TW201224903A - Touch panel - Google Patents

Abstract

A touch panel using a metal fine wire electrode which has stable performance to environment variation is provided. The touch panel has an excellent response ability even having a large area, and can realize multi-touch. The electrostatic capacitive touch panel has a first sensing electrode array and a second sensing electrode array orthogonally arranged thereto. The characteristic of the electrostatic capacitive touch panel is as following. The first sensing electrode array disposed on the side of a touching user includes a patterned conductive metal fine wire formed on a transparent substrate having an easily adhesive layer.

Description

201224903 jy/4^pif VI. Description of the Invention: [Technical Field of the Invention] The present invention relates to a sensor electrode array excellent in reflection chromaticity and a touch panel used in a projection type electrostatic capacitance method ( A preferred sensing electrode array, a method of using the sensing electrode array, a manufacturing method, and a touch panel. [Prior Art] In general, a capacitive touch panel is a position input device that captures a change in electrostatic capacitance between a fingertip of a person and a conductive film to detect the position of the fingertip. The capacitive touch panel has a surface type touch panel and a projection type touch panel. The surface type touch panel has a simple structure, but it is difficult to detect more than two points of contact (multitouch) at the same time. On the other hand, the projection type touch panel is configured such that a plurality of electrodes are arranged in a matrix shape, and more specifically έ 'a plurality of first electrode groups are arranged in the horizontal direction, and a plurality of second layers are interposed. The electrode groups are arranged in the vertical direction to form a projection touch panel, and the projection type touch panel has a configuration in which the first electrode group and the plurality of second electrode groups are gradually changed in capacity. The detection is performed, whereby multi-touch can be detected. In recent years, for the touch panel as described above, the multi-favorite control and the large-sized product are being developed. The above-mentioned projection type electrostatic capacitance method* is being developed. A transparent conductor, indium tin oxide (Lithium (10) Ti 222 or the like, is gradually used as the electrode material, but the resistance of the electrode material of 1 °, '. ^ 1 required for the large-faced surface is high, which becomes thinning.

S 4 201224903 jy/44pif and touch surface (four) should be hindered. In order to solve the above problems, the following technology is being developed, which is a process for processing metal films of gold, silver, and saki, and forming a group of electrodes by a line of conductive thin wires that are not visible to the touch person ( Patent Document 1). Further, in the case of the problem of the influence of the subtle metallic color and the gloss on the kneading surface by the use of the metal thin film, Patent Document 2 discloses a method of blackening the metal surface, but the durability is insufficient. Even if a low-resistance conductive thin wire can be formed by microfabrication of a metal thin film, it is difficult to stably produce a large-area electrode pattern without causing the metal thin wire to be broken or broken. Further, the following problems or problems of color tone change have not been solved. The above problem means that the metal thin wires formed cause migration and the responsiveness of the touch panel is lowered due to environmental changes after the formation of the touch panel. [Prior Art Document] [Patent Document 1] [Patent Document 1] International Patent Publication No. 2010/014683 (Patent Document 2) Japanese Patent Laid-Open Publication No. Hei. No. Hei. The invention has been made in view of the above problems, and an object of the present invention is to provide a touch panel which is excellent in responsiveness even when the area is large, and uses a metal thin wire electrode capable of realizing multi-touch. Further, it is an object of the present invention to provide a touch panel in which the reflected hue of the touch panel is stabilized throughout the entire surface. Further, another object of the present invention is to provide a touch panel using a metal thin wire electrode which is stable against environmental changes such as 5 201224903 jy/44pif high temperature and high humidity. Further, the purpose of the present invention is to provide a touch panel which is stably manufactured with a stable quality and using a metal thin wire electrode. D-type touch panel, comprising a first-inductive hard-to-pole array, wherein the touch surface is characterized in that: the first - (9) transition is a conductive metal thin color to produce a reflection chromaticity L ab of the sensing electrode array L is 6 to 13, and a, _〇7 is called 5, 〇~丄2. The touch panel of the first aspect, further comprising the touch panel of the first aspect, characterized in that: between the above-mentioned, and the thin metal wires and the transparent substrate; At least i or more easy adhesion layers. The board is a touch panel, and the dragon is: the touch panel of the above-mentioned touch surface. 5) A touch panel of electrostatic capacitance type, which is arranged orthogonally to the H (four) alignment, and the touch panel 1 of the electrostatic capacitance method is characterized in that: the first sensing electrode array disposed on the toucher side is transparent! The touch panel according to Item 1 or 5, wherein the conductive metal thin wires of the above-mentioned 匕 are blackened on the touch surface side. Floor. The touch panel of the second aspect is characterized in that the surface roughness of the blackened layer is less than or equal to 15.15. 201224903 jy/44pif, the electrostatic capacitance touch panel according to item 5, wherein the reflection chromaticity L*a*b* of the upper electrode array is 1^643, 4.07~, b* is as follows. ~... The touch panel of any one of item 2 to item 5, wherein the sensing electrode of the first sensing electrode array of the first layer is a mesh formed by the thin line. Diamond (dia_d) The sense of the second sensing electrode array described above, the sensing electrode phase configuration or the bar configuration of the first sensing electrode array. The touch panel of any one of clauses 2 to 5, characterized in that: the second sensing of the first sensing electrode array disk arranged in the right parent, when the electrode array is fluoroscopy, The patterned conductive metal lines j touch faces form a substantially uniform lattice pattern. The touch panel according to Item 1 or 5, characterized in that the conductive thin metal wire is made of a light film (phGtGlithQgraphy), and a metal film is used. The layer is patterned into a thin line pattern having a line width of 1000 nm to 8000 nm. The touch panel according to Item 1 or Item 5, wherein the conductive metal thin line has a thickness of 25 times or more. The touch panel of item 3 or 5, wherein the transparent substrate comprises a poly-lipid, and the adhesive layer comprises a polyester resin, an acrylic resin or a fine-grained layer, A crosslinking agent is added. The touch panel of claim 13, wherein the easy-adhesive layer comprises a first easy-adhesive layer and a second easy-adhesive layer, and the first easy-adhesive layer is connected to the transparent substrate 7 201224903 39744pif The bonding layer comprises a polyurethane grease layer comprising a dilute acid resin or an amine resin. The touch panel according to Item 13, wherein the crosslinking agent is an oxazolidine compound, an epoxy compound, or a cyanide compound. The touch panel according to Item 14, wherein the crosslinking agent is an oxazolidine compound, an epoxy compound, or an isocyanate compound. [Effect of the Invention] As described in the above, according to the sensing electrode array, the method of using the sensing electrode array, and the touch panel of the present invention, the following touch panel can be obtained, and the touch panel has a large area. It is also excellent in responsiveness, can achieve multi-touch, and is stable against environmental changes such as high temperature and high humidity, and it is really possible to obtain a touch panel that can be stably manufactured and has stable quality. [Embodiment] The present invention is the following invention as described in the above-mentioned "Problems to be Solved by the Invention", and an object of the present invention is to provide a touch panel which is excellent in responsiveness even when the area is large. Moreover, a metal thin wire electrode capable of realizing multi-touch is used, and the above invention aims to provide a touch panel in which the reflection color of the touch panel is stable throughout the entire screen, and environmental changes such as high temperature and high humidity are also It is stable in performance, stable in manufacturing and stable in quality. Hereinafter, the touch panel of the present invention described above will be described in detail. In the present specification, "~" is used as the following meaning, which means that the numerical value disclosed after "~" is used as the lower limit value and the upper limit 201224903 iy/44pif value. 1(a) and 1(b) show a first embodiment of the touch panel of the present invention. FIG. 1(a) and FIG. 1(b) illustrate a multi-layered electrostatic ^= mode touch panel. The multi-layered electrostatic capacitance type touch panel is characterized in that: (a) the upper side of the toucher side includes: a transparent material layer 16 constituting the touch surface, and an adhesive layer 19 serving as an insulating layer, The first sensing electrode array, the easy adhesion layer 18, the transparent substrate 15, the adhesive layer which also serves as an insulating layer, the second sensing electrode array 12, the easy adhesion layer 18, the transparent substrate 15, and the adhesion f 19' , and the release film 17 . Figure 1 (a), figure! The scale layer and the release film of (b) are required for attaching the touch panel of the present invention to a display device or the like, and may not exist. The configuration of the drawing differs from the configuration of Fig. 1(a) in that the easy-adhesion layer, the electrodeposition electrode array, and the adhesive layer are symmetrically laminated on both faces of the transparent substrate 15. Fig. 1(a) shows a preferred configuration when the upper electrode and the lower electrode are formed on different substrates, and ® 1(8) indicates that the first sensing electrode is formed on the front and back surfaces based on the front and back electrodes. Ji Yijia constitutes. Further, although not shown in the drawing, the arrangement of the first sensing electrode array is also shown. And the arrangement direction of the second sensing electrode array is set to be positively arranged with each other across the transparent substrate, and the material is detected for the touch of the rural area. Hereinafter, the (four) material and the method of manufacturing the electrode in the above-described sensing electrode will be described in order. 201224903 • iy.mpif [Transparent material layer, transparent substrate] The transparent material used in the transparent material layer 16 and the transparent substrate 15 and 15 constituting the touch surface may be the same material, or may be differently used. For the material, a plastic film, a plastic plate, a glass plate, or the like can be used. It is preferred to appropriately select the thickness of the layer in accordance with each use. The above materials are preferably flexible. - As a raw material of the above plastic film and plastic plate, for example, t 曰 曰 'polyethylene (p〇lyethylene) of poly _ f ^ ^ Polyethylene Terephthalate > PET ) > ( Polyethylene Naphthalate > PEN) f can be used. Polyethers such as pE), Polypropylene (PP), polystyrene, and Ethylene Vinyl Acetate 'EVA; Ethylene resins; in addition, polycarbonate (Polycarbonate, PC) can be used. Polyamide, polyimine, acrylic resin, and triacetyl cellulose (TAC). Preferred materials are 'PET (melting point: 258 ° C), PEN (melting point: 269 ° C), PE (melting point: i35 ° C), PP (melting point: 163 < t), polystyrene (melting point: 230 ° C), polyvinyl chloride (melting point: 18 〇. 〇), polyvinylidene gas (melting point: 212. 〇 or TAC (melting point: 29 (TC), etc., melting point of about 290 的 plastic film or plastic plate Preferably, pET is particularly preferable from the viewpoints of light transmittance, workability, etc. The thickness of the film or the sheet is preferably from 5 Å to 300 μm. In order to prevent adhesion of dirt and dust caused by touch, the above-mentioned touch surface is formed. The transparent material layer 16 may also be provided with an antifouling layer. Further, an anti-reflective layer against the 201224903 39744pif layer may be provided for improving the gradation of the picture caused by reflection of external light. A well-known technique in the field of an anti-reflection film or an anti-glare film can be used (Japanese Patent Laid-Open Publication No. 2005-535934, Japanese Patent Laid-Open Publication No. Hei No. Hei No. Hei No. Hei No. Hei. Forming method of the layer] The easy-adhesion layer 18, 18' of the present invention is included on the transparent substrate One or two layers of an adhesive layer containing a binder resin, a crosslinking agent, and an additive. The binder resin used in the present invention is not particularly limited, but can be preferably used (a) a polymer such as an acrylic resin, (b) a polyurethane resin, (c) a polyester resin, and (d) a rubber-based resin. The cerium (a) acrylic resin is acrylic acid, methacrylic acid, and the like. The derivative of the present invention is a polymer of the component. Specific examples thereof include the following polymers: acrylic acid, methacrylic acid, decyl acrylate vinegar, ethyl acrylate, butyl acrylate, and 2-acrylic acid. Ethylhexyl ester, decylamine acrylate, acrylonitrile, and hydroxy acrylate are main components, and a monomer copolymerizable with the above main component (for example, styrene or divinylbenzene) is copolymerized. The polyurethane resin is a polymerization comprising an amine phthalate linkage in the main chain, and is generally obtained by the reaction of a polyisocyanate with a polyol. The polyisocyanate is TDI, MDI, NDI, TODI. , HDI, and IPDI荨, the polyol is ethylene glycol, propylene glycol, glycerol, hexanetriol, etc. Further, as the isocyanate of the present invention, the polymer is used for the polyisocyanate and the polyol. The poly 11 201224903 39744pif amine vinegar polymer obtained by the reaction is subjected to a chain extension treatment to increase the molecular weight. With regard to the above-mentioned polyisoprene (10), polyol, and chain extension treatment, for example, it has been disclosed in "Polyfine resin". Handbook (edited by Iwata Katsuyuki, Nikkan Kogyo Shimbun, published in Showa 62). (c) Polyester resin is a generic term for polymers that include ester linkages in the main chain' and is usually multi-nuclear and multi-component Obtained by the reaction of an alcohol. The polyacid is, for example, fumaric acid, sulfinic acid, adipic acid, sebacic acid, terephthalic acid, and the like. Examples of the polyhydric alcohol include the above alcohols. The raw materials of the poly-resin resin and the poly-resin resin are disclosed, for example, in the "Hand Brewing Resin Handbook" (written by Daisuke Eiyama, Nikkan Kogyo Shimbun, Showa). ..., Ding County butyl-ene, 4 ethylene. Dibutyl diene copolymer,] fr di-n-acrylonitrile copolymer, benzene (10) C ethylene benzene: lanthanide di-i acrylonitrile copolymer, and polychloroprene Wait. Guan Shiguo (slave) Asakura Bookstore, issued in Showa 42). As the crosslinking agent used in the present invention, for example, I. a compound, a trimeric amine compound, and a different; St: compound hydrazine compound, examples thereof include an early oxygen compound such as a polycyclic ring compound, and a glycidol polycondensate, and are "epoxy compounds, for example, sorbose. Alcohol, H-alcohol, polycondensation, and pentaerythritol condensation

