KR20120035874A - Touch panel - Google Patents

Abstract

PURPOSE: A touch panel using a fine metal line electrode is provided to implement a touch panel capable of multi-touch by using a stable metal line electrode in environment change. CONSTITUTION: A capacitive touch panel of an electrostatic capacitive type includes first and second sensor electrode arrays. The first sensor electrode array is formed by patterning a conductive metal session on a transparent having an easily adhered layer(18). The patterned conductive metal session includes blacking layers on a touch side.

Description

TOUCH PANEL {TOUCH PANEL}

The present invention relates to a sensor electrode array excellent in reflection chromaticity, a sensor electrode array suitable for use in a projection-type capacitive touch panel, a method of using the sensor electrode array, a manufacturing method thereof, and a touch panel.

2. Description of the Related Art Generally, a capacitive touch panel is a position input device that detects a position of a fingertip by capturing a change in capacitance between a fingertip of a human and a conductive film. In this capacitive touch panel, There are types and projection types. Although the surface type is simple in structure, it is difficult to detect two or more points of contact (multi-touch) at the same time. On the other hand, in the projection type, a plurality of electrodes are arranged in a matrix, and more specifically, a plurality of first electrode groups are arranged in a horizontal direction, and a plurality of second electrode groups are arranged perpendicular And the capacitance change is sequentially detected by the plurality of first electrode groups and the plurality of second electrode groups, so that multi-touch can be detected.

In recent years, there has been a strong demand for multi-touch and large-screen display on such a touch panel, and the projection type electrostatic capacity type touch panel is under development. ITO or the like, which is a transparent conductive material, has been used for the electrode material. However, the electrode thinning required for a large screen has a high resistance value, which is a hindrance to thinning and touch panel responsiveness. In order to solve these problems, a technique has been developed in which a thin metal film of gold, silver, copper, or the like is finely processed to constitute an electrode group by a conductive thin wire having a line width not visible to the toucher (Patent Document 1).

As to the problem of the influence of subtle metallic color and gloss on the screen in the case of using a metal thin film, a method of blackening the metal surface is disclosed in Patent Document 2, but the durability is insufficient.

Even if it is possible to form a conductive thin wire having a low resistance by micro-machining of a metal thin film, it is not easy to stably manufacture a large-area electrode pattern without causing peeling or cracking of metal thin wires. Further, there is a problem that the formed metal thin wire does not cause the migration of the environment change after the touch panel is formed, thereby lowering the responsiveness of the touch panel and the problem of the color tone variation.

International Publication No. 2010/014683 pamphlet Japanese Laid-Open Patent Publication No. 2006-344163

SUMMARY OF THE INVENTION It is an object of the present invention to provide a touch panel using a metal thin wire electrode that is large in area and excellent in responsiveness and capable of multi-touch. It is also an object of the present invention to provide a touch panel in which the reflection color is stable over the entire screen. Another object of the present invention is to provide a touch panel using a metal thin-line electrode that is stable to environmental changes such as high temperature and high humidity. It is still another object of the present invention to provide a touch panel using a metal thin wire electrode which can be stably manufactured and has a stable quality.

1) A touch panel having a first sensor electrode array, wherein the first sensor electrode array is formed by patterning a conductive metal thin wire on a transparent substrate, and the reflection chromaticity L ^* a ^* b ^* of the sensor electrode array is L ^* 6? 13, a ^* is -0.7? 1.5, b ^* is -5.0? 1.2. ≪ / RTI >

2) The touch panel according to claim 1, further comprising a second sensor electrode array, wherein the first sensor electrode array and the second sensor electrode array are arranged orthogonally.

3) The touch panel according to claim 1, wherein at least one easy adhesion layer is provided between the patterned conductive metal thin wire and the transparent substrate.

4) The capacitive touch panel according to claim 1, wherein the touch panel is a capacitive touch panel.

5) A capacitive touch panel in which a first sensor electrode array and a second sensor electrode array are arranged orthogonally, wherein a first sensor electrode array disposed on a toucher side includes a conductive metal Wherein the touch panel is formed by patterning thin wires.

6) The touch panel according to claim 1 or 5, wherein the patterned conductive metal thin wire has a blackening layer on the touch surface side.

7) The touch panel according to claim 6, wherein the surface roughness (Ra) of the blackening layer is 0.15 or less.

8) reflecting the color of the sensor electrode arrays L ^* a ^* b ^* of the L ^* a 6? 13, a ^* is -0.7? 1.5, b ^* is -5.0? 1.2 < / RTI >

9) The sensor electrode constituting the first sensor electrode array is a continuum or a band-shaped body of a diamond structure formed of a mesh formed of the conductive metal thin wires, and the sensor electrode constituting the second sensor electrode array is a The touch panel according to any one of claims 2 to 5, wherein the touch panel has the same structure or bar structure as the sensor electrode constituting one sensor electrode array.

10. The method according to claim 2, wherein when the first sensor electrode array and the second sensor electrode array which are orthogonally arranged are viewed through, the patterned conductive metal thin wires form a substantially uniform lattice pattern on the entire touch surface. Or 5.

11) The touch according to claim 1 or 5, wherein the conductive thin wire is formed by patterning the metal thin film layer with a thin line pattern having a line width of 1000 nm to 8000 nm using a photolithography method or a laser ablation method. panel.

12) The touch panel according to claim 1 or 5, wherein the width of the conductive metal thin wire is 2.5 times or more of the thickness.

13) The image forming apparatus according to claim 3 or 5, wherein the transparent substrate is made of a polyester resin, the easy-to-adhere layer is made of a polyester resin, an acrylic resin or a urethane resin, A touch panel as claimed.

14) The ink-jet printable recording medium according to any one of the above items 1 to 14, wherein the adhesive facilitating layer comprises first and second easy-to-adhere layers, the first adhesive easy layer contacting the transparent substrate is made of a polyester resin and the second adhesive easy layer is made of acrylic resin or urethane resin Wherein the touch panel is a touch panel.

15) The touch panel according to claim 13, wherein the crosslinking agent is an oxazolidine compound, an epoxy compound, or an isocyanate compound.

16) The touch panel according to claim 14, wherein the cross-linking agent is an oxazolidine compound, an epoxy compound, or an isocyanate compound.

As described above, according to the sensor electrode array, the method of using the sensor electrode array, and the touch panel according to the present invention, it is possible to provide a touch panel that is large in area and excellent in responsiveness, capable of multi-touch, , Stable manufacturing can be performed, and a stable quality touch panel can be obtained.

1 is a sectional view of a touch panel of the present invention.
2 is a cross-sectional view of a sensor electrode array and a touch panel of the present invention.
3 is an arrangement view of the first sensor electrode array 11 of the present invention.
4 is an arrangement view of the second sensor electrode array 12 of the present invention.
Fig. 5 is a perspective view from the toucher side when the first and second sensor electrode arrays of the present invention are arranged orthogonally. Fig.
6 is an arrangement view of another first sensor electrode array 11 of the present invention.
7 is an arrangement view of another second sensor electrode array 12 of the present invention.
Fig. 8 is a perspective view from the toucher side when the first and second sensor electrode arrays of the present invention are arranged orthogonally. Fig.
9 is a sectional view of a touch panel having a blackening layer according to the present invention.
10 is an example of a method of forming the blackening layer of the present invention.

It is an object of the present invention to provide a touch panel using a metal thin wire electrode that is large in area and excellent in responsiveness and capable of multi-touch as described in the above-mentioned "Problem to be Solved by the Invention" The present invention aims to provide a touch panel which is stable on the screen and which can stably and stably manufacture even with environmental fluctuations such as high temperature and high humidity and is stable in quality.

