SG146597A1 - Lithographic apparatus and device manufacturing method - Google Patents
Lithographic apparatus and device manufacturing methodInfo
- Publication number
- SG146597A1 SG146597A1 SG200802524-9A SG2008025249A SG146597A1 SG 146597 A1 SG146597 A1 SG 146597A1 SG 2008025249 A SG2008025249 A SG 2008025249A SG 146597 A1 SG146597 A1 SG 146597A1
- Authority
- SG
- Singapore
- Prior art keywords
- substrate support
- sensor
- target portion
- lithographic apparatus
- control system
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 abstract 6
- 238000005259 measurement Methods 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/70516—Calibration of components of the microlithographic apparatus, e.g. light sources, addressable masks or detectors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/706835—Metrology information management or control
- G03F7/706839—Modelling, e.g. modelling scattering or solving inverse problems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/706843—Metrology apparatus
- G03F7/706847—Production of measurement radiation, e.g. synchrotron, free-electron laser, plasma source or higher harmonic generation [HHG]
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/18—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form
- G05B19/404—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by control arrangements for compensation, e.g. for backlash, overshoot, tool offset, tool wear, temperature, machine construction errors, load, inertia
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/45—Nc applications
- G05B2219/45031—Manufacturing semiconductor wafers
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/49—Nc machine tool, till multiple
- G05B2219/49189—Bending of driven table, lag between real and commanded position
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Atmospheric Sciences (AREA)
- Epidemiology (AREA)
- Manufacturing & Machinery (AREA)
- Automation & Control Theory (AREA)
- Toxicology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Human Computer Interaction (AREA)
- Environmental & Geological Engineering (AREA)
- Public Health (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/783,115 US7710540B2 (en) | 2007-04-05 | 2007-04-05 | Lithographic apparatus and device manufacturing method |
Publications (1)
Publication Number | Publication Date |
---|---|
SG146597A1 true SG146597A1 (en) | 2008-10-30 |
Family
ID=39628437
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200802524-9A SG146597A1 (en) | 2007-04-05 | 2008-03-19 | Lithographic apparatus and device manufacturing method |
Country Status (7)
Country | Link |
---|---|
US (1) | US7710540B2 (de) |
EP (1) | EP1978409A1 (de) |
JP (1) | JP5203008B2 (de) |
KR (1) | KR100938912B1 (de) |
CN (1) | CN101320223B (de) |
SG (1) | SG146597A1 (de) |
TW (1) | TWI388944B (de) |
Families Citing this family (48)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5992770A (ja) * | 1982-11-17 | 1984-05-29 | Mitsubishi Electric Corp | 電力変換装置 |
JPWO2007083758A1 (ja) | 2006-01-19 | 2009-06-11 | 株式会社ニコン | 移動体駆動方法及び移動体駆動システム、パターン形成方法及びパターン形成装置、露光方法及び露光装置、並びにデバイス製造方法 |
EP3293577A1 (de) | 2006-02-21 | 2018-03-14 | Nikon Corporation | Belichtungsapparat, belichtungsverfahren und verfahren zur herstellung einer vorrichtung |
JP5177674B2 (ja) | 2006-02-21 | 2013-04-03 | 株式会社ニコン | 測定装置及び方法、パターン形成装置及び方法、並びにデバイス製造方法 |
EP3115844B1 (de) | 2006-02-21 | 2018-08-15 | Nikon Corporation | Belichtungsapparat, belichtungsverfahren und verfahren zur herstellung einer vorrichtung |
TWI572994B (zh) | 2006-08-31 | 2017-03-01 | 尼康股份有限公司 | Exposure method and exposure apparatus, and component manufacturing method |
