first adsorption surfaces 22A and 52A is replaced by a two-stage configuration. (b) of FIG. 12 is another embodiment in which the intermediate films 54 and 56 having two layers having different lengths are disposed on the back surface side of the first adsorption surfaces 22A and 52A, and the first adsorption surfaces 22A and 52A are formed in two stages. Peeling device. The peeling device of the other form can also achieve the same effect. Moreover, the same applies to the case where the first adsorption surfaces 22A and 52A are inclined surfaces.

以上所述之第1剝離裝置之特徵在於,於彈性片材34、52具備第1吸附面22A、52A。 The first peeling device described above is characterized in that the elastic sheets 34 and 52 are provided with the first adsorption surfaces 22A and 52A.

其次,對第2剝離裝置進行說明。 Next, the second peeling device will be described.

[第2剝離裝置之構成] [Composition of the second peeling device]

第2剝離裝置之構成相對於上述第1剝離裝置之構成之不同點在於:可撓性板22之彈性片材34之吸附面、載台26之彈性片材52之吸附面為無階差之平面;及使位於第2主面1b之外緣1c之可動體24之離開移動開始時間,較位於除外緣1c以外之第2主面1b之可動體24的離開移動開始時間延遲特定時間。 The configuration of the second peeling device differs from the configuration of the first peeling device in that the adsorption surface of the elastic sheet 34 of the flexible sheet 22 and the adsorption surface of the elastic sheet 52 of the stage 26 are stepless. The departure movement start time of the movable body 24 located at the outer edge 1c of the second main surface 1b is delayed by a specific time from the departure movement start time of the movable body 24 located on the second main surface 1b other than the exclusion edge 1c.

圖13(a)及13(b)係模式性表示第2剝離裝置之剝離形態。 13(a) and 13(b) schematically show the peeling form of the second peeling device.

圖13(a)係剝離前線E自角部8側朝向角部9側行進之可撓性板22之俯視圖,圖13(b)係沿圖13(a)之U-U線之縱剖面圖。 Fig. 13 (a) is a plan view of the flexible sheet 22 from which the peeling front line E travels from the corner portion 8 side toward the corner portion 9 side, and Fig. 13 (b) is a longitudinal sectional view taken along line U-U of Fig. 13 (a).

其次,參照圖10(a)、圖13(a)及13(b),對第2剝離裝置之基板之剝離方法進行說明。 Next, a method of peeling off the substrate of the second peeling device will be described with reference to Figs. 10(a), 13(a) and 13(b).

第2剝離裝置之基板之剝離方法係藉由控制裝置30使位於第2主面1b之外緣1c之可動體24之離開移動開始時間,較位於除外緣1c以外之第2主面1b之可動體24的離開移動開始時間延遲特定時間。藉此,如圖13(b)般補強板3之外緣較除外緣以外之面延遲剝離。此種控制裝置30之控制係針對於相對於作為剝離前線E(參照圖3(a))之剝離行進方向之箭頭D大致正交的方向排列之複數之可動體24、24…實施。 The peeling method of the substrate of the second peeling device is performed by the control device 30 so that the moving movement start time of the movable body 24 located at the outer edge 1c of the second main surface 1b is movable more than the second main surface 1b other than the outer edge 1c. The departure movement start time of the body 24 is delayed by a certain time. Thereby, as shown in FIG. 13(b), the outer edge of the reinforcing plate 3 is delayed in peeling from the surface other than the outer edge. The control of the control device 30 is performed for a plurality of movable bodies 24, 24, ... arranged in a direction substantially orthogonal to the arrow D which is the peeling traveling direction of the peeling front line E (refer to FIG. 3(a)).

藉此,根據第2剝離裝置之基板之剝離方法,如圖3(a)般剝離前線E之端部之切線M、N、與剝離區域10之基板2之外周之接線J、K所成之角度θ大於90度,故而即便於基板2產生龜裂13(參照圖3(b))之情形時亦可將基板2良好地剝離。 Thereby, according to the peeling method of the substrate of the second peeling device, as shown in FIG. 3(a), the tangent lines M and N of the end portion of the front line E and the wirings J and K of the outer periphery of the substrate 2 of the peeling region 10 are formed. Since the angle θ is larger than 90 degrees, the substrate 2 can be favorably peeled off even when the cracks 13 are formed on the substrate 2 (see FIG. 3( b )).