The touch panel of the present invention will be described in detail below. In the present specification, "? &Quot; is used as a meaning including the numerical values described before and after the lower limit and the upper limit.

Fig. 1 shows a cross-sectional view of the touch panel 10 of the first present invention. A transparent material layer 16 constituting a touch surface and an adhesive layer (also referred to as an adhesive layer The first sensor electrode array 11, the adhesion facilitating layer 18, the transparent substrate 15, the adhesive layer 19 'serving also as an insulating layer, the second sensor electrode array 12, the easy adhesion layer 18 A transparent substrate 15 ', an adhesive layer 19' ', and a peeling film 17. The lower adhesive layer and the peeling film of FIG. 1 (b) is a plan view of the transparent substrate 15 in which the easy-to-adhere layer, the sensor electrode array, and the adhesive layer are laminated symmetrically on both sides of the transparent substrate 15 1 (a).

1 (a) shows a preferred configuration when the upper electrode and the lower electrode are formed on separate transparent substrates, (b) shows a configuration in which the first and second sensor electrode arrays In the case of the above-described structure.

Although not shown in the drawing, the arrangement direction of the first sensor electrode array and the arrangement direction of the second sensor electrode array are set so as to be orthogonally arranged to each other with the transparent substrate interposed therebetween, so that multi-touch detection is possible .

Hereinafter, the material used for the sensor electrode and the method for manufacturing the electrode will be described in sequence.

[Transparent material layer, transparent substrate]

The transparent material used for the transparent material layer 16 and the transparent substrates 15 and 15 'constituting the touch surface may be the same material or may be used separately or a plastic film, Is used. It is preferable that the thickness of the layer is appropriately selected according to each application. These materials preferably have flexibility.

Examples of raw materials for the plastic film and the plastic plate include polyesters such as polyethylene terephthalate (PET) and polyethylene naphthalate (PEN); Polyolefins such as polyethylene (PE), polypropylene (PP), polystyrene and EVA; Vinyl resin; In addition, polycarbonate (PC), polyamide, polyimide, acrylic resin, triacetyl cellulose (TAC) and the like can be used.

Preferred materials are PET (melting point: 258 캜), PEN (melting point: 269 캜), PE (melting point: 135 캜), PP (melting point: 163 캜), polystyrene A plastic film or a plastic plate having a melting point of about 290 DEG C or lower such as polyvinylidene chloride (melting point: 212 DEG C) or TAC (melting point: 290 DEG C) or the like is preferable from the standpoints of light transmittance and workability , And PET are preferable. It is preferable that the thickness of the film or plate is 50 mu m to 300 mu m.

The transparent material layer 16 constituting the touch surface may be formed with an antifouling layer in order to prevent contamination due to touch and adherence of dust. Further, an antireflection layer may be formed for improving the difficulty of viewing the screen due to reflection of external light. For these imparted layers, techniques known in the field of antireflection films and antiglare films (Japanese Patent Publication No. 2005-535934, Japanese Patent Application Laid-Open No. 2007-301970, etc.) can be used.

[Material used in the adhesion-facilitating layer and method of forming the layer]

The easy-to-adhere layer (18, 18 ') of the present invention has one or two easy-adhesion layers on a transparent substrate, and the layer contains a binder resin, a cross-linking agent and an additive.

The binder resin used in the present invention is not particularly limited, but polymers such as (a) an acrylic resin, (b) a polyurethane resin, (c) a polyester resin, and (d) .

(a) Acrylic resin is a polymer composed of acrylic acid, methacrylic acid and derivatives thereof. Specific examples thereof include acrylic acid, methacrylic acid, methyl methacrylate, ethyl acrylate, butyl acrylate, 2-ethylhexyl acrylate, acrylamide, acrylonitrile, hydroxyl acrylate, (For example, styrene, divinylbenzene, and the like) copolymerizable therewith.

(b) Polyurethane resin is a generic name of a polymer having a urethane bond in the main chain, and is usually obtained by a reaction between a polyisocyanate and a polyol. Examples of the polyisocyanate include TDI, MDI, NDI, TODI, HDI, IPDI and the like. Examples of the polyol include ethylene glycol, propylene glycol, glycerin and hexanetriol. As the isocyanate of the present invention, a polymer obtained by subjecting a polyurethane polymer obtained by the reaction of a polyisocyanate and a polyol to chain extension treatment to increase the molecular weight may also be used. The polyisocyanate, polyol and chain elongation treatment described above are described in, for example, " Polyurethane resin handbook " (published by Ikuta Kage, published by Nikkan Kogyo Shimbun, 1987).

(c) Polyester resin is a generic name of a polymer having an ester bond in the main chain, and is usually obtained by a reaction between a polycarboxylic acid and a polyol. Examples of the polycarboxylic acid include fumaric acid, itaconic acid, adipic acid, sebacic acid, terephthalic acid, and isophthalic acid, and examples of the polyol include those described above. The polyester resin and raw materials thereof are described in, for example, "Polyester Resin Handbook" (published by Nikkiso Kikai Shinbunsha, 1988, Aichi, Takayama).

The (d) rubber-based resin in the present invention means a diene-based synthetic rubber in the synthetic rubber. Specific examples include polybutadiene, styrene-butadiene copolymer, styrene-butadiene-acrylonitrile copolymer, styrene-butadiene-divinylbenzene copolymer, butadiene-acrylonitrile copolymer, and polychloroprene. The rubber-based resin is described, for example, in "Synthetic Rubber Handbook" (edited by Kanbarashi et al., Published by Asakura Shoten Co., Ltd., 1967).

Examples of the crosslinking agent used in the present invention include epoxy compounds, oxazoline compounds, melamine compounds, and isocyanate compounds.

Examples of the epoxy compound used in the present invention include a polyepoxy compound, a diepoxy compound, a monoepoxy compound, and a glycidyl amine compound. Examples of the polyepoxy compound include sorbitol, polyglycidyl ether, poly Glycerol polyglycidyl ether, pentaerythritol polyglycidyl ether, diglycerol polyglycidyl ether, triglycidyl tris (2-hydroxyethyl) isocyanate, glycerol polyglycidyl ether, trimethylolpropane polyglycidyl Examples of the diesters and diepoxy compounds include neopentyl glycol diglycidyl ether, 1,6-hexanediol diglycidyl ether, resorcinediglycidyl ether, ethylene glycol diglycidyl ether, polyethylene Glycol diglycidyl ether, propylene glycol diglycidyl ether, polypropylene glycol diglycidyl ether, polytetramethylene glycol diglycidyl N, N, N ', N'-tetramethylammonium, and the like may be used as the monoepoxy compound, for example, allyl glycidyl ether, 2-ethylhexyl glycidyl ether, phenyl glycidyl ether, Tetraglycidyl-m-xylylenediamine, and 1,3-bis (N, N-diglycidylamino) cyclohexane.

