SG70652A1 - Apparatus for vaporizing and supplying a material - Google Patents

Apparatus for vaporizing and supplying a material

Info

Publication number
SG70652A1
SG70652A1 SG1998003777A SG1998003777A SG70652A1 SG 70652 A1 SG70652 A1 SG 70652A1 SG 1998003777 A SG1998003777 A SG 1998003777A SG 1998003777 A SG1998003777 A SG 1998003777A SG 70652 A1 SG70652 A1 SG 70652A1
Authority
SG
Singapore
Prior art keywords
vaporizing
supplying
Prior art date
Application number
SG1998003777A
Other languages
English (en)
Inventor
Yukichi Takamatsu
Takeo Yoneyama
Yoshiyasu Ishihama
Original Assignee
Japan Pionics
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Pionics filed Critical Japan Pionics
Publication of SG70652A1 publication Critical patent/SG70652A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J4/00—Feed or outlet devices; Feed or outlet control devices
    • B01J4/008—Feed or outlet control devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D1/00—Evaporating
    • B01D1/16—Evaporating by spraying
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • B01D3/34—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping with one or more auxiliary substances
    • B01D3/343—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping with one or more auxiliary substances the substance being a gas
    • B01D3/346—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping with one or more auxiliary substances the substance being a gas the gas being used for removing vapours, e.g. transport gas
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S261/00—Gas and liquid contact apparatus
    • Y10S261/65—Vaporizers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Dispersion Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Special Spraying Apparatus (AREA)
  • Electrodes Of Semiconductors (AREA)
SG1998003777A 1997-09-30 1998-09-21 Apparatus for vaporizing and supplying a material SG70652A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9282746A JPH11111644A (ja) 1997-09-30 1997-09-30 気化供給装置

Publications (1)

Publication Number Publication Date
SG70652A1 true SG70652A1 (en) 2000-02-22

Family

ID=17656524

Family Applications (1)

Application Number Title Priority Date Filing Date
SG1998003777A SG70652A1 (en) 1997-09-30 1998-09-21 Apparatus for vaporizing and supplying a material

Country Status (7)

Country Link
US (1) US6155540A (fr)
EP (1) EP0905276A3 (fr)
JP (1) JPH11111644A (fr)
KR (1) KR19990030253A (fr)
CN (1) CN1110582C (fr)
SG (1) SG70652A1 (fr)
TW (1) TW460609B (fr)

