TW200603214A - Substrate for thin film solar cell, manufacturing method therefor, and thin film solar cell using the same - Google Patents
Substrate for thin film solar cell, manufacturing method therefor, and thin film solar cell using the sameInfo
- Publication number
- TW200603214A TW200603214A TW094108803A TW94108803A TW200603214A TW 200603214 A TW200603214 A TW 200603214A TW 094108803 A TW094108803 A TW 094108803A TW 94108803 A TW94108803 A TW 94108803A TW 200603214 A TW200603214 A TW 200603214A
- Authority
- TW
- Taiwan
- Prior art keywords
- thin film
- solar cell
- film solar
- substrate
- irregularity
- Prior art date
Links
- 239000010409 thin film Substances 0.000 title abstract 9
- 239000000758 substrate Substances 0.000 title abstract 8
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 230000003287 optical effect Effects 0.000 abstract 2
- 238000002834 transmittance Methods 0.000 abstract 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 abstract 1
- 230000000694 effects Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
- H01L31/0392—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate
- H01L31/03921—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate including only elements of Group IV of the Periodic Table
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022466—Electrodes made of transparent conductive layers, e.g. TCO, ITO layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022466—Electrodes made of transparent conductive layers, e.g. TCO, ITO layers
- H01L31/022483—Electrodes made of transparent conductive layers, e.g. TCO, ITO layers composed of zinc oxide [ZnO]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0236—Special surface textures
- H01L31/02363—Special surface textures of the semiconductor body itself, e.g. textured active layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0236—Special surface textures
- H01L31/02366—Special surface textures of the substrate or of a layer on the substrate, e.g. textured ITO/glass substrate or superstrate, textured polymer layer on glass substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1884—Manufacture of transparent electrodes, e.g. TCO, ITO
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Photovoltaic Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004089817 | 2004-03-25 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200603214A true TW200603214A (en) | 2006-01-16 |
Family
ID=35056488
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094108803A TW200603214A (en) | 2004-03-25 | 2005-03-22 | Substrate for thin film solar cell, manufacturing method therefor, and thin film solar cell using the same |
Country Status (5)
Country | Link |
---|---|
US (1) | US7781668B2 (zh) |
EP (1) | EP1732139B1 (zh) |
JP (1) | JP5600660B2 (zh) |
TW (1) | TW200603214A (zh) |
WO (1) | WO2005093854A1 (zh) |
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CN102037566A (zh) * | 2008-05-23 | 2011-04-27 | 株式会社钟化 | 薄膜光电转换装置用基板和包括它的薄膜光电转换装置、以及薄膜光电转换装置用基板的制造方法 |
CN103392235A (zh) * | 2010-12-27 | 2013-11-13 | 艾思科集团有限公司 | 用于制作包括tco层的光伏装置的改进方法 |
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JP2008066437A (ja) * | 2006-09-06 | 2008-03-21 | Mitsubishi Heavy Ind Ltd | 太陽電池パネルの製造方法 |
EP2084752B1 (en) * | 2006-11-20 | 2016-08-17 | Kaneka Corporation | Method for manufacturing a substrate provided with a transparent conductive film for thin film solar cells |
JP5291633B2 (ja) * | 2007-11-30 | 2013-09-18 | 株式会社カネカ | シリコン系薄膜光電変換装置およびその製造方法 |