As the oxazoline compound used in the present invention, a polymer containing an oxazoline group is preferred. Such a polymer can be produced by polymerization with an addition polymerizable oxazoline group-containing monomer alone or with other monomers. The addition polymerizable oxazoline group-containing monomers include 2-vinyl-2-oxazoline, 2-vinyl-4-methyl-2-oxazoline, 2- Isopropenyl-4-methyl-2-oxazoline, 2-isopropenyl-5-ethyl-2-oxazoline, and the like. Can be used. Of these, 2-isopropenyl-2-oxazoline is preferable because it is easily available industrially. The other monomers are not limited as long as they are monomers copolymerizable with the addition polymerizable oxazoline group-containing monomers, and examples thereof include alkyl acrylates, alkyl methacrylates (the alkyl groups include methyl, ethyl, n- (Meth) acrylic acid esters such as a n-butyl group, an isobutyl group, a t-butyl group, a 2-ethylhexyl group and a cyclohexyl group; Unsaturated carboxylic acids such as acrylic acid, methacrylic acid, itaconic acid, maleic acid, fumaric acid, crotonic acid, styrenesulfonic acid and its salts (sodium salt, potassium salt, ammonium salt and tertiary amine salt); Unsaturated nitriles such as acrylonitrile and methacrylonitrile; Acrylamide, N, N-dialkyl acrylamide, N, N-dialkyl methacrylate (examples of the alkyl group include methyl group, ethyl group, n- propyl acrylate, Unsaturated amides such as an isopropyl group, an n-butyl group, an isobutyl group, a t-butyl group, a 2-ethylhexyl group, and a cyclohexyl group; Vinyl esters such as vinyl acetate and vinyl propionate; Vinyl ethers such as methyl vinyl ether and ethyl vinyl ether; ? -Olefins such as ethylene and propylene; Halogen-substituted?,? - unsaturated monomers such as vinyl chloride, vinylidene chloride and vinyl fluoride; And?,? - unsaturated aromatic monomers such as styrene,? -Methylstyrene, and the like, and one kind or two or more kinds of these monomers can be used.

The melamine compound used in the present invention is preferably a compound obtained by etherifying a methylol melamine derivative obtained by condensing melamine and formaldehyde with methyl alcohol, ethyl alcohol, isopropyl alcohol or the like as a lower alcohol and a mixture thereof. Examples of methylol melamine derivatives include monomethylol melamine, dimethylol melamine, trimethylol melamine, tetramethylol melamine, pentamethylol melamine, and hexamethylol melamine.

Examples of the isocyanate compound used in the present invention include tolylene diisocyanate, diphenylmethane-4,4'-diisocyanate, meta-xylylene diisocyanate, hexamethylene-1,6-diisocyanate, Diisocyanate hexane, adducts of tolylene diisocyanate and hexanetriol, adducts of tolylene diisocyanate and trimethylol propane, polyol-modified diphenylmethane-4,4'-diisocyanate, carbodiimide-modified diphenylmethane- Diisocyanate, isophorone diisocyanate, 1,5-naphthalene diisocyanate, 3,3'-bitolylene 4,4'-diisocyanate, 3,3'-dimethyldiphenylmethane-4,4'-di Isocyanate, and metaphenylenediisocyanate.

The addition amount of the crosslinking agent which can be added to the adhesive facilitating layer is 1? By mass to 100% by mass, And more preferably 50% by mass. If the addition amount is less than 1% by mass, the adhesive property is insufficient. On the other hand, if the addition amount exceeds 100% by mass, the surface shape may be deteriorated.

Various kinds of additives can be used for the adhesive layer of the present invention in accordance with various purposes. For example, in paragraph 27 of Japanese Patent Application Laid-Open No. 2007-203635, 29, a matting agent for preventing adhesion when rolled up in the form of a roll described in the same paragraph 30, a sliding agent, and various surfactants for improving the coating properties described in the paragraphs 32 and 33 can be used.

The adhesion facilitating layer may be composed of a two-layer structure, that is, a first and a second adhesion facilitating layer in order to exhibit ease of adhesion to a transparent substrate.

In the case of a two-layer structure, if the first adhesive layer facilitating adhesion to the transparent substrate is made of polyester and the second adhesive layer can be made of acrylic resin or urethane resin, ease of adhesion is easily exhibited. The crosslinking agent used for the first and second adhesive facilitating layers is preferably an oxazolidine compound, an epoxy compound, or an isocyanate compound. Since the second adhesive facilitating layer is the outermost layer, it is preferable to use a sliding agent.

The thickness of the first adhesive layer is preferably 30 nm or more and 300 nm or less, and more preferably 65 nm or more and 150 nm or less. When the thickness is less than 30 nm, the adhesion between the transparent substrate and the first layer may be insufficient. If it exceeds 300 nm, the surface shape of the first layer may be deteriorated, which is not preferable.

The thickness of the second adhesive layer is not particularly limited, but is preferably 10 nm or more and 5000 nm or less, and more preferably 20 nm or more and 1,500 nm or less, in order to realize easy adhesion while securing excellent transparency. If the thickness of the second layer is less than 10 nm, the adhesion with the upper layer may be insufficient. On the other hand, if the thickness exceeds 5000 nm, the surface shape may deteriorate.

The easy-to-adhere layer of the present invention is preferably formed by coating. The method of forming the coating layer is not particularly limited, and known methods such as bar coater coating and slide coater coating can be used. Further, when forming the first layer and the second layer, the same method may be used, or a different method may be used. When the second layer is formed, the first layer may be coated with the first layer and then dried. Alternatively, the first layer may be coated and dried after the first layer is coated.

As the adhesive layers 19 and 19 'serving also as an insulating layer, an adhesive having no conductivity can be used. There are many adhesives, and among them, acrylic resin, epoxy resin, phenol resin, vinyl resin and the like are used. A method for forming the layer is not particularly limited, but a screen printing method or the like can be used.

2 shows a sectional view of the touch panel 10 according to the second invention. Fig. 2 (a) shows a state in which the first sensor electrode array 11 of the present invention is formed on the transparent substrate 15 And FIG. 2 (b) shows a state in which the first and second sensor electrode arrays 11 and 12 are laminated in the same manner as in FIG. Although not shown in the drawing, the arrangement direction of the first sensor electrode array and the arrangement direction of the second sensor electrode array are set so as to be orthogonally arranged to each other with the transparent substrate interposed therebetween, so that multi-touch is possible.

2 (c) and 2 (d), layers necessary for constituting the touch panel are formed on the electrodes of two layers in Fig. 2 (b) And the touch panel is formed.

The materials and forming methods of the [transparent material layer, transparent substrate] and [adhesive facilitating layer] used in the second aspect of the present invention can be the materials and the forming methods described in the first aspect of the present invention.

[Reflected chromaticity]

A sensor electrode array of the present invention, the conductive metal layer, it is necessary to adjust the reflection color as neutral as possible in order to have a unique reflection color, the color in reflection in the L ^* a ^* b ^* color system, L ^* a 6? 13, a ^* is -0.7? 1.5, b ^* is -5.0? It is preferable to adjust it to 1.2.

More preferably, L ^* is 6? 12, a ^* is -0.6? 1.2, b ^* = -4.8? 1.0.

In addition, L ^* a ^* b ^* color system is a method of color specification given in 1976 in the International Commission on Illumination (CIE), L ^* value, a ^* value in accordance with the present invention, b ^* values, JIS-Z 8729 : A value obtained by measuring according to the method specified in 1994. As the measuring method of JIS-Z 8729, there is a measuring method by reflection and a measuring method by transmission. In this embodiment, the value measured by reflection is used.

L ^* a ^* b ^* color system L ^* value in, a ^* value, b ^* value, and this L ^* value of brightness, a ^* value and b ^* value, as is well known, represents the color and saturation. More specifically, when the a ^* value is a positive sign, it indicates a color of red, and when a ^* indicates a negative sign, it indicates a green color. If the b ^* value is a positive sign, it is a yellow color; if it is a negative sign, it is a blue color. Also, the larger the absolute value of the a ^* value and the b ^* value, the greater the saturation of the color is, and the smaller the absolute value, the smaller the saturation. In the present invention, it is intended to obtain a touch panel which is easy to see by changing the a ^* value from a reliable red color system to a value as small as possible and the b ^* value from a positive yellow color to an extremely small blue color. The details of the measurement method are described in the examples.