S 12 201224903 39744pif glyceryl ether, diglycerol polyglycidyl ether, triglycidyl tris(2-hydroxyethyl)isocyanate, glycerol polyglycidyl ether, and trishydroxypropylpropane polyglycidyl ether; Examples of the diepoxy compound include neopentyl glycol diglycidyl ether, 1,6-hexanediol diglycidyl ether, resorcinol diglycidyl ether, ethylene glycol diglycidyl ether, and polyethylene glycol. Diglycidyl ether, propanol diglycidyl mystery, polypropylene glycol diglycidyl _, and polybutylene glycol diglycidyl ether; as the monoepoxy compound, for example, allyl epoxypropyl ether, 2- Ethylhexyl glycidyl ether, phenyl glycidyl ether; as the glycidylamine compound, exemplified by ^3, :^,::^,-tetraglycidyl_m-xylylenediamine, 1,3-double ( N,N-glycidylamino)cyclohexane or the like. The oxazoline compound used in the present invention is preferably a oxazoline group-containing polymer. Such a polymer may be produced by a monomer containing an addition polymerizable oxalate group, or may be produced by polymerization with other monomers. Examples of the monomer having an addition polymerization property of oxalinyl group include ethyl 4-amino group 1, 2 oxazoline, 2-isopropenyl-2-oxazoline, 2-isopropenyl _4. _Methyloxazole and 2-isopropyl-5-ethyl-2-" oxalate, etc., may use one of the above-mentioned monomers containing an addition polymerizable oxazoline group, or two types may be used. The above mixture containing a monomer having an addition polymerizable η σ 圭 圭 圭 。 。 。 。 。 。 。 。 2 2 2 异丙 异丙 异丙 异丙 异丙 异丙 异丙 异丙 异丙 异丙 异丙 异丙 异丙 异丙 异丙 异丙 异丙 异丙 异丙 异丙 异丙 异丙 异丙 异丙The monomer copolymerized with the polymerized oxazoline group is not limited, and examples thereof include an alkyl acrylate and an alkyl methacrylate (alkyl group is an alkyl group, an ethyl group, an η-propyl group, and an isopropyl group). y (〆 ) ) 夕 夕 夕 夕 夕 夕 夕 夕 夕 夕 夕 夕 夕 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 Unsaturation of acrylic acid, sulfhydryl succinic acid, maleic acid, fumaric acid, crotonic acid, styrene sulfonic acid and its salts (sodium salt 'potassium salt, ammonium salt, and third amine salt, etc.) Carboxylic acid; propylene Unsaturated nitriles such as nitrile and mercapto acrylonitrile; acrylamide, mercapto acrylamide, N_= propylene amide, N-alkyl mercapto decylamine, N,N-dialkyl decyl amide And hydrazine, bis-dialkyl methacrylate (alkyl group is fluorenyl, ethyl, n_ = group, isopropyl, η-butyl, isobutyl, t-butyl, 2-ethylhexyl and Unsaturated guanamine group such as % hexyl or the like; ethylene lysate such as vinyl acetate or vinyl propionate; methyl ethylene _, ethyl ethene ethylene ruthenium; Olefins; gas-containing ethylene, ethylene-terminated ethylene, and fluorine-J; alkenes-containing alizarin-α, anthracene-unsaturated monomers; and α,β-unsaturated aromatics such as styrene and α-methyl stupidene As the monomer or the like, one type of the above monomer may be used or two or more types of monomers may be used. The melamine compound used in the present invention is preferably a combination of the following = and a mixture of the above compounds. Alcohol methanol, ethanol, and isopropanol react with hydroxymercapto melamine derivative obtained by condensation of melamine with formic acid The obtained: as a methyl melamine derivative, for example, methyl melamine, methyl melamine, dimercapto melamine, tetramethyl melamine pentamethylol melamine, and Hexahydroxyindole melamine, etc. - As the isocyanate compound used in the present invention, for example, stupid diisocyanate, diphenylmethane_4,4,_diisocyanate, methane = acid 'hexamethylene ♦ 2 Isocyanide, W diisocyanate hexane, an adduct of monoisocyanate and hexane triol, indole diisocyanate and three

