SG146597A1 - Lithographic apparatus and device manufacturing method - Google Patents

Lithographic apparatus and device manufacturing method

Info

Publication number
SG146597A1
SG146597A1 SG200802524-9A SG2008025249A SG146597A1 SG 146597 A1 SG146597 A1 SG 146597A1 SG 2008025249 A SG2008025249 A SG 2008025249A SG 146597 A1 SG146597 A1 SG 146597A1
Authority
SG
Singapore
Prior art keywords
substrate support
sensor
target portion
lithographic apparatus
control system
Prior art date
Application number
SG200802524-9A
Other languages
English (en)
Inventor
Erik Roelof Loopstra
Henrikus Herman Marie Cox
Jeroen Johannes Sophia Maria Mertens
Wilhelmus Franciscus Johannes Simons
Paul Petrus Joannes Berkvens
Original Assignee
Asml Netherlands B V 22 30 74
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands B V 22 30 74 filed Critical Asml Netherlands B V 22 30 74
Publication of SG146597A1 publication Critical patent/SG146597A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70516—Calibration of components of the microlithographic apparatus, e.g. light sources, addressable masks or detectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/706835—Metrology information management or control
    • G03F7/706839—Modelling, e.g. modelling scattering or solving inverse problems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/706843—Metrology apparatus
    • G03F7/706847—Production of measurement radiation, e.g. synchrotron, free-electron laser, plasma source or higher harmonic generation [HHG]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00—Programme-control systems
    • G05B19/02—Programme-control systems electric
    • G05B19/18—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form
    • G05B19/404—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by control arrangements for compensation, e.g. for backlash, overshoot, tool offset, tool wear, temperature, machine construction errors, load, inertia
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/45—Nc applications
    • G05B2219/45031—Manufacturing semiconductor wafers
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/49—Nc machine tool, till multiple
    • G05B2219/49189—Bending of driven table, lag between real and commanded position

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Epidemiology (AREA)
  • Manufacturing & Machinery (AREA)
  • Automation & Control Theory (AREA)
  • Toxicology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Human Computer Interaction (AREA)
  • Environmental & Geological Engineering (AREA)
  • Public Health (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200802524-9A 2007-04-05 2008-03-19 Lithographic apparatus and device manufacturing method SG146597A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/783,115 US7710540B2 (en) 2007-04-05 2007-04-05 Lithographic apparatus and device manufacturing method

Publications (1)

Publication Number Publication Date
SG146597A1 true SG146597A1 (en) 2008-10-30

Family

ID=39628437

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200802524-9A SG146597A1 (en) 2007-04-05 2008-03-19 Lithographic apparatus and device manufacturing method

Country Status (7)

Country Link
US (1) US7710540B2 (de)
EP (1) EP1978409A1 (de)
JP (1) JP5203008B2 (de)
KR (1) KR100938912B1 (de)
CN (1) CN101320223B (de)
SG (1) SG146597A1 (de)
TW (1) TWI388944B (de)