KR101670639B1 (ko) | 2006-08-31 | 2016-10-28 | 가부시키가이샤 니콘 | 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법 |
KR101706027B1 (ko) | 2006-08-31 | 2017-02-10 | 가부시키가이샤 니콘 | 이동체 구동 시스템 및 이동체 구동 방법, 패턴 형성 장치 및 방법, 노광 장치 및 방법, 디바이스 제조 방법, 그리고 결정 방법 |
KR101626245B1 (ko) | 2006-09-01 | 2016-05-31 | 가부시키가이샤 니콘 | 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 디바이스 제조 방법, 그리고 캘리브레이션 방법 |
KR20180058861A (ko) | 2006-09-01 | 2018-06-01 | 가부시키가이샤 니콘 | 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법 |
US8237919B2 (en) * | 2007-08-24 | 2012-08-07 | Nikon Corporation | Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method for continuous position measurement of movable body before and after switching between sensor heads |
US8279401B2 (en) * | 2008-04-25 | 2012-10-02 | Asml Netherlands B.V. | Position control system, a lithographic apparatus and a method for controlling a position of a movable object |
US8786829B2 (en) * | 2008-05-13 | 2014-07-22 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
US8817236B2 (en) | 2008-05-13 | 2014-08-26 | Nikon Corporation | Movable body system, movable body drive method, pattern formation apparatus, pattern formation method, exposure apparatus, exposure method, and device manufacturing method |
US8228482B2 (en) * | 2008-05-13 | 2012-07-24 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
NL2003772A (en) * | 2008-12-11 | 2010-06-14 | Asml Netherlands Bv | Lithographic apparatus and a method to compensate for the effect of disturbances on the projection system of a lithographic apparatus. |
US8902402B2 (en) | 2008-12-19 | 2014-12-02 | Nikon Corporation | Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method |
US8773635B2 (en) * | 2008-12-19 | 2014-07-08 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
US8760629B2 (en) * | 2008-12-19 | 2014-06-24 | Nikon Corporation | Exposure apparatus including positional measurement system of movable body, exposure method of exposing object including measuring positional information of movable body, and device manufacturing method that includes exposure method of exposing object, including measuring positional information of movable body |
US8599359B2 (en) | 2008-12-19 | 2013-12-03 | Nikon Corporation | Exposure apparatus, exposure method, device manufacturing method, and carrier method |
NL2003993A (nl) * | 2009-01-22 | 2010-07-26 | Asml Netherlands Bv | Control system, lithographic apparatus and a method to control a position quantity of a control location of a movable object. |
NL2005013A (en) * | 2009-07-31 | 2011-02-02 | Asml Netherlands Bv | Positioning system, lithographic apparatus and method. |
US8493547B2 (en) | 2009-08-25 | 2013-07-23 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
US8488109B2 (en) | 2009-08-25 | 2013-07-16 | Nikon Corporation | Exposure method, exposure apparatus, and device manufacturing method |
US8514395B2 (en) | 2009-08-25 | 2013-08-20 | Nikon Corporation | Exposure method, exposure apparatus, and device manufacturing method |
US20110102761A1 (en) * | 2009-09-28 | 2011-05-05 | Nikon Corporation | Stage apparatus, exposure apparatus, and device fabricating method |
US20110096306A1 (en) * | 2009-09-28 | 2011-04-28 | Nikon Corporation | Stage apparatus, exposure apparatus, driving method, exposing method, and device fabricating method |
US20110096312A1 (en) * | 2009-09-28 | 2011-04-28 | Nikon Corporation | Exposure apparatus and device fabricating method |
US20110096318A1 (en) * | 2009-09-28 | 2011-04-28 | Nikon Corporation | Exposure apparatus and device fabricating method |