[積層板相對於剝離裝置之搬入步驟、剝離步驟、搬出步驟] [Step of carrying in the laminate with respect to the peeling device, peeling step, and carrying out step]

圖14(a)~14(c)及圖15(a)~15(c)係時間序列地表示將積層板1搬入剝離裝置20之搬入步驟、積層板1之剝離步驟、及將已剝離之基板2與補強板3自剝離裝置20搬出之搬出步驟的說明圖。又,積層板1向剝離裝置20之搬入作業、及所剝離之補強板3及基板2之搬出作業係藉由圖14(a)所示之具備複數之吸附墊58、58…之搬送裝置60而進行。 14(a) to 14(c) and Figs. 15(a) to 15(c) show, in time series, a step of carrying the laminated board 1 into the peeling device 20, a peeling step of the laminated board 1, and a peeling process. An explanatory view of the step of carrying out the removal of the substrate 2 and the reinforcing plate 3 from the peeling device 20. Further, the loading operation of the laminated plate 1 to the peeling device 20 and the removal of the reinforcing plate 3 and the substrate 2 by the transfer device 60 having the plurality of adsorption pads 58, 58 shown in Fig. 14 (a) And proceed.

圖14(a)係藉由搬送裝置60而將積層板1載置於可撓性板22之剝離裝置20之側視圖。於該情形時,為了於可撓性板22與載台26之間插入搬送裝置60,而使可撓性板22與載台26預先移動至相對足夠退避之位置。然後,若將積層板1載置於可撓性板22,則藉由可撓性板22真空吸附並保持積層板1之補強板3。即,積層板1之第2主面1b被可撓性板22真空吸附並保持。 Fig. 14 (a) is a side view of the peeling device 20 in which the laminated plate 1 is placed on the flexible plate 22 by the conveying device 60. In this case, in order to insert the conveying device 60 between the flexible plate 22 and the stage 26, the flexible plate 22 and the stage 26 are moved to a position that is relatively sufficiently retracted. Then, when the laminated board 1 is placed on the flexible board 22, the reinforcing board 3 of the laminated board 1 is vacuum-adsorbed and held by the flexible board 22. That is, the second main surface 1b of the laminated plate 1 is vacuum-adsorbed and held by the flexible plate 22.

圖14(b)係撓性板22與載台26向相對靠近之方向移動,積層板1之第1主面1a被載台26真空吸附並保持之狀態之剝離裝置20的側視圖。 Fig. 14 (b) is a side view of the peeling device 20 in a state in which the flexible plate 22 and the stage 26 are moved in the relatively close direction, and the first main surface 1a of the laminated plate 1 is vacuum-adsorbed and held by the stage 26.

圖14(c)係藉由剝離裝置20實施本發明之剝離方法之狀態之剝離裝置20的側視圖。根據該圖,一面使可撓性板22彎曲變形,一面使積層板1之界面沿剝離前線E剝離。 Fig. 14 (c) is a side view of the peeling device 20 in a state in which the peeling method of the present invention is carried out by the peeling device 20. According to this figure, the interface of the laminated board 1 is peeled off along the peeling front line E while the flexible board 22 is bent and deformed.

圖15(a)係界面已被完全剝離之狀態之剝離裝置20之側視圖。根據該圖,已剝離之基板2被載台26真空吸附並保持,所剝離之補強板3被可撓性板22真空吸附並保持。又,為了於可撓性板22與載台26之間插入圖14(a)所示之搬送裝置60,而使可撓性板22與載台26預先移動至相對足夠退避之位置。 Fig. 15 (a) is a side view of the peeling device 20 in a state in which the interface has been completely peeled off. According to the figure, the peeled substrate 2 is vacuum-adsorbed and held by the stage 26, and the peeled reinforcing plate 3 is vacuum-adsorbed and held by the flexible sheet 22. Further, in order to insert the conveying device 60 shown in Fig. 14(a) between the flexible plate 22 and the stage 26, the flexible plate 22 and the stage 26 are moved to a position relatively large enough to be retracted.

其後,先解除可撓性板22之真空吸附。其次,藉由搬送裝置60之吸附墊58、58…吸附並保持補強板3。接著,藉由搬送裝置60將補強板3自剝離裝置20搬出。 Thereafter, the vacuum adsorption of the flexible sheet 22 is first released. Next, the reinforcing plate 3 is sucked and held by the adsorption pads 58, 58 of the conveying device 60. Next, the reinforcing plate 3 is carried out from the peeling device 20 by the conveying device 60.

