WO2009063955A1 - Composition de résine sensible au rayonnement adaptée pour former une entretoise, entretoise, procédé de formation d'entretoise et dispositif d'affichage à cristaux liquides - Google Patents

Composition de résine sensible au rayonnement adaptée pour former une entretoise, entretoise, procédé de formation d'entretoise et dispositif d'affichage à cristaux liquides Download PDF

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Publication number
WO2009063955A1
WO2009063955A1 PCT/JP2008/070715 JP2008070715W WO2009063955A1 WO 2009063955 A1 WO2009063955 A1 WO 2009063955A1 JP 2008070715 W JP2008070715 W JP 2008070715W WO 2009063955 A1 WO2009063955 A1 WO 2009063955A1
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WO
WIPO (PCT)
Prior art keywords
spacer
radiation
resin composition
sensitive resin
forming
Prior art date
Application number
PCT/JP2008/070715
Other languages
English (en)
Japanese (ja)
Inventor
Hideyuki Nakamura
Kyohei Mochizuki
Kenta Yamazaki
Yuuichi Fukushige
Original Assignee
Fujifilm Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corporation filed Critical Fujifilm Corporation
Priority to JP2009541176A priority Critical patent/JP5178737B2/ja
Priority to CN200880115544.5A priority patent/CN101855597B/zh
Publication of WO2009063955A1 publication Critical patent/WO2009063955A1/fr

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/12—Polymers provided for in subclasses C08C or C08F
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2202/00—Materials and properties
    • G02F2202/02—Materials and properties organic material
    • G02F2202/022—Materials and properties organic material polymeric
    • G02F2202/023—Materials and properties organic material polymeric curable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Organic Chemistry (AREA)
  • Nonlinear Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

La présente invention a pour objet une composition de résine sensible au rayonnement destinée à des entretoises, qui présente une grande sensibilité et une excellente stabilité au stockage. La présente invention a également pour objet une entretoise formée en utilisant une telle composition de résine sensible au rayonnement, un procédé de formation de cette entretoise et un dispositif d'affichage à cristaux liquides comprenant une telle entretoise. Plus précisément, l'invention concerne une composition de résine sensible au rayonnement adaptée pour former des entretoises, qui contient (A) une résine ayant dans une chaîne latérale une structure ramifiée et/ou une structure alicyclique, un groupe acide et un groupe éthyléniquement insaturé lié à la chaîne principale par un groupe ester, (B) un composé insaturé polymérisable, et (C) un composé hexaarylbiimidazole (C1), un composé mercapto aromatique (C2) et un adjuvant (C3).
PCT/JP2008/070715 2007-11-16 2008-11-13 Composition de résine sensible au rayonnement adaptée pour former une entretoise, entretoise, procédé de formation d'entretoise et dispositif d'affichage à cristaux liquides WO2009063955A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2009541176A JP5178737B2 (ja) 2007-11-16 2008-11-13 スペーサー形成用感放射線性樹脂組成物、スペーサー、スペーサーの形成方法、及び液晶表示素子
CN200880115544.5A CN101855597B (zh) 2007-11-16 2008-11-13 间隔物形成用感放射线性树脂组合物、间隔物、间隔物的形成方法及液晶显示元件

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007-298177 2007-11-16
JP2007298177 2007-11-16
JP2008-113856 2008-04-24
JP2008113856 2008-04-24

Publications (1)

Publication Number Publication Date
WO2009063955A1 true WO2009063955A1 (fr) 2009-05-22

Family

ID=40638803

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/070715 WO2009063955A1 (fr) 2007-11-16 2008-11-13 Composition de résine sensible au rayonnement adaptée pour former une entretoise, entretoise, procédé de formation d'entretoise et dispositif d'affichage à cristaux liquides

Country Status (4)

