TW200521624A - Negative blue-violet laser photosensitive composition, image forming material, image former and method of image formation - Google Patents

Negative blue-violet laser photosensitive composition, image forming material, image former and method of image formation Download PDF

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Publication number
TW200521624A
TW200521624A TW93128914A TW93128914A TW200521624A TW 200521624 A TW200521624 A TW 200521624A TW 93128914 A TW93128914 A TW 93128914A TW 93128914 A TW93128914 A TW 93128914A TW 200521624 A TW200521624 A TW 200521624A
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TW
Taiwan
Prior art keywords
ring
photosensitive composition
violet laser
blue
group
Prior art date
Application number
TW93128914A
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English (en)
Chinese (zh)
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TWI354864B (enrdf_load_stackoverflow
Inventor
Junji Mizukami
Yasuhiro Kameyama
Eriko Toshimitsu
Yuji Mizuho
Original Assignee
Mitsubishi Chem Corp
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Publication date
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Publication of TW200521624A publication Critical patent/TW200521624A/zh
Application granted granted Critical
Publication of TWI354864B publication Critical patent/TWI354864B/zh

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
TW93128914A 2003-09-25 2004-09-23 Negative blue-violet laser photosensitive composition, image forming material, image former and method of image formation TW200521624A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003332626 2003-09-25
JP2003344636 2003-10-02

Publications (2)

Publication Number Publication Date
TW200521624A true TW200521624A (en) 2005-07-01
TWI354864B TWI354864B (enrdf_load_stackoverflow) 2011-12-21

Family

ID=34395582

Family Applications (2)

Application Number Title Priority Date Filing Date
TW93128914A TW200521624A (en) 2003-09-25 2004-09-23 Negative blue-violet laser photosensitive composition, image forming material, image former and method of image formation
TW96146583A TW200821754A (en) 2003-09-25 2004-09-23 Negative blue-violet laser photosensitive composition, image forming material, image former and method of image formation

Family Applications After (1)

Application Number Title Priority Date Filing Date
TW96146583A TW200821754A (en) 2003-09-25 2004-09-23 Negative blue-violet laser photosensitive composition, image forming material, image former and method of image formation

Country Status (3)

Country Link
KR (2) KR100998459B1 (enrdf_load_stackoverflow)
TW (2) TW200521624A (enrdf_load_stackoverflow)
WO (1) WO2005031463A1 (enrdf_load_stackoverflow)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080118867A1 (en) * 2004-05-12 2008-05-22 Morimasa Sato Pattern Forming Material, Pattern Forming Apparatus, And Pattern Forming Process
JP2006308983A (ja) * 2005-04-28 2006-11-09 Fuji Photo Film Co Ltd パターン形成方法
JP5013831B2 (ja) * 2006-06-23 2012-08-29 富士フイルム株式会社 カラーフィルタ用硬化性組成物、カラーフィルタ、及びその製造方法
KR101398503B1 (ko) * 2006-06-23 2014-05-27 후지필름 가부시키가이샤 화합물, 감광성 조성물, 경화성 조성물, 컬러 필터용 경화성 조성물, 컬러 필터, 및 그 제조 방법
CN105425544A (zh) 2008-04-28 2016-03-23 日立化成工业株式会社 感光性树脂组合物、感光性元件、抗蚀图形的形成方法及印刷电路板的制造方法
JP4756112B2 (ja) * 2009-04-30 2011-08-24 日立化成工業株式会社 感光性樹脂組成物、これを用いた感光性エレメント、レジストパターンの形成方法、及びプリント配線板の製造方法
TWI491982B (zh) * 2009-10-28 2015-07-11 Sumitomo Chemical Co Coloring the photosensitive resin composition
CN105001081B (zh) * 2015-06-24 2017-03-01 常州强力电子新材料股份有限公司 一种蒽系增感剂及其在uv‑led光固化体系中的应用
CN112835268B (zh) * 2020-12-30 2022-12-30 烟台魔技纳米科技有限公司 一种生物基水溶性负性光刻胶及其在飞秒激光直写加工方法中的应用

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0990619A (ja) * 1995-09-20 1997-04-04 Brother Ind Ltd 光硬化型組成物及び感光性カプセル
JP4685259B2 (ja) * 2000-04-19 2011-05-18 コダック株式会社 感光性平版印刷版及び印刷版の製版方法
JP3832248B2 (ja) * 2001-01-26 2006-10-11 三菱化学株式会社 光重合性組成物及びカラーフィルター
JP2002287380A (ja) * 2001-03-26 2002-10-03 Mitsubishi Chemicals Corp 画像形成方法
JP4221467B2 (ja) * 2001-04-20 2009-02-12 デュポン エムアールシー ドライフィルム株式会社 レジスト用光重合性樹脂組成物
JP2003140358A (ja) * 2001-11-01 2003-05-14 Fuji Photo Film Co Ltd 感光性平版印刷版の製版方法
JP2003221517A (ja) * 2002-01-30 2003-08-08 Fuji Photo Film Co Ltd 増感色素の製造方法及びそれを用いた感光性組成物
KR20050047088A (ko) * 2002-08-07 2005-05-19 미쓰비시 가가꾸 가부시키가이샤 청자색 레이저 감광성 레지스트재층을 갖는 화상 형성재및 그 레지스트 화상 형성 방법

Also Published As

Publication number Publication date
KR20070119098A (ko) 2007-12-18
TWI354864B (enrdf_load_stackoverflow) 2011-12-21
TW200821754A (en) 2008-05-16
KR100970357B1 (ko) 2010-07-16
KR100998459B1 (ko) 2010-12-06
WO2005031463A1 (ja) 2005-04-07
KR20060065576A (ko) 2006-06-14

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