圖15(b)係將基板2自載台26交接至可撓性板22之狀態之剝離裝置20的側視圖。即,載台26朝向可撓性板22下降移動,於基板2載置於可撓性板22之時候解除載台26之吸附保持,然後使載台26退避移動至充分離開可撓性板22之位置。 Fig. 15 (b) is a side view of the peeling device 20 in a state where the substrate 2 is transferred from the stage 26 to the flexible plate 22. That is, the stage 26 is moved downward toward the flexible board 22, and when the substrate 2 is placed on the flexible board 22, the holding and holding of the stage 26 is released, and then the stage 26 is retracted and moved sufficiently away from the flexible board 22. The location.

圖15(c)係即將搬出基板2前之狀態之剝離裝置20之側視圖。之後,藉由圖14(a)所示之搬送裝置60吸附並保持基板2,並自剝離裝置20搬出基板2。 Fig. 15 (c) is a side view of the peeling device 20 in a state immediately before the substrate 2 is carried out. Thereafter, the substrate 2 is sucked and held by the transfer device 60 shown in FIG. 14( a ), and the substrate 2 is carried out from the peeling device 20 .

以上係積層板1相對於剝離裝置20之搬入步驟、剝離步驟、搬出步驟。 The above steps are the carrying-in step, the peeling step, and the unloading step of the laminate 1 with respect to the peeling device 20.

[積層體相對於剝離裝置之搬入步驟、剝離步驟、搬出步驟] [Loading step, peeling step, and carrying out step of the laminated body with respect to the peeling device]

圖16(a)~16(c)、圖17(a)~17(c)、及圖18(a)~18(c)係時間序列地表示將圖2所示之積層體6搬入剝離裝置20之搬入步驟、積層體6之剝離步驟、將所剝離之補強板3A、3B自剝離裝置20搬出之搬出步驟、及將包含已剝離補強板3A、3B之基板2A、2B與液晶層7之電子元件用之面板62自剝離裝置20搬出之搬出步驟的說明圖。又,積層體6向 剝離裝置20之搬入作業、及所剝離之補強板3A、3B及面板62之搬出作業係藉由圖14(a)所示之搬送裝置60而進行。 16(a) to 16(c), Figs. 17(a) to 17(c), and Figs. 18(a) to 18(c) show time series of the laminated body 6 shown in Fig. 2 in a peeling device. The carrying-in step of 20, the peeling step of the laminated body 6, the carrying-out step of carrying out the peeled reinforcing plates 3A and 3B from the peeling device 20, and the substrates 2A and 2B including the peeled reinforcing plates 3A and 3B and the liquid crystal layer 7 An explanatory view of the carrying-out step of the panel 62 for electronic components being carried out from the peeling device 20. Also, the laminated body 6 is oriented The loading operation of the peeling device 20 and the removal of the peeled reinforcing plates 3A and 3B and the panel 62 are performed by the conveying device 60 shown in Fig. 14 (a).

又,圖16~圖18所示之剝離裝置20具備代替載台26而配置可撓性板64,藉由位於上下之一對之可撓性板22、64剝離補強板3A、3B之功能。即,可撓性板64具備與可撓性板22相同之功能。即,於可撓性板64具備與使可撓性板22彎曲變形之可動體24相同之可動體(未圖示)、與驅動裝置28相同之驅動裝置(未圖示)、及與控制裝置30相同之控制裝置(未圖示)。 Further, the peeling device 20 shown in FIGS. 16 to 18 has a function of arranging the flexible plate 64 instead of the stage 26, and peeling the reinforcing plates 3A and 3B by the pair of upper and lower flexible plates 22 and 64. That is, the flexible board 64 has the same function as the flexible board 22. In other words, the flexible plate 64 includes a movable body (not shown) similar to the movable body 24 that bends and deforms the flexible plate 22, a driving device (not shown) similar to the driving device 28, and a control device. 30 identical control devices (not shown).