[Structure of sensor electrode array]

Fig. 3 is a view for explaining the first sensor electrode array 11 of the present invention, in which an orthogonal grid-like mesh is connected to two conductive fine wires in the X direction to constitute one electrode. These electrodes are arranged in the Y direction to form an electrode array. Here, the X direction and the Y direction define the X direction as the vertical direction of the touch screen when the touch panel is manufactured, and the Y direction as the horizontal direction. The mesh structure shown in Fig. 3 has a square shape with a regular square grid, and the outer shape seen from the electrode direction is rhombus. Conductive broken lines indicated by i are formed in the outer portion of the mesh. 4 is a view for explaining the second sensor electrode array 12 of the present invention. The sensor electrode array 12 is the same as the first sensor electrode array 11 except that the mesh of the orthogonal grid is connected to the two conductive thin wires in the Y- Do.

Fig. 5 shows a perspective view when the first and second sensor electrode arrays are arranged orthogonally, and a substantially uniform lattice pattern of conductive fine wires is formed on the entire touch surface. A portion of the sensor electrode is collectively referred to as a diamond structure. A conductive fine wire (i) which is not electrically connected to the electrode is disposed in the non-conductive portion between the electrodes. If the conductive fine wire (i) is not disposed on the non-conductive portion between the electrodes, the non-conductive pattern may be recognized due to the difference in reflectance, refractive index and small color taste of the electrode portion and non-conductive portion, (I) which is not provided. 3? The non-conductive thin lines (i) of 5 are described as isolated conductors. These fine lines (i) may be used for controlling the parasitic capacitance by connecting them separately from the electrodes.

The line width of the conductive fine wire in the lattice-like mesh structure is preferably 0.5 μm or more and 10 μm or less, more preferably 1 μm or more and 8 μm or less, and further preferably 2 μm or more and 5 μm or less. When the thickness is 0.5 mu m or more and 10 mu m or less, both ease of processing and prevention of generation of interference fringe are achieved.

The length of one side of the lattice constituting the mesh is preferably 100 占 퐉 or more and 600 占 퐉 or less, more preferably 150 占 퐉 or more and 350 占 퐉 or less. When the thickness is 100 占 퐉 or more and 600 占 퐉 or less, both light transmittance and low resistance value can be achieved.

The width of the non-conductive portion sandwiching the electrode is preferably 50 占 퐉 or more, more preferably 100 占 퐉 or more, and further preferably 150 占 퐉 to 350 占 퐉 in order to avoid conduction by high frequency driving.

The distance between the electrodes of the sensor electrode array is preferably 2 mm or more and 8 mm or less, more preferably 3 mm or more and 7 mm or less.

6? Fig. 5 is a view showing an electrode pattern of a band-shaped structure which is different from the electrode pattern of the diamond structure of Fig. 5.

 Fig. 6 shows a strip-shaped first sensor electrode array, and it is exemplified that the electrodes r-i constituting the array extend in the Y direction and i arrays are arranged in the X direction. In the figure, rw represents the width of the sensor electrode (r-i), and rd represents the width of the non-conductive boundary region between the sensor electrodes.

The electrode (r-i) has a detailed structure in which four linear straight lines extending in the Y direction are connected in Fig. 6, and several connecting lines c in the X direction for connecting the four electrodes are connected. The connection line (c) is formed so as not to impede the function of the sensor electrode even if any trouble occurs, such as breakage, in any of the four linear thin wires extending in the Y direction. And a disconnection line i of a conductive fine wire is formed on the extension of the connecting line c. The disconnection line (i) is an isolated line not connected to the electrode. In Fig. 6, four linear straight lines constituting one electrode are connected. However, the distance between the electrodes and the distance between the lines described below can be selected.

FIG. 7 shows a strip-shaped second sensor electrode array, in which the electrodes (c-j) constituting the array extend in the X-direction and j-arrays are arranged in the Y-direction. In the figure, cw represents the width of the sensor electrode (c-j), and cd represents the width of the non-conductive boundary region between the sensor electrodes. Other conditions are the same as those in the first sensor electrode array. However, it may be changed in accordance with the aspect ratio of the touch panel.

Fig. 8 shows a perspective view when the first and second sensor electrode arrays are arranged orthogonally, and a substantially uniform lattice pattern of conductive fine wires is formed on the entire touch surface. The connection line (c) and the isolated single wire (i) are disposed so as to fill the gap between the first sensor electrode array and the second sensor electrode array. The connecting line (c) and the isolated single wire (i) are arranged so that a substantially uniform lattice shape of the conductive fine wire is formed on the entire touch surface, thereby preventing visibility problems from occurring. These fine lines (i) may be connected to the electrodes separately and used for controlling the parasitic capacitance.

The line width of the fine lines of each electrode constituting the strip-shaped sensor electrode array, the fine lines of the connecting portion (c) and the fine lines of the isolated disconnection line (i) is preferably 0.5 μm or more and 10 μm or less, more preferably 1 μm or more and 8 μm or less And more preferably 2 mu m or more and 5 mu m or less. When the thickness is 0.5 占 퐉 or more and 10 占 퐉 or less, both the ease of processing and the prevention of the generation of interference fringes can be achieved.

The distance between the fine lines constituting the electrode is preferably 100 占 퐉 or more and 600 占 퐉 or less, more preferably 150 占 퐉 or more and 350 占 퐉 or less. When the thickness is 100 占 퐉 or more and 600 占 퐉 or less, both light transmittance and low resistance value can be achieved.

The width (cd, rd) of the non-conductive portion sandwiching the electrode is preferably 50 占 퐉 or more, more preferably 100 占 퐉 or more, and further preferably 150 占 퐉 to 350 占 퐉 in order to avoid conduction by high-

The interval (rw + rd or cw + cd) of the electrodes of the sensor electrode array is preferably 2 mm or more and 8 mm or less, more preferably 3 mm or more and 7 mm or less.

Fig. 9 is a diagram showing the relationship between the first and second sensor electrode arrays 11 and 12 of Figs. 1 (a) and 1 (b), 2 (c) And blackening layers 20 and 20 'are formed on the surface of the toucher side. The blackening layer of the second sensor electrode array in Fig. 9 (b) is formed between the easy adhesion layer and the electrode array.

In the present invention, the blackening layer is a layer which prevents coloring due to metallic luster of the conductive metal forming the conductive metal thin wire and alleviates difficulties in view of the touch panel screen resulting from a high reflectance or prevents corrosion or migration of the conductive metal It is a layer installed for the purpose of, for example, The color of the blackening layer is preferably substantially black, but it may not necessarily be a pure black color as long as it can suppress metallic luster. The position of the blackening layer is preferably on the touch side in contact with the conductive metal layer for the above purpose. From this point of view, rather than the blackening layer of the second sensor electrode array of Fig. 9 (b), the position of the blackening layer of the second sensor electrode array of Fig. 9 (a) is more preferable from the viewpoint of prevention of corrosion and migration.

[Material of sensor electrode]

Conductive materials capable of forming the first and second sensor electrodes of the present invention will be described below.

Conventionally, a light-transmitting conductive material such as ITO has been used as a material for constituting the sensor electrode. However, since the sensor electrode of the present invention uses a conductive fine wire of 10 탆 or less, It is preferable to use a metal or an alloy having high conductivity. Examples of such metals include metals such as copper, silver, gold, platinum, palladium, nickel, tin, aluminum, cobalt, rhodium, iridium, iron, ruthenium, osmium, manganese, molybdenum, tungsten, niobium, Bismuth, antimony, lead and the like. Of these, copper, silver, gold, platinum, palladium, nickel, tin, aluminum, and alloys thereof are preferable from the viewpoint of excellent conductivity.

For the electrode formation in these metals or alloys, the following A)? C) can be used. Particularly preferred in the present invention are the materials and methods of A) and B).

A) Use as a metal foil or a thin film.