Families Citing this family (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5992770A (ja) * 1982-11-17 1984-05-29 Mitsubishi Electric Corp 電力変換装置
JPWO2007083758A1 (ja) 2006-01-19 2009-06-11 株式会社ニコン 移動体駆動方法及び移動体駆動システム、パターン形成方法及びパターン形成装置、露光方法及び露光装置、並びにデバイス製造方法
EP3293577A1 (de) 2006-02-21 2018-03-14 Nikon Corporation Belichtungsapparat, belichtungsverfahren und verfahren zur herstellung einer vorrichtung
JP5177674B2 (ja) 2006-02-21 2013-04-03 株式会社ニコン 測定装置及び方法、パターン形成装置及び方法、並びにデバイス製造方法
EP3115844B1 (de) 2006-02-21 2018-08-15 Nikon Corporation Belichtungsapparat, belichtungsverfahren und verfahren zur herstellung einer vorrichtung
TWI572994B (zh) 2006-08-31 2017-03-01 尼康股份有限公司 Exposure method and exposure apparatus, and component manufacturing method
KR101670639B1 (ko) 2006-08-31 2016-10-28 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법
KR101706027B1 (ko) 2006-08-31 2017-02-10 가부시키가이샤 니콘 이동체 구동 시스템 및 이동체 구동 방법, 패턴 형성 장치 및 방법, 노광 장치 및 방법, 디바이스 제조 방법, 그리고 결정 방법
KR101626245B1 (ko) 2006-09-01 2016-05-31 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 디바이스 제조 방법, 그리고 캘리브레이션 방법
KR20180058861A (ko) 2006-09-01 2018-06-01 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법
US8237919B2 (en) * 2007-08-24 2012-08-07 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method for continuous position measurement of movable body before and after switching between sensor heads
US8279401B2 (en) * 2008-04-25 2012-10-02 Asml Netherlands B.V. Position control system, a lithographic apparatus and a method for controlling a position of a movable object
US8786829B2 (en) * 2008-05-13 2014-07-22 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8817236B2 (en) 2008-05-13 2014-08-26 Nikon Corporation Movable body system, movable body drive method, pattern formation apparatus, pattern formation method, exposure apparatus, exposure method, and device manufacturing method
US8228482B2 (en) * 2008-05-13 2012-07-24 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
NL2003772A (en) * 2008-12-11 2010-06-14 Asml Netherlands Bv Lithographic apparatus and a method to compensate for the effect of disturbances on the projection system of a lithographic apparatus.
US8902402B2 (en) 2008-12-19 2014-12-02 Nikon Corporation Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method
US8773635B2 (en) * 2008-12-19 2014-07-08 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8760629B2 (en) * 2008-12-19 2014-06-24 Nikon Corporation Exposure apparatus including positional measurement system of movable body, exposure method of exposing object including measuring positional information of movable body, and device manufacturing method that includes exposure method of exposing object, including measuring positional information of movable body
US8599359B2 (en) 2008-12-19 2013-12-03 Nikon Corporation Exposure apparatus, exposure method, device manufacturing method, and carrier method
NL2003993A (nl) * 2009-01-22 2010-07-26 Asml Netherlands Bv Control system, lithographic apparatus and a method to control a position quantity of a control location of a movable object.
NL2005013A (en) * 2009-07-31 2011-02-02 Asml Netherlands Bv Positioning system, lithographic apparatus and method.
US8493547B2 (en) 2009-08-25 2013-07-23 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8488109B2 (en) 2009-08-25 2013-07-16 Nikon Corporation Exposure method, exposure apparatus, and device manufacturing method
US8514395B2 (en) 2009-08-25 2013-08-20 Nikon Corporation Exposure method, exposure apparatus, and device manufacturing method
US20110102761A1 (en) * 2009-09-28 2011-05-05 Nikon Corporation Stage apparatus, exposure apparatus, and device fabricating method
US20110096306A1 (en) * 2009-09-28 2011-04-28 Nikon Corporation Stage apparatus, exposure apparatus, driving method, exposing method, and device fabricating method
US20110096312A1 (en) * 2009-09-28 2011-04-28 Nikon Corporation Exposure apparatus and device fabricating method
US20110096318A1 (en) * 2009-09-28 2011-04-28 Nikon Corporation Exposure apparatus and device fabricating method
US20110123913A1 (en) * 2009-11-19 2011-05-26 Nikon Corporation Exposure apparatus, exposing method, and device fabricating method
US20110128523A1 (en) * 2009-11-19 2011-06-02 Nikon Corporation Stage apparatus, exposure apparatus, driving method, exposing method, and device fabricating method
NL2005719A (en) * 2009-12-18 2011-06-21 Asml Netherlands Bv Method of measuring properties of dynamic positioning errors in a lithographic apparatus, data processing apparatus, and computer program product.
US8488106B2 (en) * 2009-12-28 2013-07-16 Nikon Corporation Movable body drive method, movable body apparatus, exposure method, exposure apparatus, and device manufacturing method
NL2006804A (en) * 2010-06-24 2011-12-28 Asml Netherlands Bv Measurement system, method and lithographic apparatus.
WO2013050081A1 (en) * 2011-10-07 2013-04-11 Carl Zeiss Smt Gmbh Method for controlling a motion of optical elements in lithography systems
US9207549B2 (en) 2011-12-29 2015-12-08 Nikon Corporation Exposure apparatus and exposure method, and device manufacturing method with encoder of higher reliability for position measurement
EP2735928B1 (de) * 2012-11-21 2018-08-22 Maschinenfabrik Berthold Hermle AG Verfahren zur Einjustierung einer werkstücktragenden Baugruppe eines Bearbeitungszentrums für die spanende Werkstückbearbeitung
KR101772504B1 (ko) * 2012-11-27 2017-09-12 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치, 기판 지지 시스템, 디바이스 제조 방법 및 제어 프로그램
DE102013201082A1 (de) 2013-01-24 2014-03-13 Carl Zeiss Smt Gmbh Anordnung zur Aktuierung eines Elementes in einer mikrolithographischen Projektionsbelichtungsanlage
KR101882892B1 (ko) 2013-12-05 2018-07-27 에이에스엠엘 네델란즈 비.브이. 기판 상의 구조체를 측정하는 방법 및 장치, 오차 보정을 위한 모델, 이러한 방법 및 장치를 구현하기 위한 컴퓨터 프로그램 제품
CN111208712A (zh) 2015-02-23 2020-05-29 株式会社尼康 测量装置及方法、光刻系统、曝光装置及方法
JP6649636B2 (ja) * 2015-02-23 2020-02-19 株式会社ニコン 計測装置、リソグラフィシステム及び露光装置、並びにデバイス製造方法
TWI768409B (zh) 2015-02-23 2022-06-21 日商尼康股份有限公司 基板處理系統及基板處理方法、以及元件製造方法
KR102390306B1 (ko) 2016-08-04 2022-04-22 케이엘에이 코포레이션 제조 공정에서 기판 상의 패턴들의 포지셔닝을 제어하기 위한 방법 및 컴퓨터 프로그램 제품
CN107883887B (zh) * 2016-09-30 2019-11-26 上海微电子装备（集团）股份有限公司 一种光学测量装置和方法
JP6882103B2 (ja) * 2017-07-04 2021-06-02 キヤノン株式会社 インプリント装置、および物品の製造方法
WO2020173641A1 (en) * 2019-02-26 2020-09-03 Asml Netherlands B.V. Inspection apparatus, lithographic apparatus, measurement method
CN111003207B (zh) * 2019-12-06 2022-12-02 江西洪都航空工业集团有限责任公司 一种飞机舵机动刚度试验台稳定裕度测试系统及方法