圖16(a)係藉由搬送裝置60將積層體6載置於可撓性板22之剝離裝置20的側視圖。於該情形時,為了於可撓性板22與可撓性板64之間插入搬送裝置60,而使可撓性板22與可撓性板64預先移動至相對足夠退避之位置。然後,若將積層體6載置於可撓性板22,則藉由可撓性板22真空吸附並保持積層體6之補強板3B。即,積層體6之第2主面6b被可撓性板22真空吸附並保持。 Fig. 16 (a) is a side view of the peeling device 20 in which the laminated body 6 is placed on the flexible plate 22 by the conveying device 60. In this case, in order to insert the conveying device 60 between the flexible plate 22 and the flexible plate 64, the flexible plate 22 and the flexible plate 64 are moved to a position that is relatively sufficiently retracted. Then, when the laminated body 6 is placed on the flexible plate 22, the reinforcing plate 3B of the laminated body 6 is vacuum-adsorbed and held by the flexible plate 22. That is, the second main surface 6b of the laminated body 6 is vacuum-adsorbed and held by the flexible plate 22.

圖16(b)係向可撓性板22與可撓性板64相對靠近之方向移動,積層體6之第1主面6a被可撓性板64真空吸附並保持之狀態之剝離裝置20的側視圖。 16(b) is a peeling device 20 in which the first main surface 6a of the laminated body 6 is vacuum-adsorbed and held by the flexible plate 64 in a direction in which the flexible plate 22 and the flexible plate 64 are moved toward each other. Side view.

圖16(c)係藉由剝離裝置20而實施本發明之剝離方法之狀態之剝離裝置20之側視圖。根據該圖,一面使可撓性板22彎曲變形,一面使積層體6之基板2B與補強板3B之界面沿剝離前線E剝離。 Fig. 16 (c) is a side view of the peeling device 20 in a state in which the peeling method of the present invention is carried out by the peeling device 20. According to this figure, the interface between the substrate 2B of the laminated body 6 and the reinforcing plate 3B is peeled off along the peeling front line E while the flexible plate 22 is bent and deformed.

圖17(a)係基板2B與補強板3B之界面已被完全剝離之狀態之剝離裝置20的側視圖。根據該圖,所剝離之補強板3B被可撓性板22真空吸附並保持,除補強板3B以外之積層體66(包含補強板3A、基板2A、液晶層7、及基板2B之積層體)被可撓性板64真空吸附並保持。又,為了於可撓性板22與可撓性板64之間插入圖14(a)所示之搬送裝置60,而使可撓性板22與可撓性板64預先移動至相對足夠退避之位置。 Fig. 17 (a) is a side view of the peeling device 20 in a state in which the interface between the substrate 2B and the reinforcing plate 3B has been completely peeled off. According to the figure, the peeled reinforcing plate 3B is vacuum-adsorbed and held by the flexible plate 22, and the laminated body 66 other than the reinforcing plate 3B (including the laminated body of the reinforcing plate 3A, the substrate 2A, the liquid crystal layer 7, and the substrate 2B) It is vacuum-absorbed and held by the flexible plate 64. Moreover, in order to insert the conveying device 60 shown in FIG. 14(a) between the flexible plate 22 and the flexible plate 64, the flexible plate 22 and the flexible plate 64 are moved in advance to a relatively sufficient retreat. position.

然後,先解除可撓性板22之真空吸附。其次,藉由搬送裝置60之吸附墊58、58…吸附並保持補強板3B。接著,藉由搬送裝置60將補強板3B自剝離裝置20搬出。 Then, the vacuum adsorption of the flexible sheet 22 is first released. Next, the reinforcing plate 3B is adsorbed and held by the adsorption pads 58, 58 of the transfer device 60. Next, the reinforcing plate 3B is carried out from the peeling device 20 by the conveying device 60.

圖17(b)係藉由可撓性板22與可撓性板64真空吸附並保持積層體66之剝離裝置20的側視圖。即,使可撓性板22與可撓性板64向相對靠近之方向移動,藉由可撓性板22與可撓性板64真空吸附並保持積層體66。 17(b) is a side view of the peeling device 20 which vacuum-adsorbs and holds the laminated body 66 by the flexible plate 22 and the flexible plate 64. That is, the flexible plate 22 and the flexible plate 64 are moved in the relatively close direction, and the laminated body 66 is vacuum-sucked and held by the flexible plate 22 and the flexible plate 64.

圖17(c)係藉由剝離裝置20而實施本發明之剝離方法之狀態之剝離裝置20的側視圖。根據該圖,一面使可撓性板64彎曲變形,一面使積層體66之基板2A與補強板3A之界面沿剝離前線E剝離。 Fig. 17 (c) is a side view of the peeling device 20 in a state in which the peeling method of the present invention is carried out by the peeling device 20. According to this figure, the interface between the substrate 2A of the laminated body 66 and the reinforcing plate 3A is peeled off along the peeling front line E while the flexible plate 64 is bent and deformed.