Country Link
JP (1) JP5178737B2 (fr)
CN (1) CN101855597B (fr)
TW (1) TWI432894B (fr)
WO (1) WO2009063955A1 (fr)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011006558A (ja) * 2009-06-24 2011-01-13 Showa Denko Kk 水系媒体に分散した光硬化性樹脂組成物
JP2013117716A (ja) * 2011-10-31 2013-06-13 Hitachi Chemical Co Ltd 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
JP2014081456A (ja) * 2012-10-16 2014-05-08 Sanyo Chem Ind Ltd 感光性樹脂組成物、硬化物およびスペーサー
JP2017049587A (ja) * 2015-09-03 2017-03-09 東友ファインケム株式会社Dongwoo Fine−Chem Co., Ltd. ネガ型感光性樹脂組成物及びそれから形成される光硬化性パターン及び当該光硬化性パターンを備える画像表示装置
US11043643B2 (en) 2015-11-18 2021-06-22 Altana Ag Crosslinkable polymeric materials for dielectric layers in electronic devices

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20130047656A (ko) * 2011-10-31 2013-05-08 히타치가세이가부시끼가이샤 감광성 수지 조성물, 감광성 엘리먼트, 레지스트 패턴의 형성 방법 및 인쇄 배선판의 제조 방법
EP4071182A1 (fr) * 2019-12-02 2022-10-12 ENEOS Corporation Composé acrylate alicyclique, composé époxyacrylate alicyclique, composition durcissable et article durci

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006016545A (ja) * 2004-07-02 2006-01-19 Mitsubishi Chemicals Corp 着色樹脂組成物、カラーフィルタ及び液晶表示装置
JP2006276847A (ja) * 2005-03-02 2006-10-12 Jsr Corp 感放射線性樹脂組成物および液晶表示素子用スペーサー
JP2007148366A (ja) * 2005-10-25 2007-06-14 Hitachi Chem Co Ltd 液晶スペーサー及びその製造方法
JP2007199685A (ja) * 2005-12-28 2007-08-09 Fujifilm Electronic Materials Co Ltd 光硬化性着色組成物及びカラーフィルタ、並びに液晶表示装置
JP2007206217A (ja) * 2006-01-31 2007-08-16 Fujifilm Corp 平版印刷版の作製方法および平版印刷版原版

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101299380B1 (ko) * 2005-03-02 2013-08-22 제이에스알 가부시끼가이샤 감방사선성 수지 조성물 및 액정 표시 소자용 스페이서

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006016545A (ja) * 2004-07-02 2006-01-19 Mitsubishi Chemicals Corp 着色樹脂組成物、カラーフィルタ及び液晶表示装置
JP2006276847A (ja) * 2005-03-02 2006-10-12 Jsr Corp 感放射線性樹脂組成物および液晶表示素子用スペーサー
JP2007148366A (ja) * 2005-10-25 2007-06-14 Hitachi Chem Co Ltd 液晶スペーサー及びその製造方法
JP2007199685A (ja) * 2005-12-28 2007-08-09 Fujifilm Electronic Materials Co Ltd 光硬化性着色組成物及びカラーフィルタ、並びに液晶表示装置
JP2007206217A (ja) * 2006-01-31 2007-08-16 Fujifilm Corp 平版印刷版の作製方法および平版印刷版原版

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011006558A (ja) * 2009-06-24 2011-01-13 Showa Denko Kk 水系媒体に分散した光硬化性樹脂組成物
JP2013117716A (ja) * 2011-10-31 2013-06-13 Hitachi Chemical Co Ltd 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
JP2014081456A (ja) * 2012-10-16 2014-05-08 Sanyo Chem Ind Ltd 感光性樹脂組成物、硬化物およびスペーサー
JP2017049587A (ja) * 2015-09-03 2017-03-09 東友ファインケム株式会社Dongwoo Fine−Chem Co., Ltd. ネガ型感光性樹脂組成物及びそれから形成される光硬化性パターン及び当該光硬化性パターンを備える画像表示装置
US11043643B2 (en) 2015-11-18 2021-06-22 Altana Ag Crosslinkable polymeric materials for dielectric layers in electronic devices

Also Published As

Publication number Publication date
TWI432894B (zh) 2014-04-01
CN101855597B (zh) 2012-12-12
TW200931177A (en) 2009-07-16
CN101855597A (zh) 2010-10-06
JP5178737B2 (ja) 2013-04-10
JPWO2009063955A1 (ja) 2011-03-31

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