To use it as a thin film, a metal thin film is first formed on a substrate by a vacuum deposition method, a sputtering method, an ion plating method, a plating method, etc., or by a plating method or a metal foil bonding. The thickness of the metal thin film is not particularly limited, but is, for example, 100 nm to 3000 nm. Subsequently, the metal thin film is subjected to the following patterning to form a mesh electrode. When the mesh pattern is formed by photoetching, a photoresist film is formed on the metal thin film, exposed using a photomask, and developed with a developer to form a mesh pattern of the resist film. This is etched by an etching solution, and the resist film is peeled off to form a mesh pattern made of fine wire metal lines. Alternatively, in the case of forming with a printing resist, a mesh pattern of a resist film is printed on a metal thin film by a method such as screen printing, gravure printing, or ink jetting, and etching other than the resist covering portion in the metal thin film by an etching solution, The resist film is peeled off to form a mesh pattern of fine metal wires.

B) printing the mesh pattern with ink (or paste) containing conductive nanoparticles.

As the conductive nanoparticles, carbon may be used in addition to the fine particles of the metal. The conductive nanoparticles are preferably particles containing gold, silver, palladium, platinum, copper, carbon, or a mixture thereof. The average particle diameter of the nanoparticles is 2 mu m or less, preferably 200 to 500 nm, which is smaller than that of the conventional micron particles, which is preferable for forming a mesh pattern. For the mesh pattern printing, a screen printing method or a gravure printing method is used.

The conductive material containing the ink (or paste) may not be metal particles but may be conductive fibers. In this case, conductive fibers include metal wires, fibrous materials called nanowires, tubes with hollow structure, and nanotubes. The average short axis length (sometimes referred to as "average minor axis diameter", "average diameter") of the metal nanowires is preferably 100 nm or less, more preferably 1 nm or less, More preferably 50 nm, and more preferably 10 nm? More preferably 40 nm, and more preferably 15 nm? And particularly preferably 35 nm. In the case of forming the conductive layer by using the conductive fiber, for example, Japanese Unexamined Patent Application Publication No. 2009-215594, Japanese Unexamined Patent Application Publication No. 2009-242880, Japanese Unexamined Patent Application Publication No. 2009-299162, Japanese Unexamined Patent Application Publication No. 2010- 84173, JP-A-2010-87105, and JP-A-2010-86714.

C) A silver halide photographic light-sensitive material used in photography is used to perform a mesh pattern exposure on this material, followed by development and fixing treatment, and to obtain a conductive fine-line pattern by development silver.

The method of obtaining the conductive fine wire pattern according to the present invention includes the following three types depending on the form of the photosensitive material and the development processing.

(1) Physical phenomenon The photosensitive silver halide silver-free photosensitive material containing no nucleus is chemically developed or thermally developed to form a metal silver portion on the photosensitive material.

(2) A mode in which a photosensitive silver halide silver / white photosensitive material containing a physical phenomenon nucleus in a silver halide emulsion layer is dissolved and physically developed to form a metal silver portion on the photosensitive material.

(3) A mode in which a photosensitive silver halide silver-free photosensitive material containing no physical phenomenon nuclei and a light-receiving sheet having a non-light-sensitive layer containing physical phenomenon nuclei are overlaid and spread and transferred to form a metal silver portion on the non-photosensitive image-receiving sheet.

In the mode (1), as a monolithic monochrome developing type, a light transmitting conductive film such as a light transmitting conductive film is formed on a photosensitive material. The obtained phenomenon is a silver chemical phenomenon or a heat phenomenon, and the activity is high in the subsequent plating or physical development process in that it is a filament having a high surface area.

In the mode (2), the silver halide particles of the physical phenomenon nuclei are dissolved and deposited on the developing nuclei in the exposure section, so that a light-transmitting conductive film such as a light-transmitting electroconductive film is formed on the photosensitive material. This is also an integral type of black and white phenomenon. The developing action is high activity because it is precipitation into the physical phenomenon nuclei, but the phenomenon is spherical in which the silver specific surface is small.

In the embodiment (3), the silver halide particles are dissolved and diffused in the unexposed portion and deposited on the developing nuclei on the image receiving sheet, so that a light transmitting conductive film such as a light transmitting conductive film is formed on the image receiving sheet. In the so-called separate type, the image-receiving sheet is peeled from the photosensitive material and used.

Any of the embodiments can be selected from the negative type developing process and the reversal developing process (in the case of the diffusion transfer method, negative type developing process becomes possible by using an auto-positive photosensitive material as the photosensitive material).

The chemical phenomenon, heat phenomenon, dissolution physical phenomenon, and diffusion transfer phenomenon referred to herein are the same as the terms commonly used in the art, and they can be classified into general textbooks of photochemicals such as Kikuchi Shinichi Co., , Published in 1955), and CEK Mees, "The Theory of Photographic Processes, 4th ed." (Mcmillan, published in 1977). Although this is an invention related to liquid processing, it is also possible to refer to a technique of applying a thermal developing method as another developing method. For example, the techniques disclosed in Japanese Patent Application Laid-Open Nos. 2004-184693, 2004-334077, and 2005-010752 can be applied.

The material used in the present invention and the method for producing the conductive pattern are described in Japanese Patent Application Laid-Open No. 2006-352073, which is an invention of a mesh-shaped electromagnetic wave shielding film, Japanese Patent Application No. 2009-265467 The description and description of the call may be used.

[Method of forming sensor electrode]

Next, a method of forming the first and second sensor electrodes of the present invention will be described.

A method of forming a metal foil or a thin film (material A) as a material for forming an electrode will be described first with reference to Fig. 10 (a) is a transparent base body 15 serving also as an insulating layer, and is, for example, a PET film of about 100 탆. The surface of the film is cleaned, and then a thin layer 21 of a metal or alloy is formed on the surface of the film (Fig. 10 (b)). Methods for forming a thin layer include a vacuum film forming method and a chemical film forming method, but when the film is thin, a vacuum film forming method such as a vapor deposition method is used. The sputtering method or the ion plating method is preferable because it is easy to obtain a film having better conductivity than the vapor deposition method. When the film thickness exceeds 500 nm, an electrolytic plating method or an electroless plating method can be used, and a film can be formed at a low cost, which is preferable.

As the metal, the material described in the above (1) can be used, but silver, copper, aluminum, or an alloy thereof is preferably used. A sputtering method or the like is used for forming the thin layer, but other methods may be used. The thinner the thickness of the formed metal thin layer is, the better it is because it does not peel off more easily. Thinner, however, increases the resistance and deteriorates the responsiveness of the touch panel. Therefore, the thickness is preferably 0.1 탆 or more and 3 탆 or less, more preferably 0.2 탆 or more and 2 탆 or less More preferable. In order to prevent peeling, the ratio of the " line width / thickness " is preferably 2.5 or more, and more preferably 4 or more.

Next, a photoresist film is formed on the metal thin film formed as described above, exposed using a photomask (a mask is generated in FIGS. 3, 4, 6 and 7), and developed with a developing solution to form a mesh pattern of the cured resist film do. This is etched by an etching solution, and the cured resist film is peeled and removed to form a mesh pattern of fine wire metal lines (FIG. 10 (c)). FIG. 10 (c) shows a conductive fine line of a mesh pattern in which 31 is formed.

Next, a coating layer 32 is formed on the sensor electrode formed as described above (FIG. 10 (d)). In the present invention, this coating layer is called a blackening layer. The blackening layer has a visual function of making the metallic luster of the metal or alloy not noticeable, and a function of improving the durability by prevention of rust and migration of the metal. The material of the blackening layer (coating layer) will be separately described below. The thickness of the blackening layer (coating layer) is preferably 5 占 퐉 or less, more preferably 3 占 퐉 or less, and particularly preferably 0.2 占 퐉 or more and 2 占 퐉 or less.