S 14 201224903 39744pif Addition of hydroxymercaptopropane, polyol modified diphenyl decane _4,4, _ diisocyanate, carbon dinitride modified bismuth 曱 4, 4, _ 2 Isocyanate, isophorone diisocyanate, 1,5-naphthalene diisocyanate, 3,3,-dioxaphenyl, 4, monoisocyanate, 3,3-nonyldiphenyldecane-4,4L diisocyanate And m-phenyl diisocyanate. .......... "In addition to the weight of the addition of the grazing/Baiyu cross-linking agent, the phase: is preferably added in the range of 1 wt% to i0 〇 wt% of the binder, The range of 5 wt% to 50 wt% is better. If the addition amount is less than i plus %, then Ϊ = will be the surface 'If the addition amount exceeds the pile, the root f is used for each purpose. The invention is easy to stick ~ ^ L ^ = this special (4) _3635 paragraph paragraph 27 fall: two:: shot two = microparticles, the above-mentioned patent paragraph slip agent ' and paragraph 3 of the above patent = = = = = species interface activity <I ** terror improvement for each of the pairs: the connection, the easy adhesion layer can also be used in the case of double layer, if =- easy to bond layer. The first substrate is connected to the first easy adhesion The layered package; the lower composition, that is, the resin containing the acrylic resin or the amine sulphate, is easy to turn on the surface of the easy-adhesive layer and the second easy-wheel layer. - the compound, the epoxy compound, or the dissociating agent is preferably the outermost layer of the pyridine layer, and therefore, the thickness of the first easy-adhesion layer is preferably 30 nm or more and 3 due to the second easy adhesion 15 201224903 39744pif 〇〇nm below, more 65 nm or more and i5 〇 nm or less. When the thickness of the first easy-adhesion layer is less than 30 nm, the adhesion between the transparent substrate and the ith layer may be insufficient. The thickness of the first layer may be deteriorated and the thickness of the first layer may be deteriorated. Therefore, the thickness of the second easy-adhesion layer is not particularly limited, but in order to ensure excellent penetration. The thickness of the second easy-adhesion layer is preferably 10 nm or more and 5 〇〇〇 nm or less, more preferably 2 〇 or more and 1500 nm or less. If the thickness of the second layer is less than 10 If the thickness is more than 5,000 nm, the surface state may be deteriorated. In other words, it is preferable to set the easy adhesion of the present invention by coating. Layer 'However, there is no limitation on the method of forming the coating layer, and it is possible to apply a coating coater or a slant plate coater (slidec (10) coating, etc.). When using one layer and the second layer, the same method can be used, or the method can be used. In the second layer, after the coating is applied simultaneously with the first layer, the first layer and the second layer are dried, and the layer can be coated and the layer can be dried. Coating - The adhesive ship without the guide can be used as the adhesive layer of the insulating layer! 9 _, 19 ° There are many kinds of adhesives, among which acrylic resin can be used, % oxygen Resin type, benzene age resin type, and ethylene base resin type. The method for forming a layer is not particularly limited, and a screen printing method or the like can be used.

16 201224903 3y/44pif FIGS. 2(a) to 2(d) are cross-sectional views showing a second touch panel of the present invention, and FIG. 2(a) shows that the first sensing electrode array u of the present invention is formed in a transparent manner. In the case of the substrate 15, FIG. 2(b) shows a case where the first sensing electrode array 11 and the second sensing electrode array 12 are laminated in the same manner as in the drawings (a) and (i). Furthermore, although not shown in the figure, the arrangement direction of the first sensing electrode array and the arrangement direction 疋δ of the second sensing electrode array are arranged orthogonally to each other across the transparent substrate, and The composition of multi-touch. 2(c) and 2(d) show a case where the layers necessary for the touch panel are provided on the electrodes of the two layers of FIG. 2(b), and the thickness of the touch panel is as shown in FIG. 1 (a) The same touch panel as Figure 1 (b). The material of the [transparent material layer, transparent substrate], [easy adhesion layer] used in the second invention described above and the method of forming the same can be used as described in the first aspect of the invention. [Reflected chromaticity] The conductive metal layer of the sensing electrode array of the present invention has an inherent reflected color 'so 'must adjust the reflected color to a neutral color as much as possible'. It is preferable to adjust the reflected chromaticity. Therefore, L* in the L*a*b* color specification system is 6 to 13, a* is -0.7 to 1.5, and b* is -5.0 to 1.2. More preferably, L* is 6 to 12, a* is -0.6 to 1.2, and b* is -4.8 to 1.0. Furthermore, the 'L a b color system is the International Commission on Illumination (Commission)

Internationale de l'Eclairage, CIE) The colorimetric method established in 1976. The L* value, the a* value, and the b* value in the present invention are according to the method specified in JIS-Z8729: 17 201224903 jy /44pif 1994. The value obtained by the measurement was performed. The measurement method of JIS_Z8729 includes a measurement method using reflection and a measurement method using transmission. However, in the present embodiment, a value obtained by measurement using reflection is used. Regarding the l* value, the a* value, and the value in the L a b color system, it is well known that the L value represents brightness, and the a* value and b* value represent hue and chroma. Specifically, if the sign of the a value is positive, it represents the hue of red, and if the sign of the 〆 value is negative, it represents the hue of green. If the sign of the b* value is positive, then the yellow *color phase, if the sign of the b* value is negative, is the blue hue. Further, both the a value and the b value are larger the value, and the greater the chroma of the color and the brighter the color, the smaller the absolute value, the smaller the chroma. In the present invention, the value of a changes from a clear red color to a value as small as possible, and the b* value changes from a clear yellow to a negligible blue color, whereby an easily recognizable touch panel is intended. Details of the assay method are disclosed in the examples. [Structure of Sense Electrode Array] FIG. 3 is an explanatory view of the first sensing electrode array u of the present invention, and two orthogonal conductive lines are used to connect orthogonal grid-shaped grids along the 乂 direction to form one electrode. Such electrodes are arranged in the Y direction to form a = pole array. Here, regarding the X direction and the γ direction, the vertical direction 7 of the touch screen when the touch panel is created is defined as the X direction, and the horizontal direction is defined as the Υ direction. The grid structure of Fig. 3 is a square lattice and the shape is also roughly square, and the shape seen from the electrode direction is a diamond shape. The outer = m of the above grid is formed with a conductive miscellaneous line represented by i. The fourth embodiment is a diagram for explaining the first sensing electrode array 12 of the present invention, using two conductive thin