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US6015918A (en) * 1998-11-10 2000-01-18 Sharp Laboratories Of America, Inc. Allyl-derived precursor and synthesis method
KR100368319B1 (ko) * 1998-12-30 2003-03-17 주식회사 하이닉스반도체 액체운송장치
US6267820B1 (en) * 1999-02-12 2001-07-31 Applied Materials, Inc. Clog resistant injection valve
TW510820B (en) * 1999-11-30 2002-11-21 Japan Pionics Method of cleaning of harmful gas and cleaning apparatus
GB9929279D0 (en) * 1999-12-11 2000-02-02 Epichem Ltd An improved method of and apparatus for the delivery of precursors in the vapour phase to a plurality of epitaxial reactor sites
JP2001259494A (ja) * 2000-03-17 2001-09-25 Matsushita Battery Industrial Co Ltd 薄膜形成方法
KR100331024B1 (ko) * 2000-06-05 2002-04-03 김상호 액체소스 분사 기화장치
FR2812665B1 (fr) * 2000-08-01 2003-08-08 Sidel Sa Procede de depot de revetement par plasma, dispositif de mise en oeuvre du procede et revetement obtenu par un tel procede
JP2003268552A (ja) * 2002-03-18 2003-09-25 Watanabe Shoko:Kk 気化器及びそれを用いた各種装置並びに気化方法
US6758591B1 (en) 2002-03-22 2004-07-06 Novellus Systems, Inc. Mixing of materials in an integrated circuit manufacturing equipment
JP3822135B2 (ja) * 2002-05-13 2006-09-13 日本パイオニクス株式会社 気化供給装置
KR100474565B1 (ko) * 2002-08-30 2005-03-10 삼성전자주식회사 소스 가스 공급 방법 및 장치
US7253084B2 (en) * 2004-09-03 2007-08-07 Asm America, Inc. Deposition from liquid sources
KR100724283B1 (ko) * 2004-10-14 2007-06-04 주식회사 아이피에스 박막증착장치
WO2006081234A2 (fr) * 2005-01-27 2006-08-03 Applied Materials, Inc. Appareil et procede de deport de couche de ruthenium
US20070271751A1 (en) * 2005-01-27 2007-11-29 Weidman Timothy W Method of forming a reliable electrochemical capacitor
US7438949B2 (en) * 2005-01-27 2008-10-21 Applied Materials, Inc. Ruthenium containing layer deposition method
JP2006222265A (ja) * 2005-02-10 2006-08-24 Hitachi Kokusai Electric Inc 基板処理装置
KR100599058B1 (ko) * 2005-03-15 2006-07-12 삼성전자주식회사 액체 소스 레벨 측정 방법 및 장치 그리고 이를 포함하는반도체 제조 장치
US7514119B2 (en) * 2005-04-29 2009-04-07 Linde, Inc. Method and apparatus for using solution based precursors for atomic layer deposition
US9101949B2 (en) 2005-08-04 2015-08-11 Eilaz Babaev Ultrasonic atomization and/or seperation system
JP4710481B2 (ja) * 2005-08-17 2011-06-29 住友化学株式会社 有機金属化合物供給容器
KR100749068B1 (ko) * 2005-12-28 2007-08-13 한국생산기술연구원 전자기 및 초음파를 이용한 광폭 복합코팅 장치 및 공정
DE102006026576A1 (de) * 2006-06-06 2008-01-10 Aixtron Ag Vorrichtung und Verfahren zum Aufdampfen eines pulverförmigen organischen Ausgangsstoffs
US7708028B2 (en) * 2006-12-08 2010-05-04 Praxair Technology, Inc. Fail-safe vacuum actuated valve for high pressure delivery systems
KR101490438B1 (ko) * 2007-06-29 2015-02-11 주성엔지니어링(주) 증착장비의 기화기
US20090258143A1 (en) * 2008-04-11 2009-10-15 Peck John D Reagent dispensing apparatus and delivery method
US7905247B2 (en) * 2008-06-20 2011-03-15 Praxair Technology, Inc. Vacuum actuated valve for high capacity storage and delivery systems
JP5031066B2 (ja) * 2010-05-26 2012-09-19 兵庫県 クラスタービーム発生装置、基板処理装置、クラスタービーム発生方法及び基板処理方法
TW201222630A (en) * 2010-11-16 2012-06-01 Ind Tech Res Inst Film deposition system and method and gas supplying apparatus being used therein
KR20120140148A (ko) * 2011-06-20 2012-12-28 엘지이노텍 주식회사 증착 장치 및 박막 형성 방법
JP5837869B2 (ja) * 2012-12-06 2015-12-24 株式会社フジキン 原料気化供給装置
JP6078335B2 (ja) * 2012-12-27 2017-02-08 株式会社日立国際電気 基板処理装置、半導体装置の製造方法、気化システム、気化器およびプログラム
CN104419911A (zh) * 2013-09-01 2015-03-18 赵培 一种新型高速制备各种功能、结构薄膜的技术及设备
US9877514B2 (en) 2015-09-21 2018-01-30 Cloud V Enterprises Vaporizer with electronically heated nail
JPWO2017188209A1 (ja) * 2016-04-28 2019-02-14 富士フイルム株式会社 精製装置、精製方法、製造装置、薬液の製造方法、容器、及び薬液収容体
JP6890610B2 (ja) 2016-11-18 2021-06-18 富士フイルム株式会社 薬液、薬液収容体、パターン形成方法、及び、キット
JP6880085B2 (ja) 2017-02-20 2021-06-02 富士フイルム株式会社 薬液、薬液収容体、及び、パターン形成方法
JP6948803B2 (ja) 2017-03-02 2021-10-13 東京エレクトロン株式会社 ガス供給装置、ガス供給方法及び成膜方法
JP6877188B2 (ja) * 2017-03-02 2021-05-26 東京エレクトロン株式会社 ガス供給装置、ガス供給方法及び成膜方法
DE102018120580A1 (de) * 2018-08-23 2020-02-27 Infineon Technologies Ag Vorrichtung und verfahren zum abscheiden einer schicht bei atmosphärendruck
JP6875336B2 (ja) * 2018-08-27 2021-05-26 信越化学工業株式会社 成膜方法
CN110965026A (zh) * 2018-09-30 2020-04-07 深圳市引擎门科技有限公司 蒸汽连供系统及方法
KR102072924B1 (ko) * 2018-11-05 2020-02-03 (주)에이텍솔루션 고효율 반도체 증착용 기화기
JP6887688B2 (ja) 2019-02-07 2021-06-16 株式会社高純度化学研究所 蒸発原料用容器、及びその蒸発原料用容器を用いた固体気化供給システム
JP6901153B2 (ja) 2019-02-07 2021-07-14 株式会社高純度化学研究所 薄膜形成用金属ハロゲン化合物の固体気化供給システム。
US11788190B2 (en) 2019-07-05 2023-10-17 Asm Ip Holding B.V. Liquid vaporizer
US11946136B2 (en) 2019-09-20 2024-04-02 Asm Ip Holding B.V. Semiconductor processing device
CN111250013B (zh) * 2020-03-13 2022-05-31 浙江恒翔新材料有限公司 一种带有预热装置的反应釜
KR102131706B1 (ko) 2020-04-03 2020-07-08 김성규 자동차의 관성을 이용한 연료 절약 장치
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Also Published As

Publication number Publication date
JPH11111644A (ja) 1999-04-23
US6155540A (en) 2000-12-05
TW460609B (en) 2001-10-21
CN1110582C (zh) 2003-06-04
CN1219605A (zh) 1999-06-16
KR19990030253A (ko) 1999-04-26
EP0905276A2 (fr) 1999-03-31
EP0905276A3 (fr) 2001-05-23

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