TW201319664A - Peeling device, and manufacturing method of electronic device - Google Patents

Peeling device, and manufacturing method of electronic device Download PDF

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Publication number
TW201319664A
TW201319664A TW101132410A TW101132410A TW201319664A TW 201319664 A TW201319664 A TW 201319664A TW 101132410 A TW101132410 A TW 101132410A TW 101132410 A TW101132410 A TW 101132410A TW 201319664 A TW201319664 A TW 201319664A
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Taiwan
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peeling
plate
interface
substrate
movable
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TW101132410A
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Chinese (zh)
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Kei Takiuchi
Yasunori Ito
Hiroshi Utsugi
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Asahi Glass Co Ltd
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B43/00Operations specially adapted for layered products and not otherwise provided for, e.g. repairing; Apparatus therefor
    • B32B43/006Delaminating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B38/00Ancillary operations in connection with laminating processes
    • B32B38/10Removing layers, or parts of layers, mechanically or chemically
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Abstract

The invention relates to a peeling device, which sequentially peels an interface of a substrate and a reinforcing plate which reinforces the substrate from one end side to the other end side, comprising: a support mechanism, for supporting a first main surface of a laminating body including the above-mentioned substrate and the reinforcing plate; a flexible plate, which sucks a second main surface of the above-mentioned laminating body; a plurality of movable bodies, which are spaced apart and fixed onto said flexible plate, and independently move with respect to the support mechanism; and a control device, which controls the movement of said the plurality of movable bodies. Furthermore, the control device controls movement of the plurality of movable bodies so that a boundary line of a portion where the interface is peeled and a portion where the interface is not peeled is curved to protrude backward in the direction of movement, when the linear distance between both ends of the boundary line is longest.

Description

剝離裝置、及電子裝置之製造方法 Stripping device, and method of manufacturing the same

本發明係關於一種將基板與加強板剝離之剝離裝置、及電子裝置之製造方法。 The present invention relates to a peeling device for peeling a substrate from a reinforcing plate, and a method of manufacturing the electronic device.

伴隨顯示面板、太陽電池、薄膜充電電池等電子裝置之薄型化、輕量化,要求電子裝置中使用之基板之薄板化。若基板變薄,則基板之操作性變差,因此變得難以於基板上形成電子裝置用功能層(例如薄膜電晶體、彩色濾光片)。 With the reduction in thickness and weight of electronic devices such as display panels, solar cells, and film rechargeable batteries, it is required to reduce the thickness of the substrate used in the electronic device. When the substrate is thinned, the handleability of the substrate is deteriorated, so that it is difficult to form a functional layer for an electronic device (for example, a thin film transistor or a color filter) on the substrate.

因此,開發有如下方法:於在藉由加強板而加強之基板上形成功能層後,從而將基板與加強板剝離(例如,參照專利文獻1)。使基板及加強板之至少一者撓曲變形,以使基板與加強板之界面自一端側向另一端側依次剝離。該撓曲變形係藉由如下方式實施:將至少一者吸附至可撓性板,從而使固定於可撓性板上之複數個可動體獨立地移動。 Therefore, there has been developed a method of peeling a substrate from a reinforcing plate after forming a functional layer on a substrate reinforced by a reinforcing plate (for example, refer to Patent Document 1). At least one of the substrate and the reinforcing plate is flexibly deformed so that the interface between the substrate and the reinforcing plate is sequentially peeled off from one end side to the other end side. The flexural deformation is carried out by adsorbing at least one of the plurality of movable bodies to the flexible plate so that the plurality of movable bodies fixed to the flexible plate are independently moved.

[先行技術文獻] [Advanced technical literature] [專利文獻] [Patent Literature]

[專利文獻1]國際公開第11/024689號說明書 [Patent Document 1] International Publication No. 11/024689

於剝離時,使基板及加強板中之至少一者撓曲變形,因此對至少一者施加負載。存在藉由該負載而至少一者自邊 緣龜裂之情形。 At the time of peeling, at least one of the substrate and the reinforcing plate is flexibly deformed, so that at least one of them is applied with a load. There is at least one self-side by the load The situation of cracking.

本發明係鑒於上述課題而完成者,目的在於提供一種可抑制剝離時之破損之剝離裝置、及電子裝置之製造方法。 The present invention has been made in view of the above problems, and an object thereof is to provide a peeling device capable of suppressing breakage during peeling and a method of manufacturing the electronic device.

為了解決上述目的,本發明之一態樣之剝離裝置係自一端側向另一端側依次剝離基板與加強該基板之加強板之界面者,其包括:支持機構,其支持包含上述基板及上述加強板之積層體之一主面;可撓性板,其支持上述積層體之另一主面;複數個可動體,其空開間隔而固定於該可撓性板上,可相對於上述支持機構獨立地移動;及控制裝置,其控制複數個可動體之移動;且上述控制裝置於已剝離上述界面之部分與未剝離上述界面之部分之邊界線的兩端間之直線距離成為最長時,以使上述邊界線成為於該邊界線之移動方向後方凸出之彎曲狀之方式,控制上述複數個可動體之移動。 In order to achieve the above object, a stripping device according to an aspect of the present invention is an interface for sequentially peeling a substrate from a one end side to a other end side and reinforcing a reinforcing plate of the substrate, comprising: a supporting mechanism supporting the substrate and the reinforcing a main surface of the laminated body of the board; a flexible board supporting the other main surface of the laminated body; and a plurality of movable bodies fixed to the flexible board at intervals, relative to the support mechanism Moving independently; and a control device that controls movement of the plurality of movable bodies; and wherein the control device has the longest linear distance between the ends of the boundary line between the portion where the interface has been peeled off and the portion where the interface is not peeled off, The movement of the plurality of movable bodies is controlled such that the boundary line is curved in a direction in which the boundary line moves rearward.

較佳為,於本發明之剝離裝置中,上述複數個可動體於剝離開始前自相對於上述界面垂直之方向觀察時,配置於上述界面之外周之內側附近、該外周上、或較該外周更外側,於上述複數個可動體中配置於上述界面之剝離開始端之前方的複數個上述可動體中,距上述界面之剝離開始端之特定方向上之距離較短的上述可動體係先於上述距離較長 之上述可動體而相對於上述支持機構離開。 Preferably, in the peeling device of the present invention, the plurality of movable bodies are disposed in the vicinity of the inner side of the outer periphery of the interface, on the outer circumference, or on the outer circumference when viewed from a direction perpendicular to the interface before the start of peeling. Further, in the plurality of movable bodies disposed in the plurality of movable bodies before the peeling start end of the interface, the movable system having a short distance from a specific direction of the peeling start end of the interface precedes the Longer distance The movable body is separated from the support mechanism.

較佳為,於本發明之剝離裝置中,於剝離開始前自相對於上述界面垂直之方向觀察時,距上述界面之剝離開始端之特定方向上之距離相同的3個以上之上述可動體中兩端之上述可動體,配置於上述界面的外周之內側附近、該外周上、或較該外周更外側,其餘之上述可動體配置於較該外周更內側,上述兩端之可動體係先於上述其餘之可動體而相對於上述支持機構離開。 Preferably, in the peeling device of the present invention, when viewed from a direction perpendicular to the interface before the start of peeling, among the three or more movable bodies having the same distance in a specific direction from the peeling start end of the interface The movable body at both ends is disposed near the inner side of the outer periphery of the interface, on the outer circumference, or outside the outer circumference, and the remaining movable body is disposed further inside the outer circumference, and the movable systems at the both ends are preceded by the The remaining movable bodies are separated from the support mechanism described above.

較佳為,於本發明之剝離裝置中,上述可撓性板包含吸附上述積層體之第2主面之吸附部、及支持該吸附部之基體板,該基體板之彎曲剛性高於上述吸附部之彎曲剛性,於上述基體板之表面,設置於上述邊界線之移動方向後方凸出之彎曲槽。 Preferably, in the peeling device of the present invention, the flexible plate includes an adsorption portion that adsorbs the second main surface of the laminate, and a base plate that supports the adsorption portion, and the bending rigidity of the base plate is higher than the adsorption. The bending rigidity of the portion is provided on the surface of the base plate, and is provided in a curved groove that protrudes rearward in the moving direction of the boundary line.

較佳為,於本發明之剝離裝置中,上述可撓性板包含吸附上述積層體之第2主面之吸附部、及支持該吸附部之基體板,該基體板之彎曲剛性高於上述吸附部之彎曲剛性,上述基體板係一體地包含板狀部及包圍該板狀部之外框部,上述外框部之厚度厚於上述板狀部之厚度。 Preferably, in the peeling device of the present invention, the flexible plate includes an adsorption portion that adsorbs the second main surface of the laminate, and a base plate that supports the adsorption portion, and the bending rigidity of the base plate is higher than the adsorption. The bending rigidity of the portion, the base plate integrally includes a plate portion and a frame portion surrounding the plate portion, and the thickness of the outer frame portion is thicker than the thickness of the plate portion.

又,本發明之其他態樣之電子裝置之製造方法包括於以加強板加強之基板上形成功能層之步驟,及將形成有上述功能層之上述基板與上述加強板剝離之步驟,且將上述基板與上述加強板剝離之步驟係如下之步驟:藉由支持機構支持包含上述基板及上述加強板之積層體之第 1主面,並且對空開間隔而固定於吸附上述積層體之第2主面之可撓性板上之複數個可動體相對於上述支持機構的移動進行控制,而自一端側向另一端側依次剝離上述基板與上述加強板之界面;且於已剝離上述界面之部分與未剝離上述界面之部分之邊界線的兩端間之直線距離成為最長時,以使上述邊界線成為於該邊界線之移動方向後方凸出之彎曲狀之方式,控制上述複數個可動體之移動。 Moreover, a method of manufacturing an electronic device according to another aspect of the present invention includes the steps of forming a functional layer on a substrate reinforced by a reinforcing plate, and separating the substrate on which the functional layer is formed from the reinforcing plate, and The step of peeling the substrate from the reinforcing plate is a step of supporting a laminate including the substrate and the reinforcing plate by a supporting mechanism a main surface, and a plurality of movable bodies fixed to a flexible plate that adsorbs the second main surface of the laminated body are controlled to move relative to the support mechanism, and from one end side to the other end side Interlacing the interface between the substrate and the reinforcing plate in sequence; and when the linear distance between the two ends of the boundary line between the portion where the interface has been peeled off and the portion where the interface is not peeled off is the longest, the boundary line is formed as the boundary line The movement of the plurality of movable bodies is controlled in such a manner that the moving direction is convex at the rear.

較佳為,於本發明之電子裝置之製造方法中,上述複數個可動體於剝離開始前自相對於上述界面垂直之方向觀察時,配置於上述界面之外周之內側附近、該外周上、或較該外周更外側,於上述複數個可動體中配置於上述界面之剝離開始端之前方的複數個上述可動體中,距上述界面之剝離開始端之特定方向上之距離較短的上述可動體係先於上述距離較長之上述可動體而相對於上述支持機構離開。 Preferably, in the method of manufacturing an electronic device of the present invention, the plurality of movable bodies are disposed near the inner side of the outer periphery of the interface, on the outer circumference, or when viewed from a direction perpendicular to the interface before the start of peeling, or The plurality of movable bodies disposed in the plurality of movable bodies before the peeling start end of the interface are shorter than the outer circumference, and the movable system having a short distance in a specific direction from the peeling start end of the interface The movable body having a longer distance is separated from the support mechanism.

較佳為,於本發明之電子裝置之製造方法中,於剝離開始前自相對於上述界面垂直之方向觀察時,距上述界面之剝離開始端之特定方向上之距離相同的3個以上之上述可動體中兩端之上述可動體,配置於上述界面的外周之內側附近、該外周上、或較該外周更外側,其餘之上述可動體配置於較該外周更內側,上述兩端之可動體係先於上述其餘之可動體而相對於上述支持機構離開。 Preferably, in the method of manufacturing an electronic device according to the present invention, when viewed from a direction perpendicular to the interface before the start of peeling, three or more of the above-mentioned distances from the peeling start end of the interface in the specific direction are the same. The movable body at both ends of the movable body is disposed near the inner side of the outer periphery of the interface, on the outer circumference, or outside the outer circumference, and the remaining movable body is disposed on the inner side of the outer circumference, and the movable systems at the both ends are The remaining movable body is separated from the support mechanism before the remaining movable body.

較佳為,於本發明之電子裝置之製造方法中,上述可撓性板包含吸附上述積層體之第2主面之吸附部、及支持該吸附部之基體板,該基體板之彎曲剛性高於上述吸附部之彎曲剛性,於上述基體板之表面,設置於上述邊界線之移動方向後方凸出之彎曲槽。 Preferably, in the method of manufacturing an electronic device of the present invention, the flexible plate includes an adsorption portion that adsorbs the second main surface of the laminate, and a base plate that supports the adsorption portion, and the base plate has high bending rigidity. The bending rigidity of the adsorption portion is provided on a surface of the base plate at a curved groove that protrudes rearward in a moving direction of the boundary line.