US20110123913A1 (en) * | 2009-11-19 | 2011-05-26 | Nikon Corporation | Exposure apparatus, exposing method, and device fabricating method |
US20110128523A1 (en) * | 2009-11-19 | 2011-06-02 | Nikon Corporation | Stage apparatus, exposure apparatus, driving method, exposing method, and device fabricating method |
NL2005719A (en) * | 2009-12-18 | 2011-06-21 | Asml Netherlands Bv | Method of measuring properties of dynamic positioning errors in a lithographic apparatus, data processing apparatus, and computer program product. |
US8488106B2 (en) * | 2009-12-28 | 2013-07-16 | Nikon Corporation | Movable body drive method, movable body apparatus, exposure method, exposure apparatus, and device manufacturing method |
NL2006804A (en) * | 2010-06-24 | 2011-12-28 | Asml Netherlands Bv | Measurement system, method and lithographic apparatus. |
WO2013050081A1 (en) * | 2011-10-07 | 2013-04-11 | Carl Zeiss Smt Gmbh | Method for controlling a motion of optical elements in lithography systems |
US9207549B2 (en) | 2011-12-29 | 2015-12-08 | Nikon Corporation | Exposure apparatus and exposure method, and device manufacturing method with encoder of higher reliability for position measurement |
EP2735928B1 (de) * | 2012-11-21 | 2018-08-22 | Maschinenfabrik Berthold Hermle AG | Verfahren zur Einjustierung einer werkstücktragenden Baugruppe eines Bearbeitungszentrums für die spanende Werkstückbearbeitung |
KR101772504B1 (ko) * | 2012-11-27 | 2017-09-12 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 장치, 기판 지지 시스템, 디바이스 제조 방법 및 제어 프로그램 |
DE102013201082A1 (de) | 2013-01-24 | 2014-03-13 | Carl Zeiss Smt Gmbh | Anordnung zur Aktuierung eines Elementes in einer mikrolithographischen Projektionsbelichtungsanlage |
KR101882892B1 (ko) | 2013-12-05 | 2018-07-27 | 에이에스엠엘 네델란즈 비.브이. | 기판 상의 구조체를 측정하는 방법 및 장치, 오차 보정을 위한 모델, 이러한 방법 및 장치를 구현하기 위한 컴퓨터 프로그램 제품 |
CN111208712A (zh) | 2015-02-23 | 2020-05-29 | 株式会社尼康 | 测量装置及方法、光刻系统、曝光装置及方法 |
JP6649636B2 (ja) * | 2015-02-23 | 2020-02-19 | 株式会社ニコン | 計測装置、リソグラフィシステム及び露光装置、並びにデバイス製造方法 |
TWI768409B (zh) | 2015-02-23 | 2022-06-21 | 日商尼康股份有限公司 | 基板處理系統及基板處理方法、以及元件製造方法 |
KR102390306B1 (ko) | 2016-08-04 | 2022-04-22 | 케이엘에이 코포레이션 | 제조 공정에서 기판 상의 패턴들의 포지셔닝을 제어하기 위한 방법 및 컴퓨터 프로그램 제품 |
CN107883887B (zh) * | 2016-09-30 | 2019-11-26 | 上海微电子装备(集团)股份有限公司 | 一种光学测量装置和方法 |
JP6882103B2 (ja) * | 2017-07-04 | 2021-06-02 | キヤノン株式会社 | インプリント装置、および物品の製造方法 |
WO2020173641A1 (en) * | 2019-02-26 | 2020-09-03 | Asml Netherlands B.V. | Inspection apparatus, lithographic apparatus, measurement method |
CN111003207B (zh) * | 2019-12-06 | 2022-12-02 | 江西洪都航空工业集团有限责任公司 | 一种飞机舵机动刚度试验台稳定裕度测试系统及方法 |
Family Cites Families (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5184055A (en) * | 1989-10-06 | 1993-02-02 | Canon Kabushiki Kaisha | Device for positioning control |
JP3217522B2 (ja) * | 1992-03-02 | 2001-10-09 | キヤノン株式会社 | 精密位置決め装置 |
JP2002055719A (ja) * | 1992-03-02 | 2002-02-20 | Canon Inc | 精密位置決め装置 |
US6791098B2 (en) * | 1994-01-27 | 2004-09-14 | Cymer, Inc. | Multi-input, multi-output motion control for lithography system |
JPH08286758A (ja) * | 1995-04-11 | 1996-11-01 | Canon Inc | 位置決め装置 |
JP3918200B2 (ja) * | 1995-11-16 | 2007-05-23 | 株式会社ニコン | リソグラフィ装置の製造方法及びリソグラフィ装置 |
JP3733174B2 (ja) * | 1996-06-19 | 2006-01-11 | キヤノン株式会社 | 走査型投影露光装置 |
US6330052B1 (en) * | 1997-06-13 | 2001-12-11 | Canon Kabushiki Kaisha | Exposure apparatus and its control method, stage apparatus, and device manufacturing method |
WO1999053217A1 (fr) * | 1998-04-09 | 1999-10-21 | Nikon Corporation | Systeme d'elimination des vibrations et d'exposition |