S 18 201224903 3y/44pif line, along the 丫杨, the orthogonal grid _ net material is the same as the first sensing electrode array u. even,,'. In addition, a substantially uniform lattice of the array electrode array and the second sensing electrode array thin line is formed; the sub-level is formed with the conductive sarcophagus 1i, the text on the control surface. The portion of the sensing electrode is generally referred to as a diamond structure and is electrically connected to the electrode without being electrically connected to the electrode, and is disposed without any alignment; I·. 啻W*, . On the right side, the non-conducting portion reflectance across the electrode, #电减叫i', due to the difference between the electrode portion and the material portion, and the difference in color tone, it is possible to lose $丨丨m. L Qiu et al. 4~2:ΐ Configure the thin wire i that is not conductive. The thin line i of the non-V-pass in Fig. 3 is described as being isolated. The thin line i is additionally connected to the electrode, and the U-input 17 uses the path 1 to control the parasitic capacitance. The shape of the thin line of the two-dimensional grid structure is 05哗„Η) μΐη町' is preferably i μιη or more and is 8 or less, and is more than 5 μηη. The line width is 0.5 or more and 10 μm or less, whereby the processing can be easily performed and interference fringes can be prevented. The length of one side of the lattice constituting the mesh is preferably (10) or more and 600 or less. It is preferably 15 〇 μηη or more and 35 〇 _ or less. The length of one side of the lattice is set to 1 〇〇 or more and 600 μηη or less, thereby achieving both light transmittance and low resistance value. The conduction caused by the drive of the sinusoidal wave is preferably 50 μηι or more, more preferably (10) μηι or more, further preferably 150 μm or more and 350 μηη or less across the electrode. 201224903 Electrodes of the sensing electrode array The interval is preferably 2 or more and 8 mm or less, and more preferably 3 mm or more and 7 mm or less. π η to 8 is a strip shape which is different from the electrode pattern of the diamond structure of FIGS. 3 to 5 . Diagram of the constructed electrode pattern Fig. 6 shows a strip-shaped first sensing electrode array, and exemplifies a case where the electrodes constituting the array extend in the γ direction, and along χ J to I, the 〜 in the electrode diagram indicates sensing. The width of the electrode η indicates the width of the non-conductive boundary region between the sensing electrodes. The 荽γ + electrode Γ1 is a detailed structure in which four linear thin lines extending along the two sides are connected, and A line connecting the χ direction in which a plurality of (4) upper thin wires are connected. In the following manner == line C, even if four straight lines extending along the Υ direction, 'any line in the field line' In the failure of the material, the forest will be damaged as the function of the sensing electrode. The extension of the above-mentioned connecting line e: the short line i of the second electric thin line. The single line 丨 is ^ ^ two = '4 pieces constitute an electrode Straight line 2: The distance between the electrodes and the thin line disclosed below Fig. 7 shows a strip-shaped second sensing electrode array, in which case, the electrode e_j constituting the array extends in the z-direction, and Μ. The CW in the figure indicates that the sensing power is the same. However, it can also be based on the aspect ratio of the touch panel, etc.

S 20 201224903 3y/44pif cd will be changed. Fig. 8 is a perspective view showing a state in which the first sensing electrode array and the second sensing electrode array are arranged orthogonally, and a substantially uniform lattice pattern of conductive thin wires is formed on the entire control surface. Between the first sensing electrode array and the second sensing electrode array, the gap between the first sensing electrode array and the second sensing electrode array is buried, and the connecting line c is isolated and isolated. Short line i. In order to form a substantially uniform lattice pattern of the conductive thin wires over the entire touch surface, the connection line e and the isolated short line 1' are disposed so that %· does not cause a problem in visibility. The thin wire i may be additionally connected to the electrode and used to control the parasitic capacitance. The line width of the thin wires constituting each electrode of the strip-shaped sensing electrode array, the thin line of the connecting portion C, and the thin line of the isolated short line i are preferably 〇5 or more and 10 Å or less, more preferably 1 or more. It is 8 μηχ or less, more preferably 2 μιη g and 5 μηι or less. The line width of the above-mentioned fine line is set to 〇.5 μΓη or more and 10 μηη or less, whereby the processing can be easily performed and interference fringes can be prevented. The interval between the thin wires constituting the electrode is preferably 1 Å or less, and more preferably 15 Å or more and 35 Å to $: The interval between the thin lines is 100 μπι or more and 6 〇〇 μηι or less. Both light transmission and low resistance can be considered. In order to avoid conduction caused by the peripheral wave drive, the widths cd and rd of the non-conductive portion interposed between the electrodes are preferably 5 〇 μm or more, more preferably 丨 (8) or more, and further preferably 150 μm or more and 35 〇 μηι. the following. The interval (rw + rd or c w + c d ) of the electrodes of the sensing electrode array is preferably 21 201224903 jy / ^ pif is 2 mm or more and 8 mm or less, and more preferably 3 Å or more and 7 mm or less. 9(a) and 9(b) are first sensing electrode arrays of Figs. 1(a) and 1(b), 2(c) and 2(4) as a form of the touch panel of the present invention. 11 and the touch-sensing side surface of the second sensing electrode array 12 are provided with a blackening layer 20 and 20. Figure 9 (b) (5) The blackening layer of the second sensing electrode array is disposed between the easy-adhesion layer and the electrode array. In the present invention, the blackening layer is a layer which is provided for the purpose of achieving the following object, for example, a coloring and a high reflectance which are caused by a metal crucible of a conductive metal forming a conductive metal thin wire. The control panel can be moderately relaxed; or the conductive gold can be prevented from surging or migrating. The color of the blackening layer is preferably a color which can be substantially recognized as black, but as long as the metallic luster can be suppressed, the forest must be pure black: according to the above purpose, the position of the blackening layer is preferably in a conductive state. The toucher side of the metal layer is connected. According to the above point of view, the position of the blackening layer of the second sensing electrode array of the ® 9 (a) is better in preventing corrosion or migration than the blackening layer of the second sensing electrode array of FIG. 9 (8). . [Material of Sensing Electrode] Hereinafter, a conductive material which can form the first sensing electrode and the second sensing electrode of the present invention will be described. The light-transmitting conductive material such as tantalum is used as the material constituting the sensing electrode. However, the sensing electrode of the present invention uses a conductive thin wire of 1 m or less. A material having a lower electric resistance such as ITO is preferable to use a gold alloy having high conductivity. Ο 22 201224903 ^y/44pif Examples of such metals include copper, silver, gold, bismuth, cobalt, ruthenium, osmium, iron, nail, H, 'bar, tin, copper, bismuth, and lead. Wait. In the above metals, '·, ', 铌, button, titanium, copper, silver, gold, platinum, palladium, nickel, tin, aluminum become the point of Wu, 'Lv乂 and some of the metal alloys use the above metals When materials or alloys are used to form electrodes, the materials and methods disclosed in A) to C) can be used. The materials and methods under this issue are particularly preferred. A) and B) A) Utilization of metal foil or film. When used as a film, first, by the sputtering method, the ion 〇 'vapor deposition method', the sputtering method, the # 々 e e e e e e e e e e e e 电 电 电 电 电 电 电 电 电 电 电A metal thin film of the above metal or alloy is formed on the substrate. The metal thin film is, for example, just in the range of nm to _, and the following patterning forms a grid electrode. When the blush is expressed by the light, the developing solution is formed on the metal _, whereby a mesh pattern of the photoresist film is formed. The grid pattern of the photoresist film is engraved by = ί ί, and the photoresist is removed. Thus, when the shaft includes a thin metal wire and a photoresist wire into the above grid pattern, the screen is ^ Edition (inhibition) printing, and _ (secret (8) # method === pattern printing onto the metal film, by the side liquid to the part of the metal phase other than the photoresist coating portion, the photoresist The film 23 201224903 jy/44pif is peeled off, thereby forming a mesh pattern of metal thin wires. B) Printing the above by using ink w) (or paste) containing conductive nano particles (paste) The method of grid pattern. Conductive nanowires can also use carbon-) in addition to the fine particles of the metal. The conductive nanoparticle is preferably gold, silver, ruthenium, copper, carbon, or a particle containing a mixture of the above metals. The average particle size of the nanoparticles is 2, preferably fine to nm, in terms of forming a grid pattern, the particles (4) of the previous « (mi particles of the particles are preferred. Screen printing can be used) Or the gravure printing method may not be a metal particle but a conductive fiber contained in the ink (or the material). In the case of the case, it includes a wife, which is called a nanowire (10) wire. Fibrous substances, hollow-structured tubes (such as "), and nanotubes (_tube) are thin, called conductive fibers. The average short-axis length of the golden rice noodle (sometimes called "average short-axis diameter", " The diameter of the flat two"" is preferably below io 〇 nm, more preferably from 1 nm to 5 〇 nm, further preferably from 10 mn to 4 〇 nm, and particularly preferably from ls nm to 35 gamma. When electrical fibers are formed In the case of the conductive layer, for example, Japanese Patent No. 2009-215594, Japanese Patent Laid-Open No. Hei No. 2, No. 9-24, Japanese Patent No. 2009-299162, Japanese Patent Laid-Open No. Hei No. Hei No. Hei. And the combination of the disclosed Japanese Patent Laid-Open Publication No. Hei. No. Hei. The method is to perform development using a dentifrice photosensitive material used in a photograph, and then perform development, 24 201224903 jy/H^pir fixing treatment, and obtain a conductive thin line pattern by developing silver. The method of obtaining the conductive fine line pattern in the present month includes three forms of the following lining depending on the form of the photosensitive material and the developing portion 1. (1) Morphology: Chemical development or photographic of a photosensitive _ silver black-and-white photosensitive material not containing a physical development nucleus, and a metal silver portion is formed on the photosensitive material. (2) Form: The photosensitive sensitized silver black-containing photosensitive material containing a physical development nucleus in the silver halide emulsion layer is subjected to dissolution physical development, and a metallic silver portion is formed on the photosensitive material. (3) Form: a photosensitive silver halide white photosensitive material not containing a physical development core is superposed on a sheet having a non-photosensitive layer containing a physical development core, and diffusion transfer development is performed to make gold Non-photosensitive Lin >}. ^ The form of the above (1) is an integrated black-and-white development type (ty-transparent conductive film such as a light-transmitting conductive film on a photosensitive material. The developed silver, chemical (four) silver or _ jing silver, secret silk (five) she The specific surface area of the second is high, and the subsequent electrowinning or physical development is too rich. For the form of the above (2), in the exposed portion, the physical = near-edge self-chemically soluble (4) is deposited on the developing core, whereby The conductive conductive film of the light-transmitting conductive material is formed on the material, and the form is also a black-and-white development type. The development effect is a precipitation of t ^ , and therefore, the activity is high, but the developed silver is a ί surface area. Small spherical shape. For the form of the above (3), in the unexposed portion, the self-forming silver particles 25 201224903 jy/4*pif are dissolved and diffused, thereby depositing on the developing core on the developing sheet, Thereby, a light-transmitting conductive film such as a light-transmitting conductive film is formed on the developing sheet. The form of the above (3) is a so-called separate type, and the developing sheet is peeled off from the photosensitive material. The form of use. Any form is optional Any of the negative type development processing and the reverse development processing (in the case of the diffusion transfer method, an autopositive type photosensitive material is used as the photosensitive material, whereby 'negative development processing can be realized' The chemical development, thermal development, dissolved physical development, and diffusion transfer development referred to herein mean the meanings as used in the industry, and are explained in general textbooks of photochemistry, such as "Photo Chemistry". (Kyoritsu Press, issued in 1955), "The Theory 〇f Photographic Processes -4thed." edited by CE K Mees (Mcmillan, issued in 1977). This case is related to liquid handling but can also be referenced. The heat-developing type is used as a technique of other development methods. For example, the techniques disclosed in the respective publications of Japanese Patent Laid-Open No. 2004-184693, Japanese Patent Laid-Open No. Hei No. 2004-334077, and Japanese Patent Laid-Open No. Hei No. 2005-010752 can be applied. Further, as for the method for producing the material and the conductive pattern used in the present invention, a grid-like electromagnetic wave shielding (shidd) film can be used. The invention is the disclosure and technology of the invention of Japanese Patent Application No. 2__265467, which is the disclosure of the Japanese Patent Application No. 2__352G73, and the invention of the electrostatic capacitance type touch panel. [Method of Forming Sensing Electrode]