較佳為,於本發明之電子裝置之製造方法中,上述可撓性板包含吸附上述積層體之第2主面之吸附部、及支持該吸附部之基體板,該基體板之彎曲剛性高於上述吸附部之彎曲剛性,上述基體板係一體地具有板狀部及包圍該板狀部之外框部,上述外框部之厚度厚於上述板狀部之厚度。 Preferably, in the method of manufacturing an electronic device of the present invention, the flexible plate includes an adsorption portion that adsorbs the second main surface of the laminate, and a base plate that supports the adsorption portion, and the base plate has high bending rigidity. In the bending rigidity of the adsorption portion, the base plate integrally has a plate-like portion and a frame portion surrounding the plate-like portion, and the thickness of the outer frame portion is thicker than the thickness of the plate-like portion.

根據本發明,提供一種可抑制剝離時之破損之剝離裝置、及電子裝置之製造方法。 According to the present invention, there is provided a peeling device capable of suppressing breakage during peeling and a method of manufacturing the electronic device.

以下,參照圖式,對用以實施本發明之形態進行說明。於各圖式中,對相同或對應之構成標示相同或對應之符號而省略說明。 Hereinafter, embodiments for carrying out the invention will be described with reference to the drawings. In the respective drawings, the same or corresponding components are designated by the same or corresponding reference numerals, and the description is omitted.

[第1實施形態] [First Embodiment]

本實施形態之電子裝置之製造方法具有如下步驟:為了與電子裝置中使用之基板之薄板化對應,而於由加強板而加強之基板上形成功能層之步驟;及將形成有功能層之基板與加強板剝離之步驟。加強板不會成為電子裝置之一部 分。 The method for manufacturing an electronic device according to the present embodiment includes the steps of forming a functional layer on a substrate reinforced by a reinforcing plate in accordance with a thinning of a substrate used in the electronic device, and a substrate on which the functional layer is formed The step of peeling off the reinforcing plate. The reinforcing plate will not become part of the electronic device Minute.

此處,所謂電子裝置係指顯示面板、太陽電池、薄膜充電電池等電子零件。顯示面板包含液晶面板(LCD(Liquid Crystal Display,液晶顯示裝置))或電漿面板(PDP,Plasma Display Panel)、有機EL(Electro Luminescence,電致發光)面板(OLED(Organic Light Emitting Diode,有機發光二極體))。 Here, the electronic device refers to an electronic component such as a display panel, a solar cell, or a thin film rechargeable battery. The display panel includes a liquid crystal panel (LCD (Liquid Crystal Display)) or a plasma panel (PDP), and an organic EL (Electro Luminescence) panel (OLED (Organic Light Emitting Diode). Diode)).

(積層板) (Laminated board)

圖1係供至電子裝置之製造步驟之積層板之側視圖。積層板1包含基板2、及加強基板2之加強板3。 1 is a side view of a laminate supplied to a manufacturing step of an electronic device. The laminate 1 includes a substrate 2 and a reinforcing plate 3 of the reinforcing substrate 2.

(基板) (substrate)

於電子裝置之製造步驟之中途,在基板2上形成特定之功能層(例如,導電層)。 A specific functional layer (for example, a conductive layer) is formed on the substrate 2 in the middle of the manufacturing process of the electronic device.

基板2係例如為玻璃基板、陶瓷基板、樹脂基板、金屬基板、或半導體基板等。該等之中,玻璃基板係耐化學品性、耐透濕性優異,且線膨脹係數較小,因此較佳。線膨脹係數越小,於高溫下形成之功能層之圖案於冷卻時越難以偏移。 The substrate 2 is, for example, a glass substrate, a ceramic substrate, a resin substrate, a metal substrate, or a semiconductor substrate. Among these, the glass substrate is excellent in chemical resistance and moisture permeability resistance, and has a small coefficient of linear expansion. The smaller the coefficient of linear expansion, the more difficult it is to shift the pattern of the functional layer formed at high temperatures during cooling.

作為玻璃基板之玻璃,並無特別限定,但例如可列舉無鹼玻璃、硼矽酸玻璃、鹼石灰玻璃、高矽玻璃、以其他氧化矽為主要之成分之氧化物系玻璃等。作為氧化物系玻璃,較佳為利用氧化物換算之氧化矽之含量為40~90質量%之玻璃。 The glass of the glass substrate is not particularly limited, and examples thereof include alkali-free glass, borosilicate glass, soda lime glass, sorghum glass, and oxide-based glass containing other cerium oxide as a main component. The oxide-based glass is preferably a glass having a content of cerium oxide in an amount of 40 to 90% by mass in terms of oxide.

作為玻璃基板之玻璃,較佳為採用適於電子裝置之種類 或其製造步驟之玻璃。例如,液晶面板用玻璃基板係較佳為包含實質上不包含鹼金屬成分之玻璃(無鹼玻璃)。如上所述,玻璃基板之玻璃係基於適用之電子裝置之種類及其製造步驟而適當選擇。 As the glass of the glass substrate, it is preferable to adopt a type suitable for an electronic device. Or the glass of its manufacturing steps. For example, the glass substrate for liquid crystal panels preferably contains glass (alkali-free glass) which does not substantially contain an alkali metal component. As described above, the glass of the glass substrate is appropriately selected depending on the type of the electronic device to be used and the manufacturing steps thereof.

樹脂基板之樹脂可為結晶性樹脂,亦可為非晶性樹脂,並無特別限定。 The resin of the resin substrate may be a crystalline resin or an amorphous resin, and is not particularly limited.

作為結晶性樹脂,例如可列舉作為熱塑性樹脂之聚醯胺、聚縮醛、聚對苯二甲酸丁二酯、聚對苯二甲酸乙二酯、聚萘二甲酸乙二酯、或者間規聚苯乙烯等,熱硬化性樹脂係可列舉聚苯硫醚、聚醚醚酮、液晶聚合物、氟樹脂、或者聚醚腈等。 Examples of the crystalline resin include polyamine, thermoplastic acetal, polybutylene terephthalate, polyethylene terephthalate, polyethylene naphthalate, or syndiotactic polymerization as a thermoplastic resin. Examples of the thermosetting resin such as styrene include polyphenylene sulfide, polyether ether ketone, liquid crystal polymer, fluororesin, or polyether nitrile.

作為非晶性樹脂,例如可列舉作為熱塑性樹脂之聚碳酸酯、改性聚苯醚、聚環己烯、或者聚降冰片烯系樹脂等,熱硬化性樹脂係可列舉聚碸、聚醚碸、聚芳酯、聚醯胺醯亞胺、聚醚醯亞胺、或者熱塑性聚醯亞胺。 Examples of the amorphous resin include polycarbonate, modified polyphenylene ether, polycyclohexene, and polynorbornene-based resin which are thermoplastic resins, and examples of the thermosetting resin include polyfluorene and polyether oxime. , polyarylate, polyamidoximine, polyether quinone imine, or thermoplastic polyimine.

作為樹脂基板之樹脂,特佳為非晶性且熱塑性之樹脂。 As the resin of the resin substrate, a resin which is amorphous and thermoplastic is particularly preferable.

基板2之厚度係根據基板2之種類而設定。例如,於玻璃基板之情形時,為了電子裝置之輕量化、薄板化,較佳為0.7 mm以下,更佳為0.3 mm以下,進而較佳為0.1 mm以下。於0.3 mm以下之情形時,可對玻璃基板賦予良好之可撓性。於0.1 mm以下之情形時,可將玻璃基板捲取成輥狀。又,玻璃基板之厚度係因玻璃基板之製造較為容易、玻璃基板之使用較為容易等原因,較佳為0.03 mm以上。 The thickness of the substrate 2 is set according to the type of the substrate 2. For example, in the case of a glass substrate, in order to reduce the weight and thickness of the electronic device, it is preferably 0.7 mm or less, more preferably 0.3 mm or less, still more preferably 0.1 mm or less. When it is 0.3 mm or less, good flexibility can be imparted to the glass substrate. When the thickness is 0.1 mm or less, the glass substrate can be wound into a roll shape. Further, the thickness of the glass substrate is preferably 0.03 mm or more because the glass substrate is easily produced and the glass substrate is easily used.

(加強板) (Reinforcing plate)

加強板3係若密接至基板2,則加強基板2直至進行剝離操作為止。加強板3係於功能層之形成後,在電子裝置之製造步驟之中途自基板2剝離,從而不會成為電子裝置之一部分。再者,於本說明書中,所謂「密接」係指加強板3與基板2基本上僅藉由凡得瓦力而結合之狀態,且係指未產生投錨效應或化學鍵結之狀態。 When the reinforcing plate 3 is in close contact with the substrate 2, the substrate 2 is reinforced until the peeling operation is performed. After the formation of the functional layer, the reinforcing plate 3 is peeled off from the substrate 2 in the middle of the manufacturing process of the electronic device, so that it does not become a part of the electronic device. In the present specification, the term "close contact" means a state in which the reinforcing plate 3 and the substrate 2 are substantially joined by only the wattage force, and means that the anchoring effect or the chemical bonding is not generated.

為了抑制因溫度變化引起之翹曲或剝離,加強板3較佳為與基板2之線膨脹係數差之絕對值較小者。於基板2為玻璃基板之情形時,加強板3較佳為包含玻璃板者。該玻璃板之玻璃較佳為與玻璃基板之玻璃為相同之種類。 In order to suppress warpage or peeling due to temperature change, the reinforcing plate 3 preferably has a smaller absolute value of the difference in linear expansion coefficient from the substrate 2. In the case where the substrate 2 is a glass substrate, the reinforcing plate 3 preferably includes a glass plate. The glass of the glass plate is preferably of the same type as the glass of the glass substrate.

加強板3具備支持板4、及形成於支持板4上之樹脂層5。藉由作用於樹脂層5與基板2之間之凡得瓦力或樹脂層5之黏著力等,而可剝離地結合樹脂層5與基板2。 The reinforcing plate 3 is provided with a support plate 4 and a resin layer 5 formed on the support plate 4. The resin layer 5 and the substrate 2 are peelably bonded by the van der Waals force acting between the resin layer 5 and the substrate 2 or the adhesion of the resin layer 5 or the like.

再者,本實施形態之加強板3係由支持板4與樹脂層5構成,但亦可僅由支持板4構成。藉由作用於支持板4與基板2之間之凡得瓦力等,而可剝離地結合支持板4與基板2。亦可於支持板4之表面上形成無機薄膜,以使作為支持板4之玻璃板、與作為基板2之玻璃基板不會於高溫下接著。又,亦可藉由在支持板4之表面上設置表面粗糙度不同之區域等,而於支持板4與基板2之界面設置結合力不同之區域。 Further, the reinforcing plate 3 of the present embodiment is composed of the support plate 4 and the resin layer 5, but may be constituted only by the support plate 4. The support plate 4 and the substrate 2 are detachably bonded by acting on the van der Waals force or the like between the support plate 4 and the substrate 2. An inorganic thin film may be formed on the surface of the support plate 4 so that the glass plate as the support plate 4 and the glass substrate as the substrate 2 are not subjected to high temperature. Further, by providing an area having a different surface roughness on the surface of the support plate 4, an interface having a different bonding force may be provided at the interface between the support plate 4 and the substrate 2.

又,本實施形態之加強板3係由支持板4與樹脂層5構成,但支持板4亦可為複數個。相同地,樹脂層5亦可為複數個。 Further, the reinforcing plate 3 of the present embodiment is composed of the support plate 4 and the resin layer 5, but the plurality of the support plates 4 may be plural. Similarly, the resin layer 5 may be plural.

(支持板) (support board)

支持板4係介隔樹脂層5而支持加強基板2。支持板4係防止基板2於電子裝置之製造步驟中之變形、劃傷、破損等。 The support plate 4 supports the reinforcing substrate 2 by interposing the resin layer 5 . The support board 4 prevents deformation, scratches, breakage, and the like of the substrate 2 in the manufacturing steps of the electronic device.

支持板4例如為玻璃板、陶瓷板、樹脂板、半導體板、或金屬板等。支持板4之種類係根據電子裝置之種類或基板2之種類等而選定。若支持板4與基板2為同種,則因溫度變化引起之翹曲或剝離減少。 The support plate 4 is, for example, a glass plate, a ceramic plate, a resin plate, a semiconductor plate, or a metal plate. The type of the support board 4 is selected depending on the type of the electronic device, the type of the substrate 2, and the like. If the support plate 4 and the substrate 2 are of the same kind, warpage or peeling due to temperature change is reduced.

支持板4與基板2之平均線膨脹係數之差(絕對值)係根據基板2之尺寸形狀等而適當設定,但較佳為例如35×10-7/℃以下。此處,所謂「平均線膨脹係數」係指50~300℃之溫度範圍內之平均線膨脹係數(JIS(Japanese Industrial Standards,日本工業標準)R 3102:1995)。 The difference (absolute value) between the average linear expansion coefficients of the support plate 4 and the substrate 2 is appropriately set depending on the size and shape of the substrate 2, but is preferably, for example, 35 × 10 -7 / ° C or less. Here, the "average linear expansion coefficient" means an average linear expansion coefficient in a temperature range of 50 to 300 ° C (JIS (Japanese Industrial Standards) R 3102: 1995).

支持板4之厚度係例如為0.7 mm以下。又,為了加強基板2,支持板4之厚度較佳為0.4 mm以上。支持板4之厚度可厚於基板2,亦可薄於基板2。 The thickness of the support plate 4 is, for example, 0.7 mm or less. Further, in order to reinforce the substrate 2, the thickness of the support plate 4 is preferably 0.4 mm or more. The thickness of the support plate 4 may be thicker than the substrate 2 or thinner than the substrate 2.

