TW200510961A - Apparatus and method for providing a confined liquid for immersion lithography - Google Patents

Apparatus and method for providing a confined liquid for immersion lithography

Info

Publication number
TW200510961A
TW200510961A TW093118068A TW93118068A TW200510961A TW 200510961 A TW200510961 A TW 200510961A TW 093118068 A TW093118068 A TW 093118068A TW 93118068 A TW93118068 A TW 93118068A TW 200510961 A TW200510961 A TW 200510961A
Authority
TW
Taiwan
Prior art keywords
providing
immersion lithography
confined liquid
substrate
meniscus
Prior art date
Application number
TW093118068A
Other languages
English (en)
Other versions
TWI289734B (en
Inventor
David Hemker
Fred C Redeker
John Boyd
Larios John M De
Michael Ravkin
Mikhail Korolik
Original Assignee
Lam Res Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/606,022 external-priority patent/US7252097B2/en
Application filed by Lam Res Corp filed Critical Lam Res Corp
Publication of TW200510961A publication Critical patent/TW200510961A/zh
Application granted granted Critical
Publication of TWI289734B publication Critical patent/TWI289734B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • ing And Chemical Polishing (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
TW093118068A 2003-06-24 2004-06-23 Apparatus and method for providing a confined liquid for immersion lithography TWI289734B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/606,022 US7252097B2 (en) 2002-09-30 2003-06-24 System and method for integrating in-situ metrology within a wafer process
US10/834,548 US7367345B1 (en) 2002-09-30 2004-04-28 Apparatus and method for providing a confined liquid for immersion lithography

Publications (2)

Publication Number Publication Date
TW200510961A true TW200510961A (en) 2005-03-16
TWI289734B TWI289734B (en) 2007-11-11

Family

ID=33568007

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093118068A TWI289734B (en) 2003-06-24 2004-06-23 Apparatus and method for providing a confined liquid for immersion lithography

Country Status (9)

Country Link
US (2) US7367345B1 (zh)
EP (1) EP1636654B1 (zh)
JP (1) JP4612630B2 (zh)
KR (1) KR101117052B1 (zh)
AT (1) ATE465435T1 (zh)
DE (1) DE602004026725D1 (zh)
MY (1) MY139592A (zh)
TW (1) TWI289734B (zh)
WO (1) WO2005003864A2 (zh)

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KR20060025189A (ko) 2006-03-20
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WO2005003864A2 (en) 2005-01-13
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EP1636654B1 (en) 2010-04-21
EP1636654A2 (en) 2006-03-22

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