S 26 201224903 The method of determining the % and the number of the 'electrode and the 'measured electrode' is described. Metal $_film (above Γ); 0 for (:) shape two face use = description. Fig. 1A (a) is a transparent view of the insulating layer::: The contactor is provided with a metal and a surface (8) on the surface of the film. Set the thin μ of Fang Niu right acre Λ #层21 (Fig. 10 from 3 3 ^ method _ vacuum film forming method ° 贱 key method or ^ ^ I too ^ ^ ^ ^ ^ ^ * when the film thickness exceeds 500 (10), It is possible to use i electroless magnetic recording method, and it is possible to use copper at a low cost, and the material disclosed in the above i1) 'but preferably silver or = gold. If the job law is used as a thin layer, it will be a method of hatred. It is preferable that the thickness of the thin metal layer formed is less likely to be peeled off, but if the thickness of the thin metal layer is higher, the electric resistance becomes higher, and the responsiveness as a touch panel is deteriorated. The thickness of the thin layer of the above metal is preferably α1 μm or more and 3 or more is preferably 0.2 μm or more and 2 μm or less. In order to prevent peeling, the ratio of the "= line width/thickness" of the == word is set to 2.5 or more, and it is more preferable that the ratio is set to 4 or more. Next, a photoresist film is formed on the formed metal thin film, j (according to FIG. 3, FIG. 4, FIG. 6, and FIG. 7, etc., the light sheet is a member that generates a mask turning), and the _developing wire Age, by this, 27 201224903 jy/44pif hardened light _ grid pattern. The (10) liquid is used to peel off the hardened photoresist 对 from the above-mentioned mesh, thereby forming a mesh pattern of thin metal wires (Fig. 10 ((〇). The mesh of the table shown in Fig. 10 (4) is not formed) a conductive thin line of the pattern. A coating layer 32 is provided on the above-described formed sensing electrode (Fig. (d)). In the present invention, the above-mentioned coating layer is referred to as a blackening layer. A function that does not make the metal luster of the metal or alloy conspicuous, and has a function of improving durability by preventing metal riding and preventing migration. The material of the blackening layer (cladding layer) is also described below. The thickness of the layer (coating layer) is preferably 5 μm or less, more preferably 3 or less, and particularly preferably 0.2 μm or more and 2 μm or less. Next, removing the blackening layer (cladding layer) The blackened layer on the viewing portion that does not cover the electrode thin wires can form an electrode having a mesh pattern excellent in visibility and longevity (Fig. 10(e)). When using a conductive nano-conductor When the ink (or feed) of the particle (B) above) can directly print the above grid pattern To a transparent substrate layer which also serves as an insulating layer. After the printing, when a blackening layer is provided on the metal pattern formed by heat treatment or the like as needed, the same treatment can be performed 〇 [Used in the blackening layer] Method for forming material and layer] The main component constituting the blackening layer of the present invention may be at least one compound selected from the group consisting of nickel, chromium, zinc, tin, and copper, and may or may not have conductivity. In addition to the method of the present invention, a method such as a dyeing method may be used for the person to be employed. ^ °