圖18(a)係基板2A與補強板3A之界面已被完全剝離之狀態之剝離裝置20的側視圖。根據該圖,所剝離之補強板3A被可撓性板64真空吸附並保持,面板62被可撓性板22真空吸附並保持。又,為了於可撓性板22與可撓性板64之間插入圖14(a)所示之搬送裝置60,而使可撓性板22與可撓性板64預先移動至相對足夠退避之位置。 Fig. 18 (a) is a side view of the peeling device 20 in a state in which the interface between the substrate 2A and the reinforcing plate 3A has been completely peeled off. According to the figure, the peeled reinforcing plate 3A is vacuum-adsorbed and held by the flexible plate 64, and the panel 62 is vacuum-adsorbed and held by the flexible plate 22. Moreover, in order to insert the conveying device 60 shown in FIG. 14(a) between the flexible plate 22 and the flexible plate 64, the flexible plate 22 and the flexible plate 64 are moved in advance to a relatively sufficient retreat. position.

然後,先解除可撓性板22之真空吸附。其次,藉由搬送裝置60之吸附墊58、58…吸附並保持面板62。接著,藉由搬送裝置60將面板62自剝離裝置20搬出。 Then, the vacuum adsorption of the flexible sheet 22 is first released. Next, the panel 62 is sucked and held by the adsorption pads 58, 58 of the transfer device 60. Next, the panel 62 is carried out from the peeling device 20 by the conveying device 60.

圖18(b)係將補強板3A自可撓性板64交接至可撓性板22之狀態之剝離裝置20的側視圖。即,使可撓性板64朝向可撓性板22下降移動,於補強板3A載置於可撓性板22之時候解除可撓性板64之吸附保持,然後使可撓性板64退避移動至充分離開可撓性板22之位置。 18(b) is a side view of the peeling device 20 in a state where the reinforcing plate 3A is transferred from the flexible plate 64 to the flexible plate 22. That is, the flexible plate 64 is moved downward toward the flexible plate 22, and when the reinforcing plate 3A is placed on the flexible plate 22, the suction and holding of the flexible plate 64 is released, and then the flexible plate 64 is retracted and moved. To the position where the flexible plate 22 is sufficiently separated.

圖18(c)係即將搬出補強板3A前之狀態之剝離裝置20之側視圖。然後,藉由圖14(a)所示之搬送裝置60吸附並保持補強板3A,自剝離裝置20搬出補強板3A。 Fig. 18 (c) is a side view of the peeling device 20 in a state immediately before the reinforcing plate 3A is carried out. Then, the reinforcing plate 3A is sucked and held by the conveying device 60 shown in Fig. 14 (a), and the reinforcing plate 3A is carried out from the peeling device 20.

以上係積層體6相對於剝離裝置20之搬入步驟、剝離步驟、搬出 步驟。 The above-described carrying step of the laminated body 6 with respect to the peeling device 20, the peeling step, and the carrying out step.

以上,對本發明之較佳形態進行了說明,但本發明並不限定於上述形態。可不脫離本發明之範圍而對上述形態施加各種變形及置換。 Although the preferred embodiments of the present invention have been described above, the present invention is not limited to the above embodiments. Various modifications and substitutions can be made to the above-described embodiments without departing from the scope of the invention.

本申請係基於2012年12月18日申請之日本專利申請案2012-275538者,其內容以參照之方式併入本文。 The present application is based on Japanese Patent Application No. 2012-275538, filed on Dec.

1‧‧‧積層板 1‧‧‧ laminate

2‧‧‧基板 2‧‧‧Substrate

8、9‧‧‧角部 8, 9‧‧‧ corner

10‧‧‧剝離區域 10‧‧‧ Stripped area

11‧‧‧未剝離區域 11‧‧‧Unpeeled area

12‧‧‧剝離範圍 12‧‧‧Extraction range

13‧‧‧龜裂 13‧‧‧ crack

D、P‧‧‧箭頭 D, P‧‧‧ arrows

E‧‧‧剝離前線 E‧‧‧ peeling front line

F、G‧‧‧交點 F, G‧‧‧ intersection

H‧‧‧直線 H‧‧‧ Straight line

J、K‧‧‧接線 J, K‧‧‧ wiring

N‧‧‧切線 N‧‧‧ tangent

θ‧‧‧角度 Θ‧‧‧ angle

Claims (6)