KR101460580B1 (ko) * | 2008-02-20 | 2014-11-12 | 주성엔지니어링(주) | 박막형 태양전지 및 그 제조방법 |
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US20090242020A1 (en) * | 2008-04-01 | 2009-10-01 | Seung-Yeop Myong | Thin-film photovoltaic cell, thin-film photovoltaic module and method of manufacturing thin-film photovoltaic cell |
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US8207012B2 (en) * | 2008-04-28 | 2012-06-26 | Solopower, Inc. | Method and apparatus for achieving low resistance contact to a metal based thin film solar cell |
US20090266398A1 (en) * | 2008-04-28 | 2009-10-29 | Burak Metin | Method and Apparatus to Form Back Contacts to Flexible CIGS Solar Cells |
WO2010022530A1 (en) * | 2008-09-01 | 2010-03-04 | Oerlikon Solar Ip Ag, Trübbach | Method for manufacturing transparent conductive oxide (tco) films; properties and applications of such films |
JP5180781B2 (ja) * | 2008-11-05 | 2013-04-10 | 三菱重工業株式会社 | 光電変換装置の製造方法および光電変換装置 |
JP2010114190A (ja) * | 2008-11-05 | 2010-05-20 | Mitsubishi Heavy Ind Ltd | 光電変換装置の製造方法および光電変換装置 |
WO2010072862A1 (es) * | 2008-12-22 | 2010-07-01 | Universidad De Barcelona | Células solares de película delgada con texturas combinadas |
US9059422B2 (en) | 2009-02-03 | 2015-06-16 | Kaneka Corporation | Substrate with transparent conductive film and thin film photoelectric conversion device |
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GB0915376D0 (en) | 2009-09-03 | 2009-10-07 | Isis Innovation | Transparent conducting oxides |
US20100288335A1 (en) * | 2009-10-02 | 2010-11-18 | Sunlight Photonics Inc. | Degradation-resistant photovoltaic devices |
WO2011061950A1 (ja) * | 2009-11-17 | 2011-05-26 | 三菱電機株式会社 | 薄膜太陽電池およびその製造方法 |
US20110120555A1 (en) * | 2009-11-23 | 2011-05-26 | Nicholas Francis Borrelli | Photovoltaic devices and light scattering superstrates |
US9224892B2 (en) | 2009-12-21 | 2015-12-29 | Ppg Industries Ohio, Inc. | Silicon thin film solar cell having improved haze and methods of making the same |
FR2957342B1 (fr) * | 2010-03-12 | 2014-11-21 | Saint Gobain | Substrat transparent verrier associe a une couche electroconductrice transparente a proprietes electriques ameliorees |
US20110259413A1 (en) * | 2010-04-21 | 2011-10-27 | Stion Corporation | Hazy Zinc Oxide Film for Shaped CIGS/CIS Solar Cells |
WO2011159675A1 (en) * | 2010-06-14 | 2011-12-22 | State Of Oregon Acting By And Through The State Board Of Higher Education On Behalf Of Oregon State | Process to form aqueous precursor and aluminum oxide film |
WO2011160031A2 (en) * | 2010-06-18 | 2011-12-22 | University Of Florida Research Foundation, Inc. | Thin film photovoltaic devices with microlens arrays |
DE102010030301A1 (de) * | 2010-06-21 | 2011-12-22 | Solayer Gmbh | Substrat mit oberflächlich strukturierter Flächenelektrode |
DE102010024521A1 (de) * | 2010-06-21 | 2011-12-22 | Innovent E.V. | Verfahren zur Erhöhung der Transluzenz eines Substrats |
FR2961952B1 (fr) * | 2010-06-23 | 2013-03-29 | Commissariat Energie Atomique | Substrat comprenant une couche d'oxyde transparent conducteur et son procede de fabrication |
JP5719846B2 (ja) | 2010-07-28 | 2015-05-20 | 株式会社カネカ | 薄膜太陽電池用透明電極、それを用いた薄膜太陽電池用透明電極付き基板および薄膜太陽電池、ならびに薄膜太陽電池用透明電極の製造方法 |
JP5533448B2 (ja) * | 2010-08-30 | 2014-06-25 | 住友金属鉱山株式会社 | 透明導電膜積層体及びその製造方法、並びに薄膜太陽電池及びその製造方法 |
JP2012064723A (ja) * | 2010-09-15 | 2012-03-29 | Mitsubishi Heavy Ind Ltd | 光電変換装置の製造方法 |
TWI418043B (zh) * | 2011-04-14 | 2013-12-01 | Nexpower Technology Corp | 薄膜太陽能電池 |
