SG162674A1 - Methods and processes for modifying polymer material surface interactions - Google Patents

Methods and processes for modifying polymer material surface interactions

Info

Publication number
SG162674A1
SG162674A1 SG200908085-4A SG2009080854A SG162674A1 SG 162674 A1 SG162674 A1 SG 162674A1 SG 2009080854 A SG2009080854 A SG 2009080854A SG 162674 A1 SG162674 A1 SG 162674A1
Authority
SG
Singapore
Prior art keywords
acrylates
monomers
epoxides
different types
photoinitiators
Prior art date
Application number
SG200908085-4A
Other languages
English (en)
Inventor
Jakob Nilsson
Matthias Keil Keil
Johan Ring
Babak Heidari
Original Assignee
Obducat Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Obducat Ab filed Critical Obducat Ab
Publication of SG162674A1 publication Critical patent/SG162674A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Epoxy Resins (AREA)
SG200908085-4A 2008-12-19 2009-12-04 Methods and processes for modifying polymer material surface interactions SG162674A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13903008P 2008-12-19 2008-12-19
EP08172342.1A EP2199855B1 (en) 2008-12-19 2008-12-19 Methods and processes for modifying polymer material surface interactions

Publications (1)

Publication Number Publication Date
SG162674A1 true SG162674A1 (en) 2010-07-29

Family

ID=40521956

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200908085-4A SG162674A1 (en) 2008-12-19 2009-12-04 Methods and processes for modifying polymer material surface interactions

Country Status (7)

Country Link
US (1) US9063408B2 (enExample)
EP (1) EP2199855B1 (enExample)
JP (2) JP5725465B2 (enExample)
KR (1) KR101767179B1 (enExample)
CN (1) CN101872115B (enExample)
SG (1) SG162674A1 (enExample)
TW (1) TWI515510B (enExample)

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Also Published As

Publication number Publication date
CN101872115B (zh) 2015-09-30
EP2199855A1 (en) 2010-06-23
JP5838002B2 (ja) 2015-12-24
CN101872115A (zh) 2010-10-27
KR20100071925A (ko) 2010-06-29
TWI515510B (zh) 2016-01-01
JP5725465B2 (ja) 2015-05-27
HK1149804A1 (en) 2011-10-14
KR101767179B1 (ko) 2017-08-10
JP2010183064A (ja) 2010-08-19
EP2199855B1 (en) 2016-07-20
TW201027251A (en) 2010-07-16
JP2015097293A (ja) 2015-05-21
US20100160478A1 (en) 2010-06-24
US9063408B2 (en) 2015-06-23

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