SG11202008828VA - Cleaning compositions - Google Patents

Cleaning compositions

Info

Publication number
SG11202008828VA
SG11202008828VA SG11202008828VA SG11202008828VA SG11202008828VA SG 11202008828V A SG11202008828V A SG 11202008828VA SG 11202008828V A SG11202008828V A SG 11202008828VA SG 11202008828V A SG11202008828V A SG 11202008828VA SG 11202008828V A SG11202008828V A SG 11202008828VA
Authority
SG
Singapore
Prior art keywords
cleaning compositions
compositions
cleaning
Prior art date
Application number
SG11202008828VA
Other languages
English (en)
Inventor
Thomas Dory
Mick Bjelopavlic
Joshua Guske
Kazutaka Takahashi
Original Assignee
Fujifilm Electronic Materials Usa Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Electronic Materials Usa Inc filed Critical Fujifilm Electronic Materials Usa Inc
Publication of SG11202008828VA publication Critical patent/SG11202008828VA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/02—Inorganic compounds
    • C11D7/04—Water-soluble compounds
    • C11D7/06—Hydroxides
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/261—Alcohols; Phenols
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3218—Alkanolamines or alkanolimines
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3281—Heterocyclic compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/34—Organic compounds containing sulfur
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02057—Cleaning during device manufacture
    • H01L21/0206—Cleaning during device manufacture during, before or after processing of insulating layers
    • H01L21/02063—Cleaning during device manufacture during, before or after processing of insulating layers the processing being the formation of vias or contact holes
    • C11D2111/22—
SG11202008828VA 2018-03-28 2019-02-19 Cleaning compositions SG11202008828VA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201862649029P 2018-03-28 2018-03-28
PCT/US2019/018508 WO2019190653A1 (en) 2018-03-28 2019-02-19 Cleaning compositions

Publications (1)

Publication Number Publication Date
SG11202008828VA true SG11202008828VA (en) 2020-10-29

Family

ID=68056965

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202008828VA SG11202008828VA (en) 2018-03-28 2019-02-19 Cleaning compositions

Country Status (9)

Country Link
US (4) US10752867B2 (zh)
EP (1) EP3774680A4 (zh)
JP (2) JP7311229B2 (zh)
KR (1) KR20200138742A (zh)
CN (1) CN111902379B (zh)
IL (2) IL277275B2 (zh)
SG (1) SG11202008828VA (zh)
TW (2) TW202405151A (zh)
WO (1) WO2019190653A1 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9562211B2 (en) 2013-12-06 2017-02-07 Fujifilm Electronic Materials U.S.A., Inc. Cleaning formulation for removing residues on surfaces
US10752867B2 (en) 2018-03-28 2020-08-25 Fujifilm Electronic Materials U.S.A., Inc. Cleaning compositions

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* Cited by examiner, † Cited by third party
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Also Published As

Publication number Publication date
TW201942349A (zh) 2019-11-01
US11407966B2 (en) 2022-08-09
EP3774680A4 (en) 2021-05-19
KR20200138742A (ko) 2020-12-10
TWI818958B (zh) 2023-10-21
IL277275B2 (en) 2023-11-01
US10752867B2 (en) 2020-08-25
JP2021519836A (ja) 2021-08-12
WO2019190653A1 (en) 2019-10-03
IL277275A (en) 2020-10-29
EP3774680A1 (en) 2021-02-17
CN111902379A (zh) 2020-11-06
US20220145221A1 (en) 2022-05-12
US20190300825A1 (en) 2019-10-03
US20200332231A1 (en) 2020-10-22
US11279903B2 (en) 2022-03-22
US20220306971A1 (en) 2022-09-29
IL301529A (en) 2023-05-01
IL277275B1 (en) 2023-07-01
CN111902379B (zh) 2023-02-17
JP2023133294A (ja) 2023-09-22
TW202405151A (zh) 2024-02-01
JP7311229B2 (ja) 2023-07-19

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