TW200415217A - Zeolite sol and method for preparing the same, composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device - Google Patents
Zeolite sol and method for preparing the same, composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device Download PDFInfo
- Publication number
- TW200415217A TW200415217A TW092131710A TW92131710A TW200415217A TW 200415217 A TW200415217 A TW 200415217A TW 092131710 A TW092131710 A TW 092131710A TW 92131710 A TW92131710 A TW 92131710A TW 200415217 A TW200415217 A TW 200415217A
- Authority
- TW
- Taiwan
- Prior art keywords
- porous film
- film
- composition
- forming
- zeolite
- Prior art date
Links
Classifications
-
- H10P14/6922—
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B39/00—Compounds having molecular sieve and base-exchange properties, e.g. crystalline zeolites; Their preparation; After-treatment, e.g. ion-exchange or dealumination
- C01B39/02—Crystalline aluminosilicate zeolites; Isomorphous compounds thereof; Direct preparation thereof; Preparation thereof starting from a reaction mixture containing a crystalline zeolite of another type, or from preformed reactants; After-treatment thereof
- C01B39/04—Crystalline aluminosilicate zeolites; Isomorphous compounds thereof; Direct preparation thereof; Preparation thereof starting from a reaction mixture containing a crystalline zeolite of another type, or from preformed reactants; After-treatment thereof using at least one organic template directing agent, e.g. an ionic quaternary ammonium compound or an aminated compound
-
- H10P14/6342—
-
- H10P14/665—
-
- H10P14/6686—
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geology (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Formation Of Insulating Films (AREA)
- Silicates, Zeolites, And Molecular Sieves (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002329129A JP4170735B2 (ja) | 2002-11-13 | 2002-11-13 | ゼオライトゾルとその製造方法、多孔質膜形成用組成物、多孔質膜とその製造方法、層間絶縁膜及び半導体装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW200415217A true TW200415217A (en) | 2004-08-16 |
Family
ID=32212017
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW092131710A TW200415217A (en) | 2002-11-13 | 2003-11-12 | Zeolite sol and method for preparing the same, composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device |
Country Status (4)
| Country | Link |
|---|---|
| US (2) | US7244657B2 (enExample) |
| JP (1) | JP4170735B2 (enExample) |
| CN (1) | CN100567150C (enExample) |
| TW (1) | TW200415217A (enExample) |
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7674390B2 (en) * | 2003-11-17 | 2010-03-09 | Intel Corporation | Zeolite—sol gel nano-composite low k dielectric |
| WO2005053009A1 (ja) * | 2003-11-28 | 2005-06-09 | Nec Corporation | 多孔質絶縁膜及びその製造方法並びに多孔質絶縁膜を用いた半導体装置 |
| WO2005109475A2 (en) * | 2004-05-04 | 2005-11-17 | California Institute Of Technology | Zeolite films for low k applications |
| US20050274646A1 (en) * | 2004-06-14 | 2005-12-15 | Conocophillips Company | Catalyst for hydroprocessing of Fischer-Tropsch products |
| US20060081557A1 (en) | 2004-10-18 | 2006-04-20 | Molecular Imprints, Inc. | Low-k dielectric functional imprinting materials |
| US7303989B2 (en) * | 2004-11-22 | 2007-12-04 | Intel Corporation | Using zeolites to improve the mechanical strength of low-k interlayer dielectrics |
| US7468545B2 (en) * | 2005-05-06 | 2008-12-23 | Megica Corporation | Post passivation structure for a semiconductor device and packaging process for same |
| JP5355892B2 (ja) * | 2005-09-16 | 2013-11-27 | ルネサスエレクトロニクス株式会社 | 配線構造並びに半導体装置及びその製造方法 |
| DE102006031772A1 (de) * | 2006-07-10 | 2008-01-17 | Robert Bosch Gmbh | Verfahren zur Herstellung eines Sensorelements sowie Sensorelement |
| JP2008205008A (ja) * | 2007-02-16 | 2008-09-04 | Shin Etsu Chem Co Ltd | 半導体層間絶縁膜形成用組成物とその製造方法、膜形成方法と半導体装置 |
