TW200733203A - Shower head structure and cleaning method thereof - Google Patents

Shower head structure and cleaning method thereof

Info

Publication number
TW200733203A
TW200733203A TW096109914A TW96109914A TW200733203A TW 200733203 A TW200733203 A TW 200733203A TW 096109914 A TW096109914 A TW 096109914A TW 96109914 A TW96109914 A TW 96109914A TW 200733203 A TW200733203 A TW 200733203A
Authority
TW
Taiwan
Prior art keywords
main body
shower head
head
film forming
head structure
Prior art date
Application number
TW096109914A
Other languages
English (en)
Chinese (zh)
Other versions
TWI310216B (enExample
Inventor
Tomonao Kuwada
Masatake Yoneda
Takashi Nishimori
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW200733203A publication Critical patent/TW200733203A/zh
Application granted granted Critical
Publication of TWI310216B publication Critical patent/TWI310216B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45565—Shower nozzles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4405—Cleaning of reactor or parts inside the reactor by using reactive gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/4557—Heated nozzles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45572—Cooled nozzles

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
TW096109914A 2000-09-08 2001-09-06 Shower head structure and cleaning method thereof TW200733203A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000272645 2000-09-08

Publications (2)

Publication Number Publication Date
TW200733203A true TW200733203A (en) 2007-09-01
TWI310216B TWI310216B (enExample) 2009-05-21

Family

ID=18758726

Family Applications (5)

Application Number Title Priority Date Filing Date
TW096109914A TW200733203A (en) 2000-09-08 2001-09-06 Shower head structure and cleaning method thereof
TW096143030A TWI303084B (en) 2000-09-08 2001-09-06 Shower head structure, film forming method, and gas processing apparauts
TW090122145A TWI297510B (enExample) 2000-09-08 2001-09-06
TW096143031A TWI334888B (enExample) 2000-09-08 2001-09-06
TW096143031D TW200819555A (en) 2000-09-08 2001-09-06 Shower head structure, device and method for film formation, and method for cleaning

Family Applications After (4)

Application Number Title Priority Date Filing Date
TW096143030A TWI303084B (en) 2000-09-08 2001-09-06 Shower head structure, film forming method, and gas processing apparauts
TW090122145A TWI297510B (enExample) 2000-09-08 2001-09-06
TW096143031A TWI334888B (enExample) 2000-09-08 2001-09-06
TW096143031D TW200819555A (en) 2000-09-08 2001-09-06 Shower head structure, device and method for film formation, and method for cleaning

Country Status (4)

Country Link
US (2) US6905079B2 (enExample)
JP (1) JP2011236506A (enExample)
KR (4) KR100915252B1 (enExample)
TW (5) TW200733203A (enExample)

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* Cited by examiner, † Cited by third party
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TWI473538B (zh) * 2007-09-25 2015-02-11 Lam Res Corp 電漿處理設備的噴淋頭電極組件、及其溫度控制模組與溫度控制方法
TWI763707B (zh) * 2016-09-09 2022-05-11 德商愛思強歐洲公司 Ｃｖｄ反應器及ｃｖｄ反應器之清潔方法

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TWI473538B (zh) * 2007-09-25 2015-02-11 Lam Res Corp 電漿處理設備的噴淋頭電極組件、及其溫度控制模組與溫度控制方法
TWI763707B (zh) * 2016-09-09 2022-05-11 德商愛思強歐洲公司 Ｃｖｄ反應器及ｃｖｄ反應器之清潔方法

Also Published As

Publication number Publication date
KR20080083241A (ko) 2008-09-17
KR100907968B1 (ko) 2009-07-16
TWI297510B (enExample) 2008-06-01
US20020029748A1 (en) 2002-03-14
KR100915252B1 (ko) 2009-09-03
KR100919331B1 (ko) 2009-09-25
TWI334888B (enExample) 2010-12-21
TWI303084B (en) 2008-11-11
TW200819555A (en) 2008-05-01
KR20020020648A (ko) 2002-03-15
KR20080083243A (ko) 2008-09-17
KR100919330B1 (ko) 2009-09-25
JP2011236506A (ja) 2011-11-24
US20050082385A1 (en) 2005-04-21
US6905079B2 (en) 2005-06-14
TWI310216B (enExample) 2009-05-21
KR20080083242A (ko) 2008-09-17
TW200811927A (en) 2008-03-01

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