支持板4之外形較佳如圖1所示般與樹脂層5之外形相同、或大於樹脂層5之外形,以便支持板4可支持樹脂層5之整體。 The outer shape of the support plate 4 is preferably the same as the outer shape of the resin layer 5 or larger than the outer shape of the resin layer 5 as shown in Fig. 1, so that the support plate 4 can support the entirety of the resin layer 5.

(樹脂層) (resin layer)

樹脂層5係當密接於基板2時防止基板2之位置偏移,直至進行剝離操作為止。樹脂層5係藉由剝離操作而容易地自基板2剝離。藉由容易地剝離基板2,可防止基板2之破損,又,可防止在非意圖之位置(樹脂層5與支持板4之間) 之剝離。 The resin layer 5 prevents the positional displacement of the substrate 2 when it is in close contact with the substrate 2 until the peeling operation is performed. The resin layer 5 is easily peeled off from the substrate 2 by a peeling operation. By easily peeling off the substrate 2, damage of the substrate 2 can be prevented, and at an unintended position (between the resin layer 5 and the support plate 4) can be prevented. Stripping.

樹脂層5係以使與支持板4之結合力與基板2之結合力相比相對變高之方式形成。藉此,於進行剝離操作時,可防止積層板1在非意圖之位置(樹脂層5與支持板4之間)剝離。 The resin layer 5 is formed such that the bonding force with the support plate 4 is relatively higher than the bonding strength of the substrate 2. Thereby, it is possible to prevent the laminated board 1 from being peeled off at an unintended position (between the resin layer 5 and the support sheet 4) at the time of performing the peeling operation.

樹脂層5之樹脂並無特別限定。例如,作為樹脂層5之樹脂,可列舉丙烯酸樹脂、聚烯烴樹脂、聚胺基甲酸酯樹脂、聚醯亞胺樹脂、聚矽氧樹脂、聚醯亞胺聚矽氧樹脂等。亦可混合使用數種樹脂。其中,就耐熱性或剝離性之觀點而言,較佳為聚矽氧樹脂、聚醯亞胺聚矽氧樹脂。 The resin of the resin layer 5 is not particularly limited. For example, examples of the resin of the resin layer 5 include an acrylic resin, a polyolefin resin, a polyurethane resin, a polyimide resin, a polyoxyn resin, a polyamidene polyoxy resin, and the like. Several resins can also be used in combination. Among them, from the viewpoint of heat resistance or peelability, a polydecene oxide resin or a polyamidene polyimide resin is preferable.

樹脂層5之厚度並無特別限定,但較佳為1~50 μm,更佳為4~20 μm。藉由將樹脂層5之厚度設為1 μm以上,於在樹脂層5與基板2之間混入有氣泡或異物之情形時,樹脂層5能夠以吸收氣泡或異物之厚度之方式變形。另一方面,若樹脂層5之厚度為50 μm以下,則可縮短樹脂層5之形成時間,再者不會使用超過必要量之樹脂層5之樹脂,故較為經濟。 The thickness of the resin layer 5 is not particularly limited, but is preferably 1 to 50 μm, more preferably 4 to 20 μm. When the thickness of the resin layer 5 is 1 μm or more, when a bubble or a foreign matter is mixed between the resin layer 5 and the substrate 2, the resin layer 5 can be deformed so as to absorb the thickness of bubbles or foreign matter. On the other hand, when the thickness of the resin layer 5 is 50 μm or less, the formation time of the resin layer 5 can be shortened, and the resin of the resin layer 5 exceeding a necessary amount is not used, which is economical.

樹脂層5之外形較佳如圖1所示般與基板2之外形相同、或大於基板2之外形,以便樹脂層5可密接基板2之整體。 The outer shape of the resin layer 5 is preferably the same as the outer shape of the substrate 2 or larger than the outer shape of the substrate 2 as shown in FIG. 1, so that the resin layer 5 can be in close contact with the entirety of the substrate 2.

再者,樹脂層5亦可包含2層以上。於該情形時,「樹脂層之厚度」意味著所有樹脂層之合計之厚度。 Further, the resin layer 5 may also contain two or more layers. In this case, the "thickness of the resin layer" means the total thickness of all the resin layers.

又,於樹脂層5包含2層以上之情形時,形成各層之樹脂之種類亦可不同。 Moreover, when the resin layer 5 contains two or more layers, the kind of the resin which forms each layer may differ.

(積層體) (layered body)

圖2係表示於電子裝置之製造步驟之中途製作之積層體 的側視圖。 2 is a view showing a laminate produced in the middle of a manufacturing process of an electronic device. Side view.

積層體6係於積層板1之基板2上形成導電層等功能層而成。功能層之種類係根據電子裝置之種類而選擇。亦可將複數個功能層依次積層於基板2上。作為功能層之形成方法使用一般之方法,例如可使用CVD(Chemical Vapor Deposition,化學氣相沈積)法或PVD(Physical Vapor Deposition,物理氣相沈積)法等蒸鍍法、濺鍍法等。功能層係藉由光微影法或蝕刻法而形成為特定之圖案。 The laminated body 6 is formed by forming a functional layer such as a conductive layer on the substrate 2 of the laminated board 1. The type of the functional layer is selected according to the type of the electronic device. A plurality of functional layers may be sequentially laminated on the substrate 2. As a method of forming the functional layer, a general method is used. For example, a vapor deposition method such as a CVD (Chemical Vapor Deposition) method or a PVD (Physical Vapor Deposition) method, a sputtering method, or the like can be used. The functional layer is formed into a specific pattern by photolithography or etching.

例如,積層體6依序具有加強板3A、基板2A、液晶層7、基板2B、及加強板3B。該積層體6係於LCD之製造步驟之中途製作者。於一基板2A上之液晶層7側之面,形成有未圖示之薄膜電晶體(TFT,Thin Film Transistor),於另一基板2B上之液晶層7側之面,形成有未圖示之彩色濾光片。 For example, the laminated body 6 has the reinforcing plate 3A, the substrate 2A, the liquid crystal layer 7, the substrate 2B, and the reinforcing plate 3B in this order. This laminated body 6 is produced by a maker in the middle of the manufacturing process of an LCD. A thin film transistor (TFT) (not shown) is formed on the surface of the substrate 2A on the liquid crystal layer 7 side, and a surface (not shown) is formed on the surface of the other substrate 2B on the liquid crystal layer 7 side. Color filter.

再者,本實施形態之積層體6係於兩側配置有加強板3A、3B之構成,但亦可為僅於單側配置有加強板之構成。例如,亦可省去液晶層7、基板2B、及加強板3B。 Further, the laminated body 6 of the present embodiment has a configuration in which the reinforcing plates 3A and 3B are disposed on both sides, but a reinforcing plate may be disposed only on one side. For example, the liquid crystal layer 7, the substrate 2B, and the reinforcing plate 3B may be omitted.

於剝離加強板3A、3B後,安裝背光等而獲得作為製品之LCD。於加強板3A、3B之剝離中,使用下文所述之剝離裝置。 After the reinforcing sheets 3A and 3B are peeled off, a backlight or the like is mounted to obtain an LCD as a product. In the peeling of the reinforcing sheets 3A, 3B, the peeling means described below is used.

(剝離裝置) (peeling device)

圖3係表示第1實施形態之剝離裝置之局部剖面圖。圖4係表示圖3之剝離裝置之動作例之局部剖面圖。 Fig. 3 is a partial cross-sectional view showing the peeling device of the first embodiment. Fig. 4 is a partial cross-sectional view showing an operation example of the peeling device of Fig. 3.

剝離裝置10係自一端側向另一端側依次剝離基板2與加 強板3之界面8。於剝離時,剝離界面8之部分、與未剝離界面8之部分之邊界線(以下,稱為「剝離前線」)9於特定方向上移動。以下,將剝離前線9之移動方向前方作為「前方」,且將剝離前線9之移動方向後方作為「後方」而進行說明。 The peeling device 10 sequentially peels the substrate 2 from the one end side to the other end side and adds The interface of the strong board 3 is 8. At the time of peeling, the boundary line between the portion of the peeling interface 8 and the portion of the non-peeling interface 8 (hereinafter referred to as "peeling front line") 9 is moved in a specific direction. Hereinafter, the front side in the moving direction of the peeling front line 9 will be referred to as "front side", and the rear side in the moving direction of the peeling front line 9 will be referred to as "rear side".

剝離裝置10係保持基板2,並且使加強板3撓曲變形而進行剝離。再者,剝離裝置10亦可保持加強板3,並且使基板2撓曲變形而進行剝離。 The peeling device 10 holds the substrate 2, and causes the reinforcing plate 3 to be flexibly deformed and peeled off. Further, the peeling device 10 can also hold the reinforcing plate 3 and deflect the substrate 2 to be peeled off.

剝離裝置10係由作為支持機構之平台20、可撓性板30、複數個可動體40、複數個桿60、複數個驅動裝置70、及控制裝置80等而構成。 The peeling device 10 is composed of a platform 20 as a supporting mechanism, a flexible plate 30, a plurality of movable bodies 40, a plurality of rods 60, a plurality of driving devices 70, a control device 80, and the like.

平台20係為了保持基板2而支持積層體6之第1主面6b。平台20係真空吸附積層體6之第1主面6b。再者,亦可進行靜電吸附或磁氣吸附來取代真空吸附。 The stage 20 supports the first main surface 6b of the laminated body 6 in order to hold the substrate 2. The stage 20 is the first main surface 6b of the vacuum adsorption laminate 6. Furthermore, electrostatic adsorption or magnetic gas adsorption may be performed instead of vacuum adsorption.

可撓性板30係為了使加強板3撓曲變形而吸附積層體6之第2主面6a。可撓性板30係真空吸附積層體6之第2主面6a。再者,亦可進行靜電吸附或磁氣吸附來取代真空吸附。 The flexible plate 30 absorbs the second main surface 6a of the laminated body 6 in order to flexure and deform the reinforcing plate 3. The flexible plate 30 is a second main surface 6a of the vacuum suction laminated body 6. Furthermore, electrostatic adsorption or magnetic gas adsorption may be performed instead of vacuum adsorption.

圖5(a)及5(b)係表示可撓性板之主要部分之一例之圖,圖5(a)係仰視圖,圖5(b)係沿圖5(a)之B-B線之剖面圖。 5(a) and 5(b) are views showing an example of a main portion of the flexible plate, and Fig. 5(a) is a bottom view, and Fig. 5(b) is a cross section taken along line BB of Fig. 5(a). Figure.

可撓性板30具有:吸附部31,其吸附積層體6之第2主面6a;基體板32,其支持吸附部31;及吸附槽33,其形成於吸附部31之表面。於吸附槽33之壁面,設置用以自外部吸出吸附槽33內之氣體之吸氣口34,吸氣口34係經由配管等 而連接於吸氣源(例如真空泵)35。若吸氣源35吸出吸附槽33內之氣體,則積層體6真空吸附至可撓性板30。於構成積層體6之基板2及加強板3之兩方之側面為同一平面的情形時,與於兩方之側面之間存在階差之情形不同,無法藉由夾具卡夾基板2或加強板3之剝離開始側之端部。因此,藉由可撓性板30吸附積層體6之第2主面6a之情形較為有效。 The flexible plate 30 has an adsorption portion 31 that adsorbs the second main surface 6a of the laminated body 6, a base plate 32 that supports the adsorption portion 31, and an adsorption groove 33 that is formed on the surface of the adsorption portion 31. An air intake port 34 for sucking out gas in the adsorption tank 33 from the outside is provided on the wall surface of the adsorption tank 33, and the intake port 34 is connected via a pipe or the like. It is connected to a suction source (for example, a vacuum pump) 35. When the intake source 35 sucks the gas in the adsorption tank 33, the laminated body 6 is vacuum-adsorbed to the flexible plate 30. When the side surfaces of the substrate 2 and the reinforcing plate 3 constituting the laminated body 6 are the same plane, unlike the case where there is a step difference between the sides of the laminated body 6, the substrate 2 or the reinforcing plate cannot be clamped by the jig. The end of the stripping start side of 3. Therefore, it is effective to adsorb the second main surface 6a of the laminated body 6 by the flexible plate 30.

吸附部31之外形亦可設定為大於積層體6之第2主面6a之外形,以便吸附部31可整體地支持積層體6之第2主面6a。 The outer shape of the adsorption portion 31 may be set to be larger than the outer shape of the second main surface 6a of the laminated body 6, so that the adsorption portion 31 can integrally support the second main surface 6a of the laminated body 6.

作為吸附部31之材料,並無特別限定,但就密接性之觀點而言,較佳為橡膠。作為橡膠,就剝離性之觀點而言,較佳為聚矽氧橡膠。亦可使用聚矽氧凝膠來取代聚矽氧橡膠,但於該情形時,有如下情形:於自積層體6卸除吸附部31時,聚矽氧凝膠凝聚破壞而吸附至積層體6。 The material of the adsorption unit 31 is not particularly limited, but from the viewpoint of adhesion, rubber is preferred. As the rubber, from the viewpoint of peelability, a polyoxymethylene rubber is preferred. It is also possible to use a polyoxymethylene gel instead of the polyoxyxene rubber. However, in this case, when the adsorption portion 31 is removed from the laminate 6, the polysiloxane gel is agglomerated and adsorbed to the laminate 6 .