| JP2008201832A (ja) * | 2007-02-16 | 2008-09-04 | Shin Etsu Chem Co Ltd | シロキサン重合体とその製造方法、該重合体を含有する多孔質膜形成用塗布液ならびに多孔質膜と、該多孔質膜を用いた半導体装置 |
| JP2008201833A (ja) | 2007-02-16 | 2008-09-04 | Shin Etsu Chem Co Ltd | 膜形成用組成物、低誘電率絶縁膜、低誘電率絶縁膜の形成方法及び半導体装置 |
| JP4866290B2 (ja) * | 2007-04-03 | 2012-02-01 | 信越化学工業株式会社 | ゼオライト含有膜の製造方法 |
| KR101610180B1 (ko) * | 2007-11-21 | 2016-04-07 | 캐논 나노테크놀로지즈 인코퍼레이티드 | 나노-임프린트 리소그래피용 다공성 주형 및 임프린팅 스택 |
| JP2009286935A (ja) * | 2008-05-30 | 2009-12-10 | Shin-Etsu Chemical Co Ltd | 有機酸化ケイ素微粒子及びその製造方法、多孔質膜形成用組成物、多孔質膜及びその形成方法、並びに半導体装置 |
| JP5096233B2 (ja) | 2008-05-30 | 2012-12-12 | 信越化学工業株式会社 | 有機酸化ケイ素系微粒子及びその製造方法、多孔質膜形成用組成物、多孔質膜及びその形成方法、並びに半導体装置 |
| JP4883323B2 (ja) * | 2008-08-26 | 2012-02-22 | 信越化学工業株式会社 | 非水電解質二次電池負極材及びSi−O−Al複合体の製造方法、ならびに非水電解質二次電池負極及び非水電解質二次電池 |
| US20100072671A1 (en) * | 2008-09-25 | 2010-03-25 | Molecular Imprints, Inc. | Nano-imprint lithography template fabrication and treatment |
| US8470188B2 (en) * | 2008-10-02 | 2013-06-25 | Molecular Imprints, Inc. | Nano-imprint lithography templates |
| US20100104852A1 (en) * | 2008-10-23 | 2010-04-29 | Molecular Imprints, Inc. | Fabrication of High-Throughput Nano-Imprint Lithography Templates |
| US8616873B2 (en) * | 2010-01-26 | 2013-12-31 | Molecular Imprints, Inc. | Micro-conformal templates for nanoimprint lithography |
| TW201144091A (en) * | 2010-01-29 | 2011-12-16 | Molecular Imprints Inc | Ultra-compliant nanoimprint lithography templates |
| US8440772B2 (en) * | 2011-04-28 | 2013-05-14 | Chevron Phillips Chemical Company Lp | Methods for terminating olefin polymerizations |
| US10273315B2 (en) | 2012-06-20 | 2019-04-30 | Chevron Phillips Chemical Company Lp | Methods for terminating olefin polymerizations |
| JP6459489B2 (ja) * | 2014-03-11 | 2019-01-30 | 三菱マテリアル株式会社 | シリカ多孔質膜形成用液組成物及びその液組成物から形成されたシリカ多孔質膜 |
| US20160177063A1 (en) * | 2014-12-23 | 2016-06-23 | Behr Process Corporation | Seed Scavenging Technologies for Waterborne Paint Formulations |
| JP6979548B2 (ja) * | 2019-03-25 | 2021-12-15 | 日本碍子株式会社 | ゼオライト膜複合体の製造方法およびゼオライト膜複合体 |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3677973A (en) * | 1970-03-16 | 1972-07-18 | Universal Oil Prod Co | Transalkylation of alklaromatic hydrocarbons in contact with a zeolite catalyst composition |
| IT1265320B1 (it) * | 1993-12-22 | 1996-10-31 | Eniricerche Spa | Procedimento per la preparazione di silico-allumine amorfe cataliticamente attive |
| JPH09194298A (ja) | 1995-04-25 | 1997-07-29 | Rikagaku Kenkyusho | シリカ−界面活性剤ナノ複合体及びその製造方法 |
| US5792706A (en) * | 1996-06-05 | 1998-08-11 | Advanced Micro Devices, Inc. | Interlevel dielectric with air gaps to reduce permitivity |
| US6084096A (en) * | 1998-04-09 | 2000-07-04 | Air Products And Chemicals, Inc. | Triethylenediamine and piperazine synthesis using zeolite catalysts modified with a silicon-containing compound |
| JP2000044875A (ja) | 1998-05-18 | 2000-02-15 | Jsr Corp | 膜形成用組成物、膜の形成方法および低密度膜 |
| DE19829870A1 (de) * | 1998-07-03 | 2000-01-05 | Degussa | Mikro- und/oder mesoporöse zeolithische Materialien als Füllkomponenten in Dentalkompositen |
| PT1113992E (pt) * | 1998-09-06 | 2006-09-29 | Leibniz Inst Neue Materialien | Processo para o fabrico de suspensoes e de pos a base de oxido de indio-estanho e a sua utilizacao |
| US6177381B1 (en) * | 1998-11-03 | 2001-01-23 | Uop Llc | Layered catalyst composition and processes for preparing and using the composition |
| JP3733824B2 (ja) | 1999-08-12 | 2006-01-11 | Jsr株式会社 | シリカ系被膜形成用塗布液の製造方法 |
| JP4524822B2 (ja) | 1999-10-29 | 2010-08-18 | 株式会社豊田中央研究所 | 高結晶性シリカメソ多孔体薄膜の製造方法 |
| US6685889B1 (en) * | 1999-12-14 | 2004-02-03 | Purdue Research Foundation | Photochemical catalysts and methods for their manufacture and use |