S 28 201224903 wmpif As an example of a preferable lamination method of the blackening layer in the present invention, a plating treatment and a chemical etching method can be exemplified. The plating treatment is not particularly limited as long as it is a well-known treatment called black plating, and examples thereof include black nickel plating, black chrome plating, black Sn-Ni alloy plating, Sn_Ni_Cu alloy plating, and black chromate. Processing and the like as an example. Specifically, a black electroplating bath (trade name: nikka BLACK, Sn-ni alloy system) manufactured by Nippon Chemical Industry Co., Ltd., and a black electron microscope bath manufactured by the metal chemical industry (trade name: black chrome (eb) can be used. 〇ny chrome) 85 series, Cr series), DIPSOL (stock) chromic acid agent (trade name ZB_541, galvanized black chromate agent). The electroplating method may be any one of electroless plating and electrolytic plating, and may be a mild condition or a high-speed electroplating. Regarding the plating thickness, the thickness is not limited as long as black can be recognized, but the usual wrought thickness is preferably 5 μm or less. In the present invention, a part of the conductive metal portion may be subjected to an oxidation treatment or a vulcanization treatment to form a black portion. For example, when the conductive metal portion is copper, as an example of the blackening treatment agent for the copper surface, a product name: ENPLATE ΜΒ 438 Α, Β manufactured by MELTEX (trade name); a product name manufactured by Mitsubishi Gas Chemical Co., Ltd.: nPE-900 ; MEC (stock) Manufactured under the trade name: MEC etch BOND BO-7770V; ISOLATE Chemical Institute's trade name: COPPER BLACK CuO, COPPER BLACK CuS, and selenium-based COPPER BLACK ηο·65. In addition to the above, it is of course possible to treat the sulfide to produce hydrogen sulfide (H2S) to blacken the surface of the copper to copper sulfide (CuS). For the above-mentioned process 29 201224903 jy / 44plf : 2: i can be recognized as black, the thickness is not limited, but usually the above is preferably 3 μηη or less per degree, and further preferably ♦ ♦ for the present invention. 2μιη~2μιη. Color production, better than the electrode array to obtain the desired reflection chromaticity 4c, such as two steps or more, preferably after the oxidation treatment, reduction treatment: ==: Sodium oxide and other oxidant core: after treatment 'contains two Treatment with a reducing solution such as guanamine or rotten hydrogen. Marin's surface becomes thicker to increase the black tone, and the latter's heart 2/疋 is made by the ritual-recognition of the main worker, and the ton is more stable. This, to. Preferably, the heart surface has a certain degree of surface _ degree - r is the following, more preferably _ is ~ 0.14 μιη. If the right Ra exceeds 〇.15, the wear resistance or the adhesion is not good. - The measurement method of Ra is roughly divided into a method (a stylus) for measuring the surface by a stylus in a straight line, and a method for optically measuring (light cutting method, light reflection method), or the above-described method. The method of doing the measurement. When the line width of the conductive thin wires was narrow and the measurement region (嶋) could not be secured, the prepared conductive solid portion was measured by the same operation except that the exposure region was enlarged, and Ra was calculated. Corresponding to the enlargement of the image display device using the touch panel, it is also required to increase the size of the touch panel itself. For Wei Wei, the electrode must be low-resistance, and the parasitic capacitance between the electrodes must be reduced. Therefore, if 201224903 39744pif places a dummy electrode between the electrodes, it is effective and does not connect with the sensing electrode. The formation of the extraction I contact (4), and the connection of the orphanal line may also be exemplified. [Examples] The following examples are given to enumerate the examples of the present invention to more specifically the present invention without departing from the scope of the present invention. The materials, usage amounts, ratios, processing internal processing order, and the like shown in the following examples are changed. Therefore, the scope of the invention should not be construed as being limited by the following. First, the evaluation method in the example of the present invention will be described. [Measurement of reflection chromaticity] Place the sample in the British Ceramic Research Association (British)

Ceramic Research Association, BCRA) Black porcelain monument (light version), from 0. The direction is illuminated, and the pair is 45. The spectral reflectance of the light received in the direction was measured. Furthermore, the preferred tile is the BCRA black tile (glossy version) manufactured by Sakata INX ENG. CO., LTD., and the reflection color of the black tile, I; 3.6, a* is -0.9, b* is _0.6. A SpectlO Eye u made by Gretag Macbeth can be used as a reflection densitometer. [Evaluation of the abrasion resistance] Using the "TORAYSEE" manufactured by Toray (T0RAY), which is a very fine fiber cloth, the sample was subjected to a round trip with a load of 500 g for 1 〇 31 201224903 iy/44pif times. The samples after wiping were evaluated in the following five stages. 1 : No change at all. 2: The scratches are weak and small. 3: The scratches are weak and scratches are generated as a whole. 4: The scratches are strong and small. 5: The scratches are strong and scratches are generated as a whole. [Evaluation of adhesion] The adhesion of the sample was evaluated by a cross cut method. The next sample was evaluated in the following five stages. 1 : No peeling at all. 2: Peeling is in a portion of 5% or less. 3 : Peeling is carried out in a portion exceeding 5% and being less than 1% by weight. 4 : Peeling in a portion exceeding 1 〇 ° / 0 and being 50% or less. 5 : Peeling in more than 50% of the parts. [Evaluation of Surface Thickness Ra] A solid exposure region of 5 cm x 5 cm was placed on the sample, and measurement was performed using a small surface roughness measuring machine SURF TEST SJ-301 manufactured by MITUTOYO Co., Ltd. Example 1 [Production of Transparent Substrate A Forming Easy-Adhesive Layer of Double Layer Structure] Two faces of a polyethylene terephthalate (hereinafter referred to as PET) film support having a thickness of 100 μm were subjected to After the corona discharge treatment, the following first layer coating liquid is applied to the above two surfaces by a bar coating method, and the i-th layer coating liquid is dried to form the first

S 32 201224903 39744pif layer. Then, the surface of the first layer formed as described below is applied to the surface of the first layer to be formed by a bar coating method, and the second layer coating liquid is dried by applying the coating liquid to the first coating liquid. The two films on the two sides of the film include an easy-adhesive layer composed of two layers. Furthermore, f U and the first thickness are respectively G.G8 _, _ _. Composition of the first layer coating liquid afterwards • Polyacetate resin binder (Otsuka Ink Chemical Industry Co., Ltd. (FINETEX ES650, solid content: 29 wt%), 49.7 parts by mass • Epoxy compound as a crosslinking agent ( Changchun Huacheng (share) system = DENACOLEX-314 is 6 wt% relative to resin binder • Surfactant A (Sanyo Chemical Industry Co., Ltd., SANDETB) L, solid matter 10 wt%, anionic) 2.3 parts by mass • Surfactant B (Sanyo Chemical Industry Co., Ltd., nar〇acty HN-100 'solid liter> 5% 'nonionic') 5.36 parts by mass • cerium oxide microparticle dispersion as matting agent A (曰本AEROSIL (Stock), water dispersion of 〇χ_5〇, solid content of 1〇%) 2.4 parts by mass • Colloidal cerium oxide dispersion as matting agent 制造 (Manufactured by 曰 化学 化学, SNOWTEX-XL, solid content 1〇〇/0) 4.6 parts by mass is prepared by adding distilled water as a whole to 1000 parts by mass. Composition of the second layer coating liquid • Acrylic resin binder (ΜΜΑ59 mol%, St9 mol%, 2EHA26 mol %,HEMA5 mol0/〇, AA1 mol% latex, solid 33 201224903 jy/44pif concentration is 28 Wt ° / 〇) formation (m parts • the above elimination _ A, upper (four) conversion agent is 6wt% 2·7 parts by mass 4·6 parts by mass 1.9 parts by mass 5.36 5% by mass of Brazilian brown wax dispersion, added with distilled water for adjustment

• The above-mentioned matting agent B • Surfactant A • Surfactant B • Lubricant (Zhongjing Grease (share), SELOSOL 524 solid content is 3 wt%) In a manner of achieving 1000 mass parts as a whole, [this sensing] Manufacture of the electrode array] Surface: After the plated layer of the easy-adhesion layer of the substrate, after electroplating, the electro-mineralization is performed to form an electric ore, which is electrolessly electrolyzed, and the photoresist film is formed in the above-mentioned formed military Exposure is performed using development::::frequency: a grid pattern of a photoresist film that is hardened using light. In Figure 6, Yin, light, shape of the pattern, turn fresh is set to ride (four) county