亦能夠以提高剝離性之目的,對吸附部31之表面實施塗敷。 It is also possible to apply the surface of the adsorption portion 31 for the purpose of improving the peeling property.

吸附部31之厚度T係較佳為1 mm以上,更佳為2 mm以上。藉由將吸附部31之厚度T設為1 mm以上,吸附部31與積層體6之密接性變良好。又,藉由將吸附部31之厚度T設為30 mm以下,可限制吸附部31之過度之變形。 The thickness T of the adsorption portion 31 is preferably 1 mm or more, and more preferably 2 mm or more. By setting the thickness T of the adsorption portion 31 to 1 mm or more, the adhesion between the adsorption portion 31 and the laminated body 6 is improved. Further, by setting the thickness T of the adsorption portion 31 to 30 mm or less, excessive deformation of the adsorption portion 31 can be restricted.

基體板32係與吸附部31為相同之大小,且基體板32之側面、與吸附部31之側面為同一平面。再者,基體板32大於吸附部31,於基體板32之內側配置吸附部31亦可。 The base plate 32 has the same size as the adsorption portion 31, and the side surface of the base plate 32 and the side surface of the adsorption portion 31 are flush with each other. Further, the base plate 32 is larger than the adsorption portion 31, and the adsorption portion 31 may be disposed inside the base plate 32.

基體板32係每單位寬度(1 mm)之彎曲剛性高於吸附部 31,基體板32之每單位寬度之彎曲剛性支配可撓性板30之每單位寬度的彎曲剛性。可撓性板30之每單位寬度之彎曲剛性較佳為1000~40000 N‧mm2/mm。 The base plate 32 has a bending rigidity per unit width (1 mm) higher than that of the adsorption portion 31, and the bending rigidity per unit width of the base plate 32 governs the bending rigidity per unit width of the flexible plate 30. The bending rigidity per unit width of the flexible plate 30 is preferably from 1,000 to 40,000 N‧ mm 2 /mm.

藉由將可撓性板30之每單位寬度之彎曲剛性設為1000 N‧mm2/mm以上,可防止可撓性板30吸附之板(於本實施形態中為加強板3)之折彎。又,藉由將可撓性板30之每單位寬度之彎曲剛性設為40000 N‧mm2/mm以下,可使可撓性板30吸附之板適當地撓曲變形。 By bending the bending rigidity per unit width of the flexible plate 30 to 1000 N‧ mm 2 /mm or more, the bending of the plate (in the present embodiment, the reinforcing plate 3) which is attracted by the flexible plate 30 can be prevented. . Further, by setting the bending rigidity per unit width of the flexible plate 30 to 40,000 N·mm 2 /mm or less, the plate to which the flexible plate 30 is attracted can be appropriately flexed and deformed.

作為基體板32,除例如聚氯乙烯(PVC,Polyvinyl Chloride)樹脂、聚碳酸酯樹脂、丙烯酸樹脂、聚縮醛(POM,Polyoxymethylene)樹脂等樹脂板外,可使用金屬板。 As the base plate 32, a metal plate can be used in addition to a resin plate such as a polyvinyl chloride (PVC) resin, a polycarbonate resin, an acrylic resin, or a polyacetal (POM) resin.

如圖3及圖4所示,於基體板32上,空開間隔而固定複數個圓盤狀之可動體40。複數個可動體40係螺桿固定於基體板32上。亦可進行接著固定來取代螺桿固定。複數個可動體40係可相對於平台20而獨立地移動。 As shown in FIGS. 3 and 4, a plurality of disk-shaped movable bodies 40 are fixed to the base plate 32 at intervals. A plurality of movable bodies 40 are screwed to the base plate 32. It is also possible to carry out the fixing instead of the screw fixing. The plurality of movable bodies 40 are independently movable with respect to the platform 20.

圖6係表示可撓性板上之複數個可動體之配置例之平面圖。圖6係表示剝離開始前之狀態。 Fig. 6 is a plan view showing an arrangement example of a plurality of movable bodies on a flexible plate. Fig. 6 shows the state before the start of peeling.

複數個可動體40係固定於可撓性板30上之與平台20側相反側之面。複數個可動體40係沿可撓性板30之外周而空開間隔配置,於在剝離開始前,自相對於界面8垂直之方向觀察時,配置於較界面8之外周8a更外側。於該情形時,各可動體40之中心與外周8a之距離較佳為200 mm以下。 A plurality of movable bodies 40 are fixed to the surface of the flexible board 30 on the side opposite to the side of the stage 20. The plurality of movable bodies 40 are disposed at intervals along the outer circumference of the flexible plate 30, and are disposed outside the outer periphery 8a of the interface 8 when viewed from a direction perpendicular to the interface 8 before the start of peeling. In this case, the distance between the center of each movable body 40 and the outer circumference 8a is preferably 200 mm or less.

如圖3及圖4所示,複數個可動體40係分別經由對應之連 結機構50而連結於對應之桿60。複數個可動體40係分別可與所連結之桿60一併於桿60之軸方向上移動,從而可相對於平台20相接或相離。藉由複數個可動體40相對於平台20移動,可撓性板30撓曲變形。 As shown in FIG. 3 and FIG. 4, a plurality of movable bodies 40 are respectively connected via corresponding ones. The knot mechanism 50 is coupled to the corresponding rod 60. The plurality of movable bodies 40 are respectively movable in the axial direction of the rod 60 together with the coupled rods 60 so as to be in contact with or apart from the platform 20. The flexible plate 30 is flexibly deformed by the movement of the plurality of movable bodies 40 with respect to the platform 20.

連結機構50係為了使可撓性板30之撓曲變形變得順利,以可動體40能夠以桿60之中心線X上之特定位置為中心轉動之方式,將可動體40與桿60連結。可動體40之轉動中心係設定為距加強板3上之基板2側之面的延長面、與中心線X之交點P 15 mm以內(較佳為5 mm以內)之位置。 In order to smooth the flexural deformation of the flexible plate 30, the connecting mechanism 50 connects the movable body 40 to the rod 60 so that the movable body 40 can rotate about a specific position on the center line X of the rod 60. The center of rotation of the movable body 40 is set to a position which is an extension surface of the surface on the side of the substrate 2 on the reinforcing plate 3 and within 15 mm (preferably within 5 mm) of the intersection with the center line X.

再者,本實施形態之交點P係加強板3上之基板2側之面之延長面、與中心線X的交點,但於可撓性板30使基板2取代加強板3而撓曲變形之情形時,為基板2上之加強板3側之面之延長面、與中心線X的交點。 Further, the intersection point P of the present embodiment is an intersection of the surface of the reinforcing plate 3 on the side of the substrate 2 and the intersection with the center line X. However, the flexible sheet 30 is formed by replacing the reinforcing sheet 3 with the substrate 2 and being flexed and deformed. In this case, it is the intersection of the surface of the surface of the reinforcement plate 3 on the board|substrate 2, and the intersection with the center line X.

連結機構50係例如由球面接頭等構成,且包含與可動體40一體化之凹球面部51、及與桿60一體化之凸球面部52。凸球面部52之曲率中心成為可動體40之轉動中心。於可動體40與連結機構50之間,以較自然狀態略微收縮之狀態插裝有螺旋彈簧54。藉由螺旋彈簧54之恢復力,凹球面部51與凸球面部52始終接觸。 The connection mechanism 50 is composed of, for example, a spherical joint or the like, and includes a concave spherical surface portion 51 that is integrated with the movable body 40 and a convex spherical surface portion 52 that is integrated with the rod 60. The center of curvature of the convex spherical portion 52 becomes the center of rotation of the movable body 40. A coil spring 54 is inserted between the movable body 40 and the coupling mechanism 50 in a state of being slightly contracted in a more natural state. The concave spherical portion 51 and the convex spherical portion 52 are always in contact by the restoring force of the coil spring 54.

再者,作為連結機構50,亦可使用連桿機構。又,亦可使用如下裝置來取代使用連結機構50:將可動體40與桿60一體化,使桿60或使桿60於軸方向上移動之驅動裝置70相對於平台20傾斜移動。 Further, as the connection mechanism 50, a link mechanism can also be used. Further, instead of using the link mechanism 50, the following means may be used: the movable body 40 is integrated with the rod 60, and the rod 60 or the driving device 70 that moves the rod 60 in the axial direction is tilted with respect to the platform 20.

驅動裝置70係於利用控制裝置80之控制下,使桿60於軸 方向上移動,從而使可動體40相對於平台20相接或相離。驅動裝置70係與複數個桿60對應而設置複數個,從而使複數個桿60、進而複數個可動體40獨立地移動。 The driving device 70 is controlled by the control device 80 to make the rod 60 on the shaft The direction is moved such that the movable body 40 is in contact with or away from the platform 20. The driving device 70 is provided in plurality corresponding to the plurality of levers 60, so that the plurality of levers 60 and further the plurality of movable bodies 40 are independently moved.

各驅動裝置70係例如由旋轉式伺服馬達及滾珠螺桿機構等構成。伺服馬達之旋轉運動係於滾珠螺桿機構中轉換為直線運動,從而傳達至對應之桿60。 Each of the drive devices 70 is constituted by, for example, a rotary servo motor, a ball screw mechanism, or the like. The rotary motion of the servo motor is converted into a linear motion in the ball screw mechanism to be transmitted to the corresponding lever 60.

再者,本實施形態之驅動裝置係設為由旋轉式伺服馬達及滾珠螺桿機構等構成,但亦可由線式伺服馬達、或液壓缸(例如氣壓缸)構成。 Further, the drive device of the present embodiment is configured by a rotary servo motor, a ball screw mechanism, or the like, but may be constituted by a line servo motor or a hydraulic cylinder (for example, a pneumatic cylinder).

複數個驅動裝置70係可分別經由緩衝構件14而連結於可相對於平台20升降之框架16。緩衝構件14係與複數個驅動裝置70對應而設置複數個。緩衝構件14之材質並無特別限定,但例如可列舉胺基甲酸乙酯橡膠等。緩衝構件14係以追隨可撓性板30之撓曲變形之方式彈性變形,從而使各桿60相對於平台20傾斜移動。 A plurality of drive devices 70 can be coupled to the frame 16 that can be raised and lowered with respect to the platform 20 via the cushioning members 14, respectively. The buffer member 14 is provided in plurality in correspondence with a plurality of driving devices 70. The material of the cushioning member 14 is not particularly limited, and examples thereof include urethane rubber and the like. The cushioning member 14 is elastically deformed in such a manner as to follow the flexural deformation of the flexible plate 30, thereby causing the respective rods 60 to move obliquely with respect to the platform 20.

控制裝置80係作為包含CPU(Central Processing Unit,中央處理單元)、ROM(Read Only Memory,唯讀記憶體)或RAM(Random Access Memory,隨機存取記憶體)等記錄媒體等之電腦而構成。控制裝置80係藉由使CPU執行記錄媒體中所記錄之程式,而對複數個驅動裝置70進行控制,對複數個桿60之移動、進而複數個可動體40之移動進行控制。 The control device 80 is configured as a computer including a CPU (Central Processing Unit), a ROM (Read Only Memory), or a RAM (Random Access Memory). The control device 80 controls the plurality of drive devices 70 by causing the CPU to execute the program recorded on the recording medium, and controls the movement of the plurality of levers 60 and the movement of the plurality of movable bodies 40.

控制裝置80可包括基於各伺服馬達之旋轉數而檢測各桿60之當前位置之位置檢測部81。控制裝置80係獨立地控制 向各伺服馬達之供給電力,以使藉由位置檢測部81檢測之各桿60之當前位置與目標位置之差變小。目標位置係根據自剝離開始之經過時間而設定。目標位置係針對每個桿60而設定,且預先記錄於記錄媒體。自剝離開始之經過時間係藉由組裝於控制裝置80之計時器而計測。如上所述,控制裝置80係可對各桿60之位置進行反饋控制。可準確地控制複數個桿60之位置關係、進而複數個可動體40之位置關係。 The control device 80 may include a position detecting portion 81 that detects the current position of each of the levers 60 based on the number of rotations of the respective servo motors. Control device 80 is independently controlled Power is supplied to each servo motor so that the difference between the current position of each lever 60 detected by the position detecting unit 81 and the target position becomes small. The target position is set based on the elapsed time from the start of peeling. The target position is set for each of the levers 60 and is recorded in advance on the recording medium. The elapsed time from the start of peeling is measured by a timer assembled to the control device 80. As described above, the control device 80 can provide feedback control of the position of each of the levers 60. The positional relationship of the plurality of rods 60 and the positional relationship of the plurality of movable bodies 40 can be accurately controlled.

又,控制裝置80可包括檢測各伺服馬達之負載轉矩(例如,向各伺服馬達之供給電流)之負載檢測部82。控制裝置80係基於負載檢測部82之檢測結果而修正各桿60之目標位置,從而記錄至記錄媒體。例如,於在第n次(n為1以上之自然數)之控制時,一伺服馬達之負載轉矩超過閾值時,進行使利用該一伺服馬達之桿60之移動開始時間延遲特定時間(例如,0.06秒)之修正,從而記錄至記錄媒體。於第n+1次之控制時,基於修正、記錄之資訊而獨立地控制各伺服馬達。藉此,可減輕施加至積層體6之負載。 Further, the control device 80 may include a load detecting unit 82 that detects a load torque of each servo motor (for example, a supply current to each servo motor). The control device 80 corrects the target position of each of the levers 60 based on the detection result of the load detecting unit 82, and records it on the recording medium. For example, when the load torque of a servo motor exceeds a threshold value at the nth time (n is a natural number of 1 or more), the movement start time of the lever 60 using the servo motor is delayed by a specific time (for example, , 0.06 seconds) correction, thus recorded to the recording medium. At the time of the n+1th control, each servo motor is independently controlled based on the information of the correction and recording. Thereby, the load applied to the laminated body 6 can be alleviated.

