TW200712023A - Glass composition for low temperature sintering, glass frit, dielectric composition and multilayer ceramic capacitor using the same - Google Patents

Glass composition for low temperature sintering, glass frit, dielectric composition and multilayer ceramic capacitor using the same

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Publication number
TW200712023A
TW200712023A TW095127252A TW95127252A TW200712023A TW 200712023 A TW200712023 A TW 200712023A TW 095127252 A TW095127252 A TW 095127252A TW 95127252 A TW95127252 A TW 95127252A TW 200712023 A TW200712023 A TW 200712023A
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TW
Taiwan
Prior art keywords
composition
glass
low temperature
same
multilayer ceramic
Prior art date
Application number
TW095127252A
Other languages
English (en)
Other versions
TWI333938B (en
Inventor
Sung-Bum Sohn
Kang-Heon Hur
Eun-Sang Na
Tae-Ho Song
Han-Seong Jung
Chan Kong Kim
Original Assignee
Samsung Electro Mech
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electro Mech filed Critical Samsung Electro Mech
Publication of TW200712023A publication Critical patent/TW200712023A/zh
Application granted granted Critical
Publication of TWI333938B publication Critical patent/TWI333938B/zh

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/002Details
    • H01G4/018Dielectrics
    • H01G4/06Solid dielectrics
    • H01G4/08Inorganic dielectrics
    • H01G4/12Ceramic dielectrics
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/02Frit compositions, i.e. in a powdered or comminuted form
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    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/46Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates
    • C04B35/462Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates based on titanates
    • C04B35/465Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates based on titanates based on alkaline earth metal titanates
    • C04B35/468Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates based on titanates based on alkaline earth metal titanates based on barium titanates
    • C04B35/4682Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates based on titanates based on alkaline earth metal titanates based on barium titanates based on BaTiO3 perovskite phase
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    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/622Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/626Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
    • C04B35/63Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B using additives specially adapted for forming the products, e.g.. binder binders
    • C04B35/638Removal thereof
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    • H01G4/06Solid dielectrics
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    • H01G4/12Ceramic dielectrics
    • H01G4/1209Ceramic dielectrics characterised by the ceramic dielectric material
    • H01G4/1218Ceramic dielectrics characterised by the ceramic dielectric material based on titanium oxides or titanates
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    • H01G4/002Details
    • H01G4/018Dielectrics
    • H01G4/06Solid dielectrics
    • H01G4/08Inorganic dielectrics
    • H01G4/12Ceramic dielectrics
    • H01G4/129Ceramic dielectrics containing a glassy phase, e.g. glass ceramic
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    • C04B2235/54Particle size related information
    • C04B2235/5418Particle size related information expressed by the size of the particles or aggregates thereof
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    • C04B2235/658Atmosphere during thermal treatment
    • C04B2235/6583Oxygen containing atmosphere, e.g. with changing oxygen pressures
    • C04B2235/6584Oxygen containing atmosphere, e.g. with changing oxygen pressures at an oxygen percentage below that of air
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
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    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/29Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982Particulate matter [e.g., sphere, flake, etc.]
TW095127252A 2005-07-29 2006-07-26 Glass composition for low temperature sintering, glass frit, dielectric composition and multilayer ceramic capacitor using the same TWI333938B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020050069342A KR100632001B1 (ko) 2005-07-29 2005-07-29 저온 소결용 유리 조성물, 유리 프릿, 유전체 조성물 및이를 이용한 적층 세라믹 콘덴서

Publications (2)

Publication Number Publication Date
TW200712023A true TW200712023A (en) 2007-04-01
TWI333938B TWI333938B (en) 2010-12-01

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Family Applications (1)

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TW095127252A TWI333938B (en) 2005-07-29 2006-07-26 Glass composition for low temperature sintering, glass frit, dielectric composition and multilayer ceramic capacitor using the same

Country Status (5)

Country Link
US (3) US7605104B2 (zh)
JP (1) JP4794385B2 (zh)
KR (1) KR100632001B1 (zh)
CN (1) CN1903764B (zh)
TW (1) TWI333938B (zh)

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US8896725B2 (en) 2007-06-21 2014-11-25 Fotonation Limited Image capture device with contemporaneous reference image capture mechanism
JP2006265003A (ja) * 2005-03-22 2006-10-05 Nippon Chem Ind Co Ltd 誘電体セラミック形成用組成物および誘電体セラミック材料
JP5067541B2 (ja) * 2007-03-30 2012-11-07 Tdk株式会社 誘電体磁器組成物、複合電子部品および積層セラミックコンデンサ
KR100993010B1 (ko) * 2008-06-26 2010-11-09 한국과학기술연구원 저온소성용 저유전율 유전체 세라믹 조성물
KR100983046B1 (ko) * 2008-12-29 2010-09-17 삼성전기주식회사 소결조제용 붕규산염계 유리 조성물, 유전체 조성물 및 이를 이용한 적층 세라믹 커패시터
CN101585709B (zh) * 2009-06-18 2012-02-29 华中科技大学 一种钛酸锶钡半导体陶瓷的制备方法
TW201107267A (en) * 2009-08-21 2011-03-01 Darfon Electronics Corp Ceramic powder composition, ceramic material and laminated ceramic capacitor made of the same
KR101079464B1 (ko) * 2009-12-22 2011-11-03 삼성전기주식회사 적층 세라믹 커패시터
JP6202775B2 (ja) * 2010-08-11 2017-09-27 日本電気硝子株式会社 Li2O−Al2O3−SiO2系結晶化ガラス
KR101730184B1 (ko) 2010-11-08 2017-05-12 삼성전기주식회사 도전성 페이스트 조성물 및 이를 이용한 적층 세라믹 콘덴서의 제조방법
KR101483819B1 (ko) * 2011-01-18 2015-01-16 삼성전기주식회사 글라스 분말 및 이의 제조방법
KR101525643B1 (ko) * 2011-05-20 2015-06-03 삼성전기주식회사 적층형 세라믹 전자부품
US8618640B2 (en) 2011-07-29 2013-12-31 Taiwan Semiconductor Manufacturing Company, Ltd. Method of shielding through silicon vias in a passive interposer
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US7851393B2 (en) 2010-12-14
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