Family Cites Families (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5184055A (en) * 1989-10-06 1993-02-02 Canon Kabushiki Kaisha Device for positioning control
JP3217522B2 (ja) * 1992-03-02 2001-10-09 キヤノン株式会社 精密位置決め装置
JP2002055719A (ja) * 1992-03-02 2002-02-20 Canon Inc 精密位置決め装置
US6791098B2 (en) * 1994-01-27 2004-09-14 Cymer, Inc. Multi-input, multi-output motion control for lithography system
JPH08286758A (ja) * 1995-04-11 1996-11-01 Canon Inc 位置決め装置
JP3918200B2 (ja) * 1995-11-16 2007-05-23 株式会社ニコン リソグラフィ装置の製造方法及びリソグラフィ装置
JP3733174B2 (ja) * 1996-06-19 2006-01-11 キヤノン株式会社 走査型投影露光装置
US6330052B1 (en) * 1997-06-13 2001-12-11 Canon Kabushiki Kaisha Exposure apparatus and its control method, stage apparatus, and device manufacturing method
WO1999053217A1 (fr) * 1998-04-09 1999-10-21 Nikon Corporation Systeme d'elimination des vibrations et d'exposition
TW490596B (en) * 1999-03-08 2002-06-11 Asm Lithography Bv Lithographic projection apparatus, method of manufacturing a device using the lithographic projection apparatus, device manufactured according to the method and method of calibrating the lithographic projection apparatus
US6924884B2 (en) * 1999-03-08 2005-08-02 Asml Netherlands B.V. Off-axis leveling in lithographic projection apparatus
EP1111472B1 (de) 1999-12-22 2007-03-07 ASML Netherlands B.V. Lithographischer Apparat mit einem System zur Positionsdetektion
US6680617B2 (en) * 2000-09-20 2004-01-20 Neocera, Inc. Apertured probes for localized measurements of a material's complex permittivity and fabrication method
US7158840B2 (en) 2001-06-29 2007-01-02 Cymer, Inc. Tuning control parameters of vibration reduction and motion control systems for fabrication equipment and robotic systems
JP2003228422A (ja) * 2002-02-04 2003-08-15 Canon Inc ステージ制御装置及び露光装置並びにデバイスの製造方法
JP3919560B2 (ja) * 2002-02-26 2007-05-30 キヤノン株式会社 振動制御装置及び振動制御方法及び露光装置及びデバイスの製造方法
JP3984841B2 (ja) * 2002-03-07 2007-10-03 キヤノン株式会社 歪み計測装置、歪み抑制装置、及び露光装置、並びにデバイス製造方法
JP2004086702A (ja) * 2002-08-28 2004-03-18 Yaskawa Electric Corp 振動抑制フィルタの自動設定方法
JP2004111653A (ja) * 2002-09-18 2004-04-08 Canon Inc 位置決め装置及びそれを適用した露光装置並びに半導体デバイスの製造方法
US6881963B2 (en) * 2002-11-08 2005-04-19 Canon Kabushiki Kaisha Vibration control of an object
JP2004162745A (ja) * 2002-11-11 2004-06-10 Canon Inc 弾性振動の制御装置
JP2004164029A (ja) * 2002-11-08 2004-06-10 Canon Inc 弾性振動の制御装置
JP2005093638A (ja) * 2003-09-17 2005-04-07 Canon Inc 微動ステージ
TWI254190B (en) * 2003-09-22 2006-05-01 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
JP2005150615A (ja) * 2003-11-19 2005-06-09 Canon Inc ステージおよびステージの制御方法
JP2005150616A (ja) * 2003-11-19 2005-06-09 Canon Inc 微動ステージ
JP2005297109A (ja) * 2004-04-09 2005-10-27 Canon Inc 微動ステージ
US7486381B2 (en) * 2004-05-21 2009-02-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2005337320A (ja) * 2004-05-25 2005-12-08 Canon Inc 構造物、半導体露光装置およびデバイス製造方法
US7310130B2 (en) * 2004-10-05 2007-12-18 Asml Netherlands B.V. Lithographic apparatus and position measuring method
US7256866B2 (en) * 2004-10-12 2007-08-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7327437B2 (en) * 2004-12-07 2008-02-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7265813B2 (en) * 2004-12-28 2007-09-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Also Published As