Next, by removing the blackening layer on the visible portion which does not cover the electrode fine line of the blackening layer (coating layer), a mesh-shaped electrode having excellent visibility and durability can be formed (Fig. 10 (e)).

In the case of using ink (or paste) containing conductive nanoparticles (the above B), the mesh pattern can be printed directly on the transparent base layer which also serves as an insulating layer. In the case where a blackening layer is formed on the metal pattern formed by performing heat treatment or the like as necessary after printing, the same treatment as described above can be performed.

[Material used for blackening layer and method of forming layer]

The main constituent constituting the blackening layer of the present invention may be at least one kind of compound containing an element selected from nickel, chromium, zinc, tin, and copper, and may be conductive or nonconductive. In addition to the method of the present invention, methods such as staining method may be used in combination.

Examples of a preferable lamination method of the blackening layer in the present invention include a plating treatment and a chemical etching method.

Examples of the plating treatment include black nickel plating, black chromium plating, black Sn-Ni alloy plating, Sn-Ni-Cu alloy plating, and black zinc chromate treatment, . Specifically, a black plating bath (trade name, Nikka black, Sn-ni alloy system) manufactured by Nippon Chemical Industry Co., Ltd., a black plating bath (trade name: Ebony-chrome 85 series, Cr ZB-541, a zinc chromate black chromate agent) can be used as a chromate agent. The plating method may be either electroless plating or electrolytic plating, relaxed conditions, or high-speed plating. The thickness of the plating is not limited as long as it can be recognized as black, but usually the thickness of the plating is preferably 5 占 퐉 or less.

In the present invention, a black part may be formed by oxidizing or sulfiding a part of the conductive metal part. For example, when the conductive metal addition part is copper, examples of the blackening agent on the copper surface include Enflate MB438A, B, trade name nPE-900, manufactured by Mitsubishi Gas Chemical Co., Copper-black CuO, Copper CuS, Copolymer of selenium series, manufactured by ISOLATE CHEMICAL RESEARCH INSTITUTE, MICHE BOND BO-7770V, 65 may be used. Other than the above, for example, it is also possible to treat sulfide to generate hydrogen sulfide (H2S), and to blacken the surface of copper to copper sulfide (CuS). Though the thickness of these treatments is not limited as long as they can be recognized as black, it is usually 3 m or less, preferably 0.2 m? More preferably 2 m.

In the present invention, in order to obtain a desired reflection chromaticity in the sensor electrode array, the blackening treatment is preferably performed in two or more steps. For example, it is preferable to carry out a reduction treatment after the oxidation treatment, specifically, an alkali aqueous solution containing an oxidizing agent such as sodium chlorite or sodium peroxodisulfate, and then treating the solution with a reducing agent such as dimethylamine borane, sodium borohydride, It is preferable to treat it with a solution. It is believed that the former increases the black rice by roughening the surface and the latter stabilizes the unstable surface state in the electronic treatment, thereby becoming a desirable mode.

The surface of the blackening layer preferably has some degree of surface roughness (Ra). Ra is preferably 0.15 m or less, more preferably 0.05? More preferably 0.14 mu m. Ra exceeding 0.15 占 퐉 is not preferable because the scratch resistance and adhesion may be deteriorated.

The measurement of Ra is roughly divided into two stages, that is, a surface is linearly measured with a stylus (a stylus) and an optical measurement is performed (a light cutting method, a light reflection method).

When the line width of the conductive fine wire is narrow and a measurement area can not be secured, the conductive beta portion produced by the same operation is measured except Ra of the exposure area, and Ra is calculated.

In response to an increase in the size of an image display device using a touch panel, it is also required to increase the size of the touch panel itself. With respect to enlargement, it is necessary to lower the resistance of the electrode and to lower the parasitic capacitance between the electrodes, and it is therefore effective to dispose the dummy electrode between the electrodes. The dummy electrode is not connected to the sensor electrode but is an isolated electrode group. However, the dummy electrode may be formed by connecting the isolated disconnection line to control the parasitic capacitance.

[Example]

Hereinafter, the present invention will be described in more detail with reference to examples of the present invention. In addition, the materials, the amounts used, the ratios, the contents of the treatments, the processing procedures, and the like appearing in the following examples can be appropriately changed without departing from the gist of the present invention. Therefore, the scope of the present invention is not to be construed as being limited by the specific examples described below.

First, an evaluation method in the embodiment of the present invention will be described.

[Measurement method of reflection chromaticity]

The sample is placed on a BCRA black tile (glossy plate), and the spectral reflectance of the light radiated from the 0 ° direction and the light received at the 45 ° direction is measured.

A preferable tile is a BCRA black tile (glossy plate) manufactured by Sakata Ines Engineering Co., Ltd. The reflection chromaticity of the black tile is L ^* of 3.6, a ^* of -0.9 and b ^* of -0.6. As the reflection densitometer, Spectro Eye LT manufactured by GretagMacbeth (GretagMarkbeth) can be used.

[Evaluation of scratch resistance]

The sample is rubbed 10 times in a weight of 500 g with "Tresi" manufactured by TORAY, a superfine fiber. The rubbed samples are evaluated in the following five steps.

1: No change at all.

2: The rubbing marks are weak and small.

3: The rubbing marks are weak, and they occur as a whole.

4: The rubbing is strong but small.

5: Rubbed marks are strong, and occur as a whole.

[Evaluation of adhesion]

The sample was subjected to adhesion evaluation by a cross-cut method, and the subsequent sample was evaluated by the following five steps.

1: No peeling at all.

2: Peeling in less than 5%.

3: Exceeding 5% and peeling at less than 10%.

4: Exceeding 10% and peeling at 50% or less.

5: Peeled off in excess of 50%.

[Evaluation of surface roughness (Ra)]

A beta-exposed area of 5 cm x 5 cm was formed on the sample, and the area was measured using a small surface roughness meter, Surf test SJ-301 manufactured by Mitsutoyo Co., Ltd.

Example 1

[Production of Transparent Substrate A with Two-Layer Easy-to-Adhesive Layer]

After a corona discharge treatment was applied to both sides of a polyethylene terephthalate (hereinafter referred to as PET) film support having a thickness of 100 占 퐉, the following first layer coating liquid was applied and dried by the bar coating method on both sides, . Thereafter, the following second layer coating liquid was coated on the surface of the formed first layer by a bar coating method and dried to produce a PET film having two layers of easy-to-adhere layers on both sides of the film. The thicknesses of the first layer and the second layer after drying were 0.08 mu m and 0.09 mu m, respectively.

The composition of the first layer coating liquid

? Polyester resin binder (Pinex ES650, solid content 29 mass%, manufactured by Dainippon Ink and Chemicals, Incorporated) 49.7 parts by mass

? An epoxy compound (Dinacol EX-314, manufactured by Nagase & Co., Ltd.) as a crosslinking agent,

6% by mass based on the resin binder,

? Surfactant A (Sanyo Denki Sangyo Co., Ltd., Sandet BL, solid content 10 mass%, anionic property) 2.3 mass parts

? Surfactant B (Sanyo Chemical Industries, Ltd., Naroacty HN-100, solid content 5%, nonionic) 5.36 parts by mass

 ? 2.4 parts by mass of a silica fine particle dispersion (water dispersion of OX-50, solid content 10%, manufactured by Nippon Aerosil Co., Ltd.) as a matting agent A

As the matting agent B, 4.6 parts by mass of a colloidal silica dispersion (SNOWTEX-XL, solid content 10%, manufactured by Nissan Chemical Industries, Ltd.)

Distilled water was added so that the whole amount was 1000 parts by mass.