一種基板之剝離裝置,其係將基板、與補強上述基板之補強板之界面沿自一端側朝向另一端側之剝離行進方向依序剝離者,該剝離裝置之特徵在於具備剝離機構,該剝離機構於將剝離上述界面之剝離區域與未剝離區域之邊界線和上述基板之外周之2個交點連結而成之直線、與上述剝離區域之上述基板之外周之接線所成之角度為至少90度以下之剝離範圍內,以上述邊界線之端部之切線、與上述剝離區域之上述基板之外周之接線所成之角度大於90度的方式剝離上述界面;且上述剝離機構具備:支持機構,其支持包含上述基板及上述補強板之積層體之第1主面;可撓性板,其具有吸附並保持上述積層體之第2主面之外緣之第1吸附面、及吸附並保持除上述外緣以外之第2主面之第2吸附面,且上述第2吸附面係相對於上述第2主面平行之面,上述第1吸附面係相對於上述第2吸附面而突出特定量之突出面;複數之可動體,其等空開間隔而固定於上述可撓性板,且相對於上述支持機構而可獨立地移動;及控制機構,其使位於上述剝離行進方向之上述一端側之上述可動體至位於上述剝離行進方向之另一端側的上述可動體,向離開上述支持機構之方向依序移動。 A peeling device for a substrate, wherein an interface between a substrate and a reinforcing plate for reinforcing the substrate is sequentially peeled off from a one end side toward a other end side, and the peeling device is characterized in that a peeling mechanism is provided, and the peeling mechanism is provided a straight line connecting the boundary line between the peeled region and the unpeeled region of the interface and the intersection of the outer periphery of the substrate, and an angle formed by the wire on the outer periphery of the substrate in the peeling region is at least 90 degrees or less In the peeling range, the interface is peeled off such that a tangent to an end portion of the boundary line and an angle of an outer circumference of the substrate in the peeling region is greater than 90 degrees; and the peeling mechanism includes a support mechanism that supports a first main surface including the laminate of the substrate and the reinforcing plate; and a flexible plate having a first adsorption surface that adsorbs and holds an outer edge of the second main surface of the laminate, and adsorbs and holds the above a second adsorption surface of the second main surface other than the edge, and the second adsorption surface is parallel to the second main surface, and the first adsorption surface is opposite to the upper surface a second surface of the second adsorption surface that protrudes by a specific amount; the plurality of movable bodies are fixed to the flexible plate at intervals, and are independently movable with respect to the support mechanism; and a control mechanism The movable body located on the one end side of the peeling traveling direction is moved to the movable body located on the other end side in the peeling traveling direction in a direction away from the support mechanism. 如請求項1之基板之剝離裝置,其中上述基板係厚度為0.2mm以下之玻璃基板。 A peeling device for a substrate according to claim 1, wherein the substrate has a thickness of 0.2 mm or less. 一種基板之剝離方法,其係將基板、與補強上述基板之補強板 之界面沿自一端側朝向另一端側之剝離行進方向依序剝離者,該剝離方法之特徵在於:於將剝離上述界面之剝離區域與未剝離區域之邊界線和上述基板之外周之2個交點連結而成之直線、與上述剝離區域之上述基板之外周之接線所成之角度為至少90度以下之剝離範圍內,以上述邊界線之端部之切線、與上述剝離區域之上述基板之外周之接線所成之角度大於90度的方式藉由剝離機構剝離上述界面;且藉由上述剝離機構而進行之剝離方法具備:支持機構,其支持包含上述基板及上述補強板之積層體之第1主面;可撓性板,其具有吸附並保持上述積層體之第2主面之外緣之第1吸附面、及吸附並保持除上述外緣以外之第2主面之第2吸附面,且上述第2吸附面係相對於上述第2主面平行之面,上述第1吸附面係相對於上述第2吸附面突出特定量之突出面;及複數之可動體,其等空開間隔而固定於上述可撓性板,且相對於上述支持機構而可獨立地移動;且藉由控制機構使位於上述剝離行進方向之上述一端側之上述可動體至位於上述剝離行進方向之另一端側的上述可動體,向離開上述支持機構之方向依序移動。 A method for peeling off a substrate, which is a substrate, and a reinforcing plate for reinforcing the substrate The interface is sequentially peeled off in the peeling traveling direction from the one end side toward the other end side, and the peeling method is characterized in that the boundary line between the peeled region and the unpeeled region where the interface is peeled off and the outer periphery of the substrate are separated a line formed by the connection, and an angle formed by the outer periphery of the substrate in the peeling region is at least 90 degrees or less, and a tangent to an end portion of the boundary line and an outer circumference of the substrate in the peeling region The peeling mechanism peels off the interface by an angle of more than 90 degrees, and the