接著,對上述構成之剝離裝置10之動作進行說明。剝離裝置10之動作係於利用控制裝置80之控制下進行。 Next, the operation of the peeling device 10 having the above configuration will be described. The operation of the peeling device 10 is performed under the control of the control device 80.

積層體6係以加強板3A成為上側之方式載置於平台20上。若藉由平台20真空吸附積層體6,則控制裝置80將框架16下降至特定位置為止,從而將可撓性板30推壓至加強板3A。接著,控制裝置80係藉由可撓性板30真空吸附加強板3A。於該狀態下,如圖3所示,可撓性板30成為平板 狀。 The laminated body 6 is placed on the stage 20 such that the reinforcing plate 3A is on the upper side. When the laminated body 6 is vacuum-adsorbed by the stage 20, the control device 80 lowers the frame 16 to a specific position, thereby pressing the flexible plate 30 to the reinforcing plate 3A. Next, the control device 80 vacuum-adsorbs the reinforcing plate 3A by the flexible plate 30. In this state, as shown in FIG. 3, the flexible board 30 becomes a flat plate. shape.

再者,本實施形態之剝離裝置10係為平台20為固定且框架16為升降之構成,但只要為平台20與框架16相對性地移動之構成即可。 Further, in the peeling device 10 of the present embodiment, the platform 20 is fixed and the frame 16 is configured to be raised and lowered. However, the base 20 and the frame 16 may be relatively moved.

接著,如圖4所示,控制裝置80係使可撓性板30撓曲變形,以便自一端側向另一端側依次剝離基板2A與加強板3A之界面8。可撓性板30之狀態係由複數個可動體40之位置關係等決定。 Next, as shown in FIG. 4, the control device 80 flexes and deforms the flexible plate 30 so that the interface 8 between the substrate 2A and the reinforcing plate 3A is sequentially peeled from one end side to the other end side. The state of the flexible plate 30 is determined by the positional relationship or the like of the plurality of movable bodies 40.

圖7(a)~7(c)係說明複數個可動體40之動作例之圖,圖7(a)係平面圖,圖7(b)係沿圖7(a)之B-B線之剖面圖,圖7(c)係沿圖7(a)之C-C線之剖面圖。剖面為與剝離前線9垂直之剖面。 7(a) to 7(c) are views showing an operation example of a plurality of movable bodies 40, Fig. 7(a) is a plan view, and Fig. 7(b) is a cross-sectional view taken along line BB of Fig. 7(a). Fig. 7(c) is a cross-sectional view taken along line CC of Fig. 7(a). The cross section is a section perpendicular to the peeling front line 9.

複數個可動體40為了使可撓性板30撓曲變形,進行相對於平台20離開之動作。首先,處於較界面8之剝離開始端8b更後方之可動體40A開始動作。藉此,於剝離開始端8b剝離界面8。為了減少剝離阻力,剝離開始端8b較佳如圖6所示般設定於界面8之一角。於使可撓性板30撓曲變形前,亦可將剃刀等薄刃插入至剝離開始端8b而製造剝離之契機。亦可向剝離開始端8b噴射壓縮氣體等高速之流體來取代將薄刃插入至剝離開始端8b。 The plurality of movable bodies 40 perform an operation of moving away from the stage 20 in order to flexure and deform the flexible plate 30. First, the movable body 40A which is located further rearward than the peeling start end 8b of the interface 8 starts to operate. Thereby, the interface 8 is peeled off at the peeling start end 8b. In order to reduce the peeling resistance, the peeling start end 8b is preferably set at an angle of the interface 8 as shown in FIG. Before the flexible plate 30 is flexed and deformed, a thin blade such as a razor may be inserted into the peeling start end 8b to produce a peeling action. Instead of inserting a thin blade into the peeling start end 8b, a high-speed fluid such as a compressed gas may be ejected to the peeling start end 8b.

接著,處於較剝離開始端8b更前方之可動體40-2~40-7開始動作。處於較剝離開始端8b更前方之可動體40-2~40-7係以與距剝離開始端8b之距離對應之順序開始動作。若將剝離前線9之移動方向(相對於連結剝離前線9之兩端之 方向垂直之方向)設為M方向,則距界面8之剝離開始端8b之M方向上之距離N較短的可動體(例如可動體40-2)先於距離N較長之可動體(例如可動體40-3)開始動作。可動體40-2~40-7係以等間距配置於M方向上,但亦可以非等間距配置。可動體40-2~40-7係於剝離開始前自相對於界面8垂直之方向觀察時,在界面8之外周8a之兩外側(左外側及右外側)配置有至少各1個(於圖7(a)中為各1個)。距離N為相同之2個可動體(例如可動體40-2、40-2)係以大致相同之時序開始動作。距離N係自剝離開始端8b之M方向上之至可動體40之中心為止的距離。 Next, the movable bodies 40-2 to 40-7 which are located further forward than the peeling start end 8b start to operate. The movable bodies 40-2 to 40-7 which are located further forward than the peeling start end 8b start to operate in the order corresponding to the distance from the peeling start end 8b. If the direction of movement of the front line 9 is peeled off (relative to the ends of the joint peeling front line 9) When the direction perpendicular to the direction is the M direction, the movable body (for example, the movable body 40-2) having a short distance N in the M direction from the peeling start end 8b of the interface 8 precedes the movable body having a longer distance N (for example, The movable body 40-3) starts to operate. The movable bodies 40-2 to 40-7 are arranged at equal intervals in the M direction, but may be arranged at non-equal intervals. When the movable bodies 40-2 to 40-7 are viewed from the direction perpendicular to the interface 8 before the start of peeling, at least one of the outer sides (left outer side and right outer side) of the outer periphery 8a of the interface 8 is disposed (in the figure). 1 in each of 7(a)). The two movable bodies (for example, the movable bodies 40-2 and 40-2) having the same distance N start to operate at substantially the same timing. The distance from the N-series to the center of the movable body 40 in the M direction from the peeling start end 8b.

處於較剝離開始端8b更前方之可動體40-2~40-7配置於較界面8之外周8a更外側,因此於距離N為最短之可動體40-2之動作開始後,剝離前線9成為兩端部先行於中央部之形狀,從而成為於移動方向後方凸出之彎曲形狀。該形狀被保持至剝離結束為止。 Since the movable bodies 40-2 to 40-7 which are located further forward than the peeling start end 8b are disposed outside the outer periphery 8a of the interface 8, the peeling front line 9 becomes after the operation of the movable body 40-2 whose distance N is the shortest is started. The both end portions are formed in the shape of the center portion, and are formed into a curved shape that protrudes rearward in the moving direction. This shape is maintained until the end of peeling.

於剝離前線9成為於移動方向後方凸出之彎曲形狀時,與可撓性板30一併撓曲變形之板(於本實施形態中為加強板3A)之曲率半徑係如圖7(b)所示般於剝離前線9之兩端部變大,且如圖7(c)所示般於剝離前線9之中央部變小。曲率半徑係相對於剝離前線9垂直之剖面之曲率半徑,且係剝離前線9之後方附近之曲率半徑。 When the peeling front line 9 is a curved shape that protrudes rearward in the moving direction, the radius of curvature of the plate (in the present embodiment, the reinforcing plate 3A) which is flexibly deformed together with the flexible plate 30 is as shown in Fig. 7(b). As shown in the figure, the both end portions of the peeling front thread 9 become large, and as shown in Fig. 7(c), the center portion of the peeling front thread 9 becomes small. The radius of curvature is the radius of curvature of the section perpendicular to the peeling front line 9, and is the radius of curvature near the back of the front line 9.

於與可撓性板30一併撓曲變形之加強板3A中,曲率半徑越大則變形越小,因此負載變小。另一方面,曲率半徑越大則剝離角度越小,因此剝離阻力(剝離所需之力)變大。 In the reinforcing plate 3A which is flexibly deformed together with the flexible plate 30, the larger the radius of curvature, the smaller the deformation, and the load is reduced. On the other hand, the larger the radius of curvature, the smaller the peeling angle, and therefore the peeling resistance (the force required for peeling) becomes large.

於本實施形態中,由於剝離前線9成為於移動方向後方凸出之彎曲形狀,因此加強板3A之曲率半徑係於剝離前線9之兩端部較大,於中央部較小。藉此,可一面抑制剝離阻力變大,一面減少施加於加強板3A之邊緣之負載,從而可抑制加強板3A自邊緣龜裂。由於剝離前線之兩端間之直線距離H越長,則剝離阻力越大,因此該效果顯著。如圖7(a)所示,本實施形態係於距離H成為最大時,剝離前線9成為於移動方向後方凸出之彎曲形狀,因此可有效地抑制加強板3A自邊緣龜裂。 In the present embodiment, since the peeling front thread 9 has a curved shape that protrudes rearward in the moving direction, the radius of curvature of the reinforcing plate 3A is larger at both end portions of the peeling front thread 9 and smaller at the center portion. Thereby, it is possible to reduce the load applied to the edge of the reinforcing plate 3A while suppressing the increase in the peeling resistance, and it is possible to suppress the crack of the reinforcing plate 3A from the edge. Since the linear distance H between the both ends of the peeling front line is longer, the peeling resistance is larger, so the effect is remarkable. As shown in Fig. 7 (a), in the present embodiment, when the distance H is the maximum, the peeling front line 9 has a curved shape that protrudes rearward in the moving direction. Therefore, it is possible to effectively suppress the crack of the reinforcing plate 3A from the edge.

再者,於本實施形態中,與可撓性板30一併撓曲變形之板為加強板3A,但亦可為基板2A。於該情形時,可抑制基板2A自邊緣龜裂。 Further, in the present embodiment, the plate which is flexibly deformed together with the flexible plate 30 is the reinforcing plate 3A, but may be the substrate 2A. In this case, the substrate 2A can be suppressed from being cracked from the edge.

於基板2A與加強板3A之剝離完成後,控制裝置80使框架16上升至特定位置。接著,控制裝置80解除利用可撓性板30之真空吸附、及利用平台20之真空吸附。其後,自可撓性板30卸除加強板3A,自平台20卸除已無加強板3A之積層體6。 After the peeling of the substrate 2A and the reinforcing plate 3A is completed, the control device 80 raises the frame 16 to a specific position. Next, the control device 80 releases the vacuum suction by the flexible board 30 and the vacuum suction by the stage 20. Thereafter, the reinforcing plate 3A is removed from the flexible plate 30, and the laminated body 6 having no reinforcing plate 3A is removed from the stage 20.

已無加強板3A之積層體6係以其餘之加強板3B為上側之方式被載置至平台20。此後,控制裝置80再次進行上述動作而將加強板3B與基板2B剝離。 The laminated body 6 having no reinforcing plate 3A is placed on the stage 20 so that the remaining reinforcing plates 3B are on the upper side. Thereafter, the control device 80 performs the above operation again to peel off the reinforcing plate 3B from the substrate 2B.

以此方式,於自積層體6剝離加強板3A、3B後,組入背光等而獲得作為製品之LCD。 In this manner, after the reinforcing sheets 3A and 3B are peeled off from the laminated body 6, a backlight or the like is incorporated to obtain an LCD as a product.

再者,本實施形態之剝離裝置10係於LCD之製造步驟中使用,但本發明並不限定於此,可於其他電子裝置之製造 步驟中使用。 Further, the peeling device 10 of the present embodiment is used in the manufacturing process of the LCD, but the present invention is not limited thereto, and can be manufactured in other electronic devices. Used in the steps.

[第2實施形態] [Second Embodiment]

上述第1實施形態係於積層體6之單側,配置有可撓性板30、複數個可動體40、複數個桿60、及複數個驅動裝置70等。 In the first embodiment, the flexible plate 30, the plurality of movable bodies 40, the plurality of rods 60, the plurality of driving devices 70, and the like are disposed on one side of the laminated body 6.

與此相對,本實施形態中係於積層體6之兩側配置有可撓性板30、複數個可動體40、複數個桿60、及複數個驅動裝置70等。 On the other hand, in the present embodiment, the flexible plate 30, the plurality of movable bodies 40, the plurality of rods 60, the plurality of driving devices 70, and the like are disposed on both sides of the laminated body 6.

圖8係表示第2實施形態之剝離裝置之局部剖面圖。圖9係表示圖8之剝離裝置之動作例之局部剖面圖。圖10(a)~10(f)係使用有圖8之剝離裝置之剝離步驟之一例的圖。 Fig. 8 is a partial cross-sectional view showing the peeling device of the second embodiment. Fig. 9 is a partial cross-sectional view showing an operation example of the peeling device of Fig. 8. 10(a) to 10(f) are views showing an example of a peeling step using the peeling device of Fig. 8.