Publication number Publication date
TW200848957A (en) 2008-12-16
CN101320223A (zh) 2008-12-10
JP5203008B2 (ja) 2013-06-05
EP1978409A1 (de) 2008-10-08
TWI388944B (zh) 2013-03-11
CN101320223B (zh) 2011-03-16
US20080246936A1 (en) 2008-10-09
US7710540B2 (en) 2010-05-04
KR20080091020A (ko) 2008-10-09
JP2008258613A (ja) 2008-10-23
KR100938912B1 (ko) 2010-01-27

Similar Documents

Publication Publication Date Title
SG146597A1 (en) Lithographic apparatus and device manufacturing method
SG145654A1 (en) Stage system and lithographic apparatus comprising such stage system
WO2009013905A1 (ja) 位置計測システム、露光装置、位置計測方法、露光方法及びデバイス製造方法、並びに工具及び計測方法
ATE531313T1 (de) System zur steuerung einer haptischen exoskelettvorrichtung zu rehabilitationszwecken und entsprechende haptische exoskelettvorrichtung
WO2006132943A3 (en) Method and apparatus for controlling a component by feed-forward closed-loop controller state modification
SG162700A1 (en) A method for damping an object, an active damping system, and a lithographic apparatus
WO2010006935A3 (en) Alignment system, lithographic system and method
TW200627096A (en) Optical position assessment apparatus and method
TW200633009A (en) Position measurement method, position control method, measurement method, loading method, exposure method and exposure apparatus, and device manufacturing
DE602004029720D1 (de) S eines wasserfahrzeugs
SG148963A1 (en) Control system, lithographic projection apparatus, method of controlling a support structure, and a computer program product
TW200744806A (en) Robot system
SG151245A1 (en) Lithographic apparatus and device manufacturing method
JP2009224806A5 (de)
WO2009011052A1 (ja) メモリリフレッシュ装置およびメモリリフレッシュ方法
WO2005007406A3 (de) Verfahren und vorrichtung zur beeinflussung des fan-out-effektes
TW200707088A (en) Metrology apparatus, lithographic apparatus, process apparatus metrology method and device manufacturing method
TW200700934A (en) Lithographic apparatus, immersion projection apparatus and device manufacturing method
SG11201900593WA (en) Method and device for lithographically producing a target structure on a non-planar initial structure
JP2008535638A5 (de)
SG145645A1 (en) Lithographic apparatus and device manufacturing method
ATE488706T1 (de) Kupplungsreferenzposition
TW200644078A (en) Measurement method, measurement system, inspection method, inspection system, exposure method, and exposure system
WO2008146877A1 (ja) 防振装置、防振装置の制御方法、及び露光装置
TW200702966A (en) Traveling vehicle system and stop control method for traveling vehicle