TW200732837A - Photo-curable coloring composition, color filter and liquid crystal display device - Google Patents

Photo-curable coloring composition, color filter and liquid crystal display device

Info

Publication number
TW200732837A
TW200732837A TW095148756A TW95148756A TW200732837A TW 200732837 A TW200732837 A TW 200732837A TW 095148756 A TW095148756 A TW 095148756A TW 95148756 A TW95148756 A TW 95148756A TW 200732837 A TW200732837 A TW 200732837A
Authority
TW
Taiwan
Prior art keywords
photo
coloring composition
liquid crystal
display device
crystal display
Prior art date
Application number
TW095148756A
Other languages
English (en)
Inventor
Norikuni Suzuki
Yoichi Nemoto
Tsutomu Okita
Original Assignee
Fujifilm Electronic Materials
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Electronic Materials filed Critical Fujifilm Electronic Materials
Publication of TW200732837A publication Critical patent/TW200732837A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Liquid Crystal (AREA)
TW095148756A 2005-12-28 2006-12-25 Photo-curable coloring composition, color filter and liquid crystal display device TW200732837A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005380016 2005-12-28
JP2006332360A JP2007199685A (ja) 2005-12-28 2006-12-08 光硬化性着色組成物及びカラーフィルタ、並びに液晶表示装置

Publications (1)

Publication Number Publication Date
TW200732837A true TW200732837A (en) 2007-09-01

Family

ID=38454314

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095148756A TW200732837A (en) 2005-12-28 2006-12-25 Photo-curable coloring composition, color filter and liquid crystal display device

Country Status (4)

Country Link
JP (1) JP2007199685A (zh)
KR (1) KR101357547B1 (zh)
CN (1) CN1991584B (zh)
TW (1) TW200732837A (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI386436B (zh) * 2007-12-26 2013-02-21 Asahi Kasei Emd Corp A heat-resistant resin precursor, and a photosensitive resin composition using the same
US8765332B2 (en) 2008-03-28 2014-07-01 Fujifilm Corporation Green curable composition, color filter and method of producing same

