WO2009022644A1 - ネガ型感光性樹脂組成物、スペーサー及び液晶表示装置 - Google Patents
ネガ型感光性樹脂組成物、スペーサー及び液晶表示装置 Download PDFInfo
- Publication number
- WO2009022644A1 WO2009022644A1 PCT/JP2008/064294 JP2008064294W WO2009022644A1 WO 2009022644 A1 WO2009022644 A1 WO 2009022644A1 JP 2008064294 W JP2008064294 W JP 2008064294W WO 2009022644 A1 WO2009022644 A1 WO 2009022644A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- resin composition
- photosensitive resin
- negative photosensitive
- spacer
- liquid crystal
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials For Photolithography (AREA)
- Liquid Crystal (AREA)
- Polymerisation Methods In General (AREA)
Abstract
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009528111A JPWO2009022644A1 (ja) | 2007-08-10 | 2008-08-08 | ネガ型感光性樹脂組成物、スペーサー及び液晶表示装置 |
CN200880017670A CN101689022A (zh) | 2007-08-10 | 2008-08-08 | 负型感光性树脂组合物、间隔体及液晶显示装置 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007-209443 | 2007-08-10 | ||
JP2007209443 | 2007-08-10 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2009022644A1 true WO2009022644A1 (ja) | 2009-02-19 |
Family
ID=40350697
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/064294 WO2009022644A1 (ja) | 2007-08-10 | 2008-08-08 | ネガ型感光性樹脂組成物、スペーサー及び液晶表示装置 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPWO2009022644A1 (ja) |
KR (1) | KR20100039275A (ja) |
CN (1) | CN101689022A (ja) |
TW (1) | TW200919086A (ja) |
WO (1) | WO2009022644A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010134444A (ja) * | 2008-10-30 | 2010-06-17 | Sumitomo Chemical Co Ltd | 感光性樹脂組成物 |
JP2010237465A (ja) * | 2009-03-31 | 2010-10-21 | Tokyo Ohka Kogyo Co Ltd | 感光性樹脂組成物及び液晶パネル |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20160111805A (ko) * | 2015-03-17 | 2016-09-27 | 동우 화인켐 주식회사 | 감광성 수지 조성물, 이로부터 형성된 광경화 패턴 및 이를 포함하는 화상 표시 장치 |
KR101931449B1 (ko) * | 2017-11-09 | 2018-12-20 | 동우 화인켐 주식회사 | 착색 감광성 수지 조성물, 이를 이용하여 제조되는 컬러필터 및 상기 컬러필터를 포함하는 표시장치 |
CN111670121B (zh) * | 2018-01-31 | 2022-05-13 | 富士胶片株式会社 | 平版印刷版原版及平版印刷版的制作方法 |
KR102177312B1 (ko) * | 2019-12-31 | 2020-11-11 | 코오롱인더스트리 주식회사 | 감광성 수지 조성물 및 이를 이용한 드라이 필름 포토레지스트, 감광성 엘리먼트, 회로기판, 및 디스플레이 장치 |
CN114761874A (zh) * | 2019-12-31 | 2022-07-15 | 可隆工业株式会社 | 光敏树脂层和使用该光敏树脂层的干膜光致抗蚀剂、光敏元件 |
KR102253140B1 (ko) * | 2020-07-30 | 2021-05-14 | 코오롱인더스트리 주식회사 | 감광성 수지층, 및 이를 이용한 드라이 필름 포토레지스트, 감광성 엘리먼트, 회로기판, 및 디스플레이 장치 |
KR102253141B1 (ko) * | 2020-07-30 | 2021-05-14 | 코오롱인더스트리 주식회사 | 감광성 수지층, 및 이를 이용한 드라이 필름 포토레지스트, 감광성 엘리먼트, 회로기판, 및 디스플레이 장치 |
KR102250827B1 (ko) * | 2020-07-30 | 2021-05-10 | 코오롱인더스트리 주식회사 | 감광성 수지층, 및 이를 이용한 드라이 필름 포토레지스트, 감광성 엘리먼트, 회로기판, 및 디스플레이 장치 |
KR102177311B1 (ko) * | 2019-12-31 | 2020-11-11 | 코오롱인더스트리 주식회사 | 감광성 수지 조성물 및 이를 이용한 드라이 필름 포토레지스트, 감광성 엘리먼트, 회로기판, 및 디스플레이 장치 |
KR102253142B1 (ko) * | 2020-07-30 | 2021-05-14 | 코오롱인더스트리 주식회사 | 감광성 수지층, 및 이를 이용한 드라이 필름 포토레지스트, 감광성 엘리먼트, 회로기판, 및 디스플레이 장치 |
KR102177313B1 (ko) * | 2019-12-31 | 2020-11-16 | 코오롱인더스트리 주식회사 | 감광성 수지 조성물 및 이를 이용한 드라이 필름 포토레지스트, 감광성 엘리먼트, 회로기판, 및 디스플레이 장치 |
KR102177310B1 (ko) * | 2019-12-31 | 2020-11-10 | 코오롱인더스트리 주식회사 | 감광성 수지 조성물 및 이를 이용한 드라이 필름 포토레지스트, 감광성 엘리먼트, 회로기판, 및 디스플레이 장치 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06100663A (ja) * | 1992-09-22 | 1994-04-12 | Chisso Corp | 紫外線硬化性樹脂組成物及びそれを用いたカラーフィルター保護膜 |
JPH07134411A (ja) * | 1993-11-10 | 1995-05-23 | Japan Synthetic Rubber Co Ltd | 感光性樹脂組成物 |
JP2006079064A (ja) * | 2004-08-09 | 2006-03-23 | Mitsubishi Chemicals Corp | 感光性樹脂組成物、カラーフィルタ及び液晶表示装置 |
JP2007199532A (ja) * | 2006-01-27 | 2007-08-09 | Fujifilm Corp | パターン形成方法 |
-
2008
- 2008-08-04 TW TW97129493A patent/TW200919086A/zh unknown
- 2008-08-08 CN CN200880017670A patent/CN101689022A/zh active Pending
- 2008-08-08 WO PCT/JP2008/064294 patent/WO2009022644A1/ja active Application Filing
- 2008-08-08 JP JP2009528111A patent/JPWO2009022644A1/ja not_active Withdrawn
- 2008-08-08 KR KR1020097025516A patent/KR20100039275A/ko not_active Application Discontinuation
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06100663A (ja) * | 1992-09-22 | 1994-04-12 | Chisso Corp | 紫外線硬化性樹脂組成物及びそれを用いたカラーフィルター保護膜 |
JPH07134411A (ja) * | 1993-11-10 | 1995-05-23 | Japan Synthetic Rubber Co Ltd | 感光性樹脂組成物 |
JP2006079064A (ja) * | 2004-08-09 | 2006-03-23 | Mitsubishi Chemicals Corp | 感光性樹脂組成物、カラーフィルタ及び液晶表示装置 |
JP2007199532A (ja) * | 2006-01-27 | 2007-08-09 | Fujifilm Corp | パターン形成方法 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010134444A (ja) * | 2008-10-30 | 2010-06-17 | Sumitomo Chemical Co Ltd | 感光性樹脂組成物 |
JP2010237465A (ja) * | 2009-03-31 | 2010-10-21 | Tokyo Ohka Kogyo Co Ltd | 感光性樹脂組成物及び液晶パネル |
Also Published As
Publication number | Publication date |
---|---|
CN101689022A (zh) | 2010-03-31 |
TW200919086A (en) | 2009-05-01 |
KR20100039275A (ko) | 2010-04-15 |
JPWO2009022644A1 (ja) | 2010-11-18 |
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