TW200415217A - Zeolite sol and method for preparing the same, composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device - Google Patents

Zeolite sol and method for preparing the same, composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device Download PDF

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Publication number
TW200415217A
TW200415217A TW092131710A TW92131710A TW200415217A TW 200415217 A TW200415217 A TW 200415217A TW 092131710 A TW092131710 A TW 092131710A TW 92131710 A TW92131710 A TW 92131710A TW 200415217 A TW200415217 A TW 200415217A
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TW
Taiwan
Prior art keywords
porous film
film
composition
forming
zeolite
Prior art date
Application number
TW092131710A
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English (en)
Chinese (zh)
Inventor
Tsutomu Ogihara
Fujio Yagihashi
Hideo Nakagawa
Masaru Sasago
Original Assignee
Shinetsu Chemical Co
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinetsu Chemical Co, Matsushita Electric Industrial Co Ltd filed Critical Shinetsu Chemical Co
Publication of TW200415217A publication Critical patent/TW200415217A/zh

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Classifications

    • H10P14/6922
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B39/00Compounds having molecular sieve and base-exchange properties, e.g. crystalline zeolites; Their preparation; After-treatment, e.g. ion-exchange or dealumination
    • C01B39/02Crystalline aluminosilicate zeolites; Isomorphous compounds thereof; Direct preparation thereof; Preparation thereof starting from a reaction mixture containing a crystalline zeolite of another type, or from preformed reactants; After-treatment thereof
    • C01B39/04Crystalline aluminosilicate zeolites; Isomorphous compounds thereof; Direct preparation thereof; Preparation thereof starting from a reaction mixture containing a crystalline zeolite of another type, or from preformed reactants; After-treatment thereof using at least one organic template directing agent, e.g. an ionic quaternary ammonium compound or an aminated compound
    • H10P14/6342
    • H10P14/665
    • H10P14/6686

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  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Formation Of Insulating Films (AREA)
  • Silicates, Zeolites, And Molecular Sieves (AREA)
TW092131710A 2002-11-13 2003-11-12 Zeolite sol and method for preparing the same, composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device TW200415217A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002329129A JP4170735B2 (ja) 2002-11-13 2002-11-13 ゼオライトゾルとその製造方法、多孔質膜形成用組成物、多孔質膜とその製造方法、層間絶縁膜及び半導体装置

Publications (1)

Publication Number Publication Date
TW200415217A true TW200415217A (en) 2004-08-16

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TW092131710A TW200415217A (en) 2002-11-13 2003-11-12 Zeolite sol and method for preparing the same, composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device

Country Status (4)

Country Link
US (2) US7244657B2 (enExample)
JP (1) JP4170735B2 (enExample)
CN (1) CN100567150C (enExample)
TW (1) TW200415217A (enExample)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7674390B2 (en) * 2003-11-17 2010-03-09 Intel Corporation Zeolite—sol gel nano-composite low k dielectric
WO2005053009A1 (ja) * 2003-11-28 2005-06-09 Nec Corporation 多孔質絶縁膜及びその製造方法並びに多孔質絶縁膜を用いた半導体装置
WO2005109475A2 (en) * 2004-05-04 2005-11-17 California Institute Of Technology Zeolite films for low k applications
US20050274646A1 (en) * 2004-06-14 2005-12-15 Conocophillips Company Catalyst for hydroprocessing of Fischer-Tropsch products
US20060081557A1 (en) 2004-10-18 2006-04-20 Molecular Imprints, Inc. Low-k dielectric functional imprinting materials
US7303989B2 (en) * 2004-11-22 2007-12-04 Intel Corporation Using zeolites to improve the mechanical strength of low-k interlayer dielectrics
US7468545B2 (en) * 2005-05-06 2008-12-23 Megica Corporation Post passivation structure for a semiconductor device and packaging process for same
JP5355892B2 (ja) * 2005-09-16 2013-11-27 ルネサスエレクトロニクス株式会社 配線構造並びに半導体装置及びその製造方法
DE102006031772A1 (de) * 2006-07-10 2008-01-17 Robert Bosch Gmbh Verfahren zur Herstellung eines Sensorelements sowie Sensorelement
JP2008205008A (ja) * 2007-02-16 2008-09-04 Shin Etsu Chem Co Ltd 半導体層間絶縁膜形成用組成物とその製造方法、膜形成方法と半導体装置
JP2008201832A (ja) * 2007-02-16 2008-09-04 Shin Etsu Chem Co Ltd シロキサン重合体とその製造方法、該重合体を含有する多孔質膜形成用塗布液ならびに多孔質膜と、該多孔質膜を用いた半導体装置
JP2008201833A (ja) 2007-02-16 2008-09-04 Shin Etsu Chem Co Ltd 膜形成用組成物、低誘電率絶縁膜、低誘電率絶縁膜の形成方法及び半導体装置
JP4866290B2 (ja) * 2007-04-03 2012-02-01 信越化学工業株式会社 ゼオライト含有膜の製造方法
KR101610180B1 (ko) * 2007-11-21 2016-04-07 캐논 나노테크놀로지즈 인코퍼레이티드 나노-임프린트 리소그래피용 다공성 주형 및 임프린팅 스택
JP2009286935A (ja) * 2008-05-30 2009-12-10 Shin-Etsu Chemical Co Ltd 有機酸化ケイ素微粒子及びその製造方法、多孔質膜形成用組成物、多孔質膜及びその形成方法、並びに半導体装置
JP5096233B2 (ja) 2008-05-30 2012-12-12 信越化学工業株式会社 有機酸化ケイ素系微粒子及びその製造方法、多孔質膜形成用組成物、多孔質膜及びその形成方法、並びに半導体装置
JP4883323B2 (ja) * 2008-08-26 2012-02-22 信越化学工業株式会社 非水電解質二次電池負極材及びSi−O−Al複合体の製造方法、ならびに非水電解質二次電池負極及び非水電解質二次電池
US20100072671A1 (en) * 2008-09-25 2010-03-25 Molecular Imprints, Inc. Nano-imprint lithography template fabrication and treatment
US8470188B2 (en) * 2008-10-02 2013-06-25 Molecular Imprints, Inc. Nano-imprint lithography templates
US20100104852A1 (en) * 2008-10-23 2010-04-29 Molecular Imprints, Inc. Fabrication of High-Throughput Nano-Imprint Lithography Templates
US8616873B2 (en) * 2010-01-26 2013-12-31 Molecular Imprints, Inc. Micro-conformal templates for nanoimprint lithography
TW201144091A (en) * 2010-01-29 2011-12-16 Molecular Imprints Inc Ultra-compliant nanoimprint lithography templates
US8440772B2 (en) * 2011-04-28 2013-05-14 Chevron Phillips Chemical Company Lp Methods for terminating olefin polymerizations
US10273315B2 (en) 2012-06-20 2019-04-30 Chevron Phillips Chemical Company Lp Methods for terminating olefin polymerizations
JP6459489B2 (ja) * 2014-03-11 2019-01-30 三菱マテリアル株式会社 シリカ多孔質膜形成用液組成物及びその液組成物から形成されたシリカ多孔質膜
US20160177063A1 (en) * 2014-12-23 2016-06-23 Behr Process Corporation Seed Scavenging Technologies for Waterborne Paint Formulations
JP6979548B2 (ja) * 2019-03-25 2021-12-15 日本碍子株式会社 ゼオライト膜複合体の製造方法およびゼオライト膜複合体