Composition of the second layer coating liquid

? Acrylic resin binder (59% by mole of MMA, 9% by mole of St, 26% by mole of 2EHA, 5% by mole of HEMA, 1% by mole of AA latex, solid content concentration of 28%

? An epoxy compound (Dinacol EX-314, manufactured by Nagase & Co., Ltd.) as a crosslinking agent,

 6% by mass relative to the resin binder,

??? 2.7 parts by mass of Matte Part A

Matte B 4.6 parts by mass

? Surfactant A ??? 1.9 parts by mass

? Surfactant B ??? 5.36 parts by mass

? Slip agent (Chukyo Kasei Co., Ltd., carnauba wax dispersion, vertical sol 524 solid content 3% by mass)

7.6 parts by mass

Distilled water was added so that the whole amount was 1000 parts by mass.

[Production of sensor electrode array of the present invention]

A copper thin film was formed by plating on one side of the easy-to-adhere layer of the transparent substrate A on which the easy-to-adhere layer was formed. Electroless plating was performed on the plating, followed by electrolytic plating to form a copper thin layer having a thickness of 2 탆.

Next, a photoresist film was formed on the copper thin film formed above. The photoresist film was exposed to light using a photomask and developed with a developer to form a cured resist film pattern. The photomask is a pattern in which the width of the conductive fine wire is 5 占 퐉 and the pitch of the fine wire is 300 占 퐉 in FIG. 6, and the photoresist of the conductive fine wire portion is cured by exposure. This was etched using an etching solution, and then the cured resist film was peeled and removed to form a sensor electrode array made of conductive thin wires of the pattern shown in Fig.

Next, a blackening layer is formed on the conductive thin wire portion made of the copper thin film of the sensor electrode array of Fig. 6 manufactured as described above. In this embodiment, the transparent substrate on which the sensor electrode array is formed is immersed in the hydrogen sulfide solution, and only the surface of the copper thin film is made of black copper sulfide, thereby forming the sensor electrode array of the first embodiment.

Example 2

6, and in Example 2, the same operation as in Example 1 was carried out except that the line width of the conductive fine wire was changed to 6 m in addition to the diamond shape in Fig. 3, The sensor electrode array of Example 2 was fabricated.

Example 3

The same operation as in Example 2 was carried out except that the pitch of the conductive thin wire of Example 2 was set to 500 탆, thereby fabricating the sensor electrode array of Example 3.

Example 4

Example 1 was repeated except that the laminated polyester film (referred to as transparent substrate B) described in Example 1 of JP-A-5-74463 was used in place of the transparent substrate A on which the adhesion-facilitating layer used in Example 1 was formed. The same operation was performed to fabricate the sensor electrode array of Example 4. Further, the laminated polyester film of the transparent substrate B contains a melamine-based crosslinking agent NIKARAK MW-12 LF (manufactured by Sanwa Chemical Co., Ltd.) in the modified layer (easy adhesion layer of the present film).

Example 5

The same operation as in Example 2 was carried out except that the copper thin film of Example 2 was formed by sputtering and the thickness thereof was set to 0.2 탆, the width of the conductive thin wire of the electrode was set to 3 탆, and the pitch thereof was set to 200 탆 , The sensor electrode array of Example 5 was fabricated.

Example 6

(NIKARAK MW-12 LF, manufactured by Sanwa Chemical Co., Ltd.) was added in an amount of 6 mass% based on the resin binder in place of the epoxy-based compound Dinacol EX-314 used for the adhesive layer of the transparent substrate A of Example 1, The same operation as in Example 1 was carried out to fabricate the sensor electrode array of Example 6. [

Example 7

Example 1 was repeated except that 6 mass% of the adduct of tolylene diisocyanate and trimethylol propane was used instead of the epoxy compound Dinacol EX-314 used for the easy-to-adhere layer of the transparent substrate A of Example 1 to the resin binder. The sensor electrode array of Example 7 was fabricated by performing the same operation. Further, in order to dissolve the crosslinking agent, part of water was substituted with acetone in the coating liquid for easy adhesion layer.

Example 8

A copolymer of 2-vinyl-2-oxazoline monomer and methyl methacrylate was used in an amount of 6 mass% relative to the resin binder in place of the epoxy compound Dinacol EX-314 used for the adhesive layer of the transparent substrate A of Example 1 , The sensor electrode array of Example 7 was fabricated. Further, in order to dissolve the crosslinking agent, part of water was substituted with acetone in the coating liquid for easy adhesion layer.

Example 9

The same operation as in Example 1 was carried out except that the line width of the conductive fine wire of Example 1 was set to 5.5 탆, whereby a sensor electrode array of Example 9 was fabricated.

Example 10

The same operation as in Example 1 was carried out except that the line width of the conductive thin wire of Example 1 was set at 4 탆, thereby fabricating the sensor electrode array of Example 10.

Comparative Example 1

A sensor electrode array of Comparative Example 1 was fabricated in the same manner as in Example 1 except that the crosslinking agent was not used for the second adhesive facilitating layer of Example 1.

Comparative Example 2

The same operation as in Comparative Example 1 was carried out except that the line width of the conductive thin wire of Comparative Example 1 was set to 3 탆, whereby a sensor electrode array of Comparative Example 2 was fabricated.

Comparative Example 3

A sensor electrode array of Comparative Example 3 was fabricated in the same manner as in Example 4 except that the melamine-based crosslinking agent of the transparent substrate B of Example 4 was excluded.

Table 1 summarizes the adhesion of the samples of the examples and comparative examples.

From the above results, it is necessary to add a crosslinking agent to the easy-to-adhere layer, and in particular, the use of an epoxy-based, melamine-based, isocyanate-based or oxazoline-based crosslinking agent can improve adhesion between the transparent substrate and the copper foil layer. It was also confirmed that the line width of the conductive thin wire can be improved by more than 2.5 times the thickness.

Example 21

A copper thin film was formed on one side of the easy-to-adhere layer of the transparent substrate A (having a two-layer easy-adhesion layer) prepared in Example 1 by a plating method. Electroless plating was performed on the plating, followed by electrolytic plating to form a copper thin layer having a thickness of 2 탆. On this copper thin film, a sensor electrode array made of conductive fine wires having the pattern of FIG. 6 (the width of the conductive fine wire and the pitch of the fine wire of 5 mu m and the fine wire of 300 mu m) was formed in the same manner as in Example 1. [ This sensor electrode array is referred to as a sample 21-1. A blackened layer was formed on the conductive fine wire portion made of the copper thin film of this sensor electrode array by the following reduction treatment or oxidation treatment method.

[Blackening treatment method 1]

Treatment conditions: Immersed in the following solution at 40 占 폚 for 3 minutes, and then washed.

Composition of liquid: 3.8 g of sodium borohydride

Water is added to make 1 liter.

[Blackening Treatment Method 2]

Treatment conditions: Immersed in the following solution at 85 캜 for 4 minutes, and then washed.

Composition of liquid: Sodium chlorite 55 g

Sodium hydroxide 15 g

3 g of sodium phosphate 10 g

Water is added to make 1 liter.

The sample subjected to the blackening treatment method 1 on the sample 21-1 is designated as 21-2. In addition, the sample subjected to the blackening treatment method 2 on the sample 21-1 is designated as 21-3. The sample subjected to the blackening treatment method 1 in addition to the sample 21-3 is designated as 21-4. The specimens 21-1 to 21-4 thus obtained were tested for reflection chromaticity, adhesion, and scratch resistance. The results are shown in Table 2.

From the above results, it was found that, in order to obtain the desired reflection chromaticity, the oxidation treatment is preferable to the reduction treatment, and the reduction treatment after the oxidation treatment is more preferable when the blackening treatment is carried out by the oxidation reduction treatment. In addition, in the samples 21-3 and 21-4, the performance related to the durability such as adhesion and scratch resistance is also improved.

