TW200709426A - Liquid crystal display device capable of reducing leakage current, and fabrication method thereof - Google Patents

Liquid crystal display device capable of reducing leakage current, and fabrication method thereof

Info

Publication number
TW200709426A
TW200709426A TW095123466A TW95123466A TW200709426A TW 200709426 A TW200709426 A TW 200709426A TW 095123466 A TW095123466 A TW 095123466A TW 95123466 A TW95123466 A TW 95123466A TW 200709426 A TW200709426 A TW 200709426A
Authority
TW
Taiwan
Prior art keywords
electrodes
liquid crystal
display device
crystal display
gate
Prior art date
Application number
TW095123466A
Other languages
English (en)
Other versions
TWI337406B (en
Inventor
Byoung-Ho Lim
Original Assignee
Lg Philips Lcd Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lg Philips Lcd Co Ltd filed Critical Lg Philips Lcd Co Ltd
Publication of TW200709426A publication Critical patent/TW200709426A/zh
Application granted granted Critical
Publication of TWI337406B publication Critical patent/TWI337406B/zh

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/124Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40Electrodes ; Multistep manufacturing processes therefor
    • H01L29/41Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
    • H01L29/423Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
    • H01L29/42312Gate electrodes for field effect devices
    • H01L29/42316Gate electrodes for field effect devices for field-effect transistors
    • H01L29/4232Gate electrodes for field effect devices for field-effect transistors with insulated gate
    • H01L29/42384Gate electrodes for field effect devices for field-effect transistors with insulated gate for thin film field effect transistors, e.g. characterised by the thickness or the shape of the insulator or the dimensions, the shape or the lay-out of the conductor
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136209Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Nonlinear Science (AREA)
  • Liquid Crystal (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Thin Film Transistor (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
TW095123466A 2005-06-27 2006-06-27 Liquid crystal display device capable of reducing leakage current, and fabrication method thereof TWI337406B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020050055963A KR101152528B1 (ko) 2005-06-27 2005-06-27 누설전류를 줄일 수 있는 액정표시소자 및 그 제조방법

Publications (2)

Publication Number Publication Date
TW200709426A true TW200709426A (en) 2007-03-01
TWI337406B TWI337406B (en) 2011-02-11

Family

ID=37513766

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095123466A TWI337406B (en) 2005-06-27 2006-06-27 Liquid crystal display device capable of reducing leakage current, and fabrication method thereof

Country Status (6)

Country Link
US (1) US8134155B2 (zh)
JP (1) JP4473235B2 (zh)
KR (1) KR101152528B1 (zh)
CN (1) CN100454122C (zh)
DE (1) DE102006028320B4 (zh)
TW (1) TWI337406B (zh)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100428039C (zh) * 2005-11-23 2008-10-22 北京京东方光电科技有限公司 一种tft lcd像素结构
CN101416320B (zh) * 2006-01-31 2011-08-31 出光兴产株式会社 Tft基板及反射型tft基板以及其制造方法
KR101330399B1 (ko) * 2007-02-02 2013-11-15 엘지디스플레이 주식회사 액정 표시 장치용 박막 트랜지스터 소자 및 그의 제조 방법
US9176353B2 (en) 2007-06-29 2015-11-03 Semiconductor Energy Laboratory Co., Ltd. Liquid crystal display device
US7738050B2 (en) * 2007-07-06 2010-06-15 Semiconductor Energy Laboratory Co., Ltd Liquid crystal display device
US7897971B2 (en) * 2007-07-26 2011-03-01 Semiconductor Energy Laboratory Co., Ltd. Display device
US8786793B2 (en) * 2007-07-27 2014-07-22 Semiconductor Energy Laboratory Co., Ltd. Display device and manufacturing method thereof
JP2009105390A (ja) * 2007-10-05 2009-05-14 Semiconductor Energy Lab Co Ltd 半導体装置およびその作製方法
JP5377940B2 (ja) * 2007-12-03 2013-12-25 株式会社半導体エネルギー研究所 半導体装置
JP5615605B2 (ja) * 2010-07-05 2014-10-29 三菱電機株式会社 Ffsモード液晶装置
JP2012053372A (ja) * 2010-09-03 2012-03-15 Hitachi Displays Ltd 液晶表示装置
KR101789236B1 (ko) 2010-12-24 2017-10-24 삼성디스플레이 주식회사 박막 트랜지스터 및 평판 표시 장치
CN103187423B (zh) 2013-02-04 2016-03-23 合肥京东方光电科技有限公司 一种氧化物薄膜晶体管阵列基板及其制作方法、显示面板
CN203983289U (zh) * 2014-06-17 2014-12-03 京东方科技集团股份有限公司 薄膜晶体管、阵列基板及显示装置
CN104752345B (zh) * 2015-04-27 2018-01-30 深圳市华星光电技术有限公司 薄膜晶体管阵列基板及其制作方法
CN105870197A (zh) * 2016-04-21 2016-08-17 京东方科技集团股份有限公司 薄膜晶体管及制备方法、阵列基板、显示装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3002099B2 (ja) 1994-10-13 2000-01-24 株式会社フロンテック 薄膜トランジスタおよびそれを用いた液晶表示装置
JP3716580B2 (ja) * 1997-02-27 2005-11-16 セイコーエプソン株式会社 液晶装置及びその製造方法、並びに投写型表示装置
JPH1140814A (ja) * 1997-07-18 1999-02-12 Furontetsuku:Kk 薄膜トランジスタ基板と液晶表示装置および薄膜トランジスタ基板の製造方法
JP4100655B2 (ja) * 1999-12-21 2008-06-11 エルジー.フィリップス エルシーデー カンパニー,リミテッド 薄膜トランジスタの製造方法
JP4211250B2 (ja) 2000-10-12 2009-01-21 セイコーエプソン株式会社 トランジスタ及びそれを備える表示装置
KR100743101B1 (ko) * 2001-05-07 2007-07-27 엘지.필립스 엘시디 주식회사 액정표시장치 및 그 제조방법과 이를 이용한 화소리페어방법
JP4604440B2 (ja) * 2002-02-22 2011-01-05 日本電気株式会社 チャネルエッチ型薄膜トランジスタ
JP4551049B2 (ja) * 2002-03-19 2010-09-22 三菱電機株式会社 表示装置
JP2004342923A (ja) * 2003-05-16 2004-12-02 Seiko Epson Corp 液晶装置、アクティブマトリクス基板、表示装置、及び電子機器

Also Published As

Publication number Publication date
KR101152528B1 (ko) 2012-06-01
JP2007011351A (ja) 2007-01-18
KR20070000546A (ko) 2007-01-03
US8134155B2 (en) 2012-03-13
DE102006028320A1 (de) 2006-12-28
CN1892386A (zh) 2007-01-10
CN100454122C (zh) 2009-01-21
JP4473235B2 (ja) 2010-06-02
US20060289867A1 (en) 2006-12-28
DE102006028320B4 (de) 2014-05-22
TWI337406B (en) 2011-02-11

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