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3677973A (en) * 1970-03-16 1972-07-18 Universal Oil Prod Co Transalkylation of alklaromatic hydrocarbons in contact with a zeolite catalyst composition
IT1265320B1 (it) * 1993-12-22 1996-10-31 Eniricerche Spa Procedimento per la preparazione di silico-allumine amorfe cataliticamente attive
JPH09194298A (ja) 1995-04-25 1997-07-29 Rikagaku Kenkyusho シリカ−界面活性剤ナノ複合体及びその製造方法
US5792706A (en) * 1996-06-05 1998-08-11 Advanced Micro Devices, Inc. Interlevel dielectric with air gaps to reduce permitivity
US6084096A (en) * 1998-04-09 2000-07-04 Air Products And Chemicals, Inc. Triethylenediamine and piperazine synthesis using zeolite catalysts modified with a silicon-containing compound
JP2000044875A (ja) 1998-05-18 2000-02-15 Jsr Corp 膜形成用組成物、膜の形成方法および低密度膜
DE19829870A1 (de) * 1998-07-03 2000-01-05 Degussa Mikro- und/oder mesoporöse zeolithische Materialien als Füllkomponenten in Dentalkompositen
PT1113992E (pt) * 1998-09-06 2006-09-29 Leibniz Inst Neue Materialien Processo para o fabrico de suspensoes e de pos a base de oxido de indio-estanho e a sua utilizacao
US6177381B1 (en) * 1998-11-03 2001-01-23 Uop Llc Layered catalyst composition and processes for preparing and using the composition
JP3733824B2 (ja) 1999-08-12 2006-01-11 Jsr株式会社 シリカ系被膜形成用塗布液の製造方法
JP4524822B2 (ja) 1999-10-29 2010-08-18 株式会社豊田中央研究所 高結晶性シリカメソ多孔体薄膜の製造方法
US6685889B1 (en) * 1999-12-14 2004-02-03 Purdue Research Foundation Photochemical catalysts and methods for their manufacture and use
DE19983995T1 (de) * 1999-12-17 2003-01-30 Osram Opto Semiconductors Gmbh Verbessertes, transparentes Elektrodenmaterial zur Steigerung der Qualität von organischen, lichtemittierenden Dioden
JP2001203197A (ja) 2000-01-21 2001-07-27 Jsr Corp 膜、および膜の形成方法
WO2001068637A2 (en) * 2000-03-10 2001-09-20 Pharmacia Corporation Method for the preparation of tetrahydrobenzothiepines
US6440309B1 (en) * 2000-05-17 2002-08-27 Yoram Cohen Ceramic-supported polymer (CSP) pervaporation membrane
AU2002222968A1 (en) * 2000-07-13 2002-01-30 The Regents Of The Universty Of California Silica zeolite low-k dielectric thin films
CN1124978C (zh) 2000-08-23 2003-10-22 中国石油化工股份有限公司 硅分子筛及其合成方法
WO2002061765A1 (en) * 2001-01-29 2002-08-08 Jsr Corporation Composite particle for dielectrics, ultramicroparticulate composite resin particle, composition for forming dielectrics and use thereof
CN1173885C (zh) 2001-09-26 2004-11-03 复旦大学 纳米尺寸的均匀介孔氧化硅球分离剂的合成方法
TWI338528B (enExample) * 2002-07-19 2011-03-01 Au Optronics Corp

Also Published As

Publication number Publication date
JP2004161535A (ja) 2004-06-10
JP4170735B2 (ja) 2008-10-22
US20040091419A1 (en) 2004-05-13
US7405459B2 (en) 2008-07-29
US20070108593A1 (en) 2007-05-17
CN1519197A (zh) 2004-08-11
CN100567150C (zh) 2009-12-09
US7244657B2 (en) 2007-07-17

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