Example 31

A copper thin film was formed on one side of the easy-to-adhere layer of the transparent substrate A (having a two-layer easy-adhesion layer) prepared in Example 1 by a plating method. Electroless plating was performed on the plating, followed by electrolytic plating to form a copper thin layer having a thickness of 2 탆. On this copper thin film, a sensor electrode array made of conductive fine wires having the pattern of FIG. 6 (the width of the conductive fine wire and the pitch of the fine wire of 5 mu m and the fine wire of 300 mu m) was formed in the same manner as in Example 1. [ This sensor electrode array is referred to as a sample 31-1. A blackened layer was formed by performing blackening treatment by electroplating as described below on the conductive fine wire portion made of the copper thin film of this sensor electrode array.

[Blackening Treatment Method 3]

 Treatment conditions: Dipping in the following plating solution at 40 캜, plating at 3.2 A / cm for 0.5 minutes, and then cleaning.

Composition of the plating solution (replenishing solution also copper composition)

Nickel sulfate 6 water salt 123 g

17 g of ammonium thiocyanate

Zinc sulfate 7 Water Salt 3 g

Sodium sulfate 16 g

Water was added to make 1 liter

pH (adjusted with sulfuric acid and sodium hydroxide) 5.0

[Blackening Treatment Method 4]

Treatment conditions: The substrate is immersed in the following plating solution at 40 캜, plated at 3.2 A / cm for 0.5 minute, and then cleaned.

Composition of the plating solution (replenishing solution also copper composition)

Nickel sulfate 6 water salt 123 g

17 g of ammonium thiocyanate

Zinc sulfate 7 Water salt 28 g

Sodium sulfate 16 g

Water was added to make 1 liter

pH (adjusted with sulfuric acid and sodium hydroxide) 5.0

The specimen 31-1 was subjected to the above-mentioned blackening treatment method 3 to obtain 31-2. The specimen 31-1 was subjected to the blackening treatment method 4 to obtain a specimen 31-3. The sample subjected to the blackening treatment method 3 in addition to the sample 31-3 was designated as 31-4. Further, the sample 31-1 was plated with a commercially available chrome black plating bath at a rate of 3.2 A / cm for 0.5 minutes, and then washed to obtain a sample 31-5.

The samples 31-1 to 31-5 thus obtained were subjected to a test for reflection color, adhesion, and scratch resistance. The results are shown in Table 3.

From the above results, it is preferable to treat with a high concentration solution of zinc sulfate heptahydrate in order to obtain a desired reflection chromaticity when the blackening treatment is carried out by electroplating, and it is preferable to treat the zinc sulfate heptahydrate with a low concentration solution of zinc sulfate heptahydrate and a two- . It is considered that the treatment in the high concentration solution of zinc sulfate heptahydrate has an action of roughening the surface. However, since the plating efficiency is not sufficient, it is considered that the treatment with a low concentration solution of zinc sulfate heptahydrate with a good plating efficiency and treatment with a high concentration solution of zinc sulfate heptahydrate is considered to be the best result.

Further, by the above two-step process, a durable metal fine wire electrode can be obtained. The low reflection treatment by the plating treatment in which the oxide film is formed on the surface of the metallic fine wire electrode is described in JP-A 2006-344163, for example, to prevent reflection by black chromium, Is not described.

The samples 31-4 and 31-5 were stored under the environment of 60 占 폚 and 90% for 500 hours and then stored under a normal environment for 24 hours, and then the same measurements as in Table 3 were carried out. As a result, only the fluctuation of the error range was observed in the sample 31-4, while in the sample 31-5, the L ^* increased to 15.0 and the Ra increased to 0.20, It was found that the surface roughness varied in the direction of undesirable surface roughness.

10 The touch panel
11 First sensor electrode array
12 second sensor electrode array
15, 15 'transparent substrate
16 A transparent material layer to be a touch surface
17 release film
18, 18 'Easy adhesion layer
19, 19 ', 19 "adhesive layer
20, 20 'blackening layer
21 Formation layer of sensor electrode
31 mesh-shaped sensor electrode
32 Coating layer of sensor electrode
33 Coating layer of sensor-shaped sensor electrode
cj indicates the number of the sensor electrode of the lower electrode layer.
cw represents the electrode width of the sensor electrode of the lower electrode layer.
cb represents the non-conductive boundary between the electrodes of the sensor electrode of the lower electrode layer.
i isolated wire
ri indicates the number of the sensor electrode in the upper electrode layer.
rw represents the electrode width of the sensor electrode of the upper electrode layer.
rb represents the non-conductive boundary between the electrodes of the sensor electrode of the upper electrode layer.
rd represents the width of the non-conductive boundary between the electrodes of the sensor electrode of the upper electrode layer.

Claims (16)

A touch panel having a first sensor electrode array,
The first sensor electrode array includes a transparent substrate and a conductive metal thin wires are formed on a patterned, L ^* in the L ^* reflection color of the sensor electrode array a ^* b ^* 6? 13, a ^* is -0.7? 1.5, b ^* is -5.0? 1.2. ≪ / RTI > The method according to claim 1,
Further comprising a second sensor electrode array, wherein the first sensor electrode array and the second sensor electrode array are arranged orthogonally. The method according to claim 1,
And at least one easy-to-adhere layer between the patterned conductive metal thin wire and the transparent substrate. The method according to claim 1,
Wherein the touch panel is a capacitive touch panel. In the capacitive touch panel in which the first sensor electrode array and the second sensor electrode array are orthogonally arranged, the first sensor electrode array disposed on the toucher side is formed by laminating conductive metal thin wires Wherein the first electrode and the second electrode are patterned. 6. The method according to claim 1 or 5,
Wherein the patterned conductive metal thin wire has a blackening layer on the touch surface side. The method according to claim 6,
And the surface roughness (Ra) of the blackening layer is 0.15 or less. 6. The method of claim 5,
Reflecting the color of the sensor electrode arrays L ^* a ^* b ^* of the L ^* a 6? 13, a ^* is -0.7? 1.5, b ^* is -5.0? 1.2. ≪ / RTI > 6. The method according to any one of claims 2 to 5,
Wherein the sensor electrode constituting the first sensor electrode array is a continuum or a band-shaped body of a diamond structure formed of a mesh formed of the conductive metal thin wires, and the sensor electrode constituting the second sensor electrode array is a sensor- Wherein the touch panel has the same structure or bar structure as the sensor electrode constituting the electrode array. 6. The method according to claim 2 or 5,
Wherein when the first sensor electrode array and the second sensor electrode array that are orthogonally arranged are viewed through, the patterned conductive metal thin wires form a substantially uniform lattice pattern over the entire touch surface. 6. The method according to claim 1 or 5,
Wherein the conductive metal thin wire is patterned in a thin line pattern having a line width of 1000 nm to 8000 nm by using a photolithography method or a laser ablation method. 6. The method according to claim 1 or 5,
Wherein the width of the conductive metal thin wire is at least 2.5 times the thickness. The method according to claim 3 or 5,
Wherein the transparent substrate is made of a polyester resin, and the easy-to-adherent layer is made of a polyester resin, an acrylic resin or a urethane resin, and a crosslinking agent is added to the easy-to-adhere layer. 14. The method of claim 13,
Wherein the easy-to-adhere layer comprises first and second easy-to-adhere layers, the first easy-to-adherent layer in contact with the transparent substrate is made of a polyester resin, and the second adherent layer is made of an acrylic resin or a urethane resin Features a touch panel. 14. The method of claim 13,
Wherein the crosslinking agent is an oxazolidine compound, an epoxy compound, or an isocyanate compound. 15. The method of claim 14,
Wherein the crosslinking agent is an oxazolidine compound, an epoxy compound, or an isocyanate compound.

Images