TW490596B (en) * | 1999-03-08 | 2002-06-11 | Asm Lithography Bv | Lithographic projection apparatus, method of manufacturing a device using the lithographic projection apparatus, device manufactured according to the method and method of calibrating the lithographic projection apparatus |
US6924884B2 (en) * | 1999-03-08 | 2005-08-02 | Asml Netherlands B.V. | Off-axis leveling in lithographic projection apparatus |
EP1111472B1 (de) | 1999-12-22 | 2007-03-07 | ASML Netherlands B.V. | Lithographischer Apparat mit einem System zur Positionsdetektion |
US6680617B2 (en) * | 2000-09-20 | 2004-01-20 | Neocera, Inc. | Apertured probes for localized measurements of a material's complex permittivity and fabrication method |
US7158840B2 (en) | 2001-06-29 | 2007-01-02 | Cymer, Inc. | Tuning control parameters of vibration reduction and motion control systems for fabrication equipment and robotic systems |
JP2003228422A (ja) * | 2002-02-04 | 2003-08-15 | Canon Inc | ステージ制御装置及び露光装置並びにデバイスの製造方法 |
JP3919560B2 (ja) * | 2002-02-26 | 2007-05-30 | キヤノン株式会社 | 振動制御装置及び振動制御方法及び露光装置及びデバイスの製造方法 |
JP3984841B2 (ja) * | 2002-03-07 | 2007-10-03 | キヤノン株式会社 | 歪み計測装置、歪み抑制装置、及び露光装置、並びにデバイス製造方法 |
JP2004086702A (ja) * | 2002-08-28 | 2004-03-18 | Yaskawa Electric Corp | 振動抑制フィルタの自動設定方法 |
JP2004111653A (ja) * | 2002-09-18 | 2004-04-08 | Canon Inc | 位置決め装置及びそれを適用した露光装置並びに半導体デバイスの製造方法 |
US6881963B2 (en) * | 2002-11-08 | 2005-04-19 | Canon Kabushiki Kaisha | Vibration control of an object |
JP2004162745A (ja) * | 2002-11-11 | 2004-06-10 | Canon Inc | 弾性振動の制御装置 |
JP2004164029A (ja) * | 2002-11-08 | 2004-06-10 | Canon Inc | 弾性振動の制御装置 |
JP2005093638A (ja) * | 2003-09-17 | 2005-04-07 | Canon Inc | 微動ステージ |
TWI254190B (en) * | 2003-09-22 | 2006-05-01 | Asml Netherlands Bv | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
JP2005150615A (ja) * | 2003-11-19 | 2005-06-09 | Canon Inc | ステージおよびステージの制御方法 |
JP2005150616A (ja) * | 2003-11-19 | 2005-06-09 | Canon Inc | 微動ステージ |
JP2005297109A (ja) * | 2004-04-09 | 2005-10-27 | Canon Inc | 微動ステージ |
US7486381B2 (en) * | 2004-05-21 | 2009-02-03 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP2005337320A (ja) * | 2004-05-25 | 2005-12-08 | Canon Inc | 構造物、半導体露光装置およびデバイス製造方法 |
US7310130B2 (en) * | 2004-10-05 | 2007-12-18 | Asml Netherlands B.V. | Lithographic apparatus and position measuring method |
US7256866B2 (en) * | 2004-10-12 | 2007-08-14 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7327437B2 (en) * | 2004-12-07 | 2008-02-05 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7265813B2 (en) * | 2004-12-28 | 2007-09-04 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
-
2007
- 2007-04-05 US US11/783,115 patent/US7710540B2/en active Active
-
2008
- 2008-03-19 SG SG200802524-9A patent/SG146597A1/en unknown
- 2008-03-24 TW TW097110410A patent/TWI388944B/zh not_active IP Right Cessation
- 2008-03-28 JP JP2008085232A patent/JP5203008B2/ja not_active Expired - Fee Related
- 2008-03-28 EP EP08075225A patent/EP1978409A1/de not_active Withdrawn
- 2008-04-03 CN CN2008101428923A patent/CN101320223B/zh active Active
- 2008-04-04 KR KR1020080031547A patent/KR100938912B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
TW200848957A (en) | 2008-12-16 |
CN101320223A (zh) | 2008-12-10 |
JP5203008B2 (ja) | 2013-06-05 |
EP1978409A1 (de) | 2008-10-08 |
TWI388944B (zh) | 2013-03-11 |
CN101320223B (zh) | 2011-03-16 |
US20080246936A1 (en) | 2008-10-09 |
US7710540B2 (en) | 2010-05-04 |
KR20080091020A (ko) | 2008-10-09 |
JP2008258613A (ja) | 2008-10-23 |
KR100938912B1 (ko) | 2010-01-27 |
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