It is a pattern of resistance. Using the rhyme solution to the above pattern: , " Thereafter, the hardened photoresist film was peeled off, and the sensing electrode array including the conductive thin wires of the pattern of Fig. 6 was buried.曰' Formation Next, the blackened layer was provided in the portion of the conductive thin wire including the steel 34 201224903 3y744pif film of the sensing electrode array of Fig. 6 which was fabricated above. In the present example, the transparent substrate on which the electrode array was formed was immersed in a hydrogen sulfide liquid, and only the surface became a black electrode of the copper sulfide forming example array of sensing electrodes. Example 2 The shape of the electrode of the Y Y is the strip shape of FIG. 6. In contrast, in the example, the shape of the electrode is set to the diamond shape of FIG. 3, and the conductivity is finer = 6 μπι' except for the above. For the same operation, the sensing electrode array of Example 2 was fabricated. Example 3 The pitch of the conductive thin wires of 2 was set to 500 μm, except that the sensing electrode array of Example 3 was produced by the same operation as in Example 2. Example 4: A transparent plate formed of a (four) layer used in the δ-real smear, and an example two-layered vinegar film (referred to as a transparent substrate Β) of Japanese Patent Publication No. 5_74463, except The same operation was made 'produce the sensed electricity_column of Example 4. Furthermore: Example 1 The laminated poly(tetra) film of plate B is in the recombination layer (in this case, the 'Mengming-based melamine-based axis NIKALAC MW·12LF (manufactured in Sanwaji Battle). Yixue (share) Example 5 j The copper film of Example 2 was formed by Laifa, and the degree was set to 0.2 μm, and the width of the conductive thin wire of the electrode was set to be thick, and 35 201224903 39744pif The pitch of the conductive thin wires of the above electrodes was set to 200 μm. Except for this, the same operation as in Example 2 was carried out to fabricate the sensing electrode array of Example 5. Example 6 Instead of the epoxy compound DENACOLEX-314 used in the easy-contact layer of the transparent substrate of Example 1, the relative A sensing electrode array of Example 6 was carried out in the same manner as in Example i except that a 6-sensed melamine-based compound (NIKalac MW-12LF manufactured by Sanwa Chemical Co., Ltd.) was used as the resin binder. Instead of the epoxy resin used in the easy-adhesion layer of the transparent substrate A of Example 1, ^DENACOLEX_314, for the resin binder, an adduct of 6 isocyanate and trimethyl propyl hydride was used, and , ::: is the same as: example i Operation, the sensing electrophoresis of Example 7 was made to dissolve the cross-linking agent, and the water in the portion of the easy-adhesion layer coating liquid was replaced with propionate. 1 Example 8 Chelation: 'Ϊ二明基板A Epoxy wt% used in the easy-adhesion layer;;, ΖΤΓ '314 * ^ 6 wt / 2 2 vinyl _2 oxazoline monoliths other than the implementation of the same sensing electrode array as Example i. The water in the liquid of Part 7 is replaced with a kneading surface, and the sealing layer is painted with an example of 9 5.5 μπι, except that the line width of the thin wire of the example 1 is set to 36 201224903 Jy/44pif

In addition, implementation and wonderful! In the operation of the gang, the example 9 is called to test the electric train. I Example 10 The line width of the conductive thin wires of Example 1 was set to 4 μm, except that the same operation as in Example 1 was carried out, and the sensing electricity of Example 10 was produced: Comparative Example 1 was not in the second easy-adhesion layer of Example 1. The same operation as in Example 1 was carried out, except that a crosslinking agent was used, to prepare a sensing electrode array of Comparative Example. Comparative Example 2 The same operation as in Comparative Example 1 was carried out except that the line width of the conductive thin wires of Comparative Example 1 was changed to 3 μm, and a sensing electrode array of Comparative Example 2 was produced. Comparative Example 3 A sensing electrode array of Comparative Example 3 was produced by performing the same operation as in Example 4 except that the melamine-based crosslinking agent of the transparent substrate of Example 4 was removed. The adhesion of the above examples to the samples of the comparative examples is summarized in the table. 37 201224903 jy/44pif [Table 1] The number of the transparent substrate and the method and film thickness of the cross-linking metal film (μηι) Thin line width (μηι) Fine line pitch (μηι) Electrode shape adhesion (peeling ratio) Example 1 A ring Oxygen plating 2 5 300 Band 5% Example 2 A Epoxy plating 2 6 300 Diamond 0% Example 3 A epoxy plating 2 8 500 Diamond 0% Example 4 B Melamine plating 2 5 300 Band 2% Example 5 A epoxy sputter 0.2 3 200 diamond 0% Example 6 A melamine plating 2 5 300 strip 5% Example 7 A isocyanate plating 2 5 300 strip 5% Example 8 A ° Evil. Oyster plating 2 5 300 Band 5% Example 9 A Epoxy plating 2 5.5 300 Band 0% Example 10 A Epoxy plating 2 4 300 Ribbon 5% Comparative Example 1 A Electroless plating 2 5 300 Ribbon 15% Comparative Example 2 A Electroless plating 2 3 300 Ribbon 30% Comparative Example 3 B Electroless plating 2 5 300 Ribbon 15% According to the above results, it is necessary to add a crosslinking agent to the easy-adhesion layer, especially if epoxy is used. The adhesion of a transparent substrate to a copper thin layer can be improved by a melamine-based, isocyanate-based, or oxazoline-based crosslinking agent. Further, it has been confirmed that the adhesion can be improved as long as the line width of the conductive thin wires is 2.5 times or more the thickness. Example 21

38 201224903 jy/44pif A film of copper was formed by electroplating on one surface of the easy-bonding layer of the transparent substrate A (including the two-layer adhesive layer) which was produced in Example 1. Electroplating is performed after electroless plating, and electrolytic bonding is performed to form a thin layer of copper having a thickness of 2 μm. In the same manner as in Example 1, a sensing electrode array including conductive thin wires having a pattern of the pattern of Fig. 6 (the width of the conductive thin wires of 5 μm Å) was 3 μm μm was formed on the above copper film. This sensing electrode array was set as the sample 21-1. The blackened layer is provided by the reduction treatment or the oxidation treatment method described below in the portion of the conductive thin wire containing the copper thin film of the sensing electrode array. [One of blackening treatment methods] Treatment conditions: Dip for 3 minutes in 4 (TC) of the following liquid, and then wash. Composition of liquid: sodium borohydride 3,8 g Add 1 liter of water. [Blackening treatment Method 2] ^ Treatment conditions: impregnation in the following liquid for 4 minutes, and then washed. Composition of the liquid: sodium sulfite 55 g sodium hydroxide 15 g trisodium phosphate 1 〇 g Add 1 liter of water. 1. The type 5 material obtained by performing one of the above-described blackening treatment methods on the sample 21-1 is 21-2. Further, the sample obtained by subjecting the sample 21-1 to the blackening treatment method 2 is set to 21-3. Further, the core of one of the above samples 39 201224903 is 2i-4. The reflection chromaticity, the viscousness, the upper and the abrasion resistance of the sample 21] to the sample 2U4 of the material LW are tested. The results of the measurement and correction are shown in Table 2. [Table 2] The number of the sample is reflected by the color 21-1 ___No treatment 21-2 L* 23,0 a* 7.2 b* 4.0 Adhesion 5 Abrasion resistance 5 Ra 0.20 Remarks One of the comparison examples j 20.5 5.9 2.8 5 5 0.17 Comparative Example 21-3 21-4 ^ Stage treatment 11.9 10.6 0.7 Γ^Γ~ -0.3 -1.3 1 2 1 0.10 0.09 It is known that in order to obtain the desired reflection chromaticity, :: oxygen: reduction treatment for blackening treatment, compared with the reduction treatment, the treatment is better, preferably, preferably After the oxidation treatment, the reduction was carried out, and the sample 21-4 of the sample 21-3 was tested and the durability and the durability phase called abrasion resistance were improved. Example 31 The surface of the (4) layer of the transparent substrate a (including the easy-adhesive layer composed of two layers) is made of material f plating method (four) into copper thin =. Electroplating is performed after the crane is not electrically The plating was performed to form a thin layer of copper having a thickness of 0.25. Using the same method as in Example 1, a conductive pattern including the pattern of FIG. 6 (the width of the conductive thin wires of 5 lines was 300 Å) was formed on the above copper film. The electrode array of the thin wire is set as the sample 3lq. The conductive thin wire portion including the copper thin film of the sensing electrode array 201224903. is subjected to the following blackening treatment by electroplating. [Blackening treatment method 3] Treatment conditions: the following plating solution impregnated at 40 ° C Forging for 3.5 minutes at 3.2 A/cm, then washing. Composition of electroplating liquid (replenishing liquid is also the same composition) Nickel sulfate hexahydrate thiocyanate, sulfuric acid, heptahydrate, sodium sulfate, water addition pH (using sulfuric acid Adjust with sodium hydroxide) 5 〇 [fourth of blackening treatment method] 123 g 17g 3g

