SG11201603358PA - Vacuum process apparatus and vacuum process method - Google Patents
Vacuum process apparatus and vacuum process methodInfo
- Publication number
- SG11201603358PA SG11201603358PA SG11201603358PA SG11201603358PA SG11201603358PA SG 11201603358P A SG11201603358P A SG 11201603358PA SG 11201603358P A SG11201603358P A SG 11201603358PA SG 11201603358P A SG11201603358P A SG 11201603358PA SG 11201603358P A SG11201603358P A SG 11201603358PA
- Authority
- SG
- Singapore
- Prior art keywords
- vacuum process
- process method
- process apparatus
- vacuum
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/8408—Processes or apparatus specially adapted for manufacturing record carriers protecting the magnetic layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0605—Carbon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
- C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5846—Reactive treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32357—Generation remote from the workpiece, e.g. down-stream
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014041685 | 2014-03-04 | ||
PCT/JP2014/005862 WO2015132830A1 (en) | 2014-03-04 | 2014-11-21 | Vacuum processing device and vacuum processing method |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201603358PA true SG11201603358PA (en) | 2016-09-29 |
Family
ID=54054675
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201603358PA SG11201603358PA (en) | 2014-03-04 | 2014-11-21 | Vacuum process apparatus and vacuum process method |
Country Status (5)
Country | Link |
---|---|
US (1) | US11600295B2 (en) |
JP (1) | JP6055575B2 (en) |
SG (1) | SG11201603358PA (en) |
TW (1) | TWI580805B (en) |
WO (1) | WO2015132830A1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102020202567A1 (en) * | 2020-02-28 | 2021-09-02 | Robert Bosch Gesellschaft mit beschränkter Haftung | Method and device for coating a tribologically highly stressed surface of a metallic component |
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JPS62159433A (en) * | 1986-01-08 | 1987-07-15 | Hitachi Ltd | Method and apparatus for removing resist |
US4889767A (en) * | 1986-04-23 | 1989-12-26 | Tdk Corporation | Magnetic recording medium |
DE69322907T2 (en) * | 1992-07-24 | 1999-05-27 | Matsushita Electric Ind Co Ltd | Magnetic recording medium and its manufacturing process |
GB9503305D0 (en) * | 1995-02-20 | 1995-04-12 | Univ Nanyang | Filtered cathodic arc source |
JP3732250B2 (en) | 1995-03-30 | 2006-01-05 | キヤノンアネルバ株式会社 | In-line deposition system |
JP3077591B2 (en) * | 1996-06-20 | 2000-08-14 | 日本電気株式会社 | CVD apparatus and CVD film forming method |
TW552306B (en) * | 1999-03-26 | 2003-09-11 | Anelva Corp | Method of removing accumulated films from the surfaces of substrate holders in film deposition apparatus, and film deposition apparatus |
JP4526151B2 (en) * | 2000-01-28 | 2010-08-18 | キヤノンアネルバ株式会社 | Substrate transfer device for substrate processing apparatus |
JP2001237216A (en) * | 2000-02-21 | 2001-08-31 | Sanyo Shinku Kogyo Kk | Method and device for generating plasma |
JP3341763B2 (en) * | 2000-04-27 | 2002-11-05 | 住友電気工業株式会社 | Method for manufacturing compound semiconductor device and apparatus for manufacturing compound semiconductor device |
JP4491934B2 (en) | 2000-08-10 | 2010-06-30 | 富士電機デバイステクノロジー株式会社 | Method for manufacturing thin film magnetic recording medium |
DE10101014A1 (en) * | 2001-01-05 | 2002-07-11 | Zeiss Carl | Coating of optical elements, especially for use with ultraviolet light |
US6785638B2 (en) * | 2001-08-06 | 2004-08-31 | Timbre Technologies, Inc. | Method and system of dynamic learning through a regression-based library generation process |
JP3904143B2 (en) * | 2002-01-25 | 2007-04-11 | 富士通株式会社 | Magnetic recording medium and magnetic recording apparatus |
US6878418B2 (en) * | 2002-03-29 | 2005-04-12 | Seagate Technology Llc | Method for making zone-bonded lubricant layer for magnetic hard discs |
US20040154743A1 (en) * | 2002-11-29 | 2004-08-12 | Savas Stephen E. | Apparatus and method for low temperature stripping of photoresist and residues |
JP4253515B2 (en) * | 2003-02-24 | 2009-04-15 | 富士通株式会社 | Carbon protective film manufacturing method, magnetic recording medium manufacturing method, magnetic head manufacturing method, and film forming apparatus |
JP4447279B2 (en) * | 2003-10-15 | 2010-04-07 | キヤノンアネルバ株式会社 | Deposition equipment |
JP4100686B2 (en) * | 2003-12-11 | 2008-06-11 | 富士電機デバイステクノロジー株式会社 | Protective film, method for producing protective film, and magnetic recording medium |
US7444955B2 (en) * | 2004-05-19 | 2008-11-04 | Sub-One Technology, Inc. | Apparatus for directing plasma flow to coat internal passageways |
JP2007026506A (en) | 2005-07-14 | 2007-02-01 | Hitachi Global Storage Technologies Netherlands Bv | Magnetic head slider and method of manufacturing same |
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US8585912B2 (en) * | 2008-07-23 | 2013-11-19 | HGST Netherlands B.V. | System, method and apparatus for batch vapor deposition of adhesion promoter for manufacturing discrete track media and bit-patterned media, and mono-molecular layer lubricant on magnetic recording media |
CN103337453B (en) * | 2008-10-07 | 2017-10-24 | 应用材料公司 | Equipment for effectively removing halogen residues from etching substrate |
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CN104246885B (en) * | 2012-10-29 | 2018-04-13 | 富士电机(马来西亚)有限公司 | Method for manufacturing magnetic recording media and its protective film |
JP6175265B2 (en) * | 2013-04-02 | 2017-08-02 | 昭和電工株式会社 | Method for manufacturing magnetic recording medium |
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-
2014
- 2014-11-21 SG SG11201603358PA patent/SG11201603358PA/en unknown
- 2014-11-21 WO PCT/JP2014/005862 patent/WO2015132830A1/en active Application Filing
- 2014-11-21 JP JP2016505944A patent/JP6055575B2/en active Active
-
2015
- 2015-01-14 TW TW104101178A patent/TWI580805B/en active
-
2016
- 2016-04-18 US US15/131,084 patent/US11600295B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
JP6055575B2 (en) | 2016-12-27 |
US11600295B2 (en) | 2023-03-07 |
WO2015132830A1 (en) | 2015-09-11 |
TW201538765A (en) | 2015-10-16 |
US20160232932A1 (en) | 2016-08-11 |
JPWO2015132830A1 (en) | 2017-03-30 |
TWI580805B (en) | 2017-05-01 |
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