本實施形態之剝離裝置110具有配置於積層體6之單側之第1可撓性板30A、複數個第1可動體40A、複數個第1桿60A、及複數個第1驅動裝置70A等。又,剝離裝置110具有配置於積層體6之相反側之第2可撓性板30B、複數個第2可動體40B、複數個第2桿60B、及複數個第2驅動裝置70B等。由第2可撓性板30B、複數個第2可動體40B、複數個第2桿60B、複數個第2驅動裝置70B、及第2框架16B等構成支持機構。進而,剝離裝置110具有對複數個第1驅動裝置70A、及複數個第2驅動裝置70B進行控制之控制裝置80。 The peeling device 110 of the present embodiment includes a first flexible plate 30A disposed on one side of the laminated body 6, a plurality of first movable bodies 40A, a plurality of first rods 60A, and a plurality of first driving devices 70A. Further, the peeling device 110 includes a second flexible plate 30B disposed on the opposite side of the laminated body 6, a plurality of second movable bodies 40B, a plurality of second rods 60B, and a plurality of second driving devices 70B. A support mechanism is configured by the second flexible plate 30B, the plurality of second movable bodies 40B, the plurality of second rods 60B, the plurality of second driving devices 70B, and the second frame 16B. Further, the peeling device 110 has a control device 80 that controls a plurality of first driving devices 70A and a plurality of second driving devices 70B.

接著,基於圖10(a)~10(f),對上述構成之剝離裝置110之動作進行說明。剝離裝置110之動作係於利用控制裝置 80之控制下進行。 Next, the operation of the peeling device 110 having the above configuration will be described based on Figs. 10(a) to 10(f). The action of the stripping device 110 is based on the use of the control device Under the control of 80.

積層體6係以加強板3A成為上側之方式載置至第2可撓性板30B。若藉由第2可撓性板30B真空吸附積層體6,則控制裝置80使可相對於第2框架16B升降之第1框架16A下降至特定位置為止,從而將第1可撓性板30A推壓至加強板3A。接著,控制裝置80係藉由第1可撓性板30A而真空吸附加強板3A。於該狀態下,如圖10(a)及圖8所示,第1及第2可撓性板30A、30B成為平板狀。 The laminated body 6 is placed on the second flexible plate 30B such that the reinforcing plate 3A is on the upper side. When the laminated body 6 is vacuum-adsorbed by the second flexible plate 30B, the control device 80 lowers the first frame 16A that can be moved up and down with respect to the second frame 16B to a specific position, thereby pushing the first flexible plate 30A. Pressed to the reinforcing plate 3A. Next, the control device 80 vacuum-adsorbs the reinforcing plate 3A by the first flexible plate 30A. In this state, as shown in FIGS. 10( a ) and 8 , the first and second flexible plates 30A and 30B have a flat shape.

再者,本實施形態之剝離裝置110係設為固定第2框架16B且第1框架16A升降之構成,但只要為第2框架16B與第1框架16A相對性地移動之構成即可。 In addition, the peeling device 110 of the present embodiment is configured such that the second frame 16B is fixed and the first frame 16A is moved up and down. However, the second frame 16B and the first frame 16A may be relatively moved.

接著,如圖10(b)及10(c)、以及圖9所示,控制裝置80係使第1及第2可撓性板30A、30B同時撓曲變形,以便自一端側向另一端側依次剝離基板2A與加強板3A之界面。 Next, as shown in FIGS. 10(b) and 10(c) and FIG. 9, the control device 80 flexes and deforms the first and second flexible plates 30A and 30B simultaneously from one end side to the other end side. The interface between the substrate 2A and the reinforcing plate 3A is peeled off in order.

再者,於使第1及第2可撓性板30A、30B撓曲變形前,亦可將剃刀等薄刃插入至剝離開始端而製造剝離之契機。亦可向剝離開始端噴射壓縮氣體等高速之流體來取代將薄刃插入至剝離開始端。 Further, before the first and second flexible sheets 30A and 30B are flexibly deformed, a thin blade such as a razor may be inserted into the peeling start end to produce a peeling action. Instead of inserting a thin blade into the peeling start end, a high-speed fluid such as a compressed gas may be ejected toward the peeling start end.

第1可撓性板30A之撓曲變形之狀態係由複數個第1可動體40A之位置關係等決定。相同地,第2可撓性板30B之撓曲變形之狀態係由複數個第2可動體40B之位置關係等決定。 The state of the flexural deformation of the first flexible plate 30A is determined by the positional relationship or the like of the plurality of first movable bodies 40A. Similarly, the state of the flexural deformation of the second flexible plate 30B is determined by the positional relationship or the like of the plurality of second movable bodies 40B.

於本實施形態中,複數個第1可動體40A係沿第1可撓性板30A之外周而空開間隔配置,於在剝離開始前,自相對 於界面垂直之方向觀察時,配置於較界面之外周更外側。又,複數個第2可動體40B係沿第2可撓性板30B之外周而空開間隔配置,於在剝離開始前,自相對於界面垂直之方向觀察時,配置於較界面之外周更外側。 In the present embodiment, the plurality of first movable bodies 40A are disposed at intervals along the outer circumference of the first flexible plate 30A, and are self-relative before the start of peeling. When viewed in the direction perpendicular to the interface, it is disposed outside the outer periphery of the interface. Further, the plurality of second movable bodies 40B are disposed at intervals along the outer circumference of the second flexible plate 30B, and are disposed outside the outer periphery of the interface when viewed from a direction perpendicular to the interface before the start of peeling. .

控制裝置80係對複數個第1可動體40A之移動、及複數個第2可動體40B之移動進行控制,於剝離前線9之兩端間之直線距離成為最大時,剝離前線9成為於移動方向後方凸出之彎曲形狀。藉此,與第1實施形態相同地,可一面抑制剝離阻力變大,一面減少施加至加強板3A之邊緣之負載,從而可抑制加強板3A自邊緣龜裂。 The control device 80 controls the movement of the plurality of first movable bodies 40A and the movement of the plurality of second movable bodies 40B. When the linear distance between both ends of the peeling front line 9 is maximized, the peeling front line 9 becomes the moving direction. The curved shape of the rear convex. As a result, in the same manner as in the first embodiment, the load applied to the edge of the reinforcing plate 3A can be reduced while suppressing the increase in the peeling resistance, and the crack of the reinforcing plate 3A from the edge can be suppressed.

於基板2A與加強板3A之剝離完成後,控制裝置80使第1框架16A上升至特定位置為止。接著,控制裝置80解除利用第1可撓性板30A之真空吸附。此後,自第1可撓性板30A卸除加強板3A。 After the peeling of the substrate 2A and the reinforcing plate 3A is completed, the control device 80 raises the first frame 16A to a specific position. Next, the control device 80 releases the vacuum suction by the first flexible plate 30A. Thereafter, the reinforcing plate 3A is removed from the first flexible plate 30A.

接著,控制裝置80使第1框架16A下降至特定位置為止,從而將第1可撓性板30A推壓至基板2A。接著,控制裝置80係藉由第1可撓性板30A而真空吸附基板2A。於該狀態下,如圖10(d)所示,第1及第2可撓性板30A、30B成為平板狀。 Next, the control device 80 pushes the first flexible plate 30A to the substrate 2A by lowering the first frame 16A to a specific position. Next, the control device 80 vacuum-adsorbs the substrate 2A by the first flexible plate 30A. In this state, as shown in FIG. 10(d), the first and second flexible plates 30A and 30B have a flat shape.

此後,如圖10(e)及10(f)所示,控制裝置80係使第1及第2可撓性板30A、30B同時撓曲變形,以便自一端側向另一端側依次剝離基板2B與加強板3B之界面。 Thereafter, as shown in FIGS. 10(e) and 10(f), the control device 80 simultaneously flexes and deforms the first and second flexible plates 30A and 30B so as to peel the substrate 2B sequentially from one end side to the other end side. The interface with the reinforcing plate 3B.

再者,於使第1及第2可撓性板30A、30B撓曲變形前,亦可將剃刀等薄刃插入至剝離開始端而製造剝離之契機。 亦可向剝離開始端噴射壓縮氣體等高速之流體來取代將薄刃插入至剝離開始端。 Further, before the first and second flexible sheets 30A and 30B are flexibly deformed, a thin blade such as a razor may be inserted into the peeling start end to produce a peeling action. Instead of inserting a thin blade into the peeling start end, a high-speed fluid such as a compressed gas may be ejected toward the peeling start end.

以此方式,於自積層體6剝離加強板3A、3B後,組裝背光等而獲得作為製品之LCD。 In this manner, after the reinforcing sheets 3A and 3B are peeled off from the laminated body 6, a backlight or the like is assembled to obtain an LCD as a product.

又,本實施形態係使基板2A及加強板3A之兩者彼此向相反方向撓曲變形,因此可避免向任一者集中負載。 Further, in the present embodiment, both the substrate 2A and the reinforcing plate 3A are flexibly deformed in opposite directions to each other, so that it is possible to avoid concentrating the load to either one.

[第3實施形態] [Third embodiment]

本實施形態係與第2實施形態相同地,使用圖8所示之剝離裝置而進行剝離,但剝離裝置之動作不同。 In the present embodiment, as in the second embodiment, peeling is performed using the peeling device shown in Fig. 8, but the operation of the peeling device is different.

圖11(a)~11(f)係表示使用有圖8之剝離裝置之其他剝離步驟之圖。 11(a) to 11(f) are views showing other peeling steps using the peeling device of Fig. 8.

積層體6係以加強板3A成為上側之方式載置至第2可撓性板30B。控制裝置80係使第1框架16A下降至特定位置為止,從而將第1可撓性板30A推壓至加強板3A。接著,控制裝置80係藉由第1可撓性板30A真空吸附加強板3A。於該狀態下,如圖11(a)及圖8所示,第1及第2可撓性板30A、30B成為平板狀。 The laminated body 6 is placed on the second flexible plate 30B such that the reinforcing plate 3A is on the upper side. The control device 80 pushes the first flexible plate 30A to the reinforcing plate 3A by lowering the first frame 16A to a specific position. Next, the control device 80 vacuum-adsorbs the reinforcing plate 3A by the first flexible plate 30A. In this state, as shown in FIGS. 11(a) and 8 , the first and second flexible plates 30A and 30B have a flat shape.

接著,如圖11(b)及11(c)所示,控制裝置80係使第1可撓性板30A撓曲變形,以便自一端側向另一端側依次剝離基板2A與加強板3A之界面。 Next, as shown in FIGS. 11(b) and 11(c), the control device 80 flexes and deforms the first flexible plate 30A so that the interface between the substrate 2A and the reinforcing plate 3A is sequentially peeled from one end side to the other end side. .

再者,於使第1可撓性板30A撓曲變形前,亦可將剃刀等薄刃插入至剝離開始端而製造剝離之契機。亦可向剝離開始端噴射壓縮氣體等高速之流體來取代將薄刃插入至剝離開始端。 Further, before the first flexible plate 30A is flexibly deformed, a thin blade such as a razor may be inserted into the peeling start end to produce a peeling action. Instead of inserting a thin blade into the peeling start end, a high-speed fluid such as a compressed gas may be ejected toward the peeling start end.

第1可撓性板30A之撓曲變形之狀態係由複數個第1可動體40A之位置關係等決定。 The state of the flexural deformation of the first flexible plate 30A is determined by the positional relationship or the like of the plurality of first movable bodies 40A.

本實施形態係與第1實施形態相同地,複數個第1可動體40A沿第1可撓性板30A之外周而空開間隔配置,於在剝離開始前,自相對於界面垂直之方向觀察時,配置於較界面之外周更外側。控制裝置80係對複數個第1可動體40A之移動進行控制,於剝離前線9之兩端間之直線距離成為最大時,剝離前線9成為於移動方向後方凸出之彎曲形狀。藉此,與第1實施形態相同地,可一面抑制剝離阻力變大,一面減少施加至加強板3A之邊緣之負載,從而可抑制加強板3A自邊緣龜裂。 In the present embodiment, as in the first embodiment, the plurality of first movable bodies 40A are arranged at intervals along the outer circumference of the first flexible plate 30A, and are viewed from a direction perpendicular to the interface before the start of peeling. , configured outside the interface outside the perimeter. The control device 80 controls the movement of the plurality of first movable bodies 40A. When the linear distance between both ends of the peeling front line 9 is maximized, the peeling front line 9 has a curved shape that protrudes rearward in the moving direction. As a result, in the same manner as in the first embodiment, the load applied to the edge of the reinforcing plate 3A can be reduced while suppressing the increase in the peeling resistance, and the crack of the reinforcing plate 3A from the edge can be suppressed.

於基板2A與加強板3A之剝離完成後,控制裝置80係使第1框架16A上升至特定位置為止。接著,控制裝置80解除利用第1可撓性板30A之真空吸附。此後,自第1可撓性板30A卸除加強板3A。 After the peeling of the substrate 2A and the reinforcing plate 3A is completed, the control device 80 raises the first frame 16A to a specific position. Next, the control device 80 releases the vacuum suction by the first flexible plate 30A. Thereafter, the reinforcing plate 3A is removed from the first flexible plate 30A.

接著,控制裝置80係使第1框架16A下降至特定位置為止,從而將第1可撓性板30A推壓至基板2A。接著,控制裝置80係藉由第1可撓性板30A真空吸附基板2A。於該狀態下,如圖11(d)所示,第1可撓性板30A及第2可撓性板30B成為平板狀。 Next, the control device 80 pushes the first flexible plate 30A to the substrate 2A by lowering the first frame 16A to a specific position. Next, the control device 80 vacuum-adsorbs the substrate 2A by the first flexible plate 30A. In this state, as shown in FIG. 11(d), the first flexible plate 30A and the second flexible plate 30B have a flat shape.

