SG11202008828VA - Cleaning compositions - Google Patents

Cleaning compositions

Info

Publication number
SG11202008828VA
SG11202008828VA SG11202008828VA SG11202008828VA SG11202008828VA SG 11202008828V A SG11202008828V A SG 11202008828VA SG 11202008828V A SG11202008828V A SG 11202008828VA SG 11202008828V A SG11202008828V A SG 11202008828VA SG 11202008828V A SG11202008828V A SG 11202008828VA
Authority
SG
Singapore
Prior art keywords
cleaning compositions
compositions
cleaning
Prior art date
Application number
SG11202008828VA
Inventor
Thomas Dory
Mick Bjelopavlic
Joshua Guske
Kazutaka Takahashi
Original Assignee
Fujifilm Electronic Materials Usa Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Electronic Materials Usa Inc filed Critical Fujifilm Electronic Materials Usa Inc
Publication of SG11202008828VA publication Critical patent/SG11202008828VA/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/02Inorganic compounds
    • C11D7/04Water-soluble compounds
    • C11D7/06Hydroxides
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22Organic compounds
    • C11D7/26Organic compounds containing oxygen
    • C11D7/261Alcohols; Phenols
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22Organic compounds
    • C11D7/32Organic compounds containing nitrogen
    • C11D7/3218Alkanolamines or alkanolimines
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22Organic compounds
    • C11D7/32Organic compounds containing nitrogen
    • C11D7/3281Heterocyclic compounds
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22Organic compounds
    • C11D7/34Organic compounds containing sulfur
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041Cleaning
    • H01L21/02043Cleaning before device manufacture, i.e. Begin-Of-Line process
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041Cleaning
    • H01L21/02057Cleaning during device manufacture
    • H01L21/0206Cleaning during device manufacture during, before or after processing of insulating layers
    • H01L21/02063Cleaning during device manufacture during, before or after processing of insulating layers the processing being the formation of vias or contact holes
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10Objects to be cleaned
    • C11D2111/14Hard surfaces
    • C11D2111/22Electronic devices, e.g. PCBs or semiconductors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Wood Science & Technology (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Emergency Medicine (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Detergent Compositions (AREA)
  • Surface Treatment Of Glass (AREA)
SG11202008828VA 2018-03-28 2019-02-19 Cleaning compositions SG11202008828VA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201862649029P 2018-03-28 2018-03-28
PCT/US2019/018508 WO2019190653A1 (en) 2018-03-28 2019-02-19 Cleaning compositions

Publications (1)

Publication Number Publication Date
SG11202008828VA true SG11202008828VA (en) 2020-10-29

Family

ID=68056965

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202008828VA SG11202008828VA (en) 2018-03-28 2019-02-19 Cleaning compositions

Country Status (9)

Country Link
US (4) US10752867B2 (en)
EP (1) EP3774680A4 (en)
JP (2) JP7311229B2 (en)
KR (1) KR20200138742A (en)
CN (1) CN111902379B (en)
IL (2) IL301529A (en)
SG (1) SG11202008828VA (en)
TW (2) TWI818958B (en)
WO (1) WO2019190653A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108485840B (en) 2013-12-06 2020-12-29 富士胶片电子材料美国有限公司 Cleaning formulation for removing residues on surfaces
KR20200138742A (en) 2018-03-28 2020-12-10 후지필름 일렉트로닉 머티리얼스 유.에스.에이., 아이엔씨. Cleaning composition

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Also Published As

Publication number Publication date
US20200332231A1 (en) 2020-10-22
JP2021519836A (en) 2021-08-12
JP2023133294A (en) 2023-09-22
EP3774680A1 (en) 2021-02-17
IL277275B1 (en) 2023-07-01
IL301529A (en) 2023-05-01
US11279903B2 (en) 2022-03-22
IL277275A (en) 2020-10-29
TW202405151A (en) 2024-02-01
US20220306971A1 (en) 2022-09-29
JP7311229B2 (en) 2023-07-19
TW201942349A (en) 2019-11-01
IL277275B2 (en) 2023-11-01
WO2019190653A1 (en) 2019-10-03
EP3774680A4 (en) 2021-05-19
KR20200138742A (en) 2020-12-10
US20190300825A1 (en) 2019-10-03
US10752867B2 (en) 2020-08-25
US11407966B2 (en) 2022-08-09
TWI818958B (en) 2023-10-21
CN111902379A (en) 2020-11-06
CN111902379B (en) 2023-02-17
US20220145221A1 (en) 2022-05-12

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