SG68679A1 - Gas ionisation in a cathode arc source - Google Patents

Gas ionisation in a cathode arc source

Info

Publication number
SG68679A1
SG68679A1 SG1998003142A SG1998003142A SG68679A1 SG 68679 A1 SG68679 A1 SG 68679A1 SG 1998003142 A SG1998003142 A SG 1998003142A SG 1998003142 A SG1998003142 A SG 1998003142A SG 68679 A1 SG68679 A1 SG 68679A1
Authority
SG
Singapore
Prior art keywords
arc
cathode
arc source
cathode arc
gas ionisation
Prior art date
Application number
SG1998003142A
Other languages
English (en)
Inventor
Xu Shi
David Ian Flynne
Beng Kang Tay
Hong Siang Tan
Original Assignee
Filplas Vacuum Technology Pte
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Filplas Vacuum Technology Pte filed Critical Filplas Vacuum Technology Pte
Publication of SG68679A1 publication Critical patent/SG68679A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/221—Ion beam deposition
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H01J37/32633—Baffles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32697—Electrostatic control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/022—Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Gas-Filled Discharge Tubes (AREA)
  • Cold Cathode And The Manufacture (AREA)
  • ing And Chemical Polishing (AREA)
  • Discharge Heating (AREA)
  • Plasma Technology (AREA)
  • Sampling And Sample Adjustment (AREA)
SG1998003142A 1995-02-20 1996-02-20 Gas ionisation in a cathode arc source SG68679A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GBGB9503305.6A GB9503305D0 (en) 1995-02-20 1995-02-20 Filtered cathodic arc source

Publications (1)

Publication Number Publication Date
SG68679A1 true SG68679A1 (en) 2000-05-23

Family

ID=10769900

Family Applications (3)

Application Number Title Priority Date Filing Date
SG1998003143A SG68680A1 (en) 1995-02-20 1996-02-20 Cathode arc source with cathode changer
SG1998003140A SG68678A1 (en) 1995-02-20 1996-02-20 Ignition means for a cathode arc source
SG1998003142A SG68679A1 (en) 1995-02-20 1996-02-20 Gas ionisation in a cathode arc source

Family Applications Before (2)

Application Number Title Priority Date Filing Date
SG1998003143A SG68680A1 (en) 1995-02-20 1996-02-20 Cathode arc source with cathode changer
SG1998003140A SG68678A1 (en) 1995-02-20 1996-02-20 Ignition means for a cathode arc source

Country Status (8)

Country Link
US (2) US6031239A (fr)
EP (1) EP0811236B1 (fr)
AT (1) ATE210337T1 (fr)
AU (1) AU4726596A (fr)
DE (1) DE69617645D1 (fr)
GB (1) GB9503305D0 (fr)
SG (3) SG68680A1 (fr)
WO (1) WO1996026531A2 (fr)

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JP7390396B2 (ja) 2019-03-15 2023-12-01 ナノフィルム テクノロジーズ インターナショナル リミテッド 改良されたカソードアーク源
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Also Published As

Publication number Publication date
DE69617645D1 (de) 2002-01-17
GB9503305D0 (en) 1995-04-12
US6031239A (en) 2000-02-29
US6319369B1 (en) 2001-11-20
SG68680A1 (en) 2000-05-23
SG68678A1 (en) 2000-05-23
ATE210337T1 (de) 2001-12-15
EP0811236A2 (fr) 1997-12-10
EP0811236B1 (fr) 2001-12-05
WO1996026531A3 (fr) 1996-12-12
WO1996026531A2 (fr) 1996-08-29
AU4726596A (en) 1996-09-11

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