此後,如圖11(e)及11(f)所示,控制裝置80係使第2可撓性板30B撓曲變形,以便自一端側向另一端側依次剝離基板2B與加強板3B之界面。 Thereafter, as shown in FIGS. 11(e) and 11(f), the control device 80 flexes and deforms the second flexible plate 30B so that the interface between the substrate 2B and the reinforcing plate 3B is sequentially peeled from one end side to the other end side. .

再者,於使第2可撓性板30B撓曲變形前,亦可將剃刀等 薄刃插入至剝離開始端而製造剝離之契機。亦可向剝離開始端噴射壓縮氣體等高速之流體來取代將薄刃插入至剝離開始端。 Further, before the second flexible plate 30B is flexed and deformed, a razor or the like may be used. The thin blade is inserted into the peeling start end to create a peeling opportunity. Instead of inserting a thin blade into the peeling start end, a high-speed fluid such as a compressed gas may be ejected toward the peeling start end.

第2可撓性板30B之撓曲變形之狀態係由複數個第2可動體40B之位置關係等決定。 The state of the flexural deformation of the second flexible plate 30B is determined by the positional relationship or the like of the plurality of second movable bodies 40B.

本實施形態係與第1實施形態相同地,複數個第2可動體40B沿第2可撓性板30B之外周而空開間隔配置,於在剝離開始前,自相對於界面垂直之方向觀察時,配置於較界面之外周更外側。控制裝置80係對複數個第2可動體40B之移動進行控制,於剝離前線之兩端間之直線距離H成為最大時,剝離前線成為於移動方向後方凸出之彎曲形狀。藉此,與第1實施形態相同地,可一面抑制剝離阻力變大,一面減少施加至加強板3B之邊緣之負載,從而可抑制加強板3B自邊緣龜裂。 In the present embodiment, as in the first embodiment, the plurality of second movable bodies 40B are arranged at intervals along the outer circumference of the second flexible plate 30B, and are viewed from a direction perpendicular to the interface before the start of peeling. , configured outside the interface outside the perimeter. The control device 80 controls the movement of the plurality of second movable bodies 40B. When the linear distance H between both ends of the peeling front line becomes maximum, the peeling front line has a curved shape that protrudes rearward in the moving direction. As a result, in the same manner as in the first embodiment, the load applied to the edge of the reinforcing plate 3B can be reduced while suppressing the increase in the peeling resistance, and the crack of the reinforcing plate 3B from the edge can be suppressed.

以此方式,於自積層體6剝離加強板3A、3B後,組裝背光等而獲得作為製品之LCD。 In this manner, after the reinforcing sheets 3A and 3B are peeled off from the laminated body 6, a backlight or the like is assembled to obtain an LCD as a product.

以上,對本發明之第1~第3實施形態進行了說明,但本發明並不限制於上述實施形態。可不脫離本發明之範圍而對上述實施形態施加各種變形及置換。 Although the first to third embodiments of the present invention have been described above, the present invention is not limited to the above embodiment. Various modifications and substitutions may be made to the above embodiments without departing from the scope of the invention.

例如,上述實施形態之剝離裝置10、110係於電子裝置之製造步驟中使用,但亦可於其他步驟中使用。例如,剝離裝置10、110係於供至電子裝置之製造步驟前,亦可於將基板與加強板重新黏貼之步驟中使用。 For example, the peeling devices 10 and 110 of the above embodiment are used in the manufacturing steps of the electronic device, but may be used in other steps. For example, the stripping devices 10, 110 can be used in the step of reattaching the substrate and the reinforcing plate before the manufacturing step to the electronic device.

又,如圖6所示,上述實施形態之複數個可動體40係僅 配置於較界面8之外周8a更外側,但例如於界面8為大面積之情形時,亦可如圖12A所示般亦配置於界面8之外周8a之內側。於距離N(參照圖7)相同之情形時,配置於較界面8之外周8a更外側之兩端之可動體(例如可動體40-3A、40-3B)係先於配置於較界面8的外周8a更內側之其餘之可動體(例如可動體40-3C)開始動作。於該情形時,剝離前線9亦成為於移動方向後方凸出之彎曲形狀。 Further, as shown in Fig. 6, the plurality of movable bodies 40 of the above embodiment are only It is disposed outside the outer periphery 8a of the interface 8, but for example, when the interface 8 has a large area, it may be disposed on the inner side of the outer periphery 8a of the interface 8 as shown in FIG. 12A. When the distance N (see FIG. 7) is the same, the movable bodies (for example, the movable bodies 40-3A and 40-3B) disposed at the outer sides of the outer periphery 8a of the outer surface 8 are disposed before the interface 8 The remaining movable body (for example, the movable body 40-3C) on the inner side of the outer circumference 8a starts to operate. In this case, the peeling front line 9 also has a curved shape that protrudes rearward in the moving direction.

又,如圖6所示,上述實施形態之複數個可動體40係僅配置於較界面8之外周8a更外側,但亦可如圖12B所示般配置於界面8之外周8a之內側附近,且亦可沿外周8a而空開間隔配置。於該情形時,各可動體40之中心與外周8a之距離只要為50 mm以下即可。又,複數個可動體40亦可空開間隔而配置於外周8a上。於該等情形時,可動體40亦可配置於較界面8之外周8a更內側。 Further, as shown in FIG. 6, the plurality of movable bodies 40 of the above-described embodiment are disposed only outside the outer periphery 8a of the interface 8, but may be disposed near the inner side of the outer periphery 8a of the interface 8 as shown in FIG. 12B. Moreover, it may be arranged at intervals along the outer circumference 8a. In this case, the distance between the center of each movable body 40 and the outer circumference 8a may be 50 mm or less. Further, a plurality of movable bodies 40 may be disposed on the outer circumference 8a with a gap therebetween. In such a case, the movable body 40 may be disposed further inside than the outer periphery 8a of the interface 8.

又,作為可撓性板30之基體板32,亦可使用圖13所示之基體板132、或圖14(a)所示之基體板232。圖13係表示基體板之變形例之平面圖。圖14(a)及14(b)係表示基體板之其他變形例之圖,圖14(a)係平面圖,圖14(b)係沿圖14(a)之B-B線之剖面圖。 Further, as the base plate 32 of the flexible plate 30, the base plate 132 shown in Fig. 13 or the base plate 232 shown in Fig. 14(a) can be used. Fig. 13 is a plan view showing a modification of the base plate. Figs. 14(a) and 14(b) are views showing another modification of the base plate, Fig. 14(a) is a plan view, and Fig. 14(b) is a cross-sectional view taken along line B-B of Fig. 14(a).

於圖13所示之基體板132之表面,形成出剝離前線9(參照圖7)之移動方向後方凸出之彎曲槽132a。彎曲槽132a係可於剝離前線9之移動方向上,空開間隔而設置複數個。彎曲槽132a係無論形成於基體板132之兩主面中之哪一者均可。以仿照彎曲槽132a之形狀之方式,剝離前線9之形 狀成為於後方凸出之彎曲狀。 On the surface of the base plate 132 shown in Fig. 13, a curved groove 132a which protrudes rearward in the moving direction of the peeling front line 9 (see Fig. 7) is formed. The curved grooves 132a may be provided in plural in the moving direction of the peeling front line 9 at intervals. The curved groove 132a is any one of the two main faces formed on the base plate 132. Stripping the shape of the front line 9 in a manner that follows the shape of the curved groove 132a The shape is curved in the rear convex shape.

圖14(a)所示之基體板232係一體地具有板狀部232a及包圍板狀部232a之外框部232b。外框部232b之厚度D2厚於板狀部232a之厚度D1。外框部232b之彎曲剛性高於板狀部232a之彎曲剛性,因此與可撓性板30一併撓曲變形之板(例如加強板3A)之曲率半徑R係如圖7(b)所示般於剝離前線9之兩端部變大,如圖7(c)所示般於剝離前線9之中央部變小。 The base plate 232 shown in Fig. 14 (a) integrally has a plate-like portion 232a and a frame portion 232b surrounding the plate-like portion 232a. The thickness D2 of the outer frame portion 232b is thicker than the thickness D1 of the plate portion 232a. The bending rigidity of the outer frame portion 232b is higher than the bending rigidity of the plate portion 232a, and therefore the radius of curvature R of the plate (for example, the reinforcing plate 3A) which is flexibly deformed together with the flexible plate 30 is as shown in Fig. 7(b). As shown in Fig. 7(c), the both ends of the peeling front thread 9 become smaller as shown in Fig. 7(c).

本申請案係基於2011年9月6日申請之日本專利申請2011-194401者,且其內容係以參照之形式併入本文。 The present application is based on Japanese Patent Application No. 2011-194401, filed on Sep.

1‧‧‧積層板 1‧‧‧ laminate

2‧‧‧基板 2‧‧‧Substrate

2A‧‧‧基板 2A‧‧‧Substrate

2B‧‧‧基板 2B‧‧‧Substrate

3‧‧‧加強板 3‧‧‧ Strengthening board

3A‧‧‧加強板 3A‧‧‧ Strengthening board

3B‧‧‧加強板 3B‧‧‧ Strengthening board

4‧‧‧支持板 4‧‧‧Support board

5‧‧‧樹脂層 5‧‧‧ resin layer

6‧‧‧積層體 6‧‧‧Layer

6a‧‧‧第2主面 6a‧‧‧2nd main face

6b‧‧‧第1主面 6b‧‧‧1st main face

7‧‧‧液晶層(功能層) 7‧‧‧Liquid layer (functional layer)

8‧‧‧界面 8‧‧‧ interface

8a‧‧‧外周 8a‧‧‧outweek

8b‧‧‧剝離開始端 8b‧‧‧ peeling start

9‧‧‧邊界線(剝離前線) 9‧‧‧ boundary line (peeling front line)

10‧‧‧剝離裝置 10‧‧‧ peeling device

14‧‧‧緩衝構件 14‧‧‧ cushioning members

16‧‧‧框架 16‧‧‧Frame

16A‧‧‧第1框架 16A‧‧‧1st frame

16B‧‧‧第2框架 16B‧‧‧2nd frame

20‧‧‧平台(支持機構) 20‧‧‧ Platform (support organization)

30‧‧‧可撓性板 30‧‧‧Flexible board

30A‧‧‧第1可撓性板 30A‧‧‧1st flexible board

30B‧‧‧第2可撓性板 30B‧‧‧2nd flexible board

31‧‧‧吸附部 31‧‧‧Adsorption Department

32‧‧‧基體板 32‧‧‧ base board

33‧‧‧吸附槽 33‧‧‧Adsorption tank

34‧‧‧吸氣口 34‧‧‧ suction port

35‧‧‧吸氣源 35‧‧‧ Inhalation source

40‧‧‧可動體 40‧‧‧ movable body

40A‧‧‧第1可動體 40A‧‧‧1st movable body

40B‧‧‧第2可動體 40B‧‧‧2nd movable body

40-2‧‧‧可動體 40-2‧‧‧ movable body

40-3‧‧‧可動體 40-3‧‧‧ movable body

40-3A‧‧‧可動體 40-3A‧‧‧ movable body

40-3B‧‧‧可動體 40-3B‧‧‧ movable body

40-3C‧‧‧可動體 40-3C‧‧‧ movable body

40-4‧‧‧可動體 40-4‧‧‧ movable body

40-5‧‧‧可動體 40-5‧‧‧ movable body

40-6‧‧‧可動體 40-6‧‧‧ movable body

40-7‧‧‧可動體 40-7‧‧‧ movable body

50‧‧‧連結機構 50‧‧‧Linked institutions

51‧‧‧凹球面部 51‧‧‧ concave spherical face

52‧‧‧凸球面部 52‧‧‧ convex spherical face

54‧‧‧螺旋彈簧 54‧‧‧Coil spring

60‧‧‧桿 60‧‧‧ pole

60A‧‧‧第1桿 60A‧‧‧1st shot

60B‧‧‧第2桿 60B‧‧‧2nd shot

70‧‧‧驅動裝置 70‧‧‧ drive

70A‧‧‧第1驅動裝置 70A‧‧‧1st drive unit

70B‧‧‧第2驅動裝置 70B‧‧‧2nd drive unit

80‧‧‧控制裝置 80‧‧‧Control device

81‧‧‧位置檢測部 81‧‧‧Location Detection Department

82‧‧‧負載檢測部 82‧‧‧Load Detection Department

110‧‧‧剝離裝置 110‧‧‧ peeling device

132‧‧‧基體板 132‧‧‧ base board

132a‧‧‧彎曲槽 132a‧‧‧curve groove

232‧‧‧基體板 232‧‧‧ base board

232a‧‧‧板狀部 232a‧‧‧plate

232b‧‧‧外框部 232b‧‧‧Outer frame

B-B‧‧‧線 B-B‧‧‧ line

C-C‧‧‧線 C-C‧‧‧ line

D1‧‧‧板狀部232a之厚度 D1‧‧‧ Thickness of the plate portion 232a

D2‧‧‧外框部232b之厚度 D2‧‧‧ Thickness of the outer frame portion 232b

H‧‧‧距離 H‧‧‧ distance

M‧‧‧方向 M‧‧‧ direction

N‧‧‧距離 N‧‧‧ distance

P‧‧‧交點 P‧‧‧ intersection

X‧‧‧中心線 X‧‧‧ center line

圖1係表示供至電子裝置之製造步驟之積層板之一例的側視圖。 Fig. 1 is a side view showing an example of a laminated board supplied to a manufacturing step of an electronic device.

