WO2012044027A3 - Photosensitive resin composition - Google Patents

Photosensitive resin composition Download PDF

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Publication number
WO2012044027A3
WO2012044027A3 PCT/KR2011/007074 KR2011007074W WO2012044027A3 WO 2012044027 A3 WO2012044027 A3 WO 2012044027A3 KR 2011007074 W KR2011007074 W KR 2011007074W WO 2012044027 A3 WO2012044027 A3 WO 2012044027A3
Authority
WO
WIPO (PCT)
Prior art keywords
resin composition
photosensitive resin
minimizing
zinc
serve
Prior art date
Application number
PCT/KR2011/007074
Other languages
French (fr)
Other versions
WO2012044027A2 (en
Inventor
Jae Gook Han
Original Assignee
Kolon Industries, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kolon Industries, Inc. filed Critical Kolon Industries, Inc.
Publication of WO2012044027A2 publication Critical patent/WO2012044027A2/en
Publication of WO2012044027A3 publication Critical patent/WO2012044027A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Liquid Crystal (AREA)

Abstract

Provided is a photosensitive resin composition which is useful to form a cured film that can serve as a light blocking film formed on a lower substrate, which does not cause a driving error of a liquid crystal display by minimizing the content of predetermined metal (copper or zinc) while showing an appropriate optical density and a supporting spacer for maintaining a cell gap.
PCT/KR2011/007074 2010-09-30 2011-09-27 Photosensitive resin composition WO2012044027A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020100095633A KR20120033893A (en) 2010-09-30 2010-09-30 Photopolymerizable resin composition
KR10-2010-0095633 2010-09-30

Publications (2)

Publication Number Publication Date
WO2012044027A2 WO2012044027A2 (en) 2012-04-05
WO2012044027A3 true WO2012044027A3 (en) 2012-05-31

Family

ID=45893625

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2011/007074 WO2012044027A2 (en) 2010-09-30 2011-09-27 Photosensitive resin composition

Country Status (3)