Processing conditions: immersed in 4 (Vt of the following plating solution, electroplating at 3 2 A / cm for 0.5 minutes, and then washed. Composition of the plating liquid (replenishment solution is also the same composition) nickel sulfate hexahydrate sulfur Acid acid zinc sulfate heptahydrate sodium sulfate 123 g 17 g 28 g Water addition 16 g 1 liter PH (adjusted with sulfuric acid and sodium hydroxide) 5 〇 料 料 料 料 料 料 料 料 料 料 料 料 料 料 料 料 料 料 料 料 料 料 料 料 料 料In addition, the sample obtained by the fourth method of the above-mentioned sample 3M #201224903 jy/^pif method is set to 31_3. The blackening treatment method is further applied to the sample 31-3. The sample obtained in the third sample was set to 31_4. The following sample was set to 31-5, and the sample was plated with a commercially available chromium-based black plating bath at 3.2 A/cm for 5 minutes at a rate of 3.2 A/cm. Then, the obtained sample was washed. The reflection chromaticity, the nucleus, and the coffee property of the sample 3i_i obtained in the above manner were tested in (4), and the results are shown in Table 3. [Table 3] 31-1 L* reflection chromaticity a* b* Adhesive wear resistance Ra Remarks no treatment 31^2 23.0 ~12Λ^ 7.2 4.0 5 5 0.20 Comparative Example Method 3 31-3 - 08 L5 4 4 0.16 Comparative Example Method 4 9.0 0.7 -0.3 1 2 0.12 ·- - 31-4 2-stage treatment of the present invention 31-5 8.8 0.1 0.8 -1.7 〇1 ---- 13.5 1 1 0.08 4 4 0.17 Ιϊ3^Γ~ ----- Low concentration of low concentration liquid and high concentration liquid 'night come + w ^ hand good After the sulphur, zinc, and sulphate are in the form of sulphur, the sulphur-seven hydrate is high.

S 42 201224903, jy / called pif desert liquid for processing. It is possible to use the metal, field, and electrode with durability in the above two stages. An oxide film is provided on the surface of the metal thin wire electrode, or a low reflection treatment using an electric ore treatment, such as _black chrome to prevent reflection, etc., has been disclosed in Japanese Patent Laid-Open No. Hei 2__344163. In the case of the above-mentioned sample 31_4 and the sample 315, the same measurement was carried out in the environment of 6 (rc9〇%, 〇〇hour, and then stored in a normal environment for 24 hours). It can be seen that for the sample 31-4, only the error range variation is observed, (4) in the sample 31_5, L* is increased to =, and the 'Ra is also increased to 〇2 (), the poor color production in the present invention, "The direction of the poor surface roughness has changed. [Simple description of the drawings] ^) Fig. 1(b) is a cross-sectional view of the touch panel of the present invention. Section 2 (d) of the panel is an array of sensing electrodes and touch map of the present invention. Figure 3 is an arrangement diagram of the first sensing electrode array 11 of the present invention. = 4 is an arrangement diagram of the second sensing electrode array 12 of the present invention. A perspective view of the array of first sensing electrodes and second sensing electrodes when viewed from the toucher side. An arrangement diagram of other first sensing electrode arrays 11 of the present invention. An arrangement diagram of the other second sensing electrode arrays 12 of the present invention. The electrode array performs a perspective view of the first sensing electrode array and the second sensing alignment as seen from the toucher side. 43 201224903 jy /HHpif Figure 9 (a), Figure 9 (b) Sectional view of the board. The touch panel including the blackening layer of the present invention I0 (a) to (1) is a method for forming a blackening layer of the present invention. [Main element symbol description] 10: Touch panel 11 of the present invention. A sensing electrode array 12, a first sensing electrode array 15 15 · a transparent substrate 16 · a transparent material layer 17 that becomes a touch surface: a release film 18 ' = an easy-adhesion layer U, 19', 19": an adhesive layer /Adhesive layer 20, 20': blackening layer 21: forming layer/thin layer 31 of sensing electrode: grid-shaped sensing electrode 32: cladding layer 33 of sensing electrode: grid-shaped sensing electrode The non-cb of the cladding layer indicates the boundary region of the conductivity of the electrode of the sensing electrode of the lower electrode layer. 曰cd : the width cj of the boundary region indicating the non-conductivity between the sensing electrodes · the lower electrode layer The number of the sensing electrode CW. indicates the electrode width of the sensing electrode of the lower electrode layer i: isolated wire / conductive thin wire / thin wire 44 5 201224903

Rb : a non-conductive boundary region rd between the electrodes of the sensing electrodes of the upper electrode layer: a width ri of the non-conductive boundary region between the electrodes of the sensing electrodes of the upper electrode layer: represents the upper portion The number rw of the sensing electrode of the electrode layer: the electrode width of the sensing electrode of the upper electrode layer 45

Claims (1)

201224903 VII. Patent application scope: Electrode array, the touch surface 1. A touch panel, including the first sensor board, is characterized in that: the heart-first sensing electrode array is patterned by conductive metal thin wires to support the base The L of the reflection chromaticity L*a*b of the above-mentioned sensing electrode array on the board is 6 to 13, and a* is _〇.7 to 15<= _5〇~12. The touch panel of the first aspect of the invention is further characterized in that the first sensing electrode array is arranged orthogonally to the second sensing electrode array. 3. The touch panel according to the above-mentioned item, wherein at least one or more adhesive layers are provided between the conductive metal enamel and the transparent plate. The touch panel of claim i, wherein the touch panel is an electrostatic capacity mode-control panel. 5. A capacitive touch panel having orthogonally arranged first sensing electrode arrays And the second sensing electrode array, the capacitive touch panel is characterized in that: the first sensing electrode array disposed on the toucher side is patterned (four) of the conductive metal thin wires to have an easy adhesion layer The touch panel of claim 1 or claim 5, wherein the patterned conductive metal thin wire has a blackening layer on the touch surface side. The touch panel of claim 6, wherein the blackening layer has a surface roughness Ra of G.15 or less. S 46 201224903 From 〆· > % X f electrostatic capacitance touch panel, 1/6 ~13, 8. As stated in item 5 of the patent application scope The reflection chromaticity L* a of the above-mentioned sensing electrode array is -0.7 to 1.5, and b* is -5.0 to 1.2. ... Gan: _ range 2nd to 5th, wherein the touch is:感ifan: the sensing electrode of the first sensing electrode array is formed by the conductive metal thin wire formed by the mesh, and the sensing electrode of the second sensing electrode array is = The sensing electrode of the electrode array has the same structure or strip structure.) The contact plate described in the second or fifth aspect of the patent scope is orthogonally arranged in the above-mentioned first-sensing electrode _, When the fluoroscopy is performed, the patterned conductive metal thin wires form a substantially uniform lattice pattern on the touch surface. Π·If the touch panel described in claim i or item 5, / And the above-mentioned conductive metal thin wire is a method of using light lithography or a laser ablation method, and the metal thin film layer is patterned into a fine line pattern having a line width of 1000 nm to 8000 nm. I2 · as claimed in the first item or The touch panel of claim 5, wherein the width of the conductive metal thin wire is 25 times the thickness of the film is 13. The touch panel according to Item 3 or 5, wherein the transparent substrate comprises a polyester resin, and the easy-adhesion layer comprises a polyester resin, an acrylic resin or an amine ester resin, and the adhesive layer is added to the easy adhesion layer. (3) 14. The touch panel of claim 13, wherein the upper adhesive layer of 201224903 / -τ-τριΓ comprises a first easy-bonding layer and a second easy-bonding layer, The first easy-adhesion layer of the transparent substrate is a polyester resin, and the second easy-adhesive layer comprises an acrylic resin or an urethane resin. The above crosslinking agent is a compound of a chewable compound, an epoxy compound, or a compound of isocyanic acid. 16. The touch panel of claim 14, wherein the cross-linking agent is an 11 oxime compound, an epoxy compound, or an isocyanate compound. S 48