圖2係於電子裝置之製造步驟之中途製作之積層體的一例之側視圖。 2 is a side view showing an example of a laminated body produced in the middle of the manufacturing process of the electronic device.

圖3係表示第1實施形態之剝離裝置之局部剖面圖。 Fig. 3 is a partial cross-sectional view showing the peeling device of the first embodiment.

圖4係表示圖3之剝離裝置之動作例之局部剖面圖。 Fig. 4 is a partial cross-sectional view showing an operation example of the peeling device of Fig. 3.

圖5(a)及5(b)係表示可撓性板之主要部分之一例之圖。 5(a) and 5(b) are views showing an example of a main part of a flexible board.

圖6係表示可撓性板上之複數個可動體之配置例之平面圖。 Fig. 6 is a plan view showing an arrangement example of a plurality of movable bodies on a flexible plate.

圖7(a)~7(c)係說明複數個可動體之動作例之圖。 7(a) to 7(c) are diagrams showing an operation example of a plurality of movable bodies.

圖8係表示第2實施形態之剝離裝置之局部剖面圖。 Fig. 8 is a partial cross-sectional view showing the peeling device of the second embodiment.

圖9係表示圖8之剝離裝置之動作例之局部剖面圖。 Fig. 9 is a partial cross-sectional view showing an operation example of the peeling device of Fig. 8.

圖10(a)~10(f)係表示使用有圖8之剝離裝置之剝離步驟 之一例的圖。 Figures 10(a) to 10(f) show the peeling step using the peeling device of Figure 8 A diagram of an example.

圖11(a)~11(f)係表示使用有圖8之剝離裝置之剝離步驟之其他例的圖。 11(a) to 11(f) are views showing other examples of the peeling step using the peeling device of Fig. 8.

圖12A係表示圖6之變形例之平面圖。 Fig. 12A is a plan view showing a modification of Fig. 6.

圖12B係表示圖6之其他變形例之平面圖。 Fig. 12B is a plan view showing another modification of Fig. 6.

圖13係表示基體板之變形例之平面圖。 Fig. 13 is a plan view showing a modification of the base plate.

圖14(a)及14(b)係表示基體板之其他變形例之平面圖。 14(a) and 14(b) are plan views showing other modified examples of the base plate.

2‧‧‧基板 2‧‧‧Substrate

3‧‧‧加強板 3‧‧‧ Strengthening board

6‧‧‧積層體 6‧‧‧Layer

6a‧‧‧第2主面 6a‧‧‧2nd main face

6b‧‧‧第1主面 6b‧‧‧1st main face

8‧‧‧界面 8‧‧‧ interface

8a‧‧‧外周 8a‧‧‧outweek

8b‧‧‧剝離開始端 8b‧‧‧ peeling start

9‧‧‧邊界線(剝離前線) 9‧‧‧ boundary line (peeling front line)

20‧‧‧平台(支持機構) 20‧‧‧ Platform (support organization)

30‧‧‧可撓性板 30‧‧‧Flexible board

31‧‧‧吸附部 31‧‧‧Adsorption Department

32‧‧‧基體板 32‧‧‧ base board

40-2‧‧‧可動體 40-2‧‧‧ movable body

40-3‧‧‧可動體 40-3‧‧‧ movable body

40-4‧‧‧可動體 40-4‧‧‧ movable body

40-5‧‧‧可動體 40-5‧‧‧ movable body

40-6‧‧‧可動體 40-6‧‧‧ movable body

40-7‧‧‧可動體 40-7‧‧‧ movable body

B-B‧‧‧線 B-B‧‧‧ line

C-C‧‧‧線 C-C‧‧‧ line

H‧‧‧距離 H‧‧‧ distance

M‧‧‧方向 M‧‧‧ direction

N‧‧‧距離 N‧‧‧ distance

Claims (10)

一種剝離裝置,其係自一端側向另一端側依次剝離基板與加強該基板之加強板之界面,且包括:支持機構,其支持包含上述基板及上述加強板之積層體之第1主面;可撓性板,其吸附上述積層體之第2主面;複數個可動體,其空開間隔而固定於該可撓性板上,可相對於上述支持機構獨立地移動;及控制裝置,其控制上述複數個可動體之移動;且上述控制裝置於已剝離上述界面之部分與未剝離上述界面之部分之邊界線的兩端間之直線距離成為最長時,以使上述邊界線成為於該邊界線之移動方向後方凸出之彎曲狀之方式,控制上述複數個可動體之移動。 A peeling device for sequentially peeling an interface between a substrate and a reinforcing plate for reinforcing the substrate from one end side to the other end side, and comprising: a supporting mechanism that supports a first main surface including the laminated body of the substrate and the reinforcing plate; a flexible plate that adsorbs the second main surface of the laminated body; a plurality of movable bodies that are fixed to the flexible plate at intervals, are independently movable with respect to the support mechanism; and a control device Controlling movement of the plurality of movable bodies; and the control device sets the boundary line at the boundary when the linear distance between the two ends of the boundary line between the portion where the interface has been peeled off and the portion where the interface is not peeled off is the longest The movement of the plurality of movable bodies is controlled in such a manner that the moving direction of the line is convex at the rear. 如請求項1之剝離裝置,其中上述複數個可動體於剝離開始前自相對於上述界面垂直之方向觀察時,配置於上述界面之外周之內側附近、該外周上、或較該外周更外側,於上述複數個可動體中配置於上述界面之剝離開始端之前方的複數個上述可動體中,距上述界面之剝離開始端之特定方向上之距離較短的上述可動體係先於上述距離較長之上述可動體而相對於上述支持機構離開。 The peeling device of claim 1, wherein the plurality of movable bodies are disposed near the inner side of the outer periphery of the interface, on the outer circumference, or outside the outer circumference, when viewed from a direction perpendicular to the interface before the start of peeling, Among the plurality of movable bodies disposed in the plurality of movable bodies before the peeling start end of the interface, the movable system having a short distance from a specific direction of the peeling start end of the interface is longer than the movable distance The movable body is separated from the support mechanism. 如請求項1之剝離裝置,其中於剝離開始前自相對於上述界面垂直之方向觀察時,距上述界面之剝離開始端之特定方向上之距離相同的3個以上之上述可動體中兩端 之上述可動體,配置於上述界面的外周之內側附近、該外周上、或較該外周更外側,其餘之上述可動體配置於較該外周更內側,上述兩端之可動體係先於上述其餘之可動體而相對於上述支持機構離開。 The peeling device according to claim 1, wherein the two ends of the movable body having the same distance in a specific direction from the peeling start end of the interface are viewed from a direction perpendicular to the interface before the start of peeling The movable body is disposed near the inner side of the outer periphery of the interface, on the outer circumference, or outside the outer circumference, and the remaining movable body is disposed further inside than the outer circumference, and the movable systems of the both ends precede the remaining The movable body is separated from the support mechanism. 如請求項1至3中任一項之剝離裝置,其中上述可撓性板包含吸附上述積層體之第2主面之吸附部、及支持該吸附部之基體板,該基體板之彎曲剛性高於上述吸附部之彎曲剛性,於上述基體板之表面,設置於上述邊界線之移動方向後方凸出之彎曲槽。 The peeling device according to any one of claims 1 to 3, wherein the flexible plate includes an adsorption portion that adsorbs the second main surface of the laminate, and a base plate that supports the adsorption portion, the base plate having high bending rigidity The bending rigidity of the adsorption portion is provided on a surface of the base plate at a curved groove that protrudes rearward in a moving direction of the boundary line. 如請求項1至3中任一項之剝離裝置,其中上述可撓性板包含吸附上述積層體之第2主面之吸附部、及支持該吸附部之基體板,該基體板之彎曲剛性高於上述吸附部之彎曲剛性,上述基體板係一體地包含板狀部及包圍該板狀部之外框部,上述外框部之厚度厚於上述板狀部之厚度。 The peeling device according to any one of claims 1 to 3, wherein the flexible plate includes an adsorption portion that adsorbs the second main surface of the laminate, and a base plate that supports the adsorption portion, the base plate having high bending rigidity In the bending rigidity of the adsorption portion, the base plate integrally includes a plate-like portion and a frame portion surrounding the plate-like portion, and the thickness of the outer frame portion is thicker than the thickness of the plate-like portion. 一種電子裝置之製造方法,其包括於以加強板加強之基板上形成功能層之步驟,及將形成有上述功能層之上述基板與上述加強板剝離之步驟,且將上述基板與上述加強板剝離之步驟係如下之步驟:藉由支持機構支持包含上述基板及上述加強板之積層體之第1主面,並且控制空開間隔而固定於吸附上述積層體之第2主面之可撓性板上之複數個可動體相對於上述 支持機構的移動,而自一端側向另一端側依次剝離上述基板與上述加強板之界面;且於已剝離上述界面之部分與未剝離上述界面之部分之邊界線的兩端間之直線距離成為最長時,以使上述邊界線成為於該邊界線之移動方向後方凸出之彎曲狀之方式,控制上述複數個可動體之移動。 A method of manufacturing an electronic device, comprising the steps of forming a functional layer on a substrate reinforced by a reinforcing plate, and separating the substrate on which the functional layer is formed from the reinforcing plate, and peeling the substrate from the reinforcing plate The step of supporting the first main surface including the laminate of the substrate and the reinforcing plate by a support mechanism, and controlling the gap to be fixed to the flexible plate that adsorbs the second main surface of the laminated body a plurality of movable bodies on the above The movement of the support mechanism is performed, and the interface between the substrate and the reinforcing plate is sequentially peeled off from the one end side to the other end side; and the linear distance between the both ends of the boundary line between the portion where the interface has been peeled off and the portion where the interface is not peeled off becomes At the longest time, the movement of the plurality of movable bodies is controlled such that the boundary line is curved in a direction in which the boundary line moves rearward. 如請求項6之電子裝置之製造方法,其中上述複數個可動體於剝離開始前自相對於上述界面垂直之方向觀察時,配置於上述界面之外周之內側附近、該外周上、或較該外周更外側,於上述複數個可動體中配置於上述界面之剝離開始端之前方的複數個上述可動體中,距上述界面之剝離開始端之特定方向上之距離較短的上述可動體係先於上述距離較長之上述可動體而相對於上述支持機構離開。 The method of manufacturing an electronic device according to claim 6, wherein the plurality of movable bodies are disposed near the inner side of the outer periphery of the interface, on the outer circumference, or above the outer circumference, when viewed from a direction perpendicular to the interface before the start of peeling Further, in the plurality of movable bodies disposed in the plurality of movable bodies before the peeling start end of the interface, the movable system having a short distance from a specific direction of the peeling start end of the interface precedes the The longer movable body is separated from the support mechanism. 如請求項6之電子裝置之製造方法,其中於剝離開始前自相對於上述界面垂直之方向觀察時,距上述界面之剝離開始端之特定方向上之距離相同的3個以上之上述可動體中兩端之上述可動體,配置於上述界面的外周之內側附近、該外周上、或較該外周更外側,其餘之上述可動體配置於較該外周更內側,上述兩端之可動體係先於上述其餘之可動體而相對於上述支持機構離開。 The method of manufacturing an electronic device according to claim 6, wherein, when viewed from a direction perpendicular to the interface before the start of peeling, among the three or more movable bodies having the same distance from the peeling start end of the interface in a specific direction The movable body at both ends is disposed near the inner side of the outer periphery of the interface, on the outer circumference, or outside the outer circumference, and the remaining movable body is disposed further inside the outer circumference, and the movable systems at the both ends are preceded by the The remaining movable bodies are separated from the support mechanism described above. 如請求項6至8中任一項之電子裝置之製造方法,其中上述可撓性板包含吸附上述積層體之第2主面之吸附部、 及支持該吸附部之基體板,該基體板之彎曲剛性高於上述吸附部之彎曲剛性,於上述基體板之表面,設置於上述邊界線之移動方向後方凸出之彎曲槽。 The method of manufacturing an electronic device according to any one of claims 6 to 8, wherein the flexible plate includes an adsorption portion that adsorbs the second main surface of the laminate, And a base plate supporting the adsorption portion, wherein the base plate has a bending rigidity higher than a bending rigidity of the adsorption portion, and a curved groove that protrudes rearward in a moving direction of the boundary line on a surface of the base plate. 如請求項6至8中任一項之電子裝置之製造方法,其中上述可撓性板包含吸附上述積層體之第2主面之吸附部、及支持該吸附部之基體板,該基體板之彎曲剛性高於上述吸附部之彎曲剛性,上述基體板係一體地包含板狀部及包圍該板狀部之外框部,上述外框部之厚度厚於上述板狀部之厚度。 The method of manufacturing an electronic device according to any one of claims 6 to 8, wherein the flexible plate includes an adsorption portion that adsorbs the second main surface of the laminate, and a base plate that supports the adsorption portion, the base plate The bending rigidity is higher than the bending rigidity of the adsorption portion, and the base plate integrally includes a plate portion and a frame portion surrounding the plate portion, and the thickness of the outer frame portion is thicker than the thickness of the plate portion.
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