TW200538754A - Method for producing a multilayer body - Google Patents

Method for producing a multilayer body Download PDF

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Publication number
TW200538754A
TW200538754A TW094108473A TW94108473A TW200538754A TW 200538754 A TW200538754 A TW 200538754A TW 094108473 A TW094108473 A TW 094108473A TW 94108473 A TW94108473 A TW 94108473A TW 200538754 A TW200538754 A TW 200538754A
Authority
TW
Taiwan
Prior art keywords
layer
refractive index
metal oxide
oxide particles
item
Prior art date
Application number
TW094108473A
Other languages
English (en)
Chinese (zh)
Inventor
Hiroomi Shimomura
Mitsunobu Doimoto
Yasunobu Suzuki
Tetsuya Yamamura
Yuichi Eriyama
Takayoshi Tanabe
Hideaki Takase
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of TW200538754A publication Critical patent/TW200538754A/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D127/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers
    • C09D127/02—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment
    • C09D127/12—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/18—Layered products comprising a layer of synthetic resin characterised by the use of special additives
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L27/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
    • C08L27/02—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
    • C08L27/12—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20—Oxides; Hydroxides
    • C08K3/22—Oxides; Hydroxides of metals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Laminated Bodies (AREA)
TW094108473A 2004-03-18 2005-03-18 Method for producing a multilayer body TW200538754A (en)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2004077447 2004-03-18
JP2004082193 2004-03-22
JP2004130071 2004-04-26
JP2004332243 2004-11-16
JP2004332242 2004-11-16
JP2005022606 2005-01-31

Publications (1)

Publication Number Publication Date
TW200538754A true TW200538754A (en) 2005-12-01

Family

ID=34993663

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094108473A TW200538754A (en) 2004-03-18 2005-03-18 Method for producing a multilayer body

Country Status (4)

Country Link
JP (1) JP4715746B2 (ja)
KR (1) KR20070003944A (ja)
TW (1) TW200538754A (ja)
WO (1) WO2005090473A1 (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9490230B2 (en) 2009-10-27 2016-11-08 Invensas Corporation Selective die electrical insulation by additive process
US9508689B2 (en) 2008-05-20 2016-11-29 Invensas Corporation Electrical connector between die pad and z-interconnect for stacked die assemblies
US9824999B2 (en) 2007-09-10 2017-11-21 Invensas Corporation Semiconductor die mount by conformal die coating
TWI631879B (zh) * 2010-12-22 2018-08-01 三菱化學股份有限公司 含有金屬氧化物微粒子的膜、轉印薄膜及其製造方法以及積層體及其製造方法

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006161021A (ja) * 2004-11-15 2006-06-22 Jsr Corp 液状硬化性樹脂組成物、硬化膜及び積層体
JP4839703B2 (ja) * 2004-11-15 2011-12-21 Ｊｓｒ株式会社 積層体の製造方法
JP5075333B2 (ja) * 2005-11-11 2012-11-21 富士フイルム株式会社 光学フィルム、偏光板、及び画像表示装置
JP2007272184A (ja) * 2006-03-06 2007-10-18 Seiko Epson Corp 反射防止層形成用組成物、反射防止層形成方法および製品
KR101350372B1 (ko) * 2006-03-28 2014-01-13 다이니폰 인사츠 가부시키가이샤 광학 적층체
WO2009035874A1 (en) * 2007-09-07 2009-03-19 3M Innovative Properties Company Self-assembling antireflective coating comprising surface modified high refractive index nanoparticles
KR20100069950A (ko) * 2008-12-17 2010-06-25 에스에스씨피 주식회사 태양전지용 전극, 그 제조방법 및 태양전지
JP6269429B2 (ja) * 2013-10-24 2018-01-31 信越化学工業株式会社 光硬化性塗料、積層体及び自動車ヘッドランプ被覆用シート

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4078704B2 (ja) * 1998-02-12 2008-04-23 Ｊｓｒ株式会社 反射防止膜
JP4271839B2 (ja) * 1999-09-28 2009-06-03 富士フイルム株式会社 反射防止膜、偏光板、及びそれを用いた画像表示装置
JP4419267B2 (ja) * 2000-04-11 2010-02-24 Ｊｓｒ株式会社 高屈折率膜用硬化性組成物、高屈折率膜、および反射防止用積層体
JP4318414B2 (ja) * 2001-09-14 2009-08-26 ナノエニックス，インコーポレイティッド 気相重合法による伝導性高分子の合成方法及びその製造物
JP2004317734A (ja) * 2003-04-15 2004-11-11 Fuji Photo Film Co Ltd 反射防止膜、その製造方法、反射防止フィルムおよび画像表示装置
KR100896123B1 (ko) * 2004-03-18 2009-05-07 제이에스알 가부시끼가이샤 액상 경화성 수지 조성물, 경화막 및 적층체
KR100896124B1 (ko) * 2004-03-18 2009-05-07 제이에스알 가부시끼가이샤 액상 경화성 수지 조성물 및 그것을 이용한 적층체의 제조방법
WO2005090472A1 (ja) * 2004-03-22 2005-09-29 Jsr Corporation 液状硬化性樹脂組成物及びそれを用いた積層体の製造方法
WO2006051634A1 (ja) * 2004-11-15 2006-05-18 Jsr Corporation 液状硬化性樹脂組成物及びそれを用いた積層体の製造方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9824999B2 (en) 2007-09-10 2017-11-21 Invensas Corporation Semiconductor die mount by conformal die coating
US9508689B2 (en) 2008-05-20 2016-11-29 Invensas Corporation Electrical connector between die pad and z-interconnect for stacked die assemblies
US9490230B2 (en) 2009-10-27 2016-11-08 Invensas Corporation Selective die electrical insulation by additive process
TWI631879B (zh) * 2010-12-22 2018-08-01 三菱化學股份有限公司 含有金屬氧化物微粒子的膜、轉印薄膜及其製造方法以及積層體及其製造方法

Also Published As

Publication number Publication date
WO2005090473A1 (ja) 2005-09-29
KR20070003944A (ko) 2007-01-05
JP4715746B2 (ja) 2011-07-06
JPWO2005090473A1 (ja) 2008-01-31

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