WO2013002394A1 (ja) * | 2011-06-30 | 2013-01-03 | 株式会社カネカ | 薄膜太陽電池およびその製造方法 |
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US9748423B2 (en) * | 2014-01-16 | 2017-08-29 | Fundacio Institut De Ciencies Fotoniques | Photovoltaic device with fiber array for sun tracking |
DE102014217165A1 (de) * | 2014-08-28 | 2016-03-03 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Halbleiterstruktur, Verfahren zu deren Herstellung und deren Verwendung |
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WO2019069643A1 (ja) * | 2017-10-04 | 2019-04-11 | 株式会社カネカ | 太陽電池の製造方法、太陽電池および太陽電池モジュール |
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Family Cites Families (15)
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JP3222945B2 (ja) | 1992-09-11 | 2001-10-29 | 三洋電機株式会社 | 光起電力装置の製造方法 |
JPH07263727A (ja) * | 1994-03-23 | 1995-10-13 | Fuji Electric Co Ltd | 光電変換素子の製造方法 |
JPH11135817A (ja) | 1997-10-27 | 1999-05-21 | Sharp Corp | 光電変換素子およびその製造方法 |
JPH11274536A (ja) * | 1998-03-26 | 1999-10-08 | Mitsubishi Chemical Corp | 太陽電池用基板 |
AUPP699798A0 (en) | 1998-11-06 | 1998-12-03 | Pacific Solar Pty Limited | Thin films with light trapping |
WO2000029603A2 (en) * | 1998-11-18 | 2000-05-25 | Neose Technologies, Inc. | Low cost manufacture of oligosaccharides |
JP2000183376A (ja) | 1998-12-17 | 2000-06-30 | Nisshin Steel Co Ltd | 太陽電池用絶縁基板及びその製造方法 |
JP2000252501A (ja) | 1999-02-26 | 2000-09-14 | Kanegafuchi Chem Ind Co Ltd | シリコン系薄膜光電変換装置の製造方法 |
JP2001015787A (ja) | 1999-04-27 | 2001-01-19 | Asahi Glass Co Ltd | 透明導電膜付き基体、その製造方法および太陽電池 |
JP2001257369A (ja) | 2000-03-10 | 2001-09-21 | Sharp Corp | 光電変換素子及びその製造方法 |
JP4193962B2 (ja) * | 2000-10-31 | 2008-12-10 | 独立行政法人産業技術総合研究所 | 太陽電池用基板および薄膜太陽電池 |
US20030116185A1 (en) * | 2001-11-05 | 2003-06-26 | Oswald Robert S. | Sealed thin film photovoltaic modules |
JP3706835B2 (ja) | 2002-02-19 | 2005-10-19 | 株式会社カネカ | 薄膜光電変換装置 |
JP2003253435A (ja) * | 2002-02-28 | 2003-09-10 | Mitsubishi Heavy Ind Ltd | 凹凸膜形成方法および光電変換素子製造方法 |
GB0208506D0 (en) * | 2002-04-12 | 2002-05-22 | Dupont Teijin Films Us Ltd | Film coating |
-
2005
- 2005-03-15 WO PCT/JP2005/004543 patent/WO2005093854A1/ja not_active Application Discontinuation
- 2005-03-15 US US10/588,708 patent/US7781668B2/en not_active Expired - Fee Related
- 2005-03-15 EP EP05726741.1A patent/EP1732139B1/en not_active Expired - Fee Related
- 2005-03-22 TW TW094108803A patent/TW200603214A/zh unknown
-
2011
- 2011-11-11 JP JP2011247626A patent/JP5600660B2/ja not_active Expired - Fee Related
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102037566A (zh) * | 2008-05-23 | 2011-04-27 | 株式会社钟化 | 薄膜光电转换装置用基板和包括它的薄膜光电转换装置、以及薄膜光电转换装置用基板的制造方法 |
US8658885B2 (en) | 2008-05-23 | 2014-02-25 | Kaneka Corporation | Substrate for thin-film photoelectric conversion device, thin film photoelectric conversion device including the same, and method for producing substrate for thin-film photoelectric conversion device |
CN102037566B (zh) * | 2008-05-23 | 2014-10-22 | 株式会社钟化 | 薄膜光电转换装置用基板和包括它的薄膜光电转换装置、以及薄膜光电转换装置用基板的制造方法 |
CN103392235A (zh) * | 2010-12-27 | 2013-11-13 | 艾思科集团有限公司 | 用于制作包括tco层的光伏装置的改进方法 |
Also Published As
Publication number | Publication date |
---|---|
US7781668B2 (en) | 2010-08-24 |
US20070169805A1 (en) | 2007-07-26 |
JP5600660B2 (ja) | 2014-10-01 |
JP2012028827A (ja) | 2012-02-09 |
EP1732139A4 (en) | 2015-10-21 |
EP1732139B1 (en) | 2018-12-12 |
WO2005093854A1 (ja) | 2005-10-06 |
EP1732139A1 (en) | 2006-12-13 |
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