SG162674A1 - Methods and processes for modifying polymer material surface interactions - Google Patents
Methods and processes for modifying polymer material surface interactionsInfo
- Publication number
- SG162674A1 SG162674A1 SG200908085-4A SG2009080854A SG162674A1 SG 162674 A1 SG162674 A1 SG 162674A1 SG 2009080854 A SG2009080854 A SG 2009080854A SG 162674 A1 SG162674 A1 SG 162674A1
- Authority
- SG
- Singapore
- Prior art keywords
- acrylates
- monomers
- epoxides
- different types
- photoinitiators
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 2
- 230000003993 interaction Effects 0.000 title 1
- 239000002861 polymer material Substances 0.000 title 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 abstract 4
- 150000002118 epoxides Chemical class 0.000 abstract 4
- 239000000178 monomer Substances 0.000 abstract 4
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 2
- 239000000203 mixture Substances 0.000 abstract 2
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 abstract 1
- 239000012952 cationic photoinitiator Substances 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 239000012949 free radical photoinitiator Substances 0.000 abstract 1
- 125000000524 functional group Chemical group 0.000 abstract 1
- 238000001127 nanoimprint lithography Methods 0.000 abstract 1
- 230000010076 replication Effects 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
- 239000004094 surface-active agent Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Epoxy Resins (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13903008P | 2008-12-19 | 2008-12-19 | |
| EP08172342.1A EP2199855B1 (en) | 2008-12-19 | 2008-12-19 | Methods and processes for modifying polymer material surface interactions |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG162674A1 true SG162674A1 (en) | 2010-07-29 |
Family
ID=40521956
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG200908085-4A SG162674A1 (en) | 2008-12-19 | 2009-12-04 | Methods and processes for modifying polymer material surface interactions |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US9063408B2 (enExample) |
| EP (1) | EP2199855B1 (enExample) |
| JP (2) | JP5725465B2 (enExample) |
| KR (1) | KR101767179B1 (enExample) |
| CN (1) | CN101872115B (enExample) |
| SG (1) | SG162674A1 (enExample) |
| TW (1) | TWI515510B (enExample) |
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| KR101653626B1 (ko) * | 2009-07-13 | 2016-09-02 | 주식회사 동진쎄미켐 | 광경화형 함불소 수지 조성물 및 이를 이용한 수지 몰드의 제조방법 |
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| WO2012025316A1 (en) * | 2010-08-26 | 2012-03-01 | Asml Netherlands B.V. | Imprint lithography method and imprintable medium |
| JP5306404B2 (ja) * | 2011-03-25 | 2013-10-02 | 株式会社東芝 | パターン形成方法 |
| US20140346141A1 (en) * | 2012-01-13 | 2014-11-27 | Asml Netherlands B.V. | Self-assemblable polymer and methods for use in lithography |
| JP5959865B2 (ja) * | 2012-02-09 | 2016-08-02 | キヤノン株式会社 | 光硬化物及びその製造方法 |
| JP6090732B2 (ja) * | 2012-05-14 | 2017-03-08 | 東洋合成工業株式会社 | 光インプリント方法 |
| WO2013174522A1 (en) * | 2012-05-25 | 2013-11-28 | Micro Resist Technology Gesellschaft Für Chemische Materialien Spezieller Photoresistsysteme Mbh | Composition suitable for use as a release-optimized material for nanoimprint processes and uses thereof |
| JP6071255B2 (ja) * | 2012-06-04 | 2017-02-01 | キヤノン株式会社 | 光硬化物 |
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| US10754244B2 (en) * | 2016-03-31 | 2020-08-25 | Canon Kabushiki Kaisha | Pattern forming method as well as production methods for processed substrate, optical component, circuit board, electronic component and imprint mold |
| JP6754344B2 (ja) * | 2017-09-26 | 2020-09-09 | 富士フイルム株式会社 | インプリント用下層膜形成用組成物、キット、積層体、積層体の製造方法、硬化物パターンの製造方法、回路基板の製造方法 |
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| US11549020B2 (en) | 2019-09-23 | 2023-01-10 | Canon Kabushiki Kaisha | Curable composition for nano-fabrication |
| JP7904692B2 (ja) * | 2020-04-24 | 2026-08-13 | イルミナ ケンブリッジ リミテッド | フローセル |
| CN112731764A (zh) * | 2020-12-29 | 2021-04-30 | 苏州理硕科技有限公司 | 负性光刻胶组合物和形成光刻胶图案的方法 |
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| US11884977B2 (en) | 2021-03-12 | 2024-01-30 | Singular Genomics Systems, Inc. | Nanoarrays and methods of use thereof |
| WO2022232308A1 (en) | 2021-04-27 | 2022-11-03 | Singular Genomics Systems, Inc. | High density sequencing and multiplexed priming |
| EP4388134A4 (en) | 2021-08-20 | 2025-10-29 | Singular Genomics Systems Inc | CHEMICALLY AND THERMALLY ASSISTED NUCLEIC ACID AMPLIFICATION PROCESSES |
| WO2023034920A2 (en) | 2021-09-03 | 2023-03-09 | Singular Genomics Systems, Inc. | Amplification oligonucleotides |
| WO2023076833A1 (en) | 2021-10-26 | 2023-05-04 | Singular Genomics Systems, Inc. | Multiplexed targeted amplification of polynucleotides |
| US20250188521A1 (en) | 2022-03-10 | 2025-06-12 | Singular Genomics Systems, Inc. | Nucleic acid delivery scaffolds |
| CN117659612A (zh) * | 2022-09-07 | 2024-03-08 | 泰科电子(上海)有限公司 | 包含含氟化合物的环氧树脂组合物、使用该组合物的工艺及产品 |
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| TWI887123B (zh) * | 2024-09-20 | 2025-06-11 | 華碩電腦股份有限公司 | 壓印油墨及其壓印方法 |
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-
2008
- 2008-12-19 EP EP08172342.1A patent/EP2199855B1/en active Active
-
2009
- 2009-12-04 SG SG200908085-4A patent/SG162674A1/en unknown
- 2009-12-10 US US12/635,329 patent/US9063408B2/en active Active
- 2009-12-14 JP JP2009283148A patent/JP5725465B2/ja active Active
- 2009-12-16 TW TW098143041A patent/TWI515510B/zh active
- 2009-12-17 CN CN200910261311.2A patent/CN101872115B/zh active Active
- 2009-12-18 KR KR1020090126769A patent/KR101767179B1/ko active Active
-
2015
- 2015-02-06 JP JP2015022431A patent/JP5838002B2/ja active Active
Also Published As
| Publication number | Publication date |
|---|---|
| TWI515510B (zh) | 2016-01-01 |
| HK1149804A1 (en) | 2011-10-14 |
| JP2015097293A (ja) | 2015-05-21 |
| US20100160478A1 (en) | 2010-06-24 |
| CN101872115A (zh) | 2010-10-27 |
| JP5838002B2 (ja) | 2015-12-24 |
| EP2199855B1 (en) | 2016-07-20 |
| JP2010183064A (ja) | 2010-08-19 |
| KR20100071925A (ko) | 2010-06-29 |
| EP2199855A1 (en) | 2010-06-23 |
| US9063408B2 (en) | 2015-06-23 |
| KR101767179B1 (ko) | 2017-08-10 |
| CN101872115B (zh) | 2015-09-30 |
| TW201027251A (en) | 2010-07-16 |
| JP5725465B2 (ja) | 2015-05-27 |
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