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4788485B2 (ja) * 2006-06-13 2011-10-05 住友化学株式会社 着色感光性樹脂組成物
JP5207837B2 (ja) * 2007-08-02 2013-06-12 富士フイルム株式会社 硬化性組成物、硬化膜、フォトスペーサーの製造方法、液晶表示装置用基板及び液晶表示装置
KR100952965B1 (ko) * 2007-08-30 2010-04-16 제일모직주식회사 액정배향제, 및 이를 이용하여 제조된 액정배향막
JP2009079121A (ja) * 2007-09-26 2009-04-16 Fujifilm Corp 顔料分散組成物、光硬化性組成物、カラーフィルタ及びカラーフィルタの製造方法
KR20100075831A (ko) * 2007-10-05 2010-07-05 도아고세이가부시키가이샤 광 경화성 수지 조성물 및 그의 제조 방법
CN101821299B (zh) * 2007-10-09 2012-10-10 昭和电工株式会社 感光性接枝聚合物以及含有该接枝聚合物的感光性树脂组合物
WO2009063955A1 (ja) * 2007-11-16 2009-05-22 Fujifilm Corporation スペーサー形成用感放射線性樹脂組成物、スペーサー、スペーサーの形成方法、及び液晶表示素子
TWI476513B (zh) * 2007-12-28 2015-03-11 Fujifilm Corp 感光性樹脂組成物、光間隔物及其形成方法、保護膜、著色圖案、顯示裝置用基板與顯示裝置
JP5239414B2 (ja) * 2008-03-13 2013-07-17 Ｊｓｒ株式会社 着色層形成用感放射線性組成物、カラーフィルタ及び液晶表示素子
JP5075691B2 (ja) * 2008-03-14 2012-11-21 株式会社ダイセル 光及び／又は熱硬化性共重合体、硬化性樹脂組成物及び硬化物
JP5316034B2 (ja) * 2008-04-07 2013-10-16 三菱化学株式会社 カラーフィルタ用着色組成物、カラーフィルタ、及び液晶表示装置
KR20090126991A (ko) 2008-06-05 2009-12-09 삼성전자주식회사 색필터 및 색필터를 가지는 표시 장치
JP2010015062A (ja) * 2008-07-04 2010-01-21 Fujifilm Corp 着色感光性樹脂組成物、カラーフィルタ、及びカラーフィルタの製造方法
JP5393087B2 (ja) * 2008-09-22 2014-01-22 東京応化工業株式会社 ガラスエッチング用感光性樹脂組成物及び被加工ガラス基板の製造方法
JP5671936B2 (ja) * 2010-10-21 2015-02-18 東レ株式会社 ネガ型感光性樹脂組成物およびそれを用いた硬化膜
CN102331596B (zh) * 2011-10-09 2013-12-04 华映视讯（吴江）有限公司 彩色树脂组合物与形成多色彩色滤光片的方法
JP6166526B2 (ja) * 2011-12-09 2017-07-19 株式会社日本触媒 硬化性樹脂組成物及びその用途
JP5545313B2 (ja) * 2012-03-29 2014-07-09 住友化学株式会社 着色硬化性組成物
JP5888065B2 (ja) * 2012-03-30 2016-03-16 東洋インキＳｃホールディングス株式会社 カラーフィルタ用着色組成物およびカラーフィルタ
KR101840061B1 (ko) 2012-09-10 2018-03-19 동우 화인켐 주식회사 알칼리 가용성 고분자 화합물 및 이의 제조방법
JP6063200B2 (ja) * 2012-10-15 2017-01-18 旭化成株式会社 感光性樹脂組成物
KR102138381B1 (ko) * 2012-11-02 2020-07-27 닛테츠 케미컬 앤드 머티리얼 가부시키가이샤 터치 패널용 차광성 조성물 및 터치 패널
KR20210102494A (ko) * 2014-05-21 2021-08-19 아사히 가세이 가부시키가이샤 감광성 수지 조성물 및 회로 패턴의 형성 방법
JP2017039857A (ja) * 2015-08-20 2017-02-23 昭和電工株式会社 光反応性透明粘着シート用組成物、光反応性透明粘着シート、タッチパネル、画像表示装置
JP7119390B2 (ja) * 2017-03-02 2022-08-17 東レ株式会社 ネガ型感光性樹脂組成物およびそれを用いた硬化膜
KR102371945B1 (ko) * 2017-11-03 2022-03-08 동우 화인켐 주식회사 착색 감광성 수지 조성물, 컬러필터 및 화상표시장치
KR102355812B1 (ko) * 2017-12-05 2022-01-26 동우 화인켐 주식회사 착색 감광성 수지 조성물, 컬러필터 및 화상표시장치
KR102363119B1 (ko) * 2018-03-15 2022-02-14 동우 화인켐 주식회사 착색 감광성 수지 조성물, 컬러 필터 및 이를 구비한 화상 표시 장치

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002293837A (ja) * 2001-03-30 2002-10-09 Dainippon Printing Co Ltd 硬化性樹脂及びその製造方法
JP2002296775A (ja) 2001-03-30 2002-10-09 Dainippon Printing Co Ltd 感光性樹脂組成物、カラーフィルター、及び、液晶パネル
JP4463467B2 (ja) * 2002-05-24 2010-05-19 日油株式会社 カラーフィルターの保護膜、ｒｇｂ用画素、ブラックマトリックス又はスペーサーを形成するための光硬化性樹脂組成物及びカラーフィルター
JP4534697B2 (ja) * 2003-10-27 2010-09-01 住友化学株式会社 着色感光性樹脂組成物
JP4720318B2 (ja) * 2004-06-28 2011-07-13 住友化学株式会社 着色感光性樹脂組成物

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI386436B (zh) * 2007-12-26 2013-02-21 Asahi Kasei Emd Corp A heat-resistant resin precursor, and a photosensitive resin composition using the same
US8765332B2 (en) 2008-03-28 2014-07-01 Fujifilm Corporation Green curable composition, color filter and method of producing same

Also Published As

Publication number Publication date
CN1991584A (zh) 2007-07-04
KR20070070072A (ko) 2007-07-03
JP2007199685A (ja) 2007-08-09
KR101357547B1 (ko) 2014-01-29
CN1991584B (zh) 2012-01-04

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