SG165245A1 - Level sensor arrangement for lithographic apparatus and device manufacturing method - Google Patents
Level sensor arrangement for lithographic apparatus and device manufacturing methodInfo
- Publication number
- SG165245A1 SG165245A1 SG201001507-1A SG2010015071A SG165245A1 SG 165245 A1 SG165245 A1 SG 165245A1 SG 2010015071 A SG2010015071 A SG 2010015071A SG 165245 A1 SG165245 A1 SG 165245A1
- Authority
- SG
- Singapore
- Prior art keywords
- level sensor
- lithographic apparatus
- sensor arrangement
- substrate
- device manufacturing
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 abstract 4
- 230000005855 radiation Effects 0.000 abstract 3
- 238000001514 detection method Methods 0.000 abstract 2
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
- G03F9/7034—Leveling
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70591—Testing optical components
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70608—Monitoring the unpatterned workpiece, e.g. measuring thickness, reflectivity or effects of immersion liquid on resist
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/706843—Metrology apparatus
- G03F7/706847—Production of measurement radiation, e.g. synchrotron, free-electron laser, plasma source or higher harmonic generation [HHG]
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Health & Medical Sciences (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Length Measuring Devices By Optical Means (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US16012609P | 2009-03-13 | 2009-03-13 | |
| US28814909P | 2009-12-18 | 2009-12-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG165245A1 true SG165245A1 (en) | 2010-10-28 |
Family
ID=42174070
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG201001507-1A SG165245A1 (en) | 2009-03-13 | 2010-03-03 | Level sensor arrangement for lithographic apparatus and device manufacturing method |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8842293B2 (ko) |
| EP (1) | EP2228685B1 (ko) |
| JP (2) | JP5192505B2 (ko) |
| KR (1) | KR101198347B1 (ko) |
| CN (1) | CN101840166B (ko) |
| SG (1) | SG165245A1 (ko) |
| TW (1) | TWI431439B (ko) |
Families Citing this family (116)
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|---|---|---|---|---|
| JP5162006B2 (ja) * | 2011-06-01 | 2013-03-13 | キヤノン株式会社 | 検出装置、露光装置、および、デバイスの製造方法 |
| NL2009004A (en) * | 2011-07-20 | 2013-01-22 | Asml Netherlands Bv | Inspection method and apparatus, and lithographic apparatus. |
| NL2009273A (en) | 2011-08-31 | 2013-03-04 | Asml Netherlands Bv | Level sensor arrangement for lithographic apparatus, lithographic apparatus and device manufacturing method. |
| KR102219780B1 (ko) | 2014-03-04 | 2021-02-25 | 에이에스엠엘 네델란즈 비.브이. | 데이터 처리 장치를 갖는 리소그래피 장치 |
| US10095131B2 (en) | 2014-06-12 | 2018-10-09 | Asml Netherlands B.V. | Alignment modeling and a lithographic apparatus and exposure method using the same |
| CN107735731B (zh) | 2015-07-03 | 2020-12-22 | Asml荷兰有限公司 | 光刻设备、控制方法及计算机程序产品 |
| KR102037994B1 (ko) | 2015-07-20 | 2019-10-29 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 장치를 제어하는 방법, 리소그래피 장치 및 디바이스 제조 방법 |
| NL2017296A (en) | 2015-08-12 | 2017-02-16 | Asml Netherlands Bv | Methods for controlling lithographic apparatus, lithographic apparatus and device manufacturing method |
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| KR102628875B1 (ko) | 2015-09-15 | 2024-01-25 | 도쿄엘렉트론가부시키가이샤 | 기판 처리 장치, 기판 처리 방법 및 기억 매체 |
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-
2010
- 2010-02-24 EP EP10154577.0A patent/EP2228685B1/en active Active
- 2010-03-03 SG SG201001507-1A patent/SG165245A1/en unknown
- 2010-03-10 JP JP2010052645A patent/JP5192505B2/ja active Active
- 2010-03-11 TW TW099107118A patent/TWI431439B/zh active
- 2010-03-12 US US12/722,955 patent/US8842293B2/en active Active
- 2010-03-12 KR KR1020100022284A patent/KR101198347B1/ko active IP Right Grant
- 2010-03-12 CN CN2010101360561A patent/CN101840166B/zh active Active
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Also Published As
| Publication number | Publication date |
|---|---|
| KR20100103420A (ko) | 2010-09-27 |
| JP2012199594A (ja) | 2012-10-18 |
| TWI431439B (zh) | 2014-03-21 |
| EP2228685A3 (en) | 2014-07-30 |
| KR101198347B1 (ko) | 2012-11-06 |
| CN101840166A (zh) | 2010-09-22 |
| EP2228685A2 (en) | 2010-09-15 |
| JP5192505B2 (ja) | 2013-05-08 |
| TW201042404A (en) | 2010-12-01 |
| JP2010219528A (ja) | 2010-09-30 |
| US8842293B2 (en) | 2014-09-23 |
| US20100233600A1 (en) | 2010-09-16 |
| EP2228685B1 (en) | 2018-06-27 |
| CN101840166B (zh) | 2012-07-11 |
| JP5600145B2 (ja) | 2014-10-01 |
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