TW200916944A - Method of correcting a defect in a gray tone mask, method of manufacturing a gray tone mask, gray tone mask, and method of transferring a pattern - Google Patents

Method of correcting a defect in a gray tone mask, method of manufacturing a gray tone mask, gray tone mask, and method of transferring a pattern Download PDF

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Publication number
TW200916944A
TW200916944A TW097125679A TW97125679A TW200916944A TW 200916944 A TW200916944 A TW 200916944A TW 097125679 A TW097125679 A TW 097125679A TW 97125679 A TW97125679 A TW 97125679A TW 200916944 A TW200916944 A TW 200916944A
Authority
TW
Taiwan
Prior art keywords
film
light
semi
correction
transmissive
Prior art date
Application number
TW097125679A
Other languages
English (en)
Chinese (zh)
Inventor
Jun-Ichi Tanaka
Michiaki Sano
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Publication of TW200916944A publication Critical patent/TW200916944A/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW097125679A 2007-07-12 2008-07-08 Method of correcting a defect in a gray tone mask, method of manufacturing a gray tone mask, gray tone mask, and method of transferring a pattern TW200916944A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007182870A JP2009020312A (ja) 2007-07-12 2007-07-12 グレートーンマスクの欠陥修正方法、グレートーンマスクの製造方法及びグレートーンマスク、並びにパターン転写方法

Publications (1)

Publication Number Publication Date
TW200916944A true TW200916944A (en) 2009-04-16

Family

ID=40246742

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097125679A TW200916944A (en) 2007-07-12 2008-07-08 Method of correcting a defect in a gray tone mask, method of manufacturing a gray tone mask, gray tone mask, and method of transferring a pattern

Country Status (4)

Country Link
JP (1) JP2009020312A (ko)
KR (1) KR20090006809A (ko)
CN (1) CN101344720B (ko)
TW (1) TW200916944A (ko)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI440964B (zh) * 2009-01-27 2014-06-11 Hoya Corp 多調式光罩、多調式光罩之製造方法及圖案轉印方法
JP2011227209A (ja) * 2010-04-16 2011-11-10 Cowin Dst Co Ltd ハーフトーンマスクのリペア方法及びリペアシステム
KR101032695B1 (ko) 2010-04-26 2011-06-10 주식회사 에스앤에스텍 그레이톤 포토마스크의 결함 수정 방법, 그레이톤 포토마스크 블랭크, 그레이톤 포토마스크, 및 그들의 제조 방법
US8741506B2 (en) 2012-06-15 2014-06-03 Shenzhen China Star Optoelectronics Technology Co., Ltd. Mask and repairing method therefor
CN102736405B (zh) * 2012-06-15 2014-07-16 深圳市华星光电技术有限公司 一种光罩及其修正方法
JP6235643B2 (ja) * 2016-03-25 2017-11-22 Hoya株式会社 パターン修正方法、フォトマスクの製造方法、フォトマスク、及び修正膜形成装置
CN107145035A (zh) * 2017-03-30 2017-09-08 惠科股份有限公司 光罩及其主动开关阵列基板的制造方法
KR102254646B1 (ko) * 2018-07-30 2021-05-21 호야 가부시키가이샤 포토마스크 수정 방법, 포토마스크의 제조 방법, 포토마스크, 및 표시 장치용 디바이스의 제조 방법
JP6741893B1 (ja) * 2020-03-04 2020-08-19 株式会社エスケーエレクトロニクス ハーフトーンマスクの欠陥修正方法、ハーフトーンマスクの製造方法及びハーフトーンマスク
JP7461220B2 (ja) 2020-05-25 2024-04-03 株式会社エスケーエレクトロニクス フォトマスクの修正方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5035787A (en) * 1987-07-22 1991-07-30 Microbeam, Inc. Method for repairing semiconductor masks and reticles
JPH0729816A (ja) * 1993-07-14 1995-01-31 Canon Inc 投影露光装置及びそれを用いた半導体素子の製造方法
JP3630935B2 (ja) * 1997-08-18 2005-03-23 Ｈｏｙａ株式会社 ハーフトーン型位相シフトマスクの欠陥修正方法
JP3556591B2 (ja) * 2000-09-29 2004-08-18 Ｈｏｙａ株式会社 グレートーンマスクにおけるグレートーン部の欠陥修正方法
JP2002189280A (ja) * 2000-12-19 2002-07-05 Hoya Corp グレートーンマスク及びその製造方法
US6894774B2 (en) * 2001-08-10 2005-05-17 Hoya Corporation Method of defect inspection of graytone mask and apparatus doing the same
JP2004335949A (ja) * 2002-11-29 2004-11-25 Nikon Corp 露光装置及び露光方法
JP3993125B2 (ja) * 2003-04-01 2007-10-17 Ｈｏｙａ株式会社 グレートーンマスクの欠陥修正方法
JP3875648B2 (ja) * 2003-04-08 2007-01-31 Ｈｏｙａ株式会社 グレートーンマスクの欠陥検査方法
JP4468093B2 (ja) * 2004-07-01 2010-05-26 大日本印刷株式会社 階調フォトマスクの製造方法
JP5037231B2 (ja) * 2006-08-02 2012-09-26 株式会社エスケーエレクトロニクス ハーフトーンマスクの欠陥修正方法及び欠陥が修正されたハーフトーンマスク

Also Published As

Publication number Publication date
KR20090006809A (ko) 2009-01-15
CN101344720A (zh) 2009-01-14
JP2009020312A (ja) 2009-01-29
CN101344720B (zh) 2011-11-09

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