WO2009063955A1 - スペーサー形成用感放射線性樹脂組成物、スペーサー、スペーサーの形成方法、及び液晶表示素子 - Google Patents

スペーサー形成用感放射線性樹脂組成物、スペーサー、スペーサーの形成方法、及び液晶表示素子 Download PDF

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Publication number
WO2009063955A1
WO2009063955A1 PCT/JP2008/070715 JP2008070715W WO2009063955A1 WO 2009063955 A1 WO2009063955 A1 WO 2009063955A1 JP 2008070715 W JP2008070715 W JP 2008070715W WO 2009063955 A1 WO2009063955 A1 WO 2009063955A1
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spacer
radiation
resin composition
sensitive resin
forming
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PCT/JP2008/070715
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English (en)
French (fr)
Inventor
Hideyuki Nakamura
Kyohei Mochizuki
Kenta Yamazaki
Yuuichi Fukushige
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Fujifilm Corporation
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Priority to JP2009541176A priority Critical patent/JP5178737B2/ja
Priority to CN200880115544.5A priority patent/CN101855597B/zh
Publication of WO2009063955A1 publication Critical patent/WO2009063955A1/ja

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/12—Polymers provided for in subclasses C08C or C08F
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2202/00—Materials and properties
    • G02F2202/02—Materials and properties organic material
    • G02F2202/022—Materials and properties organic material polymeric
    • G02F2202/023—Materials and properties organic material polymeric curable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Organic Chemistry (AREA)
  • Nonlinear Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

　高感度で、かつ、保存性に優れたスペーサー用感放射線性樹脂組成物、それを用いて形成したスペーサー、該スペーサーの形成方法、該スペーサーを備えた液晶表示素子を提供する。スペーサー形成用感放射線性樹脂組成物は、（Ａ）分岐構造および／または脂環構造と、酸性基と、エステル基を介してエチレン性不飽和基とを側鎖に有する樹脂、（Ｂ）重合性不飽和化合物、並びに（Ｃ）（Ｃ１）ヘキサアリールビイミダゾール化合物、（Ｃ２）芳香族メルカプト化合物、及び（Ｃ３）助剤を含有する。
PCT/JP2008/070715 2007-11-16 2008-11-13 スペーサー形成用感放射線性樹脂組成物、スペーサー、スペーサーの形成方法、及び液晶表示素子 WO2009063955A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2009541176A JP5178737B2 (ja) 2007-11-16 2008-11-13 スペーサー形成用感放射線性樹脂組成物、スペーサー、スペーサーの形成方法、及び液晶表示素子
CN200880115544.5A CN101855597B (zh) 2007-11-16 2008-11-13 间隔物形成用感放射线性树脂组合物、间隔物、间隔物的形成方法及液晶显示元件

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007-298177 2007-11-16
JP2007298177 2007-11-16
JP2008-113856 2008-04-24
JP2008113856 2008-04-24

Publications (1)

Publication Number Publication Date
WO2009063955A1 true WO2009063955A1 (ja) 2009-05-22

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ID=40638803

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PCT/JP2008/070715 WO2009063955A1 (ja) 2007-11-16 2008-11-13 スペーサー形成用感放射線性樹脂組成物、スペーサー、スペーサーの形成方法、及び液晶表示素子

Country Status (4)

Country Link
JP (1) JP5178737B2 (ja)
CN (1) CN101855597B (ja)
TW (1) TWI432894B (ja)
WO (1) WO2009063955A1 (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011006558A (ja) * 2009-06-24 2011-01-13 Showa Denko Kk 水系媒体に分散した光硬化性樹脂組成物
JP2013117716A (ja) * 2011-10-31 2013-06-13 Hitachi Chemical Co Ltd 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
JP2014081456A (ja) * 2012-10-16 2014-05-08 Sanyo Chem Ind Ltd 感光性樹脂組成物、硬化物およびスペーサー
JP2017049587A (ja) * 2015-09-03 2017-03-09 東友ファインケム株式会社Dongwoo Fine−Chem Co., Ltd. ネガ型感光性樹脂組成物及びそれから形成される光硬化性パターン及び当該光硬化性パターンを備える画像表示装置
US11043643B2 (en) 2015-11-18 2021-06-22 Altana Ag Crosslinkable polymeric materials for dielectric layers in electronic devices

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20130047656A (ko) * 2011-10-31 2013-05-08 히타치가세이가부시끼가이샤 감광성 수지 조성물, 감광성 엘리먼트, 레지스트 패턴의 형성 방법 및 인쇄 배선판의 제조 방법
JPWO2021112062A1 (ja) * 2019-12-02 2021-06-10

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006016545A (ja) * 2004-07-02 2006-01-19 Mitsubishi Chemicals Corp 着色樹脂組成物、カラーフィルタ及び液晶表示装置
JP2006276847A (ja) * 2005-03-02 2006-10-12 Jsr Corp 感放射線性樹脂組成物および液晶表示素子用スペーサー
JP2007148366A (ja) * 2005-10-25 2007-06-14 Hitachi Chem Co Ltd 液晶スペーサー及びその製造方法
JP2007199685A (ja) * 2005-12-28 2007-08-09 Fujifilm Electronic Materials Co Ltd 光硬化性着色組成物及びカラーフィルタ、並びに液晶表示装置
JP2007206217A (ja) * 2006-01-31 2007-08-16 Fujifilm Corp 平版印刷版の作製方法および平版印刷版原版

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101299380B1 (ko) * 2005-03-02 2013-08-22 제이에스알 가부시끼가이샤 감방사선성 수지 조성물 및 액정 표시 소자용 스페이서

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006016545A (ja) * 2004-07-02 2006-01-19 Mitsubishi Chemicals Corp 着色樹脂組成物、カラーフィルタ及び液晶表示装置
JP2006276847A (ja) * 2005-03-02 2006-10-12 Jsr Corp 感放射線性樹脂組成物および液晶表示素子用スペーサー
JP2007148366A (ja) * 2005-10-25 2007-06-14 Hitachi Chem Co Ltd 液晶スペーサー及びその製造方法
JP2007199685A (ja) * 2005-12-28 2007-08-09 Fujifilm Electronic Materials Co Ltd 光硬化性着色組成物及びカラーフィルタ、並びに液晶表示装置
JP2007206217A (ja) * 2006-01-31 2007-08-16 Fujifilm Corp 平版印刷版の作製方法および平版印刷版原版

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011006558A (ja) * 2009-06-24 2011-01-13 Showa Denko Kk 水系媒体に分散した光硬化性樹脂組成物
JP2013117716A (ja) * 2011-10-31 2013-06-13 Hitachi Chemical Co Ltd 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
JP2014081456A (ja) * 2012-10-16 2014-05-08 Sanyo Chem Ind Ltd 感光性樹脂組成物、硬化物およびスペーサー
JP2017049587A (ja) * 2015-09-03 2017-03-09 東友ファインケム株式会社Dongwoo Fine−Chem Co., Ltd. ネガ型感光性樹脂組成物及びそれから形成される光硬化性パターン及び当該光硬化性パターンを備える画像表示装置
US11043643B2 (en) 2015-11-18 2021-06-22 Altana Ag Crosslinkable polymeric materials for dielectric layers in electronic devices

Also Published As

Publication number Publication date
TWI432894B (zh) 2014-04-01
CN101855597B (zh) 2012-12-12
TW200931177A (en) 2009-07-16
JP5178737B2 (ja) 2013-04-10
JPWO2009063955A1 (ja) 2011-03-31
CN101855597A (zh) 2010-10-06

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