Country Link
KR (1) KR20120033893A (en)
TW (1) TW201214046A (en)
WO (1) WO2012044027A2 (en)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6185742B2 (en) * 2013-04-19 2017-08-23 デクセリアルズ株式会社 Anisotropic conductive film, connection method, and joined body
KR102218948B1 (en) 2014-09-23 2021-02-23 동우 화인켐 주식회사 Black photosensitive resin composition, and black matrix and column spacer for liquid crystal display manufactured thereby
KR102332736B1 (en) 2015-02-02 2021-12-01 동우 화인켐 주식회사 Color photosensitive resin composition, column spacer manufactured thereby and liquid crystal display comprising the same
KR20160094668A (en) 2015-02-02 2016-08-10 동우 화인켐 주식회사 Color photosensitive resin composition, column spacer manufactured thereby and liquid crystal display comprising the same
KR102361595B1 (en) 2015-03-11 2022-02-11 동우 화인켐 주식회사 Black photosensitive resin composition, and black matrix and column spacer for liquid crystal display manufactured thereby
KR102243177B1 (en) 2015-03-26 2021-04-22 동우 화인켐 주식회사 Black photo sensitive resin composition, a color filter comprising a black metrics and/or a column spacer prepared by using the composition, and a liquid crystal display comprising the color filter
KR20160115148A (en) 2015-03-26 2016-10-06 동우 화인켐 주식회사 Black photo sensitive resin composition, a color filter comprising a black metrics and/or a column spacer prepared by using the composition, and a liquid crystal display comprising the color filter
KR101886911B1 (en) 2015-03-26 2018-08-08 동우 화인켐 주식회사 Black photo sensitive resin composition, a color filter comprising a black metrics and/or a column spacer prepared by using the composition, and a liquid crystal display comprising the color filter
KR101897858B1 (en) 2015-03-26 2018-09-12 동우 화인켐 주식회사 Black photo sensitive resin composition, a color filter comprising a black metrics and/or a column spacer prepared by using the composition, and a liquid crystal display comprising the color filter
KR20160115151A (en) 2015-03-26 2016-10-06 동우 화인켐 주식회사 Black photo sensitive resin composition, a color filter comprising a black metrics and/or a column spacer prepared by using the composition, and a liquid crystal display comprising the color filter
KR102222742B1 (en) 2015-03-26 2021-03-04 동우 화인켐 주식회사 Black photo sensitive resin composition, a color filter comprising a black metrics and/or a column spacer prepared by using the composition, and a liquid crystal display comprising the color filter
KR102363457B1 (en) 2015-12-29 2022-02-15 동우 화인켐 주식회사 Colored Photosensitive Resin Composition and Column Spacer Comprising the Same
KR102529781B1 (en) 2016-11-25 2023-05-08 동우 화인켐 주식회사 Black photosensitive resin composition, black matrix, column sapcer and column spacer combined with black matrix for image display device produced using the same
KR20180085231A (en) 2017-01-18 2018-07-26 동우 화인켐 주식회사 Black photosensitive resin composition, black matrix, column sapcer and column spacer combined with black matrix for image display device produced using the same
KR101970325B1 (en) 2017-01-20 2019-08-13 동우 화인켐 주식회사 Black photosensitive resin composition, black matrix, column sapcer and column spacer combined with black matrix for image display device produced using the same
KR101886992B1 (en) * 2017-01-20 2018-08-10 동우 화인켐 주식회사 A photo sensitive resin composition, a color filter comprising a black metrics, a column spacer or black column spacer prepared by using the composition, and a display devide comprising the color filter
CN106883812B (en) * 2017-02-25 2020-07-03 上海昀通电子科技有限公司 Light-cured adhesive composition for screen edge sealing and application thereof
KR101883596B1 (en) 2017-03-16 2018-07-30 동우 화인켐 주식회사 Black photo sensitive resin composition, a color filter comprising a column spacer, a black metrics or a black column spacer prepared by using the composition, and a display device comprising the color filter
KR102210938B1 (en) * 2017-11-28 2021-02-01 주식회사 엘지화학 A composition for shielding a waveguide edge with excellent adhesion
KR102528890B1 (en) 2018-10-11 2023-05-04 동우 화인켐 주식회사 A black photo sensitive resin composition, a color filter comprising a black metrics and/or a column spacer prepared by using the composition, and a display comprising the color filter
KR102079264B1 (en) 2018-12-20 2020-02-19 동우 화인켐 주식회사 Colored photosensitive resin composition, color filter comprising black matrix and/or column spacer produced using the same, and image display device including color filter
KR102081881B1 (en) 2018-12-20 2020-02-26 동우 화인켐 주식회사 Colored photosensitive resin composition, color filter comprising black matrix and/or column spacer produced using the same, and image display device including color filter
KR102079266B1 (en) 2018-12-20 2020-02-19 동우 화인켐 주식회사 Colored photosensitive resin composition, color filter comprising black matrix and/or column spacer produced using the same, and image display device including color filter
KR102202344B1 (en) 2019-01-04 2021-01-13 동우 화인켐 주식회사 Black photosensitive resin composition, black matrix, column sapcer and column spacer combined with black matrix for image display device produced using the same
KR102542250B1 (en) 2019-03-28 2023-06-12 동우 화인켐 주식회사 Colored photosensitive resin composition, color filter comprising black matrix and/or column spacer produced using the same, and image display device including color filter
TW202132390A (en) * 2019-12-17 2021-09-01 南韓商Ｌｇ化學股份有限公司 Compound for binder resin, binder resin, negative-type photosensitive resin composition, black bank and display apparatus
KR102664597B1 (en) 2020-01-22 2024-05-10 동우 화인켐 주식회사 Black photosensitive resin composition, cured film and black matrix produced using the same
KR20210102646A (en) 2020-02-12 2021-08-20 동우 화인켐 주식회사 Black photosensitive resin composition, cured film and black matrix produced using the same

Citations (4)

* Cited by examiner, † Cited by third party
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JP2002285007A (en) * 2001-03-27 2002-10-03 Dainippon Printing Co Ltd Black resin composition, black coat, black matrix substrate, and manufacturing method of black resin composition
KR20060076412A (en) * 2004-12-29 2006-07-04 제일모직주식회사 Photosensitive resin composition and black matrix thereof
KR20060121954A (en) * 2004-08-09 2006-11-29 미쓰비시 가가꾸 가부시키가이샤 Photosensitive resin composition, color filter and liquid crystal display device
JP2008009401A (en) * 2006-06-01 2008-01-17 Nippon Steel Chem Co Ltd Resist composition for color filter, method for producing the same, and color filter using the same

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002285007A (en) * 2001-03-27 2002-10-03 Dainippon Printing Co Ltd Black resin composition, black coat, black matrix substrate, and manufacturing method of black resin composition
KR20060121954A (en) * 2004-08-09 2006-11-29 미쓰비시 가가꾸 가부시키가이샤 Photosensitive resin composition, color filter and liquid crystal display device
KR20060076412A (en) * 2004-12-29 2006-07-04 제일모직주식회사 Photosensitive resin composition and black matrix thereof
JP2008009401A (en) * 2006-06-01 2008-01-17 Nippon Steel Chem Co Ltd Resist composition for color filter, method for producing the same, and color filter using the same

Also Published As

Publication number Publication date
TW201214046A (en) 2012-04-01
KR20120033893A (en) 2012-04-09
WO2012044027A2 (en) 2012-04-05

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