peeling method by the peeling mechanism includes a support mechanism that supports the first layer of the laminate including the substrate and the reinforcing plate a main surface; a flexible plate having a first adsorption surface that adsorbs and holds the outer edge of the second main surface of the laminate; and a second adsorption surface that adsorbs and holds the second main surface other than the outer edge. Further, the second adsorption surface is a surface parallel to the second main surface, and the first adsorption surface protrudes by a specific amount of the protruding surface with respect to the second adsorption surface; and the plurality of movable surfaces are movable And the movable plate is fixed to the flexible plate at intervals, and is independently movable with respect to the support mechanism; and the movable body located on the one end side of the peeling traveling direction is located at the peeling by a control mechanism The movable body on the other end side in the traveling direction moves in the direction away from the support mechanism. 如請求項3之基板之剝離方法,其中上述基板係厚度為0.2mm以下之玻璃基板。 The method of peeling off a substrate according to claim 3, wherein the substrate has a thickness of 0.2 mm or less. 一種電子元件之製造方法,其具有於經補強板補強之基板之正面形成功能層之功能層成形步驟、將形成有上述功能層之上述基板與上述補強板剝離之剝離步驟,該製造方法之特徵在於:上述剝離步驟係如下步驟:藉由支持機構支持包含上述基板 及上述補強板之積層體之第1主面,並且控制空開間隔而固定於吸附並保持上述積層體之第2主面之可撓性板的複數之可動體之相對於上述支持機構之移動,將上述基板與上述補強板之界面沿自一端側朝向另一端側之剝離行進方向依序剝離,且上述可撓性板具有吸附並保持上述積層體之第2主面之外緣之第1吸附面、及吸附並保持除上述外緣以外之第2主面之第2吸附面,上述第2吸附面係相對於上述第2主面平行之面,上述第1吸附面具備相對於上述第2吸附面突出特定量之突出面;於將剝離上述界面之剝離區域與未剝離區域之邊界線和上述基板之外周之2個交點連結而成之直線、與上述剝離區域之上述基板之外周之接線所成之角度為至少90度以下之剝離範圍內,以上述邊界線之端部之切線、與上述剝離區域之上述基板之外周之接線所成之角度大於90度的方式將上述界面剝離。 A method for producing an electronic component, comprising: a functional layer forming step of forming a functional layer on a front surface of a substrate reinforced by a reinforcing plate; and a peeling step of peeling the substrate on which the functional layer is formed and the reinforcing plate, and a feature of the manufacturing method The above peeling step is a step of supporting the substrate including the support by a support mechanism And a first main surface of the laminated body of the reinforcing plate, and a movement of the plurality of movable bodies fixed to the flexible plate that adsorbs and holds the second main surface of the laminated body with respect to the support mechanism The interface between the substrate and the reinforcing plate is sequentially peeled off from the one end side toward the other end side, and the flexible plate has the first outer edge of the second main surface that adsorbs and holds the laminated body. An adsorption surface, and a second adsorption surface that adsorbs and holds the second main surface other than the outer edge, wherein the second adsorption surface is parallel to the second main surface, and the first adsorption surface is provided with respect to the first surface (2) the adsorption surface protrudes by a specific amount of the protruding surface; a line connecting the boundary line between the peeled region and the unpeeled region of the interface and the intersection of the outer periphery of the substrate; and the outer periphery of the substrate in the peeling region The angle formed by the wiring is at least 90 degrees or less, and the angle between the end of the boundary line and the connection of the outer periphery of the substrate in the peeling area is greater than 90 degrees. Said interfacial peeling. 如請求項5之電子元件之製造方法,其中上述基板係厚度為0.2mm以下之玻璃基板。 The method of producing an electronic component according to claim 5, wherein the substrate is a glass substrate having a thickness of 0.2 mm or less.
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