TW200710597A - Pattern generating method - Google Patents

Pattern generating method

Info

Publication number
TW200710597A
TW200710597A TW095125970A TW95125970A TW200710597A TW 200710597 A TW200710597 A TW 200710597A TW 095125970 A TW095125970 A TW 095125970A TW 95125970 A TW95125970 A TW 95125970A TW 200710597 A TW200710597 A TW 200710597A
Authority
TW
Taiwan
Prior art keywords
pattern
pitch
shake
project
generating method
Prior art date
Application number
TW095125970A
Other languages
English (en)
Chinese (zh)
Inventor
Masanobu Takashima
Katsuto Sumi
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of TW200710597A publication Critical patent/TW200710597A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Materials For Photolithography (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
TW095125970A 2005-07-19 2006-07-17 Pattern generating method TW200710597A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005209235A JP2007025394A (ja) 2005-07-19 2005-07-19 パターン形成方法

Publications (1)

Publication Number Publication Date
TW200710597A true TW200710597A (en) 2007-03-16

Family

ID=37668630

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095125970A TW200710597A (en) 2005-07-19 2006-07-17 Pattern generating method

Country Status (5)

Country Link
JP (1) JP2007025394A (ja)
KR (1) KR20080037612A (ja)
CN (1) CN101228480A (ja)
TW (1) TW200710597A (ja)
WO (1) WO2007010748A1 (ja)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010109220A (ja) * 2008-10-31 2010-05-13 Nikon Corp マスクレス露光装置およびマスクレス露光方法
KR100989863B1 (ko) 2008-11-25 2010-10-29 주식회사 이오테크닉스 디지털 3차원 리소그래피 방법
JP5935462B2 (ja) 2011-05-10 2016-06-15 日立化成株式会社 感光性エレメント、レジストパターンの形成方法、プリント配線板の製造方法
CN102890429B (zh) * 2012-09-18 2015-02-11 天津芯硕精密机械有限公司 光刻系统中倾斜扫描显示下提高数据传输速度的方法
CN102890426B (zh) * 2012-09-18 2014-05-14 天津芯硕精密机械有限公司 一种直写式光刻系统中倾斜扫描显示方法
JP6608236B2 (ja) * 2015-10-09 2019-11-20 東レエンジニアリング株式会社 マーキング装置
CN109478018B (zh) * 2015-12-17 2020-11-24 株式会社尼康 图案描绘装置
US9791786B1 (en) * 2016-04-08 2017-10-17 Applied Materials, Inc. Method to reduce line waviness
JP7121509B2 (ja) * 2018-03-19 2022-08-18 キヤノン株式会社 露光装置、露光方法、および物品製造方法

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Publication number Priority date Publication date Assignee Title
DE69729659T2 (de) * 1996-02-28 2005-06-23 Johnson, Kenneth C., Santa Clara Mikrolinsen-rastereinrichtung für mikrolithografie und für konfokale mikroskopie mit grossem aufnahmefeld
JPH10147007A (ja) * 1996-11-19 1998-06-02 Asahi Optical Co Ltd マルチビーム記録装置
JPH11147326A (ja) * 1997-11-17 1999-06-02 Dainippon Screen Mfg Co Ltd 画像記録装置
JPH11320968A (ja) * 1998-05-13 1999-11-24 Ricoh Microelectronics Co Ltd 光像形成方法及びその装置、画像形成装置並びにリソグラフィ用露光装置
JP3910317B2 (ja) * 1999-09-08 2007-04-25 富士フイルム株式会社 画像記録方法および装置
JP4330762B2 (ja) * 2000-04-21 2009-09-16 富士フイルム株式会社 マルチビーム露光装置
US6493867B1 (en) * 2000-08-08 2002-12-10 Ball Semiconductor, Inc. Digital photolithography system for making smooth diagonal components
JP2002169113A (ja) * 2000-12-01 2002-06-14 Fuji Photo Film Co Ltd マルチビーム露光ヘッドおよびマルチビーム露光装置
JP3907179B2 (ja) * 2001-03-19 2007-04-18 富士フイルム株式会社 ポジ型レジスト組成物
JP2002351086A (ja) * 2001-03-22 2002-12-04 Fuji Photo Film Co Ltd 露光装置
JP3808327B2 (ja) * 2001-06-13 2006-08-09 大日本スクリーン製造株式会社 画像記録装置
JP4320694B2 (ja) * 2001-08-08 2009-08-26 株式会社オーク製作所 多重露光描画装置および多重露光式描画方法
US7302111B2 (en) * 2001-09-12 2007-11-27 Micronic Laser Systems A.B. Graphics engine for high precision lithography
JP2006502558A (ja) * 2001-11-07 2006-01-19 アプライド　マテリアルズ　インコーポレイテッド 光学式スポット格子アレイ印刷装置
JP3938714B2 (ja) * 2002-05-16 2007-06-27 大日本スクリーン製造株式会社 露光装置
JP2004009595A (ja) * 2002-06-07 2004-01-15 Fuji Photo Film Co Ltd 露光ヘッド及び露光装置
JP2004184921A (ja) * 2002-12-06 2004-07-02 Fuji Photo Film Co Ltd 露光装置
JP2004258294A (ja) * 2003-02-26 2004-09-16 Mitsubishi Paper Mills Ltd パターン形成方法及びレジストパターン形成方法
JP2004303951A (ja) * 2003-03-31 2004-10-28 Nikon Corp 露光装置及び露光方法
JP4390189B2 (ja) * 2003-04-10 2009-12-24 大日本スクリーン製造株式会社 パターン描画装置
JP4344162B2 (ja) * 2003-04-11 2009-10-14 財団法人国際科学振興財団 パターン描画装置及びパターン描画方法
JP2004330536A (ja) * 2003-05-06 2004-11-25 Fuji Photo Film Co Ltd 露光ヘッド
JP2005010468A (ja) * 2003-06-19 2005-01-13 Dainippon Screen Mfg Co Ltd パターン描画装置およびパターン描画方法
JP2005055881A (ja) * 2003-07-22 2005-03-03 Fuji Photo Film Co Ltd 描画方法および描画装置
JP4647355B2 (ja) * 2004-03-29 2011-03-09 富士フイルム株式会社 マルチビーム露光方法及び装置
JP2006085074A (ja) * 2004-09-17 2006-03-30 Fuji Photo Film Co Ltd 画像形成装置
JP4638826B2 (ja) * 2005-02-04 2011-02-23 富士フイルム株式会社 描画装置及び描画方法

Also Published As

Publication number Publication date
CN101228480A (zh) 2008-07-23
KR20080037612A (ko) 2008-04-30
JP2007025394A (ja) 2007-02-01
WO2007010748A1 (ja) 2007-01-25

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