| DE19983995T1 (de) * | 1999-12-17 | 2003-01-30 | Osram Opto Semiconductors Gmbh | Verbessertes, transparentes Elektrodenmaterial zur Steigerung der Qualität von organischen, lichtemittierenden Dioden |
| JP2001203197A (ja) | 2000-01-21 | 2001-07-27 | Jsr Corp | 膜、および膜の形成方法 |
| WO2001068637A2 (en) * | 2000-03-10 | 2001-09-20 | Pharmacia Corporation | Method for the preparation of tetrahydrobenzothiepines |
| US6440309B1 (en) * | 2000-05-17 | 2002-08-27 | Yoram Cohen | Ceramic-supported polymer (CSP) pervaporation membrane |
| AU2002222968A1 (en) * | 2000-07-13 | 2002-01-30 | The Regents Of The Universty Of California | Silica zeolite low-k dielectric thin films |
| CN1124978C (zh) | 2000-08-23 | 2003-10-22 | 中国石油化工股份有限公司 | 硅分子筛及其合成方法 |
| WO2002061765A1 (en) * | 2001-01-29 | 2002-08-08 | Jsr Corporation | Composite particle for dielectrics, ultramicroparticulate composite resin particle, composition for forming dielectrics and use thereof |
| CN1173885C (zh) | 2001-09-26 | 2004-11-03 | 复旦大学 | 纳米尺寸的均匀介孔氧化硅球分离剂的合成方法 |
| TWI338528B (enExample) * | 2002-07-19 | 2011-03-01 | Au Optronics Corp |
-
2002
- 2002-11-13 JP JP2002329129A patent/JP4170735B2/ja not_active Expired - Fee Related
-
2003
- 2003-11-07 US US10/703,854 patent/US7244657B2/en not_active Expired - Fee Related
- 2003-11-12 TW TW092131710A patent/TW200415217A/zh unknown
- 2003-11-13 CN CNB200310114941XA patent/CN100567150C/zh not_active Expired - Fee Related
-
2007
- 2007-01-11 US US11/652,297 patent/US7405459B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2004161535A (ja) | 2004-06-10 |
| JP4170735B2 (ja) | 2008-10-22 |
| US20040091419A1 (en) | 2004-05-13 |
| US7405459B2 (en) | 2008-07-29 |
| US20070108593A1 (en) | 2007-05-17 |
| CN1519197A (zh) | 2004-08-11 |
| CN100567150C (zh) | 2009-12-09 |
| US7244657B2 (en) | 2007-07-17 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TW200415217A (en) | Zeolite sol and method for preparing the same, composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | |
| TWI280263B (en) | Method of forming amorphous silica-based coating film with low dielectric constant and thus obtained silica-based coating film | |
| TWI280264B (en) | Coating liquid for forming amorphous silica-based coating film with low dielectric constant and method for preparing the same | |
| US20080118737A1 (en) | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | |
| KR100671850B1 (ko) | 다공질 필름의 개질 방법 및 개질된 다공질 필름 및 그 용도 | |
| JPWO1999003926A1 (ja) | 絶縁薄膜製造用アルコキシシラン―有機ポリマー組成物、及びその用途 | |
| EP0677872A1 (en) | Method of forming Si-O containing coatings | |
| JP2005522878A (ja) | 集積回路用途用の低金属多孔質シリカ誘電体 | |
| JP4021131B2 (ja) | 低誘電率シリカ系被膜形成用塗布液および低誘電率シリカ系被膜付基板 | |
| JP2006500769A (ja) | 低k材料用の中間層接着促進剤 | |
| US7119354B2 (en) | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film | |
| TWI356809B (en) | Porous-film-forming composition, preparation metho | |
| TW200403284A (en) | Low dielectric constant films derived by sol-gel processing of a hyperbranched polycarbosilane | |
| US20100249445A1 (en) | Post-spin-on silylation method for hydrophobic and hydrofluoric acid-resistant porous silica films | |
| WO2001048806A1 (en) | Method of forming low-dielectric-constant film, and semiconductor substrate with low-dielectric-constant film | |
| JPWO2001048806A1 (ja) | 低誘電率シリカ系被膜の形成方法および低誘電率被膜付半導体基板 | |
| TW593548B (en) | Siloxane resins | |
| TWI328600B (en) | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device | |
| JP4866290B2 (ja) | ゼオライト含有膜の製造方法 | |
| JP2004210579A (ja) | 多孔質シリカフィルムの製造方法、該方法により得られた多孔質シリカフィルム、並びにそれからなる半導体装置 | |
| JP2000340651A (ja) | 低誘電率膜の製造法 | |
| JP2004307693A (ja) | 多孔質膜形成用組成物、多孔質膜の製造方法、多孔質膜、層間絶縁膜、及び半導体装置 | |
| JP2000336312A (ja) | シリカ系被膜形成用塗布液、シリカ系被膜の製造法及び半導体装置 | |
| JPWO2001019922A1 (ja) | 組成物、その組成物を用いた低誘電率膜の形成方法、低誘電率膜及びその低誘電率膜を有する電子部品 | |
| JP2003243386A (ja) | 絶縁膜の製造方法 |